Magnetron sputtering sample disc structure

Abstract

The utility model belongs to the technical field of sample discs, and particularly relates to a magnetron sputtering sample disc structure which comprises a baffle and a sample disc body, a rotating shaft is arranged in the center of the sample disc body in a penetrating mode, a fixing plate is fixedly installed on the rotating shaft, and the fixing plate is fixedly connected with the sample disc body through bolts. Square grooves are formed in the sample disc body in an array mode, small grooves are formed in the square grooves, and round grooves corresponding to the square grooves are formed in the back face of the sample disc body. According to the magnetron sputtering sample disc structure, the sample disc body is installed so that samples can be flexibly prepared through the magnetron sputtering sample disc structure, the sample disc body can be driven to rotate when the motor works, the positions of the base plates on the sample disc body can be adjusted, the different base plates move to one side of the through hole to be subjected to film deposition process treatment, and the positions of the small baffles are adjusted; and the small baffle can shield the unique substrate, so that the sputtering state can be selected conveniently, and the continuous component-adjustable sample can be efficiently obtained under the same preparation condition.

Description

Technical Field

[0001] The utility model relates to the technical field of sample discs, in particular to a magnetron sputtering sample disc structure. Background Art

[0002] Magnetron sputtering is a method of controlling high-speed electron flow using a magnetic field. By bringing metal or other solid materials into contact with liquid or gas at high temperature and depositing surface materials under high voltage, magnetron sputtering can generate tiny and precise surfaces, making it an important means of manufacturing high-precision, high-quality products.

[0003] With the advancement of materials science and thin film technology, the demand for efficient preparation of high-throughput composition-regulated thin films is growing. However, traditional magnetron sputtering equipment has limitations in preparing thin film samples with continuous composition changes, which restricts its development in materials research and industrial applications, resulting in insufficient efficiency and flexibility. Utility Model Content

[0004] The utility model aims to provide a magnetron sputtering sample disk structure to solve the technical problems of insufficient efficiency and flexibility proposed in the above background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a magnetron sputtering sample disk structure, comprising a baffle and a sample disk body, a rotating shaft is passed through the center position of the sample disk body, a fixed plate is fixedly installed on the rotating shaft, and the fixed plate is fixedly connected to the sample disk body by bolts, square grooves are arranged in an array on the sample disk body, small grooves are arranged inside the square grooves, and circular grooves corresponding to the square grooves are arranged on the back of the sample disk body, a rotating rod is passed through the baffle, and the rotating rod is fixedly connected to the small baffle, and a through hole is arranged on the baffle, and the through hole is located on one side of the sample disk body.

[0006] Preferably, a connecting rod is fixedly connected to the baffle plate, and the baffle plate is connected to a corresponding position on the top of the sputtering chamber through a thread.

[0007] Preferably, one end of the rotating shaft is fixedly connected to an output end of an external motor.

[0008] Preferably, the circular groove is at a small distance from the small groove on the front side, and the circular groove is used to be connected to the heating device.

[0009] Preferably, a storage groove is fixedly installed on the baffle, and an electric push rod is fixedly installed inside the storage groove.

[0010] Preferably, a strip plate is provided inside the storage groove, and one end of the electric push rod is fixedly connected to the strip plate.

[0011] Preferably, a cleaning plate is fixedly connected to the strip plate, and the cleaning plate is conical.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] 1. The utility model is convenient for the flexible sample preparation of the magnetron sputtering sample tray structure by installing a sample tray body. After the baffle is fixed at the corresponding position on the top of the sputtering chamber, the substrate is placed through the sample tray body. The baffle has only one through hole located below the corresponding substrate to be deposited with a thin film, so that only one substrate can be deposited with a thin film during operation, and substrates at other positions are blocked. The output end of the external motor is fixedly connected to the rotating shaft, and then the rotating shaft is driven to rotate when the motor is working. The rotation of the rotating shaft drives the sample tray body to rotate, and the position of the substrate on the sample tray body can be adjusted, so that different substrates are moved to one side of the through hole for thin film deposition process. The rotating rod is fixedly connected to the output end of the external motor, and the rotation of the rotating rod can be controlled by the motor to be adjusted. The position of the small baffle can block the only substrate, which is convenient for controlling the sputtering state, improving efficiency and flexibility, and realizing efficient acquisition of continuously adjustable samples under the same preparation conditions.

