Cleaning cavity and cleaning equipment

Through the design of the lifting chamber and collection components, the problems of liquid splash and metal chips in the cleaning chamber are solved, and effective control of the cleaning process and recycling of precious metals are achieved.

CN222766812UActive Publication Date: 2025-04-18KINGSEMI CO LTD
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Patent Information

Application Number
CN202420815453.9
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-04-18
Publication Date
2025-04-18
Estimated Expiration
2034-04-18

AI Technical Summary

Technical Problem

During high-pressure cleaning, liquid and metal chips splash, affecting the detection effect of optical components and may clog the drain port, making it inconvenient for precious metals to recover.

Method used

The lifting chamber and collection assembly are designed. The lifting chamber increases the relative distance from the cleaning surface to the top of the cavity by rising, and the chamber cover covers the splashing droplets, and the collection assembly is arranged on the inside to collect solid by-products.

Benefits of technology

Effectively block splashing droplets in the cavity, prevent them from affecting the optical components, and recover precious metals to avoid blocking the drain port.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses a cleaning cavity and cleaning equipment, which comprise a lifting cavity used for increasing the relative distance from a cleaning surface to the top of the cavity through ascending so as to limit splashing liquid drops generated in the cleaning process in the cavity. According to the optical element cleaning device, splashing liquid drops generated when cleaning liquid is sprayed on a cleaning face in the cleaning process can be blocked in the cavity, the splashing liquid drops are prevented from overflowing in the cleaning process to affect the detection effect of an optical element, and splashing solid by-products generated in the cleaning process can be prevented from blocking the liquid outlet. And the precious metal contained in the solid by-product can be effectively recovered at the same time.
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Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor process equipment, in particular to a cleaning chamber and cleaning equipment. Background Art

[0002] A Chinese invention patent application with publication number CN116581056A discloses a cleaning chamber of a semiconductor process equipment, which includes a chamber shell, a cleaning liquid collecting mechanism, a cleaning liquid discharge mechanism and a supporting seat for supporting wafers. The cleaning liquid collecting mechanism and the supporting seat are both arranged in the chamber shell, and the cleaning liquid collecting mechanism is arranged around the supporting seat, and the cleaning liquid discharge mechanism is connected to the cleaning liquid collecting mechanism; the material of the cleaning liquid collecting mechanism and the cleaning liquid discharge mechanism is different from the material of the chamber shell, and the corrosion resistance is better than the corrosion resistance of the chamber shell, so that the cleaning chamber can better ensure the corrosion resistance while avoiding the problem of higher cost caused by the entire cleaning chamber being made of more expensive corrosion-resistant materials.

[0003] However, since the cleaning chamber is an integrated single chamber, in the actual cleaning process such as degumming, the chamber is limited by its height. When the high-pressure cleaning organic solution is sprayed on the wafer during cleaning, liquid and metal chips will splash and overflow from the opening space at the top of the chamber, thereby affecting the detection effect of the optical element. In addition, after the metal chips splash, they may block the drain port and make it inconvenient to recover the precious metals therein. Utility Model Content

[0004] The purpose of the utility model is to overcome the above-mentioned defects in the prior art and provide a cleaning cavity and a cleaning device.

[0005] To achieve the above purpose, the technical solution of the utility model is as follows:

[0006] The utility model provides a cleaning cavity, comprising:

[0007] The lifting chamber is used to increase the relative distance between the cleaning surface and the top of the cavity by rising, so as to limit the splashing droplets generated during the cleaning process to the inside of the cavity.

[0008] Furthermore, a chamber cover is provided on the top of the lifting chamber, and the chamber cover is used to cover the top opening of the lifting chamber during cleaning, so as to block the droplets further splashed to the top of the lifting chamber back into the cavity.

[0009] Furthermore, it also includes: a fixed chamber, the lifting chamber is arranged on the fixed chamber, and the lifting chamber is driven by the lifting mechanism to rise relative to the fixed chamber, thereby increasing the relative distance from the cleaning surface to the top of the lifting chamber, thereby increasing the relative distance from the cleaning surface to the top of the cavity.

