Protective film frame and protective film stripping tool

Abstract

The embodiment of the utility model provides a protective film frame and a protective film stripping tool. The embodiment of the utility model relates to a protective film stripping tool or a protective film removing tool, which comprises one or more clamp structures, and each clamp structure comprises a corresponding pin group. Respective pins of the pin groups of the one or more clamp structures are configured to be inserted in holes present within a pellicle frame of the pellicle in operation. Once corresponding pins of the group of pins are inserted into the holes of the pellicle frame, a removal force may be applied to the pellicle frame to remove the pellicle coupled onto the photomask by an adhesive, glue, or some other similar type of coupling material from the photomask.

Description

Technical Field

[0001] The embodiment of the utility model relates to a protective film frame and a protective film stripping tool. Background Art

[0002] In the manufacture of integrated circuit devices, photomasks, also called photoreticles or reticles, are used to project patterns for the integrated circuits onto semiconductor wafers. To protect the photomasks from contamination, which would result in errors in the projected pattern, the photomasks have been provided with a pellicle consisting of a pellicle frame and an optically transparent film. An adhesive is used to bond the pellicle frame to the surface of the photomask, and the film extends through the pellicle frame.

[0003] Reasons for removing pellicles include repairing defects detected in the photomask, removing haze contamination that has formed on the photomask beneath the pellicle, and replacing pellicles that have been damaged by mechanical damage or exposure damage. Haze contamination is a precipitate formed by chemical residues from photomask cleaning, fab impurities, or environmental exposure. Currently, precipitated defects or contamination may be caused by air contamination in the environment, pellicle adhesives, photomask pod out-gassing, pellicle frame residues, chemical growth and deposition from reactions, and mixtures of chemical solutions.

[0004] When removing the pellicle, damage to the pellicle may occur due to the application of forces to the pellicle frame of the pellicle in an unbalanced manner, resulting in flexure and bending in the film, which may damage the film. For example, such damage to the film may include cracks, wrinkles, or breaks that propagate through and within the film and occur such that the film is no longer suitable for protecting a corresponding photomask or allowing selected wavelengths of light to pass through the film unimpeded. Utility Model Content

[0005] An embodiment of the utility model provides a protective film frame, comprising: a frame, comprising: a first surface; a second surface, relative to the first surface; a first side portion; a second side portion, relative to the first side portion; a third side portion, transverse to the first side portion and the second side portion, the third side portion extends from the first side portion to the second side portion and is coupled to the first side portion and the second side portion; a fourth side portion, transverse to the first side portion and the second side portion, the fourth side portion extends from the first side portion to the second side portion and is coupled to the first side portion and the second side portion, and the fourth side portion is relative to the third side portion; an opening, defined by the first side portion, the second side portion, the third side portion and the fourth side portion; a first group of holes, in the first side portion; a second group of holes, in the second side portion; a third group of holes, in the third side portion; and a fourth group of holes, in the fourth side portion.

[0006] An embodiment of the utility model provides a protective film stripping tool, comprising: a protective film clamp structure, configured to be clamped on a protective film frame coupled to a corresponding protective film of a photomask during operation, the protective film clamp structure comprising: a main body portion; and one or more tapered pins protruding from the main body portion, the one or more tapered pins comprising: a first end; a second end, relative to the first end; and at least one inclined side wall, transverse to the first end and the second end, the at least one inclined side wall extending from the first end to the second end.

[0007] In order to make the above features and advantages of the embodiments of the present invention more obvious and easy to understand, embodiments are specifically cited below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0008] The aspects of the present disclosure will be best understood from the following detailed description when read in conjunction with the accompanying drawings. It is noteworthy that, in accordance with standard practice in the industry, various features are not drawn to scale. In fact, the size of various features may be arbitrarily increased or reduced for clarity of discussion.

[0009] Figure 1A is a top plan view of one or more fixtures coupled to a reticle of a photomask and a reticle stripping tool.

[0010] Figure 1B is along Figure 1A The line 1B-1B shown in FIG. Figure 1A A cross-sectional view of one or more fixtures coupled to a pellicle of a photomask and a stripping pellicle tool is shown.

[0011] Figure 2is a top plan view of a corresponding pellicle after removal from a corresponding photomask, with resulting damage and defects extending through and within the film of the pellicle.

[0012] Figure 3A is a top plan view of one or more fixtures coupled to a pellicle of a photomask and a strip pellicle tool in accordance with some embodiments.

[0013] Figure 3B According to some embodiments, Figure 3A The line 3B-3B shown in FIG. Figure 3A A cross-sectional view of one or more fixtures coupled to a pellicle of a photomask and a stripping pellicle tool is shown.

[0014] Figure 3C According to some embodiments, Figure 3A and Figure 3B A side view of one or more fixtures of a pellicle and a stripping tool coupled to a photomask is shown.

[0015] Figure 3D According to some embodiments, Figure 3C An enlarged and enhanced view of a cross section 3D-3D of the pellicle is shown.

[0016] Figure 4A is a top plan view along the outline of pins of one or more clamps of a stripping pellicle tool according to some embodiments.

[0017] Figure 4B According to some embodiments, Figure 4A A front side view of one end of a pin of one or more clamps of a stripping tool is shown.

[0018] Figure 5A is a top plan view of a system configured to control and position one or more fixtures of a stripping tool during operation, according to some embodiments.

[0019] Figure 5B According to some embodiments, Figure 5A An enlarged and enhanced view of section 5B-5B along at least one pin of a clamp of a stripping pellicle tool and along at least one reception opening of a frame of the pellicle is shown.

[0020] Figure 6 is a cycle diagram of a pellicle being removed from a photomask and reused after being removed from the photomask in accordance with some embodiments.

[0021] Figure 7 is a flow chart of a method of removing a pellicle from a photomask that is coupled to the photomask using one or more fixtures having one or more pins, according to some embodiments.

[0022] FIG. 8A to FIG. 8E They are Figure 7 1 and 2 are corresponding views of corresponding steps of an embodiment of a method of removing a pellicle coupled to a photomask from a photomask as shown in a flowchart of FIG. DETAILED DESCRIPTION

[0023] The following disclosure provides many different embodiments or examples of different features for implementing the provided subject matter. Specific examples of components and configurations are described below to simplify the disclosure. Of course, these components and configurations are only examples and are not intended to be restrictive. For example, in the following description, the formation of a first feature over or on a second feature may include an embodiment in which the first feature and the second feature are formed in direct contact, and may also include an embodiment in which an additional feature may be formed between the first feature and the second feature so that the first feature and the second feature may not be in direct contact. In addition, the disclosure may repeat figure numbers and / or letters in various examples. This repetition is for the purpose of simplicity and clarity, and does not itself indicate the relationship between the various embodiments and / or configurations discussed.

