Machine table for semiconductor detection equipment and semiconductor detection equipment

Abstract

The utility model belongs to the technical field of semiconductor manufacturing, and particularly relates to a machine table for semiconductor detection equipment and the semiconductor detection equipment. The machine table comprises a machine table body, a linear moving module, a workbench and at least one adjusting device. The linear moving module is arranged on the machine table body; the workbench is used for bearing a sample, and the workbench is connected to the linear moving module and can be driven by the linear moving module to move relative to the machine table body; each adjusting device is used for rotating the workbench so as to eliminate torsion of the workbench in the moving process. The workbench can be pushed to twist by adjusting each adjusting device, so that the workbench is twisted to an ideal assembly position, namely the twisting of the workbench caused by assembly errors is eliminated, and accurate position data can be obtained.

Description

Technical Field

[0001] The present application belongs to the field of semiconductor manufacturing technology, and in particular, relates to a machine platform for semiconductor testing equipment and semiconductor testing equipment. Background Art

[0002] Scanning electron microscopes use electron beams to observe the microstructure of a sample surface. They are widely used in semiconductor manufacturing and can be used to observe the microstructure of a wafer surface.

[0003] As wafer manufacturing requirements become increasingly stringent, the requirements for SEM detection accuracy are also increasing. The movement accuracy of the workbench used to load samples has a significant impact on SEM measurement.

[0004] One of the main factors affecting the moving accuracy of the workbench is its assembly accuracy. The moving accuracy of the workbench is mainly confirmed by a laser rangefinder. A slight deviation in the installation position of the workbench will cause errors in the data obtained by the laser rangefinder.

[0005] At present, the workbench is mainly manually positioned and assembled by assemblers. The manual positioning and assembly method can easily cause the workbench to twist, that is, the actual assembly position of the workbench is twisted from the ideal assembly position, resulting in large errors in the measured movement position data. Utility Model Content

[0006] The present application provides a machine platform for semiconductor testing equipment and semiconductor testing equipment to solve the technical problem that the existing workbench has a large movement accuracy error due to assembly torsion problems.

[0007] According to one aspect of the present application, a machine platform for semiconductor testing equipment is provided, comprising a machine platform body, a linear moving module, a workbench, and at least one adjusting device. The linear moving module is arranged on the machine platform body; the workbench is used to carry a sample, the workbench is connected to the linear moving module and is arranged to be able to move relative to the machine platform body under the drive of the linear moving module; each adjusting device is used to rotate the workbench to eliminate the torsion of the workbench during the movement.

[0008] In an optional solution of the present application, each adjustment device includes a bracket and a telescopic rod mechanism; the bracket is connected to the linear moving module, and the telescopic rod mechanism is connected to the bracket; the telescopic rod mechanism is arranged facing the workbench and can move toward the workbench to rotate the workbench.

[0009] In an optional solution of the present application, the telescopic rod mechanism is a screw micrometer and includes a telescopic rod, a fixed sleeve and a rotating sleeve. The telescopic rod is inserted into the fixed sleeve, and the rotating sleeve is arranged outside the fixed sleeve and can rotate relative to the fixed sleeve; the telescopic rod is telescoped relative to the fixed sleeve under the rotation of the rotating sleeve to drive the workbench to rotate.

[0010] In an optional solution of the present application, the bracket includes a supporting seat and a fixing seat, the supporting seat is connected to the linear moving module, and the fixing seat is connected to the supporting seat; the telescopic rod mechanism is passed through the fixing seat.

[0011] In an optional solution of the present application, the fixing seat is provided with a through hole and a locking hole, the locking hole is perpendicular to the through hole and connected to the through hole; the telescopic rod mechanism passes through the through hole, and the locking hole is used to pass through the fastening connector to fix the telescopic rod mechanism.

[0012] In an optional solution of the present application, the fixing seat includes an opening block, a hoop block and a screw connection member; the hoop block is connected to the opening block via the screw connection member to cooperate with the opening block to tightly clamp the telescopic rod mechanism.

