Low-reflection low-transmittance neutral-color temperable low-emissivity coated glass

Abstract

The utility model discloses low-reflection low-transmittance neutral-color temperable low-emissivity coated glass in the technical field of glass magnetron sputtering coating, which comprises a glass substrate and a coating layer, the coating layer is sequentially compounded with a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer and a ninth film layer from the glass substrate to the outside, the first film layer is a silicon nitride layer, the second film layer is a nickel-chromium layer, the third film layer is a silicon nitride layer, the fourth film layer is a nickel-chromium layer, and the ninth film layer is a nickel-chromium layer. The fifth film layer is a silver layer, the sixth film layer is a copper layer, the seventh film layer is a silver layer, the eighth film layer is a nickel-chromium layer, and the ninth film layer is a silicon nitride layer. According to the coated glass, the transmission color is neutral, the effects of low transmittance and low reflection effect are achieved, and a temperable low-transmittance low-radiation coated glass product system is enriched.

Description

Technical Field

[0001] The utility model relates to the technical field of glass magnetron sputtering coating, in particular to a low-reflection, low-transmittance, neutral-color, temperable, low-radiation coated glass. Background Art

[0002] As competition in the curtain wall glass deep processing industry becomes increasingly fierce, product upgrades are particularly important. Traditional low-transmittance tempered low-radiation coated glass has high reflectivity and the visible surface color is green and blue. When installed on the curtain walls of high-rise buildings, it will cause certain light pollution, dizziness and visual fatigue, and the market feedback information effect is not very ideal. The present invention breaks the characteristics of traditional low-transmittance tempered low-radiation coated glass, so that the product has low transmittance and low reflectivity, and the reflected color and transmitted color are neutral colors. The present invention meets the needs of the current and future markets, and will definitely bring new profit growth points, improve customer satisfaction and market competitiveness, and thus enrich the low-transmittance glass product system for building curtain walls.

[0003] In the prior art, there are many tempered low-emissivity coated glass products, but the low-transmittance steel series products on the market have a green transmittance color and a green and blue reflectance color, and the transmittance color cannot be neutral. In addition, the low-transmittance steel series products on the market have high reflection on the visible surface, which can easily cause dizziness and visual fatigue. The market satisfaction is poor, and the low transmittance and low reflection effects cannot be achieved.

[0004] Based on this, the utility model designs a low-reflection, low-transmittance, neutral-color, tempered, low-radiation coated glass to solve the above problems. Utility Model Content

[0005] The purpose of the utility model is to provide a low-reflection, low-transmittance, neutral-color tempered low-radiation coated glass to solve the problem that the low-transmittance tempered glass series products on the market mentioned in the above background technology have a green transmittance color, a green and blue reflectance color, and the transmittance color cannot be a neutral color. In addition, the low-transmittance tempered glass series products on the market have high reflection on the visible surface, which can easily cause dizziness and visual fatigue, poor market satisfaction, and cannot achieve low transmittance and low reflection effects.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a low-reflection, low-transmittance, neutral-color, tempered, low-radiation coated glass, comprising a glass substrate and a coating layer, wherein the coating layer is compounded with a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer and a ninth film layer in sequence from the glass substrate to the outside, wherein the first film layer is set as a silicon nitride layer, and the coating thickness of the first film layer is 20nm to 30nm, the second film layer is set as a nickel-chromium layer, and the coating thickness of the second film layer is 2nm to 3nm, the third film layer is set as a silicon nitride layer, and the coating thickness of the third film layer is 20nm to 30nm, The film thickness is 20nm~25nm, the fourth film layer is set to a nickel-chromium layer, and the coating thickness of the fourth film layer is 1.5nm~2nm, the fifth film layer is set to a silver layer, and the coating thickness of the fifth film layer is 2nm~3nm, the sixth film layer is set to a copper layer, and the coating thickness of the sixth film layer is 5nm~10nm, the seventh film layer is set to a silver layer, and the coating thickness of the seventh film layer is 2nm~3nm, the eighth film layer is a nickel-chromium layer, and the coating thickness of the eighth film layer is 1nm~2nm, the ninth film layer is a silicon nitride layer, and the coating thickness of the ninth film layer is 30nm~35nm.

