High-boiling residue treatment device and polycrystalline silicon production system

Abstract

The utility model discloses a high-boiling residue treatment device and a polycrystalline silicon production system. The high-boiling residue treatment device comprises a separation unit and a cracking unit, the separation unit comprises a liquid phase filter, and a liquid phase outlet of the liquid phase filter is communicated with a cracking inlet of the cracking unit. The high-boiling residue treatment device provided by the utility model has the characteristic of long continuous operation time.

Description

Technical Field

[0001] The utility model relates to a high boiling point treatment device, belonging to the field of applied chemical industry. Background Art

[0002] Polysilicon is the basic raw material of the photovoltaic industry, and some by-products are produced during its preparation. Some of these by-products are high-boiling compounds with boiling points exceeding 70°C, which are called high-boiling substances. High-boiling substances include a variety of polychlorosilanes, which have complex components and similar boiling points. It is difficult to separate the components using common separation methods, so high-boiling substances are difficult to use directly.

[0003] At present, high boiling materials are generally cracked under the action of catalysts to convert them into monosilicon compounds for utilization. However, high boiling materials often contain silicon powder and solid metal salt impurities, which can easily combine with catalysts to deactivate the catalysts, thus shortening the continuous operation time of the high boiling material cracking device.

[0004] Therefore, developing a high boiling point processing device with a long continuous operation time has become a research direction. Utility Model Content

[0005] The utility model provides a high boiling point processing device, which has the characteristic of long continuous operation time.

[0006] The utility model also provides a polysilicon production system, which has the characteristic of long continuous operation time.

[0007] The utility model provides a high boiling point processing device, which comprises a separation unit and a cracking unit;

[0008] The separation unit comprises a liquid phase filter, and a liquid phase outlet of the liquid phase filter is communicated with a pyrolysis inlet of the pyrolysis unit.

[0009] In the high boiling point processing device as described above, the filtration accuracy of the liquid phase filter is less than or equal to 0.5 μm.

[0010] In the high boiling point treatment device as described above, the separation unit further comprises a buffer tank, and the liquid phase outlet of the liquid phase filter is connected to the cracking inlet of the cracking unit through the buffer tank.

[0011] The high boiling point treatment device as described above, wherein, further comprises a distillation unit, wherein the liquid phase outlet of the distillation unit is communicated with the liquid phase inlet of the liquid phase filter.

[0012] As the high boiling point processing device as described above, wherein the liquid phase filter includes a filtering part and a post-filtering part, and the separation unit further includes a first pressure gauge and a second pressure gauge, the first pressure gauge is connected to the filtering part, and the second pressure gauge is connected to the post-filtering part.

[0013] The high boiling material processing device as described above, wherein it further comprises a cleaning material storage unit;

[0014] The cleaning material outlet of the cleaning material storage unit is communicated with the first cleaning material inlet arranged at the top of the liquid phase filter through the buffer tank.

[0015] In the high boiling point processing device as described above, a second cleaning material inlet is further provided at the bottom of the liquid phase filter, and the cleaning material outlet of the cleaning material storage unit is communicated with the second cleaning material inlet.

[0016] The high boiling point processing device as described above, wherein it comprises N separation units, N ≥ 1;

[0017] When N>1, N separation units are connected in parallel.

[0018] As described above, in the high boiling point processing device, N=2, the liquid phase inlet of the liquid phase filter of the first separation unit is provided with a first control valve, and the liquid phase inlet of the liquid phase filter of the second separation unit is provided with a second control valve, and the working states of the first control valve and the second control valve are opposite.

[0019] The utility model also provides a polysilicon production system, which comprises any one of the above-mentioned high boiling point processing devices.

[0020] The high boiling material processing device provided by the utility model has the characteristic of long continuous operation time. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced one by one below. Obviously, the drawings in the following description are some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0022] Figure 1 A schematic structural diagram of a first high boiling point treatment device provided by the utility model;

[0023] Figure 2 A schematic diagram of the structure of a second high boiling point processing device provided by the utility model;

[0024] Figure 3This is a schematic diagram of the equipment of the second high boiling point processing device provided by the utility model.

