A silicon nitride plate grinding and polishing equipment

Abstract

The utility model discloses a silicon nitride plate grinding and polishing device, belonging to the field of grinding and polishing technology. A silicon nitride plate grinding and polishing device comprises a polishing table, a nozzle is connected to the side wall of the polishing table through a flexible connector, the spray end of the nozzle faces the working end of the polishing table, a working disk is fixedly connected to the polishing table, a push rod is slidably connected to the working disk, and when the push rod moves toward the nozzle, the position of the nozzle is changed; the utility model can change the position of the nozzle, and the nozzle will vibrate under the influence of the limit of the flexible connector, thereby causing the water flow sprayed by the nozzle to fluctuate, so that it can cover the surface of the silicon nitride plate polished by the polishing wheel, and reduce the situation where the local temperature of the polishing surface of the polishing wheel is too high or too low.

Description

Technical Field

[0001] The utility model relates to the technical field of grinding and polishing, in particular to a silicon nitride plate grinding and polishing device. Background Art

[0002] Silicon nitride ceramic plates have many excellent properties, such as high hardness, high strength, low thermal expansion coefficient, good oxidation resistance, good thermal corrosion resistance, low friction coefficient, low high-temperature creep, and similarity to lubricated metal surfaces. They are the structural ceramic materials with the best comprehensive performance. When processing large-sized silicon nitride ceramic plates, a large workbench area and load-bearing capacity are required to adapt to large-sized silicon nitride plates to process, grind and polish the tiny holes on their surfaces to make them smooth after processing. In addition, silicon nitride has a good thermal expansion coefficient, which makes silicon nitride ceramic plates an extremely attractive high-strength and high-thermal conductivity electronic device substrate material. Compared with other ceramic materials, silicon nitride ceramic materials have obvious advantages. Especially under high temperature conditions, silicon nitride ceramic materials show high temperature resistance, chemical inertness to metals, ultra-high hardness and fracture toughness and other mechanical properties.

[0003] After searching, the Chinese patent publication number CN206982421U discloses a silicon nitride curved mirror polishing device, including a frame and a workbench, a slide rail is provided on the top of the frame, a slider is provided on the slide rail, a driving rod is provided on the top of the slider, a rotating disk is provided on the side of the slider, a control rod is provided on the rotating disk, a polishing shell is provided on the side of the rotating disk, a motor and a polishing wheel are provided in the polishing shell, the motor drives the polishing wheel, the polishing wheel is arranged above the workbench, a connecting plate is provided on the rear side of the polishing shell, the connecting plate is provided with a nozzle, and the nozzle is arranged on one side of the polishing wheel.

[0004] In the above scheme, the nozzle on the device sprays water fixedly toward one side of the polishing wheel, resulting in the water flow not being able to cover the surface of the silicon nitride plate being polished by the polishing wheel, causing the polishing surface of the polishing wheel to have a local temperature that is too high or too low. Utility Model Content

[0005] The purpose of the utility model is to solve the problem in the prior art that a fixed water spraying nozzle may cause the water flow to fail to cover the surface of the silicon nitride plate being polished by the polishing wheel, resulting in a situation where the polishing surface of the polishing wheel has a local temperature that is too high or too low, and to propose a silicon nitride plate grinding and polishing device.

[0006] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0007] A silicon nitride plate grinding and polishing device comprises a polishing table, a nozzle is connected to the side wall of the polishing table through a flexible connector, the spray end of the nozzle faces the working end of the polishing table, a working disk is fixedly connected to the polishing table, a push rod is slidably connected to the working disk, and when the push rod moves toward the nozzle, the position of the nozzle is changed.

[0008] In order to facilitate the control of the switch of the solenoid valve, preferably, a switch button is fixedly connected to the working disk, an air intake pipe is fixedly connected to the nozzle, a solenoid valve is arranged on the air intake pipe, and the solenoid valve is electrically coordinated with the switch button.

[0009] In order to facilitate the sliding of the two groups of push rods, the push rod further includes a first push rod and a second push rod, and a cam is rotatably connected inside the working disk. The contact ends of the first push rod and the second push rod respectively abut against the outer wall of the cam. The first push rod can abut against the outer wall of the nozzle, and the second push rod can abut against the outer wall of the switch button.