[0013] In an optional solution of the present application, the workbench is a rectangular workbench, the workbench is spaced apart from the machine body in the Z direction, and each adjustment device is arranged near a corner of the workbench.

[0014] In an optional solution of the present application, the linear moving module includes an X-axis linear moving mechanism and a Y-axis linear moving mechanism, and the Y-axis linear moving mechanism is connected to the X-axis linear moving mechanism; the workbench is connected to one of the X-axis linear moving mechanism and the Y-axis linear moving mechanism, and the other of the X-axis linear moving mechanism and the Y-axis linear moving mechanism is connected to the machine body, so that the workbench can move relative to the machine body in the X-axis and Y-axis directions.

[0015] In an optional solution of the present application, the X-direction linear motion mechanism includes an X-direction guide rail and an X-direction slider, the X-direction guide rail is connected to the machine body, and the X-direction slider is slidably connected to the X-direction guide rail; the Y-direction linear motion mechanism includes a Y-direction guide rail and a Y-direction slider, the Y-direction guide rail is connected to the X-direction slider, and the Y-direction slider is connected to the Y-direction guide rail; the workbench is connected to the Y-direction slider.

[0016] According to another aspect of the present application, a semiconductor testing device is provided, including a scanning electron microscope and the above-mentioned machine platform for semiconductor testing equipment, wherein the machine platform is arranged opposite to the scanning electron microscope and is used for loading samples.

[0017] In summary, the semiconductor testing equipment and the semiconductor testing equipment provided by the present application have at least the following beneficial effects:

[0018] The machine is composed of a workbench, a linear motion module, a machine body, and at least one adjustment device. The workbench can move linearly under the action of the linear motion module to achieve movement relative to the machine body. Furthermore, by adjusting each adjustment device, the workbench can be pushed to twist so as to twist the workbench to an ideal assembly position, that is, the twisting of the workbench caused by assembly errors is eliminated to ensure that accurate position data can be obtained.

[0019] Furthermore, the adjusting device has a telescopic rod mechanism arranged facing the workbench, through which the telescopic rod mechanism can abut against the workbench and provide thrust, thereby realizing rotation of the workbench, that is, forming a torque to eliminate torsion.

[0020] Furthermore, the telescopic rod mechanism may adopt a micrometer screw, which has high precision and can achieve fine-tuning of the torsion error, thereby ensuring the assembly accuracy of the workbench after the torsion is eliminated.

[0021] Furthermore, in the case where the workbench is a rectangular workbench, the adjusting devices are all arranged close to the corners of the workbench, so that a larger force arm can be formed, which facilitates rotation adjustment through the adjusting devices. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the specific implementation of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the specific implementation or the prior art description. Obviously, the drawings described below are some implementations of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0023] Figure 1a A schematic diagram showing that the workbench has not been twisted is presented;

[0024] Figure 1b A schematic diagram showing the twisting of the workbench is presented;

[0025] Figure 2 A partial schematic diagram of a machine provided according to one embodiment of the present application;

[0026] Figure 3 for Figure 2 A schematic diagram of the machine in another perspective;

[0027] Figure 4 for Figure 3 A partial enlarged view of the S in the middle;

[0028] Figure 5a A partial schematic diagram of an adjusting device provided according to one embodiment of the present application;

[0029] Figure 5b It is a partial schematic diagram of an adjustment device provided according to another embodiment of the present application.

