Intensive silicon wafer conveying streamline and silicon wafer detecting and sorting equipment

Abstract

The utility model relates to the technical field of silicon wafer conveying, in particular to an intensive silicon wafer conveying streamline and silicon wafer detecting and sorting equipment, which comprises a conveying line substrate assembly, an idle wheel assembly, a belt driving device, two conveying belts and a double-belt self-cleaning assembly, the double-belt self-cleaning assembly is further arranged at the bottom of the conveying line base plate assembly, the double-belt self-cleaning assembly comprises two brush wheels, and brushes on the two brush wheels make contact with the outer surfaces of the two conveying belts correspondingly. The conveyor belt cleaning device has a belt self-cleaning function, and dirt on the conveyor belt can be automatically cleaned without shutdown.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon wafer conveying, in particular to an intensive silicon wafer conveying streamline and silicon wafer detection and sorting equipment. Background Art

[0002] As an important raw material for solar cells, silicon wafers are widely used in the production of solar cells, circuit boards and other products. In the production process of silicon wafers, silicon wafer sorting machines, as terminal equipment for quality control, detect and grade silicon wafers in terms of size, dirt, cracks, holes, resistivity, etc., to ensure the quality of solar cells, circuit boards and other products made from silicon wafers.

[0003] Silicon wafer inspection and sorting equipment (or silicon wafer sorter) generally consists of three parts: loading, detection and unloading sorting. The silicon wafer is loaded by the feeder and flows through each inspection station through the belt conveyor line to detect various defects of the silicon wafer, and finally transmitted to the corresponding material box through the belt conveyor line. In normal production, there are factors such as dust and dirt in the production workshop, and the belt powder, silicon powder, etc. generated by friction will cause the silicon wafer surface to stick to dust and dirt when the silicon wafer is transported on the conveyor line, resulting in misjudgment and affecting the quality of the silicon wafer. At present, the cleaning method for the dust and dirt is mainly through manual cleaning, but manual cleaning requires downtime, which affects production efficiency and consumes a lot of manpower and material resources. This application focuses on the conveying flow line with a cleaning function of the silicon wafer sorter to automatically clean the dirt on the conveyor belt. Utility Model Content

[0004] The utility model aims to provide an intensive silicon wafer conveying streamline, which has a belt self-cleaning function and can automatically clean dirt on the conveying belt without stopping the machine.

[0005] Another object of the utility model is to provide a conveyor belt having a self-cleaning function, which can automatically clean dirt on the conveyor belt without stopping the machine.

[0006] The technical solution of the utility model is achieved in this way:

[0007] An intensive silicon wafer conveying flow line, comprising a conveying line substrate assembly, an idler assembly, a belt drive device, two conveying belts, and a double-belt self-cleaning assembly;

[0008] The belt drive device comprises a base, a transmission shaft, a transmission assembly, a belt drive motor and a driving wheel; the base is fixedly arranged at the bottom of the conveyor line substrate assembly, a mounting groove is provided on the base, the transmission shaft is passed through the mounting groove along the left and right directions, and the left and right parts of the transmission shaft are rotatably connected to the base through bearings respectively, the driving wheels are respectively installed at both ends of the transmission shaft, and the output shaft of the belt drive motor is transmission-connected to the transmission shaft through the transmission assembly;

[0009] The idler wheel assembly is respectively arranged on the left and right sides of the conveyor line substrate assembly, and the idler wheel assembly includes a plurality of idler wheels, and the idler wheels are rotatably connected with the conveyor line substrate assembly through idler wheel shafts. The idler wheel assembly on the left and the driving wheel on the left are jointly installed with one conveyor belt, and the idler wheel assembly on the right and the driving wheel on the right are jointly installed with another conveyor belt;

[0010] The double-belt self-cleaning assembly is also arranged at the bottom of the conveyor line substrate assembly. The double-belt self-cleaning assembly includes two brush wheels. The brushes on the two brush wheels are in contact with the outer surfaces of the two conveyor belts respectively.

[0011] Furthermore, the double-belt self-cleaning assembly also includes a mounting frame, a mounting shaft and a magnetic block. The mounting frame is fixed to the bottom of the conveyor line substrate assembly by bolts. Both ends of the mounting frame are respectively provided with a first long hole, and the length direction of the first long hole is a vertical direction. The brush wheel is installed at one end of the mounting shaft, and the magnetic block adsorbs and fixes the mounting shaft. The other end of the mounting shaft is a screw structure, and the mounting shaft is fixed to the first long hole by tightening the screw and generating friction with the inner wall of the first long hole.

