Beam measurement device and equipment

By installing screening slits in the electrode assembly of the beam measurement device and forming electric fields with different electric potentials, the problem of low energy ions and electrons in the beam flow cannot be removed, and the accuracy of measurement is improved.

CN222926871UActive Publication Date: 2025-05-30浙江求是创芯半导体设备有限公司
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Patent Information

Application Number
CN202421348145.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-06-13
Publication Date
2025-05-30
Estimated Expiration
2034-06-13

AI Technical Summary

Technical Problem

The existing beam current measurement devices cannot effectively remove low-energy ions and electrons when the beam current enters, resulting in a decrease in the accuracy of the measurement results.

Method used

A beam measuring device is designed, including a measuring shell, a beam cup and an electrode assembly. A screening slit is provided in the electrode assembly, and electric fields with different potentials are formed in the screening slit, which can eliminate low-energy ions and electrons in the beam current.

Benefits of technology

The removal of low-energy ions and electrons in the beam through the electric field of the electrode assembly significantly improves the accuracy of beam measurement and reduces the interference of low-energy ions and electrons on the measurement results.

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Abstract

The utility model belongs to the technical field of semiconductors, and discloses a beam measuring device and equipment. The beam measurement device comprises a measurement shell, a beam cup and an electrode assembly. A closed mounting cavity is formed in the measuring shell, and a conduction slit communicated with the mounting cavity is formed in the side surface of the measuring shell; the beam cup is arranged in the mounting cavity, and the side face of the beam cup is provided with a collecting sinking groove for beam injection; the electrode assembly is provided with a screening slit, one end of the screening slit is communicated with the conduction slit, the other end of the screening slit is communicated with the collection sinking groove, and electric fields with different potentials are formed in the screening slit to eliminate low-energy ions and electrons in the beam current. When the beam current measuring device is used, the beam current passes through the electric fields with different potentials formed by the electrode assembly, so that electrons in the beam current can be eliminated, low-energy ions in the beam current can also be eliminated, the possibility of interference of the low-energy ions and the electrons on the test result of the beam current can be effectively reduced, and the test accuracy of the beam current measuring device is improved. And the measurement accuracy is effectively improved.
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Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a beam current measuring device and equipment. Background Art

[0002] A beam current measuring device is an important measuring element in an ion implantation system. Its measuring principle is to use a hollow conductor to capture charged particles in a vacuum and determine the number of incident electrons or ions by monitoring the current on a grounded sensor.

[0003] In the prior art, the beam current measuring device includes a beam cup. A suppression electrode is installed at the front end of the beam cup, and the suppression electrode has a suppression slit communicating with the beam collection cavity of the beam cup. When the beam current passes through the suppression slit, the electric field generated by the suppression electrode in the suppression slit is used to exclude electrons in the beam current.

[0004] However, it is difficult to achieve absolute vacuum in the transmission environment of the beam current. Therefore, the beam current will inevitably collide with gas molecules during transmission to generate low-energy ions and electrons. The suppression electrode can only exclude the influence of electrons, and the low-energy ions will still enter the beam cup along with the beam current, resulting in poor accuracy of the measurement result. Summary of the Utility Model

[0005] The purpose of the utility model is to provide a beam current measuring device and equipment, which solves the problem that in the prior art, low-energy ions and electrons cannot be removed together when the beam current enters the beam cup, resulting in interference with the test result of the beam current and reduction of the test accuracy.

[0006] To achieve the above object, the utility model adopts the following technical solutions:

[0007] A beam current measuring device, comprising:

[0008] A measuring shell, which has a closed installation cavity inside, and a conduction slit is arranged on the side surface of the measuring shell;

[0009] A beam cup, which is arranged in the installation cavity, and a collection sink for injecting the beam current is arranged on the side surface of the beam cup; and

[0010] An electrode assembly, which has a screening slit. One side of the screening slit communicates with the conduction slit, and the other side communicates with the collection sink. An electric field with different electric potentials is formed in the screening slit to exclude low-energy ions and electrons in the beam current.