[0030] The reference numerals are as follows:

[0031] 100. Machine;

[0032] 110. Workbench;

[0033] 120. Adjustment device;

[0034] 121, bracket; 1211, support seat; 1212, fixing seat; 12121, opening block; 12122, hoop block; 12123, screw connection;

[0035] 122, telescopic rod mechanism; 1221, telescopic rod; 1222, fixed sleeve; 1223, rotating sleeve;

[0036] 130, linear motion module; 131, X-axis linear motion mechanism; 1311, X-axis guide rail; 1312, X-axis slider; 132, Y-axis linear motion mechanism; 1321, Y-axis guide rail; 1322, Y-axis slider;

[0037] 140. Machine body;

[0038] 200, reflector;

[0039] 300. Laser source;

[0040] H1, through hole; H2, locking hole. DETAILED DESCRIPTION

[0041] In this application, if there is a feature defined as "first" or "second" for descriptive purposes only, it cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Features defined as "first" or "second" may explicitly or implicitly include at least one of the defined features. If the description of "plurality" appears, the general meaning is to include at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0042] In this application, unless otherwise clearly specified and limited, the terms such as "installed", "connected", "connected", "fixed" and so on should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection, it can be a direct connection, or it can be an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0043] In the description of this specification, if the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" appear, it means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, unless they are contradictory.

[0044] In order to facilitate understanding of the present solution, the technical problems caused by assembly errors of the workbench 110 in the machine 100 in the prior art will be further described below with reference to the accompanying drawings. Figure 1a A schematic diagram showing that the workbench 110 is not twisted is shown. Figure 1b A schematic diagram of the workbench 110 being twisted is shown. In other words, Figure 1a The workbench 110 in the embodiment is in an ideal assembly position.

[0045] It should be noted that the "X direction", "Y direction" and "Z direction" mentioned in this application are all references to the spatial right-angle system constructed based on the machine 100 provided in this application, among which the "Z direction" is the vertical direction, that is, the up and down direction.

[0046] Please combine Figure 1a and Figure 1b In the prior art, the workbench 110 is generally rectangular and has linear movement freedom in the X direction and the Y direction. Reflectors 200 are provided on the adjacent two side walls of the workbench 110. Laser sources 300 are provided in the X direction and the Y direction of the workbench 110. The laser source 300 can emit laser toward the reflector 200 and collect the reflected laser to obtain the position data of the workbench 110.

[0047] Specifically, the X-direction position data of the workbench 110 can be acquired through the laser source 300 and the reflector 200 in the X-direction, and the Y-direction position data of the workbench 110 can be acquired through the laser source 300 and the reflector 200 in the Y-direction.

[0048] Please refer to Figure 1a As shown, when the workbench 110 is not twisted, that is, in an ideal assembly position, the Y-direction position data will not change during the movement of the workbench 110 along the X-direction. Similarly, the X-direction position data will not change during the movement of the workbench 110 along the Y-direction.

[0049] Please refer to Figure 1bAs shown, when the workbench 110 is twisted, the Y-direction position data changes during the movement of the workbench 110 along the X-direction due to the twisting of the workbench 110. Similarly, the X-direction position data also changes during the movement of the workbench 110 along the Y-direction.

[0050] In other words, when the workbench 110 is twisted, the measured movement position data will be deviated, thereby affecting semiconductor processing and manufacturing.

[0051] In view of the technical problems existing in the prior art described above, one aspect of the present application provides a machine platform 100 for semiconductor testing equipment. Figure 2 FIG. 1 is a partial schematic diagram of a machine 100 provided according to one embodiment of the present application.

[0052] See also Figure 2 The machine 100 includes a workbench 110 , a linear motion module 130 , a machine body 140 and at least one adjustment device 120 .

[0053] The linear motion module 130 is disposed on the machine body 140. The workbench 110 is used to carry the sample, and the workbench 110 is connected to the linear motion module 130 and is configured to move relative to the machine body 140 under the drive of the linear motion module 130. Each adjustment device 120 is used to rotate the workbench 110 to eliminate the torsion of the workbench 110 during the movement.

[0054] In this embodiment, the machine body 140 provides support for other components in the machine 100 , wherein the linear moving module 130 is fixedly mounted on the machine body 140 , the workbench 110 is mounted on the linear moving module 130 , and the workbench 110 is movably connected to the machine body 140 through the linear moving module 130 .

