Special gas supply device and ion implantation equipment

Abstract

The utility model belongs to the field of semiconductor technology, and discloses a special gas supply device and ion implantation equipment. The special gas supply device includes a gas supply pipeline and a gas supply mechanism. The gas supply mechanism includes: a fixed bracket, a gas cylinder, a gas transmission pipeline and a control component. The gas cylinder is arranged on the fixed bracket for storing special gases; one end of the gas transmission pipeline is connected to the exhaust port of the gas cylinder, and the other end of the gas transmission pipeline is detachably connected to the gas supply pipeline; the control component is arranged on the gas transmission pipeline to detect and control the special gas flowing in the gas transmission pipeline. In this way, when the special gas supply device is in use, when it is necessary to replace different types of special gases for gas supply, it is only necessary to select the gas transmission pipeline corresponding to the gas supply mechanism to form a connection with the gas supply pipeline, and it is no longer necessary to disassemble and install other structures, so that the entire disassembly and installation process is simplified, the difficulty of disassembly and installation is effectively reduced, and the convenience of disassembly and installation is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a special gas supply device and ion implantation equipment. Background Art

[0002] In the semiconductor manufacturing process, the ion implantation process is a very important link. By introducing different types of ions according to production requirements, the electrical properties of semiconductor wafers can be changed. Ions are produced by ionizing specific process gases (referred to as special gases).

[0003] In the prior art, ion implantation equipment is equipped with a separate gas source cabinet, which is equipped with a gas cylinder for storing special gases and a gas supply pipeline connected to the gas cylinder. The end of the gas supply pipeline away from the gas cylinder is connected to the ion source arc chamber to input the special gas into the ion source arc chamber.

[0004] However, different types of special gases have different storage conditions due to their different properties. For example, hydrogen and helium need to be stored in positive pressure gas cylinders, while borane, phosphine and arsine need to be stored in negative pressure gas cylinders. When different gas cylinders are supplied, different control structures need to be configured on the gas supply pipeline, resulting in the need to dismantle and install multiple structures when replacing different types of special gases, making the entire disassembly and installation process cumbersome and difficult. Utility Model Content

[0005] The purpose of the utility model is to provide a special gas supply device and ion implantation equipment, which solves the problem in the prior art that when replacing different types of special gases, multiple structures need to be disassembled and installed, resulting in cumbersome orientation and installation processes and great difficulty.

[0006] To achieve this purpose, the utility model adopts the following technical solutions:

[0007] In a first aspect, a special gas supply device comprises:

[0008] A gas supply pipeline is connected with the ion source arc chamber;

[0009] An air supply mechanism, the air supply mechanism comprising:

[0010] Fixed bracket;

[0011] A gas cylinder, arranged on the fixed support for storing special gas;

[0012] A gas delivery pipeline, one end of which is connected to the exhaust port of the gas cylinder, and the other end of which is detachably connected to the gas supply pipeline; and

[0013] A regulating component is arranged in the gas pipeline to detect and control the special gas flowing in the gas pipeline.

[0014] Optionally, the gas cylinder is a positive pressure gas cylinder, and the regulating component includes:

[0015] A pressure regulating valve is arranged near the exhaust port of the positive pressure gas cylinder;

[0016] A first detection member, disposed at the air inlet end of the pressure regulating valve, for detecting a first air pressure of the special gas entering the pressure regulating valve; and

[0017] The second detection component is arranged at the exhaust end of the pressure regulating valve to detect the second gas pressure of the special gas after the pressure is regulated by the pressure regulating valve.

[0018] Optionally, the gas cylinder is a negative pressure gas cylinder, and the regulating component includes:

[0019] The third detection component is used to detect the third air pressure in the air pipeline.

[0020] Optionally, the control component further includes:

[0021] a control valve group, arranged on the gas pipeline to control the connection and disconnection of the gas pipeline; and

[0022] A mass flow controller is arranged in the gas pipeline to control the flow and quality in the gas pipeline.

[0023] Optionally, the control valve group includes:

[0024] A first control valve is disposed near the exhaust port of the gas cylinder; and

[0025] A plurality of second control valves are distributed at intervals in the gas delivery pipeline and are all located on a side of the first control valve away from the gas cylinder.

[0026] Optionally, the special gas supply device further includes:

[0027] A purge branch, one end of which is connected to the gas pipeline, and the other end of which is connected to the purge equipment.

