Concentration device for preparing acrylic photoresist

Abstract

The utility model is applicable to the technical field of acrylic acid photoresist production and processing, and provides a concentration device for preparing acrylic acid photoresist, which comprises a bottom tank and a top tank, the bottom tank and the top tank are hemispherical and hollow, the bottom tank and the top tank are matched and connected from bottom to top, one side of the bottom of the bottom tank is provided with a heating box, and the heating box is connected with the heating box. A through pipe is arranged at the top of the top tank in a penetrating mode, an arc-shaped groove is formed in the through pipe, a spherical piston is arranged in the arc-shaped groove, the bottom face of the spherical piston is attached to and seals the inner wall of the arc-shaped groove, an opening is formed in the bottom wall of the arc-shaped groove and communicates with the interior of the top tank, and a sealing cover is arranged at the top of the through pipe. And a pull rope is arranged at the top of the spherical piston. According to the scheme, through mutual cooperation of the through pipe, the arc-shaped groove, the spherical piston, the pull rope and the hopper, the effect of adjusting air pressure can be achieved, acrylic photoresist can be supplemented at any time in the concentration process, and use is greatly facilitated.

Description

Technical Field

[0001] The utility model belongs to the technical field of acrylic acid photoresist production and processing, in particular to a concentrating device for preparing acrylic acid photoresist. Background Art

[0002] Acrylic photoresist is a type of photoresist. In the photolithography process, acrylic photoresist is first coated on the surface of a silicon wafer or other substrate to form a thin film. Then, the light and shadow pattern of the graphic is projected onto the surface of the photoresist through a UV etcher or laser exposure system. Under the action of ultraviolet light, the photosensitizer in the photoresist will undergo chemical changes, allowing the photoresist to retain or remove the desired area during the photolithography process.

[0003] During the production and processing of acrylic photoresist, in order to obtain glue with a certain viscosity, it needs to be concentrated. Most of the existing concentration devices are completed by heating, and the method of adjusting the air pressure inside the entire device is relatively cumbersome and inconvenient. Utility Model Content

[0004] The utility model aims to provide a concentrating device for preparing acrylic photoresist to solve the problems in the above-mentioned background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical scheme: a concentrating device for preparing acrylic photoresist, comprising a bottom tank and a top tank, the bottom tank and the top tank are both hemispherical and hollow inside, the bottom tank and the top tank are matched and connected from bottom to top, a heating box is provided on one side of the bottom of the bottom tank, a through pipe is passed through the top of the top tank, an arc groove is provided inside the through pipe, a spherical piston is provided inside the arc groove, the bottom surface of the spherical piston fits the inner wall of the sealed arc groove, the bottom wall of the arc groove is provided with an opening, the opening is connected with the inside of the top tank, a sealing cover is provided on the top of the through pipe, a pull rope is provided on the top of the spherical piston, the pull rope passes through the sealing cover and extends to the outside, an air outlet pipe is provided on the bottom of the bottom tank, one end of the air outlet pipe is connected to a condensing tank, and a pressure gauge is provided on one side of the top of the top tank.

[0006] Preferably, a hopper is provided on the top of the sealing cover, and a sealing plug is provided on the top of the hopper.

[0007] Preferably, a heating wire is provided inside the heating box.

[0008] Preferably, the free end of the air outlet pipe extends to the interior of the condensation tank and is located above the inner bottom surface of the condensation tank.

[0009] Preferably, a protrusion is provided on the bottom surface of the spherical piston, and the protrusion is matched with the opening.

[0010] The utility model has at least the following beneficial effects:

[0011] The utility model provides a concentrating device for preparing acrylic photoresist. Through the cooperation of a through pipe, an arc groove, a spherical piston, a pull rope and a hopper, it can not only adjust the air pressure, but also replenish the acrylic photoresist at any time during the concentration process, which greatly facilitates use. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a schematic diagram of the internal overall structure of the utility model;

[0013] Figure 2 It is a schematic diagram of the external overall structure of the utility model.

[0014] In the accompanying drawings: 1, bottom tank; 2, top tank; 3, heating box; 4, through pipe; 5, arc groove; 6, spherical piston; 7, protrusion; 8, pull rope; 9, hopper; 10, pressure gauge; 11, outlet pipe; 12, condensation tank; 13, exhaust pipe. DETAILED DESCRIPTION

[0015] The technical solutions in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model.

[0016] Example

[0017] See also Figure 1-2The utility model provides a technical solution: a concentrating device for preparing acrylic photoresist, comprising a bottom tank 1 and a top tank 2, the bottom tank 1 and the top tank 2 are both hemispherical and hollow inside, the bottom tank 1 and the top tank 2 are matched and connected from bottom to top, specifically, the bottom tank 1 is threadedly connected to the top tank 2, a heating box 3 is provided on one side of the bottom of the bottom tank 1, specifically, the heating box 3 is fixedly connected to the bottom tank 1, a through pipe 4 is passed through the top of the top tank 2, specifically, the through pipe 4 is connected to the top tank 2 and is fixedly connected to the top tank 2, an arc groove 5 is provided inside the through pipe 4, specifically, the arc groove 5 is fixedly connected to the through pipe 4, and the arc groove 5 is fixedly connected to the through pipe 4. A spherical piston 6 is provided inside the groove 5, and the bottom surface of the spherical piston 6 fits the inner wall of the sealed arc groove 5. The bottom wall of the arc groove 5 is provided with an opening, which is connected with the interior of the top tank 2. A sealing cover is provided on the top of the through pipe 4. Specifically, the sealing cover is placed on the through pipe 4 and can be picked up. A pull rope 8 is provided on the top of the spherical piston 6, and the pull rope 8 passes through the sealing cover and extends to the outside. Specifically, the pull rope 8 is slidably connected to the sealing cover, and the pull rope 8 is fixedly connected to the spherical piston 6. An air outlet pipe 11 is provided at the bottom of the bottom tank 1, and one end of the air outlet pipe 11 is connected to a condensation tank 12. A pressure gauge 10 is provided on one side of the top of the top tank 2.

