Ion exchange resin cleaning device

By designing an ion exchange resin cleaning device including a resin cleaning tank, a liquid dispensing bucket and an ultrasonic generator, the problem that the prior art cannot effectively remove organic matter inside the resin is solved, and a more efficient cleaning effect is achieved, ensuring low organic matter dissolution during ultrapure water treatment.

CN222872210UActive Publication Date: 2025-05-16CHINA ELECTRONICS INNOVATION ENVIRONMENTAL TECH CO LTD +1
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Patent Information

Application Number
CN202421427251.3
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-21
Publication Date
2025-05-16
Estimated Expiration
2034-06-21

AI Technical Summary

Technical Problem

The existing cleaning technology cannot effectively remove organic matter left in the ion exchange resin, resulting in the problem of resin organic matter dissolution during ultrapure water treatment.

Method used

An ion exchange resin cleaning device is designed, which includes a resin cleaning tank, a liquid dispensing bucket and an ultrasonic generator. The cleaning tank is equipped with a liquid inlet area and a cleaning area. The acid and alkali cleaning liquid is introduced into the cleaning area through a filter structure with a water cap, and a micro bubble is generated using an ultrasonic generator to penetrate into the resin for cleaning.

Benefits of technology

Through the use of this device, the cleaning efficiency and cleaning effect of the resin are significantly improved, so that the organic matter dissolution of the cleaned resin during use (in the preparation of ultrapure water) is less than 5 micrograms/liter.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model discloses an ion exchange resin cleaning device which comprises a resin cleaning tank, the resin cleaning tank comprises a liquid inlet, a liquid outlet, a feeding port and a discharging port, the liquid inlet is located at the bottom of the resin cleaning tank, and the liquid outlet is located at the top of the resin cleaning tank; a liquid inlet area and a cleaning area are further arranged in the resin cleaning tank, a filtering structure with a water cap is arranged between the liquid inlet area and the cleaning area, and acid cleaning liquid or alkali cleaning liquid enters the liquid inlet area of the resin cleaning tank through the liquid inlet, penetrates through the filtering structure with the water cap and then enters the cleaning area; an ultrasonic generator is arranged on the outer side wall, corresponding to the liquid inlet area, of the resin cleaning tank; the side, close to the liquid inlet area, of the cleaning area is of a conical structure with the inner diameter gradually enlarged, and an ultrasonic transducer is arranged on the outer side wall of a conical cavity of the cleaning area. The feeding port and the discharging port are both formed in the cleaning area. According to the resin cleaning device, an inner channel of resin is opened through acid-alkali cleaning, a cleaning area where a dead water area is easily formed is adjusted to be of a horn mouth structure, the ultrasonic generator is arranged in the horn mouth space to promote inflow water cavitation to form tiny bubbles, and the tiny bubbles can penetrate into the resin to clean; therefore, the cleaning efficiency and the cleaning effect on the resin are greatly improved.
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Description

Technical Field

[0001] The utility model relates to an ion exchange resin cleaning device. Background Art

[0002] Ion exchange resin is an important type of treatment material in the ultrapure water treatment process. It can remove salt, boron, silicon and organic matter. It is a type of polymer compound with a functional group in a network structure. It consists of an insoluble three-dimensional network skeleton, functional groups connected to the skeleton, and exchangeable ions with opposite charges on the functional groups. Some organic solvents used in the skeleton synthesis process will remain in the skeleton, resulting in the problem of organic matter dissolution from the resin in the ultrapure water treatment process, causing the terminal ultrapure water TOC to exceed the standard.

[0003] Due to the small size of resin particles and complex network structure, existing cleaning technologies, such as ordinary water backwashing and air scrubbing, cannot penetrate deep into the resin. Although the use of ultrasonic cleaning equipment has improved the cleaning effect, the resin requires high ultrapure water treatment, and organic matter still remains. The cleaning effect of the resin still needs to be further improved. Utility Model Content

[0004] Purpose of the utility model: The purpose of the utility model is to provide an ion exchange resin cleaning device, which can effectively remove organic matter remaining inside the resin.

[0005] Technical solution: The ion exchange resin cleaning device described in the utility model comprises a resin cleaning tank, and the resin cleaning tank comprises a liquid inlet, a liquid outlet, a feed inlet and a feed outlet, the liquid inlet is located at the bottom of the resin cleaning tank, and the liquid outlet is located at the top of the resin cleaning tank; the resin cleaning tank is also provided with a liquid inlet area and a cleaning area, and a filtering structure with a water cap is provided between the liquid inlet area and the cleaning area, and an acid cleaning liquid or an alkaline cleaning liquid enters the liquid inlet area of ​​the resin cleaning tank through the liquid inlet, and enters the cleaning area after passing through the filtering structure with a water cap; an ultrasonic generator is provided on the outer side wall corresponding to the liquid inlet area of ​​the resin cleaning tank; the cleaning area is a conical structure with a gradually expanding inner diameter on the side close to the liquid inlet area, and an ultrasonic transducer is provided on the outer side wall of the conical cavity of the cleaning area; the feed inlet and the discharge port are both arranged in the cleaning area.

