Omnibearing magnetic filtration composite magnetic control coating equipment for preparing composite carbon film

Abstract

The utility model discloses omni-directional magnetic filtration composite magnetic control coating equipment for preparing a composite carbon film. The omni-directional magnetic filtration composite magnetic control coating equipment comprises an equipment shell, a vacuumizing device, an argon injection device and a dynamic magnetic field scanning device, the vacuumizing device and the argon injection device are fixedly mounted on one side of the equipment shell; a base material fixing frame and a plurality of sputtering systems are mounted on the equipment shell; a base material is fixedly mounted on the base material fixing frame; the plurality of sputtering systems respectively correspond to the base material; a vacuum chamber is arranged in the equipment shell; the vacuum chamber is communicated with the plurality of sputtering systems, the base material, the vacuumizing device and the argon injection device; a dynamic magnetic field scanning device is mounted at the bottom in the vacuum chamber; according to the utility model, the sputtering systems are arranged in the plurality of horizontal directions of the equipment shell, and different target materials are arranged in the sputtering systems in different horizontal directions, so that the coating process of a base material can be completed in sequence, and the preparation of a composite carbon film is completed.

Description

Technical Field

[0001] The utility model relates to the technical field of coating preparation, in particular to an all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation. Background Art

[0002] In modern industry, coating technology is widely used in fields such as tools, mechanical parts, electronic components, and aerospace to improve the hardness, wear resistance, corrosion resistance, and other properties of materials. Among them, the demand for high-strength and high-toughness coatings is increasing day by day, especially for composite coatings, which can maintain good toughness while providing high hardness, thus performing excellently under various extreme working conditions.

[0003] At present, commonly used high-strength coating materials include diamond-like carbon (ta-C) and graphite-like carbon (GLC), etc. These materials have excellent hardness and toughness respectively, but it is often difficult to balance hardness and toughness when used alone. For example, although the ta-C coating has high hardness, it is prone to brittle fracture; while the GLC coating has good toughness but relatively low hardness. Therefore, how to compound multiple coating materials to form a composite coating with both high hardness and high toughness has become a research hotspot. In the existing coating preparation technologies, methods such as magnetron sputtering and pulsed arc discharge are often used.

[0004] The prior art CN118360578A discloses a magnetron sputtering vacuum coating equipment, which includes an equipment body, a carrier table, a vacuum pumping device, and a rotating disk; there is an operation window between the coating generation chamber and the turntable installation cavity of the equipment body; the carrier table can be placed directly below the operation window in the coating generation chamber; the ion source and target of the rotating disk rotate with the rotating disk and alternately move to the operation window to enable the workpiece substrate to be cleaned and coated successively in an argon environment; although this solution can complete the coating of the substrate, there are still certain deficiencies; first, this solution can only perform single-layer coating on the substrate; second, there is only one target in this solution, and the area of the sputtering source is limited by the size of the target, so it cannot coat a large-area substrate and affects the coating uniformity; finally, there is a lack of a filtering device, and target particles will be generated during the coating process of the target on the substrate, and the attachment of the target particles to the substrate surface will affect the coating effect and cause uneven coating.

[0005] Therefore, it is necessary to design an all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation to solve the above problems. Summary of the Utility Model

[0006] The utility model overcomes the deficiencies of the prior art and provides an all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation.

[0007] To achieve the above object, the technical solution adopted by the present utility model is as follows: An all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation, comprising: an equipment housing, a vacuum pumping device, an argon injection device, a dynamic magnetic field scanning device, and a control device; the vacuum pumping device and the argon injection device are fixedly installed on one side of the equipment housing;

[0008] A substrate fixing frame and a plurality of sputtering systems are installed on the equipment housing; a substrate is fixedly installed on the substrate fixing frame; the plurality of sputtering systems correspond to the substrate respectively;

[0009] A vacuum chamber is provided inside the equipment housing; the vacuum chamber is communicated with the plurality of sputtering systems, the substrate, the vacuum pumping device, and the argon injection device; a dynamic magnetic field scanning device is installed at the bottom inside the vacuum chamber;

[0010] The control device is used to control the operation of the entire all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation except itself.

[0011] In a preferred embodiment of the present utility model, the plurality of sputtering systems correspond to the substrate in at least two directions in the horizontal direction.

[0012] In a preferred embodiment of the present utility model, there are at least two sputtering systems in the same horizontal direction in the vertical direction.

[0013] In a preferred embodiment of the present utility model, the sputtering system comprises: a glow discharge chamber, a target, and a filter plate; the glow discharge chamber is communicated with the vacuum chamber; the target and the filter plate are fixedly installed in the glow discharge chamber; the filter plate is located on the side of the target closer to the substrate and is used to filter floating target particles.