[0025] Description of reference numerals:

[0026] A-first separation unit;

[0027] A101-first liquid phase filter filtering part;

[0028] A102-first liquid phase filter rear part;

[0029] A103-first liquid phase filter first pressure gauge;

[0030] A104-first liquid phase filter second pressure gauge;

[0031] A2-first buffer tank;

[0032] A3-first control valve;

[0033] B-second separation unit;

[0034] B101- second liquid phase filter filtering part;

[0035] B102-second liquid phase filter rear part;

[0036] B103-the first pressure gauge of the second liquid phase filter;

[0037] B104-second liquid phase filter second pressure gauge;

[0038] B2-second buffer tank;

[0039] B3-second control valve;

[0040] C-cleavage unit;

[0041] C1-high boiler cracking column;

[0042] D-distillation unit;

[0043] D1-distillation tower;

[0044] E-cleaning material storage unit;

[0045] E1-Plant nitrogen source. DETAILED DESCRIPTION

[0046] In order to enable those skilled in the art to better understand the scheme of the utility model, the utility model is further described in detail below. The specific implementation methods listed below are only for describing the principles and features of the utility model. The examples are only used to explain the utility model and do not limit the scope of the utility model. Based on the embodiments of the utility model, all other implementation methods obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model.

[0047] The utility model provides a high boiling point processing device in a first aspect. The device comprises a separation unit and a cracking unit. The separation unit comprises a liquid phase filter. The liquid phase outlet of the liquid phase filter is connected to the cracking inlet of the cracking unit.

[0048] The liquid phase outlet of the liquid phase filter flows out a pure high-boiling substance after being filtered by the liquid phase filter to remove impurities, and the pure high-boiling substance is connected to the cracking unit through the cracking inlet of the cracking unit for cracking. The utility model does not limit the flow direction of the liquid phase filter. In one embodiment, the liquid phase filter flows from bottom to top.

[0049] The separation unit is used to remove impurities from high-boiling substances. The separation unit includes a liquid phase filter, which allows the fluid containing impurities to pass through a filter screen of smaller size, thereby separating the fluid from the impurities. The cracking unit cracks the high-boiling substances with impurities removed into monosilicon compounds. The utility model does not limit the specific selection of the cracking unit, and it only needs to meet the requirement of being able to crack the high-boiling substances into monosilicon compounds. In one embodiment, the cracking unit is a high-boiling substance cracking column, and the cracking inlet of the high-boiling substance cracking column is the cracking inlet of the cracking unit.

[0050] High-boiling substances often contain silicon powder and solid metal chlorides. The above impurities entering the cracking unit will cause the catalyst in the cracking unit to fail, reducing the continuous operation time of the high-boiling substance processing device. Therefore, a separation unit is required to remove impurities in the high-boiling substances. The inventors found that when the separation unit includes a liquid phase filter, and the liquid phase outlet of the liquid phase filter is connected to the cracking inlet of the cracking unit, since the liquid phase filter screen has a high filtering accuracy (i.e., the impurity particle size allowed to pass is low), the impurities contained in the high-boiling substances can be effectively removed by the liquid phase filter, so that the catalyst in the cracking unit is not easy to fail, and the continuous operation time of the high-boiling substance processing device is longer.

[0051] The high boiling point processing device provided by the utility model does not specifically limit the filtering accuracy of the liquid phase filter, and a liquid phase filter of a commonly used model in the art can be used.

[0052] The high boiling material processing device provided by the utility model has the characteristic of long continuous operation time.

[0053] In one embodiment, the filtration accuracy of the liquid phase filter in the high boiling point processing device provided by the utility model is less than or equal to 0.5 μm. The liquid phase filter with the above filtration accuracy can make the high boiling point processing device have a longer operating time while maintaining a low filtration resistance.

[0054] In one embodiment, the separation unit further comprises a buffer tank, and the liquid phase outlet of the liquid phase filter is connected to the pyrolysis inlet of the pyrolysis unit through the buffer tank.

[0055] The buffer tank is used to store the pure high boiling products obtained by the liquid phase filter, which can make the operation of the high boiling product treatment device more stable. The pure high boiling products leave the liquid phase filter through the liquid phase outlet of the liquid phase filter, and enter the cracking unit through the cracking inlet of the cracking unit for cracking after being temporarily stored in the buffer tank.

[0056] In one embodiment, the high boiling point processing device provided by the utility model further comprises a distillation unit, and the liquid phase outlet of the distillation unit is connected to the liquid phase inlet of the liquid phase filter.

