A clean drying system for crystalline silicon powder

By adopting continuous vacuum microwave irradiation technology in the powder drying system, the problems of uneven heating, pollution and high energy consumption during powder drying are solved, and efficient, uniform and automated powder drying effects are achieved.

CN222733291UActive Publication Date: 2025-04-08SICHUAN YUANCHI THERMAL TECH CO LTD
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Patent Information

Application Number
CN202420604463.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-03-27
Publication Date
2025-04-08
Estimated Expiration
2034-03-27

AI Technical Summary

Technical Problem

The prior art has problems of uneven heating, powder pollution, high energy consumption and low automation during powder drying, especially when dealing with high purity and special powders.

Method used

A clean drying system with continuous vacuum microwave irradiation is adopted to reduce the boiling point of water by vacuum, and the crystalline silicon powder in the resonant cavity is heated by microwaves to quickly evaporate the water. The water vapor is driven out of the chamber by air extraction, achieving uniform drying of the powder.

Benefits of technology

It improves the uniformity and purity of powder drying, reduces impurity content and energy consumption, shortens drying time, and has a high degree of process automation, which is suitable for large-scale industrial production.

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Abstract

The utility model relates to the technical field of clean drying of powders, and specifically to a clean drying system for crystalline silicon powder, including: a main frame as a load-bearing component; a transmission mechanism, which cooperates with the main frame and is used to place and transport a basket; a resonator, which is used to provide a cavity environment for drying the powder; a vacuum system, which is used to evacuate the resonator; a microwave component, which is used to generate and emit microwaves and is arranged inside the resonator; an air intake system, which is used to break the air and form an airflow to take away evaporated moisture. The vacuum state in the resonant cavity is used to reduce the boiling point of water, and can have a positive effect on the escape of steam in the gaps of the powder; the transmission mechanism is used for automatic transportation to realize continuous semi-automatic operations of placing materials, multiple drying, and taking materials, thereby improving product quality, production efficiency, safety, standardization and automation, and reducing the demand for production space, manpower loss and material waste.
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Description

Technical Field

[0001] The utility model relates to the technical field of clean drying of powders, in particular to a clean drying system for crystalline silicon powder. Background Art

[0002] The drying process of powders in industry is to vaporize the water quickly, which usually requires heating the powders. Traditional heating and drying methods include contact heat exchange heating and hot air heating. In contact heat exchange heating, there is direct contact between the heating body and the powder, which leads to contamination of high-purity powders, and there may be uneven heating. The temperature in the contact area is too high and even causes the powder to be inactivated. The heating temperature in the far end area is insufficient, resulting in the final moisture content of the powder not meeting the standard. To solve the problem of uneven heating, the method of stirring the powder is usually adopted, but this method is limited by the properties of the powder, the powder container, the process, etc., and there is a risk that the agitator will destroy the physical form of the powder or contaminate the powder. In some processes, hot air heating is also used to heat the powder. Although it avoids the risk of contamination of the powder due to contact between the heat exchange body and the powder, it requires extremely high cleanliness of the hot air. Otherwise, the powder is more susceptible to contamination due to its large specific surface area. When hot air is used to dry powder in a fixed bed, the inside of the powder cannot be fully heated, and the same problems as heat exchange contact heating still exist. In addition, the energy utilization rate in the process is low, and a large proportion of heat flows to the air or equipment.

[0003] There is a technology that solves the above problems by using microwave heating to evenly heat the inside and outside of the powder. However, this method has obvious disadvantages:

[0004] Since the gas inside the powder does not circulate, the water vapor between the gaps of the powder cannot escape from the inside of the powder in time, and the drying speed is low; the single drying efficiency is low, and the process needs to be repeated; the gas environment is complex and special powders cannot be processed; it can be seen that there is still room for improvement in the technology of efficient, fast and clean drying of powders. It should be optimized and improved to expand the scope of application of powder drying treatment, further improve the drying process of special powders, and reduce the impurity content. Therefore, it is necessary to propose a more reasonable technical solution to solve the technical problems existing in the existing technology. Utility Model Content

[0005] In order to overcome at least one of the defects mentioned above, the utility model proposes a clean drying system for crystalline silicon powder, which realizes efficient and clean drying of crystalline silicon powder through continuous vacuum microwave irradiation, efficiently dehydrates the crystalline silicon powder, ensures the purity of the crystalline silicon powder, reduces manpower loss, and improves the degree of automation of drying and dehydration of crystalline silicon powder.