[0028] Optionally, the gas delivery pipeline has a purge interface, which is located on a side of the first control valve away from the gas cylinder and close to the first control valve, and the purge interface is connected to the purge branch.

[0029] Optionally, the control component further includes:

[0030] A filter is arranged on the gas transmission pipeline.

[0031] Optionally, the air supply pipeline has a plurality of connecting branches, and each of the connecting branches is connected to a corresponding air supply mechanism.

[0032] In a second aspect, an ion implantation device is characterized by comprising:

[0033] The special gas supply device as described in the first aspect; and

[0034] The ion source arc chamber is connected to the special gas supply device to ionize the special gas input by the special gas supply device to generate ions.

[0035] Beneficial effects of the utility model:

[0036] On the one hand, by setting a fixed bracket, the gas cylinder, gas pipeline and control component are integrated into a complete module. When gas supply is needed, it is only necessary to connect the gas pipeline with the gas supply pipeline. When different types of special gases need to be replaced, it is only necessary to separate the gas pipeline from the gas supply pipeline, and the entire gas supply mechanism can be disconnected from the gas supply pipeline, and then the gas pipeline of the gas supply mechanism storing the corresponding special gas can be connected to the gas supply pipeline. In this way, when the gas supply mechanism is in use, when different types of special gases need to be replaced for gas supply, it is only necessary to select the corresponding gas pipeline to be connected with the gas supply pipeline, and there is no need to disassemble and install other structures, so that the entire disassembly and installation process is simplified, effectively reducing the difficulty of disassembly and installation, and improving the convenience of disassembly and installation.

[0037] Secondly, when the ion implantation equipment is in use, a specific number of gas supply mechanisms can be set according to the operating requirements. Moreover, when replacing the gas supply mechanism, since each gas supply mechanism is a complete module with various control functions, it is only necessary to dismantle and install the pipelines for the special gas circulation during installation and disassembly, and there is no need to dismantle and install other structures, which effectively simplifies the disassembly and installation process and improves operational efficiency, thereby effectively ensuring the rapid operation of the ion implantation equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] Figure 1 It is a structural schematic diagram of a special gas supply device in an embodiment of the utility model when a negative pressure gas cylinder is provided;

[0039] Figure 2 It is a structural schematic diagram of a positive pressure gas cylinder provided in a special gas supply device of an embodiment of the utility model;

[0040] Figure 3 It is a structural schematic diagram of a special gas supply device according to an embodiment of the utility model.

[0041] In the figure:

[0042] 1. Fixed bracket; 2. Gas transmission pipeline; 3. Control component; 31. Pressure regulating valve; 32. First detection component; 33. Second detection component; 34. Third detection component; 35. Filter; 36. Mass flow controller; 37. First control valve; 38. Second control valve; 4. Positive pressure gas cylinder; 5. Negative pressure gas cylinder; 6. Purge branch; 7. Purge pipeline; 8. Gas supply pipeline; 9. Connecting branch. DETAILED DESCRIPTION

[0043] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0044] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0045] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0046] In the description of this embodiment, the terms "upper", "lower", "left", "right" and other directions or positional relationships are based on the directions or positional relationships shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0047] The embodiments of the present application disclose a special gas supply device and ion implantation equipment.

[0048] Reference Figures 1 to 3 The special gas supply device includes a gas supply pipeline 8 and a gas supply mechanism. The gas supply mechanism includes a fixed bracket 1, a gas cylinder, a gas pipeline 2 and a control component 3. The gas cylinder is arranged on the fixed bracket 1 for storing the special gas; one end of the gas pipeline 2 is connected to the exhaust port of the gas cylinder, and the other end of the gas pipeline 2 is detachably connected to the gas supply pipeline 8; the control component 3 is arranged on the gas pipeline 2 to detect and control the special gas flowing in the gas pipeline 2.

[0049] Specifically, the fixed bracket 1 includes a fixed plate and a fixed part, and the two can be an integrated structure, or fixed together by welding, bonding, bolting, etc. A gas cylinder is arranged in the fixed part, and the gas cylinder can be connected to the fixed part by a detachable connection method such as snap-on connection. A fixed plate is arranged on the top wall of the fixed part, and a gas pipeline 2 and a regulating component 3 are arranged on the top wall of the fixed plate. The gas pipeline 2 can be extended according to the size and shape of the fixed plate, one end of which is connected to the exhaust port of the gas cylinder, and the other end is detachably connected to the gas supply pipeline 8. The detachable connection can be achieved by a connecting valve, or by a connecting sleeve, or by directly plugging the gas pipeline 2 and the gas supply pipeline 8. The specific implementation method is not limited in this application, and it is sufficient to ensure that the two form a high airtightness when connected.