[0007] Preferably, the sum of the thicknesses of the first film layer, the second film layer, the third film layer, the fourth film layer, the fifth film layer, the sixth film layer, the seventh film layer, the eighth film layer and the ninth film layer is not less than 90 nm and not greater than 115 nm.

[0008] A method for preparing the low-reflection, low-transmittance, neutral-color, temperable, low-radiation coated glass, the method comprising the following steps: performing vacuum magnetron sputtering on the surface of a glass substrate using a target material under a vacuum environment, and sputtering in sequence to form a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer, and a ninth film layer;

[0009] 1) Magnetron sputtering coating layer;

[0010] A. Magnetron sputtering first film layer:

[0011] Number of targets: 3 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0012] B. Magnetron sputtering second film layer:

[0013] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0014] C. Magnetron sputtering third film layer:

[0015] Number of targets: 3 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0016] D. Magnetron sputtering fourth film layer:

[0017] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0018] E. Magnetron sputtering fifth film layer:

[0019] Target quantity: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0020] F. Magnetron sputtering sixth film layer:

[0021] Target quantity: 2 DC planar targets; target configuration is copper (Cu); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0022] G. Magnetron sputtering seventh film layer:

[0023] Target quantity: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0024] H. Magnetron sputtering eighth film layer:

[0025] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0026] I. Magnetron sputtering ninth film layer:

[0027] Target quantity: 5-6 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0028] Preferably, the transmission speed of the sputtering chamber is controlled at 7-8 m / min.

[0029] Compared with the prior art, the utility model has the following beneficial effects: in the coated glass, the second film layer, the fourth film layer and the eighth film layer are set as nickel-chromium (NiCr) layers, which have the effect of increasing the absorption of sunlight and improving the light trapping effect, and can greatly improve the visible light absorptivity of the coated glass, so that the coated glass has a low visible light reflectivity under the condition of low transmittance. At the same time, the fourth film layer of nickel-chromium (NiCr) layer is in close contact with the fifth film layer of silver (Ag), and the eighth film layer of nickel-chromium (NiCr) layer is in close contact with the seventh film layer of silver (Ag), which plays the role of a protective layer, and can effectively avoid the fifth film layer of silver (Ag) and the seventh film layer of silver ( Ag) layer is oxidized, and the sixth film layer copper (Cu) layer has the effect of a functional layer and also plays a role in adjusting the transmittance color. By adding the sixth film layer copper (Cu) layer, the transmittance color of the coated glass is a neutral color that is very popular in the market. Specifically, the transmittance color of a single piece of 6mm product is T∈[38,45], a*∈[0,-1], b*∈[0,-1], and the reflectance color is Yg∈[7,8], a*∈[0,-1], b*∈[0,-1]. The transmittance color of the coated glass is neutral, achieving the effects of low transmittance and low reflection, enriching the product system of low-transmittance and low-radiation coated glass. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for describing the embodiments are briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0031] Figure 1 It is a schematic diagram of the layered structure of the coated glass.

[0032] In the accompanying drawings, the components represented by the reference numerals are listed as follows:

[0033] 1-first film layer, 2-second film layer, 3-third film layer, 4-fourth film layer, 5-fifth film layer, 6-sixth film layer, 7-seventh film layer, 8-eighth film layer, 9-ninth film layer. DETAILED DESCRIPTION

