Air inlet device of silicon epitaxy equipment

Abstract

The utility model relates to an air inlet device of silicon epitaxy equipment, which comprises a silicon epitaxy equipment body, an air inlet mechanism is arranged at the top of the silicon epitaxy equipment body, a pollution discharge component is arranged outside the silicon epitaxy equipment body, and the air inlet mechanism comprises a box body fixedly connected with the silicon epitaxy equipment body. A filtering bin and a drying bin are arranged in the box body, and the box body is fixedly connected with an air inlet fan and a cold air pipe. According to the air inlet device of the silicon epitaxy equipment, by arranging the air inlet mechanism, filtering and drying functions are added to the air inlet device of the silicon epitaxy equipment, impurities in air can be conveniently filtered, water vapor in cold air is reduced, the silicon epitaxy effect of the silicon epitaxy equipment is improved, and the problems that air is fed through an air inlet pipeline, the filtering function is not achieved, and the service life of the silicon epitaxy equipment is prolonged are solved. The problems that in the gas inlet process of the silicon epitaxy equipment, gas is inconvenient to filter and dry, impurities and water vapor are likely to enter the silicon epitaxy equipment, and the silicon epitaxy effect of the silicon epitaxy equipment is affected are solved.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon epitaxial equipment, in particular to an air inlet device of silicon epitaxial equipment. Background Art

[0002] The silicon epitaxial process requires the deposition and growth of a layer of single-crystal silicon with uniform thickness and resistivity on a silicon wafer substrate. The reaction chamber rack of the silicon epitaxial equipment is used to install the silicon epitaxial reaction chamber, as well as the water system, gas system, electrical system, etc. that assist the silicon epitaxial reaction. The reaction temperature of the silicon epitaxial process reaches 1150 degrees Celsius, and process gases such as hydrogen and silane are required. Among them, the gas system is required to supply gas; the water cooling system is required to provide circulating cooling water for the reaction chamber; and the electrical system is required to provide power.

[0003] Please refer to the announcement number CN216919484U, which is a reaction chamber structure of a silicon epitaxial equipment, including an installation cabinet, wherein the installation cabinet is provided with a gas system installation chamber, a water system installation chamber, an electrical system installation chamber and a reaction chamber installation chamber for installing the reaction chamber, wherein the gas system installation chamber, the water system installation chamber and the electrical system installation chamber are arranged on one side of the reaction chamber installation chamber, and the gas system installation chamber and the water system installation chamber are arranged on the rear side of the electrical system installation chamber, and relatively independent gas system installation chamber, water system installation chamber, electrical system installation chamber and reaction chamber installation chamber for installing the reaction chamber are provided, and the layout of each functional system chamber is reasonable to reduce mutual interference between the gas system, the water system and the electrical system, and the water system installation chamber is arranged below the gas system installation chamber to avoid water leakage affecting the normal operation of other functional systems and ensure the smooth progress of the silicon epitaxial reaction in the reaction chamber.

[0004] However, in this patent, air is taken in through an air inlet duct which does not have a filtering function. During the air intake process of the silicon epitaxial device, it is not convenient to filter and dry the gas, which may easily cause impurities and water vapor to enter the interior of the silicon epitaxial device, thus affecting the silicon epitaxial effect of the silicon epitaxial device. Utility Model Content

[0005] In view of the shortcomings of the prior art, the utility model provides an air inlet device for silicon epitaxial equipment, which has the advantages of filtering, drying, dust collection and anti-blocking, and solves the problem that air is taken in through an air inlet duct without filtering function, and it is inconvenient to filter and dry the gas during the air intake process of the silicon epitaxial equipment, which easily causes impurities and water vapor to enter the interior of the silicon epitaxial equipment, affecting the silicon epitaxial effect of the silicon epitaxial equipment.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an air inlet device of a silicon epitaxial device, comprising a silicon epitaxial device body, an air inlet mechanism is arranged on the top of the silicon epitaxial device body, and a sewage discharge component is arranged outside the silicon epitaxial device body;

[0007] The air intake mechanism includes a box body fixedly connected to the main body of the silicon epitaxial equipment, a filter bin and a drying bin are arranged inside the box body, an air intake fan and a cold air duct are fixedly connected to the box body, a filter screen is fixedly connected to the inside of the filter bin, the filter bin has an internal movably installed and cleaning component, a collection box is fixedly connected to the left side of the box body, a suction fan is fixedly connected to the left side of the collection box, a dust suction pipe fixedly connected to the box body is fixedly connected to the top of the collection box, a first activated carbon plate is plugged into the inside of the filter bin, and a drying plate and a second activated carbon plate are plugged into the inside of the drying bin.