[0010] Furthermore, the fixed chamber and the lifting chamber include a cylindrical side wall, the bottom end of the cylindrical side wall of the fixed chamber is closely connected to the bottom surface of the cavity, the bottom end of the cylindrical side wall of the lifting chamber is movably sleeved on the top end of the cylindrical side wall of the fixed chamber, and the chamber cover is arranged on the top end of the cylindrical side wall of the lifting chamber.

[0011] Furthermore, it also includes: a collecting component, which is arranged in the lifting chamber and is used to collect splashed solid by-products generated during the cleaning process.

[0012] Furthermore, the collecting component includes a plurality of layers of collecting parts surrounding the inner side of the lifting chamber, and the collecting component is connected to the top of the lifting chamber through the top of an uppermost collecting part among the plurality of layers of collecting parts, and each layer of the collecting parts has a caliber that gradually decreases in the direction away from the top of the lifting chamber, and each layer of the collecting parts is interconnected downwardly and suspended in the lifting chamber.

[0013] Furthermore, the collecting member is provided with an annular side wall, the upper end of the annular side wall is provided with a first flange edge facing outward, the lower end of the annular side wall is provided with a second flange edge facing inward, a limiting member is provided on the outer surface of the annular side wall of the collecting member below the collecting member on the uppermost layer, and a limiting groove is correspondingly provided on the second flange edge of the collecting member above the collecting member on the lowermost layer; wherein, any one of the collecting members on the lower layer passes through an adjacent one of the collecting members on the upper layer from above, and is pressed against the second flange edge of the adjacent one of the collecting members on the upper layer through the first flange edge, A mutual socket connection is formed, and a first limit is obtained by allowing the limiting member to pass through and abut against the first end of the limiting groove of the adjacent collecting member located on the upper layer. When the collecting assembly contracts upward, any one of the collecting members located on the lower layer abuts against the bottom surface of the second flange edge of the adjacent collecting member located on the upper layer through the limiting member to obtain a second limit. Any one of the collecting members located on the lower layer obtains a third limit by making relative rotation so that the limiting member moves with the limiting member and abuts against the second end of the limiting groove of the adjacent collecting member located on the upper layer, so as to release the socket connection with the adjacent collecting member located on the upper layer by moving upward.

[0014] Furthermore, the limiting member includes a first sub-limiting member axially arranged on the outer surface of the annular side wall and a second sub-limiting member circumferentially arranged, the first sub-limiting member on each of the collecting members located in the lower layer is used to cooperate with the corresponding limiting groove on the adjacent collecting member located in the upper layer, so as to realize the first limiting and the third limiting of the collecting member located in the lower layer relative to the adjacent collecting member located in the upper layer, the second sub-limiting member on each of the collecting members located in the lower layer is used to cooperate with the second flange edge on the adjacent collecting member located in the upper layer, so as to realize the second limiting of the collecting member located in the lower layer relative to the adjacent collecting member located in the upper layer, the limiting groove forms an opening on the inner side of the second flange edge, the first sub-limiting member is connected to the bottom surface of the first flange edge on the same collecting member, the length and width of the second sub-limiting member on each of the collecting members located in the lower layer are smaller than the length and width of the corresponding limiting groove on the adjacent collecting member located in the upper layer.

[0015] Furthermore, a first window is provided on the annular side wall of the collecting member, a filter is provided on the first window, a second window is provided on the second flange edge of the collecting member at the bottom layer, and the filter is also provided on the second window.

[0016] The utility model also provides a cleaning device, comprising the above-mentioned cleaning cavity.

[0017] It can be seen from the above technical scheme that the utility model provides a lifting chamber on the cleaning chamber. During the cleaning process, the relative distance from the cleaning surface in the cleaning chamber to the top of the chamber can be increased by raising the lifting chamber, so as to increase the effective depth of the chamber, thereby blocking the splashing droplets generated by spraying the cleaning liquid on the cleaning surface during the cleaning process inside the chamber; further, by providing a chamber cover on the top of the lifting chamber, the top opening of the lifting chamber can be covered during cleaning, so that the droplets splashed to the top of the lifting chamber can be blocked and refluxed, thereby effectively preventing the splashing droplets during the cleaning process from overflowing and affecting the detection effect of the optical element; and, by providing a collecting component on the inner side of the lifting chamber, it is used to collect the splashed solid by-products generated during the cleaning process (such as metal chips of precious metals generated during degumming), thereby preventing the solid by-products from clogging the drain port and effectively recovering the precious metals contained in the solid by-products. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 The figure is a schematic structural diagram of a cleaning chamber according to a preferred embodiment of the utility model.