[0024] Additionally, for ease of description, spatially relative terms such as "beneath," "below," "lower," "above," "upper," and the like may be used herein to describe the relationship of one component or feature to another component or feature as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may be interpreted accordingly.

[0025] Generally, semiconductor wafers, substrates or layers are patterned using an extreme ultraviolet (EUV) patterning tool or apparatus during the manufacturing process. For example, a photomask coupled to a pellicle such that the photomask overlaps the pellicle is aligned with a semiconductor wafer within an EUV patterning tool. EUV light is then emitted at the semiconductor wafer by an EUV light source within the EUV patterning tool to pattern the semiconductor wafer.

[0026] After performing the EUV patterning process one or more times, the pellicle can be removed from the photomask by using a pellicle stripping tool or a pellicle removal tool using one or more clamp structures of the pellicle stripping tool or the pellicle removal tool. For example, one or more clamp structures can be engaged with the pellicle frame of the pellicle, and then the one or more clamp structures can be moved away from the photomask. When the one or more clamp structures apply a force to the pellicle, the adhesive force of the adhesive coupling the pellicle frame to the photomask is overcome, causing the pellicle frame of the pellicle to break away from the adhesive. However, when the force is applied in an unbalanced manner so that the force is unevenly distributed on the pellicle frame, the film of the pellicle coupled to the pellicle frame may be damaged. For example, damage to the film may include wrinkling, ruptures, cracks, or some other similar type of damage that may occur in the film when the force is unevenly distributed on the film. The pellicle is configured to protect the photomask from contamination during operation when used within an EUV patterning tool, and the provision of the pellicle results in increased manufacturing costs and scrap costs when the pellicle is damaged because the pellicle is relatively expensive.

[0027] When such damage occurs in the film of the pellicle when the pellicle is removed from the photomask, small particles of the film may fall off the film, causing damage or contamination of the photomask. When the photomask is damaged or contaminated, the setting of the photomask leads to increased manufacturing costs and scrap costs because the photomask is relatively expensive.

[0028] The present disclosure is directed to one or more embodiments of a pellicle stripping tool or a pellicle removal tool, which includes one or more clamp structures, which are used to apply a removal force to a pellicle frame of the pellicle so as to remove the pellicle from the photomask. When the force is applied to the pellicle frame by the one or more clamp structures, the force is distributed on the pellicle frame in a balanced manner so that the force is evenly distributed on and along the pellicle frame. This uniform distribution of the removal force prevents or reduces the possibility of damage to the pellicle or the film of the pellicle when the pellicle is removed from the photomask. For example, this uniform distribution of the removal force to the pellicle frame can prevent or reduce the possibility of wrinkling, cracking, cracking or other similar defects in the film of the pellicle, thereby reducing manufacturing costs, reducing scrap costs and preventing or reducing contamination or damage to the photomask previously coupled to the pellicle.

[0029] Figure 1A is the same as the photomask 102 (see Figure 1B) is a top plan view of a pellicle 100 with overlapping portions. The pellicle 100 includes a pellicle frame 104 coupled to a photomask 102. The pellicle frame 104 includes a first side portion 106, a second side portion 108, a third side portion 110, and a fourth side portion 112, wherein the second side portion 108 is relative to the first side portion 106, the third side portion 110 is transverse to the first side portion 106 and the second side portion 108 and extends from the first side portion 106 to the second side portion 108, and the fourth side portion 112 is transverse to the first side portion 106 and the second side portion 108 and relative to the third side portion 110 and extends from the first side portion 106 to the second side portion 108. Respective corners of the frame 110 between the first side portion 106, the second side portion 108, the third side portion 110, and the fourth side portion 112 are rounded corners.

[0030] The pellicle 100 also includes a film 114 that extends through an opening 115 of the pellicle frame 104 defined by the first side portion 106, the second side portion 108, the third side portion 110, and the fourth side portion 112, respectively. The film 114 is configured to overlap and cover the photomask 102 in operation, such that the film 114 serves as a protective cover or boundary to prevent or block contaminants from reaching the photomask 102. The film 114 can be made of a material that allows selected wavelengths of light to pass through the film 114 and reach a target aligned with the film 114 and the photomask 102. For example, the film 114 can be made of a material that allows EUV light to easily pass through the film 114, such that a target (e.g., a semiconductor wafer, a semiconductor substrate, a semiconductor layer, or some other similar semiconductor structure) is used with the film 114 and the photomask 102. Alternatively, the film 114 may be made of a material that allows some other wavelengths of light to pass through the film 114 which may be used to perform various types of patterning techniques.

[0031] The pellicle stripping tool or pellicle removal tool includes a first clamp structure 116 and a second clamp structure 118, and the second clamp structure 118 is opposite to the first clamp structure 116. The first clamp structure 116 includes a first pin group 120, and the second clamp structure 118 includes a second pin group 122. The first pin group 120 includes two pins 120, and the second pin group 122 includes two pins 122.

[0032] Figure 1B It is along Figure 1A FIG. 1 is a cross-sectional view of the protective film 100, the first clamp structure 116, and the second clamp structure 118 along the line 1B-1B shown in FIG. Figure 1BAs shown, the first pin group 120 is inserted into the first receiving opening 124 extending through the first side portion 106 of the film frame 104, and the second pin group 122 is inserted into the second receiving opening 126 extending through the second side portion 108. At least one first opening 124 and at least one second opening 126 are shown in Figure 1B As shown in the cross-sectional view. Figure 1B At least one first opening 124 is shown to receive a corresponding pin of the first pin group 120, and as shown in FIG. Figure 1B At least one second opening 126 is shown to receive a corresponding pin of the second pin group 122. In other words, there is a one-to-one relationship between the first pin group 120 and the first opening 124, such that each corresponding pin 120 of the first pin group 120 is inserted into a corresponding first opening of the first opening 124, and there is a one-to-one relationship between the second pin group 122 and the second opening 126, such that each corresponding pin 122 of the second pin group 122 is inserted into a corresponding second opening of the second opening 126.

[0033] The photomask 102 includes a first side 128 and a second side 130, the second side 130 being opposite to the first side 128. The first side 128 faces away from the pellicle 100, and the second side 130 faces the pellicle 100.

[0034] The frame 104 of the pellicle 100 includes a third side 132 and a fourth side 134 opposite the third side 132. The third side 132 faces the second side 130 of the photomask 102 and the fourth side 134 faces away from the photomask 102. The film 114 is coupled to the fourth side 134 of the frame 104 of the pellicle 100.