[0012] Furthermore, the mounting frame is U-shaped, and comprises a mounting plate in the middle and ear plates arranged on both sides of the mounting plate, and the ear plates are provided with the first elongated hole.

[0013] Further, the conveyor line substrate assembly includes a main substrate, a detection station substrate and a belt support strip, the detection station substrate is arranged on the front side of the main substrate, and the main substrate and the detection station substrate are fixedly connected by a plurality of bolts, the belt support strips are arranged on the left and right sides of the main substrate respectively, and the belt support strips are used to support the conveyor belt on the main substrate;

[0014] A detection position avoidance gap is formed between the main substrate and the detection station substrate. When the conveyor belt passes through the detection position avoidance gap, it bypasses under the detection position avoidance gap.

[0015] Furthermore, at least one detection position avoidance gap is formed on the detection position substrate, and when the conveyor belt passes through any detection position avoidance gap, it bypasses under the detection position avoidance gap.

[0016] Further, the front and rear ends of the main substrate are respectively provided with idler wheel mounting seats, and the idler wheels are respectively mounted on the left and right ends of the idler wheel mounting seats;

[0017] The idler wheel mounting seat is arranged at the bottom of the main base plate, and at least two first threaded holes and at least one second threaded hole are respectively arranged on the idler wheel mounting seat, and at least two through holes are arranged on the main base plate, and the through holes are arranged one-to-one with the first threaded holes, and a first connecting bolt passes through the through hole and is threadedly connected with the first threaded hole, and a gap is left between the head of the first connecting bolt and the main base plate; a lifting screw is installed in the second threaded hole, and the main base plate can be lifted by screwing the lifting screw;

[0018] Alternatively, the idler wheel mounting seat is provided with at least two second elongated holes along the front-to-back direction, the length direction of the second elongated holes is the vertical direction, the front end face and the rear end face of the main substrate are respectively provided with at least two third threaded holes, the third threaded holes are arranged one-to-one with the second elongated holes, and the second connecting bolt passes through the elongated hole and is threadedly connected with the third threaded hole to lock the idler wheel mounting seat to the end of the main substrate.

[0019] Further, two first threaded holes and two second threaded holes are respectively arranged on the idler wheel mounting seat, the two first threaded holes are arranged in sequence along the left-right direction, and the two second threaded holes are arranged in sequence along the left-right direction;

[0020] The main base plate is provided with two through holes, the two first connecting bolts respectively pass through the two through holes and are threadedly connected with the two first threaded holes, and the lifting screws are respectively installed in the two second threaded holes.

[0021] Furthermore, it also includes auxiliary supporting feet, the belt driving device is arranged at the middle position of the conveyor line substrate assembly, and the auxiliary supporting feet are respectively arranged at the bottom of the front and rear ends of the conveyor line substrate assembly.

[0022] Further, the transmission assembly includes a synchronous main wheel, a synchronous slave wheel and a synchronous belt, the belt-driven motor is installed on the base, the output shaft of the belt-driven motor is installed with the synchronous main wheel, the synchronous slave wheel is located in the mounting groove and fixed to the transmission shaft, and the synchronous main wheel and the synchronous slave wheel are connected through the synchronous belt transmission;

[0023] A pair of tensioning wheel structures are respectively arranged on the left and right sides of the base, and the tensioning wheel structures on both sides are respectively used to tension the two conveyor belts.

[0024] A silicon wafer detection and sorting device comprises the intensive silicon wafer conveying flow line.

[0025] Compared with the prior art, the beneficial effects of the utility model are:

[0026] The conveyor line substrate assembly of the present application is provided with double belts (two conveyor belts) to convey silicon wafers. The present application arranges a double belt self-cleaning assembly on the conveyor line substrate assembly, and utilizes two brush wheels with brushes to contact the outer surfaces of the two conveyor belts respectively. When the conveyor belts are running, the brushes on the brush wheels automatically clean the dirt on the conveyor belts, thereby achieving the purpose of synchronous cleaning of the double belts. The dirt on the conveyor belts can be automatically cleaned without stopping the machine, which not only affects the production efficiency, but also reduces manpower and material resources. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.