[0034] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0035] See also Figure 1The utility model provides a technical solution: a low-reflection, low-transmittance, neutral-color, tempered, low-radiation coated glass, comprising a glass substrate and a coating layer, wherein the coating layer is compounded with a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer and a ninth film layer in sequence from the glass substrate to the outside, wherein the first film layer 1 is set as a silicon nitride layer, and the coating thickness of the first film layer 1 is 20nm to 30nm, the second film layer 2 is set as a nickel-chromium layer, and the coating thickness of the second film layer 2 is 2nm to 3nm, the third film layer 3 is set as a silicon nitride layer, and the coating thickness of the third film layer 3 is 20nm to 30nm. m~25nm, the fourth film layer 4 is set to a nickel-chromium layer, and the coating thickness of the fourth film layer 4 is 1.5nm~2nm, the fifth film layer 5 is set to a silver layer, and the coating thickness of the fifth film layer 5 is 2nm~3nm, the sixth film layer 6 is set to a copper layer, and the coating thickness of the sixth film layer 6 is 5nm~10nm, the seventh film layer 7 is set to a silver layer, and the coating thickness of the seventh film layer 7 is 2nm~3nm, the eighth film layer 8 is a nickel-chromium layer, and the coating thickness of the eighth film layer 8 is 1nm~2nm, the ninth film layer 9 is a silicon nitride layer, and the coating thickness of the ninth film layer 9 is 30nm~35nm.

[0036] Among them, the sum of the film thicknesses of the first film layer, the second film layer, the third film layer, the fourth film layer, the fifth film layer, the sixth film layer, the seventh film layer, the eighth film layer and the ninth film layer is not less than 90nm and not greater than 115nm.

[0037] In the coated glass, the second film layer 2, the fourth film layer 4, and the eighth film layer 8 are set as nickel-chromium (NiCr) layers, which have the effect of increasing the absorption of sunlight and improving the light trapping effect, and can greatly improve the visible light absorptivity of the coated glass, so that the coated glass has a low visible light reflectivity under the condition of low transmittance. At the same time, the fourth film layer 4 nickel-chromium (NiCr) layer is in close contact with the fifth film layer 5 silver (Ag) layer, and the eighth film layer 8 nickel-chromium (NiCr) layer is in close contact with the seventh film layer 7 silver (Ag) layer, which plays the role of a protective layer, and can effectively avoid the The fifth film layer 5 silver (Ag) layer and the seventh film layer 7 silver (Ag) layer are oxidized, and the sixth film layer 6 copper (Cu) layer has the effect of a functional layer while also playing a role in adjusting the transmittance color. By adding the sixth film layer 6 copper (Cu) layer, the transmittance color of the coated glass is a neutral color that is very popular in the market. Specifically, the transmittance color of a single piece of a 6mm product is T∈[38,45], a*∈[0,-1], b*∈[0,-1], and the reflectance color is Yg∈[7,8], a*∈[0,-1], b*∈[0,-1].

[0038] A method for preparing low-reflection, low-transmittance, neutral-color, temperable, low-radiation coated glass, the method comprising the following steps: performing vacuum magnetron sputtering on a surface of a glass substrate using a target material under a vacuum environment, and sequentially sputtering to form a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer, and a ninth film layer;

[0039] 1) Magnetron sputtering coating layer;

[0040] A. Magnetron sputtering first film layer 1:

[0041] Number of targets: 3 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0042] B. Magnetron sputtering second film layer 2:

[0043] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0044] C. Magnetron sputtering third film layer 3:

[0045] Number of targets: 3 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0046] D. Magnetron sputtering fourth film layer 4:

[0047] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0048] E. Magnetron sputtering fifth film layer 5:

[0049] Target quantity: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0050] F. Magnetron sputtering sixth film layer 6:

[0051] Target quantity: 2 DC planar targets; target configuration is copper (Cu); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0052] G. Magnetron sputtering seventh film layer 7:

[0053] Target quantity: 1 DC plane target; target configuration is silver (Ag); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0054] H, magnetron sputtering eighth film layer 8:

[0055] Target quantity: 1 DC plane target; target configuration is nickel chromium (NiCr); process gas ratio: pure argon; sputtering gas pressure is 2~5X10-3mbar;

[0056] I. Magnetron sputtering ninth film layer 9:

[0057] Target quantity: 5-6 AC rotating targets; target configuration is silicon aluminum (SiAl); process gas ratio: argon and nitrogen, the ratio of argon and nitrogen is 1:1.3; sputtering pressure is 3~8X10-3mbar;

[0058] The total film thickness is controlled at 90-115nm, and the transmission speed of the sputtering chamber is generally controlled at 7-8m / min.

