Gas-liquid mixture vaporization system and reaction system

By designing a gas-liquid mixed material vaporization system, the injection mixer and material mixer are used to achieve full mixing of gas-phase and liquid phase materials, the problem of uneven gas-liquid mixing in chemical enterprises is solved, and the utilization rate and energy efficiency of low-temperature thermal energy are improved.

CN222854614UActive Publication Date: 2025-05-13QINGHAI ASIA SILICON POLYSILICON CO LTD +5
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202421766080.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-07-24
Publication Date
2025-05-13
Estimated Expiration
2034-07-24

AI Technical Summary

Technical Problem

In chemical companies, uneven gas-liquid mixing leads to low low-temperature thermal energy utilization, affecting energy efficiency.

Method used

A gas-liquid mixed material vaporization system is designed, including an evaporator, an injection mixer and a material mixer. The gas-phase material and the liquid phase material are fully mixed through the injection mixer, and then further mixed through the material mixer, and then enter the evaporator for heating and vaporization.

Benefits of technology

The gas-phase and liquid phase materials are fully and uniformly mixed, the utilization rate of low-temperature heat sources is improved, and energy consumption is reduced.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN222854614U_ABST
    Figure CN222854614U_ABST
Patent Text Reader

Abstract

The utility model provides a gas-liquid mixture vaporization system and a reaction system, and relates to the technical field of chemical engineering. The gas-liquid mixed material vaporization system comprises an evaporator, a jet mixer and a material mixer; a liquid-phase inlet is formed in the upper part of the evaporator; a gas outlet is formed in the top of the evaporator; the jet mixer is provided with a gas phase inlet; the interior of the evaporator communicates with the jet mixer, so that the liquid-phase material in the evaporator enters the jet mixer, and the gas-phase material can atomize the liquid-phase material in the jet mixer to obtain a mixture; an inlet of the material mixer is communicated with an outlet of the jet mixer, so that a mixture can enter the material mixer from the jet mixer to be mixed; the material mixer is installed on the lower portion of the evaporator, and the outlet end of the material mixer is located in the evaporator so that a mixture discharged from the material mixer can enter the evaporator to be heated and vaporized and can be discharged from the gas outlet. The condition that gas and liquid are not mixed uniformly can be improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The present application relates to the field of chemical technology, and in particular to a gas-liquid mixture material vaporization system and a reaction system. Background Art

[0002] Chemical enterprises use many types of energy with different grades. The process is both heat absorbing and heat releasing. The fuel, steam, electricity, mechanical energy used in large quantities in production and the combustible gas, reaction heat and various waste heat generated in the production process are effectively combined to achieve efficient utilization of system energy. About 80% of the total heat energy consumed by chemical enterprises is ultimately released as low-temperature heat energy. Therefore, the effective use of low-temperature heat energy is the key to improving the utilization rate of chemical energy. In the chemical industry, in reactions involving both liquid and gas phases, the liquid and gas phases can be mixed first, and the mixed material can be heated by a preheater, and finally passed into an evaporator for evaporation to improve the utilization rate of low-grade heat sources. However, this process is prone to uneven mixing of gas and liquid. Utility Model Content

[0003] The present application provides a gas-liquid mixed material vaporization system and a reaction system, which can improve the situation of uneven gas-liquid mixing.

[0004] This application is implemented as follows:

[0005] In a first aspect, the present application provides a gas-liquid mixed material vaporization system, comprising:

[0006] An evaporator, wherein the upper portion of the evaporator has a liquid inlet for feeding liquid materials; and the top of the evaporator has a gas outlet;

[0007] a jet mixer having a gas phase inlet for feeding a gas phase material; the interior of the evaporator is connected to the jet mixer so that the liquid phase material in the evaporator can enter the jet mixer, and the gas phase material can atomize the liquid phase material in the jet mixer to obtain a mixture; and

[0008] A material mixer, wherein the inlet of the material mixer is communicated with the outlet of the jet mixer so that the mixture can enter the material mixer from the jet mixer for mixing; the material mixer is installed at the lower part of the evaporator, and the outlet end of the material mixer is located inside the evaporator so that the mixture discharged from the material mixer can enter the evaporator for heating and vaporization and can be discharged from the gas outlet.

[0009] In a possible embodiment, the material mixer has multiple sections of interconnected pipelines, and the multiple sections of pipelines are arranged in an S shape.

[0010] In a possible embodiment, the pipe has an internal passage therein, and the internal passage is spiral-shaped.