[0035] Adhesive 136 is on second side 130 of photomask 102 and on third side 132 of frame 104. Adhesive 136 couples or adheres third side 132 of frame 104 of pellicle 100 to second side 130 of photomask 102. Adhesive 136 may be glue or some other type of adhesive material.

[0036] In operation, when the first lead set 120 is within the first opening 124 and the second lead set 122 is within the second opening 126, a force 138 is applied to the pellicle frame 104 away from the photomask 102. The force 138 may be referred to as a removal force. Figure 1B In the orientation shown, force 138 is directed in a downward direction. Removal force 138 is strong enough to overcome the adhesion or strength of adhesive 136 that adheres or couples frame 104 to the photomask. For example, when removal force 138 is applied to frame 104, adhesive 136 is broken, thereby causing frame 104 to be removed from photomask 102.

[0037] Since there are two corresponding pins 120 in the first pin group 120 and two corresponding pins 122 in the second pin group 122, the removal force 138 applied to the frame 104 of the protective film 100 may have a larger force at the corresponding pins near the first pin group 120 and the corresponding pins of the second pin group 122 along the first clamp structure 116 and the second clamp structure 118, respectively. In other words, the removal force 138 applied at the first side portion 106 and the second side portion 108 by the first clamp structure 116 and the second clamp structure 118 may cause the stress and strain in the frame 104 and the film 114 near or adjacent to the first side portion 106 and the second side portion 108 to be greater than those at the third side portion 110 and the fourth side portion 112. Such uneven distribution of the removal force 138 on the frame 104 results in such uneven distribution of stress and strain in the film 114, and may cause buckling, bending, and warping of the film 114, which ... Figure 1B Such buckling, bending and warping of the membrane 114 may result in the propagation of damage or defects within the membrane 114, which may be Figure 2 It is easy to see.

[0038] Figure 2 FIG. 1 is a top view of a corresponding pellicle identical to pellicle 100 after the corresponding pellicle identical to pellicle 100 is removed from a corresponding photomask identical to photomask 102. Figure 2 As shown, the pellicle 100 is removed from the photomask 102 using the first clamp structure 116 and the second clamp structure 118, and the film 114 of the pellicle has been damaged. Figure 2 As shown, damaged regions 140 extending through the film 114 exist at locations 142 along the second side portion 108 of the frame 104 of the pellicle 100. These locations 142 may correspond to, be adjacent to, or be near the respective locations where the removal force 138 is applied to the second side portion 108 to remove the pellicle 100 from the photomask 102. In other words, these locations 142 may correspond to, be adjacent to, or be near the respective locations of the second opening 126 along the second side portion 108 of the frame 104 of the pellicle 100. As the damaged regions 140 expand at the second side portion 108 of the frame 104 due to bending, buckling, or warping within the film 114, damage may occur at other regions or locations along the film 114 when the removal force 138 is applied to the frame 104 of the pellicle 100, wherein the pellicle 100 is removed from the photomask 102 by overcoming the adhesion or strength of the adhesive 136.

[0039] Figure 3A2 is a top plan view of a pellicle 200 coupled to a photomask 102. The pellicle 200 further includes a pellicle frame 202. The pellicle frame 202 may be made of a metal material. The frame includes a first side portion 204, a second side portion 206, a third side portion 208, and a fourth side portion 210, wherein the second side portion 206 is relative to the first side portion 204, the third side portion 208 is transverse to the first side portion 204 and the second side portion 206 and extends from the first side portion 204 to the second side portion 206, and the fourth side portion 210 is relative to the third side portion 208 and is transverse to the first side portion 204 and the second side portion 206 and extends from the first side portion 204 to the second side portion 206. The respective corners of the frame 202 between the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 are rounded. The protective film 200 further includes a film 114 extending through an opening 212 of the frame 202 defined by the first side portion 204 , the second side portion 206 , the third side portion 208 , and the fourth side portion 210 of the frame 202 , and the film 114 overlaps the opening 212 .

[0040] The film stripping tool or film removal tool includes a first clamp structure 214, a second clamp structure 216, a third clamp structure 218, and a fourth clamp structure 220, wherein the second clamp structure 216 is relative to the first clamp structure 214, the third clamp structure 218 is transverse to the first clamp structure 214 and the second clamp structure 216, and the fourth clamp structure 220 is transverse to the first clamp structure 214 and the second clamp structure 216 and relative to the third clamp structure 218. The first clamp structure 214 includes a first pin group 222, the second clamp structure 216 includes a second pin group 224, the third clamp structure 218 includes a third pin group 226, and the fourth clamp structure 220 includes a fourth pin group 228. Figure 3A In the illustrated embodiment of the pellicle stripping tool and the pellicle removal tool, the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228 each include three pins. In some embodiments, the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228 may have different numbers of corresponding pins relative to each other. For example, the first pin group 222 and the second pin group 224 may include three pins, while the third pin group 226 and the fourth pin group 228 may include four pins. In other words, the number of the first pin group 222, the number of the second pin group 224, the number of the third pin group 226, and the number of the fourth pin group 228 may have multiple combinations.

[0041] Figure 3B is along Figure 3A The cross-sectional view of the protective film 200, the first clamp structure 214 and the second clamp structure 216 along the line 3B-3B shown in FIG. Figure 3BAs shown, the first pin group 222 is inserted into the first receiving opening 230 extending through the first side portion 204 of the frame 202, and the second pin group 224 is inserted into the second receiving opening 232 extending through the second side portion 206 of the frame 202. At least one first opening 230 and at least one second opening 232 are shown in Figure 3B As shown in the cross-sectional view. Figure 3B At least one first opening 230 is shown to receive a corresponding pin of the first pin group 222, and as shown in FIG. Figure 3B At least one second opening 232 is shown to receive a corresponding pin of the second pin group 224. In other words, there is a one-to-one relationship between the first pin group 222 and the first opening 230, such that each corresponding pin 222 of the first pin group 222 is inserted into a corresponding first opening 230 of the first opening 230, and there is a one-to-one relationship between the second pin group 224 and the second opening 232, such that each corresponding pin 224 of the second pin group 224 is inserted into a corresponding second opening 232 of the second opening 232.

[0042] Although not shown, the third side portion 208 of the frame 202 includes a third receiving opening, and the fourth side portion 210 includes a fourth receiving opening. The third receiving opening and the fourth receiving opening are the same as or similar to the first receiving opening and the second receiving opening. The third receiving opening of the third side portion 208 receives the third pin group 226 of the third fixture structure 218, and the fourth receiving opening of the fourth side portion 210 receives the fourth pin group 228 of the fourth fixture structure 220. There is a one-to-one relationship between the third receiving opening and the third pin group 226, such that each corresponding pin 226 of the third pin group 226 is inserted into a corresponding opening of the third opening, and there is a one-to-one relationship between the fourth opening and the fourth pin group 228, such that each corresponding pin 228 of the fourth pin group 228 is inserted into a corresponding opening of the fourth opening.

