Tunnel type silicon wafer drying equipment

By designing tunnel silicon wafer drying equipment and using transmission lines and hot air systems, the problem of low drying efficiency of existing equipment is solved, and efficient and energy-saving silicon wafer drying effect is achieved.

CN222718571UActive Publication Date: 2025-04-04苏州普伊特自动化系统有限公司
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Patent Information

Application Number
CN202421313982.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-11
Publication Date
2025-04-04
Estimated Expiration
2034-06-11

AI Technical Summary

Technical Problem

The existing silicon wafer drying equipment has low drying efficiency, which leads to heat dissipation, requires repeated heating and waste of energy.

Method used

A tunnel silicon wafer drying equipment is designed, using a transmission line and a hot air system, and the hot air is constantly supplied from top to bottom. During the drying process, the space in the tunnel is closed and the heat loss is low, which can ensure continuous high temperature and uniform air flow.

Benefits of technology

Through this equipment, energy saving, drying efficiency can be improved, and efficient drying of silicon wafers can be ensured.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses tunnel type silicon wafer drying equipment, which comprises a transmission line, and a feeding section, a drying section and a discharging section which are sequentially arranged corresponding to the transmission line, the feeding section is provided with a feeding cover plate located above the conveying line, and the discharging section is provided with a discharging cover plate located above the conveying line. The hot air system comprises an air blower arranged outside the drying section, a heating box communicated to an air outlet of the air blower, an air inlet pipe communicated to an air outlet of the heating box, and air outlet pipes horizontally arranged in the drying section in parallel in the conveying direction and located above the conveying line; the air inlets of the air outlet pipes communicate with the air outlet of the air inlet pipe. In the conveying process of carriers such as flower baskets, hot air is continuously supplied from top to bottom, the operation time can be set according to needs, due to the fact that the space in the tunnel is closed, the influence of opening and closing of the cover plates on the two sides is small, heat loss is low, it can be guaranteed that continuous high temperature and even air flow flow from top to bottom, energy can be saved, and drying efficiency can be improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics, in particular to wet process equipment for photovoltaic cells, and specifically to tunnel-type silicon wafer drying equipment. Background Art

[0002] In the manufacturing process of solar cells, the surface of silicon wafers has been adsorbed with various impurities after being processed through multiple processes such as slicing, grinding, chamfering, and polishing. Before diffusion, it is necessary to clean the surface to eliminate various pollutants and make a velvet structure (velveting) that can reduce the reflection of sunlight on the surface. The degree of cleanliness directly affects the yield and reliability of the solar cell. After cleaning the silicon wafers, efficient drying of the silicon wafers is one of the important processes and is also the key to ensuring the reliability of subsequent processes.

[0003] At present, the traditional drying method mostly uses several independent drying tanks, each of which has an independent heating system. During the mass production process, the cover of each drying tank will be frequently opened and closed to take and place the carrier. This method easily causes heat dissipation and causes the temperature in the tank to drop, requiring repeated heating, wasting energy and low drying efficiency. Utility Model Content

[0004] The utility model discloses a tunnel type silicon wafer drying device, aiming to solve the technical problem of low drying efficiency of the existing silicon wafer drying device in the background technology.

[0005] The utility model provides a tunnel-type silicon wafer drying device, comprising a transmission line, and a loading section, a drying section and a unloading section which are sequentially arranged corresponding to the transmission line;

[0006] The loading section is provided with a loading cover plate located above the transmission line, and the unloading section is provided with a unloading cover plate located above the transmission line;

[0007] It also includes a hot air system, which includes a blower arranged outside the drying section, a heating box connected to the air outlet of the blower, an air inlet pipe connected to the air outlet of the heating box, and air outlet pipes arranged horizontally and side by side along the conveying direction in the drying section and located above the transmission line, and the air inlets of the air outlet pipes are all connected to the air outlets of the air inlet pipes.

[0008] Wherein, a wind screen is arranged between the feeding section and the drying section.

[0009] Wherein, a wind screen is arranged between the drying section and the unloading section.

[0010] Furthermore, a return air hood is provided below the transmission line, and an air outlet of the return air hood is connected to an air inlet of the blower through a return air duct.

[0011] Wherein, two rows of transmission lines are arranged in parallel along the conveying direction.

[0012] As can be seen from the above, the utility model provides a tunnel-type silicon wafer drying equipment, in which the loading cover is opened when feeding, and after the carriers such as flower baskets are placed on the transmission line through the loading section, the loading cover is closed, and then driven by the transmission line, the carrier is slowly driven through the drying section for drying, and then driven to the unloading section. After the carrier is in place, the unloading cover is opened, the carrier is taken out, and the unloading cover is closed. During the transmission process, hot air is continuously supplied from top to bottom, and the operating time can be set as needed. Since the space in the tunnel is closed, it is less affected by the opening and closing of the covers on both sides, and the heat loss is low, which can ensure continuous high temperature, and the airflow flows evenly from top to bottom, which can save energy and improve drying efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 This is a schematic diagram of the main structure of the utility model;

[0014] Figure 2 It is a side structural schematic diagram of the utility model.