[0055] Specifically, the workbench 110 can move linearly under the action of the linear moving module 130 to achieve movement relative to the machine body 140. Furthermore, the machine 100 also has at least one adjustment device 120, and each adjustment device 120 can be adjusted to push the workbench 110 to twist, so as to twist the workbench 110 to an ideal assembly position, that is, to eliminate the twisting of the workbench 110 caused by assembly errors, so as to ensure that accurate position data can be obtained.

[0056] It should be noted that the above-mentioned torsion during the moving process means that the workbench 110 needs to be moved during the assembly process and a detection device (generally a micrometer, etc.) needs to be used to determine the torsion of the workbench 110.

[0057] In a further optional embodiment, the linear motion module 130 includes an X-axis linear motion mechanism 131 and a Y-axis linear motion mechanism 132 , and the Y-axis linear motion mechanism 132 is connected to the X-axis linear motion mechanism 131 .

[0058] In one of the optional embodiments, see Figure 2 The workbench 110 is connected to the Y-axis linear moving mechanism 132, and the X-axis linear moving mechanism 131 is connected to the machine body 140. In other words, the workbench 110 is installed on the Y-axis linear moving mechanism 132, the Y-axis linear moving mechanism 132 is connected to the X-axis linear moving mechanism 131, and the X-axis linear moving mechanism 131 is fixedly installed on the machine body 140.

[0059] Thus, the worktable 110 has X-direction linear movement freedom and Y-direction linear movement freedom under the action of the X-direction linear movement mechanism 131 and the Y-direction linear movement mechanism 132 , that is, the worktable 110 can move along the X-direction and the Y-direction relative to the machine body 140 .

[0060] In another optional embodiment, the workbench 110 is connected to the X-axis linear moving mechanism 131, and the Y-axis linear moving mechanism 132 is connected to the machine body 140. In other words, the workbench 110 is installed on the X-axis linear moving mechanism 131, the X-axis linear moving mechanism 131 is connected to the Y-axis linear moving mechanism 132, and the Y-axis linear moving mechanism 132 is fixedly installed on the machine body 140.

[0061] Thus, the worktable 110 has X-direction linear movement freedom and Y-direction linear movement freedom under the action of the X-direction linear movement mechanism 131 and the Y-direction linear movement mechanism 132 , that is, the worktable 110 can move along the X-direction and the Y-direction relative to the machine body 140 .

[0062] It can be seen that the workbench 110 can be connected to one of the X-axis linear moving mechanism 131 and the Y-axis linear moving mechanism 132, and the other of the X-axis linear moving mechanism 131 and the Y-axis linear moving mechanism 132 is connected to the machine body 140, so that the workbench 110 can move relative to the machine body 140 along the X-axis and the Y-axis.

[0063] Figure 3 for Figure 2 A schematic diagram of the machine 100 in another perspective. Figure 3 The X-direction linear moving mechanism 131 includes an X-direction guide rail 1311 and an X-direction slider 1312 . The X-direction guide rail 1311 is connected to the machine body 140 , and the X-direction slider 1312 is slidably connected to the X-direction guide rail 1311 .

[0064] The Y-direction linear moving mechanism 132 includes a Y-direction guide rail 1321 and a Y-direction slider 1322. The Y-direction guide rail 1321 is connected to the X-direction slider 1312, and the Y-direction slider 1322 is connected to the Y-direction guide rail 1321. The workbench 110 is connected to the Y-direction slider 1322.

[0065] In this embodiment, the X-direction linear moving mechanism 131 and the Y-direction linear moving mechanism 132 are both guide rail and slider transmission mechanisms. Specifically, the X-direction linear moving mechanism 131 is composed of an X-direction guide rail 1311 and an X-direction slider 1312, wherein the X-direction guide rail 1311 is a linear guide rail extending along the X-direction, and the X-direction slider 1312 is installed on the X-direction guide rail 1311 and can move along the X-direction guide rail 1311.

[0066] The Y-direction linear moving mechanism 132 is composed of a Y-direction guide rail 1321 and a Y-direction slider 1322 . The Y-direction guide rail 1321 is also a linear guide rail and is extended along the Y-direction. The Y-direction slider 1322 is installed on the Y-direction guide rail 1321 and can move along the Y-direction guide rail 1321 .