[0019] Figure 2 The figure is a side structural schematic diagram of a collecting assembly according to a preferred embodiment of the utility model.

[0020] Figure 3 The figure is a schematic diagram of the structure of a collecting assembly in a preferred embodiment of the utility model from a top view.

[0021] Figure 4 It is a schematic diagram of a clamping structure of a preferred embodiment of the utility model. DETAILED DESCRIPTION

[0022] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the utility model belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0023] In view of the existing cleaning process, because the integrated separate cleaning chamber is limited by its height, when the high-pressure cleaning liquid is sprayed on the wafer during cleaning, liquid and metal chips will splash and overflow from the open space at the top of the chamber, thereby affecting the detection effect of the optical element provided, and the metal chips may block the drain port after splashing, and it is inconvenient to recover the precious metals therein. The utility model provides a cleaning chamber to overcome the above-mentioned defects of the prior art.

[0024] A cleaning cavity of the utility model comprises:

[0025] The lifting chamber is used to increase the relative distance from the cleaning surface to the top of the chamber by rising, so as to limit the splashing droplets generated during the cleaning process to the inside of the chamber.

[0026] The utility model provides a lifting chamber on the cleaning chamber. During the cleaning process, the lifting chamber is raised to increase the relative distance from the cleaning surface in the cleaning chamber to the top of the chamber, thereby increasing the effective depth of the chamber. The splashing droplets generated by spraying the cleaning liquid on the cleaning surface during the cleaning process can be effectively blocked inside the chamber, thereby preventing the splashing liquid from affecting the detection of the optical element during the cleaning process.

[0027] The specific implementation of the utility model is further described in detail below in conjunction with the accompanying drawings.

[0028] refer to Figure 1A cleaning chamber 10 of the utility model includes a lifting chamber 12 .

[0029] The cleaning chamber 10 of the utility model is used for spraying cleaning liquid on the surface of a treatment object (not shown) placed in the chamber 10, so as to perform a cleaning process on the surface of the treatment object through the sprayed cleaning liquid.

[0030] In some embodiments, the processing object may be, for example, a semiconductor wafer. The cleaning liquid may be a chemical liquid, and the chemical liquid may be, for example, an organic liquid. The chamber 10 is used to spray the chemical liquid on the surface of the wafer to perform a cleaning process on the surface of the wafer.

[0031] In some embodiments, the cleaning process may be a degumming cleaning process. The chamber 10 is used to spray an organic liquid on the rotating wafer surface to perform a degumming cleaning process on the wafer surface, and simultaneously remove the metal layer on the wafer surface that is not to be retained, thereby generating splashing organic liquid droplets and solid byproducts such as metal chips during the cleaning process.

[0032] In some other embodiments, the processing object may also be other products that require surface treatment.

[0033] The following takes a semiconductor wafer as the processing object, and a cleaning chamber 10 of the utility model is used to spray, for example, an organic liquid on the surface of the wafer, and takes the cleaning process of removing the glue and stripping off the metal layer on the surface of the wafer (collectively referred to as the degumming cleaning process) as an example to describe a cleaning chamber 10 of the utility model in detail.

[0034] refer to Figure 1 . In some embodiments, a chuck assembly 19 is provided in the cavity 10. The top surface of the chuck assembly 19 is used to place and fix a wafer (not shown); the bottom of the chuck assembly 19 is connected to the rotating mechanism 18, and the lower end of the rotating mechanism 18 is led out of the cavity 10 from the bottom surface of the cavity 10. The rotating mechanism 18 is used to be driven to drive the chuck assembly 19 to rotate, thereby driving the wafer placed and fixed on the top surface of the chuck assembly 19 to be sprayed with an organic liquid in a rotating state for degumming and cleaning. Among them, the upper surface of the wafer constitutes a cleaning surface.