[0014] 2. The utility model is convenient for cleaning the magnetron sputtering sample tray structure by installing a cleaning plate. When cleaning the sample tray body, the electric push rod is operated to push the strip plate to move, and the strip plate moves to drive the cleaning plate to move. After the cleaning plate moves and contacts the sample tray body, the motor works to provide a rotation shaft to rotate, which drives the sample tray body to rotate. When the sample tray body rotates, the cleaning plate can scrape off the impurities adsorbed on the sample tray body, thereby achieving the purpose of improving the cleaning efficiency and facilitating the cleaning of the sample tray body. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0016] Figure 2 This is a schematic diagram of the baffle structure of the utility model;

[0017] Figure 3 This is a schematic diagram of the structure of the sample tray body of the utility model;

[0018] Figure 4 It is a schematic diagram of the through hole structure of the utility model;

[0019] Figure 5 This is a schematic diagram of the storage slot structure of the utility model.

[0020] In the figure: 1. baffle; 2. sample tray body; 3. fixed plate; 4. rotating shaft; 5. square groove; 6. small groove; 7. connecting rod; 8. circular groove; 9. through hole; 10. rotating rod; 11. small baffle; 12. storage slot; 13. electric push rod; 14. strip plate; 15. cleaning plate. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0022] See also Figure 1 - Figure 4A magnetron sputtering sample disk structure comprises a baffle plate 1 and a sample disk body 2, a rotating shaft 4 is passed through the center of the sample disk body 2, a fixing plate 3 is fixedly mounted on the rotating shaft 4, and the fixing plate 3 is fixedly connected to the sample disk body 2 by bolts, a square groove 5 is arranged in an array on the sample disk body 2, a small groove 6 is arranged inside the square groove 5, a circular groove 8 corresponding to the square groove 5 is arranged on the back of the sample disk body 2, a rotating rod 10 is passed through the baffle plate 1, a small baffle plate 11 is fixedly connected to the rotating rod 10, a through hole 9 is arranged on the baffle plate 1, and the through hole 9 is located at the sample disk body 2, when using the magnetron sputtering sample plate structure, the diameter of the sample plate body 2 should be about half of the sputtering chamber. The diameter of the sputtering chamber in the laboratory is 500mm, so the diameter of the sample plate is 240mm and the thickness is 10mm. The square groove 5 can fix the square sample. A small circular groove with a radius slightly smaller than the radius of the groove is drilled at the bottom of the square groove 5, that is, the small groove 6. The small groove 6 should be shallower and used to place the substrate. The commonly used substrate is a 20×20mm square style, so the diameter of the small groove 6 is 40mm and the depth is 2mm. The small groove 6 is drilled around and has Several threads are used to place and fix the substrate device. The threads around the small groove 6 are M3, the hole depth is 2mm, and the thread depth is 1mm. After fixing the baffle 1 at the corresponding position on the top of the sputtering chamber, place the substrate through the sample tray body 2. The baffle 1 has only one through hole 9 located below the corresponding substrate to be deposited with a thin film, ensuring that only one substrate can be deposited with a thin film during operation, and the substrates at other positions are blocked. The output end of the external motor is fixedly connected to the rotating shaft 4, and then the rotating shaft 4 will be driven to rotate when the motor is working. The rotation of the rotating shaft 4 will drive the sample tray body 2 to rotate, and the sample tray body can be adjusted. The position of the substrate on the body 2 is adjusted so that different substrates are moved to one side of the through hole 9 for thin film deposition process. The rotating rod 10 is fixedly connected to the output end of the external motor. The rotating rod 10 can be controlled to rotate by the motor, and then the position of the small baffle 11 is adjusted. The small baffle 11 can block the only substrate, which is convenient for selecting the sputtering state, improving efficiency and flexibility, and realizing efficient acquisition of continuous composition adjustable samples under the same preparation conditions. The position where the substrate is placed in the sample tray body 2 can accommodate substrates of two sizes: 10mm×20mm×2mm and 10mm×10mm×2mm.

[0023] See also Figure 1 and Figure 2 A connecting rod 7 is fixedly connected to the baffle 1, and the baffle 1 is connected to the corresponding position of the top of the sputtering chamber through a thread. The connecting rod 7 can be used to fix and support the position of the baffle 1.

[0024] See also Figure 1 and Figure 3One end of the rotating shaft 4 is fixedly connected to the output end of the external motor. The motor can adjust the position of the sample tray body 2 through the rotating shaft 4. The distance between the circular groove 8 and the small groove 6 on the front side is small. The circular groove 8 is used to connect with the heating device.

[0025] See also Figure 2 A storage groove 12 is fixedly installed on the baffle 1, and an electric push rod 13 is fixedly installed inside the storage groove 12. The baffle 1 provides an installation space for the storage groove 12, and the storage groove 12 provides an installation space for the electric push rod 13.