[0050] The gas cylinder can be a positive-pressure gas cylinder 4 or a negative-pressure gas cylinder 5, and can be selected according to the requirements of the actual semiconductor manufacturing process. At the same time, the structures of the regulating components 3 corresponding to the positive-pressure gas cylinder 4 and the negative-pressure gas cylinder 5 are different. According to the different gas cylinders, the corresponding regulating components 3 are arranged on the fixed bracket 1 in advance, so that the gas cylinder and the regulating components 3 form a complete module.

[0051] By setting a fixed bracket 1, the gas cylinder, the gas pipeline 2 and the control component 3 are integrated into a complete module. When gas supply is needed, it is only necessary to connect the gas pipeline 2 with the gas supply pipeline 8. When different types of special gases need to be replaced, it is only necessary to separate the gas pipeline 2 from the gas supply pipeline 8, and the entire gas supply mechanism can be disconnected from the gas supply pipeline 8, and then the gas pipeline 2 of the gas supply mechanism storing the corresponding special gas can be connected to the gas supply pipeline 8. In this way, when the gas supply mechanism is in use, when different types of special gases need to be replaced for gas supply, it is only necessary to select the corresponding gas pipeline 2 to be connected with the gas supply pipeline 8, and it is no longer necessary to disassemble and install other structures, so that the entire disassembly and installation process is simplified, the difficulty of disassembly and installation is effectively reduced, and the convenience of disassembly and installation is improved.

[0052] Optionally, the gas cylinder is a positive pressure gas cylinder 4, and the control component 3 includes a pressure regulating valve 31, a first detection component 32, and a second detection component 33. The pressure regulating valve 31 is arranged near the exhaust port of the positive pressure gas cylinder 4; the first detection component 32 is arranged at the air inlet end of the pressure regulating valve 31 to detect the first air pressure of the special gas entering the pressure regulating valve 31; the second detection component 33 is arranged at the exhaust end of the pressure regulating valve 31 to detect the second air pressure of the special gas after pressure regulation by the pressure regulating valve 31.

[0053] Specifically, the air pressure of the positive pressure gas cylinder 4 is relatively high, and the setting of the pressure regulating valve 31 can adjust the air pressure of the special gas after entering the gas pipeline 2 to ensure that the special gas flows safely in the gas pipeline 2. The first detection component 32 and the second detection component 33 can respectively detect the first air pressure and the second air pressure at the front and rear ends of the pressure regulating valve 31. Detecting the first air pressure can obtain the air pressure value of the special gas flowing from the gas cylinder into the gas pipeline 2, and detecting the second air pressure can obtain the air pressure value after the air pressure is adjusted by the pressure regulating valve 31. According to the first air pressure and the operating requirements, the operator can understand how to operate the pressure regulating valve 31 to adjust the pressure, and through the second air pressure, the operator can determine whether the state of the pressure regulating valve 31 meets the operating requirements. The specific types of the first detection component 32 and the second detection component 33 are not limited in this application, and they can detect the corresponding air pressure values.

[0054] By setting the pressure regulating valve 31, the special gas flowing into the gas pipeline 2 from the positive pressure gas cylinder 4 can be pressure regulated to ensure that the pressure of the special gas transported in the gas pipeline 2 meets the requirements. And by setting the first detection member 32 and the second detection member 33, the pressure detection on the inlet and outlet sides of the pressure regulating valve 31 can be formed, so that it is convenient to adjust the state of the pressure regulating valve 31 according to the detected first and second pressures, so as to improve the accuracy of the pressure control of the special gas.

[0055] Optionally, the gas cylinder is a negative pressure gas cylinder 5 , and the regulating component 3 includes a third detection member 34 . The third detection member 34 is used to detect a third gas pressure in the gas pipeline 2 .

[0056] Specifically, the gas pressure of the negative pressure gas cylinder 5 is relatively low. When the negative pressure gas cylinder 5 is used for special gas supply, there is no need to adjust the gas pressure separately. Only the third detection component 34 is provided to detect the third gas pressure in the gas pipeline 2 in real time to ensure that the third gas pressure meets the operation requirements.

