Ta-C magnetic control coating device

Abstract

The utility model discloses a ta-C magnetic control coating device, relates to cutter surface ta-C coating technical field, including shell 1 and shell 2, the rear side of shell 1 is fixedly communicated with feed inlet, the left end of shell 1 is fixedly communicated with magnetic filtration channel, the outside of magnetic filtration channel is sleeved with a pair of filter coil, and the shell 2 is fixed with the magnetic filtration channel. A magnetic filtering channel is arranged in the shell I, a mechanical baffle plate is fixedly arranged in the magnetic filtering channel, a mounting plate is fixedly arranged at the left end of the magnetic filtering channel, a plurality of groups of pulse arc targets are arranged at the left end of the mounting plate, and an auxiliary cooling cylinder is arranged on the upper side of a bottom plate of the shell I. According to the device, the mechanical baffle plate in the magnetic filtering channel is arranged; large particles generated by high temperature of a target surface are removed, a high-quality ta-C surface layer is obtained, then the hardness and wear resistance of ta-C are improved, meanwhile, an auxiliary cooling cylinder is arranged, cooling liquid flows in an internal cooling channel, heat in a system is absorbed, and a ta-C film is prevented from being carbonized under the condition that the temperature is too high.

Description

Technical Field

[0001] The utility model relates to the technical field of ta-C coating on tool surfaces, in particular to a ta-C magnetron coating device. Background Art

[0002] In cutting processing, tool performance has a decisive influence on cutting efficiency, precision and surface quality. In order to better improve the cutting performance of the tool, a more effective method is to use various coating technologies to coat the substrate with one or more layers of high hardness and high wear resistance materials. The coating on the tool surface acts as a chemical barrier and thermal barrier, reducing the crescent wear of the tool, which can significantly improve processing efficiency, improve processing accuracy, extend tool life and reduce processing costs.

[0003] The ta-C magnetron coating device is a device used to deposit ta-C thin films on the surface of substrates. ta-C has the advantages of high hardness, low friction coefficient, high wear resistance and chemical stability, and is widely used in tools, molds, medical devices and other fields.

[0004] The hardness and wear resistance of the ta-C film produced by the traditional ta-C magnetron coating device are average. At the same time, the ta-C magnetron coating device produces ta-C in a sealed container with a high internal temperature, and the ta-C film is prone to carbonization when the temperature is too high. Based on this, this solution provides a ta-C magnetron coating device to solve the above-mentioned problems. Utility Model Content

[0005] In order to solve the above technical problems, a ta-C magnetron coating device is provided. The technical solution solves the problems mentioned in the above background technology that the hardness and wear resistance of the ta-C film produced by the traditional ta-C magnetron coating device are generally poor, and the ta-C magnetron coating device produces ta-C in a sealed container with a high internal temperature, and the ta-C film is prone to carbonization when the temperature is too high.

[0006] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0007] A ta-C magnetron coating device comprises a shell one and a shell two, wherein the shell one is fixedly connected to the shell two, the rear side of the shell one is fixedly connected to a material inlet, the left end of the shell one is fixedly connected to a magnetic filtering channel, a pair of filtering coils are sleeved on the outer side of the magnetic filtering channel, a mechanical baffle is fixedly installed inside the magnetic filtering channel, a mounting plate is fixedly installed on the left end of the magnetic filtering channel, a plurality of groups of pulse arc targets are installed on the left end of the mounting plate, a pair of magnetic control components are symmetrically installed on the rear side of the shell one, a pair of magnetic control components are symmetrically installed on the front side of the shell two, and an auxiliary cooling cylinder is arranged on the upper side of the bottom plate of the shell one.

[0008] Preferably, the shell 1 and the shell 2 can be combined into a main body, the interior of the main body is a deposition chamber, and the external transverse cross-section of the main body is a regular octahedron.

[0009] Preferably, the front end of the shell one is fixedly connected with a method disk one, the rear end of the shell two is fixedly connected with a method disk two, and the method disk one and the method disk two are fixedly connected by bolts.

[0010] Preferably, four groups of the magnetic controls are provided, two of the magnetic controls are provided on four sides of the outer shell, and each pair of the magnetic controls is separated by one side.

[0011] Preferably, a filament is disposed inside the second shell, and two ends of the filament extend out through two mounting seats, and the mounting seats are fixedly connected to the front end side of the second shell.

[0012] Preferably, an auxiliary anode is disposed inside the second shell, and the upper end of the auxiliary anode passes through the top plate of the second shell and extends out.