[0043] The frame 202 of the pellicle 200 includes a third side 234 and a fourth side 236, wherein the fourth side 236 is opposite to the third side 234. The third side 234 faces the second side 130 of the photomask 102, and the fourth side 236 faces away from the photomask 102.

[0044] The first adhesive 238 is on the second side 130 of the photomask 102 and on the third side 234 of the frame 202 of the pellicle 200. The first adhesive 238 couples the third side 234 of the frame 202 of the pellicle 200 to the second side 130 of the photomask 102. The first adhesive may be glue or some other type of adhesive.

[0045] The second adhesive 240 is on the fourth side 236 of the frame 202 of the pellicle 200 and couples the membrane support frame 242 to the fourth side 236 of the frame 202 of the pellicle 200. The second adhesive 240 may be glue or some other type of adhesive. The membrane 114 is coupled to the membrane support frame 242.

[0046] The membrane support frame 242 may be made of a silicon material. In some embodiments, the membrane support frame 242 may be integrated with the membrane 114 such that the membrane support frame 242 and the membrane 114 are made of a continuous material, such as silicon.

[0047] In operation, when the first lead group 222, the second lead group 224, the third lead group 226, and the fourth lead group 228 are inserted into the first receiving opening 230 of the first side portion 204, the second receiving opening 232 of the second side portion 206, the third receiving opening (not shown) of the third side portion 208, and the fourth receiving opening (not shown) of the fourth side portion 210, respectively, a force 138 is applied to the pellicle frame 202 away from the photomask 102. Based on the Figure 3B In the orientation shown, the force 138 is directed in a downward direction. The removal force 138 is strong enough to overcome the adhesion or strength of the first adhesive 238 adhering or coupling the third side 234 of the frame 202 to the second side 130 of the photomask 102. For example, when the removal force 138 is applied to the frame 202, the first adhesive 238 is broken, thereby causing the frame 202 to be removed from the photomask 102.

[0048] Because the respective pins 222, 224, 226, 228 of the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228 have a greater number relative to the respective pins 120, when the frame 104 is removed from the photomask 102, the force 138 is more evenly distributed on the frame 202 relative to when the frame 104 is removed from the photomask 102 using the first pin group 120 and the second pin group 122 as previously described herein. The more evenly distributed force 138 on the frame 202 further prevents or reduces the force 138 from being applied to the frame 202. Figure 2 The possibility of damage shown will be reduced, thereby reducing manufacturing costs and scrap costs.

[0049] Because Figure 3B The corresponding clamp structures 214, 216, 218, 220 shown are relative to Figure 2The respective clamp structures 116, 118 are shown to have a greater number, so when the frame 202 is removed from the photomask 102 using the respective clamp structures 214, 216, 218, 220, the force 138 is more evenly distributed on the frame 202 relative to when the frame 104 is removed from the photomask 102 using the respective clamp structures 116, 118. The more evenly distributed force 138 on the frame 202 further prevents or reduces the following Figure 2 The possibility of damage shown will be reduced, thereby reducing manufacturing costs and scrap costs.

[0050] Due to the presence of the second adhesive 240, and the second adhesive 240 coupling the film support frame 242 to the fourth side 236 of the frame 202 of the overcoat 200, the second adhesive prevents or reduces the possibility of the film 114 being exposed to the stress and strain that occurs when the removal force 138 is applied to the frame 202 using the corresponding pin groups 222, 224, 226, 228 and the corresponding clamp structures 214, 216, 218, 220. In other words, the second adhesive 240 can be configured to act as an isolation of stress and strain during operation, so that the stress and strain that occurs in the frame 202 is isolated from the film 114, thereby preventing or reducing the possibility of the film 114 being exposed to the stress and strain that occurs when the frame 202 is removed. Figure 2 The potential for damage to occur within film 114 is shown. The adhesive material used for second adhesive 240 may have a relatively high modulus of elasticity to further isolate film 114 from any stress or strain that may occur within frame 202 when force 138 is applied to frame 202 to remove frame 202 from photomask 102.

[0051] like Figure 3B As shown, relative to Figure 1B The bending, buckling and warping of the membrane 114 shown has less bending, buckling and warping within the membrane 114. Figure 3B The illustrated reduced bending, buckling, and warping within the membrane further prevents or reduces the likelihood of damage or defects propagating within the membrane 114 .

[0052] Figure 3C2 is a side view of the pellicle 200 coupled to the photomask 102 and the photomask 102 coupled to the photomask platform 244, wherein the photomask platform 244 includes one or more photomask alignment structures 246 so that the photomask 102 is properly positioned. The photomask platform 244 includes a platform plate 246, and the platform plate 246 includes a fixture structure opening 248, and the fixture structure opening 248 is configured to allow the first fixture structure 214, the second fixture structure 216, the third fixture structure 218, and the fourth fixture structure 220 to pass through the corresponding fixture structure opening 248, respectively, so that the first lead group 222, the second lead group 224, the third lead group 226, and the fourth lead group 228 can be inserted into the first receiving opening 230 in the first side portion 204, the second receiving opening 232 in the second side portion 206, the third receiving opening (not shown) in the third side portion 208, and the fourth receiving opening (not shown) in the fourth side portion 210, respectively.

[0053] The photomask 102 may be coupled to the photomask alignment structure 246 by an adhesive (not shown). The photomask alignment structure 246 has one or more surfaces 250 that may be adjacent to or may be adjacent to the second side 130 of the photomask 102. When the first lead group 222, the second lead group 224, the third lead group 226, and the fourth lead group 228 are inserted into the first receiving opening 230 in the first clamp structure 214, the second receiving opening 232 in the second clamp structure 216, the third receiving opening (not shown) in the third clamp structure 218, and the fourth receiving opening (not shown) in the fourth clamp structure 220, respectively, and the force 138 is applied to the frame 202, the one or more surfaces 250 may hold the photomask 102 in a fixed position, so that the first adhesive 238 is broken, thereby causing the pellicle 200 to be removed from the second side 130 of the photomask 102.