[0067] It should be understood that the workbench 110 is mounted on the Y-direction slider 1322, and thus can move along the Y-direction guide rail 1321 with the Y-direction slider 1322. In addition, the Y-direction guide rail 1321 is mounted on the X-direction slider 1312, and thus the Y-direction slider 1322 and the workbench 110 can move along the X-direction guide rail 1311 with the Y-direction slider 1312. In this way, the workbench 110 has the X-direction movement freedom and the Y-direction movement freedom.

[0068] It should be noted that the X-axis linear moving mechanism 131 and the Y-axis linear moving mechanism 132 are not limited to guide rail and slider transmission mechanisms, and may also include, for example, a ball screw transmission mechanism, a gear rack transmission mechanism, etc.

[0069] In addition, in the embodiment shown in the figure, both the X-guide rail 1311 and the Y-guide rail 1321 are parallel double rails, which can ensure the stability of the slider during movement.

[0070] In some optional embodiments, there are multiple adjusting devices 120 , which are symmetrically arranged about the Z-direction geometric center line of the workbench 110 , and the extension and retraction directions of each adjusting device 120 are staggered with the Z-direction geometric center line of the workbench 110 .

[0071] In this embodiment, the number of the adjusting devices 120 is not less than 2, and the workbench 110 is driven to rotate by the cooperation of the multiple adjusting devices 120 .

[0072] It should be understood that in order to achieve the goal of being able to push the workbench 110 to rotate, the telescopic direction of each adjustment device 120 cannot fall on the Z-direction geometric center line of the workbench 110, that is, the staggered arrangement. Correspondingly, each adjustment device 120 should be arranged eccentrically, so that the direction of the thrust provided by the adjustment device 120 will not pass through the geometric center of the workbench 110, thereby forming a torsional moment on the workbench 110.

[0073] In addition, the multiple adjustment devices 120 are arranged in a centrally symmetrical manner, so that evenly distributed thrust application points can be formed around the workbench 110 to generate a torsional moment. In this way, the torsional moment generated by the multiple adjustment devices 120 is larger, which makes it easier for assemblers to perform torsional operations.

[0074] Please note that Figure 2 Here, the Z-direction geometric center line of the workbench 110 may refer to a Z-direction extension line passing through the center of the workbench 110 along the Z-direction.

[0075] In a further optional embodiment, the workbench 110 is a rectangular workbench, and the workbench 110 is spaced apart from the machine body 140 in the Z direction. Each adjustment device 120 is disposed near a corner of the workbench 110 .

[0076] In this embodiment, the workbench 110 is a rectangular workbench and is spaced apart from the machine body 140 in the Z direction. Each adjustment device 120 is disposed close to a corner of the workbench 110 , which is conducive to forming a larger torsional moment through each adjustment device 120 .

[0077] It should be noted that, in a specific application, the reflector 200 needs to be fixedly installed on one side wall of the workbench 110 in the X direction and one side wall in the Y direction. Eliminating the twist here means adjusting the parallelism between the side wall of the workbench 110 in the X direction and the X direction to within a suitable range, and adjusting the parallelism between the side wall of the workbench 110 in the Y direction and the Y direction to within a suitable range.

[0078] In the embodiment shown in FIG1 , the number of the adjusting devices 120 is 8, and two adjusting devices 120 are arranged at each of the four corners of the workbench 110, and the two adjusting devices 120 at the same corner are located on two adjacent sides of the workbench 110. It should be noted that the number of the adjusting devices 120 is not limited to the embodiment shown in the figure, and the number can be adjusted appropriately according to needs.

[0079] Figure 4 for Figure 3 A partial enlarged view of the S in the figure. Figure 4Each adjusting device 120 includes a bracket 121 and a telescopic rod mechanism 122. The bracket 121 is connected to the linear moving module 130, and the telescopic rod mechanism 122 is connected to the bracket 121. The telescopic rod mechanism 122 is arranged facing the workbench 110 and can move toward the workbench 110 to rotate the workbench 110.