[0006] In order to achieve the above-mentioned purpose, the clean drying system of crystalline silicon powder disclosed in the utility model can adopt the following technical solutions:

[0007] The main frame is a load-bearing component, and both ends of the main frame are equipped with material platforms.

[0008] The transmission mechanism cooperates with the main frame and is used to place and transport the material basket. The material basket moves from the front end to the rear end of the main frame following the transmission mechanism, aligns and enters the resonator for drying;

[0009] Resonators, which are in multiple numbers and connected to the main frame, are used to provide a cavity environment for drying the powder;

[0010] A vacuum system for evacuating the resonator;

[0011] A microwave component, used for generating and emitting microwaves, is arranged in cooperation with the resonator;

[0012] The air intake system is connected to a plurality of resonators to break through the air and form airflow to carry away evaporated water.

[0013] The above disclosed crystalline silicon powder drying system reduces the boiling point of water by vacuuming, and uses microwaves to heat the crystalline silicon powder in the resonance cavity to evaporate a large amount of water. Since the pressure in the resonance cavity is low and the pressure inside the powder is high, the water vapor in the gaps inside the powder will diffuse to the outside of the powder. At this time, the air is broken and the air is pumped to replace the water vapor in the resonance cavity. This process is repeated multiple times in multiple resonance bodies to evenly dry the powder. This greatly improves the uniformity of the drying of the crystalline silicon powder, and also reduces the pollution of the external gas environment to the crystalline silicon powder. The energy utilization rate is high, the drying time is short, and low-temperature drying will not cause damage to the crystalline silicon powder, thereby improving production efficiency and quality.

[0014] A plurality of resonators are provided, and a vacuum microwave drying operation is performed in each resonator, thereby ensuring that the water vapor inside the crystalline silicon powder is extracted multiple times to reach the final moisture content requirement.

[0015] Furthermore, in the present invention, the resonant body can be constructed in a variety of forms, which are not limited to a single one. An optimization is performed here and one feasible option is proposed: there are a number of resonant bodies and each is provided with a chamber, each chamber is provided with a separate air inlet and exhaust port, each chamber is connected to a microwave component at multiple positions to achieve multi-angle resonant drying, and in some schemes, the microwave component can be set at different positions in each chamber.

[0016] Preferably, a plurality of microwave components are arranged in the cavity of the resonator, a sealing member is arranged at the lower opening of the cavity, and the cavity is respectively connected with the vacuum system and the air intake system.

[0017] Furthermore, in the present invention, the setting of the resonant body can adopt a variety of schemes, which are not limited to the only one. Here, an optimization is made and one of the feasible options is proposed: the resonant body is located on the upper part of the main frame, and when the lifting mechanism lifts the basket, it is aligned and enters the chamber through the basket receiving mechanism. When such a scheme is adopted, the resonant bodies are arranged evenly spaced in a straight line, and when the moving mechanism moves to a position, it drives the basket to the bottom of the next resonant body, reducing the repeated adjustment and alignment operations, and can perform the secondary drying process more efficiently.

[0018] Furthermore, in order to maximize the irradiation area of ​​crystalline silicon powder, a new form of microwave assembly is optimized and proposed: the microwave assembly includes a magnetron, a waveguide and an end waveguide connected in sequence, the waveguide is connected to the chamber through a sealed wave-transmitting flange, and the end waveguide is located inside the chamber. When such a scheme is adopted, multiple microwave assemblies are evenly installed on the same surface of the same resonant chamber, and the end waveguide of the microwave assembly is a pyramid waveguide, and the irradiation surface of each pyramid waveguide on the powder surface is evenly distributed and slightly crossed.

[0019] Furthermore, in some other solutions, microwave components may be arranged at different positions in the chamber, with the aim of achieving microwave resonance drying from multiple angles, thereby improving the drying effect.