[0013] Compared with the prior art, the utility model proposes a ta-C magnetron coating device, which has the following beneficial effects:

[0014] 1. In the utility model, the substrate to be plated of the cutting tool is placed in the deposition chamber through the feed port, and then the feed port is sealed, wherein the pulse arc target is arranged on the side wall of the deposition chamber, and a magnetic filtration channel is arranged in the middle. The pulse arc target is used to provide highly ionized plasma, and a mechanical baffle is installed inside the magnetic filtration channel to remove large particles generated due to the high temperature of the target surface, so as to obtain a high-quality ta-C surface layer, thereby improving the quality of ta-C (hydrogen-free diamond-like carbon), and further improving the hardness and wear resistance of ta-C.

[0015] 2. The utility model is provided with a filament and an auxiliary anode. The filament is arranged at the front side of the deposition chamber for generating electrons. The auxiliary anode is arranged in the deposition chamber close to the filament for attracting the electrons generated by the filament. The substrate is cleaned and etched by the filament and the auxiliary anode. The high-density electrons generated by the filament ionize the gas, thereby increasing the ionization rate and improving the deposition rate.

[0016] 3. The utility model is provided with an auxiliary cooling cylinder. The coolant enters the cooling cylinder from the inlet, flows through the internal cooling channel, absorbs the heat in the system, and is then discharged from the outlet. At the same time, a spiral channel design is adopted to increase the coolant flow path and increase the contact time between the coolant and the heat source, thereby improving the heat dissipation effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0018] Figure 2 It is a schematic diagram of the internal structure of the utility model;

[0019] Figure 3 It is a top view schematic diagram of the overall internal structure of the utility model.

[0020] The numbers in the figure are:

[0021] 1. Shell 1; 101, method disk 1; 2. Shell 2; 201, method disk 2; 3. Feed inlet; 4. Magnetic filtration channel; 5. Filter coil; 6. Mounting plate; 7. Pulse arc target; 8. Filament; 801, mounting seat; 9. Auxiliary anode; 10. Magnetic control unit; 11. Auxiliary cooling cylinder; 12. Mechanical baffle. DETAILED DESCRIPTION

[0022] The following description is used to disclose the present invention so that those skilled in the art can implement the present invention. The preferred embodiments described below are only examples, and those skilled in the art may think of other obvious variations.

[0023] Reference Figure 1-3 As shown, a ta-C magnetron coating device comprises a shell 1 and a shell 2 2, wherein the shell 1 is fixedly connected to the shell 2 2, the rear side of the shell 1 is fixedly connected to a feed port 3, the left end of the shell 1 is fixedly connected to a magnetic filtering channel 4, a pair of filtering coils 5 are sleeved on the outer side of the magnetic filtering channel 4, a mechanical baffle 12 is fixedly installed inside the magnetic filtering channel 4, a mounting plate 6 is fixedly installed on the left end of the magnetic filtering channel 4, and a plurality of groups of pulse arc targets 7 are installed on the left end of the mounting plate 6, a substrate of a cutting tool to be plated is placed in a deposition chamber through the feed port 3, and then the feed port 3 is sealed, wherein , the pulse arc target 7 is arranged on the side wall of the deposition chamber, and a magnetic filtering channel 4 is arranged in the middle. The pulse arc target 7 is used to provide highly ionized plasma. A mechanical baffle 12 is installed inside the magnetic filtering channel 4 to remove large particles generated by the high temperature of the target surface, so as to obtain a high-quality ta-C surface layer, and improve the quality of ta-C (hydrogen-free diamond-like carbon), and then improve the hardness and wear resistance of ta-C. A pair of magnetic controls 10 are symmetrically installed on the rear side of the shell 1, and a pair of magnetic controls 10 are symmetrically installed on the front side of the shell 2. An auxiliary cooling cylinder 11 is arranged on the upper side of the bottom plate of the shell 1. The device is provided with an auxiliary cooling cylinder 11, and the coolant enters the cooling cylinder 11 from the inlet, flows through the internal cooling channel, absorbs the heat in the system, and then is discharged from the outlet. At the same time, a spiral channel design is adopted to increase the flow path of the coolant, increase the contact time between the coolant and the heat source, and thus improve the heat dissipation effect.

[0024] Specifically, in this embodiment, the shell 1 and the shell 2 2 can be combined into a main body, the interior of the main body is a deposition chamber, and the external transverse cross-section of the main body is a regular octahedron.

[0025] Specifically, in this embodiment, the front end of the shell 1 is fixedly connected to the method disk 101, and the rear end of the shell 2 is fixedly connected to the method disk 201, and the method disk 101 and the method disk 201 are fixedly connected by bolts.

[0026] Specifically, in this embodiment, four groups of magnetic controls 10 are provided, two magnetic controls 10 are provided on four sides of the outer shell, and every two magnetic controls 10 are separated by one side.

