Filtering device for acrylic photoresist

Abstract

The utility model discloses a filtering device for acrylic photoresist, which comprises a device main body which is of a cylindrical structure, a feed port and a discharge port are arranged at the top end and the lower part of the device main body, a supporting seat is further fixed at the bottom of the device main body, and the filtering device further comprises a filter screen, the inner barrel is arranged in the device main body and is of a hollow cylindrical structure, and a filter plate is arranged in the middle of the inner barrel and is used for filtering; and the multi-stage vibration mechanism is arranged between the inner cylinder body and the device main body. According to the filtering device for the acrylic photoresist, the inner cylinder is arranged in the device main body, the filtering work of the photoresist can be completed through the filtering plate in the inner cylinder, and in the filtering process, a multi-stage vibration mechanism is arranged outside the whole inner cylinder, so that the filtering efficiency is improved; and the whole inner barrel can be driven to vibrate in the device main body, so that the photoresist can be quickly dropped and filtered in the vibration process.

Description

Technical Field

[0001] The utility model relates to the technical field related to acrylic photoresist, in particular to a filtering device for acrylic photoresist. Background Art

[0002] When preparing acrylic photoresist, in order to ensure the purity of the photoresist, it is generally necessary to filter the mixed photoresist through a filtering device to control the purity of the photoresist. Since the concentration and viscosity of the photoresist are relatively high, the filtering devices currently available on the market, when filtering, simply pour the mixed photoresist directly onto the top of the filtering device, so that the photoresist automatically falls and completes the filtering, which results in a very low filtering efficiency of the filtering device of the entire device. In addition, in order to ensure efficient filtering of the photoresist, the filtering devices currently available on the market generally provide an extrusion mechanism above the filter plate to extrude the photoresist. Although the extrusion can improve the filtering efficiency, due to the excessive number of parts provided inside the device, a large amount of photoresist will be adhered to the parts, which will cause a waste of photoresist. Utility Model Content

[0003] The purpose of the utility model is to provide a filtering device for acrylic photoresist, so as to solve the problem proposed in the above background technology that in order to ensure high-efficiency filtering of the photoresist, the filtering device currently on the market generally arranges an extrusion mechanism above the filter plate to extrude the photoresist. Although the extrusion work can improve the filtering efficiency, due to the excessive number of parts arranged inside the device, a large amount of photoresist will be adhered to the parts, thereby causing the problem of photoresist waste.

[0004] To achieve the above object, the utility model provides the following technical solution: a filtering device for acrylic photoresist, comprising a device body, which is arranged in a cylindrical structure, and a feed port and a discharge port are arranged at the top and the bottom of the device body, the feed port is used for feeding the photoresist, and the discharge port is used for discharging the filtered photoresist;

[0005] A support base is also fixed at the bottom of the device body, which is used to support the device body;

[0006] Also includes;

[0007] The inner cylinder is arranged inside the main body of the device and is in a hollow cylindrical structure. A filter plate is arranged in the middle of the inner cylinder for filtering.

[0008] The multi-stage vibration mechanism is arranged between the inner cylinder and the device body, and is used to perform multi-stage vibration of the inner cylinder to achieve the effect of multi-stage vibration filtering of the photoresist.

[0009] Preferably, reserved sliding grooves are symmetrically arranged on both sides of the inner wall of the device body, and return springs are arranged at upper and lower positions inside the reserved sliding grooves and connected to the inner cylinder.

[0010] Preferably, sliders are integrally installed on both sides of the inner cylinder, the sliders are engaged in the reserved slide grooves, the upper and lower positions of the sliders are connected to one side of the return spring, and a multi-stage vibration mechanism is provided at the bottom of the slider for performing multi-stage vibration of the inner cylinder.

[0011] Preferably, the size of the inner cylinder is larger than the size of the reserved slide groove, and the outer wall thereof fits with the inner wall of the device body.