[0035] When driven, the lifting chamber 12 can move up and down along the vertical direction of the cavity 10 to realize the lifting and lowering of the cavity 10 as a whole. When the degumming and cleaning process is performed, the lifting chamber 12 is driven to rise, and the relative distance from the cleaning surface to the top of the cavity 10 can be increased by moving the relative position of the lifting chamber 12 upward, so that the splashing droplets generated by the high-pressure spraying of the organic liquid on the rotating wafer surface during the degumming and cleaning process can be blocked, thereby limiting the splashing droplets inside the cavity 10 to avoid a large amount of splashing droplets overflowing.

[0036] refer to Figure 1 In some embodiments, a chamber cover 14 is provided on the top of the lift chamber 12. The chamber cover 14 is used to cover the top opening of the lift chamber 12 during degumming and cleaning, so as to block the droplets further splashed to the top of the lift chamber 12 inside the cavity 10, and make them flow back to the bottom surface of the cavity 10 and be discharged from the cavity 10.

[0037] In some embodiments, the chamber cover 14 is installed with the top of the lifting chamber 12 using a quick-release connector 141, so that no tools are required for installation and removal, which is convenient and quick. The quick-release connector 141 can be a commercial quick-release connector.

[0038] In some embodiments, a flange 121 is provided outwardly on the top of the lifting chamber 12, and the chamber cover 14 is installed on the flange 121 on the top of the lifting chamber 12 using a quick-release connector 141, thereby effectively ensuring the tightness between the chamber cover 14 and the top of the lifting chamber 12.

[0039] In some embodiments, the organic liquid is sprayed from above into the cavity 10 through a swing arm nozzle disposed outside the cavity 10. The chamber cover 14 is provided with a channel (opening) adapted to the swing trajectory of the swing arm to avoid obstruction to the working state of the swing arm.

[0040] refer to Figure 1 In some embodiments, the cavity 10 further includes a fixed cavity 11. The fixed cavity 11 is disposed on the bottom surface of the cavity 10; the lifting cavity 12 is disposed on the fixed cavity 11. The lifting cavity 12 and the fixed cavity 11 together constitute a liftable cavity 10. The lifting cavity 12 can increase the relative distance from the cleaning surface to the top of the lifting cavity 12 by being driven to rise relative to the fixed cavity 11, thereby increasing the relative distance from the cleaning surface to the top of the cavity 10.

[0041] In some embodiments, the fixed chamber 11 and the lifting chamber 12 include cylindrical side walls. The bottom end of the cylindrical side wall of the fixed chamber 11 is tightly mounted on the bottom surface of the chamber body 10. The bottom end of the cylindrical side wall of the lifting chamber 12 is movably sleeved on the top end of the cylindrical side wall of the fixed chamber 11.

[0042] In some embodiments, a flange 121 is provided on the top end of the cylindrical side wall of the lifting chamber 12 , and the chamber cover 14 is installed on the flange 121 .

[0043] In some embodiments, the bottom end of the cylindrical side wall of the lifting chamber 12 is movably sleeved on the inner side of the top end of the cylindrical side wall of the fixed chamber 11. In addition, the lifting chamber 12 has a height adapted to the fixed chamber 11. When the lifting chamber 12 is driven to descend, the flange 121 on the top end of the lifting chamber 12 abuts against the top end of the fixed chamber 11, thereby realizing the limit control of the lifting chamber 12 when descending along the cylindrical side wall of the fixed chamber 11, and preventing the lower end of the lifting chamber 12 from hitting the bottom surface of the cavity 10.

[0044] In some embodiments, a guide groove is provided on the outer surface of the cylindrical side wall of the lifting chamber 12, and a corresponding guide protrusion is provided on the inner surface of the cylindrical side wall of the fixed chamber 11. Therefore, through the cooperation between the guide groove and the guide protrusion, the lifting chamber 12 is always in a centered state when it is lifted or lowered relative to the fixed chamber 11, thereby ensuring the lifting performance of the lifting chamber 12.

[0045] refer to Figure 1 In some embodiments, the lifting chamber 12 is connected to a lifting mechanism 16 . The lifting mechanism 16 is used to drive the lifting chamber 12 to move up and down relative to the fixed chamber 11 .