[0027] Specifically, in this embodiment, a filament 8 is disposed inside the shell 2, and both ends of the filament 8 extend out through two mounting seats 801, and the mounting seats 801 are fixedly connected to the front side of the shell 2. An auxiliary anode 9 is disposed inside the shell 2, and the upper end of the auxiliary anode 9 penetrates through the top plate of the shell 2 and extends out. The filament 8 is disposed at the front side of the deposition chamber for generating electrons, and the auxiliary anode 9 is disposed in the deposition chamber close to the filament 8 for attracting the electrons generated by the filament. The substrate is cleaned and etched by the filament 8 and the auxiliary anode 9, and the high-density electrons generated by the filament 8 ionize the gas, thereby increasing the ionization rate and improving the deposition rate.

[0028] The working principle of the utility model is: the substrate to be plated of the cutting tool is placed in the deposition chamber through the feed port 3, and then the feed port 3 is sealed, wherein the pulse arc target 7 is arranged on the side wall of the deposition chamber, and a magnetic filtration channel 4 is arranged in the middle, the pulse arc target 7 is used to provide highly ionized plasma, and a mechanical baffle 12 is installed inside the magnetic filtration channel 4 to remove large particles generated due to the high temperature of the target surface, so as to obtain a high-quality ta-C surface layer, and improve the quality of ta-C (hydrogen-free diamond-like carbon), and then improve the hardness and wear resistance of ta-C. In this process, the filament 8 is arranged at the front side of the deposition chamber for generating electrons, and the auxiliary anode 9 is arranged in the deposition chamber close to the filament 8 for attracting the electrons generated by the filament, and the substrate is cleaned and etched by the filament 8 and the auxiliary anode 9, and the high-density electrons generated by the filament 8 ionize the gas, thereby increasing the ionization rate and improving the deposition rate.

[0029] An auxiliary cooling cylinder 11 is provided. The coolant enters the cooling cylinder 11 from the inlet, flows through the internal cooling channel, absorbs the heat in the system, and is then discharged from the outlet. At the same time, a spiral channel design is adopted to increase the coolant flow path and increase the contact time between the coolant and the heat source, thereby improving the heat dissipation effect and avoiding carbonization of the ta-C film when the temperature is too high.

[0030] The above shows and describes the basic principle, main features and advantages of the utility model. Those skilled in the art should understand that the utility model is not limited by the above embodiments. The above embodiments and the specification only describe the principles of the utility model. The utility model may be subject to various changes and improvements without departing from the spirit and scope of the utility model. These changes and improvements fall within the scope of the utility model to be protected. The scope of protection claimed by the utility model is defined by the attached claims and their equivalents.

Claims

1. A ta-C magnetron coating device, characterized in that: The invention comprises a shell one (1) and a shell two (2), wherein the shell one (1) is fixedly connected to the shell two (2), the rear side of the shell one (1) is fixedly connected to a feed port (3), the left end of the shell one (1) is fixedly connected to a magnetic filtering channel (4), a pair of filtering coils (5) are sleeved on the outer side of the magnetic filtering channel (4), a mechanical baffle (12) is fixedly installed inside the magnetic filtering channel (4), a mounting plate (6) is fixedly installed on the left end of the magnetic filtering channel (4), and a plurality of groups of pulse arc targets (7) are installed on the left end of the mounting plate (6), a pair of magnetic control components (10) are symmetrically installed on the rear side of the shell one (1), a pair of magnetic control components (10) are symmetrically installed on the front side of the shell two (2), and an auxiliary cooling cylinder (11) is arranged on the upper side of the bottom plate of the shell one (1).

2. A ta-C magnetron coating device according to claim 1, characterized in that: The shell one (1) and the shell two (2) are combined into a main body, the interior of the main body is a deposition chamber, and the external transverse cross-section of the main body is a regular octahedron.

3. The ta-C magnetron coating device according to claim 1, characterized in that: The front end of the shell one (1) is fixedly connected to a method disk one (101), and the rear end of the shell two (2) is fixedly connected to a method disk two (201). The method disk one (101) and the method disk two (201) are fixedly connected by bolts.

4. The ta-C magnetron coating device according to claim 1, characterized in that: Four groups of magnetic controls (10) are provided, two of the magnetic controls (10) are provided on four sides of the outer shell, and each pair of the magnetic controls (10) is separated by one side.

5. The ta-C magnetron coating device according to claim 1, characterized in that: A filament (8) is arranged inside the second shell (2), and two ends of the filament (8) extend out through two mounting seats (801), and the mounting seats (801) are fixedly connected to the front end side of the second shell (2).

6. The ta-C magnetron coating device according to claim 1, characterized in that: An auxiliary anode (9) is arranged inside the second shell (2), and the upper end of the auxiliary anode (9) penetrates the top plate of the second shell (2) and extends out.

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