[0054] Figure 3D Yes Figure 3C The first side portion 204 of the frame 202 of the protective film 200 is shown as Figure 3C An enlarged and enhanced view of the cross section 3D-3D shown. Figure 3C As shown, adjacent first receiving openings 230 are separated by a distance 252 that extends between center points of adjacent first receiving openings 230. In at least some embodiments, the distance 252 is determined using the following formula:

[0055]

[0056] σ f = Silicon bending stress

[0057] M z = Moment about the neutral axis z

[0058] W y = resistance moment about the neutral axis

[0059] F = bending force of the protective film on the fixture pin

[0060] L = distance between fixture pins

[0061] b = sample (film) width

[0062] h = sample (film) height

[0063] P μ = Sample (film) mass

[0064] μ=Adhesion of sample (film adhesive)

[0065] Figure 4A 2 is a top plan view of an embodiment of at least one corresponding pin 222, 224, 226, 228. Figure 4A As shown, the corresponding pins 222, 224, 226, 228 include a first end 254 and a second end 256, wherein the second end 256 is opposite to the first end 254. The first end 254 is an end that is initially inserted into the corresponding receiving openings of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220, respectively. The second end 256 is an end that is coupled to the frame 202 of the pellicle 200 so that the corresponding pins 222, 224, 226, 228 extend and protrude from at least one of the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 of the frame 202, respectively. The first end 254 has a first area, and the second end 256 has a second area, wherein the second area is smaller than the first area of ​​the first end 254. The respective pin 222 , 224 , 226 , 228 includes at least one angled surface 258 extending from the first end 254 to the second end 258 .

[0066] Figure 4B 222, 224, 226, 228 are various front and side views of various embodiments of the corresponding pins 222, 224, 226, 228. Figure 4B In the leftmost embodiment shown, the first end 254 has a first circular profile, the second end 256 has a second circular profile that is larger than the first circular profile, and at least one inclined surface 258 extends from the first end 254 to the second end 256. Figure 4B In the central embodiment shown, the first end has a first elliptical profile, the second end has a second elliptical profile that is larger than the first elliptical profile, and at least one inclined surface 258 extends from the first end 254 to the second end 256. Figure 4BIn the rightmost embodiment shown, the first end 254 has a first rectangular profile, the second end 256 has a second rectangular profile that is larger than the first rectangular profile, and at least one inclined surface 258 extends from the first end 254 to the second end 256. In alternative embodiments, the first end 254 and the second end 256 of the corresponding pins 222, 224, 226, 228 may have the same Figure 4B For example, the first end 254 and the second end 256 may have a triangular profile, an n-sided polygonal profile, or some other similar polygonal or shaped profile.

[0067] The first end 254 of the respective pin 222, 224, 226, 228 may have a first width 260 extending through the first end 254. In some embodiments, the first width 260 may be greater than or equal to 0.2 millimeters (mm). The second end 256 may have a second width 262 that is greater than the first width 260. When the respective pin 222, 224, 226, 228 has a circular or oval profile as previously described herein, the first width 260 and the second width 262 may be diameters.

[0068] At least one inclined surface 258 has a slope. In some embodiments, the slope may be greater than or equal to 5, may be less than or equal to 8, or may be some intermediate value between 5 and 8.

[0069] When the corresponding pins 222, 224, 226, 228 are corresponding pins of the first pin group 222, the first receiving opening 230 may have a width (e.g., a diameter when the first receiving opening 230 is circular or oval), and the width may be greater than the first width 260 of the first end 254. The width of the first receiving opening 230 greater than the first width 260 of the first end 254 can allow the corresponding pin 222 to be inserted into the corresponding first receiving opening 230 of the first receiving openings 230. Although this discussion is about the corresponding pins of the first pin group 222, this discussion can be easily applied to the second pin group 224, the third pin group 226, and the fourth pin group 228, respectively.

[0070] Figure 5A 300 is a top plan view of a system 300 configured to control and position one or more fixtures of a stripping pellicle tool or a pellicle removal tool, control and position a platform 244, or both, respectively, during operation. The system 300 includes one or more sensors 302a, 302b, 302c. For example, one or more sensors 302a, 302b, 302c may be a charge coupled image capture device that captures an image by converting photons into electrons.

[0071] The controller 304 is in communication with one or more sensors 302a, 302b, 302c, respectively. The controller 304 can communicate with the first fixture structure 214, the second fixture structure 216, the third fixture structure 218, and the fourth fixture structure 220, can communicate with the platform 244, or can communicate with the first fixture structure 214, the second fixture structure 216, the third fixture structure 218, and the fourth fixture structure 220 and the platform 244.

[0072] The first sensor 302a of the one or more sensors 302a, 302b, 302c monitors the film 114 of the pellicle 200 for monitoring the expansion of damage or defects in the film 114. For example, if the first sensor 302a begins to detect the expansion of any damage or defects in the film 114 when the pellicle 200 is removed from the photomask 102, the controller 304 may output a control signal to stop the movement of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220, to stop the movement of the platform 244, or to stop the movement of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 and the platform 244, thereby preventing irreversible damage or defects in the film 114 when the pellicle 200 is removed from the photomask 102.

[0073] The second sensor 302b of the one or more sensors 302a, 302b, 302c may monitor the positioning of the first receiving opening 230 of the first side portion 204 of the frame 202 relative to the first pin group 222. For example, if the second sensor 302b of the one or more sensors 302a, 302b, 302c determines that the first pin group 222 is not aligned with the first receiving opening 230 (e.g., the first guide pin group 222 is offset relative to the first receiving opening 230), the controller 304 may output a control signal to move one or both of the first fixture structure 214 and the platform 244 to align the first receiving opening 230 with the first guide pin group 222 so that the first guide pin group 222 can be inserted into the first receiving opening 230.

[0074] The third sensor 302c of the one or more sensors 302a, 302b, 302c may monitor the positioning of the third receiving opening of the third side portion 208 of the frame 202 of the protective film 200 relative to the third guide pin group 226. For example, if the third sensor 302c of the one or more sensors 302a, 302b, 302c determines that the third guide pin group is not aligned with the third receiving opening (e.g., the third guide pin group 226 is offset relative to the third receiving opening), the controller 304 may output a control signal to move one or both of the third fixture structure 218 and the platform 244 to align the third receiving opening with the third guide pin group 226 so that the third guide pin group 226 can be inserted into the third receiving opening of the third side portion 208 of the frame 202 of the protective film 200.

[0075] Although not shown, the controller 304 may be in electrical communication with one or more actuators (not shown) that mechanically cooperate or engage with a respective one of the first, second, third, and fourth fixture structures 214, 216, 218, and 220, and the platform 244. The controller 304 may send control signals to the one or more actuators (not shown) to control various movements of at least one of the first, second, third, and fourth fixture structures 214, 216, 218, and 220, the platform 244, or both of the first, second, third, and fourth fixture structures 214, 216, 218, and 220, and the platform 244.