[0014] In a preferred embodiment of the present utility model, the target materials on the sputtering systems in different horizontal directions are different.

[0015] In a preferred embodiment of the present utility model, a heating device is fixedly installed in the vacuum chamber of the equipment housing, and the heating device is used to heat the substrate.

[0016] The present utility model solves the defects existing in the background technology, and the present utility model has the following beneficial effects:

[0017] (1) The present utility model provides an all-round magnetic filtration composite magnetron coating equipment for composite carbon film preparation. By installing sputtering systems in multiple horizontal directions of the equipment housing and using different targets in the sputtering systems in different horizontal directions, the coating process of the substrate can be completed in sequence, thereby completing the preparation of the composite carbon film.

[0018] (2) The utility model installs multiple sputtering systems in the vertical direction of each horizontal direction, breaking through the limitation that the size of the substrate is restricted by the size of the target. By using different numbers of sputtering systems in the vertical direction, coating of substrates with different sizes can be completed.

[0019] (3) The utility model installs a heating device in the vacuum chamber of the equipment housing, which can heat the substrate, effectively improving the adhesion and quality of the thin film.

[0020] (4) The utility model installs a filter plate in the sputtering system, which can effectively filter the target ions and improve the uniformity of the coating film layer. Description of the Drawings

[0021] In order to more clearly illustrate the technical solutions in the embodiments of the present utility model or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings described below are only some embodiments recorded in the present utility model. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings;

[0022] Figure 1 It is a schematic diagram of the overall assembly structure of the present utility model;

[0023] Figure 2 It is a schematic diagram of the assembly structure of the equipment housing, sputtering system and heating device of the present utility model;

[0024] Figure 3 It is a schematic diagram of the assembly structure of the equipment housing, sputtering system and substrate fixing bracket of the present utility model;

[0025] Figure 4 It is a schematic cross-sectional structure diagram of the sputtering system and the filter plate of the present utility model.

[0026] In the figure: 1. Equipment housing; 2. Substrate fixing bracket; 3. Sputtering system; 4. Filter plate; 5. Heating device. Detailed Embodiments

[0027] The following will clearly and completely describe the technical solutions in the embodiments of the present utility model with reference to the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, rather than all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the protection scope of the present utility model.

[0028] In the following description, many specific details are set forth in order to provide a thorough understanding of the present utility model. However, the present utility model may also be implemented in other ways different from those described herein. Therefore, the scope of protection of the present utility model is not limited by the specific embodiments disclosed below.

[0029] As Figures 1-4 shown, a full - range magnetic - filtering composite magnetron coating equipment for composite carbon film preparation includes: an equipment housing 1, a vacuum - pumping device, an argon - injection device, and a control device; the vacuum - pumping device and the argon - injection device (not shown in the figure) are fixedly installed on one side of the equipment housing 1;

[0030] A substrate fixing frame 2 and a plurality of sputtering systems 3 are installed on the equipment housing 1; a substrate is fixedly installed on the substrate fixing frame 2; the plurality of sputtering systems 3 correspond to the substrate respectively;

[0031] A vacuum chamber is provided inside the equipment housing 1; the vacuum chamber is communicated with the plurality of sputtering systems 3, the substrate, the vacuum - pumping device, and the argon - injection device; a dynamic magnetic - field scanning device is installed at the bottom inside the vacuum chamber;

[0032] The control device is used to control the operation of the entire full - range magnetic - filtering composite magnetron coating equipment for composite carbon film preparation except itself.

[0033] Further, the sputtering system 3 includes: a glow - discharge chamber, a target, and a filter plate 4; the target and the filter plate 4 are fixedly installed inside the glow - discharge chamber; the glow - discharge chamber is communicated with the vacuum chamber; the filter plate 4 is located on the side of the target closer to the substrate; as a specific implementation manner of this example, the filter plate 4 is provided with evenly distributed filter holes;

[0034] As a specific implementation manner of this example, the dynamic magnetic - field scanning device (not shown in the figure) consists of a magnetic - field generator and a magnetic - field control system. The magnetic - field intensity and direction generated by the magnetic - field generator can be adjusted as needed. The magnetic - field control system is responsible for monitoring and controlling the output of the magnetic - field generator to ensure that the magnetic field can change according to the preset parameters; by adjusting the dynamic magnetic - field scanning device and the sputtering system 3, the target ions can move along a predetermined arc - shaped orbit to complete the coating of the substrate.

[0035] When the target sputters and coats the substrate, target particles will be generated. When the target particles adhere to the surface of the substrate, they will affect the coating effect of the substrate and cause uneven coating; the filter holes on the filter plate 4 can block the diffusion of target particles into the vacuum chamber, and the filter plate 4 intercepts the target particles to improve the uniformity of the film layer.