[0006] Wherein, the discharge port is located directly above the filter structure with a water cap, and the opening direction of the discharge port faces the filter structure with a water cap.

[0007] Among them, the outlet directions of the feed port and the discharge port of the resin cleaning tank are set 180 degrees in opposite directions. Such a setting can increase the distance between the feed port and the discharge port, reduce the influence of the flow field near the feed port and the discharge port, and increase the effective volume of the cleaning tank.

[0008] Among them, in the liquid inlet area, a baffle is provided above the liquid inlet, and the baffle is L-shaped, which is conducive to water distribution. The baffle can prevent high-speed acid and alkali liquids from directly contacting the filtering structure, reduce the flow rate, and make it enter the cleaning area evenly.

[0009] The invention also comprises a liquid preparation barrel, wherein the liquid preparation barrel is filled with hydrochloric acid or sodium hydroxide solution; the mass concentration of the hydrochloric acid is 3-5%; the mass concentration of the sodium hydroxide solution is 4-5%.

[0010] The liquid inlet and the liquid outlet are connected to the liquid dispensing barrel through a liquid inlet pipe and a liquid outlet pipe respectively. The liquid outlet pipe can form a circulation channel.

[0011] Wherein, the liquid inlet pipeline is provided with a liquid inlet pump and a liquid inlet valve; the liquid outlet pipeline is provided with a liquid outlet valve.

[0012] It also includes a liquid discharge pipe connected with the liquid inlet and the liquid inlet pipe, and a liquid discharge valve is arranged on the liquid discharge pipe.

[0013] Beneficial effects: Compared with the prior art, the utility model has the following advantages: the utility model utilizes acid and alkali cleaning to open the internal channels of the resin, and adjusts the cleaning area that is prone to forming dead water areas into a bell-mouth structure. The bell-mouth structure can ensure uniform water distribution of the incoming water on the one hand, while reducing the residual amount of the resin when it is discharged; on the other hand, the use of the bell-mouth space to set an ultrasonic generator can promote cavitation of the incoming water to form tiny bubbles, and the tiny bubbles can penetrate deep into the resin for cleaning, thereby greatly improving the cleaning efficiency and cleaning effect of the resin, so that the organic matter dissolution of the cleaned resin during use (in the process of preparing ultrapure water) is less than 5 micrograms / liter. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 This is a system schematic diagram of the utility model ion exchange resin cleaning device. DETAILED DESCRIPTION

[0015] like Figure 1As shown, the ion exchange resin cleaning device of the utility model comprises a resin cleaning tank 8, the resin cleaning tank 8 comprises a liquid inlet 4, a liquid outlet 11, a feed inlet 10 and a feed outlet 9, the liquid inlet 4 is located at the bottom of the resin cleaning tank 8, and the liquid outlet 11 is located at the top of the resin cleaning tank 8; the resin cleaning tank is also provided with a liquid inlet area 81 and a cleaning area 82, and a filtering structure 51 with a water cap 5 is provided between the liquid inlet area 81 and the cleaning area 82, the filtering structure 51 is a filtering plate with a plurality of through holes, and a water cap 5 is installed at each through hole; the acid cleaning liquid or the alkaline cleaning liquid enters the liquid inlet of the resin cleaning tank 8 through the liquid inlet 4 In the zone 81, after passing through the filter structure 51 with a water cap 5, it enters the cleaning zone 82; the resin cleaning tank 8 is provided with an ultrasonic generator 6 on the outer side wall corresponding to the liquid inlet zone 81; the cleaning zone 82 is a conical structure with a gradually expanding inner diameter on the side close to the liquid inlet zone 81, and an ultrasonic transducer 7 is provided on the outer side wall of the conical cavity of the cleaning zone 82; the feed port 10 and the discharge port 9 are both arranged in the cleaning zone 82, the discharge port 9 is located directly above the filter structure 51 with a water cap, and the opening direction of the discharge port 9 is directly opposite to the filter structure 51 with a water cap; the outlet directions of the feed port 10 and the discharge port 9 are arranged 180° in the opposite direction. Among them, in the liquid inlet zone 81, a baffle 14 is provided above the liquid inlet 4 to facilitate water distribution.

