PH rapid adjusting device for silicon carbide polishing solution production

Abstract

The utility model belongs to the technical field of silicon carbide polishing solution production, and particularly relates to a PH fast adjusting device for silicon carbide polishing solution production, which comprises a feeding pipe and a feeding valve, the feeding valve is arranged on the feeding pipe, the end part of the feeding pipe is communicated and connected with the bottom of the side wall of a pretreatment box, and a detection box is arranged on one side of the pretreatment box. The detection box and the pretreatment box are communicated and connected through a communicating pipe, an alkaline liquid storage box is arranged above the pretreatment box, an acidic liquid storage box is arranged on one side of the alkaline liquid storage box, electromagnetic valves are mounted at the bottoms of the alkaline liquid storage box and the acidic liquid storage box, filling pipes are connected to the bottoms of the electromagnetic valves, and the filling pipes are connected to the bottom of the alkaline liquid storage box and the bottom of the acidic liquid storage box. A first PH detector is mounted on the feeding pipe, and a second PH detector is mounted above the detection box; the pH value of the silicon carbide polishing solution can be quickly adjusted according to the measured pH value, and the silicon carbide polishing solution subjected to the pH value adjustment can be remeasured, so that the pH value adjustment accuracy of the silicon carbide polishing solution can be improved.

Description

Technical Field

[0001] The utility model relates to the technical field of silicon carbide polishing liquid production, in particular to a PH fast regulating device for silicon carbide polishing liquid production. Background Art

[0002] With the development of high-tech enterprises such as semiconductors, new energy, high-end intelligent manufacturing, 5G information technology, and AI, the semiconductor industry is becoming a new and popular industry. Semiconductor wafers need to be polished with silicon carbide polishing liquid during the production process. The acidity and alkalinity of silicon carbide polishing liquid need to be precisely controlled during production to reduce corrosion to the wafer.

[0003] During the production and transportation of silicon carbide polishing liquid, the silicon carbide polishing liquid comes into contact with air or production equipment, causing the acidity and alkalinity of the silicon carbide polishing liquid to change, which will affect the accuracy of the pH value of the silicon carbide polishing liquid. If the pH value error of the silicon carbide polishing liquid is too large, it will cause certain corrosion to the wafer. In order to solve the above problems, this application proposes a rapid pH adjustment device for the production of silicon carbide polishing liquid. Utility Model Content

[0004] (I) Purpose of the utility model

[0005] In order to solve the technical problems existing in the background technology, the utility model proposes a rapid pH adjustment device for the production of silicon carbide polishing liquid, which can quickly adjust the acid and base of the silicon carbide polishing liquid according to the measured pH value, and can retest the silicon carbide polishing liquid after acid and base adjustment, thereby improving the accuracy of pH adjustment of the silicon carbide polishing liquid to solve the problems raised in the background technology.

[0006] (II) Technical solution

[0007] In order to solve the above technical problems, the utility model provides a PH rapid adjustment device for the production of silicon carbide polishing liquid, including a feeding pipe and a feeding valve, the feeding valve is installed on the feeding pipe, the end of the feeding pipe is connected to the bottom of the side wall of the pretreatment box, and a detection box is provided on one side of the pretreatment box, and the detection box and the pretreatment box are connected by a connecting pipe.

[0008] An alkaline liquid storage tank is arranged above the pretreatment tank, an acidic liquid storage tank is arranged on one side of the alkaline liquid storage tank, solenoid valves are installed at the bottom of the alkaline liquid storage tank and the acidic liquid storage tank, and a filling pipe is connected to the bottom of the solenoid valve.

[0009] A No. 1 PH detector is installed on the feeding pipe.

[0010] A No. 2 PH detector is installed above the detection box.

[0011] Preferably, one end of the connecting pipe is conductively connected to the top of the side wall of the pretreatment box, and the other end of the connecting pipe is conductively connected to the bottom of the side wall of the detection box.

[0012] Preferably, liquid level observation windows are embedded on the surfaces of the alkaline liquid storage tank and the acidic liquid storage tank.