[0080] In this embodiment, each adjusting device 120 is composed of a bracket 121 and a telescopic rod mechanism 122 , wherein the telescopic rod mechanism 122 is connected to the linear motion module 130 through the bracket 121 and is arranged facing the workbench 110 .

[0081] The telescopic rod mechanism 122 can move toward the workbench 110 and abut against the workbench 110 , thereby providing a thrust to drive the workbench 110 to rotate, so as to eliminate assembly errors caused by torsion of the workbench 110 .

[0082] In a further optional embodiment, the bracket 121 includes a supporting seat 1211 and a fixing seat 1212 , the supporting seat 1211 is connected to the linear moving module 130 , and the fixing seat 1212 is connected to the supporting seat 1211 . The telescopic rod mechanism 122 is disposed through the fixing seat 1212 .

[0083] In this embodiment, the bracket 121 is composed of a support seat 1211 and a fixed seat 1212. The support seat 1211 is used to connect the linear moving module 130. The fixed seat 1212 is installed on the support seat 1211 and is used to fix the telescopic rod mechanism 122 so as to arrange the telescopic rod mechanism 122 on one side of the workbench 110.

[0084] In a specific application, the support seat 1211 can be installed on a side wall of the Y-axis slider 1322 by bolts, and the fixing seat 1212 can be installed on the support seat 1211 by screws. That is, the bracket 121 is a splicing structure and is detachably connected to the linear moving module 130. In this way, after eliminating the torsion of the workbench 110, the bracket 121 can be disassembled to prevent the telescopic rod mechanism 122 and the bracket 121 located outside the workbench 110 from interfering with other peripheral components.

[0085] Figure 5a It is a partial schematic diagram of an adjustment device 120 provided according to one embodiment of the present application. Figure 5b It is a partial schematic diagram of an adjustment device 120 provided according to another embodiment of the present application.

[0086] The telescopic rod mechanism 122 is a micrometer screw and includes a telescopic rod 1221 , a fixed sleeve 1222 and a rotating sleeve 1223 . The telescopic rod 1221 is inserted into the fixed sleeve 1222 , and the rotating sleeve 1223 is externally mounted on the fixed sleeve 1222 and can rotate relative to the fixed sleeve 1222 .

[0087] The telescopic rod 1221 is telescoped relative to the fixed sleeve 1222 under the rotation of the rotating sleeve 1223 to push the workbench 110 to rotate.

[0088] In this embodiment, the telescopic rod mechanism 122 is a micrometer screw. It can be understood that the micrometer screw includes a telescopic rod 1221, a fixed sleeve 1222, and a rotating sleeve 1223. The telescopic rod 1221, the fixed sleeve 1222, and the rotating sleeve 1223 are nested from the inside to the outside, the telescopic rod 1221 and the fixed sleeve 1222 are clearance-matched, and the rotating sleeve 1223 and the telescopic rod 1221 are generally screw-connected and matched, so as to realize the conversion of the rotary input of the rotating sleeve 1223 into the linear extension of the telescopic rod 1221.

[0089] The telescopic rod 1221 can abut against the workbench 110 , and the assembler only needs to rotate the rotating sleeve 1223 to allow the telescopic rod 1221 to push the workbench 110 , thereby causing the workbench 110 to twist.

[0090] In addition, after the assembler assembles the workbench 110 on the corresponding slider, the workbench 110 generally only produces a slight twist, and the movable stroke of the telescopic rod 1221 in the micrometer screw meets the adjustment requirements, and the accuracy of the micrometer screw can reach 0.5μm level, meeting the adjustment accuracy requirements.

[0091] It should be noted that the telescopic rod mechanism 122 is not limited to the micrometer screw, that is, manually adjusted by the micrometer screw. For example, the telescopic rod mechanism 122 can also be an electric push rod, an electric cylinder, etc., and an automatic solution is used for adjustment.