[0076] Although in Figure 5A In the embodiment of the system 300 shown, there are three one or more sensors 302a, 302b, 302c, but in some alternative embodiments, there may be more than three one or more sensors. For example, in alternative embodiments of the system 300, there may be five sensors, there may be six sensors, or there may be some greater number of sensors. For example, in at least one alternative embodiment, there may be one sensor monitoring the membrane 114 for monitoring the onset of expansion of damage or defects in the membrane 114, and there may be four other sensors for monitoring each of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220.

[0077] Figure 5B 5B-5B is an enlarged and enhanced view of the first clamp structure 214, a corresponding pin 222 of the first pin group 222, and a first receiving opening 230 of the first receiving opening 230 in the first side portion 204 of the frame 202 of the protective film 200. Figure 5BAs shown, when the corresponding pin 222 is offset relative to the corresponding first receiving opening 230, at least one or both of the first fixture structure 214 and the platform 244 are moved so that the first center line 306 of the corresponding pin 222 is aligned with the second center line 308 of the corresponding first receiving opening 230. Once the first center line 306 and the second center line 308 are aligned with each other, then as shown in FIG. Figure 5B The corresponding pins 222 shown can be inserted into Figure 5B In the first receiving opening 230 shown.

[0078] Figure 6 The cycle flow chart 400 is intended for the pellicle 200 to be used in a semiconductor fabrication facility (FAB). The cycle flow chart 400 includes a first step 402, a second step 404, a third step 406, a fourth step 408, and a fifth step 410, which are performed successively and cyclically, and the pellicle 200 undergoes multiple cycles before its service life ends.

[0079] In a first step 402, the pellicle 200 is mounted, adhered, bonded or coupled to the photomask 102 via a first adhesive 238, which is disclosed herein. Figure 3B After the pellicle 200 is coupled to the photomask via the first adhesive 238, the photomask 102 may be mounted, adhered, bonded, or coupled to one or more surfaces 250 of a platform 244, which may be within a patterning tool (e.g., an EUV patterning tool or some other type of optical patterning tool that may use some other wavelength of light).

[0080] After the first step 402 in which the pellicle 200 is coupled to the photomask 102 and the photomask 102 is coupled to the platform 244 within the patterning tool, a second step 404 is performed in which a light source emits light at the pellicle 114 and the photomask 102 to pattern a target that overlaps and is aligned with the pellicle 114 and the photomask 102. For example, the target may be a semiconductor substrate, a semiconductor wafer, a semiconductor layer, or some other similar or like type of semiconductor structure or material.

[0081] After the second step 404 of the patterning process is completed, in the third step 406, the first lead group 222, the second lead group 224, the third lead group 226 and the fourth lead group 228 are used to form the Figure 3A and Figure 3B The pellicle 200 is shown removed from the photomask 102. The details of removing the pellicle 200 in the third step 406 will be described below with respect to Figure 7 and Figures 8A-8E Discuss in more detail.

[0082] After the third step 406 of removing the pellicle 200 from the photomask 102 , in a fourth step 408 , the pellicle 200 is inspected and cleaned so that contaminants that would block light from passing through the film 114 are removed from the film 114 .

[0083] After the fourth step 408 of cleaning the film 114 of the pellicle 200, in a fifth step 410, the film 114 of the pellicle 200 and the photomask are inspected for damage and defects to determine whether the pellicle 200 and the photomask can be reused in the patterning process to pattern a new target (e.g., a new semiconductor substrate, a new semiconductor wafer, a new semiconductor layer, or a new semiconductor structure or material) within the patterning tool.

[0084] After the fifth step 410 of inspecting the film 114 of the pellicle 200 and the photomask 102 , if both the pellicle 200 and the photomask 102 pass the inspection, the corresponding steps 402 , 404 , 406 , 408 , 41 of the loop flowchart 400 are executed again to reuse the pellicle 200 and the photomask 102 .

[0085] Figure 7 is a flowchart with additional details regarding the third step 406 in the loop flowchart 400. The flowchart includes respective steps 406a, 406b, 406c, 406d.

[0086] In a first step 406a, the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 of the stripping tool or the pellicle removal tool are moved into position around the platform 244. The first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 can be positioned around the platform 244 so that each of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 is aligned with a corresponding clamp structure opening 248 in the platform 244 (see the disclosure of the present invention). Figure 3D For example, in a first step 406a, the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 may be moved in a first direction 500 (see Fig.8D ) is moved from a lower position to a higher position. Once the first step 406a is performed, the first fixture structure 214, the second fixture structure 216, the third fixture structure 218 and the fourth fixture structure 220 are positioned as follows. Fig. 8A and Fig.8D As shown in the position, the first clamp structure 214 , the second clamp structure 216 , the third clamp structure 218 , and the fourth clamp structure 220 surround the pellicle 200 and are level with the pellicle 200 .

[0087] After the first step 406a in which the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 are positioned around the protective film 200 and raised to be flush with the protective film 200, at least one of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220, the platform 244, or both the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 and the platform 244 are moved so that the corresponding receiving openings in the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 are aligned with the corresponding pins of the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228 of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220. Fig. 8A As shown, the platform 244 is moved along the second direction 502 so that the platform 244 is based on Fig. 8A The orientation shown diagonally moves the photomask 102 and the pellicle. Fig. 8A 224, the third pin group 226, and the fourth pin group 228. Although the platform 244 is shown as FIG. 224, the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 may be moved individually in some alternative embodiments to align the corresponding receiving openings in the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 with the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228. Fig. 8A As shown, the platform 244 is movable, but in some alternative embodiments, the first clamp structure 214, the second clamp structure 216, the third clamp structure 218 and the fourth clamp structure 220 are movable and adjustable individually or together to align the corresponding receiving openings in the first side portion 204, the second side portion 206, the third side portion 208 and the fourth side portion 210 with the first pin group 222, the second pin group 224, the third pin group 226 and the fourth pin group 228 of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218 and the fourth clamp structure 220.

[0088] After the second step 406b of aligning the corresponding receiving openings in the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 with the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228, in the third step 406c, the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 are moved inwardly toward the frame 202 of the protective film 200 to insert the first pin group 222, the second pin group 224, the third pin group 226, and the fourth pin group 228 of the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 into the corresponding receiving openings in the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 of the frame 202. This inward movement of inserting the corresponding pins into the receiving openings is performed by Figure 8B The first lead group 222, the second lead group 224, the third lead group 226 and the fourth lead group 228 are inserted into the corresponding receiving openings of the first side portion 204, the second side portion 206, the third side portion 208 and the fourth side portion 210 respectively. Figure 8C and Fig. 8E It is easy to see.