[0008] Furthermore, two air inlet holes are provided at the bottom of the box body, the air inlet fan is connected with the filter bin through the air inlet hole, and the cold air duct is connected with the drying bin through the air inlet hole.

[0009] Furthermore, a dust suction port is provided on the left side of the box body, and the dust suction pipe is connected with the filter bin through the dust suction port.

[0010] Furthermore, a suction port corresponding to the position of the suction fan is opened on the left inner wall of the collection box, and a screen is fixedly installed inside the suction port.

[0011] Furthermore, plug blocks are fixedly connected to both left and right sides of the first activated carbon plate, and the first activated carbon plate is plugged into the box body through the plug blocks.

[0012] Furthermore, a slot is provided inside the box, and the drying plate and the second activated carbon plate are plugged into the box through the slot.

[0013] Furthermore, the sewage discharge assembly includes a glass window fixedly connected to the collection box, and a sewage discharge valve is fixedly connected to the left side of the collection box.

[0014] Furthermore, a sewage outlet is provided on the left side of the collecting box, and the sewage outlet valve is connected with the collecting box through the sewage outlet.

[0015] Compared with the prior art, the technical solution of this application has the following beneficial effects:

[0016] 1. The air inlet device of the silicon epitaxial equipment adds filtering and drying functions to the air inlet device of the silicon epitaxial equipment by setting an air inlet mechanism, which is convenient for filtering impurities and water vapor in the gas, reducing water vapor in the cold air, and improving the silicon epitaxial effect of the silicon epitaxial equipment. It solves the problem that the air is taken in through the air inlet duct without the filtering function. During the air intake process of the silicon epitaxial equipment, it is inconvenient to filter and dry the gas, which easily causes impurities and water vapor to enter the interior of the silicon epitaxial equipment, affecting the silicon epitaxial effect of the silicon epitaxial equipment.

[0017] 2. The air inlet device of the silicon epitaxial device is provided with a sewage discharge component, which facilitates the discharge and cleaning of dust and impurities, and is convenient for users to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a cross-sectional view of the structure of the utility model;

[0019] Figure 2 This is a front view of the box structure of the utility model;

[0020] Figure 3 This is a three-dimensional diagram of the collection box structure of the utility model.

[0021] In the figure: 1. Silicon epitaxial equipment body; 2. Box body; 201. Filter chamber; 202. Drying chamber; 3. Intake fan; 4. Cold air duct; 5. Filter; 6. Cleaning component; 7. Dust suction pipe; 8. Collection box; 9. Suction fan; 10. First activated carbon plate; 11. Drying plate; 12. Second activated carbon plate; 13. Glass window; 14. Drain valve. DETAILED DESCRIPTION

[0022] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0023] See also Figure 1-3 In this embodiment, an air inlet device of a silicon epitaxial device includes a silicon epitaxial device body 1, an air inlet mechanism is arranged on the top of the silicon epitaxial device body 1, and a sewage discharge component is arranged outside the silicon epitaxial device body 1.

[0024] Embodiment 1: The air intake mechanism includes a box body 2 fixedly connected to the silicon epitaxial equipment body 1, and a filter chamber 201 and a drying chamber 202 are arranged inside the box body 2. An air intake fan 3 and a cold air duct 4 are fixedly connected to the box body 2. Two air intake holes are opened at the bottom of the box body 2. The air intake fan 3 is connected with the filter chamber 201 through the air intake holes, and the cold air duct 4 is connected with the drying chamber 202 through the air intake holes. The other end of the air intake fan 3 is fixedly connected to the air supply component. The air intake fan 3 is powered on and rotates to transport gas to the interior of the filter chamber 201. The other end of the cold air duct 4 is fixedly connected to the cold air transport component, and the cold air is transported to the interior of the drying chamber 202 through the cold air duct 4.

[0025] Among them, a filter screen 5 is fixedly connected to the inside of the filter bin 201, and a cleaning component 6 is movably installed inside the filter bin 201. The cleaning component 6 includes a driving motor, a screw rod, a sliding seat and a cleaning brush. The driving motor is fixedly connected to the left side of the box body 2, the screw rod is fixedly connected to the output end of the driving motor, the sliding seat is threadedly connected to the outside of the screw rod, the cleaning brush is fixed to the bottom of the sliding seat, the cleaning brush is adapted to the box body 2, and the cleaning brush is tightly fitted to the filter screen 5. A collecting box 8 is fixedly connected to the left side of the box body 2, and a suction fan 9 is fixedly connected to the left side of the collecting box 8. An air suction port corresponding to the position of the suction fan 9 is opened on the left inner wall of the collecting box 8, and a screen is fixedly installed inside the air suction port to facilitate the suction fan 9 to discharge the gas inside the collecting box 8, and the screen filters out impurities and dust in the gas, so that the dust and impurities are deposited in the bottom space of the collecting box 8.