[0059] The glass substrate is float glass with a thickness of 3 to 12 mm.

[0060] Examples 1-4

[0061] A low-reflection, low-transmittance, neutral-color, temperable, low-radiation coated glass and a preparation method thereof, comprising the following steps:

[0062] A: Select a glass substrate and cut it into the predetermined size using a cutting machine, with the air side of the substrate facing upwards, and clean it with a cleaning machine and use an air knife to blow dry the moisture;

[0063] B: The cleaned substrate is sent into the vacuum magnetron sputtering chamber, and each coating layer is sputtered in sequence. The specific parameters are shown in Table 1.

[0064]

[0065]

[0066] The green-tone low-emissivity coated glass obtained in the above embodiment is tested for optical properties of the glass obtained in Examples 1 to 4 in accordance with GB / T18915.2-2002 "Coated Glass Part 2: Low-emissivity Coated Glass". The test results are shown in Table 2:

[0067] Table 2

[0068] Example 1 Example 2 Example 3 Example 4 Visible light transmittance (%) 43.1 40.3 38.8 42.8 Transmittance color a* value -0.2 -0.8 -0.9 -0.3 Transmittance b* value -0.2 -0.3 -1.0 -0.4 Glass surface reflectivity (%) 7.8 7.2 7.4 7.6 Glass surface reflection color a* value -0.3 -0.5 -0.8 -0.2 Glass surface reflection color b* value -0.8 -0.2 -0.5 -0.1

[0069] The specific embodiments described herein are merely examples of the spirit of the present invention. Those skilled in the art may make various modifications or additions to the specific embodiments described or replace them in similar ways, but they will not deviate from the spirit of the present invention or exceed the scope defined by the appended claims.

[0070] The preferred embodiments of the utility model disclosed above are only used to help explain the utility model. The preferred embodiments do not describe all the details in detail, nor do they limit the utility model to the specific implementation methods described. Obviously, many modifications and changes can be made according to the content of this specification. This specification selects and specifically describes these embodiments in order to better explain the principles and practical applications of the utility model, so that technicians in the relevant technical field can well understand and use the utility model. The utility model is limited only by the claims and their full scope and equivalents.

Claims

1. A low-reflection, low-transmittance, neutral-color, temperable, low-radiation coated glass, comprising a glass substrate and a coating layer, characterized in that: The coating layer is compounded from the glass substrate to the outside in sequence with a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer and a ninth film layer, wherein the first film layer (1) is configured as a silicon nitride layer, and the coating thickness of the first film layer (1) is 20nm to 30nm, the second film layer (2) is configured as a nickel-chromium layer, and the coating thickness of the second film layer (2) is 2nm to 3nm, the third film layer (3) is configured as a silicon nitride layer, and the coating thickness of the third film layer (3) is 20nm to 25nm, the fourth film layer (4) is configured as a nickel-chromium layer, and the fourth film layer (4) The coating thickness is 1.5nm to 2nm, the fifth film layer (5) is set as a silver layer, and the coating thickness of the fifth film layer (5) is 2nm to 3nm, the sixth film layer (6) is set as a copper layer, and the coating thickness of the sixth film layer (6) is 5nm to 10nm, the seventh film layer (7) is set as a silver layer, and the coating thickness of the seventh film layer (7) is 2nm to 3nm, the eighth film layer (8) is a nickel-chromium layer, and the coating thickness of the eighth film layer (8) is 1nm to 2nm, and the ninth film layer (9) is a silicon nitride layer, and the coating thickness of the ninth film layer (9) is 30nm to 35nm.

2. The low-reflection, low-transmittance, neutral-color, temperable, low-emissivity coated glass according to claim 1, characterized in that: The sum of the thicknesses of the first film layer, the second film layer, the third film layer, the fourth film layer, the fifth film layer, the sixth film layer, the seventh film layer, the eighth film layer and the ninth film layer is not less than 90 nm and not greater than 115 nm.

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