[0012] Preferably, the multi-stage vibration mechanism includes a primary vibration mechanism, a secondary vibration mechanism and a tertiary vibration mechanism, and the primary vibration mechanism, the secondary vibration mechanism and the tertiary vibration mechanism are arranged in sequence from the inside to the outside on the outer side of the slider.

[0013] Preferably, the primary vibration mechanism comprises a primary motor and a primary rotating cam, the top of the primary motor is connected to the primary rotating cam, the secondary vibration mechanism comprises a secondary motor and a secondary rotating cam, the top of the secondary motor is connected to the secondary rotating cam, the tertiary vibration mechanism comprises a tertiary motor and a tertiary rotating cam, the top of the tertiary motor is coaxially connected with the tertiary rotating cam, the outer side of the primary motor is connected to the top of the secondary rotating cam by a bearing, and the outer side of the secondary motor is connected to the top of the tertiary rotating cam by a bearing;

[0014] The sizes of the primary rotating cam, the secondary rotating cam and the tertiary rotating cam are reduced in sequence.

[0015] Compared with the prior art, the utility model has the following beneficial effects: the filtering device for acrylic photoresist is provided with an inner cylinder inside the device body, and the filtering work of the photoresist can be completed through the filtering plate inside the inner cylinder, and during the filtering process, a multi-level vibration mechanism is provided outside the entire inner cylinder, which can drive the entire inner cylinder to vibrate inside the device body, thereby ensuring that the photoresist can be quickly dropped and filtered during the vibration process, and while ensuring high-efficiency filtering, there are no redundant parts inside, thereby ensuring that the photoresist can be filtered and collected to the maximum extent;

[0016] The multi-stage vibration mechanism includes a primary vibration mechanism, a secondary vibration mechanism and a tertiary vibration mechanism, which can be adjusted and controlled according to the different viscosities of the photoresist, thereby making the entire device more flexible and having a wider range of uses. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic diagram of the main structure of the utility model;

[0018] Figure 2 This is a schematic diagram of the main half-section structure of the utility model;

[0019] Figure 3 This is a schematic diagram of a partially enlarged structure of the connection between the main body of the device and the inner cylinder of the utility model;

[0020] Figure 4 This is a schematic diagram of the main structure of the inner cylinder of the utility model;

[0021] Figure 5 This is a schematic diagram of the structure of the multi-stage vibration mechanism of the utility model at the bottom of the slider;

[0022] Figure 6 It is a schematic diagram of the front cross-sectional structure of the multi-stage vibration mechanism of the utility model.

[0023] In the figure: 1. Device body; 11. Reserved slide groove; 2. Feed inlet; 3. Support seat; 4. Discharge outlet; 5. Inner cylinder; 51. Slider; 6. Return spring; 7. Multi-stage vibration mechanism; 71. Primary vibration mechanism; 711. Primary motor; 712. Primary rotating cam; 72. Secondary vibration mechanism; 721. Secondary motor; 722. Secondary rotating cam; 73. Third-stage vibration mechanism; 731. Third-stage motor; 732. Third-stage rotating cam. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] See also Figure 1-5 The utility model provides a technical solution: a filtering device for acrylic photoresist, comprising a device body 1, which is arranged in a cylindrical structure, and a feed port 2 and a discharge port 4 are arranged at the top and the bottom of the device body, the feed port 2 is used for feeding the photoresist, and the discharge port 4 is used for discharging the filtered photoresist;

[0026] A support base 3 is also fixed to the bottom of the device body 1 for supporting the device body 1;

[0027] Also includes;

[0028] The inner cylinder 5 is arranged inside the device body 1 and is arranged in a hollow cylindrical structure. A filter plate is arranged in the middle of the inner cylinder 5 for filtering;

[0029] The multi-stage vibration mechanism 7 is arranged between the inner cylinder 5 and the device body 1, and is used to perform multi-stage vibration of the inner cylinder 5 to achieve the effect of multi-stage vibration filtering of the photoresist.