[0028] Figure 1 This is an axonometric diagram of the utility model's intensive silicon wafer conveying streamline;

[0029] Figure 2 This is an axonometric diagram of the utility model's intensive silicon wafer conveying flow line without the double-belt self-cleaning assembly installed;

[0030] Figure 3 This is an axonometric diagram of the belt drive device of the utility model;

[0031] Figure 4 It is a bottom view of the rear end structure of the intensive silicon wafer conveying streamline of the utility model;

[0032] Figure 5 For this utility model Figure 4 Structural cross-section view at the middle BB;

[0033] Figure 6 For this utility model Figure 1 A partial enlarged view of the structure at center A;

[0034] Figure 7 It is an axonometric view of the double-belt self-cleaning assembly of the utility model.

[0035] In the figure:

[0036] 1- conveyor line substrate assembly; 101- main substrate; 102- belt support strip; 103- detection station substrate; 104- detection position avoidance gap;

[0037] 2-belt drive device; 201-belt drive motor; 202-synchronous main wheel; 203-synchronous slave wheel; 204-synchronous belt; 205-transmission shaft; 206-driving wheel; 207-base; 208-tensioning wheel mounting seat; 209-slideway; 210-third long hole; 211-fourth threaded hole;

[0038] 3-idler assembly; 301-idler; 302-idler shaft;

[0039] 4-idler wheel mounting seat; 401-first connecting bolt; 402-jacking screw; 403-second long hole;

[0040] 5-Conveyor belt;

[0041] 6-double belt self-cleaning assembly; 601-brush wheel; 602-magnetic block; 603-mounting frame; 604-mounting shaft; 605-first long strip hole;

[0042] 7-silicon wafer; 8-auxiliary support. DETAILED DESCRIPTION

[0043] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Generally, the components of the embodiments of the utility model described and shown in the drawings here can be arranged and designed in various different configurations.

[0044] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the present invention to be protected, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0045] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0046] In the description of the present utility model, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inside", "outside", etc. indicate the orientation or position relationship based on the orientation or position relationship shown in the accompanying drawings, or the orientation or position relationship in which the utility model product is usually placed when in use, which is only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0047] In addition, the terms "horizontal", "vertical", "overhanging" and the like do not mean that the components are required to be absolutely horizontal or overhanging, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0048] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms "set", "install", "connect", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0049] In conjunction with the accompanying drawings, some embodiments of the present invention are described in detail below. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0050] Example 1

[0051] Reference Figure 1-Figure 7 , this embodiment provides an intensive silicon wafer conveying flow line, including a conveying line substrate assembly 1, an idler assembly 3, a belt drive device 2, two conveying belts 5, and a double-belt self-cleaning assembly 6;

[0052] The conveyor line substrate assembly 1 adopts a split structure, and the conveyor line substrate assembly 1 includes a main substrate 101, a detection station substrate 103 and a belt support strip 102. Figure 1As shown, the length direction of the main substrate 101 is defined as the front-to-back direction, and the width direction of the main substrate 101 is defined as the left-to-right direction. A detection station substrate 103 is set on the front side of the main substrate 101, and the main substrate 101 and the detection station substrate 103 are fixedly connected by a plurality of bolts. The belt support strips 102 are respectively set on the left and right sides of the main substrate 101, and the belt support strips 102 are used to support the conveyor belt 5 on the main substrate 101. The length direction of the belt support strips 102 is consistent with the length direction of the main substrate 101 and is both in the front-to-back direction. The belt support strips 102 are fixed to the main substrate 101 by a plurality of bolts; the conveyor belt 5 can reduce the fluctuation of the silicon wafer 7 during the conveying process under the support of the belt support strips 102, and improve the stability of data detection during the conveying process of the silicon wafer 7. The silicon wafer 7 to be tested flows from the feeder to each material box of the unloader by the conveyor line, and flows through each detection station on the conveyor line to complete the detection action.