[0010] In order to facilitate the resetting of the push rod so that its contact end is always in contact with the outside of the cam, further, a reset spring is sleeved on the push rod, one end of the reset spring is fixedly connected to the end of the push rod, and the other end of the reset spring is fixedly connected to the working disk.

[0011] In order to facilitate the connection and installation of the return spring, preferably, the end of the push rod is fixedly connected to a circular push plate, and the return spring is fixedly connected to the circular push plate.

[0012] In order to facilitate grinding and polishing of the silicon nitride plate, preferably, the polishing table includes a working plate, the bottom of the working plate is rotatably connected to a polishing wheel, and the injection end of the nozzle faces the outside of the polishing wheel.

[0013] In order to facilitate the rotation of the cam, preferably, a connecting plate is fixedly connected to the working plate, a rotating shaft is rotatably connected to the connecting plate, and the rotating shaft is fixedly connected to the cam.

[0014] In order to facilitate the rotation of the rotating shaft, a booster disc is fixedly connected to the connecting plate, the rotating shaft extends to the booster disc and is fixedly connected to a turbine blade, one side of the booster disc is fixedly connected to a liquid inlet pipe, and the other side of the booster disc is connected to the nozzle through a liquid outlet pipe.

[0015] In order to facilitate one-way flow of the liquid outlet pipe, preferably, a one-way valve is provided on the liquid outlet pipe, and the one-way valve cooperates with the spray head.

[0016] In order to improve the flexible connection effect of the nozzle, preferably, the flexible connection piece can be a rubber flexible joint, a bellows or a spring flexible joint.

[0017] Compared with the prior art, the utility model provides a silicon nitride plate grinding and polishing device, which has the following beneficial effects:

[0018] 1. The silicon nitride plate grinding and polishing equipment pushes the outside of the nozzle through the first push rod, at which time the position of the nozzle is changed, and the nozzle will vibrate under the influence of the limit of the flexible connection part, so that the water flow sprayed by the nozzle can fluctuate, so that it can cover the surface of the silicon nitride plate polished by the polishing wheel, and reduce the situation where the local temperature of the polishing surface of the polishing wheel is too high or too low;

[0019] 2. The silicon nitride plate grinding and polishing equipment intermittently delivers gas to the nozzle through the air inlet pipe, and mixes with the water source to increase the cooling effect of the water source in the nozzle, making the water spray cooling effect of the nozzle more obvious. At the same time, the gas can form bubbles in the water source, breaking the surface tension of the water, making it easier for the water to adhere to the surface of the polishing wheel or the silicon nitride plate, thereby improving the cooling effect of the nozzle.

[0020] The parts not involved in the device are the same as the existing technology or can be implemented by the existing technology. The utility model can change the position of the nozzle. Under the influence of the limiting influence of the flexible connecting part, the nozzle will vibrate, which can cause the water flow sprayed by the nozzle to fluctuate, so that it can cover the surface of the silicon nitride plate polished by the polishing wheel, thereby reducing the local temperature of the polishing surface of the polishing wheel that is too high or too low. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a three-dimensional schematic diagram of a silicon nitride plate grinding and polishing device proposed by the utility model;

[0022] Figure 2 This is a schematic diagram of the structure of a working plate of a silicon nitride plate grinding and polishing equipment proposed by the utility model;

[0023] Figure 3 This is a structural schematic diagram of a working disk of a silicon nitride plate grinding and polishing device proposed by the utility model from a first-view perspective;

[0024] Figure 4 This is a structural schematic diagram of a working disk of a silicon nitride plate grinding and polishing equipment proposed by the utility model from a second perspective.

[0025] In the figure: 1, working plate; 101, polishing wheel; 2, connecting plate; 3, nozzle; 301, liquid outlet pipe; 302, air inlet pipe; 4, working disk; 401, first push rod; 402, second push rod; 5, rotating shaft; 6, cam; 7, boost disk; 701, turbine blade; 8, switch button; 801, solenoid valve. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0027] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.