[0046] In some embodiments, the lifting mechanism 16 is fixed (for example, fixed on a mounting surface outside the cavity 10). The lifting mechanism 16 uses a cylinder drive to control the lifting of the lifting chamber 12. The lifting chamber 12 is connected to the cylinder rod of the cylinder through the top of the side wall.

[0047] In some other embodiments, the lifting mechanism 16 may also be driven by an electric cylinder to control the lifting of the lifting chamber 12 .

[0048] In some embodiments, the lifting stroke of the lifting chamber 12 reaches more than 125 mm.

[0049] refer to Figure 1-Figure 3 In some embodiments, the chamber 10 further includes a collecting assembly 15. The collecting assembly 15 is disposed in the lifting chamber 12 and is used to collect splashed solid byproducts generated during the degumming and cleaning process.

[0050] In some embodiments, the collecting assembly 15 includes multiple layers of collecting pieces (151, 152, 153) surrounding the side wall of the lifting chamber 12. The collecting assembly 15 is connected to the top of the lifting chamber 12 through the top of the topmost collecting piece in the multiple layers, and is located below the chamber cover 14. In addition, each layer of collecting pieces has a diameter that decreases gradually in a direction away from the top of the lifting chamber 12, and each layer of collecting pieces is mutually connected downward and suspended in the lifting chamber 12.

[0051] The following is a detailed description of the collecting assembly 15 when the collecting assembly 15 includes three layers of collecting members (151, 152, 153). It is understood that the collecting assembly 15 may also include two layers of collecting members or more than four layers of collecting members. Alternatively, the collecting assembly 15 may also include only a single layer of collecting members.

[0052] refer to Figure 1-Figure 4 In some embodiments, each (layer) collecting element is provided with an annular sidewall, and the diameters of the annular sidewalls of each layer of collecting elements decrease gradually from top to bottom.

[0053] The upper end of the annular side wall of each collector is provided with an annular first flange 156 facing outward, and the lower end of the annular side wall of each collector is provided with an annular second flange 155 facing inward. Among them, a collector 152 (represented by the middle collector 152) located in the middle layer and a collector 151 (represented by the lower collector 151) located in the lower layer below a collector 153 (represented by the upper collector 153) located in the uppermost layer of the three layers are provided with a stopper 159 on the outer surface of the annular side wall respectively, and the middle collector 152 and the upper collector 153 located above the lower collector 151 in the three layers are provided with a stopper groove 158 on the second flange 155 respectively, and the stopper groove 158 forms an opening on the inner side of the second flange 155. The stopper 159 on each lower collector has an adaptable size that can pass through the stopper groove 158 on the adjacent collector located in the upper layer.

[0054] In some embodiments, the stopper 159 includes a first sub-stopper 1592 arranged axially on the outer surface of the annular side wall and a second sub-stopper 1591 arranged circumferentially. The first sub-stopper 1592 is connected to the bottom surface of the first flange edge 156 on the same collecting member, the width of each first sub-stopper 1592 on the collecting member in the lower layer is smaller than the width of the corresponding stopper groove 158 on the adjacent collecting member in the upper layer, and the length and width of each second sub-stopper 1591 on the collecting member in the lower layer are smaller than the length and width of the corresponding stopper groove 158 on the adjacent collecting member in the upper layer. Thus, the stopper 159 on each collecting member in the lower layer can pass through the stopper groove 158 on the adjacent collecting member in the upper layer. Each first sub-stopper 1592 on the collecting member in the lower layer is used to cooperate with the corresponding stopper groove 158 on the adjacent collecting member in the upper layer to achieve the first stopper and the third stopper between the collecting member in the lower layer and the adjacent collecting member in the upper layer. The second sub-limiting member 1591 on each collecting member located at the lower layer is used to cooperate with the second flange edge 155 on the adjacent collecting member located at the upper layer to achieve the second limiting of the collecting member located at the lower layer relative to the adjacent collecting member located at the upper layer.

[0055] In some embodiments, the first sub-limiting member 1592 and the second sub-limiting member 1591 are connected to form a right angle.