[0057] Optionally, the regulating component 3 further includes a control valve group and a mass flow controller 36. The control valve group is arranged on the gas pipeline 2 to control the connection and disconnection of the gas pipeline 2. The mass flow controller 36 is arranged on the gas pipeline 2 to control the flow and quality in the gas pipeline 2.

[0058] Specifically, the control valve group can control the on-off of the gas pipeline 2, so that the operator can flexibly control the delivery of the special gas. It can include control valves arranged at intervals on the gas pipeline 2 to divide the gas pipeline 2 into multiple sections, so as to flexibly adjust the on-off at different positions on the gas pipeline. The mass flow controller 36 can adopt existing technology, which can calculate the mass flow of the gas by measuring the gas density and instantaneous flow, so as to achieve the effect of accurately controlling the gas flow and ensuring the gas quality.

[0059] Optionally, the control valve group includes a first control valve 37 and a plurality of second control valves 38. The first control valve 37 is arranged near the exhaust port of the gas cylinder; the plurality of second control valves 38 are distributed in the gas pipeline 2 at intervals and are all located on the side of the first control valve 37 away from the gas cylinder.

[0060] Specifically, the first control valve 37 is arranged between the filter 35 and the gas cylinder, and can be a manual valve or a solenoid valve to control the connection and disconnection between the gas cylinder and the gas pipeline 2. The plurality of second control valves 38 are distributed according to the various structures on the gas pipeline 2. In this embodiment, two second control valves 38 are arranged, which are respectively located at the two ends of the mass flow controller 36. The second control valve 38 can be a diaphragm valve or other valve bodies.

[0061] Optionally, the special gas supply device further includes a purge branch 6. One end of the purge branch 6 is connected to the gas pipeline 2, and the other end of the purge branch 6 is connected to the purge equipment.

[0062] Specifically, the purge branch 6 is connected to the purge pipeline 7 of the purge device, and the purge pipeline 7 is connected to the exhaust gas collection chamber. The purge device can blow nitrogen or other gases into the purge device, so that after the gas supply is completed, the residual special gas in the gas pipeline 2 is blown out, and the residual special gas can enter the exhaust gas collection chamber along the purge pipeline 7 for storage.

[0063] Optionally, the gas delivery pipeline 2 has a purge interface, which is located on a side of the first control valve 37 away from the gas cylinder and close to the first control valve 37 , and is connected to the purge branch 6 .

[0064] Specifically, a purge interface is provided on the gas pipeline 2 between the first control valve 37 and the second control valve 38 closest to the gas cylinder to connect with the purge branch 6, so that the purge branch 6 can blow gas into the gas from the end of the gas pipeline 2 close to the gas cylinder. At the same time, the first control valve 37 can remain closed to prevent the gas from flowing into the gas cylinder, thereby smoothly blowing out the special gas remaining in the gas pipeline 2.

[0065] Specifically, the regulating component 3 further includes a filter 35. The filter 35 is arranged on the gas pipeline 2. The filter 35 is arranged at a position of the gas pipeline 2 close to the exhaust port of the gas cylinder to filter the gas entering the gas pipeline 2 to reduce impurities and particles contained in the gas.

[0066] Optionally, the gas supply pipeline 8 has a plurality of connecting branches 9, and each connecting branch 9 can be used to connect to the special gas supply device as described above.

[0067] Specifically, a plurality of connecting branch pipes 9 are distributed at intervals along the extension direction of the gas supply pipeline 8, and each connecting branch pipe 9 corresponds to a group of gas supply mechanisms, which can be a positive-pressure gas supply mechanism containing a positive-pressure gas cylinder, or a negative-pressure gas supply mechanism containing a negative-pressure gas cylinder. Among the plurality of connecting branch pipes 9, only some of the connecting branch pipes 9 can be connected to the gas supply mechanism, and the remaining connecting branch pipes 9 are used as reserved branches to provide installation locations for subsequent special gas supply needs. The specific number of connecting branch pipes 9 can be designed according to the actual usage scenario, and this application does not limit it.

[0068] The air supply mechanism is connected by selecting a suitable number of connecting branch pipes 9, and each connecting branch pipe 9 can be connected to only one air supply mechanism, and the remaining connecting branch pipes 9 not connected to the air supply mechanism can be used as reserved branches to facilitate the arrangement of the air supply mechanism according to the adjustment of the operation requirements at any time.