[0030] Reserved slide grooves 11 are symmetrically arranged on both sides of the inner wall of the device body 1, and return springs 6 are arranged at the upper and lower positions inside the reserved slide grooves 11 to connect with the inner cylinder 5, ensuring that the inner cylinder 5 can vibrate up and down inside the device body 1 to achieve the effect of vibration filtering.

[0031] Slide blocks 51 are integrally installed on both sides of the inner cylinder 5. The slide blocks 51 are engaged in the reserved slide grooves 11. The upper and lower positions of the slide blocks 51 are connected to one side of the return spring 6. A multi-stage vibration mechanism 7 is provided at the bottom of the slide block 51 for performing multi-stage vibration of the inner cylinder 5. It is convenient to complete the multi-stage vibration of the inner cylinder 5 through the multi-stage vibration mechanism 7, so as to achieve the effect of performing different degrees of vibration according to the different consistencies of the photoresist inside the inner cylinder 5.

[0032] The size of the inner cylinder 5 is larger than that of the reserved slide groove 11, and its outer wall fits with the inner wall of the device body 1, ensuring that the inner cylinder 5 can always fit with the inner wall of the device body 1, thereby ensuring that the photoresist will not enter the interior of the reserved slide groove 11, and thus there will be no waste problem.

[0033] The multi-stage vibration mechanism 7 includes a primary vibration mechanism 71 , a secondary vibration mechanism 72 and a tertiary vibration mechanism 73 , which are sequentially arranged from inside to outside on the outer side of the slider 51 .

[0034] The primary vibration mechanism 71 includes a primary motor 711 and a primary rotating cam 712, the top of the primary motor 711 is connected to the primary rotating cam 712, the secondary vibration mechanism 72 includes a secondary motor 721 and a secondary rotating cam 722, the top of the secondary motor 721 is connected to the secondary rotating cam 722, the tertiary vibration mechanism 73 includes a tertiary motor 731 and a tertiary rotating cam 732, the top of the tertiary motor 731 is coaxially connected with the tertiary rotating cam 732, the outer side of the primary motor 711 is connected to the top of the secondary rotating cam 722 by a bearing, and the outer side of the secondary motor 721 is connected to the top of the tertiary rotating cam 732 by a bearing;

[0035] The sizes of the first-stage rotating cam 712 , the second-stage rotating cam 722 and the third-stage rotating cam 732 are successively reduced, and the multi-stage vibration mechanism 7 can achieve a multi-stage vibration effect on the inner cylinder 5 .

[0036] Working principle: When using the filtering device for acrylic photoresist, pour the photoresist to be filtered into the interior of the entire device body 1 through the feed port 2, and then the photoresist will reach the interior of the inner cylinder 5. At this time, it is necessary to start the multi-stage vibration mechanism 7, so that it drives the slider 51 outside the inner cylinder 5 to move up and down inside the reserved slide groove 11, so that the entire inner cylinder 5 vibrates up and down inside the device body 1. Since a filter plate is provided in the middle of the inner cylinder 5, when the inner cylinder 5 vibrates up and down, the photoresist inside it can be filtered through the filter plate inside the inner cylinder 5, and finally the photoresist reaches the bottom of the device body 1 and is discharged through the discharge port 4;