[0020] Furthermore, the material basket in the utility model is transported by a transmission mechanism, and the structure of the material basket receiving mechanism is not limited to a single one. Here, an optimization is performed and a feasible option is proposed: the material basket receiving mechanism includes two limit plates arranged opposite to the material basket, and the limit plates clamp and limit from both sides of the material basket's travel direction so that the material basket is aligned with the chamber. When such a scheme is adopted, the material basket is guided by the limit plates to align the chamber in a direction perpendicular to the travel path, so as to facilitate smooth entry into the chamber during the table lifting process. In some schemes, the material basket receiving mechanism is fixed inside the main frame and includes a translation slide rod driven by a cylinder, and the limit plates are connected to the translation slide rod, and the limit plates and the translation slide rod are driven by the cylinder to telescopic movement to complete the receiving, clamping and releasing of the material basket.

[0021] Preferably, the transmission mechanism includes a table top, on which are provided a material rack for receiving a material basket and a sealing module for cooperating with a resonant body; a motion mechanism is provided on the table top for driving the sealing module and the material rack to move and transport the material basket; a lifting mechanism is connected to the lower part of the table top, and the lifting mechanism lifts the sealing module and the sealing member to combine to form a sealed cavity, and a material basket receiving mechanism is arranged in the system.

[0022] Preferably, the material rack and the material basket are slidably positioned via a limiting groove, and the limiting groove is perpendicular to the travel direction of the motion mechanism.

[0023] Furthermore, in some solutions, the direction of movement of the basket can be adjusted in more ways, which are optimized and explained here: the movement mechanism is arranged on the transmission mechanism table, and the transmission mechanism table is provided with a linear rail, and the bottom of the sealing module is slidably matched with the linear rail through a platform provided with a slider, and the driving mechanism provided on the corresponding platform drives the platform to slide left and right on the table to translate and transport the basket. When such a solution is adopted, the left and right position of the basket can also be adjusted to align the chamber.

[0024] Furthermore, in order to better connect the sealing module to the material basket, an optimization is performed here and a material rack structure is proposed: the material rack includes a plurality of support plates combined to form a tic-tac-toe support structure, and the outer sides of the support plates are chamfered. When the material rack rises with the table top to receive the material basket, the chamfered surface of the support plate contacts the outer extension of the bottom frame of the material basket to make the material basket slide, thereby completing the self-centering positioning of the material basket.

[0025] Furthermore, in the utility model, the sealing of the resonant body is achieved by lifting the sealing module through a lifting mechanism, and the structure of the lifting mechanism is not limited solely. Here, an optimization is performed and a feasible option is proposed: the lifting mechanism adopts a scissor-type lifting mechanism, one side of the scissor-type lifting mechanism is fixed on the transmission mechanism base, and the other side cooperates with the table top and the transmission mechanism base through a driving slider. The lifting drive device drives the slider to move left and right to complete the lifting and lowering action of the table top.

[0026] Furthermore, in order to avoid the contamination of the crystalline silicon powder by the entry of the complex external gas environment, an optimization is made here and a feasible option is proposed: the air intake system includes an air intake pipeline, a filter and an air intake valve, the air intake valve is connected to the resonator through the air intake pipeline, and the filter is connected to the air intake end of the air intake pipeline. When such a solution is adopted, the filter adopts a high-efficiency air filter that can be quickly disassembled and replaced to filter the gas entering the air intake pipeline, and the main body of the air intake pipeline is made of PP pipe to avoid contamination caused by metal ions on the pipe wall.

[0027] Furthermore, in order to better extract water vapor from the resonator, the structure of the resonator chamber is optimized and one feasible option is proposed: the vacuum outlet and air inlet of the chamber are placed diagonally.

[0028] Furthermore, in some feasible solutions, the material rack is perforated over a large area to enhance the air flow under the material basket, and this type of measure does not affect the quality factor of the microwave.

[0029] Furthermore, in the utility model, multiple sealing modules are placed on the same table, and the sealing modules are squeezed into contact with the sealing member to form a sealing structure. Due to manufacturing process errors, the top surfaces of the sealing modules and the sealing members are not uniform in height. In order to achieve good sealing effects on each contact surface, an optimization is performed here and a feasible option is proposed: a guide column that cooperates with the motion mechanism for positioning is provided at the bottom of the sealing module, and a spring is provided at the bottom of the sealing module. When each sealing module is lifted, the spring at the bottom is compressed and positioned by the guide column, so that each sealing module and the sealing member can be well sealed.

