Turbulent flow anti-hedging structure for chemical vapor deposition equipment

Abstract

The utility model belongs to the technical field of chemical vapor deposition, and particularly relates to a turbulent flow anti-hedging structure for chemical vapor deposition equipment, which comprises a deposition chamber, a first turbulent flow plate and a second turbulent flow plate, the first turbulent flow plate and the second turbulent flow plate are arranged on the inner side wall of the deposition chamber, the side wall of the deposition chamber is further provided with an extraction opening and a feed port, the first turbulent flow plate is communicated with the extraction opening, and the second turbulent flow plate is communicated with the feed port. The second spoiler is communicated with the feeding port, and a plurality of first open holes and second open holes are formed in the side portion of the first spoiler and the side portion of the second spoiler respectively. Compared with the prior art, the deposition chamber has the advantages that the structural design is ingenious, the second spoiler and the first spoiler which are respectively communicated with the feeding hole and the extraction hole are arranged on the inner side wall of the deposition chamber, so that coating materials entering the deposition chamber from the feeding hole can enter the deposition chamber in a dispersed manner, and the impact of the coating materials on a substrate is prevented. In addition, hot steam entering from the feeding port can pressurize the deposition chamber, so that negative pressure needs to be kept through air exhaust.

Description

Technical Field

[0001] The utility model belongs to the technical field of chemical vapor deposition, and in particular relates to a turbulence anti-collision structure for chemical vapor deposition equipment. Background Art

[0002] CVD (Chemical Vapor Deposition), full name chemical vapor deposition, is a chemical reaction process. It heats one or more gases (called precursors) to decompose them, produce polymerization reactions, and deposit on the substrate surface to form the desired thin film. CVD has the characteristics of low deposition temperature, easy control of film composition, film thickness proportional to deposition time, good uniformity, good repeatability, and excellent step coverage.

[0003] In the CVD process, the substrate needs to be coated with a coupling agent layer to improve adhesion first, and then a waterproof, insulating, high temperature resistant and salt spray resistant coating is coated on the coupling agent layer.

[0004] In the prior art, during the vacuum deposition coating process, the coating material is sprayed into the deposition chamber through a pipe. In a vacuum environment, the molecules will bounce around in the deposition chamber, and the coating material will impact the substrate, causing unnecessary impact on the substrate.

[0005] In view of this, the utility model aims to provide a spoiler anti-collision structure for chemical vapor deposition equipment, which can prevent the coating material from colliding with the substrate by setting a spoiler, so that the coating material can rotate according to the airflow and spread more evenly, so that the coating can be evenly deposited on the substrate. Utility Model Content

[0006] The purpose of the utility model is to provide a spoiler anti-collision structure for chemical vapor deposition equipment to address the deficiencies of the prior art. By setting a spoiler, the coating material can be prevented from colliding with the substrate, so that the coating material can rotate according to the airflow and spread more evenly, so that the coating can be evenly deposited on the substrate.

[0007] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0008] A spoiler and anti-collision structure for chemical vapor deposition equipment includes a deposition chamber and a first spoiler and a second spoiler arranged on the inner wall of the deposition chamber. The side wall of the deposition chamber is also provided with an exhaust port and a feed port. The first spoiler is connected to the exhaust port, and the second spoiler is connected to the feed port. The sides of the first spoiler and the second spoiler are respectively provided with a plurality of first openings and a second opening.

[0009] As an improvement of the spoiler anti-collision structure for the chemical vapor deposition equipment of the present invention, the first spoiler includes a first base plate and a first side plate and a second side plate extending from the left and right sides of the first base plate respectively toward the direction of the exhaust port, and the first opening is arranged on the first side plate and the second side plate.

[0010] As an improvement of the spoiler anti-collision structure for chemical vapor deposition equipment of the present invention, the first openings are arranged longitudinally on the first side plate and the second side plate.

[0011] As an improvement of the spoiler anti-collision structure for the chemical vapor deposition equipment of the present invention, the second spoiler includes a second bottom plate and a third side plate and a fourth side plate extending from the left and right sides of the second bottom plate respectively toward the direction of the feed port, and the second opening is arranged on the third side plate and the fourth side plate.