[0013] Preferably, fixing frames are welded to the top surfaces of the detection box and the pretreatment box, and the alkaline liquid storage tank, the acidic liquid storage tank and the second pH detector are respectively installed on the fixing frames.

[0014] Preferably, a driving motor is installed on the bottom surface of the pretreatment box, and a power output end of the driving motor passes through the bottom cavity wall of the pretreatment box.

[0015] Preferably, a stirring impeller is connected to the power output end of the driving motor, and the stirring impeller is located below the filling pipe.

[0016] Preferably, a drain pipe is connected to the top of the side wall of the detection box.

[0017] The above technical solution of the utility model has the following beneficial technical effects.

[0018] The utility model can selectively control the opening of the solenoid valve according to the measured pH value and the acidity and alkalinity of the silicon carbide polishing liquid. When the silicon carbide polishing liquid is acidic, the solenoid valve on the alkaline liquid storage tank is opened, and the alkaline solution is injected into the pretreatment box through the filling pipe. When the silicon carbide polishing liquid is alkaline, the solenoid valve at the bottom of the acidic liquid storage tank is opened, and the acidic solution is injected into the pretreatment box through the filling pipe, thereby realizing rapid adjustment of the pH value of the silicon carbide polishing liquid.

[0019] According to the utility model, after the acidity and alkali of the silicon carbide polishing liquid are adjusted, the liquid is introduced into the detection box through a connecting pipe, and the silicon carbide polishing liquid in the detection box is detected by a No. 2 pH detector, and the pH of the silicon carbide polishing liquid can be retested, thereby improving the accuracy of the pH adjustment of the silicon carbide polishing liquid. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 This is a schematic diagram of the overall structure of a pH rapid adjustment device for silicon carbide polishing liquid production according to the utility model;

[0021] Figure 2 This is a schematic cross-sectional structure diagram of a pH rapid adjustment device for silicon carbide polishing liquid production according to the utility model;

[0022] Figure 3 This is a schematic diagram of the acid-base injection structure of a pH rapid adjustment device for silicon carbide polishing liquid production according to the utility model;

[0023] Figure 4The utility model is a schematic diagram of the stirring structure of a pH rapid adjustment device for producing silicon carbide polishing liquid.

[0024] Reference numerals:

[0025] 1. Feeding pipe; 2. Feeding valve; 3. Pretreatment box; 4. Detection box; 5. Connecting pipe; 6. Fixed bracket; 7. Alkaline liquid storage tank; 8. Acidic liquid storage tank; 9. Liquid level observation window; 10. Solenoid valve; 11. Filling pipe; 12. Driving motor; 13. Stirring impeller; 14. No. 1 PH detector; 15. No. 2 PH detector; 16. Drain pipe. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical solution and advantages of the utility model clearer, the utility model is further described in detail below in combination with specific implementation methods and with reference to the accompanying drawings. It should be understood that these descriptions are only exemplary and are not intended to limit the scope of the utility model. In addition, in the following description, the description of well-known structures and technologies is omitted to avoid unnecessary confusion of the concept of the utility model.

[0027] like Figure 1-4 As shown, the utility model proposes a PH rapid adjustment device for silicon carbide polishing liquid production, including a feeding pipe 1 and a feeding valve 2, the feeding valve 2 is installed on the feeding pipe 1, the end of the feeding pipe 1 is conductively connected to the bottom of the side wall of the pretreatment box 3, a detection box 4 is provided on one side of the pretreatment box 3, the detection box 4 and the pretreatment box 3 are conductively connected through a connecting pipe 5, one end of the connecting pipe 5 is conductively connected to the top of the side wall of the pretreatment box 3, and the other end of the connecting pipe 5 is conductively connected to the bottom of the side wall of the detection box 4.

[0028] An alkaline liquid storage tank 7 is arranged above the pretreatment tank 3, an acidic liquid storage tank 8 is arranged on one side of the alkaline liquid storage tank 7, solenoid valves 10 are installed at the bottom of the alkaline liquid storage tank 7 and the acidic liquid storage tank 8, and a filling pipe 11 is connected to the bottom of the solenoid valve 10.