[0026] Among them, a dust suction port is opened on the left side of the box body 2, and the dust suction pipe 7 is connected with the filter bin 201 through the dust suction port. The dust suction port is located at the top of the filter screen 5. The cleaning component 6 cleans the filter screen 5 to reduce the clogging of the filter screen 5 by dust and impurities. The suction fan 9 is energized to make the inside of the collection box 8 and the dust suction pipe 7 in a negative pressure state, and the cleaned dust and impurities are fixedly connected to the left and right sides of the first activated carbon plate 10 with plug-ins. The first activated carbon plate 10 is plugged into the box body 2 through the plug-in block. The filter screen 5 filters the gas entering the filter bin 201, and the first activated carbon plate 10 adsorbs the filtered gas to reduce impurities in the gas, improve the air intake quality of the silicon epitaxial equipment body 1, and suck it into the collection box 8.

[0027] Among them, the top of the collecting box 8 is fixedly connected with a dust suction pipe 7 fixedly connected to the box body 2, the interior of the filter bin 201 is plugged with a first activated carbon plate 10, the interior of the drying bin 202 is plugged with a drying plate 11 and a second activated carbon plate 12, and a slot is opened inside the box body 2. The drying plate 11 and the second activated carbon plate 12 are both plugged with the box body 2 through the slot, which is convenient for disassembly and assembly of the drying plate 11 and the second activated carbon plate 12. The interior of the drying plate 11 is filled with drying cotton, and the cold air entering the drying bin 202 is dried by the drying plate 11 and the second activated carbon plate 12 to reduce the water vapor in the cold air, so as to facilitate the cold air to cool the interior of the silicon epitaxial equipment body 1.

[0028] It should be noted that by setting up an air intake mechanism, a filtering and drying function is added to the air intake device of the silicon epitaxial equipment, which facilitates the filtering of impurities and in the gas, reduces water vapor in the cold air, and improves the silicon epitaxial effect of the silicon epitaxial equipment. It solves the problem that the air intake is carried out through the air intake duct without a filtering function. During the air intake process of the silicon epitaxial equipment, it is inconvenient to filter and dry the gas, which easily causes impurities and water vapor to enter the interior of the silicon epitaxial equipment, affecting the silicon epitaxial effect of the silicon epitaxial equipment.

[0029] Specifically, when the silicon epitaxial device is in use, the air intake fan 3 is powered on and rotated to transport the gas to the inside of the filter bin 201, and the cold air is transported to the inside of the drying bin 202 through the cold air pipe 4. The filter 5 filters the gas entering the inside of the filter bin 201, and the first activated carbon plate 10 adsorbs the filtered gas to reduce impurities in the gas. The drying plate 11 and the second activated carbon plate 12 dry the cold air entering the drying bin 202 to reduce water vapor in the cold air. The filtered gas and dry cold air enter the inside of the silicon epitaxial device body 1. At the same time, the cleaning component 6 cleans the filter 5 to reduce the blockage of the filter 5 by dust and impurities. The suction fan 9 is powered on to put the inside of the collection box 8 and the dust suction pipe 7 in a negative pressure state, and the cleaned dust and impurities are sucked into the inside of the collection box 8, thereby facilitating the filtering of the gas, reducing water vapor in the cold air, and improving the silicon epitaxial effect of the silicon epitaxial device.

[0030] Example 2: Please refer to Figure 1-3 The sewage discharge component includes a glass window 13 fixedly connected to the collection box 8, a sewage discharge valve 14 is fixedly connected to the left side of the collection box 8, a sewage discharge port is opened on the left side of the collection box 8, the sewage discharge valve 14 is connected to the collection box 8 through the sewage discharge port, the inner bottom wall of the collection box 8 is set as an inclined surface, the sewage discharge valve 14 is opened, and the dust and impurities inside the collection box 8 are affected by gravity and discharged through the sewage discharge valve 14, which is convenient for users to clean the dust and impurities.

[0031] It should be noted that by providing a sewage discharge component, it is convenient to discharge and clean dust and impurities, which is convenient for users.