[0092] In a specific application, the fixing seat 1212 is sleeved on the fixing sleeve 1222 in the telescopic rod mechanism 122 , so that the telescopic movement of the telescopic rod 1221 is not affected, and the rotation of the rotating sleeve 1223 is not interfered.

[0093] In an optional embodiment, the fixing seat 1212 is provided with a through hole H1 and a locking hole H2, wherein the locking hole H2 is perpendicular to and connected to the through hole H1. The telescopic rod mechanism 122 passes through the through hole H1, and the locking hole H2 is used to pass a fastening connector to fix the telescopic rod mechanism 122.

[0094] In this embodiment, the fixing seat 1212 is provided with a through hole H1 for allowing the telescopic rod mechanism 122 to pass through and a locking hole H2 for allowing the fastening connector to pass through. Specifically, the through hole H1 is configured to allow the telescopic rod 1221 in the telescopic rod mechanism 122 and part of the fixing sleeve 1222 to pass through, and the fastening connector can pass through the locking hole H1 and abut against the fixing sleeve 1222 to apply pressure to the telescopic rod mechanism 122, thereby fixing the telescopic rod mechanism 122.

[0095] It should be noted that the fastening connectors include, for example, pins, screws, and jackscrews, which can be selected according to needs.

[0096] In another optional embodiment, the fixing seat 1212 includes an opening block 12121 , a hoop block 12122 and a screw connection 12123 . The hoop block 12122 is connected to the opening block 12121 via the screw connection 12123 to cooperate with the opening block 12121 to tightly clamp the telescopic rod mechanism 122 .

[0097] In this embodiment, the fixed seat 1212 is composed of an opening block 12121, a hoop block 12122 and a screw connection 12123. The opening block 12121 is provided with an opening, and the screw connection 12123 cooperates with the hoop block 12122 to achieve the purpose of tightening the telescopic rod mechanism 122 between the opening block 12121 and the hoop block 12122. Specifically, the fixed sleeve 1222 in the telescopic rod mechanism 122 is tightened between the opening block 12121 and the hoop block 12122.

[0098] It should be noted that the threaded connector 12123 here includes, for example, bolts, screws, etc., which can be selected according to needs.

[0099] Another aspect of the present application provides a semiconductor testing device, which includes a scanning electron microscope and the above-mentioned machine platform 100 for semiconductor testing equipment. The machine platform 100 is arranged opposite to the scanning electron microscope and is used to load samples.

[0100] It should be noted that a scanning electron microscope is an electron microscope that uses an electron beam to scan the surface of a sample to obtain image data of the sample surface. It has the advantages of high resolution and high definition and is widely used in semiconductor defect detection. A detailed description will not be given here.

[0101] In this embodiment, the stage 100 is disposed opposite to the SEM, specifically, the SEM and the stage 100 are disposed opposite to each other in the Z direction, and the SEM is located above the stage 100. Thus, the electron beam emitted by the SEM can be incident on the sample loaded on the workbench 110 in the stage 100.

[0102] It should be understood that, since the workbench 110 in the machine 100 eliminates the assembly error caused by torsion, the obtained X-axis position data and Y-axis position data are more accurate, which is conducive to improving the detection accuracy. It should be noted that the sample here can refer to a wafer. Of course, the semiconductor detection equipment also has other beneficial effects brought by the machine 100, which will not be repeated here one by one.

[0103] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Those skilled in the art can change, modify, replace and modify the above embodiments within the scope of the present application.

Claims

1. A machine for semiconductor testing equipment, characterized in that: include: Machine body (140); A linear moving module (130) is disposed on the machine body (140); A workbench (110) for carrying samples, the workbench (110) being connected to the linear motion module (130) and being configured to be movable relative to the machine body (140) under the drive of the linear motion module (130); as well as At least one adjusting device (120), each of the adjusting devices (120) is used to rotate the workbench (110) to eliminate the torsion of the workbench (110) during the movement.