[0056] In some embodiments, the lower end of the limiting member 159 (the lower end of the second sub-limiting member 1591 ) is located inside the lower end of the annular side wall.

[0057] In some embodiments, the free end of the second sub-limiting member 1591 ( Figure 4 The left end in the middle) and the bottom corner and the notch of the limiting groove 158 have an arc-shaped guiding structure.

[0058] In some embodiments, when the three-layer collecting pieces are interconnected, any one of the collecting pieces on the lower layer is passed from above through an adjacent collecting piece on the upper layer, for example, the lower collecting piece 151 is passed from above through the middle collecting piece 152, and the first flange edge 156 on the lower collecting piece 151 is pressed against the second flange edge 155 on the middle collecting piece 152 to form a fit, thereby forming a mutual connection between the lower collecting piece 151 and the middle collecting piece 152.

[0059] Furthermore, when the lower collecting member 151 and the middle collecting member 152 are fitted together, the limiting member 159 (the second sub-limiting member 1591 and the first sub-limiting member 1592) on the lower collecting member 151 passes through the limiting groove 158 on the middle collecting member 152, and the lower collecting member 151 and the middle collecting member 152 are relatively rotated ( Figure 4 The lower collecting member 151 rotates to the left in the middle collecting member 152, so that the first stopper 159 on the lower collecting member 151 abuts against the first end of the stopper groove 158 on the middle collecting member 152. Figure 4 The lower collecting member 151 is on the left end of the limiting groove 158 so that the lower collecting member 151 obtains a first limiting position relative to the middle collecting member 152, thereby realizing the sleeve installation and positioning of the lower collecting member 151 on the middle collecting member 152 in the lateral direction.

[0060] When the sleeve is released, the lower collecting member 151 and the middle collecting member 152 can be rotated in the opposite direction relative to each other ( Figure 4 The lower collecting member 151 rotates rightwards in the middle), so that the first stopper 159 on the lower collecting member 151 abuts against the second end of the stopper groove 158 on the middle collecting member 152 ( Figure 4 The lower collecting member 151 is unlocked by being pulled upward from the middle collecting member 152.

[0061] The middle collecting piece 152 is passed through the upper collecting piece 153 from above to form the mutual nesting and detaching manner between the middle collecting piece 152 and the upper collecting piece 153, which is the same as the mutual nesting and detaching manner between the lower collecting piece 151 and the middle collecting piece 152, and so on.

[0062] By providing a mutually nested structure between multiple layers of collecting parts, a quick-detachable collecting assembly 15 is formed, which can be folded so that no tools are required for disassembly, which is convenient and quick.

[0063] Furthermore, by forming a design in which the fixed chamber 11 and the lifting chamber 12 are nested and matched, and designing a quick-release chamber cover 14 and a quick-release folding collection assembly 15, the maintenance time is greatly shortened, and the installation and use space is compressed.

[0064] When the lifting chamber 12 needs to descend, the collecting assembly 15 will follow the lifting chamber 12 to descend. In addition, if the collecting assembly 15 touches the structure provided in the cavity 10 (such as the bottom surface of the cavity 10 or the structure provided on the bottom surface) due to the lower end (the lower end of the lower collecting piece 151) during the descent process, the collecting assembly 15 can shrink upward by utilizing the socket fitting formed between the multiple layers of collecting pieces, so that the three layers of collecting pieces can be overlapped (longitudinally folded) in sequence from bottom to top. At this time, when any one of the three layers of collecting pieces located in the lower layer rises with the second limiting piece 159 provided thereon to abut against the bottom surface of the second flange edge 155 of the adjacent collecting piece located in the upper layer, the second limiting piece between any one of the collecting pieces located in the lower layer and the adjacent collecting piece located in the upper layer can be obtained to maintain the structural integrity of the collecting assembly 15.

[0065] refer to Figure 1-Figure 4 In some embodiments, a first window 154 is disposed on the annular side wall of each collecting member, and a filter is disposed on the first window 154. The filter is used to filter out the liquid and block the splashed solid byproducts for collection.

