Touch screen structure
By adding a multi-layer film structure on the touch screen substrate, including SINx high folding layer, SIO2 low folding layer and SIONx thin film layer, and making a transparent conductive layer and an insulating layer, the problem of not being able to achieve good anti-colour and integrated color effect at the same time in the prior art is solved, and better integrated color effect and anti-colour effect are achieved.
Patent Information
- Application Number
- CN202421776246.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-25
- Publication Date
- 2025-05-06
- Estimated Expiration
- 2034-07-25
AI Technical Summary
Under the prior art, touch products cannot achieve good anti-colour effect and integrated color effect at the same time, resulting in poor integrated color effect when adjusting anti-colour effect, and vice versa.
By adding SINx high fold layer, SIO2 low fold layer and SIONx film layer to the substrate, and making ITO Jumper transparent conductive layer, OC1 insulating layer and ITO line transparent conductive layer on it, combined with OC2 protective layer, we can achieve both the deshaping of conductive lines and the integrated color effect.
In the off-screen state, the screen is close to the black of the border, the color difference value △E is reduced, and the integrated color effect is improved. At the same time, the effective destruction of conductive lines is achieved, achieving the dual effects of destruction and integrated color.
Smart Images

Figure CN222838411U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of touch display, and in particular to a touch screen structure. Background Art
[0002] The touch products are coated with ITO conductive film, which is etched to become conductive lines. These lines are visible on the touch products under normal conditions, affecting the user's viewing experience. Nowadays, by stacking film layers with different refractive indices, the ITO lines can disappear from the user's visual view, and the shadows of the ITO lines can disappear. The above method is called shadow elimination. At present, the industry mainly uses SIONx plus ITO, IM plus ITO, ITO plus SIONx, ITO plus IM and other structures to achieve the shadow elimination effect.
[0003] At the same time, touch-screen electronic products are surrounded by black borders, with a display screen and touch screen in the middle. Through a certain optical film process, the middle screen and the four black frames are made to be consistent in color in the black screen state. The above process is called one-color process.
[0004] However, under the current technology, when the shadow elimination effect of existing touch products is better, the one-piece color effect will be poor; when the one-piece color effect is adjusted to a better one, the shadow elimination effect is poor again, and it is impossible to effectively achieve a balance between the shadow elimination effect and the one-piece color process. Utility Model Content
[0005] The utility model aims to provide a touch screen structure to solve the problem that the shadow elimination process and the one-piece color process cannot be simultaneously implemented on the touch screen under the prior art.
[0006] To achieve this object, the utility model adopts the following technical scheme: the utility model provides a touch screen structure, including a substrate, a BM shading layer is formed on one side of the substrate by development and curing, a SINx high folding layer is sputtered on the substrate, the sputtered SINx high folding layer is on the upper side of the BM shading layer, a SIO2 low folding layer is sputtered on the SINx high folding layer, an ITO Jumper transparent conductive layer is made on the SIO2 low folding layer, an OC1 insulating layer is wrapped on the outer side of the ITO Jumper transparent conductive layer by exposure and curing, an ITO line transparent conductive layer is covered on the OC1 insulating layer and the SIO2 low folding layer, a SIONx thin film layer is covered on the ITO line transparent conductive layer, and an OC2 protective layer is covered on the upper side of the SIONx thin film layer.
[0007] Preferably, the thickness of the BM light shielding layer is 1.5-2.0 μm.
[0008] Preferably, the thickness of the SINx high-folding layer is 10-25 nm, and the refractive index of the SINx high-folding layer is 1.85-2.0.
[0009] Preferably, the thickness of the SIO2 low-fold layer is 20-40 nm, and the refractive index of the SIO2 low-fold layer is 1.46-1.49.
[0010] Preferably, the thickness of the ITO Jumper transparent conductive layer is 20-135 nm.
[0011] Preferably, the thickness of the OC1 insulating layer is 1.0-2.0 μm.
[0012] Preferably, the thickness of the ITO line transparent conductive layer is 20-135 nm.
[0013] Preferably, the thickness of the SIONx thin film layer is 60-100 nm, and the refractive index of the SIONx thin film layer is 1.65-1.75.
[0014] Preferably, the OC2 protective layer has a thickness of 1.5-2.5 μm.
[0015] Beneficial effects: By additionally adding a SINx high-fold layer, a SIO2 low-fold layer and a SIONx thin film layer on the substrate, the screen can be made close to the black of the frame when the screen is off, so that the color difference value △E is reduced, and the frame is closer to the screen display area, and the one-piece color effect is better. At the same time, the conductive lines are eliminated through the ITO Jumper transparent conductive layer, OC1 insulating layer and ITO line transparent conductive layer, and the functions of eliminating shadows and one-piece color can be realized at the same time. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 It is a cross-sectional view of the touch screen structure of the utility model.
[0017] In the figure: 1. Substrate; 2. BM shading layer; 3. SINx high fold layer; 4. SIO2 low fold layer; 5. ITO Jumper transparent conductive layer; 6. OC1 insulating layer; 7. ITO line transparent conductive layer; 8. SIONx thin film layer; 9. OC2 protective layer. DETAILED DESCRIPTION
[0018] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only the parts related to the present invention, rather than all structures, are shown in the accompanying drawings.
[0019] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected", and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0020] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.
[0021] In the description of this embodiment, the terms "upper", "lower", "right", etc., are based on the directions or positions shown in the drawings, and are only for the convenience of description and simplified operation, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as a limitation of the present invention. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.