[0057] The distillation unit is used to separate high-boiling substances from chlorosilanes with lower boiling points. The obtained high-boiling substances containing impurities leave the distillation unit through the liquid phase outlet of the distillation unit and enter the liquid phase filter through the liquid phase inlet of the liquid phase filter for filtration. Connecting the distillation unit with the liquid phase filter can improve the operating efficiency of the high-boiling substance treatment device.

[0058] In one embodiment, the liquid phase filter in the high boiling point processing device provided by the utility model includes a filtering part and a post-filtering part, and the separation unit also includes a first pressure gauge and a second pressure gauge, the first pressure gauge is connected to the filtering part, and the second pressure gauge is connected to the post-filtering part.

[0059] The filter section includes a accommodating chamber and a filter screen, wherein the accommodating chamber is used to accommodate the unfiltered high-boiling substances in the liquid phase filter, the filter screen is used to filter the high-boiling substances, and the filter back part is used to accommodate the pure high-boiling substances obtained after filtration. The first pressure gauge is connected to the filter section to detect the pressure of the filter section, and the second pressure gauge is connected to the filter back part to detect the pressure of the filter back part. Since the liquid phase filter is driven by liquid pressure, the high-boiling substances pass through the filter screen under the action of pressure and enter the filter back part from the filter section, so the pressure of the filter section is higher than the pressure of the filter back part. When the filter screen is clogged with more impurities, the pressure difference between the filter section and the filter back part increases, which is manifested as an increase in the pressure difference between the first pressure gauge and the second pressure gauge. When the pressure difference is greater than the preset pressure difference value, the filtering can be stopped and the filter screen can be cleaned. The utility model does not specifically limit the preset pressure difference value, which can be determined according to the actual operating conditions. In one embodiment, the preset pressure difference value is 12kPa.

[0060] The high boiling point treatment device provided by the utility model uses a first pressure gauge and a second pressure gauge to respectively detect the filtering part and the post-filter part, and can judge the cleaning time by the pressure difference, so the energy saving feature is more prominent.

[0061] In one embodiment, the high boiling material processing device provided by the utility model further includes a cleaning material storage unit; the cleaning material outlet of the cleaning material storage unit is connected to the first cleaning material inlet arranged on the top of the liquid phase filter through a buffer tank.

[0062] The cleaning material storage unit is used to store cleaning materials, which can remove impurities trapped in the liquid phase filter. During the cleaning process, the cleaning material leaves the cleaning material storage unit through the cleaning material outlet of the cleaning material storage unit, flows through the buffer tank, and then enters the liquid phase filter through the first cleaning material inlet set at the top of the liquid phase filter.

[0063] In one embodiment, the filter portion is located at the bottom of the liquid phase filter, and the filter rear portion is located at the top of the liquid phase filter. During the filtering process, the high boiling point to be filtered flows from bottom to top, and the impurities in the high boiling point are retained by the filter screen on the side of the filter screen close to the filter housing chamber; during cleaning, the cleaning material enters the filter rear portion from the first cleaning material inlet provided at the top of the liquid phase filter, and enters the filter portion downward from the filter rear portion, reversely peels off the impurities retained by the filter screen, and carries the impurities out of the liquid phase filter from the bottom of the liquid phase filter (i.e., the filter housing chamber).

[0064] From the above content, it can be seen that the setting of the cleaning material storage unit helps to reduce the filtration resistance of the liquid phase filter, making the energy saving feature of the high boiling point processing device provided by the utility model more prominent. The utility model does not limit the type of cleaning material, as long as it can play the role of cleaning the liquid phase filter. In one embodiment, the cleaning material storage unit is the nitrogen source of the factory area.

[0065] In one embodiment, a second cleaning material inlet is further provided at the bottom of the liquid phase filter, and the cleaning material outlet of the cleaning material storage unit is communicated with the second cleaning material inlet.

[0066] The second cleaning material inlet is arranged at the bottom of the liquid phase filter. When the bottom of the liquid phase filter is clogged with impurities in the high-boiling substance, the cleaning material can enter the liquid phase filter through the second cleaning material inlet to purge the impurities. In one embodiment, the filter part is located at the bottom of the liquid phase filter, and the post-filter part is located at the top of the liquid phase filter. In this case, the second cleaning material inlet is arranged at the filter part.

[0067] The provision of the second cleaning material inlet can further extend the continuous operation time of the high boiling material processing device provided by the utility model.

[0068] In one embodiment, the high boiling point processing device provided by the utility model comprises N separation units, N≥1; when N>1, the N separation units are connected in parallel.

[0069] The equipment included in the above separation unit is the same as above.