[0016] The utility model ion exchange resin cleaning device also includes a liquid mixing barrel 1, which is filled with hydrochloric acid or sodium hydroxide solution; the mass concentration of hydrochloric acid is 3-5%; the mass concentration of sodium hydroxide solution is 4-5%; the liquid inlet 4 and the liquid outlet 11 are connected with the liquid mixing barrel 1 through the liquid inlet pipeline 15 and the liquid outlet pipeline 16 respectively, the liquid inlet pipeline 15 is provided with a liquid inlet pump 2 and a liquid inlet valve 3; the liquid outlet pipeline 16 is provided with a liquid outlet valve 12; and also includes a liquid discharge pipeline 17 connected with the liquid inlet 4 and the liquid inlet pipeline 15, and the liquid discharge pipeline 17 is provided with a liquid discharge valve 13.

[0017] The utility model ion exchange resin cleaning device is used for cation resin cleaning, specifically:

[0018] First, add the cation exchange resin to be cleaned into the resin cleaning tank 8 through the feed port 10, and add 5wt.% hydrochloric acid into the liquid preparation barrel 1; turn on the liquid inlet pump 2 and the liquid inlet valve 3, and the hydrochloric acid enters the resin cleaning tank 8 from the liquid inlet 4, turn on the ultrasonic generator 6, and send out a high-frequency oscillation signal, which is converted into a high-frequency mechanical oscillation by the ultrasonic transducer 7 and propagated to the hydrochloric acid cleaning liquid. The frequency is 50kHz, and the cleaning takes 20 minutes; after cleaning, open the drain valve 13, wait until the cleaning liquid in the resin cleaning tank 8 is discharged, close the drain valve 13, and suck out the cleaned ion exchange resin from the discharge port 9.

[0019] The utility model ion exchange resin cleaning device is used for anion resin cleaning, specifically:

[0020] First, add the anion exchange resin to be cleaned into the resin cleaning tank 8 through the feed port 10, and add 5wt.% NaOH into the liquid preparation barrel 1; turn on the liquid inlet pump 2 and the liquid inlet valve 3, and NaOH enters the resin cleaning tank 8 from the liquid inlet 4, turn on the ultrasonic generator 6, send out a high-frequency oscillation signal, which is converted into a high-frequency mechanical oscillation by the ultrasonic transducer 7 and propagated to the NaOH cleaning liquid, with a frequency of 50kHz, and the cleaning takes 20 minutes; after cleaning, open the drain valve 13, wait until the cleaning liquid in the resin cleaning tank 8 is discharged, close the drain valve 13, and suck out the cleaned ion exchange resin from the discharge port 9.

Claims

1. An ion exchange resin cleaning device, characterized in that: The invention comprises a resin cleaning tank, which comprises a liquid inlet, a liquid outlet, a feed inlet and a feed outlet, wherein the liquid inlet is located at the bottom of the resin cleaning tank, and the liquid outlet is located at the top of the resin cleaning tank; a liquid inlet area and a cleaning area are also arranged in the resin cleaning tank, and a filtering structure with a water cap is arranged between the liquid inlet area and the cleaning area, and an acid cleaning liquid or an alkaline cleaning liquid enters the liquid inlet area of ​​the resin cleaning tank through the liquid inlet, and enters the cleaning area after passing through the filtering structure with a water cap; an ultrasonic generator is arranged on the outer side wall corresponding to the liquid inlet area of ​​the resin cleaning tank; the cleaning area is in a conical structure with a gradually expanding inner diameter on the side close to the liquid inlet area, and an ultrasonic transducer is arranged on the outer side wall of the conical cavity of the cleaning area; the feed inlet and the feed outlet are both arranged in the cleaning area.

2. The ion exchange resin cleaning device according to claim 1, characterized in that: The discharge port is located directly above the filter structure with the water cap, and the opening direction of the discharge port faces the filter structure with the water cap.

3. The ion exchange resin cleaning device according to claim 2, characterized in that: The outlet directions of the feed inlet and the discharge outlet of the resin cleaning tank are arranged in 180° opposite directions.

4. The ion exchange resin cleaning device according to claim 1, characterized in that: In the liquid inlet area, a baffle is provided above the liquid inlet.

5. The ion exchange resin cleaning device according to claim 1, characterized in that: The device also comprises a liquid preparation barrel, in which hydrochloric acid or sodium hydroxide solution is filled.

6. The ion exchange resin cleaning device according to claim 5, characterized in that: The liquid inlet and the liquid outlet are communicated with the liquid dispensing barrel through a liquid inlet pipe and a liquid outlet pipe respectively.

7. The ion exchange resin cleaning device according to claim 6, characterized in that: The liquid inlet pipeline is provided with a liquid inlet pump and a liquid inlet valve; the liquid outlet pipeline is provided with a liquid outlet valve.

8. The ion exchange resin cleaning device according to claim 6, characterized in that: It also includes a liquid discharge pipeline connected with the liquid inlet and the liquid inlet pipeline, and a liquid discharge valve is arranged on the liquid discharge pipeline.