[0053] A detection position avoidance gap 104 is formed between the main substrate 101 and the detection station substrate 103. The detection position avoidance gap 104 is a gap used to avoid the detection position. The detection position avoidance gap 104 can also be called a detection position or an avoidance position. The avoidance position can be provided with a detection mechanism, and the front and rear edges of the silicon wafer 7 can be optically detected by the detection mechanism. When the conveyor belt 5 passes through the avoidance position, it needs to avoid it. Specifically, the conveyor belt 5 bypasses the avoidance position from below to complete the avoidance (such as Figure 1 and Figure 2 As shown), because the avoidance position serves as the reflector avoidance position of the front and rear edge detection station of the silicon wafer 7, the reflector installation position needs to be set in the detection position avoidance gap 104. By setting the avoidance position, the interference problem of the belt on the reflector in the detection position avoidance gap 104 can be effectively solved, and the conveyor line can maintain its integrity. Therefore, by designing the avoidance position to allow the conveyor belt 5 to bypass the detection position, the data detection accuracy can be improved and the visual detection impurities caused by the reflection of the conveyor line can be reduced.

[0054] In an optional implementation of this embodiment, at least one detection position avoidance gap 104 is opened on the detection position substrate 103, and when the conveyor belt 5 passes through any of the detection position avoidance gaps 104, it will bypass under the detection position avoidance gaps 104. Figure 1 and Figure 2 As shown, a detection position avoidance gap 104 is formed at the gap between the main substrate 101 and the detection station substrate 103 , and a detection position avoidance gap 104 is also formed in the middle of the detection station substrate 103 .

[0055] The belt drive device 2 includes a base 207, a transmission shaft 205, a transmission assembly, a belt drive motor 201 and a driving wheel 206; the base 207 is fixedly arranged at the bottom of the conveyor line substrate assembly 1, and a mounting groove is provided on the base 207. The transmission shaft 205 is passed through the mounting groove along the left-right direction (the axial direction of the transmission shaft 205 is the left-right direction), and the left and right parts of the transmission shaft 205 are rotatably connected to the base 207 through bearings, respectively. Specifically: the parts on the base 207 located on both sides of the mounting groove are named the left part of the base 207 and the right part of the base 207, respectively, and the left and right parts of the transmission shaft 205 are rotatably connected to the left part of the base 207 and the right part of the base 207 through a bearing, respectively, as shown in FIG. Figure 3 As shown. The driving wheels 206 are respectively installed at both ends of the transmission shaft 205, and the output shaft of the belt-driven motor 201 is connected to the transmission shaft 205 through the transmission assembly; specifically: the transmission assembly includes a synchronous main wheel 202, a synchronous slave wheel 203 and a synchronous belt 204, the belt-driven motor 201 is installed on the base 207, the output shaft of the belt-driven motor 201 is installed with the synchronous main wheel 202, the synchronous slave wheel 203 is located in the installation groove and fixed to the transmission shaft 205, and the synchronous main wheel 202 and the synchronous slave wheel 203 are connected through the synchronous belt 204. The belt drive device 2 of the present application is driven by the output power of the belt-driven motor 201 to drive the synchronous main wheel 202 to rotate, and then the transmission shaft 205 is driven to rotate through the rotation of the synchronous slave wheel 203 and the synchronous belt 204, and then the driving wheels 206 at both ends of the transmission shaft 205 rotate accordingly and drive the movement of the conveyor belt 5. The structure proposed in the present application in which the belt-driven motor 201 drives the transmission shaft 205 through the transmission assembly structure is conducive to the replacement of the conveying belt 5. The driving wheels 206 are installed on both sides of the transmission shaft 205 to directly disassemble the conveying belt 5. For the technical solution of the silicon wafer 7 conveying device in the prior art, the driving motor is connected to the transmission shaft 205 by a coupling. When disassembling the conveying belt 5, the driving motor at one end needs to be removed before the belt can be removed, which is more troublesome. Therefore, compared with the prior art solution, the belt driving device 2 of the present application is more convenient to disassemble the belt.

[0056] Specifically, a pair of tension wheel structures are respectively arranged on the left and right sides of the base 207, and the pair of tension wheel structures on the same side are symmetrically arranged. The conveying belts 5 on both sides pass through the tension wheel structures on both sides respectively, and the tension wheel structures on both sides can respectively tension the two conveying belts 5 (such as Figure 1The tension wheel structure includes a tension wheel mounting seat 208 and a tension wheel mounted on the tension wheel mounting seat 208. The left and right sides of the base 207 are respectively provided with a slide groove 209. The length direction of the slide groove 209 is the front-to-back direction. The two tension wheel mounting seats 208 on the same side are symmetrically installed in the slide groove 209 and are distributed one in front and one in the back. The tension wheel mounting seat 208 can slide along the slide groove 209. The tension wheel mounting seat 208 is provided with a third long hole 210. The length direction of the third long hole 210 is the front-to-back direction. Two fourth screw holes are provided in the slide groove 209. The threaded holes 211 and the two fourth threaded holes 211 have the same height and are distributed one after the other. The tensioning wheel mounting seat 208 and the base 207 are locked by installing the third connecting bolt in the third long hole 210 of the tensioning wheel mounting seat 208 and threadedly connecting with the fourth threaded hole 211. When the position of the tensioning wheel mounting seat 208 in the slide groove 209 needs to be adjusted, the third connecting bolt is first loosened, and then the position of the third connecting bolt in the third long hole 210 is adjusted, and then the third connecting bolt is tightened again to adjust the position of the tensioning wheel mounting seat 208, so as to better tension the belt.