[0030] The above content discloses a clean drying system for crystalline silicon powder. The utility model also discloses a drying method for crystalline silicon powder, which is described below:

[0031] A method for drying crystalline silicon powder, comprising:

[0032] Material collection: Place the basket carrying the crystalline silicon powder on the material table. The table top is at the initial low position. The lifting mechanism raises the table top to receive the basket. At the same time, the moving mechanism moves forward one position to transport the basket to the bottom of the resonator.

[0033] Discharging: The transmission mechanism continues to lift, and the basket receiving mechanism guides and aligns the basket into the cavity, and the sealing module and the sealing element are aligned and combined;

[0034] Vacuuming: The vacuum pump keeps working, the vacuum valve is opened, the air inlet valve is closed, the chamber reaches the set vacuum degree and the vacuum valve is closed;

[0035] Drying: Turn on the microwave assembly, microwaves are irradiated to the powder through the magnetron through the pyramid waveguide, and the microwave assembly is turned off when the irradiation time reaches the set value; open the vacuum valve and the air inlet valve to break the air and extract the water vapor in the chamber;

[0036] Reset: The tabletop descends and the basket exits the chamber. At the same time, the motion mechanism moves forward one position, and the tabletop continues to descend to the initial position. During this process, the basket at the end of the tabletop is placed on the material table at the discharge end.

[0037] Cycle: Repeat the above-mentioned actions of taking in materials, discharging materials, vacuuming, drying and resetting.

[0038] Compared with the prior art, some beneficial effects of the technical solution disclosed in the utility model include:

[0039] In the utility model, multiple vacuum microwave drying breaks the air to allow the water vapor inside the crystalline silicon powder to escape quickly, so that the powder is heated evenly, without stirring and tumbling, etc., and various pollution sources are avoided from directly contacting the powder; the vacuum form is used to reduce the boiling point of water, and there is no need to heat the powder to a higher temperature, and the energy flow is single, and the energy utilization rate is high; the drying time is short, the discharge rhythm can be controlled, and it is more suitable for large-scale industrial production; the external gas environment is isolated, and the necessary inlet air flow is filtered to ensure the purity of the crystalline silicon powder; an automated mechanism is used to perform transmission work inside the equipment, which improves the degree of automation. The above measures realize the high-purity and low-water content automated drying of crystalline silicon powder, which can not only improve production quality and efficiency, improve the standardization and automation of production, but also reduce the demand for the production environment, reduce labor intensity and improve safety. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.

[0041] Figure 1 This is a schematic diagram of the front view structure of the vacuum microwave powder drying system.

[0042] Figure 2 This is an enlarged schematic diagram of the structure of the material loading part of the drying furnace body. In this state, the material basket is placed on the material loading table ready for transportation and drying.

[0043] Figure 3 This is a schematic diagram of the contact and cooperation between the material rack and the material basket. In this state, the material rack and the transmission mechanism rise together to receive the material basket.

[0044] Figure 4 This is a schematic diagram of the sealing module being lifted and combined with the sealing member to form a sealed chamber. In this state, the No. 1 material basket is transported to the interior of the No. 1 vacuum microwave cavity for drying.

[0045] Figure 5 Schematic diagram of the structure of the microwave component.

[0046] In the above drawings, the meanings of the various marks are as follows:

[0047] 1. Vacuum system; 101. Vacuum pipeline; 102. Vacuum valve; 103. Vacuum pump; 2. Microwave component; 201. Magnetron; 202. Waveguide; 203. End waveguide; 204. Sealed wave-transmitting flange; 3. Resonator; 301. Seal; 302. Chamber; 4. Air intake system; 401. Air intake pipeline; 402. Filter; 403. Air intake valve; 5. Material basket; 6. Main frame; 601. Material placement table; 7. Transmission mechanism; 701. Movement mechanism; 702. Lifting mechanism; 703. Table; 704. Sealing module; 705. Material rack; 706. Material basket receiving structure. DETAILED DESCRIPTION

[0048] The present invention will be further explained below in conjunction with the accompanying drawings and specific embodiments.

[0049] In view of the many problems existing in the prior art, such as uneven drying, low drying efficiency, and low purity of crystalline silicon powder, the following embodiments optimize the crystalline silicon powder drying process to solve the problems existing in the prior art.

[0050] Example 1

[0051] like Figure 1~Figure 5 As shown, this embodiment provides a clean drying system for crystalline silicon powder, one of the structures of which includes:

[0052] The main frame 6 serves as a load-bearing component, and material platforms 601 are provided at both ends of the main frame 6 .