[0029] A No. 1 PH detector 14 is installed on the feeding pipe 1.

[0030] A second PH detector 15 is installed above the detection box 4 .

[0031] It should be noted that after the feeding valve 2 is opened, the silicon carbide polishing liquid is injected into the pretreatment box 3 through the feeding pipe 1. During the feeding pipe 1 conveying the silicon carbide polishing liquid, the acidity and alkalinity of the silicon carbide polishing liquid in the feeding pipe 1 can be measured by a No. 1 PH detector 14. According to the measured pH value, the solenoid valve 10 can be selectively controlled to open according to the acidity and alkalinity of the silicon carbide polishing liquid. When the silicon carbide polishing liquid is acidic, the solenoid valve 10 on the alkaline liquid storage tank 7 is opened, and the alkaline solution is injected into the pretreatment box 3 through the filling pipe 11. In the processing box 3, when the silicon carbide polishing liquid is alkaline, the solenoid valve 10 at the bottom of the acid storage tank 8 is opened, and the acidic solution is injected into the pretreatment box 3 through the filling pipe 11, so as to realize rapid adjustment of the pH value of the silicon carbide polishing liquid. After the acid-base adjustment, the silicon carbide polishing liquid is introduced into the detection box 4 through the connecting pipe 5, and the silicon carbide polishing liquid in the detection box 4 is detected by the No. 2 PH detector 15. The PH of the silicon carbide polishing liquid can be retested, which can improve the accuracy of the PH adjustment of the silicon carbide polishing liquid.

[0032] In this embodiment, if Figure 1 As shown, liquid level observation windows 9 are embedded on the surfaces of the alkaline liquid storage tank 7 and the acidic liquid storage tank 8 .

[0033] It should be noted that the liquid levels in the alkaline liquid storage tank 7 and the acidic liquid storage tank 8 can be observed through the liquid level observation window 9 so as to replenish the acid and alkaline solutions in time.

[0034] In this embodiment, if Figure 2 As shown, a fixing frame 6 is welded on the top surface of the detection box 4 and the pretreatment box 3 , and the alkaline liquid storage tank 7 , the acidic liquid storage tank 8 and the second PH detector 15 are respectively installed on the fixing frame 6 .

[0035] It should be noted that the fixing frame 6 can fix the alkaline liquid storage tank 7, the acidic liquid storage tank 8 and the second pH detector 15 respectively.

[0036] In this embodiment, if Figure 2 and Figure 4 As shown, a driving motor 12 is installed on the bottom surface of the pretreatment box 3, and the power output end of the driving motor 12 passes through the bottom cavity wall of the pretreatment box 3. The power output end of the driving motor 12 is connected to a stirring impeller 13, and the stirring impeller 13 is located below the filling pipe 11.

[0037] It should be noted that the driving motor 12 drives the stirring impeller 13, and the stirring impeller 13 quickly stirs and mixes the silicon carbide polishing liquid and the added acidic solution or alkaline solution.

[0038] In this embodiment, if Figure 1 As shown, a drain pipe 16 is connected to the top of the side wall of the detection box 4 .

[0039] It should be noted that the silicon carbide polishing liquid is discharged through the drain pipe 16 after the pH value is adjusted.