[0011] Optionally, the electrode assembly includes:

[0012] A first electrode plate, which is connected to the positive pole of a power supply, and a first slit is arranged on the first electrode plate;

[0013] The second electrode plate is electrically connected to the first electrode plate and the negative electrode of the power supply so that the electrode assembly as a whole forms a positive electrode and a negative electrode. The second electrode plate is provided with a second slit; the first slit, the second slit, and the gap between the first electrode plate and the second electrode plate form the screening slit;

[0014] Wherein, the voltage difference between the positive electrode and the negative electrode is greater than or equal to 25V.

[0015] Optionally, the electrode assembly is in a strip shape, with one side along the length direction of the electrode assembly being the positive electrode and the other side being the negative electrode.

[0016] Optionally, the beam current measuring device further includes:

[0017] A magnet assembly, the beam cup is embedded in the magnet assembly, and the magnet assembly can generate a magnetic field to suppress the electrons generated by the beam current in the beam cup.

[0018] Optionally, the magnet assembly includes:

[0019] A mounting shell, the mounting shell has a mounting groove, and the beam cup is embedded in the mounting groove; and

[0020] Magnetic blocks, fixedly arranged in the mounting groove for generating a magnetic field.

[0021] Optionally, the magnet assembly further includes:

[0022] A protective shell, arranged between the magnetic blocks and the beam cup.

[0023] Optionally, magnetic blocks are arranged on both opposite sides of the beam cup.

[0024] Optionally, the electrode assembly is detachably connected to the beam cup.

[0025] Optionally, the beam current measuring device further includes:

[0026] A gasket, made of heat-insulating and insulating material and arranged between the magnet assembly and the measuring shell; and / or

[0027] A yoke plate, arranged around the inner side of the measuring shell; and / or

[0028] A base, one side of the base is fixedly connected to the measuring shell, the other side of the base is fixedly connected to a coil housing, and the base has a cooling channel for a coolant flow channel.

[0029] In a second aspect, the present application provides a beam current measuring device, which includes:

[0030] The beam current measuring device according to any one of the first aspect; and

[0031] A sensor, connected to the beam cup of the beam measurement device.

[0032] Advantages of the utility model:

[0033] By arranging the electrode assembly to form an electric field in the screening channel, when the beam passes through the conduction slit and enters the screening slit, the electrons contained in the beam will be excluded under the action of the electric field, so that the electrons will not enter the beam cup along with the beam. As the beam gradually passes through the screening slit, the electric field with different electric potentials formed in the screening slit can also exclude low-energy ions. In this way, when the beam measurement device is in use, by passing the beam through the electric field with different electric potentials formed by the electrode assembly, not only can the electrons in the beam be excluded, but also the low-energy ions in the beam can be excluded, thereby effectively reducing the possibility of interference of low-energy ions and electrons on the test results of the beam, and effectively improving the measurement accuracy. Description of the drawings

[0034] Figure 1 is a schematic structural diagram of the beam measurement device in the embodiment of the utility model;

[0035] Figure 2 is a structural sectional view of the beam measurement device in the first perspective in the embodiment of the utility model;

[0036] Figure 3 is a structural sectional view of the beam measurement device in the second perspective in the embodiment of the utility model;

[0037] Figure 4 is a schematic internal structure diagram of the beam measurement device in the embodiment of the utility model;

[0038] Figure 5 is a schematic structural diagram of the beam cup of the beam measurement device in the embodiment of the utility model;

[0039] Figure 6 is a schematic structural diagram of the electrode assembly of the beam measurement device in the embodiment of the utility model;

[0040] Figure 7 is a schematic structural diagram of the magnet assembly of the beam measurement device in the embodiment of the utility model;

[0041] Figure 8 is a schematic structural diagram of the protective shell of the magnet assembly of the beam measurement device in the embodiment of the utility model.

[0042] In the figure:

[0043] 1. Measuring shell; 11. Conductive slit; 12. Insulating block; 12a. Electrode insulating block; 12b. Beam cup insulating block; 13. Fixed block; 2. Beam cup; 3. Electrode assembly; 31. First electrode plate; 32. Positive electrode; 33. Negative electrode; 4. Magnet assembly; 41. Mounting shell; 42. Magnet block; 43. Mounting block; 44. Protective shell; 5. Gasket; 6. Yoke plate; 7. Base; 8. Coil housing. Detailed implementation manners

[0044] The present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the present utility model, rather than limiting the present utility model. In addition, it should be noted that for the sake of description, only parts related to the present utility model rather than all structures are shown in the drawings.