[0053] Preferably, in this embodiment, the main frame 6 is a metal frame, and the material table 601 is a slotted structure, that is, a slot is formed at the material table 601 for the table top 703 to pass from bottom to top, and when the table top 703 rises, it lifts and supports the material basket 5 from the slot.

[0054] The clean drying system for crystalline silicon powder provided in this embodiment includes the following structure:

[0055] The transmission mechanism 7 cooperates with the main frame 6 and is used to place and transport the material basket 5. The material basket 5 moves from the front end to the rear end of the main frame 6 following the transmission mechanism, aligns and enters the resonator 3 for drying.

[0056] In this embodiment, the transportation of the material basket 5 is achieved through the transmission mechanism 7. The structure of the transmission mechanism 7 is not limited to a single one. This embodiment is optimized and adopts one of the feasible options: the transmission mechanism includes a motion mechanism 701, the motion mechanism 701 is connected to the sealing module 704 and is arranged on the lifting platform 703, the material rack 705 is arranged on the sealing module 704, the lifting mechanism 702 is arranged at the lower part of the lifting platform 703, and the material basket receiving structure 706 is arranged in the middle of the main frame 6.

[0057] Preferably, the material rack 705 is made of PP or polytetrafluoroethylene.

[0058] Preferably, the material rack 705 and the material basket 5 are slidably positioned with each other via a limiting groove, and the limiting groove is perpendicular to the moving direction of the motion mechanism 701 .

[0059] In some embodiments, the direction of travel of the basket can be adjusted in a variety of ways, which are optimized and explained here: the motion mechanism is arranged on the transmission mechanism table, and a linear rail is arranged on the transmission mechanism table. The bottom of the sealing module is slidably matched with the linear rail through a platform with a slider, and the driving mechanism arranged on the corresponding platform drives the platform to slide left and right on the table to translate the basket. When such a solution is adopted, the left and right position of the basket can be adjusted to align the chamber. The driving mechanism can use a lead screw, and the motor drives the lead screw to rotate to drive the sealing module 704 to translate to realize the translation movement of the basket.

[0060] Preferably, the lifting mechanism 702 in this embodiment adopts scissor-type lifting. One side of the scissor-type lifting mechanism is fixed on the transmission mechanism base, and the other side slides with the table top and the transmission mechanism base through a slider. The driving device drives the scissor-type lifting mechanism to slide left and right to complete the lifting and lowering of the table top.

[0061] Preferably, in order to improve the matching precision between the sealing module and the sealing member and ensure the sealing effect, optimization is performed here and one of the feasible options is adopted: the sealing module is installed on the slider and positioned using a guide column, and an elastic medium is supported between the sealing module and the slider so that there is a certain moving space between the sealing module and the slider in the vertical direction.

[0062] Not limited to this embodiment, in some implementation schemes, the transmission mechanism 7 includes a table top 703, on which are provided a material rack 705 for receiving a material basket 5 and a sealing module 704 for cooperating with the resonator 3; a motion mechanism 701 is provided on the table top 703 to drive the sealing module 704 and the material rack 705 to move and transport the material basket 5; a lifting mechanism 702 is connected to the lower part of the table top 703, and the lifting mechanism 702 lifts the sealing module 704 and the sealing member 301 to form a sealed cavity, and a material basket receiving mechanism 706 is arranged in the system.

[0063] The clean drying system for crystalline silicon powder provided in this embodiment includes the following structure:

[0064] The resonators 3 are provided in a plurality and connected to the main frame 6 to provide a cavity environment for drying the powder.

[0065] In this embodiment, a basic dry environment for crystalline silicon powder is established through a resonant body 3. The structure of the resonant body 3 is not limited to a single one. This embodiment is optimized and one of the feasible options is adopted: the resonant body 3 includes a chamber 302, and a plurality of chambers 302 are arranged in series to form the resonant body 3. The chamber 302 is provided with a seal 301. The chamber 302 is also connected to a microwave component 2. The vacuum system 1 and the air intake system 4 are respectively connected to the resonant body 3.

[0066] Not limited to this embodiment, in some implementation schemes, the resonator 3 includes a chamber 302, a plurality of microwave components 2 are arranged in the chamber 302, a seal 301 is arranged at the lower opening of the chamber 302, and the chamber 302 is connected to the vacuum system 1 and the air intake system 4 respectively.