[0057] It should be noted that the tension wheel in this embodiment adopts an idler wheel 301.

[0058] The idler wheel assembly 3 is respectively arranged on the left and right sides of the conveyor line substrate assembly 1, and the idler wheel assembly 3 includes a plurality of idler wheels 301, and the idler wheel 301 is rotatably connected to the conveyor line substrate assembly 1 through an idler wheel shaft 302. The idler wheel assembly 3 on the left and the driving wheel 206 on the left are jointly installed with a conveyor belt 5, and the idler wheel assembly 3 on the right and the driving wheel 206 on the right are jointly installed with another conveyor belt 5. The arrangement of the idler wheel 301 and the winding method of the conveyor belt 5 are as follows: Figure 1 shown.

[0059] The double-belt self-cleaning assembly 6 is also arranged at the bottom of the conveyor line substrate assembly 1 . The double-belt self-cleaning assembly 6 includes two brush wheels 601 . The brushes on the two brush wheels 601 are in contact with the outer surfaces of the two conveyor belts 5 respectively.

[0060] Specifically, the double-belt self-cleaning assembly 6 also includes a mounting frame 603, a mounting shaft 604 and a magnetic block 602. The mounting frame 603 is fixed to the bottom of the conveyor line substrate assembly 1 by bolts. The two ends of the mounting frame 603 are respectively provided with a first long hole 605, and the length direction of the first long hole 605 is a vertical direction. The brush wheel 601 is installed at one end of the mounting shaft 604, and the magnetic block 602 adsorbs and fixes the mounting shaft 604. The other end of the mounting shaft 604 is a screw connection. The mounting shaft 604 is fixed to the first elongated hole 605 by tightening the screws and generating friction with the inner wall of the first elongated hole 605, so as to achieve relative fixation of the mounting shaft 604 and the mounting frame 603, that is, the brush wheel 601 is installed in the first elongated hole 605 through the mounting shaft 604. When the height of the brush wheel 601 needs to be adjusted, the mounting shaft 604 is loosened to loosen the screw structure and the first elongated hole 605, and then the mounting shaft 604 is tightened to a higher or lower position than the first elongated hole 605. It should be noted that the thickness of the screw structure of the mounting shaft 604 can be consistent, or it can gradually become thinner from the end close to the brush wheel 601 to the end away from the brush wheel 601. The height adjustment of the brush wheel 601 is achieved by adjusting the height of the mounting shaft 604, so that the brush surface of the brush wheel 601 is just in contact with the belt surface (such as Figure 1 This installation method is easy to adjust and can adapt to different sections of the conveyor line by adjusting the height to achieve compatibility between the various sections of the conveyor line.

[0061] The double-belt self-cleaning assembly 6 itself does not have a power device. When the brush layer on the brush wheel 601 contacts the outer surface of the conveyor belt 5, the brush wheel 601 can be driven to rotate, and the brush wheel 601 can clean the dust and dirt on the belt surface. The relative friction between the brush wheel 601 and the belt surface is reduced by the follow-up rotation of the conveyor belt 5, effectively preventing damage to the surface of the conveyor belt 5, increasing the service life of the conveyor belt 5, and effectively reducing the belt dust caused by friction. The brush wheel 601 is sleeved on the installation shaft 604, and the installation shaft 604 is sucked by the magnetic block 602 to play the role of axial positioning of the brush wheel 601, which can prevent the brush wheel 601 from running off the belt while not affecting the normal rotation of the brush wheel 601. Through the contact between the brush wheel 601 and the belt surface, the conveyor belt 5 of the conveyor line is cleaned, and the dust and dirt on the belt surface can be effectively cleaned. There is no need to stop the machine during the cleaning process, and the cleaning function can be completed during the operation of the equipment. When the brush wheel 601 needs to be disassembled, the brush wheel 601 can be disassembled by simply removing the magnetic block 602 , which facilitates the quick disassembly of the brush wheel 601 .