[0045] In the description of the present utility model, unless otherwise clearly defined and limited, the terms "connected", "connected", and "fixed" shall be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or integrated; it may be a mechanical connection or an electrical connection; it may be directly connected, or indirectly connected through an intermediate medium, and it may be the internal communication of two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

[0046] In the present utility model, unless otherwise clearly defined and limited, the first feature being "above" or "below" the second feature may include the direct contact between the first and second features, or may include the situation where the first and second features are not in direct contact but in contact through other features therebetween. Moreover, the first feature being "above", "above", and "on" the second feature includes that the first feature is directly above and obliquely above the second feature, or simply means that the horizontal height of the first feature is higher than that of the second feature. The first feature being "below", "below", and "under" the second feature includes that the first feature is directly below and obliquely below the second feature, or simply means that the horizontal height of the first feature is lower than that of the second feature.

[0047] In the description of this embodiment, the orientation or positional relationship terms such as "above", "below", "left", and "right" are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of description and simplifying the operation, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the present utility model. In addition, the terms "first" and "second" are only used for distinction in description and do not have special meanings.

[0048] The embodiments of the present application disclose a beam measurement device and equipment.

[0049] Refer toFigures 1 to 8 The beam measurement device includes a measurement housing 1, a beam cup 2, and an electrode assembly 3. The measurement housing 1 has a closed installation cavity, and a conduction slit 11 is formed on the side surface of the measurement housing 1; the beam cup 2 is arranged in the installation cavity, and a collection sink for injecting the beam is formed on the side surface of the beam cup 2; the electrode assembly 3 has a screening slit, one side of the screening slit is communicated with the conduction slit 11, and the other side is communicated with the collection sink, and an electric field with different electric potentials is formed in the screening slit to exclude low-energy ions and electrons in the beam.

[0050] Specifically, the measurement housing 1 is formed by enclosing a plurality of graphite plates, and its shape can be a polygon or other shapes such as a spherical shape. The thickness of the graphite plate can be between 1 mm and 10 mm. In this embodiment, the measurement housing 1 is formed by enclosing 6 graphite plates into a cuboid shape, and the conduction slit 11 is formed through the front side of the measurement housing 1. The beam cup 2 is made of a metal material and fixed in the installation cavity, and an electrical connection cable is arranged on the top wall of the beam cup 2 for measuring the charge amount.

[0051] A collection sink is formed on the front side of the beam cup 2 for collecting the beam, and the depth of the collection sink can be between 30 mm and 100 mm. The electrode assembly 3 is arranged between the collection sink and the conduction slit 11. A screening slit is formed through the electrode assembly 3 to form an electric field, and the electrons in the beam can be excluded according to the action of the electric field on the electrons. The electric potentials of the respective regions of the electric field formed in the screening channel are different, that is, some regions in the screening slit are at a high electric potential and some regions are at a low electric potential. The electric field with different electric potentials can effectively remove low-energy ions. The specific difference and distribution gradient between the high electric potential and the low electric potential can be determined according to the beam to be measured actually.

[0052] By arranging the electrode assembly 3 to form an electric field in the screening channel, when the beam passes through the conduction slit 11 and enters the screening slit, the electrons contained in the beam will be excluded under the action of the electric field, so that the electrons will not enter the beam cup 2 along with the beam. As the beam gradually passes through the screening slit, the electric field with different electric potentials formed in the screening slit can also exclude low-energy ions. In this way, when the beam measurement device is in use, by passing the beam through the electric field with different electric potentials formed by the electrode assembly 3, not only can the electrons in the beam be excluded, but also the low-energy ions in the beam can be excluded, thereby effectively reducing the possibility of the low-energy ions and electrons interfering with the test result of the beam and effectively improving the measurement accuracy.