[0018] In this embodiment, the acrylic photoresist mixture to be concentrated is poured into the bottom tank 1, and the heating box 3 is started for heating. When the internal air pressure of the bottom tank 1 and the top tank 2 increases and pressure reduction is required, the sealing cover is removed from the through pipe 4, and the spherical piston 6 can be driven to move upward by the pull rope 8, so that the top tank 2 is connected to the outside to release the gas, and then the top tank 2 is sealed, thereby facilitating the adjustment of the air pressure.

[0019] Furthermore, a hopper 9 is provided on the top of the sealing cover, and a sealing plug is provided on the top of the hopper 9.

[0020] In this embodiment, with the sealing cover covering the through pipe 4, the acrylic photoresist is first poured into the hopper 9 and into the arc groove 5, and then the sealing plug is plugged. Then the pull rope 8 is pulled to lift the spherical piston 6, so that the arc groove 5 is connected with the inside of the top tank 2, and the acrylic photoresist enters the bottom tank 1. In this way, acrylic photoresist can be supplemented at any time during the concentration process.

[0021] Furthermore, a heating wire is provided inside the heating box 3. Specifically, the heating wire is connected to a power source and a temperature controller.

[0022] In this embodiment, the concentration is performed by controlling the temperature and heating by the heating wire.

[0023] Furthermore, the free end of the air outlet pipe 11 extends to the interior of the condensation tank 12 and is located above the inner bottom surface of the condensation tank 12 . Specifically, an exhaust pipe 13 is provided on the top of the condensation tank 12 .

[0024] In this embodiment, the water vapor entering the condensation tank 12 encounters the cold tank body of the condensation tank 12 and is condensed into liquid for easy recovery, and the remaining gas can be discharged through the exhaust pipe 13.

[0025] Furthermore, a protrusion 7 is provided on the bottom surface of the spherical piston 6. Specifically, the protrusion 7 and the spherical piston 6 are an integral structure, and the protrusion 7 is matched with the opening.

[0026] In this embodiment, a protrusion 7 is provided to cooperate with the opening to further seal the mixture and facilitate heating and concentration.

[0027] The working principle and use process of the utility model: After the utility model is installed, it works according to the above implementation method until all the working steps are completed.

[0028] The basic principle, main features and advantages of the utility model are shown and described above. For those skilled in the art, it is obvious that the utility model is not limited to the details of the above exemplary embodiments, and the utility model can be implemented in other specific forms without departing from the spirit or basic features of the utility model. Therefore, no matter from which point of view, the embodiments should be regarded as exemplary and non-restrictive. The scope of the utility model is limited by the attached claims rather than the above description. Therefore, it is intended to include all changes within the meaning and scope of the equivalent elements of the claims in the utility model, and any figure marks in the claims should not be regarded as limiting the claims involved.

[0029] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A concentrating device for preparing acrylic photoresist, characterized in that: The invention comprises a bottom tank (1) and a top tank (2), wherein the bottom tank (1) and the top tank (2) are both hemispherical and hollow inside, and the bottom tank (1) and the top tank (2) are connected from bottom to top, and a heating box (3) is provided on one side of the bottom of the bottom tank (1), and a through pipe (4) is passed through the top of the top tank (2), and an arc groove (5) is provided inside the through pipe (4), and a spherical piston (6) is provided inside the arc groove (5), and the bottom surface of the spherical piston (6) is in contact with the sealing arc groove (6). The inner wall of the groove (5), the bottom wall of the arc groove (5) is provided with an opening, the opening is connected with the interior of the top tank (2), the top of the through pipe (4) is provided with a sealing cover, the top of the spherical piston (6) is provided with a pull rope (8), the pull rope (8) passes through the sealing cover and extends to the outside, the bottom of the bottom tank (1) is provided with an air outlet pipe (11), one end of the air outlet pipe (11) is connected to a condensation tank (12), and a pressure gauge (10) is provided on one side of the top of the top tank (2).

2. A concentrating device for preparing acrylic photoresist according to claim 1, characterized in that: A hopper (9) is provided on the top of the sealing cover, and a sealing plug is provided on the top of the hopper (9).

3. A concentrating device for preparing acrylic photoresist according to claim 1, characterized in that: A heating wire is arranged inside the heating box (3).

4. A concentrating device for preparing acrylic photoresist according to claim 1, characterized in that: The free end of the air outlet pipe (11) extends to the interior of the condensation tank (12) and is located above the inner bottom surface of the condensation tank (12).

5. A concentrating device for preparing acrylic photoresist according to claim 1, characterized in that: The bottom surface of the spherical piston (6) is provided with a protrusion (7), and the protrusion (7) is matched with the opening.

Images