[0089] After the third step 406c in which the first lead group 222, the second lead group 224, the third lead group 226, and the fourth lead group 228 have been inserted into the corresponding receiving openings of the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 of the frame 202 of the pellicle 200, in the fourth step 406d, the removal force 138 is applied to the frame 202 by moving the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 away from the photomask 102, which is based on the Fig. 8E The orientation shown is pointing in a downward direction. As the first clamp structure 214, the second clamp structure 216, the third clamp structure 218, and the fourth clamp structure 220 are removed from the photomask, the first lead group 222, the second lead group 224, the third lead group 226, and the fourth lead group 228 are pulled downward on the frame 202, causing the first adhesive 238 to be broken to remove the pellicle 200 from the photomask 102. After the pellicle 200 is removed from the photomask 102, the other steps of the loop flowchart 400 can be performed. When the loop flowchart 400 is performed over and over again, the process described with respect to the flowchart 406 can be performed over and over again.

[0090] Although not discussed in detail herein, the respective receiving openings of the first side portion 204, the second side portion 206, the third side portion 208, and the fourth side portion 210 of the frame 202 of the protective film 200 may be configured to allow venting of fluid between the film 114 and the photomask 102 during operation when a patterning process is performed on a semiconductor wafer, a semiconductor substrate, a semiconductor layer, or some other similar or like type of semiconductor material.

[0091] As will be apparent from the foregoing description herein, the present disclosure provides one or more embodiments of a pellicle stripping tool or pellicle removal tool that includes one or more clamp structures for applying a removal force to a pellicle frame of a pellicle to remove the pellicle from a photomask. When the force is applied to the pellicle frame by the one or more clamp structures, the force is applied and distributed on the pellicle frame in a balanced manner so that the force is evenly distributed on and along the pellicle frame. This even distribution of the removal force prevents or reduces the likelihood of damage to the pellicle or a film of the pellicle when it is removed from the photomask. For example, this even distribution of the removal force to the pellicle frame can prevent or reduce the likelihood of wrinkling, cracking, cracking, or other similar defects in the film of the pellicle, thereby reducing manufacturing costs, reducing scrap costs, and preventing or reducing contamination or damage to a photomask previously coupled to the pellicle.

[0092] Preventing or reducing the likelihood of damage or defects propagating within the membrane of the pellicle reduces manufacturing costs, scrap costs, and increases the useful life of the pellicle. Extending the life of the pellicle reduces replacement costs because the pellicle can be used multiple times before the pellicle needs to be replaced due to damage or defects propagating within the membrane of the pellicle.

[0093] At least one embodiment of the protective film frame disclosed herein can be summarized as including: a frame, including: a first surface; a second surface relative to the first surface; a first side portion; a second side portion relative to the first side portion; a third side portion transverse to the first side portion and the second side portion, the third side portion extending from the first side portion to the second side portion and coupled to the first side portion and the second side portion; a fourth side portion transverse to the first side portion and the second side portion, the fourth side portion extending from the first side portion to the second side portion and coupled to the first side portion and the second side portion, and the fourth side portion relative to the third side portion; an opening defined by the first side portion, the second side portion, the third side portion and the fourth side portion; a first set of holes in the first side portion; a second set of holes in the second side portion; a third set of holes in the third side portion; and a fourth set of holes in the fourth side portion.

[0094] In some other embodiments, in the pellicle frame, the first group of holes, the second group of holes, the third group of holes, and the fourth group of holes are configured to receive corresponding pin groups of one or more corresponding fixtures in operation.

[0095] In some other embodiments, in the pellicle frame, the first group of holes includes a plurality of holes, the second group of holes includes a plurality of holes, the third group of holes includes a plurality of holes, and the fourth group of holes includes a plurality of holes.

[0096] In some other embodiments, in the protective film frame, the number of the plurality of holes is greater than or equal to 2.

[0097] In some other embodiments, in the protective film frame, the number of the plurality of holes is greater than 2.

[0098] In some other embodiments, in the pellicle frame, corresponding adjacent holes of the first group of holes, the second group of holes, the third group of holes, and the fourth group of holes are equidistantly spaced from each other.

[0099] In some other embodiments, in the pellicle frame, corresponding adjacent holes of the first group of holes, the second group of holes, the third group of holes, and the fourth group of holes are equidistantly spaced from each other.

[0100] In some other embodiments, in the pellicle frame, the corresponding adjacent holes of the first group of holes, the second group of holes, the third group of holes and the fourth group of holes are spaced apart from each other to avoid the film connected to the frame from breaking when the pellicle frame is removed from the corresponding photomask by a pellicle stripping tool.

[0101] In some other embodiments, in the pellicle frame, the lengths by which the corresponding adjacent holes of the first group of holes, the second group of holes, the third group of holes, and the fourth group of holes are spaced apart from each other are defined by the following formula:

[0102] L = 6.498 * sqrt (1 / μ)

[0103] Where L is the length and μ is the adhesion of the adhesive coupling the frame of the pellicle frame to the corresponding photomask.

[0104] At least one embodiment of the method disclosed herein can be summarized as comprising: monitoring a first fixture structure having a first pin group, a second fixture structure having a second pin group, a third fixture structure having a third pin group, and a fourth fixture structure having a fourth pin group having a plurality of image sensors; aligning the first pin group of the first fixture structure with a first set of holes in a first side portion of a pellicle frame of a pellicle; aligning the second pin group of the second fixture structure with a second set of holes in a second side portion of the pellicle frame relative to the first side portion; aligning the third pin group of the third fixture structure with a third set of holes in a third side portion of the pellicle frame transverse to the first side portion and the second side portion; aligning the fourth pin group of the fourth fixture structure with the pellicle frame The frame is configured to align a fourth group of holes in a fourth side portion relative to the third side portion and transverse to the first side portion and the second side portion, the fourth side portion being opposite to the third side portion and transverse to the first and second side portions; inserting the first pin group, the second pin group, the third pin group and the fourth pin group into the first group of holes, the second group of holes, the third group of holes and the fourth group of holes, respectively; and by moving the first clamp structure, the second clamp structure, the third clamp structure and the fourth clamp structure away from the photomask coupled to the pellicle frame while holding the photomask in a fixed position and applying force to the pellicle frame through the first pin group, the second pin group, the third pin group and the fourth pin group in the first group of holes, the second group of holes, the third group of holes and the fourth group of holes, respectively.

[0105] In some other embodiments, in the method, applying the force to the pellicle frame further comprises overcoming an adhesive force of an adhesive coupling the pellicle frame to the photomask.