[0040] The working principle and use process of the utility model are as follows: after the feeding valve 2 is opened, the silicon carbide polishing liquid is injected into the pretreatment box 3 through the feeding pipe 1. During the process of the feeding pipe 1 conveying the silicon carbide polishing liquid, the acidity and alkalinity of the silicon carbide polishing liquid in the feeding pipe 1 can be measured by a No. 1 PH detector 14. According to the measured pH value, the solenoid valve 10 can be selectively controlled to open according to the acidity and alkalinity of the silicon carbide polishing liquid. When the silicon carbide polishing liquid is acidic, the solenoid valve 10 on the alkaline liquid storage tank 7 is opened, and the alkaline solution is injected into the pretreatment box 3 through the filling pipe 11. When the silicon carbide polishing liquid is alkaline, the acidic liquid storage tank The solenoid valve 10 at the bottom of 8 is opened, and the acidic solution is injected into the pretreatment box 3 through the filling pipe 11 to realize rapid adjustment of the pH value of the silicon carbide polishing liquid. The driving motor 12 drives the stirring impeller 13, and the stirring impeller 13 quickly stirs and mixes the silicon carbide polishing liquid and the added acidic solution or alkaline solution. After the acid-base adjustment of the silicon carbide polishing liquid, it is introduced into the detection box 4 through the connecting pipe 5. The silicon carbide polishing liquid in the detection box 4 is detected by the No. 2 PH detector 15, and the PH of the silicon carbide polishing liquid can be retested to improve the accuracy of the PH adjustment of the silicon carbide polishing liquid.

[0041] It should be understood that the above specific embodiments of the present invention are only used to illustrate or explain the principles of the present invention, and do not constitute a limitation on the present invention. Therefore, any modifications, equivalent substitutions, improvements, etc. made without departing from the spirit and scope of the present invention should be included in the protection scope of the present invention. In addition, the claims attached to the present invention are intended to cover all changes and modifications that fall within the scope and boundaries of the attached claims or the equivalent forms of such scope and boundaries.

Claims

1. A pH rapid adjustment device for silicon carbide polishing liquid production, comprising a feeding pipe (1) and a feeding valve (2), wherein the feeding valve (2) is mounted on the feeding pipe (1), characterized in that: The end of the feeding pipe (1) is conductively connected to the bottom of the side wall of the pretreatment box (3); a detection box (4) is provided on one side of the pretreatment box (3); and the detection box (4) and the pretreatment box (3) are conductively connected via a connecting pipe (5); An alkaline liquid storage tank (7) is provided above the pretreatment tank (3), an acidic liquid storage tank (8) is provided on one side of the alkaline liquid storage tank (7), solenoid valves (10) are installed at the bottom of both the alkaline liquid storage tank (7) and the acidic liquid storage tank (8), and a filling pipe (11) is connected to the bottom of the solenoid valve (10); The feeding pipe (1) is provided with a No. 1 PH detector (14); A second pH detector (15) is installed above the detection box (4).

2. The device for rapidly adjusting pH value for producing silicon carbide polishing liquid according to claim 1, characterized in that: One end of the connecting pipe (5) is conductively connected to the top of the side wall of the pretreatment box (3), and the other end of the connecting pipe (5) is conductively connected to the bottom of the side wall of the detection box (4).

3. The device for rapidly adjusting pH value for producing silicon carbide polishing liquid according to claim 2, characterized in that: Liquid level observation windows (9) are embedded on the surfaces of the alkaline liquid storage tank (7) and the acidic liquid storage tank (8).

4. The device for rapidly adjusting pH value for producing silicon carbide polishing liquid according to claim 3, characterized in that: A fixing frame (6) is welded to the top surface of the detection box (4) and the pretreatment box (3), and the alkaline liquid storage tank (7), the acidic liquid storage tank (8) and the second pH detector (15) are respectively mounted on the fixing frame (6).

5. The device for rapidly adjusting pH value for producing silicon carbide polishing liquid according to claim 4, characterized in that: A driving motor (12) is mounted on the bottom surface of the pretreatment box (3), and a power output end of the driving motor (12) penetrates the bottom cavity wall of the pretreatment box (3).

6. A rapid pH adjustment device for producing silicon carbide polishing liquid according to claim 5, characterized in that: The power output end of the driving motor (12) is connected to a stirring impeller (13), and the stirring impeller (13) is located below the filling pipe (11).

7. The device for rapidly adjusting pH value for producing silicon carbide polishing liquid according to claim 1, characterized in that: A liquid discharge pipe (16) is connected to the top of the side wall of the detection box (4).

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