[0070] For example, when N=1, the schematic diagram of the high boiling point treatment device provided by the present invention is as follows: Figure 1 The device comprises A-first separation unit, D-cracking unit, C-distillation unit, and E-cleaning material storage unit, wherein D-cracking unit, A-first separation unit, and C-distillation unit are connected in sequence, and E-cleaning material storage unit is connected to A-first separation unit.

[0071] When N>1, the devices included in the N separation units may be the same or different. The N separation units are connected in parallel, which means that the liquid phase inlets of the N separation units are interconnected, and the liquid phase outlets of the N parallel units are interconnected.

[0072] For example, Figure 2 2 is a schematic diagram of the structure of the second high boiling point processing device provided by the utility model when N=2. Figure 2 As shown, the device includes A-first separation unit, B-second separation unit, C-cracking unit, D-distillation unit, and E-cleaning material storage unit. The liquid phase inlet of A-first separation unit and B-second separation unit is connected with the liquid phase outlet of distillation unit, and the liquid phase outlet of A-first separation unit and B-second separation unit is connected with the cracking inlet of cracking unit, and the cleaning material storage unit is connected with the first separation unit and the second separation unit respectively. Figure 1 In the figure, the connection relationship between A-the first separation unit and B-the second separation unit is a parallel relationship.

[0073] Further, the liquid phase inlet of the separation unit is the liquid phase inlet of the liquid phase filter, and the liquid phase outlet of the separation unit is the liquid phase outlet of the liquid phase filter (the separation unit does not include a buffer tank) or the liquid phase outlet of the buffer tank (the separation unit includes a buffer tank). Specifically, when all separation units include a buffer tank, the liquid phase inlets of the liquid phase filters in N separation units are interconnected, and the liquid phase outlets of the liquid phase filters in N separation units are interconnected through their respective buffer tanks; when all separation units do not include a buffer tank, the liquid phase inlets of the liquid phase filters in N separation units are interconnected, and the liquid phase outlets of the liquid phase filters in N separation units are interconnected; when some separation units include a buffer tank, the liquid phase inlets of the liquid phase filters in the separation units are interconnected, and the liquid phase outlets of the liquid phase filters in the separation units that include a buffer tank are interconnected through the buffer tank with the liquid phase outlets of the liquid phase filters in the separation units that do not include a buffer tank.

[0074] In one embodiment, N=2, a first control valve is provided at the liquid phase inlet of the liquid phase filter of the first separation unit, and a second control valve is provided at the liquid phase inlet of the liquid phase filter of the second separation unit, and the working states of the first control valve and the second control valve are opposite.

[0075] For example, Figure 3 This is a schematic diagram of the equipment of the second high boiling material treatment device provided by the utility model when N=2, such as Figure 3 As shown, the device includes A101-first liquid phase filter filtering part, A102-first liquid phase filter rear part, A103-first liquid phase filter first pressure gauge, A104-first liquid phase filter second pressure gauge, A2-first buffer tank, A3-first control valve, B101-second liquid phase filter filtering part, B102-second liquid phase filter rear part, B103-second liquid phase filter first pressure gauge, B104-second liquid phase filter second pressure gauge, B2-second buffer tank, B3-second control valve, C1-high boiling cracking column, D1-distillation tower, E1-plant nitrogen source. Among them, A101-the filtering part of the first liquid phase filter, A102-the rear part of the first liquid phase filter, A103-the first pressure gauge of the first liquid phase filter, A104-the second pressure gauge of the first liquid phase filter, A2-the first buffer tank, A3-the first control valve belong to A-the first separation unit, B101-the filtering part of the second liquid phase filter, B102-the rear part of the second liquid phase filter, B103-the first pressure gauge of the second liquid phase filter, B104-the second pressure gauge of the second liquid phase filter, B2-the second buffer tank, B3-the second control valve belong to B-the second separation unit, C1-the high boiling point cracking column belongs to C-the cracking unit, D1-the distillation tower belongs to D-the distillation unit, and E1-the nitrogen source in the plant area belongs to E-the cleaning material storage unit.