[0106] In some other embodiments, the method further includes: cleaning a film of the pellicle of the pellicle frame coupled to the pellicle after the pellicle frame is removed from the photomask.

[0107] In some other embodiments, the method further includes: coupling the pellicle frame to at least one of subsequent components of the photomask or another photomask after cleaning the film of the pellicle.

[0108] In some other embodiments, in the method described, inserting the first pin group, the second pin group, the third pin group and the fourth pin group into the first group of holes, the second group of holes, the third group of holes and the fourth group of holes, respectively, occurs simultaneously after aligning the first pin group, the second pin group, the third pin group and the fourth pin group with the first group of holes, the second group of holes, the third group of holes and the fourth group of holes, respectively.

[0109] In some other embodiments, in the method described, aligning the first pin group, the second pin group, the third pin group and the fourth pin with the first group of holes, the second group of holes, the third group of holes and the fourth group of holes also includes: moving the platform structure supporting the photomask.

[0110] In some other embodiments, in the method described, aligning the first pin group, the second pin group, the third pin group and the fourth pin group with the first group of holes, the second group of holes, the third group of holes and the fourth group of holes also includes: moving at least one of the first fixture structure, the second fixture structure, the third fixture structure and the fourth fixture structure.

[0111] At least one embodiment of a pellicle stripping tool can be summarized as including: a pellicle clamp structure, the pellicle clamp structure is configured to clamp on a pellicle frame coupled to a corresponding pellicle of a photomask during operation, the pellicle clamp structure comprising: a main body portion; and one or more tapered pins protruding from the main body portion, the one or more tapered pins comprising: a first end; a second end relative to the first end; and at least one inclined side wall transverse to the first end and the second end, the at least one inclined side wall extending from the first end to the second end.

[0112] In some other embodiments, in the protective film stripping tool, the protective film clamp structure is the first protective film clamp structure of multiple protective film clamp structures, and the multiple protective film clamp structures also include: a second protective film clamp structure, relative to the first protective film clamp structure; a third protective film clamp structure, transverse to the first protective film clamp structure and the second protective film clamp structure; and a fourth protective film clamp structure, relative to the third protective film clamp structure and transverse to the first protective film clamp structure and the second protective film clamp structure.

[0113] In some other embodiments, in the protective film stripping tool, the first protective film clamp structure, the second protective film clamp structure, the third protective film clamp structure and the fourth protective film clamp structure are capable of moving inward and outward directions relative to a central area defined by the first protective film clamp structure, the second protective film clamp structure, the third protective film clamp structure and the fourth protective film clamp structure.

[0114] In some other embodiments, in the protective film stripping tool, the first end has a first end surface with a first surface area; and the second end has a second end surface with a second surface area, and the second surface area is larger than the first surface area.

[0115] The foregoing summarizes the features of several embodiments so that those skilled in the art can better understand the various aspects of the present disclosure. Those skilled in the art will appreciate that they can readily use the present disclosure as a basis for designing or modifying other processes and structures for performing the same purposes and / or achieving the same advantages of the embodiments introduced herein. Those skilled in the art will also recognize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and those skilled in the art may make various changes, substitutions, and modifications to the present disclosure without departing from the spirit and scope of the present disclosure.

Claims

1. A film protection frame, characterized in that: include: Framework, including: a first surface; a second surface, opposite to the first surface; a first side portion; a second side portion, opposite to the first side portion; a third side portion, transverse to the first side portion and the second side portion, the third side portion extending from the first side portion to the second side portion and coupled to the first side portion and the second side portion; a fourth side portion, transverse to the first side portion and the second side portion, the fourth side portion extending from the first side portion to the second side portion and coupled to the first side portion and the second side portion, and the fourth side portion is opposite to the third side portion; an opening defined by the first side portion, the second side portion, the third side portion, and the fourth side portion; a first set of holes in said first side portion; a second set of holes in said second side portion; a third set of holes in said third side portion; and A fourth set of holes is provided in the fourth side portion.

2. The film frame according to claim 1, characterized in that: The first set of holes, the second set of holes, the third set of holes, and the fourth set of holes are configured to receive corresponding sets of pins of one or more corresponding fixtures in operation.

3. The film frame according to claim 1, characterized in that: The first group of holes includes a plurality of holes, the second group of holes includes a plurality of holes, the third group of holes includes a plurality of holes, and the fourth group of holes includes a plurality of holes.

4. The film frame according to claim 3, characterized in that: The number of the plurality of holes is greater than or equal to two.

5. The film frame according to claim 1, characterized in that: Respective adjacent holes of the first, second, third and fourth groups of holes are equally spaced from one another to avoid breaking of a film connected to the frame when the pellicle frame is removed from the corresponding photomask by a pellicle stripping tool.

6. The film frame according to claim 5, characterized in that: The lengths by which the corresponding adjacent holes of the first group of holes, the second group of holes, the third group of holes, and the fourth group of holes are spaced apart from each other are defined by the following formula: L = 6.498 * sqrt (1 / μ) Where L is the length and μ is the adhesion of the adhesive coupling the frame of the pellicle frame to the corresponding photomask.

7. A tool for peeling off a protective film, characterized in that: include: A pellicle clamp structure configured to clamp onto a pellicle frame coupled to a corresponding pellicle of a photomask during operation, the pellicle clamp structure comprising: the main body; and One or more tapered pins protruding from the body portion, the one or more tapered pins comprising: First end; a second end, opposite to the first end; and At least one inclined side wall is transverse to the first end and the second end, and the at least one inclined side wall extends from the first end to the second end.

8. The film stripping tool according to claim 7, characterized in that: The pellicle clamp structure is a first pellicle clamp structure of a plurality of pellicle clamp structures, and the plurality of pellicle clamp structures further include: A second protective film clamp structure, relative to the first protective film clamp structure; a third pellicle clamp structure, transverse to the first pellicle clamp structure and the second pellicle clamp structure; and The fourth pellicle clamp structure is opposite to the third pellicle clamp structure and transverse to the first pellicle clamp structure and the second pellicle clamp structure.

9. The film stripping tool according to claim 8, characterized in that: The first protective film clamp structure, the second protective film clamp structure, the third protective film clamp structure and the fourth protective film clamp structure are capable of moving inward and outward directions relative to a central area defined by the first protective film clamp structure, the second protective film clamp structure, the third protective film clamp structure and the fourth protective film clamp structure.

10. The film stripping tool according to claim 7, characterized in that: The first end has a first end surface having a first surface area; and The second end has a second end surface having a second surface area, and the second surface area is greater than the first surface area.

Images