[0067] Preferably, in this embodiment, the resonator 3 includes 7 chambers 302, and the microwave components 2 are respectively located on the top surface and multiple side surfaces of the chamber 302. When this solution is adopted, all surfaces of the basket 5 are irradiated, and the internal and external surfaces of the crystalline silicon powder are heated evenly, thereby improving the heating and drying quality of the powder.

[0068] Preferably, all surfaces inside the chamber 302 are sprayed with fluorocarbon paint. When this solution is adopted, the chamber 302 can process powders under more process environments.

[0069] Preferably, in order to achieve a good sealing effect, a high sealing bonding degree is required. In this embodiment, the material of the sealing member 301 is optimized and one of the feasible options is adopted: the sealing member 301 is made of rubber material.

[0070] More preferably, in order to reduce the level of microwave radiation leakage, the present embodiment optimizes the structure of the seal 301 and adopts one of the feasible options: a choke groove is provided on the outer side of the seal 301 .

[0071] The fourth structure of the clean drying system for crystalline silicon powder provided in this embodiment includes:

[0072] The vacuum system 1 is used to evacuate the resonator 3. The vacuum system 1 is connected to the resonator 3, a vacuum valve 102 is provided between the resonator 3 and the vacuum pipeline 101 near the resonator 3, and a vacuum pump 103 is connected to the end of the vacuum system 1.

[0073] Preferably, in actual use, each component of the vacuum system 1 is sprayed with a coating to withstand water vapor and chemicals that may be contained therein.

[0074] The clean drying system for crystalline silicon powder provided in this embodiment includes the following structure:

[0075] The microwave component 2 is used to generate and emit microwaves and is arranged inside the resonator 3 .

[0076] In this embodiment, the heating and drying of the crystalline silicon powder is completed by the microwave component 2. The structure of the microwave component 2 is not limited to a single one. This embodiment is optimized and adopts one of the feasible options: the microwave component 2 includes a magnetron 201, the magnetron 201 is connected to a waveguide tube 202, the waveguide tube 202 is arranged on a sealed wave-transmitting flange 204, the microwave component 2 is connected to the chamber 302 through the sealed wave-transmitting flange 204, and the end waveguide 203 is arranged inside the chamber 302.

[0077] Preferably, in order to make the microwave have a better irradiation effect and transmission quality, it is necessary to improve the quality factor of the end waveguide. This embodiment is optimized and adopts one of the feasible options: the end waveguide adopts a pyramidal form. At this time, multiple microwave components 2 are evenly arranged on the same surface of the same chamber 302, and the microwaves generated and emitted by each microwave component 2 are evenly irradiated on the surface of the crystalline silicon powder with a small amount of cross-radiation surface.

[0078] The clean drying system for crystalline silicon powder provided in this embodiment includes the following structure:

[0079] The air intake system 4 includes an air intake pipeline 401 , a filter 402 and an air intake valve 403 . The air intake valve 403 is connected to the resonator 3 through the air intake pipeline 401 , and the filter 402 is connected to the air intake end of the air intake pipeline 401 .

[0080] Preferably, in order to ensure the purity of the crystalline silicon powder, the air inlet pipe 401 is made of PP material.

[0081] Example 2

[0082] This embodiment provides a method for drying crystalline silicon powder, comprising:

[0083] S01. Material collection: Place the material basket carrying the crystalline silicon powder on the material table, with the table top at an initial low position. The lifting mechanism raises the table top to receive the material basket and move the material basket forward. At the same time, the motion mechanism moves forward one position to transport the material basket to the bottom of the resonator.

[0084] S02. Unloading: The transmission mechanism continues to lift, and the basket receiving mechanism guides and aligns the basket into the cavity, and the sealing module is aligned and combined with the sealing element;

[0085] S03. Vacuuming: The vacuum pump keeps working, the vacuum valve is opened, the air inlet valve is closed, the chamber reaches the set vacuum degree and the vacuum valve is closed;

[0086] S04. Drying: Turn on the microwave assembly, microwaves are irradiated to the powder by the magnetron through the pyramid waveguide, and the microwave assembly is turned off when the irradiation time reaches the set value; open the vacuum valve and the air inlet valve to break the air and extract the water vapor in the chamber;

[0087] S05. Reset: The table is lowered and the basket is removed from the chamber. At the same time, the motion mechanism moves forward one position, and the table continues to descend to the initial position. During this process, the basket at the end of the table is placed on the material table at the discharge end;

[0088] S06. Cycle: Repeat the above-mentioned actions of taking in materials, discharging materials, vacuuming, drying and resetting.