[0066] A second window 157 is provided on the second flange 155 of a collecting member (lower collecting member 151) at the bottom layer, and a filter is also provided on the second window 157. The width of the second flange 155 of the lower collecting member 151 is greater than the width of the second flange 155 of each collecting member at the upper layer, and by providing the second window 157 with the filter, the solid by-products falling from the upper space can be caught and collected, and the falling solid by-products are prevented from falling onto the bottom surface of the cavity 10 and blocking the drain port.

[0067] Usually, when removing the adhesive, the unnecessary metal layer on the surface of the wafer is also stripped and removed, so that the solid byproduct contains waste scraps of these metal layers, especially precious metal scraps. Therefore, by setting the filter type collection component 15, these precious metal scraps can be effectively collected and recycled.

[0068] In some embodiments, the first windows 154 are arranged in a plurality of patterns along the circumferential direction on the annular sidewall of each collecting element. The second windows 157 are arranged in a plurality of patterns along the circumferential direction on the second flange 155 of a collecting element at the bottom layer.

[0069] In some embodiments, a handle 1511 is provided on the second flange 155 of the bottom collector. Since the bottom collector is relatively low, the handle 1511 is used to rotate and lift the bottom collector, so as to facilitate installation and removal of the bottom collector.

[0070] In some embodiments, an exhaust port 17 is provided on the bottom surface of the cavity 10. When performing the degumming and cleaning process, air is exhausted to the outside of the cavity 10 through the exhaust port 17, and the swing arm avoidance channel provided on the chamber cover 14 is used to form an air inlet, forming a downward flow field inside the cavity 10, which can directly draw away the drug liquid mist generated during the process from the exhaust port 17 below, not only to avoid the overflow of the drug liquid mist, but also to prevent the drug liquid mist from flowing back to the surface of the wafer to cause secondary pollution. In addition, the formed flow field can also play a good purging effect on the inner wall of the cavity 10 and the surface of the structure inside the cavity 10 (such as the chuck assembly 19, etc.), thereby also avoiding the contamination of the cavity 10 at the same time.

[0071] In some embodiments, the exhaust ports 17 are disposed on both sides of the rotating mechanism 18 and are located below the chuck assembly 19 .

[0072] refer to Figure 1 A cleaning device of the utility model includes the cleaning chamber 10 of the utility model.

[0073] When the cleaning equipment is performing a degumming operation, the lifting chamber 12 moves upward, and the depth of the chamber 10 is increased by the upward movement of the lifting chamber 12; at the same time, the splashing liquid is blocked by the chamber cover 14, and the refluxed liquid is recovered through the drain port below the chamber 10 for degumming liquid, thereby effectively solving the problem of liquid splashing in the traditional single-layer chamber affecting the detection effect of the optical element. When the degumming operation is completed, the lifting chamber 12 descends to the initial position and retracts into the fixed chamber 11, which is convenient for the robot to pick up and deliver the film.

[0074] In summary, the utility model provides a lifting chamber 12 on the cleaning chamber 10. During the cleaning process, the lifting chamber 12 is raised to increase the relative distance from the cleaning surface in the cleaning chamber 10 to the top of the chamber 10, so as to increase the effective depth of the chamber 10, thereby blocking the splashing droplets generated by spraying the cleaning liquid on the cleaning surface during the cleaning process inside the chamber 10; further, by providing a chamber cover 14 on the top of the lifting chamber 12, the top opening of the lifting chamber 12 can be covered during cleaning, so that the droplets splashed to the top of the lifting chamber 12 can be blocked and refluxed, thereby effectively preventing the splashing droplets during the cleaning process from overflowing and affecting the detection effect of the optical element; and, by providing a collecting component 15 on the inner side of the lifting chamber 12, it is used to collect the splashing solid by-products generated during the cleaning process (such as metal chips of precious metals generated during degumming), thereby preventing the solid by-products from clogging the drain port and effectively recovering the precious metals contained in the solid by-products.

[0075] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.

Claims

1. A cleaning chamber, characterized in that: include: Fixed chamber; A lifting chamber is arranged on the fixed chamber, and the lifting chamber is driven by a lifting mechanism to rise relative to the fixed chamber, thereby increasing the relative distance from the cleaning surface to the top of the lifting chamber, thereby increasing the relative distance from the cleaning surface to the top of the cavity, so as to limit the splashing droplets generated during the cleaning process to the inside of the cavity.