2. The machine platform for semiconductor testing equipment according to claim 1, characterized in that: Each of the adjustment devices (120) comprises a bracket (121) and a telescopic rod mechanism (122); The bracket (121) is connected to the linear moving module (130), and the telescopic rod mechanism (122) is connected to the bracket (121); The telescopic rod mechanism (122) is arranged facing the workbench (110) and is capable of moving toward the workbench (110) to rotate the workbench (110).

3. The machine platform for semiconductor testing equipment according to claim 2, characterized in that: The telescopic rod mechanism (122) is a screw micrometer and comprises a telescopic rod (1221), a fixed sleeve (1222) and a rotating sleeve (1223); the telescopic rod (1221) is inserted into the fixed sleeve (1222); the rotating sleeve (1223) is externally mounted on the fixed sleeve (1222) and can rotate relative to the fixed sleeve (1222); The telescopic rod (1221) is telescoped relative to the fixed sleeve (1222) under the rotation of the rotating sleeve (1223), so as to drive the workbench (110) to rotate.

4. The machine platform for semiconductor testing equipment according to claim 2, characterized in that: The bracket (121) comprises a supporting seat (1211) and a fixing seat (1212), the supporting seat (1211) is connected to the linear moving module (130), and the fixing seat (1212) is connected to the supporting seat (1211); The telescopic rod mechanism (122) is disposed through the fixing seat (1212).

5. The machine platform for semiconductor testing equipment according to claim 4, characterized in that: The fixing seat (1212) is provided with a through hole (H1) and a locking hole (H2), wherein the locking hole (H2) is perpendicular to the through hole (H1) and communicates with the through hole (H1); The telescopic rod mechanism (122) passes through the through hole (H1), and the locking hole (H2) is used to pass a fastening connector to fix the telescopic rod mechanism (122).

6. The machine platform for semiconductor testing equipment according to claim 4, characterized in that: The fixing seat (1212) comprises an opening block (12121), a hoop block (12122) and a screw connection member (12123); The hoop block (12122) is connected to the opening block (12121) via the screw connection (12123) to cooperate with the opening block (12121) to tightly hoop the telescopic rod mechanism (122).

7. The machine platform for semiconductor testing equipment according to any one of claims 1 to 6, characterized in that: The workbench (110) is a rectangular workbench. Each of the adjustment devices (120) is arranged close to a corner of the workbench (110).

8. The machine platform for semiconductor testing equipment according to claim 1, characterized in that: The linear moving module (130) comprises an X-direction linear moving mechanism (131) and a Y-direction linear moving mechanism (132), wherein the Y-direction linear moving mechanism (132) is connected to the X-direction linear moving mechanism (131); The workbench (110) is connected to one of the X-axis linear moving mechanism (131) and the Y-axis linear moving mechanism (132), and the other of the X-axis linear moving mechanism (131) and the Y-axis linear moving mechanism (132) is connected to the machine body (140), so that the workbench (110) can move along the X-axis and the Y-axis relative to the machine body (140).

9. The machine platform for semiconductor testing equipment according to claim 8, characterized in that: The X-direction linear moving mechanism (131) comprises an X-direction guide rail (1311) and an X-direction slider (1312), wherein the X-direction guide rail (1311) is connected to the machine body (140), and the X-direction slider (1312) is slidably connected to the X-direction guide rail (1311); The Y-direction linear moving mechanism (132) comprises a Y-direction guide rail (1321) and a Y-direction slider (1322), wherein the Y-direction guide rail (1321) is connected to the X-direction slider (1312), and the Y-direction slider (1322) is connected to the Y-direction guide rail (1321); The workbench (110) is connected to the Y-direction sliding block (1322).

10. A semiconductor testing device, characterized in that: It comprises a scanning electron microscope and a platform for semiconductor testing equipment according to any one of claims 1 to 9, wherein the platform (100) is arranged opposite to the scanning electron microscope and is used for loading samples.

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