[0089] The above are the implementation methods listed in this embodiment, but this embodiment is not limited to the above optional implementation methods. Those skilled in the art can arbitrarily combine the above methods to obtain other various implementation methods. Anyone can derive other various implementation methods under the inspiration of this embodiment. The above specific implementation methods should not be understood as limiting the protection scope of this embodiment. The protection scope of this embodiment should be based on the definition in the claims.

Claims

1. A clean drying system for crystalline silicon powder, characterized in that: include: The main frame (6) serves as a load-bearing component, and material platforms (601) are provided at both ends of the main frame (6); The transmission mechanism (7) cooperates with the main frame (6) and is used to place and transport the material basket (5). The material basket (5) moves from the front end to the rear end of the main frame (6) following the transmission mechanism, aligns and enters the resonator (3) for drying. A plurality of resonators (3) connected to the main frame (6) to provide a cavity environment for drying the powder; A vacuum system (1) for evacuating the resonator (3); A microwave component (2) is used to generate and emit microwaves and is arranged in cooperation with the resonator (3); The air intake system (4) is connected to the plurality of resonators (3) respectively to break through the air and form airflow to carry away evaporated water.

2. The clean drying system for crystalline silicon powder according to claim 1, characterized in that: The vacuum system (1) comprises a vacuum pump (103), the vacuum pump (103) is connected to the resonator (3) via a vacuum pipeline (101), and a vacuum valve (102) is provided on the vacuum pipeline (101).

3. The clean drying system for crystalline silicon powder according to claim 1, characterized in that: The resonator (3) comprises a chamber (302), a plurality of microwave components (2) are arranged in the chamber (302), a sealing member (301) is arranged at the lower opening of the chamber (302), and the chamber (302) is respectively connected to the vacuum system (1) and the air intake system (4).

4. The clean drying system for crystalline silicon powder according to claim 3, characterized in that: The transmission mechanism (7) comprises a table top (703), on which a material rack (705) for receiving a material basket (5) and a sealing module (704) for cooperating with a resonator (3) are arranged; a movement mechanism (701) is arranged on the table top (703) for driving the sealing module (704) and the material rack (705) to move and transport the material basket (5); a lifting mechanism (702) is connected to the lower part of the table top (703), and the lifting mechanism (702) lifts the sealing module (704) and the sealing member (301) to form a sealed cavity, and a material basket receiving mechanism (706) is arranged in the system.

5. The clean drying system for crystalline silicon powder according to claim 4, characterized in that: The resonator (3) is located on the upper part of the main frame (6), and when the lifting mechanism (702) lifts the basket (5), it is aligned through the basket receiving mechanism (706) and enters the chamber (302).

6. The clean drying system for crystalline silicon powder according to claim 5, characterized in that: The material basket receiving mechanism (706) comprises two limit plates arranged opposite to the material basket (5), and the limit plates clamp and limit the material basket (5) from both sides of the moving direction so that the material basket (5) is aligned with the chamber (302).

7. The clean drying system for crystalline silicon powder according to claim 4, characterized in that: The material rack (705) and the material basket (5) are slidably matched and positioned via a limiting groove, and the limiting groove is perpendicular to the moving direction of the motion mechanism (701).

8. The clean drying system for crystalline silicon powder according to claim 1, characterized in that: The air intake system (4) comprises an air intake pipeline (401), a filter (402) and an air intake valve (403); the air intake valve (403) is connected to the resonator (3) via the air intake pipeline (401); and the filter (402) is connected to the air intake end of the air intake pipeline (401).

9. The clean drying system for crystalline silicon powder according to claim 1, characterized in that: The microwave assembly (2) comprises a magnetron (201), a waveguide tube (202) and an end waveguide (203) which are connected in sequence. The waveguide tube (202) is connected to the chamber (302) via a sealed wave-transmitting flange (204), and the end waveguide is located inside the chamber (302).

Citation Information

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