[0026] See also Figure 4 and Figure 5 A strip plate 14 is provided inside the storage groove 12, and one end of the electric push rod 13 is fixedly connected to the strip plate 14, and a cleaning plate 15 is fixedly connected to the strip plate 14. The cleaning plate 15 is conical and made of rubber. When the sample tray body 2 is cleaned, the electric push rod 13 is operated to push the strip plate 14 to move, and the strip plate 14 moves to drive the cleaning plate 15 to move. After the cleaning plate 15 moves and contacts with the sample tray body 2, the motor works to provide the rotation shaft 4 to rotate, which drives the sample tray body 2 to rotate. The sample tray body 2 rotates, and the cleaning plate 15 can scrape off the impurities adsorbed on the sample tray body 2, thereby achieving the purpose of improving the cleaning efficiency and facilitating the cleaning of the sample tray body 2.

[0027] Working principle: first, when using the magnetron sputtering sample disk structure, fix the baffle 1 at the corresponding position on the top of the sputtering chamber, and then place the substrate through the sample disk body 2. The baffle 1 has only one through hole 9 located below the corresponding substrate to be deposited with a thin film, ensuring that only one substrate can be deposited with a thin film during operation, and substrates at other positions are blocked. The output end of the external motor is fixedly connected to the rotating shaft 4, and then the rotating shaft 4 is driven to rotate when the motor is working. The rotation of the rotating shaft 4 will drive the sample disk body 2 to rotate, and the position of the substrate on the sample disk body 2 can be adjusted to move different substrates to the side of the through hole 9 for thin film deposition process. The rotating rod 10 is fixedly connected to the output end of the external motor, and the rotating rod 10 can be controlled to rotate by the motor. The position of the small baffle 11 is adjusted. The small baffle 11 can cover the only substrate, which is convenient for selecting the sputtering state, improving efficiency and flexibility, and realizing efficient acquisition of continuous composition adjustable samples under the same preparation conditions. The cleaning plate 15 is made of rubber. When the sample tray body 2 is cleaned, the electric push rod 13 is operated to push the strip plate 14 to move. When the strip plate 14 moves, it drives the cleaning plate 15 to move. After the cleaning plate 15 moves and contacts with the sample tray body 2, the motor works to provide the rotation shaft 4 to rotate, which drives the sample tray body 2 to rotate. The sample tray body 2 rotates, and the cleaning plate 15 can scrape off the impurities adsorbed on the sample tray body 2, thereby achieving the purpose of improving the cleaning efficiency and facilitating the cleaning of the sample tray body 2.

[0028] It is obvious to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be regarded as exemplary and non-restrictive from any point of view, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention. Any reference numeral in a claim should not be regarded as limiting the claim to which it relates.

Claims

1. A magnetron sputtering sample tray structure, comprising a baffle (1) and a sample tray body (2), characterized in that: A rotating shaft (4) is provided at the center of the sample tray body (2), a fixing plate (3) is fixedly mounted on the rotating shaft (4), and the fixing plate (3) is fixedly connected to the sample tray body (2) by bolts, square grooves (5) are arranged in an array on the sample tray body (2), small grooves (6) are arranged inside the square grooves (5), and a circular groove (8) corresponding to the square grooves (5) is arranged on the back of the sample tray body (2), a rotating rod (10) is provided on the baffle plate (1), and a small baffle plate (11) is fixedly connected to the rotating rod (10), and a through hole (9) is arranged on the baffle plate (1), and the through hole (9) is located on one side of the sample tray body (2).

2. A magnetron sputtering sample disk structure according to claim 1, characterized in that: A connecting rod (7) is fixedly connected to the baffle plate (1), and the baffle plate (1) is connected to a corresponding position on the top of the sputtering chamber via a thread.

3. The magnetron sputtering sample disk structure according to claim 2, characterized in that: One end of the rotating shaft (4) is fixedly connected to the output end of an external motor.

4. The magnetron sputtering sample disk structure according to claim 3, characterized in that: The circular groove (8) is at a small distance from the front small groove (6), and the circular groove (8) is used to be connected to a heating device.

5. The magnetron sputtering sample disk structure according to claim 4, characterized in that: A storage groove (12) is fixedly mounted on the baffle (1), and an electric push rod (13) is fixedly mounted inside the storage groove (12).

6. The magnetron sputtering sample disk structure according to claim 5, characterized in that: A strip plate (14) is arranged inside the storage groove (12), and one end of the electric push rod (13) is fixedly connected to the strip plate (14).

7. The magnetron sputtering sample disk structure according to claim 6, characterized in that: A cleaning plate (15) is fixedly connected to the strip plate (14), and the cleaning plate (15) is conical.

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