[0012] As an improvement of the spoiler anti-collision structure for chemical vapor deposition equipment of the present invention, the second openings are arranged longitudinally on the third side plate and the fourth side plate.

[0013] As an improvement of the spoiler anti-collision structure for the chemical vapor deposition equipment of the present invention, the second spoiler includes a second bottom plate and a third side plate and a fourth side plate extending from the left and right sides of the second bottom plate respectively toward the direction of the feed port, and the second opening is arranged on the third side plate and the fourth side plate.

[0014] As an improvement of the spoiler and anti-collision structure for the chemical vapor deposition equipment of the present invention, in the height direction, the position of the feed port is higher than the position of the exhaust port.

[0015] As an improvement of the turbulence anti-collision structure for the chemical vapor deposition equipment of the present invention, in the circumferential direction, the feed port and the exhaust port are arranged on opposite sides of the deposition chamber.

[0016] Compared with the prior art, the utility model has an ingenious structural design. By arranging a second spoiler and a first spoiler on the inner side wall of the deposition chamber, which are respectively connected to the feed port and the exhaust port, the coating material entering the deposition chamber from the feed port can enter in a diffused manner, thereby preventing the coating material from impacting the substrate. In addition, since the hot steam entering from the feed port will pressurize the deposition chamber, it is necessary to maintain negative pressure by exhausting air. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is one of the three-dimensional structural schematic diagrams of the utility model.

[0018] Figure 2 This is the second schematic diagram of the three-dimensional structure of the utility model.

[0019] Figure 3 This is the third schematic diagram of the three-dimensional structure of the present utility model.

[0020] Figure 4 This is the fourth schematic diagram of the three-dimensional structure of the present utility model.

[0021] Figure 5 It is a schematic diagram of the exploded structure of the utility model.

[0022] Figure 6 It is a schematic structural diagram of the first spoiler in the utility model.

[0023] Figure 7 It is a schematic structural diagram of the second spoiler in the utility model. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] It should be noted that all directional indications (such as up, down, left, right, front, back...) in the embodiments of the present invention are only used to explain the relative position relationship, movement status, etc. between the components under a specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0026] In addition, the descriptions of "first", "second", etc. in the present utility model are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In addition, the technical solutions between the various embodiments can be combined with each other, but they must be based on the ability of ordinary technicians in the field to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present utility model.

[0027] like Figures 1 to 7As shown, the utility model provides a spoiler anti-collision structure for chemical vapor deposition equipment, including a deposition chamber 1 and a first spoiler 2 and a second spoiler 3 arranged on the inner side wall of the deposition chamber 1, a gas extraction port 4 and a feed port 5 are also arranged on the side wall of the deposition chamber 1, the first spoiler 2 is connected to the gas extraction port 4, the second spoiler 3 is connected to the feed port 5, and the sides of the first spoiler 2 and the second spoiler 3 are respectively provided with a plurality of first openings 6 and second openings 7. When in use, the first spoiler 2 and the inner side wall of the deposition chamber 1 form a first cavity, and the second spoiler 3 and the inner side wall of the deposition chamber 1 form a second cavity. The coating material after heating and evaporation enters the second cavity from the feed port 5, and then diffuses into the deposition chamber 1 through the second opening 7 to coat the substrate. At this time, since the coating material enters in the form of hot steam, the deposition chamber 1 will be pressurized. Therefore, the exhaust port 4 is connected to the exhaust unit to exhaust the deposition chamber 1, so that the deposition chamber 1 is in a negative pressure state, thereby ensuring the smooth progress of the coating process.

[0028] The first spoiler 2 includes a first bottom plate 21 and a first side plate 22 and a second side plate 23 extending from the left and right sides of the first bottom plate 21 toward the direction of the air outlet 4. The first opening 6 is provided on the first side plate 23 and the second side plate 24. That is, the cross section of the first spoiler 2 is shape, the entire second cavity becomes a spoiler cavity.