[0011] In a possible embodiment, a discharge device is provided at the outlet end of the material mixer, and the discharge device includes at least one discharge pipe, and a pipe wall of the discharge pipe is provided with a plurality of discharge holes.

[0012] In a possible implementation manner, two discharge pipes are provided, and the two discharge pipes are arranged in a V shape.

[0013] In a possible implementation manner, the material mixer and the evaporator are an integrated structure.

[0014] In a possible embodiment, a preheater is further included, wherein the outlet of the preheater is connected to the liquid phase inlet of the evaporator, and the inlet of the preheater is used to supply liquid phase material. The liquid phase material can enter the evaporator after being preheated by the preheater.

[0015] In a possible embodiment, it also includes a first heat source supply device and a first heat source recovery device, wherein the first heat source supply device and the first heat source recovery device are both connected to the preheater, the first heat source supply device is used to supply heat source into the preheater to heat the liquid phase material in the preheater, and the first heat source recovery device is used to recover the heat source in the preheater.

[0016] In a possible embodiment, it also includes a second heat source supply device and a second heat source recovery device, wherein the second heat source supply device and the second heat source recovery device are both connected to the evaporator, the second heat source supply device is used to supply heat source to the evaporator to heat the liquid phase material in the evaporator, and the second heat source recovery device is used to recover the heat source of the evaporator.

[0017] In a second aspect, the present application provides a reaction system, comprising a reactor and the gas-liquid mixture material vaporization system of the first aspect, wherein the inlet of the reactor is connected to the gas outlet of the evaporator.

[0018] The embodiments of the present application have at least the following beneficial effects:

[0019] In the gas-liquid mixed material vaporization system of the present application, the gas phase material atomizes the liquid phase material in the jet mixer, so that the gas phase material and the liquid phase material are fully mixed, and the mixture enters the material mixer for mixing again, and then enters the evaporator for heating and vaporization, so that the gas phase material and the liquid phase material are fully and evenly mixed. Furthermore, the present application can use the low-temperature waste heat source to achieve low-temperature vaporization of the liquid phase material mixed with the gas phase material in the evaporator, effectively utilizing the low-temperature heat source, improving the waste heat utilization, and reducing energy consumption. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present application and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without paying creative work.

[0021] Figure 1 A schematic diagram of a gas-liquid mixed material vaporization system according to an embodiment of the present application;

[0022] Figure 2 It is a schematic diagram of a material mixer according to an embodiment of the present application.

[0023] Icons: 10-gas-liquid mixed material vaporization system; 11-evaporator; 111-liquid phase inlet; 112-gas outlet; 12-jet mixer; 121-gas phase inlet; 13-material mixer; 131-pipeline; 1311-internal channel; 132-discharge device; 1321-discharge pipe; 1322-discharge hole; 14-preheater; 151-first heat source supply device; 152-first heat source recovery device; 153-second heat source supply device; 154-second heat source recovery device; 161-first pipeline; 162-second pipeline. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations.

[0025] Therefore, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the present application for which protection is sought, but merely represents selected embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0026] In the description of this application, it should be noted that the terms "upper", "lower", "inner", "outer", etc. indicate the orientation or position relationship based on the orientation or position relationship shown in the drawings, or the orientation or position relationship in which the product of the application is usually placed when in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application. In addition, the terms "first", "second", "third", etc. are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0027] In the description of this application, it should also be noted that, unless otherwise clearly specified and limited, the terms "set", "install", and "connect" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be a connection between the two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances. Example

[0028] This embodiment provides a gas-liquid mixed material vaporization system 10, please refer to Figure 1 , which includes an evaporator 11, a jet mixer 12 and a material mixer 13.

[0029] The upper part of the evaporator 11 has a liquid phase inlet 111 for feeding liquid phase materials. The jet mixer 12 has a gas phase inlet 121 for feeding gas phase materials. The inside of the evaporator 11 is connected to the jet mixer 12, so that the liquid phase materials in the evaporator 11 can enter the jet mixer 12, and the gas phase materials can atomize the liquid phase materials in the jet mixer 12 to obtain a mixture.

[0030] The inlet of the material mixer 13 is connected to the outlet of the jet mixer 12, so that the mixture can enter the material mixer 13 from the jet mixer 12 for mixing. The top of the evaporator 11 has a gas outlet 112, and the material mixer 13 is installed at the lower part of the evaporator 11. The outlet end of the material mixer 13 is located inside the evaporator 11, so that the mixture discharged from the material mixer 13 can enter the evaporator 11 for heating and vaporization and can be discharged from the gas outlet 112. Optionally, the material mixer 13 and the evaporator 11 are an integrated structure.