[0015] In the figure: 10. transmission line; 21. loading section; 211. loading cover; 22. drying section; 221. air outlet duct; 23. unloading section; 231. unloading cover; 30. return air hood; 40. carrier; 51. blower; 52. heating box; 53. air inlet duct; 54. return air duct. DETAILED DESCRIPTION

[0016] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0017] Embodiment 1:

[0018] Reference Figure 1-2 , a tunnel-type silicon wafer drying device provided in this embodiment 1 includes a transmission line 10, and a loading section 21, a drying section 22 and a unloading section 23 arranged in sequence corresponding to the transmission line 10, a wind shielding curtain is arranged between the loading section 21 and the drying section 22, and a wind shielding curtain is arranged between the drying section 22 and the unloading section 23;

[0019] The loading section 21 is provided with a loading cover plate 211 located above the transmission line 10, and the unloading section 23 is provided with a unloading cover plate 231 located above the transmission line 10;

[0020] The hot air system also includes a blower 51 arranged outside the drying section 22, a heating box 52 connected to the air outlet of the blower 51, an air inlet duct 53 connected to the air outlet of the heating box 52, and an air outlet duct 221 arranged horizontally and parallelly in the drying section 22 along the conveying direction and located above the transmission line 10, and the air inlets of the air outlet ducts 221 are all connected to the air outlets of the air inlet duct 53.

[0021] When the present embodiment 1 is working, the loading cover plate 211 is responsible for opening when feeding, and after the carrier 40 such as the flower basket is placed on the transmission line 10 through the loading section 21, the loading cover plate 211 is closed, and then driven by the transmission line 10, the carrier 40 is slowly driven through the drying section 22 for drying, and then driven to the unloading section 23. After the carrier 40 is in place, the unloading cover plate 231 is opened, the carrier 40 is taken out, and the unloading cover plate 231 is closed. During the transmission process, hot air is continuously supplied from top to bottom by the air outlet pipe 221, and the operation time can be set as needed. Since the space in the tunnel is closed, it is less affected by the opening and closing of the covers on both sides, and the heat loss is low, which can ensure continuous high temperature, and the airflow flows evenly from top to bottom, which can save energy and improve drying efficiency.

[0022] Embodiment 2:

[0023] Based on Example 1, a return air cover 30 is further provided below the transmission line 10 in this Example 2, and the air outlet of the return air cover 30 is connected to the air inlet of the blower 51 through the return air duct 54. Since the return air cover 30 is provided, the hot air after passing through the silicon wafer can be reintroduced into the blower 51 through the return air duct 54, so that the waste heat of the return air can be effectively utilized to reduce the energy consumption of the heating box 52.

[0024] Embodiment 3:

[0025] Based on Embodiment 1 or 2, in Embodiment 3, two rows of transmission lines 10 are arranged in parallel along the conveying direction. By arranging two rows of parallel conveying lines 10, Embodiment 3 can realize the smooth conveying of two rows of carriers 40 at the same time to improve the drying efficiency of silicon wafers.

[0026] The above are only preferred specific implementation methods of the utility model, but the protection scope of the utility model is not limited to this. Any technician familiar with the technical field within the technical scope disclosed by the utility model, who makes equivalent replacements or changes based on the technical scheme and utility model concept of the utility model, should be covered by the protection scope of the utility model.

Claims

1. A tunnel type silicon wafer drying equipment, characterized in that: It comprises a transmission line (10), and a loading section (21), a drying section (22) and a unloading section (23) which are arranged in sequence corresponding to the transmission line (10); The loading section (21) is provided with a loading cover plate (211) located above the transmission line (10), and the unloading section (23) is provided with a unloading cover plate (231) located above the transmission line (10); The invention also comprises a hot air system, wherein the hot air system comprises a blower (51) arranged outside the drying section (22), a heating box (52) connected to the air outlet of the blower (51), an air inlet pipe (53) connected to the air outlet of the heating box (52), and an air outlet pipe (221) arranged horizontally and in parallel along the conveying direction in the drying section (22) and located above the transmission line (10), wherein the air inlets of the air outlet pipes (221) are connected to the air outlets of the air inlet pipes (53).

2. The tunnel type silicon wafer drying equipment according to claim 1, characterized in that: A wind screen is provided between the feeding section (21) and the drying section (22).

3. The tunnel type silicon wafer drying equipment according to claim 1, characterized in that: A wind screen is provided between the drying section (22) and the unloading section (23).

4. The tunnel type silicon wafer drying equipment according to claim 1, characterized in that: An air return hood (30) is also provided below the transmission line (10), and an air outlet of the air return hood (30) is connected to an air inlet of the blower (51) via an air return pipe (54).

5. The tunnel type silicon wafer drying equipment according to claim 4, characterized in that: Two rows of transmission lines (10) are arranged side by side along the conveying direction.

Citation Information

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