[0062] Preferably, the first elongated hole 605 can be a waist-shaped slot hole.

[0063] Preferably, the mounting frame 603 is U-shaped, and includes a mounting plate in the middle and ear plates arranged on both sides of the mounting plate, and the ear plates are provided with the first long strip hole 605. During actual installation, it is installed at the bottom of the main substrate 101, and the U-shaped notch of the mounting frame 603 is arranged downward, so that the mounting plate in the middle fits with the main substrate 101, which is more convenient for bolt fixing therebetween.

[0064] In an optional implementation manner of the present embodiment, idler wheel mounting seats 4 are respectively provided at the front and rear ends of the main substrate 101, and the idler wheels 301 are respectively installed at the left and right ends of the idler wheel mounting seats 4; wherein idler wheel mounting seats 4 are installed at both ends of the main substrate 101 of the conveyor line, and the height of the idler wheels 301 at both ends can be adjusted by adjusting the height of the idler wheel mounting seats 4, at the junction of the front and rear sections of the conveyor line, that is, the junction after the main substrate 101 and the detection station substrate 103, or the junction of the main substrate 101 and the conveyor line before it (the before and after mentioned here are defined according to the flow direction of the silicon wafer 7, for example, the silicon wafer 7 flows from the front section conveyor line to the conveyor flow line described in this application, then the front section conveyor line belongs to the conveyor line before the conveyor flow line described in this application), the two sections of the conveyor line may be uneven due to the unequal factors of the substrates, resulting in up and down fluctuations or jamming during the transmission of the silicon wafer 7, then the unevenness of the two sections of the conveyor line can be offset by adjusting the height of the idler wheel mounting seats 4, and the specific height adjustment methods are as follows:

[0065] The first type: the idler wheel mounting seat 4 is arranged at the bottom of the main base plate 101, and at least two first threaded holes and at least one second threaded hole are respectively arranged on the idler wheel mounting seat 4, and at least two through holes are arranged on the main base plate 101, and the through holes are arranged one-to-one with the first threaded holes, and the first connecting bolt 401 passes through the through hole and is threadedly connected with the first threaded hole, and a gap is left between the head of the first connecting bolt 401 and the main base plate 101, that is, the first connecting bolt 401 only plays a pulling role on the idler wheel mounting seat 4, and is not locked to facilitate its height adjustment; a jacking screw 402 is installed in the second threaded hole, and screwing the jacking screw 402 can The main substrate 101 is lifted up; preferably: two first threaded holes and two second threaded holes are respectively arranged on the idler wheel mounting seat 4, the two first threaded holes are arranged in sequence along the left-right direction, the two second threaded holes are arranged in sequence along the left-right direction, and the first threaded holes are closer to the middle of the main substrate 101 than the second threaded holes; two through holes corresponding to the two first threaded holes are arranged on the main substrate 101, two first connecting bolts 401 pass through the two through holes and are threadedly connected to the two first threaded holes, and the lifting screws 402 are respectively installed in the two second threaded holes, and the lifting screws 402 can be ordinary bolts with heads or machine screws.

[0066] The second type: the idler mounting seat 4 is provided with at least two second elongated holes 403 along the front-to-back direction, the length direction of the second elongated holes 403 is the vertical direction, the front end face and the rear end face of the main substrate 101 are provided with at least two third threaded holes respectively, the third threaded holes are arranged one-to-one with the second elongated holes 403, and the second connecting bolt passes through the elongated holes and is threadedly connected with the third threaded holes to lock the idler mounting seat 4 to the end of the main substrate 101. Preferably, two third threaded holes of the same height are respectively provided on the front end face and the rear end face of the main substrate 101, and two second elongated holes 403 of the same height are provided on the idler mounting seat 4, the second elongated holes 403 are preferably waist-shaped slot holes, and the spacing between the two second elongated holes 403 is the same as the spacing between the two third threaded holes. The locking of the idler mounting seat 4 and the main substrate 101 is achieved by passing the second connecting bolt through the second elongated holes 403 and threading it with the third threaded holes. When the height of the idler wheel mounting base 4 needs to be adjusted, the two second connecting bolts are loosened, the height of the second connecting bolts in the second elongated holes 403 is adjusted, and then the bolts are tightened to achieve the height adjustment.