[0031] In the gas-liquid mixed material vaporization system 10 of the embodiment of the present application, the gas phase material atomizes the liquid phase material in the action of the jet mixer 12, so that the gas phase material and the liquid phase material are fully mixed, and the mixture enters the material mixer 13 for mixing again, and then enters the evaporator 11 for heating and vaporization, so that the gas phase material and the liquid phase material are fully and evenly mixed. In addition, the above-mentioned implementation scheme of the present embodiment adopts a design combining the evaporator 11 with the jet mixer 12 and the material mixer 13, replacing the scheme in the prior art that requires an additional preheater 14 to achieve the same effect. In the prior art, the preheater 14 is required to heat the mixed mixed material, and then pass it into the evaporator 11 for evaporation. The above-mentioned scheme of the present embodiment not only reduces the number of equipment used and saves equipment space, but also reduces the amount of pipeline 131, installation costs and other supporting auxiliary facilities, greatly reducing the production and operation costs.

[0032] Please refer to Figure 2 For example, the material mixer 13 has a plurality of connected pipes 131, and the plurality of pipes 131 are arranged in an S shape. The S-shaped arranged pipes 131 increase the contact area of ​​the medium, so that the mixture is heated more fully in the pipes 131 of the material mixer 13. Furthermore, the internal channel 1311 inside the pipe 131 is spiral, so that the mixture can be heated more evenly.

[0033] Exemplarily, the outlet end of the material mixer 13 is provided with a discharge device 132, and the discharge device 132 includes at least one discharge pipe 1321, and the tube wall of the discharge pipe 1321 is provided with a plurality of discharge holes 1322. It can help the gas to be discharged, and at the same time, it can further absorb the liquid phase material. Exemplarily, two discharge pipes 1321 are provided, and the two discharge pipes 1321 are arranged in a V shape. In other embodiments, the discharge pipe 1321 can also be arranged in three or four, and one end of the multiple discharge pipes 1321 is connected together and maintained in communication, and two adjacent discharge pipes 1321 are arranged in a V shape.

[0034] Furthermore, in some embodiments, the gas-liquid mixed material vaporization system 10 further includes a preheater 14, the outlet of the preheater 14 is connected to the liquid phase inlet 111 of the evaporator 11, and the inlet of the preheater 14 is used to supply liquid phase material, and the liquid phase material can enter the evaporator 11 after being preheated by the preheater 14. Among them, the liquid phase material is fed into the preheater 14 through the first pipeline 161, and the feed amount of the first pipeline 161 is controlled by the flow rate of the liquid phase material and the liquid level of the evaporator 11. When the liquid level of the evaporator 11 is too high, the feed amount of the preheater 14 can be reduced to reduce the liquid level of the evaporator 11. When the liquid level is too low, the feed amount of the first pipeline 161 can be increased to increase the liquid level of the evaporator 11.

[0035] The gas-liquid mixed material vaporization system 10 is further provided with a first heat source supply device 151 and a first heat source recovery device 152. Both the first heat source supply device 151 and the first heat source recovery device 152 are connected to the preheater 14. The first heat source supply device 151 is used to supply a low-temperature heat source to the preheater 14 to heat the liquid-phase material in the preheater 14, and the first heat source recovery device 152 is used to recover the heat source in the preheater 14. The first heat source supply device 151 supplies a low-temperature heat source to the preheater 14 to heat the liquid-phase material in the preheater 14, and the low-temperature heat source after cooling is recovered by the first heat source recovery device 152.

[0036] The gas-liquid mixed material vaporization system 10 is also provided with a second heat source supply device 153 and a second heat source recovery device 154. The second heat source supply device 153 and the second heat source recovery device 154 are both connected to the evaporator 11. The second heat source supply device 153 is used to supply heat source to the evaporator 11 to heat the liquid phase material in the evaporator 11, and the second heat source recovery device 154 is used to recover the heat source after cooling of the evaporator 11. Among them, the low-temperature heat source temperature of the second heat source supply device 153 is higher than the low-temperature heat source temperature of the first heat source supply device 151. The present application can utilize the low-temperature waste heat source to realize low-temperature vaporization of the liquid phase material mixed with the gas phase material in the evaporator 11, effectively utilizing the low-temperature heat source, improving the waste heat utilization, and reducing energy consumption.