[0076] In the device, A-the first separation unit and B-the second separation unit are connected in parallel. Specifically, inside each separation unit, A3-the first control valve, A101-the filtering part of the first liquid phase filter, A102-the rear part of the first liquid phase filter, and A2-the first buffer tank are connected in sequence, B3-the second control valve, B101-the filtering part of the second liquid phase filter, B102-the rear part of the second liquid phase filter, and B2-the second buffer tank are connected in sequence, A103-the first pressure gauge of the first liquid phase filter and A104-the second pressure gauge of the first liquid phase filter are connected to A101-the filtering part of the first liquid phase filter and A102-the rear part of the first liquid phase filter, respectively, and B103-the first pressure gauge of the second liquid phase filter and B104-the second pressure gauge of the second liquid phase filter are connected to B101-the filtering part of the second liquid phase filter and B102-the rear part of the second liquid phase filter, respectively. E1-the nitrogen source in the factory area is connected to A102-the rear part of the first liquid phase filter, A2-the first buffer tank, B102-the rear part of the second liquid phase filter, and B2-the second buffer tank respectively.

[0077] In this embodiment, the high boiling point treatment device provided by the utility model includes A-first separation unit and B-second separation unit, the liquid phase inlet of the liquid phase filter of A-first separation unit (the liquid phase inlet is located in the filtering part of A101-first liquid phase filter) is provided with A3-first control valve, and the liquid phase inlet of the liquid phase filter of B-second separation unit (the liquid phase inlet is located in the filtering part of B101-second liquid phase filter) is provided with B3-second control valve. When A3-first control valve is in open state, B3-second control valve is in closed state; or, when B3-second control valve is in open state, A3-first control valve is in closed state. The above-mentioned setting method and the working logic of the control valve can make A-the first separation unit and B-the second separation unit standby for each other, that is, when there are too many impurities in the liquid phase filter of the A-first separation unit, the A3-first control valve can be closed and the cleaning material can be used to clean the liquid phase filter of the A-first separation unit. At this time, the B3-second control valve is in the open state, and the B-second separation unit can work normally; when there are too many impurities in the liquid phase filter of the B-second separation unit, the B3-second control valve can be closed and the cleaning material can be used to clean the liquid phase filter of the B-second separation unit. At this time, the A3-first control valve is in the open state, and the A-first separation unit can work normally.

[0078] The above arrangement and the working logic of the control valve can make the first separation unit and the second separation unit serve as backup for each other, so that the high boiling point processing device provided by the utility model has a longer continuous operation time.

[0079] The third aspect of the present invention provides a polysilicon production system, which includes any of the above-mentioned high boiling point processing devices. Since the high boiling point processing device provided by the present invention has the advantage of a long continuous operation time, the polysilicon production system provided by the present invention also has the advantage of a long continuous operation time.

[0080] The present invention does not limit the types of other equipment included in the polysilicon production system, and can be selected according to production requirements. In one embodiment, the polysilicon production system provided by the present invention also includes a reduction furnace.

[0081] The high boiling point treatment device provided by the utility model is further described below through examples.

[0082] Example

[0083] This embodiment uses Figure 3 The high boiler treating device shown treats high boilers.

[0084] like Figure 3 As shown, the high boiling point processing device includes A101-first liquid phase filter filtering part, A102-first liquid phase filter rear filtering part, A103-first liquid phase filter first pressure gauge, A104-first liquid phase filter second pressure gauge, A2-first buffer tank, A3-first control valve, B101-second liquid phase filter filtering part, B102-second liquid phase filter rear filtering part, B103-second liquid phase filter first pressure gauge, B104-second liquid phase filter second pressure gauge, B2-second buffer tank, B3-second control valve, C1-high boiling point cracking column, D1-distillation tower, E1-plant nitrogen source.

[0085] Among them, A101-the filtering part of the first liquid phase filter, A102-the rear part of the first liquid phase filter, A103-the first pressure gauge of the first liquid phase filter, A104-the second pressure gauge of the first liquid phase filter, A2-the first buffer tank, A3-the first control valve belong to A-the first separation unit, B101-the filtering part of the second liquid phase filter, B102-the rear part of the second liquid phase filter, B103-the first pressure gauge of the second liquid phase filter, B104-the second pressure gauge of the second liquid phase filter, B2-the second buffer tank, B3-the second control valve belong to B-the second separation unit, C1-the high boiling point cracking column belongs to C-the cracking unit, D1-the distillation tower belongs to D-the distillation unit, and E1-the nitrogen source in the plant area belongs to E-the cleaning material storage unit.