[0036] As Figures 1-2As shown, as a specific implementation manner of this embodiment, a plurality of the sputtering systems 3 correspond to the substrate in three directions in the horizontal direction, and at least three sputtering systems 3 are installed on the equipment housing 1 in the vertical directions of the three horizontal directions; the target materials of the sputtering systems 3 in the three horizontal directions are different, and the target materials in the sputtering systems 3 in the same vertical direction are the same; by arranging a plurality of sputtering systems 3 in the vertical direction, coating of substrates of different sizes can be completed.

[0037] When preparing a composite carbon film, the targets of the three materials are respectively placed into the sputtering systems 3 located in the three horizontal directions; at the same time, according to the size of the substrate, the number of sputtering systems 3 used in the vertical direction is selected; when the substrate is small, coating of the substrate can be completed by using one sputtering system 3 in the vertical direction, and when the substrate is large, a plurality of sputtering systems 3 are used in the vertical direction to coat the substrate simultaneously to ensure uniform coating of the substrate; the sputtering systems 3 are adjusted in sequence so that the targets on each sputtering system 3 can sputter and coat the substrate, and then the sputtering systems 3 in the three horizontal directions sputter and coat the substrate in sequence to complete the preparation of the composite carbon film.

[0038] Specifically, as Figure 2 shown, a heating device 5 is fixedly installed in the vacuum chamber of the equipment housing 1; as a specific implementation manner of this embodiment, the heating device 5 is a heating wire; by energizing the heating wire to make it generate heat to heat the substrate, the adhesion and quality of the film can be effectively improved.

[0039] The control device is electrically connected to the sputtering system 3, the vacuum pumping device, the argon injection device, the dynamic magnetic field scanning device, and the heating device 5.

[0040] Working principle:

[0041] In the first step, the operator fixedly installs the substrate on the substrate fixing rack 2, and then fixedly installs various targets in the designated sputtering systems 3 according to needs;

[0042] In the second step, the vacuum pumping device evacuates the vacuum chamber, and then the heating device heats the substrate;

[0043] In the third step, after heating is completed, the argon injection device injects argon into the vacuum chamber, adjusts the sputtering system 3 and the dynamic magnetic field scanning device, and a plurality of sputtering systems 3 sputter and coat the substrate in sequence to complete the preparation of the composite carbon film.

[0044] Based on the inspiration of the ideal embodiments of the present utility model, through the above description, relevant personnel can completely make various changes and modifications without departing from the technical idea of this utility model. The technical scope of this utility model is not limited to the content in the specification, and the technical scope must be determined according to the scope of the claims.

Claims

1. An all-round magnetic filtration composite magnetron coating equipment for preparing composite carbon film, characterized in that: include: An equipment housing (1), a vacuum pumping device, an argon gas injection device, a dynamic magnetic field scanning device and a control device; the vacuum pumping device and the argon gas injection device are fixedly mounted on one side of the equipment housing (1); A substrate fixing frame (2) and a plurality of sputtering systems (3) are mounted on the device housing (1); a substrate is fixedly mounted on the substrate fixing frame (2); and the plurality of sputtering systems (3) correspond to the substrates respectively; A vacuum chamber is provided in the device housing (1); the vacuum chamber is connected to a plurality of sputtering systems (3), a substrate, a vacuum pumping device and an argon gas injection device; a dynamic magnetic field scanning device is installed at the bottom of the vacuum chamber; The control device is used to control the operation of the entire omnidirectional magnetic filtration composite magnetron coating equipment used for preparing composite carbon films except itself.

2. The omnidirectional magnetic filtration composite magnetron coating equipment for preparing composite carbon film according to claim 1, characterized in that: The plurality of sputtering systems (3) correspond to the substrate in at least two directions in the horizontal direction.

3. The omnidirectional magnetic filtration composite magnetron coating equipment for preparing composite carbon film according to claim 1, characterized in that: There are at least two sputtering systems (3) located in the same direction in the horizontal direction in the vertical direction.

4. The omnidirectional magnetic filtration composite magnetron coating equipment for preparing composite carbon film according to claim 2, characterized in that: The sputtering system (3) comprises: a glow discharge chamber, a target material and a filter plate (4); the glow discharge chamber is connected to a vacuum chamber; the target material and the filter plate (4) are fixedly installed in the glow discharge chamber; the filter plate (4) is located on a side of the target material closer to a substrate and is used to filter floating target material particles.

5. The omnidirectional magnetic filtration composite magnetron coating equipment for preparing composite carbon film according to claim 2, characterized in that: The target materials on the sputtering systems (3) located in different directions in the horizontal direction are different.

6. The omnidirectional magnetic filtration composite magnetron coating equipment for preparing composite carbon film according to claim 1, characterized in that: A heating device (5) is fixedly installed in the vacuum chamber of the device housing (1), and the heating device (5) is used to heat the substrate.

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