[0067] The belt drive device 2 is arranged at the middle position of the conveyor line substrate assembly 1, and the bottoms of the front and rear ends of the conveyor line substrate assembly 1 are respectively provided with the auxiliary support legs 8. Figure 1 The two auxiliary legs 8 and the base 207 of the belt drive device 2 jointly support the entire silicon wafer conveying line.

[0068] Example 2

[0069] This embodiment provides a silicon wafer detection and sorting device, including the intensive silicon wafer conveying flow line and a detection mechanism.

[0070] A reflective mirror is arranged in each detection position avoidance gap 104 , and a detection mechanism for detecting the front and rear edges of the silicon wafer 7 is also arranged corresponding to each detection position avoidance gap 104 .

[0071] The beneficial effects of the technical solution of the utility model are:

[0072] The present application uses the brush wheel 601 to contact the outer surface of the conveyor belt 5, which plays a role in cleaning the conveyor belt, can effectively clean the dust and dirt on the belt surface, and does not need to stop the machine for operation during the cleaning process, and can complete the cleaning function during the operation of the equipment. The overall structure of the device is simple, the intensive structure is easy to install, the conveyor belt is simple to maintain, the cost is low, and the space occupancy rate is small. It can effectively clean the double conveyor belt 5, and can also effectively reduce the wear on the belt surface by rotating with the conveyor belt 5. It can not only play a cleaning role but also reduce the damage to the belt, and can reduce the investment in labor costs.

[0073] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the aforementioned embodiments, ordinary technicians in this field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not make the essence of the corresponding technical solution deviate from the scope of the technical solution of the embodiments of the utility model.

[0074] The above description is only the preferred embodiment of the utility model, and is not intended to limit the utility model. For those skilled in the art, the utility model can have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the utility model shall be included in the protection scope of the utility model.

Claims

1. An intensive silicon wafer conveying line, characterized in that: It comprises a conveyor line base plate assembly (1), an idler wheel assembly (3), a belt driving device (2), two conveyor belts (5), and a double-belt self-cleaning assembly (6); The belt drive device (2) comprises a base (207), a transmission shaft (205), a transmission assembly, a belt drive motor (201) and a driving wheel (206); the base (207) is fixedly arranged at the bottom of the conveyor line substrate assembly (1); a mounting groove is provided on the base (207); the transmission shaft (205) is passed through the mounting groove in the left-right direction; the left and right parts of the transmission shaft (205) are rotatably connected to the base (207) via bearings respectively; the driving wheels (206) are respectively installed at both ends of the transmission shaft (205); and the output shaft of the belt drive motor (201) is transmission-connected to the transmission shaft (205) via the transmission assembly; The idler wheel assembly (3) is respectively arranged on the left and right sides of the conveyor line base plate assembly (1), the idler wheel assembly (3) comprises a plurality of idler wheels (301), the idler wheels (301) are rotatably connected to the conveyor line base plate assembly (1) via idler wheel shafts (302), one conveyor belt (5) is commonly installed on the idler wheel assembly (3) on the left and the driving wheel (206) on the left, and another conveyor belt (5) is commonly installed on the idler wheel assembly (3) on the right and the driving wheel (206) on the right; The double-belt self-cleaning assembly (6) is also arranged at the bottom of the conveyor line substrate assembly (1), and the double-belt self-cleaning assembly (6) comprises two brush wheels (601), and the brushes on the two brush wheels (601) are in contact with the outer surfaces of the two conveyor belts (5) respectively.

2. The intensive silicon wafer conveying flow line according to claim 1, characterized in that: The double-belt self-cleaning assembly (6) also includes a mounting frame (603), a mounting shaft (604) and a magnetic block (602); the mounting frame (603) is fixed to the bottom of the conveyor line substrate assembly (1) by bolts; the two ends of the mounting frame (603) are respectively provided with a first elongated hole (605); the length direction of the first elongated hole (605) is vertical; the brush wheel (601) is mounted on one end of the mounting shaft (604), and the magnetic block (602) adsorbs and fixes the mounting shaft (604); the other end of the mounting shaft (604) is a screw structure; the mounting shaft (604) is fixed to the first elongated hole (605) by tightening the screw and generating friction with the inner wall of the first elongated hole (605).