[0086] In the device, A3-first control valve, A101-filtering part of the first liquid phase filter, A102-filtering rear part of the first liquid phase filter, A2-first buffer tank are connected in sequence, B3-second control valve, B101-filtering part of the second liquid phase filter, B102-filtering rear part of the second liquid phase filter, B2-second buffer tank are connected in sequence, A103-first liquid phase filter first pressure gauge, A104-first liquid phase filter second pressure gauge are connected to A101-filtering part of the first liquid phase filter, A102-filtering rear part of the first liquid phase filter, B103-second liquid phase filter first pressure gauge, B104-second liquid phase filter second pressure gauge are connected to B101-filtering part of the second liquid phase filter, B102-filtering rear part of the second liquid phase filter. E1-plant nitrogen source is connected to A102-filtering rear part of the first liquid phase filter, A2-first buffer tank, B102-filtering rear part of the second liquid phase filter, B2-second buffer tank.

[0087] The liquid phase outlet of the D1-distillation tower is connected to the liquid phase inlet of the liquid phase filter of the first separation unit (set in the filtering part of A101-first liquid phase filter) through the A3-first control valve. At the same time, the liquid phase outlet of the D1-distillation tower is also connected to the liquid phase inlet of the liquid phase filter of the second separation unit (set in the filtering part of B101-first liquid phase filter) through the B3-second control valve, and the working states of the A3-first control valve and the B3-second control valve are opposite.

[0088] A101-the first liquid phase filter filtering part and B101-the second liquid phase filter filtering part are provided with filter screens with a filtering accuracy of 0.5 μm.

[0089] Comparative Example

[0090] The high boiling material processing device used in this comparative example includes a D1-distillation tower and a C1-high boiling material cracking column. The above two devices are the same as those in Example 1. In addition, the high boiling material processing device used in this comparative example also includes a basket filter. The high boiling material flowing out of the liquid phase outlet of the D1-distillation tower is filtered through the basket filter and then enters the C1-high boiling material cracking column for cracking treatment.

[0091] Test example

[0092] The high-boiling-material processing devices provided in the embodiment and the comparative example were used respectively to carry out high-boiling-material cracking, and the continuous operation time was recorded respectively. It was found that the continuous operation time of the high-boiling-material processing device provided in the embodiment of the utility model was significantly higher than that of the high-boiling-material cracking device used in the comparative example, which indicates that the high-boiling-material processing device provided by the utility model has the characteristic of a longer continuous operation time.

[0093] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, or it can be an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0094] The terms "first", "second", "third", "fourth", etc. (if any) in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein, for example. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0095] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the comparative examples of the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the technical solutions of the embodiments of the utility model.

Claims

1. A high boiling point treatment device, characterized in that: It includes a separation unit and a cracking unit; The separation unit comprises a liquid phase filter, and the liquid phase outlet of the liquid phase filter is connected to the pyrolysis inlet of the pyrolysis unit; The separation unit further includes a buffer tank, and the liquid phase outlet of the liquid phase filter is communicated with the cracking inlet of the cracking unit through the buffer tank.

2. The device according to claim 1, characterized in that The filtration accuracy of the liquid phase filter is less than or equal to 0.5 μm.

3. The device according to claim 1, characterized in that It also includes a distillation unit, wherein the liquid phase outlet of the distillation unit is communicated with the liquid phase inlet of the liquid phase filter.

4. The device according to claim 1, characterized in that The liquid phase filter includes a filtering part and a post-filtering part, and the separation unit also includes a first pressure gauge and a second pressure gauge, wherein the first pressure gauge is communicated with the filtering part, and the second pressure gauge is communicated with the post-filtering part.

5. The device according to claim 1, characterized in that Also included is a cleaning material storage unit; The cleaning material outlet of the cleaning material storage unit is communicated with the first cleaning material inlet arranged at the top of the liquid phase filter through the buffer tank.

6. The device according to claim 5, characterized in that A second cleaning material inlet is also provided at the bottom of the liquid phase filter, and the cleaning material outlet of the cleaning material storage unit is communicated with the second cleaning material inlet.

7. The device according to any one of claims 1 to 6, characterized in that It includes N separation units, N≥1; When N>1, N separation units are connected in parallel.

8. The device according to claim 7, characterized in that N=2, a first control valve is provided at the liquid phase inlet of the liquid phase filter of the first separation unit, and a second control valve is provided at the liquid phase inlet of the liquid phase filter of the second separation unit, and the working states of the first control valve and the second control valve are opposite.

9. A polysilicon production system, characterized in that: The invention comprises the device according to any one of claims 1 to 8.

Images