[0032] Specifically, during the use of the silicon epitaxial device, the drain valve 14 is opened, and the dust and impurities inside the collection box 8 are affected by gravity and discharged through the drain valve 14, which is convenient for the user to clean the dust and impurities.

[0033] The working principle of the above embodiment is:

[0034] (1) The air inlet device of the silicon epitaxial device, when the silicon epitaxial device is in use, the air inlet fan 3 is powered on and rotated to transport the gas to the inside of the filter chamber 201, and the cold air is transported to the inside of the drying chamber 202 through the cold air pipe 4. The filter 5 filters the gas entering the inside of the filter chamber 201, and the first activated carbon plate 10 adsorbs the filtered gas to reduce impurities in the gas. The drying plate 11 and the second activated carbon plate 12 dry the cold air entering the drying chamber 202 to reduce water vapor in the cold air. The filtered gas and the dry cold air enter the inside of the silicon epitaxial device body 1. At the same time, the cleaning component 6 cleans the filter 5 to reduce the clogging of the filter 5 by dust and impurities. The suction fan 9 is powered on to make the inside of the collection box 8 and the dust suction pipe 7 in a negative pressure state, and the cleaned dust and impurities are sucked into the inside of the collection box 8, thereby facilitating the filtering of the gas, reducing the water vapor in the cold air, and improving the silicon epitaxial effect of the silicon epitaxial device.

[0035] (2) The air inlet device of the silicon epitaxial device is used. When the silicon epitaxial device is used, the drain valve 14 is opened, and the dust and impurities inside the collection box 8 are affected by gravity and discharged through the drain valve 14, which is convenient for the user to clean the dust and impurities.

[0036] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0037] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An air inlet device for a silicon epitaxial device, comprising a silicon epitaxial device body (1), characterized in that: An air intake mechanism is arranged on the top of the silicon epitaxial device body (1), and a sewage discharge component is arranged outside the silicon epitaxial device body (1); The air intake mechanism comprises a box body (2) fixedly connected to the silicon epitaxial device body (1), a filter chamber (201) and a drying chamber (202) are arranged inside the box body (2), an air intake fan (3) and a cold air pipe (4) are fixedly connected to the box body (2), a filter screen (5) is fixedly connected to the inside of the filter chamber (201), a movable installation and cleaning component (6) is installed inside the filter chamber (201), a collection box (8) is fixedly connected to the left side of the box body (2), a suction fan (9) is fixedly connected to the left side of the collection box (8), a dust suction pipe (7) fixedly connected to the box body (2) is fixedly connected to the top of the collection box (8), a first activated carbon plate (10) is plugged into the inside of the filter chamber (201), and a drying plate (11) and a second activated carbon plate (12) are plugged into the inside of the drying chamber (202).

2. The gas inlet device of a silicon epitaxial device according to claim 1, characterized in that: The bottom of the box body (2) is provided with two air inlet holes, the air inlet fan (3) is connected to the filter bin (201) through the air inlet holes, and the cold air pipe (4) is connected to the drying bin (202) through the air inlet holes.

3. The gas inlet device of a silicon epitaxial device according to claim 1, characterized in that: A dust suction port is provided on the left side of the box body (2), and the dust suction pipe (7) is connected to the filter bin (201) through the dust suction port.

4. The gas inlet device of a silicon epitaxial device according to claim 1, characterized in that: The left inner wall of the collection box (8) is provided with an air suction port corresponding to the position of the suction fan (9), and a screen is fixedly installed inside the air suction port.

5. The gas inlet device of silicon epitaxial equipment according to claim 1, characterized in that: Insertion blocks are fixedly connected to both left and right sides of the first activated carbon plate (10), and the first activated carbon plate (10) is plugged into the box body (2) via the insertion blocks.

6. The gas inlet device of silicon epitaxial equipment according to claim 1, characterized in that: A slot is provided inside the box body (2), and the drying plate (11) and the second activated carbon plate (12) are plugged into the box body (2) through the slot.

7. The gas inlet device of silicon epitaxial equipment according to claim 1, characterized in that: The sewage discharge assembly comprises a glass window (13) fixedly connected to the collection box (8), and a sewage discharge valve (14) is fixedly connected to the left side of the collection box (8).

8. The gas inlet device of silicon epitaxial equipment according to claim 7, characterized in that: A sewage outlet is provided on the left side of the collecting box (8), and the sewage outlet valve (14) is connected to the collecting box (8) through the sewage outlet.

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