[0069] The gas supply mechanism connected to the connecting branch pipe 9 can be a positive pressure gas supply mechanism or a negative pressure gas supply mechanism, and the specific type and quantity are not limited in this application. In this way, when the special gas supply device is used for special gas supply, the gas supply mechanism can be disassembled and installed as an integral module. When disassembling and installing, it is only necessary to operate the separation and connection between the connecting branch pipe 9 and the gas supply mechanism, and it is no longer necessary to operate other structures separately, which effectively reduces the difficulty of disassembly and installation, and improves the convenience of disassembly and installation, so as to ensure the stable gas supply of the special gas supply device.

[0070] The ion implantation device comprises an ion source arc chamber and a special gas supply device as described above. The ion source arc chamber is connected with the special gas supply device to ionize the special gas input by the special gas supply device to generate ions.

[0071] When the ion implantation equipment is in use, a specific number of gas supply mechanisms can be set according to the operating requirements. Moreover, when replacing the gas supply mechanisms, since each gas supply mechanism is a complete module with various control functions, it is only necessary to dismantle and install the pipelines for the special gas circulation during installation and disassembly, and there is no need to dismantle and install other structures, which effectively simplifies the disassembly and installation process and improves operating efficiency, thereby effectively ensuring the rapid operation of the ion implantation equipment.

[0072] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, various obvious changes, readjustments and substitutions can be made without departing from the scope of protection of the present invention. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention shall be included in the scope of protection of the claims of the present invention.

Claims

1. Special gas supply device, characterized in that: include: A gas supply pipeline (8) is connected to the ion source arc chamber; An air supply mechanism, the air supply mechanism comprising: A fixing bracket (1); A gas cylinder, arranged on the fixed support (1) for storing special gas; A gas delivery pipeline (2), one end of which is connected to the exhaust port of the gas cylinder, and the other end of which is detachably connected to the gas supply pipeline (8); and A regulating component (3) is arranged in the gas pipeline (2) to detect and control the special gas flowing in the gas pipeline (2).

2. The special gas supply device according to claim 1, characterized in that: The gas cylinder is a positive pressure gas cylinder (4), and the regulating component (3) comprises: A pressure regulating valve (31) is arranged near the exhaust port of the positive pressure gas cylinder (4); A first detection element (32) is arranged at the air inlet end of the pressure regulating valve (31) and is used to detect a first air pressure of the special gas entering the pressure regulating valve (31); and The second detection component (33) is arranged at the exhaust end of the pressure regulating valve (31) and is used to detect the second gas pressure of the special gas after the pressure is regulated by the pressure regulating valve (31).

3. The special gas supply device according to claim 1, characterized in that: The gas cylinder is a negative pressure gas cylinder (5), and the regulating component (3) comprises: The third detection component (34) is used to detect a third air pressure in the air transmission pipeline (2).

4. The special gas supply device according to any one of claims 1 to 3, characterized in that: The control component (3) further comprises: a control valve group, arranged on the gas transmission pipeline (2) for controlling the connection and disconnection of the gas transmission pipeline (2); and A mass flow controller (36) is arranged in the gas pipeline (2) and is used to control the flow rate and mass in the gas pipeline (2).

5. The special gas supply device according to claim 4, characterized in that: The control valve group comprises: a first control valve (37) disposed near the exhaust port of the gas cylinder; and A plurality of second control valves (38) are distributed at intervals on the gas delivery pipeline (2) and are all located on a side of the first control valve (37) away from the gas cylinder.

6. The special gas supply device according to claim 5, characterized in that: The special gas supply device also includes: A purge branch (6), one end of the purge branch (6) is connected to the gas transmission pipeline (2), and the other end of the purge branch (6) is connected to the purge equipment.

7. The special gas supply device according to claim 6, characterized in that: The gas delivery pipeline (2) has a purge interface, which is located on a side of the first control valve (37) away from the gas cylinder and close to the first control valve (37), and the purge interface is connected to the purge branch (6).

8. The special gas supply device according to any one of claims 1 to 3, characterized in that: The control component (3) further comprises: A filter (35) is arranged on the gas transmission pipeline (2).

9. The special gas supply device according to any one of claims 1 to 3, characterized in that: The air supply pipeline (8) has a plurality of connecting branch pipes (9), and each connecting branch pipe (9) is connected to a corresponding air supply mechanism.

10. Ion implantation equipment, characterized in that include: The special gas supply device according to any one of claims 1 to 9; as well as The ion source arc chamber is connected to the special gas supply device to ionize the special gas input by the special gas supply device to generate ions.

Images