[0022] Under existing technologies, touch products cannot have both the ability to eliminate shadows and the ability to have one-color.
[0023] In order to solve the above problems, Figure 1 As shown, the utility model provides a touch screen structure, which includes a substrate 1, a BM light shielding layer 2 is formed on one side of the substrate 1 through development and curing, a SINx high folding layer 3 is sputtered on the substrate 1, the SINx high folding layer 3 is sputtered on the upper side of the BM light shielding layer 2, a SIO2 low folding layer 4 is sputtered on the SINx high folding layer 3, an ITO Jumper transparent conductive layer 5 is made on the SIO2 low folding layer 4, an OC1 insulating layer 6 is wrapped on the outer side of the ITO Jumper transparent conductive layer 5 through exposure and curing, an ITO line transparent conductive layer 7 is covered on the OC1 insulating layer 6 and the SIO2 low folding layer 4, a SIONx thin film layer 8 is covered on the ITO line transparent conductive layer 7, and an OC2 protective layer 9 is covered on the upper side of the SIONx thin film layer 8.
[0024] The thickness of the BM light shielding layer 2 of the present invention is 1.5-2.0 μm, which reserves space for the subsequent SINx high folding layer 3 and SIO2 low folding layer 4. At the same time, the BM light shielding layer 2 mainly plays a light shielding role to avoid light leakage.
[0025] Afterwards, a SINx high fold layer 3 is disposed on the upper side of the BM light shielding layer 2. The thickness of the SINx high fold layer 3 is 10-25 nm, and the refractive index of the SINx high fold layer 3 is 1.85-2.0, which can increase the strength of the screen and improve its ability to resist impact.
[0026] At the same time, a SIO2 low-fold layer 4 is paved on the upper side of the SINx high-fold layer 3. The thickness of the SIO2 low-fold layer 4 is 20-40 nm, and the refractive index of the SIO2 low-fold layer 4 is 1.46-1.49. By superimposing the SINx high-fold layer 3 and the SIO2 low-fold layer 4, the integrity can be improved without affecting the shadow elimination effect.
[0027] The thickness of the ITO Jumper transparent conductive layer 5 is 20-135 nm. The ITO Jumper transparent conductive layer 5 can realize the touch function as a jumper structure.
[0028] The thickness of the OC1 insulating layer 6 is 1.0-2.0 μm, which protects the internal ITO jumper transparent conductive layer 5 while ensuring the original shadow elimination capability.
[0029] The thickness of the ITO line transparent conductive layer 7 is 20-135 nm under the resistance requirement.
[0030] The thickness of the SIONx film layer 8 is 60-100 nm, and the refractive index of the SIONx film layer 8 is 1.65-1.75. The SIONx film layer 8 can ensure that the internal structure is eliminated, so that the user cannot observe the internal etching marks, thereby meeting the design requirements.
[0031] The thickness of the OC2 protective layer 9 is 1.5-2.5 μm, which can protect the internal structure while ensuring the shadow elimination, avoid the internal structure from being damaged, and maintain the shadow elimination and integration capabilities of the touch screen structure.
[0032] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the implementation methods of the present invention. For those skilled in the art, various obvious changes, readjustments and substitutions can be made without departing from the scope of protection of the present invention. It is not necessary and impossible to list all implementation methods here. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention shall be included in the scope of protection of the claims of the present invention.
Claims
1. A touch screen structure, characterized in that: The invention comprises a substrate (1), a BM light shielding layer (2) is formed on one side of the substrate (1) through development and curing, a SINx high-folding layer (3) is sputtered on the substrate (1), the sputtered SINx high-folding layer (3) is on the upper side of the BM light shielding layer (2), a SIO2 low-folding layer (4) is sputtered on the SINx high-folding layer (3), an ITO Jumper transparent conductive layer (5) is formed on the SIO2 low-folding layer (4), an OC1 insulating layer (6) is wrapped around the outer side of the ITO Jumper transparent conductive layer (5) through exposure and curing, an ITO line transparent conductive layer (7) is covered on the OC1 insulating layer (6) and the SIO2 low-folding layer (4), a SIONx thin film layer (8) is covered on the ITO line transparent conductive layer (7), and an OC2 protective layer (9) is covered on the upper side of the SIONx thin film layer (8).
2. The touch screen structure according to claim 1, characterized in that: The thickness of the BM light shielding layer (2) is 1.5-2.0 μm.
3. The touch screen structure according to claim 1, characterized in that: The thickness of the SINx high-folding layer (3) is 10 to 25 nm, and the refractive index of the SINx high-folding layer (3) is 1.85 to 2.
0.
4. The touch screen structure according to claim 1, characterized in that: The thickness of the SIO2 low-fold layer (4) is 20-40 nm, and the refractive index of the SIO2 low-fold layer (4) is 1.46-1.
49.
5. The touch screen structure according to claim 1, characterized in that: The thickness of the ITO jumper transparent conductive layer (5) is 20-135 nm.
6. The touch screen structure according to claim 1, characterized in that: The thickness of the OC1 insulating layer (6) is 1.0-2.0 μm.
7. The touch screen structure according to claim 1, characterized in that: The thickness of the ITO line transparent conductive layer (7) is 20-135 nm.
8. The touch screen structure according to claim 1, characterized in that: The thickness of the SIONx thin film layer (8) is 60 to 100 nm, and the refractive index of the SIONx thin film layer (8) is 1.65 to 1.
75.
9. The touch screen structure according to claim 1, characterized in that: The thickness of the OC2 protective layer (9) is 1.5-2.5 μm.