[0029] The first openings 6 are arranged longitudinally on the first side plate 23 and the second side plate 24 , and the size, number and position of the holes can be set according to actual needs.

[0030] The second spoiler 3 includes a second bottom plate 31 and a third side plate 32 and a fourth side plate 33 extending from the left and right sides of the second bottom plate 31 respectively toward the direction of the feed port 5, and the second opening 7 is provided on the third side plate 32 and the fourth side plate 33. That is, the cross section of the second spoiler 3 is shape, the entire first cavity becomes a spoiler cavity.

[0031] The second openings 7 are arranged longitudinally on the third side plate 32 and the fourth side plate 33 , and the size, number and position of the holes can be set according to actual needs.

[0032] In the height direction, the position of the feed port 5 is higher than that of the exhaust port 4. In the circumferential direction, the feed port 5 and the exhaust port 4 are arranged on opposite sides of the deposition chamber 1 to form a better spoiler effect. The first spoiler plate 2 and the second spoiler plate 3 are symmetrically arranged on the inner side wall of the deposition chamber 1.

[0033] The utility model has an ingenious structural design. By arranging the first spoiler 2 and the second spoiler 3 on the inner side wall of the deposition chamber 1, which are respectively connected to the feed port 5 and the exhaust port 4, the coating material entering the deposition chamber 1 from the feed port 5 can enter in a diffused manner, thereby preventing the coating material from impacting the substrate. In addition, since the hot steam entering from the feed port 5 will pressurize the deposition chamber, it is necessary to maintain negative pressure by exhausting air.

[0034] According to the disclosure and teaching of the above description, the technical personnel in the field to which the utility model belongs can also change and modify the above implementation. Therefore, the utility model is not limited to the specific implementation methods disclosed and described above, and some modifications and changes to the utility model should also fall within the scope of protection of the claims of the utility model. In addition, although some specific terms are used in this specification, these terms are only for the convenience of description and do not constitute any limitation to the utility model.

Claims

1. A flow disturbance and anti-collision structure for chemical vapor deposition equipment, characterized in that: It includes a deposition chamber and a first spoiler and a second spoiler arranged on the inner wall of the deposition chamber. The side wall of the deposition chamber is also provided with an exhaust port and a feed port. The first spoiler is connected to the exhaust port, and the second spoiler is connected to the feed port. The sides of the first spoiler and the second spoiler are respectively provided with a plurality of first openings and second openings.

2. The anti-collision structure for chemical vapor deposition equipment according to claim 1, characterized in that: The first spoiler includes a first bottom plate and a first side plate and a second side plate extending from left and right sides of the first bottom plate respectively toward the direction of the air suction port, and the first opening is provided on the first side plate and the second side plate.

3. The anti-collision structure for chemical vapor deposition equipment according to claim 2, characterized in that: The first openings are longitudinally arranged on the first side plate and the second side plate.

4. The anti-collision structure for chemical vapor deposition equipment according to claim 1, characterized in that: The second spoiler includes a second bottom plate and a third side plate and a fourth side plate extending from left and right sides of the second bottom plate respectively toward the direction of the feed port, and the second opening is arranged on the third side plate and the fourth side plate.

5. The anti-collision structure for chemical vapor deposition equipment according to claim 4, characterized in that: The second openings are longitudinally arranged on the third side plate and the fourth side plate.

6. The anti-collision structure for chemical vapor deposition equipment according to claim 1, characterized in that: The second spoiler includes a second bottom plate and a third side plate and a fourth side plate extending from left and right sides of the second bottom plate respectively toward the direction of the feed port, and the second opening is arranged on the third side plate and the fourth side plate.

7. The anti-collision structure for chemical vapor deposition equipment according to claim 1, characterized in that: In the height direction, the position of the feed port is higher than the position of the air extraction port.

8. The anti-collision structure for chemical vapor deposition equipment according to claim 1, characterized in that: In the circumferential direction, the feed port and the gas extraction port are arranged on two opposite sides of the deposition chamber.

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