[0028] Example:

[0029] Reference Figure 1-Figure 4 A silicon nitride plate grinding and polishing device includes a polishing table, which includes a working plate 1. A polishing wheel 101 is rotatably connected to the bottom of the working plate 1. The polishing wheel 101 is rotated by a driving machine or an electric motor. The polishing table can also be installed on a large workbench to grind and polish large silicon nitride plates.

[0030] The nozzle 3 is also connected to the working plate 1 through a flexible connector, and the flexible connector can be a rubber flexible joint: made of rubber material, capable of driving the nozzle 3 to vibrate and compensate for displacement, a bellows: made of copper, aluminum or plastic material, with a corrugated structure, capable of driving the nozzle 3 to bend within a certain range, a spring flexible joint: composed of a metal spring or a rubber spring, capable of driving the nozzle 3 to bend.

[0031] In addition, the spray end of the nozzle 3 will face the outside of the polishing wheel 101. A pipe for providing coolant or water source can be installed on the nozzle 3 to provide a water source for the nozzle 3, so that the nozzle 3 can be used to spray water on the surface of the polishing wheel 101.

[0032] A connecting plate 2 is fixedly connected to the working plate 1, a working disk 4 is fixedly connected to the connecting plate 2, a first push rod 401 is slidably connected to the working disk 4, a cam 6 is rotatably connected inside the working disk 4, and the contact end of the first push rod 401 abuts against the outer wall of the cam 6, a return spring is sleeved on the first push rod 401, one end of the return spring is fixedly connected to the end of the first push rod 401, and the other end of the return spring is fixedly connected to the working disk 4.

[0033] In addition, in order to improve the resetting effect of the resetting spring, a circular push plate is fixedly connected to the end of the first push rod 401, and the resetting spring is fixedly connected to the circular push plate, so that the first push rod 401 can continuously abut against the outer wall of the cam 6 rotating in the working disk 4.

[0034] A rotating shaft 5 is also rotatably connected to the connecting plate 2, and the rotating shaft 5 is fixedly connected to the cam 6. A booster disc 7 is also fixedly connected to the connecting plate 2. The rotating shaft 5 is then extended into the booster disc 7, and a turbine blade 701 is installed on the rotating shaft 5. A liquid inlet pipe is fixedly connected to one side of the booster disc 7. The liquid inlet pipe can be connected to a water supply device, such as the output end of a water pump to transport high-pressure water to the booster disc 7. At the same time, the other side of the booster disc 7 is also connected to the nozzle 3 through a liquid outlet pipe 301, and a one-way valve is arranged on the liquid outlet pipe 301. The one-way valve cooperates with the nozzle 3 to prevent water backflow when the nozzle 3 is working.

[0035] By supplying water to the nozzle 3, the water flow drives the turbine blade 701 in the boost disk 7 to rotate, and then drives the rotating shaft 5 to rotate. At this time, the rotating shaft 5 will drive the cam 6 to rotate in the working disk 4, and can make the first push rod 401 slide back and forth. The first push rod 401 will be limited by the return spring during the sliding process. At this time, the first push rod 401 will push the outside of the nozzle 3. At this time, the position of the nozzle 3 is changed. Under the influence of the limiting influence of the flexible connecting part, the nozzle 3 will vibrate, and then the water flow sprayed from the nozzle 3 can fluctuate, so that it can cover the surface of the silicon nitride plate polished by the polishing wheel 101, thereby reducing the local temperature being too high or too low on the polishing surface of the polishing wheel 101.

[0036] Embodiment 2:

[0037] Reference Figure 2-Figure 4 A second push rod 402 is also slidably connected in the working disk 4, and the second push rod 402 is symmetrically arranged with the first push rod 401. A switch button 8 is fixedly connected to a push rod connecting rod on the side of the working disk 4 away from the first push rod 401. It is a commonly used electrical component used to control the on and off of a circuit or the start and stop of a function. A switch button 8 with model LA38-11 / 203 can be used. The contact structure is in a normally closed state, and the switch button 8 is usually composed of a button head, a button body, a fixing seat and a connecting wire. The circuit is opened and closed by pressing the button head of the switch button 8.