3. The intensive silicon wafer conveying line according to claim 2, characterized in that: The mounting frame (603) is U-shaped, and comprises a mounting plate in the middle and ear plates arranged on both sides of the mounting plate, wherein the ear plates are provided with the first elongated hole (605).

4. The intensive silicon wafer conveying flow line according to claim 1, characterized in that: The conveyor line substrate assembly (1) comprises a main substrate (101), a detection station substrate (103) and a belt support strip (102); the detection station substrate (103) is arranged on the front side of the main substrate (101), and the main substrate (101) and the detection station substrate (103) are fixedly connected by a plurality of bolts; the belt support strips (102) are arranged on the left and right sides of the main substrate (101), respectively, and the belt support strips (102) are used to support the conveyor belt (5) on the main substrate (101); A detection position avoidance gap (104) is formed between the main substrate (101) and the detection station substrate (103); when the conveyor belt (5) passes through the detection position avoidance gap (104), it bypasses under the detection position avoidance gap (104).

5. The intensive silicon wafer conveying line according to claim 4, characterized in that: At least one detection position avoidance notch (104) is provided on the detection position substrate (103), and when the conveyor belt (5) passes through any detection position avoidance notch (104), it bypasses under the detection position avoidance notch (104).

6. The intensive silicon wafer conveying line according to claim 4, characterized in that: Idler wheel mounting seats (4) are respectively provided at the front and rear ends of the main substrate (101), and the idler wheels (301) are respectively mounted at the left and right ends of the idler wheel mounting seats (4); The idler wheel mounting seat (4) is arranged at the bottom of the main base plate (101), and at least two first threaded holes and at least one second threaded hole are respectively arranged on the idler wheel mounting seat (4), and at least two through holes are arranged on the main base plate (101), and the through holes are arranged in a one-to-one correspondence with the first threaded holes, and a first connecting bolt (401) passes through the through hole and is threadedly connected to the first threaded hole, and a gap is left between the head of the first connecting bolt (401) and the main base plate (101); a lifting screw (402) is installed in the second threaded hole, and the main base plate (101) can be lifted up by screwing the lifting screw (402); Alternatively, the idler wheel mounting seat (4) is provided with at least two second elongated holes (403) along the front-to-back direction, the length direction of the second elongated holes (403) is the vertical direction, and the front end face and the rear end face of the main base plate (101) are respectively provided with at least two third threaded holes, the third threaded holes and the second elongated holes (403) are arranged one-to-one correspondingly, and the second connecting bolt passes through the elongated holes and is threadedly connected to the third threaded holes to lock the idler wheel mounting seat (4) to the end of the main base plate (101).

7. The intensive silicon wafer conveying line according to claim 6, characterized in that: The idler wheel mounting seat (4) is respectively provided with two first threaded holes and two second threaded holes, the two first threaded holes are arranged in sequence along the left-right direction, and the two second threaded holes are arranged in sequence along the left-right direction; The main base plate (101) is provided with two through holes, and the two first connecting bolts (401) respectively pass through the two through holes and are threadedly connected to the two first threaded holes, and the lifting screws (402) are respectively installed in the two second threaded holes.

8. The intensive silicon wafer conveying line according to claim 1, characterized in that: It also includes auxiliary support feet (8), the belt drive device (2) is arranged at the middle position of the conveyor line substrate assembly (1), and the auxiliary support feet (8) are respectively arranged at the bottom of the front and rear ends of the conveyor line substrate assembly (1).

9. The intensive silicon wafer conveying line according to claim 1, characterized in that: The transmission assembly comprises a synchronous main wheel (202), a synchronous slave wheel (203) and a synchronous belt (204); the belt-driven motor (201) is mounted on the base (207); the output shaft of the belt-driven motor (201) is mounted with the synchronous main wheel (202); the synchronous slave wheel (203) is located in the mounting groove and fixedly mounted on the transmission shaft (205); the synchronous main wheel (202) and the synchronous slave wheel (203) are connected in transmission via the synchronous belt (204); A pair of tensioning wheel structures are respectively arranged on the left and right sides of the base (207), and the tensioning wheel structures on the two sides are respectively used to tension the two conveying belts (5).

10. A silicon wafer detection and sorting device, characterized in that: The invention comprises the intensive silicon wafer conveying flow line as described in any one of claims 1 to 9.

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