[0037] In the present application, different vibration mechanisms can be selected according to the different concentrations of the photoresist. When the primary vibration mechanism 71 is working, it is only necessary to start the primary motor 711 to drive the primary rotating cam 712 at its top to rotate, so that the outer portion of the primary rotating cam 712 pushes the slider 51 to move up and down inside the reserved slide groove 11. When the primary vibration mechanism 71 is working, the secondary rotating cam 722 and the tertiary rotating cam 732 on the secondary vibration mechanism 72 and the tertiary vibration mechanism 73 need to be in the downward position, so that the primary vibration mechanism 71 can be guaranteed to perform normal rotation vibration. When the secondary vibration mechanism 72 is working, it is necessary to make the primary vibration mechanism 71 and the tertiary vibration mechanism 73 in the lower position, and then control the secondary motor 721 to drive the secondary rotating cam 722 at its top to rotate. At the same time, when it is necessary to control the tertiary vibration mechanism 73 to work, it is necessary to make the primary vibration mechanism 71 and the secondary vibration mechanism 72 in the downward state, and then start the tertiary motor 731 to drive the tertiary rotating cam 732 at its top to rotate, thereby completing the rotational vibration work. The contents not described in detail in this specification belong to the prior art known to professional and technical personnel in this field.

[0038] Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art may still modify the technical solutions described in the aforementioned embodiments, or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection scope of the present invention.

Claims

1. A filtering device for acrylic photoresist, comprising: The device body (1) is provided in a cylindrical structure, and is provided with a feed port (2) and a discharge port (4) at the top and bottom of the device body, wherein the feed port (2) is used for feeding photoresist, and the discharge port (4) is used for discharging filtered photoresist; A support seat (3) is also fixed at the bottom of the device body (1) for supporting the device body (1); Features: Also includes; An inner cylinder (5) is arranged inside the device body (1) and is in the shape of a hollow cylinder. A filter plate is arranged in the middle of the inner cylinder (5) for filtering. The multi-stage vibration mechanism (7) is arranged between the inner cylinder (5) and the device body (1) and is used to perform multi-stage vibration of the inner cylinder (5) to achieve the effect of multi-stage vibration filtering of the photoresist.

2. A filtering device for acrylic photoresist according to claim 1, characterized in that: Reserved slide grooves (11) are symmetrically arranged on both sides of the inner wall of the device body (1), and return springs (6) are arranged at upper and lower positions inside the reserved slide grooves (11) and connected to the inner cylinder (5).

3. A filtering device for acrylic photoresist according to claim 1, characterized in that: Slide blocks (51) are integrally mounted on both sides of the inner cylinder (5). The slide blocks (51) are engaged in the interior of the reserved slide groove (11). The upper and lower positions of the slide blocks (51) are connected to one side of the return spring (6). A multi-stage vibration mechanism (7) is arranged at the bottom of the slide block (51) for performing multi-stage vibration of the inner cylinder (5).

4. A filtering device for acrylic photoresist according to claim 1, characterized in that: The size of the inner cylinder (5) is larger than the size of the reserved slide groove (11), and its outer wall fits the inner wall of the device body (1).

5. The filtering device for acrylic photoresist according to claim 1, characterized in that: The multi-stage vibration mechanism (7) comprises a primary vibration mechanism (71), a secondary vibration mechanism (72) and a tertiary vibration mechanism (73), wherein the primary vibration mechanism (71), the secondary vibration mechanism (72) and the tertiary vibration mechanism (73) are arranged in sequence from the inside to the outside on the outer side of the slider (51).

6. A filtering device for acrylic photoresist according to claim 5, characterized in that: The primary vibration mechanism (71) comprises a primary motor (711) and a primary rotating cam (712), the top end of the primary motor (711) being connected to the primary rotating cam (712); the secondary vibration mechanism (72) comprises a secondary motor (721) and a secondary rotating cam (722), the top end of the secondary motor (721) being connected to the secondary rotating cam (722); the tertiary vibration mechanism (73) comprises a tertiary motor (731) and a tertiary rotating cam (732), the top end of the tertiary motor (731) being coaxially connected to the tertiary rotating cam (732), the outer side of the primary motor (711) being connected to the top end of the secondary rotating cam (722) by a bearing, and the outer side of the secondary motor (721) being connected to the top end of the tertiary rotating cam (732) by a bearing; The sizes of the first-stage rotating cam (712), the second-stage rotating cam (722) and the third-stage rotating cam (732) decrease in sequence.

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