[0038] The switch button 8 realizes the circuit passage operation by pressing the contact of the button head. If not pressed, the circuit is closed. An air intake pipe 302 is also fixedly connected to the nozzle 3, and an electromagnetic valve 801 is arranged on the air intake pipe 302. The electromagnetic valve 801 is electrically coordinated with the switch button 8. The electromagnetic valve 801 can be opened or closed by the switch button 8, and the air intake pipe 302 can be externally connected to a gas delivery device, such as an air pump, which can deliver air or nitrogen.

[0039] When the second push rod 402 contacts the switch button 8, the solenoid valve 801 is opened, and the air inlet pipe 302 intermittently delivers gas to the nozzle 3, which is mixed with the water source to increase the cooling effect of the water source in the nozzle 3, making the water spray cooling effect of the nozzle 3 more obvious. At the same time, the gas can form bubbles in the water source, breaking the surface tension of the water, making it easier for the water to adhere to the surface of the polishing wheel 101 or the silicon nitride plate, thereby improving the cooling effect of the nozzle 3.

[0040] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes within the technical scope disclosed by the present invention according to the technical scheme and the utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A silicon nitride plate grinding and polishing device, comprising a polishing table, characterized in that: A nozzle (3) is connected to the side wall of the polishing table via a flexible connector, the spray end of the nozzle (3) faces the working end of the polishing table, a working disk (4) is fixedly connected to the polishing table, and a push rod is slidably connected to the working disk (4), and when the push rod moves toward the nozzle (3), the position of the nozzle (3) is changed.

2. The silicon nitride plate grinding and polishing equipment according to claim 1, characterized in that: The working disk (4) is fixedly connected with a switch button (8), the nozzle (3) is fixedly connected with an air intake pipe (302), the air intake pipe (302) is provided with a solenoid valve (801), and the solenoid valve (801) is electrically matched with the switch button (8).

3. The silicon nitride plate grinding and polishing equipment according to claim 2, characterized in that: The push rod comprises a first push rod (401) and a second push rod (402); a cam (6) is rotatably connected inside the working disk (4); the contact ends of the first push rod (401) and the second push rod (402) respectively abut against the outer wall of the cam (6); the first push rod (401) can abut against the outer wall of the nozzle (3); and the second push rod (402) can abut against the outer wall of the switch button (8).

4. The silicon nitride plate grinding and polishing equipment according to claim 1, characterized in that: A return spring is sleeved on the push rod, one end of the return spring is fixedly connected to the end of the push rod, and the other end of the return spring is fixedly connected to the working disk (4).

5. The silicon nitride plate grinding and polishing equipment according to claim 4, characterized in that: The end of the push rod is fixedly connected with a circular push plate, and the return spring is fixedly connected to the circular push plate.

6. The silicon nitride plate grinding and polishing equipment according to claim 3, characterized in that: The polishing table comprises a working plate (1), the bottom of the working plate (1) is rotatably connected to a polishing wheel (101), and the spraying end of the spray head (3) faces the outside of the polishing wheel (101).

7. The silicon nitride plate grinding and polishing equipment according to claim 6, characterized in that: The working plate (1) is fixedly connected to a connecting plate (2), the connecting plate (2) is rotatably connected to a rotating shaft (5), and the rotating shaft (5) is fixedly connected to a cam (6).

8. The silicon nitride plate grinding and polishing equipment according to claim 7, characterized in that: A booster disc (7) is fixedly connected to the connecting plate (2); the rotating shaft (5) extends into the booster disc (7) and is fixedly connected to a turbine blade (701); one side of the booster disc (7) is fixedly connected to a liquid inlet pipe; the other side of the booster disc (7) is connected to the nozzle (3) via a liquid outlet pipe (301).

9. The silicon nitride plate grinding and polishing equipment according to claim 8, characterized in that: The liquid outlet pipe (301) is provided with a one-way valve, and the one-way valve cooperates with the spray head (3).

10. The silicon nitride plate grinding and polishing equipment according to claim 1, characterized in that: The flexible connector is a rubber flexible joint, a bellows or a spring flexible joint.

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