[0037] The working principle of the gas-liquid mixed material vaporization system 10 of the present application embodiment is as follows:

[0038] According to the minimum ratio of gas-phase material to liquid-phase material in the reaction operation, the liquid-phase material is supplied to the preheater 14 through the first pipeline 161, and the liquid-phase material is preheated by the preheater 14 and supplied to the evaporator 11 from the liquid-phase inlet 111 of the evaporator 11; the gas-phase material is supplied to the jet mixer 12, and the liquid-phase material from the evaporator 11 is atomized by the jet mixer 12 to obtain a mixture, and the mixture enters the material mixer 13 from the jet mixer 12 for mixing, and then enters the evaporator 11 for heating and vaporization, and is discharged from the gas outlet 112 of the evaporator 11 after vaporization.

[0039] This embodiment also provides a reaction system, including a reactor and the above-mentioned gas-liquid mixed material vaporization system 10, wherein the inlet of the reactor is connected to the gas outlet 112 of the evaporator 11 through a second pipeline 162. The mixed gas discharged from the gas outlet 112 of the evaporator 11 enters the reactor through the second pipeline 162 for reaction.

[0040] In the reaction system of the present application, the gas phase material atomizes the liquid phase material in the jet mixer 12, so that the gas phase material and the liquid phase material are fully mixed, and the mixture enters the material mixer 13 for mixing again, and then enters the evaporator 11 for heating and vaporization, so that the gas phase material and the liquid phase material are fully and evenly mixed, which is conducive to full reaction in the reactor.

[0041] The above are only preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A gas-liquid mixed material vaporization system, characterized in that: include: An evaporator, wherein the upper portion of the evaporator has a liquid inlet for feeding liquid materials; and the top of the evaporator has a gas outlet; A jet mixer, wherein the jet mixer has a gas phase inlet for feeding gas phase materials; The interior of the evaporator is communicated with the jet mixer, so that the liquid phase material in the evaporator can enter the jet mixer, and the gas phase material can atomize the liquid phase material in the jet mixer to obtain a mixture; as well as A material mixer, wherein the inlet of the material mixer is communicated with the outlet of the jet mixer so that the mixture can enter the material mixer from the jet mixer for mixing; the material mixer is installed at the lower part of the evaporator, and the outlet end of the material mixer is located inside the evaporator so that the mixture discharged from the material mixer can enter the evaporator for heating and vaporization and can be discharged from the gas outlet.

2. The gas-liquid mixed material vaporization system according to claim 1, characterized in that: The material mixer is provided with multiple sections of pipelines that are connected, and the multiple sections of pipelines are arranged in an S shape.

3. The gas-liquid mixed material vaporization system according to claim 2, characterized in that: The pipe has an internal passage inside, and the internal passage is spiral-shaped.

4. The gas-liquid mixture material vaporization system according to any one of claims 1 to 3, characterized in that: The outlet end of the material mixer is provided with a discharge device, and the discharge device comprises at least one discharge pipe, and a pipe wall of the discharge pipe is provided with a plurality of discharge holes.

5. The gas-liquid mixed material vaporization system according to claim 4, characterized in that: Two discharge pipes are provided, and the two discharge pipes are arranged in a V shape.

6. The gas-liquid mixture material vaporization system according to any one of claims 1 to 3, characterized in that: The material mixer and the evaporator are an integrated structure.

7. The gas-liquid mixture material vaporization system according to any one of claims 1 to 3, characterized in that: It also includes a preheater, the outlet of the preheater is connected to the liquid phase inlet of the evaporator, the inlet of the preheater is used to supply liquid phase materials, and the liquid phase materials can enter the evaporator after being preheated by the preheater.

8. The gas-liquid mixed material vaporization system according to claim 7, characterized in that: It also includes a first heat source supply device and a first heat source recovery device, both of which are connected to the preheater. The first heat source supply device is used to supply heat source into the preheater to heat the liquid phase material in the preheater, and the first heat source recovery device is used to recover the heat source in the preheater.

9. The gas-liquid mixture material vaporization system according to any one of claims 1 to 3, characterized in that: It also includes a second heat source supply device and a second heat source recovery device, both of which are connected to the evaporator. The second heat source supply device is used to supply heat source to the evaporator to heat the liquid phase material in the evaporator, and the second heat source recovery device is used to recover the heat source of the evaporator.

10. A reaction system, characterized in that: It comprises a reactor and the gas-liquid mixture material vaporization system according to any one of claims 1 to 9, wherein the inlet of the reactor is connected to the gas outlet of the evaporator.