2. The cleaning chamber according to claim 1, characterized in that: A chamber cover is provided on the top of the lifting chamber, and the chamber cover is used to cover the top opening of the lifting chamber during cleaning, so as to block the liquid droplets further splashed to the top of the lifting chamber back to the inside of the cavity.

3. The cleaning chamber according to claim 1, characterized in that: The fixed chamber and the lifting chamber include a cylindrical side wall, the bottom end of the cylindrical side wall of the fixed chamber is closely connected to the bottom surface of the cavity, the bottom end of the cylindrical side wall of the lifting chamber is movably sleeved on the top end of the cylindrical side wall of the fixed chamber, and the chamber cover is arranged on the top end of the cylindrical side wall of the lifting chamber.

4. The cleaning chamber according to claim 1, characterized in that: Also includes: A collecting component is disposed in the lifting chamber and is used to collect splashed solid byproducts generated during the cleaning process.

5. The cleaning chamber according to claim 4, characterized in that: The collecting assembly includes multiple layers of collecting parts surrounding the inner side of the lifting chamber. The collecting assembly is connected to the top of the lifting chamber through the top of an uppermost collecting part among the multiple layers of collecting parts. The collecting parts of each layer have a caliber that gradually decreases in the direction away from the top of the lifting chamber. The collecting parts of each layer are interconnected downward and suspended in the lifting chamber.

6. The cleaning chamber according to claim 5, characterized in that: The collecting member is provided with an annular side wall, the upper end of the annular side wall is provided with a first flange edge facing outward, the lower end of the annular side wall is provided with a second flange edge facing inward, a limiting member is provided on the outer surface of the annular side wall of the collecting member below the collecting member on the uppermost layer, and a limiting groove is correspondingly provided on the second flange edge of the collecting member above the collecting member on the lowermost layer; wherein, any one of the collecting members on the lower layer passes through an adjacent one of the collecting members on the upper layer from above, and is pressed against the second flange edge of the adjacent one of the collecting members on the upper layer through the first flange edge, forming They are socketed with each other, and a first limit is obtained by allowing the limiting member to pass through and abut against the first end of the limiting groove of the adjacent collecting member located on the upper layer. When the collecting assembly contracts upward, any one of the collecting members located on the lower layer abuts against the bottom surface of the second flange edge of the adjacent collecting member located on the upper layer through the limiting member to obtain a second limit. Any one of the collecting members located on the lower layer obtains a third limit by making relative rotation so that the limiting member moves with the limiting member and abuts against the second end of the limiting groove of the adjacent collecting member located on the upper layer, so as to release the socketing with the adjacent collecting member located on the upper layer by moving upward.

7. The cleaning chamber according to claim 6, characterized in that: The limiting member includes a first sub-limiting member axially arranged on the outer surface of the annular side wall and a second sub-limiting member circumferentially arranged. The first sub-limiting member on each of the collecting members located in the lower layer is used to cooperate with the corresponding limiting groove on the adjacent collecting member located in the upper layer, so as to realize the first limiting and the third limiting of the collecting member located in the lower layer relative to the adjacent collecting member located in the upper layer. The second sub-limiting member on each of the collecting members located in the lower layer is used to cooperate with the second flange edge on the adjacent collecting member located in the upper layer, so as to realize the second limiting of the collecting member located in the lower layer relative to the adjacent collecting member located in the upper layer. The limiting groove forms an opening on the inner side of the second flange edge. The first sub-limiting member is connected to the bottom surface of the first flange edge on the same collecting member. The length and width of the second sub-limiting member on each of the collecting members located in the lower layer are smaller than the length and width of the corresponding limiting groove on the adjacent collecting member located in the upper layer.

8. The cleaning chamber according to claim 6, characterized in that: A first window is provided on the annular side wall of the collecting member, a filter is provided on the first window, and a second window is provided on the second flange edge of the collecting member at the bottom layer, and the filter is also provided on the second window.

9. A cleaning device, characterized in that: A cleaning chamber comprising any one of claims 1 to 8.

Citation Information

Patent Citations

  • Semiconductor process equipment and cleaning chamber thereof

    CN116581056A