[0053] Optionally, the electrode assembly 3 includes a first electrode plate 31 and a second electrode plate. The first electrode plate 31 is connected to the positive electrode of the power supply, and the first electrode plate 31 is provided with a first slit; the second electrode plate is electrically connected to the first electrode plate 31 and the negative electrode of the power supply so that the electrode assembly 3 as a whole forms a positive electrode 32 and a negative electrode 33, and the second electrode plate is provided with a second slit; the first slit, the second slit, and the gap between the first electrode plate 31 and the second electrode plate form a screening slit; wherein, the voltage difference between the positive electrode 32 and the negative electrode 33 is greater than or equal to 25V.

[0054] Specifically, both the first electrode plate 31 and the second electrode plate are made of graphite material, and their thickness can be between 2mm and 5mm. The two are connected by electrical cables, and both the first electrode plate 31 and the second electrode plate are electrically connected to the positive and negative electrodes of the power supply through electrical cables to form and maintain a potential, so that the electrode assembly 3 as a whole can form a positive electrode 32 and a negative electrode 33, wherein the voltage of the positive electrode 32 can be between 25V and 150V, and the voltage of the negative electrode 33 can be between -25V and -150V. It should be understood that the number of the first electrode plate 31 and the second electrode plate can be multiple. When multiple are provided, an electric field with a more complex gradient can be formed. In this embodiment, only one first electrode plate 31 and one second electrode plate are provided. Moreover, the voltage difference between the positive electrode 32 and the negative electrode 33 can also be other values, not limited to 25V in the above example, and can be specifically designed according to the beam current to be measured actually.

[0055] By providing the first electrode plate 31 and the second electrode plate, an electric field with a positive electrode 32 and a negative electrode 33 can be formed in the screening slit to smoothly exclude electrons in the beam, and an electric field with a voltage difference greater than 25V can exclude low-energy ions with an energy less than 25eV. In this way, low-energy ions and electrons in the beam can be smoothly excluded.

[0056] Optionally, the electrode assembly 3 is in a long strip shape, with the positive electrode 32 on one side along the length direction of the electrode assembly 3 and the negative electrode 33 on the other side.

[0057] Specifically, both the first electrode plate 31 and the second electrode plate are in a long strip shape, and a first slit and a second slit are provided at the middle position thereof. Connectors are respectively provided at the edge positions of the first electrode plate 31 and the second electrode plate to connect electrical cables, and the specific positions of the connectors can be set according to the direction of the actual electric field. In this embodiment, the electrode assembly 3 extends in the vertical direction, with the positive electrode 32 formed on the upper side of the electrode assembly 3 and the negative electrode 33 formed on the lower side of the electrode assembly 3.

[0058] Optionally, the electrode assembly 3 is detachably connected to the beam cup 2.

[0059] Specifically, an insertion structure can be provided between the electrode assembly 3 and the beam cup 2 to achieve detachable connection, and the entire beam cup 2 can also be disassembled, so that the entire device can be flexibly assembled and disassembled, effectively reducing the overall installation difficulty. At the same time, the detachable connection can also enable the various structures to form a more compact layout during installation and can be quickly disassembled during later maintenance to reduce the maintenance difficulty and maintenance cost.

[0060] Optionally, both ends of the electrode assembly 3 and both ends of the beam measurement housing 1 are fixedly connected to the measurement housing 1 through insulating blocks 12.

[0061] Specifically, fixing blocks 13 are provided on both the inner top wall and the inner bottom wall of the measurement housing 1. The fixing blocks 13 are fixedly connected to the graphite plate, and the fixing method can be bonding or clamping, etc. An insulating block 12 is provided on the side of the fixing block 13 away from the graphite plate. The insulating block can be divided into two parts, one part is the electrode insulating block 12a, and the other part is the beam cup insulating block 12b. The electrode insulating block 12a is fixedly connected to the electrode assembly 3, and the beam cup insulating block 12b is fixedly connected to the beam cup 2. The insulating block 12 is made of an insulating material, such as alumina ceramic material, etc., or other materials that meet the requirements can also be used, and the present application does not limit this.

[0062] By providing the insulating block 12, the measurement housing 1 can be isolated from the electrode assembly 3 and the beam cup 2, ensuring that the current of the electrode assembly 3 and the beam cup 2 will not be transmitted to the measurement housing 1, and improving the safety of the entire measurement device and the accuracy of the test results.

[0063] Optionally, the beam measurement device further includes a magnet assembly 4. The beam cup 2 is embedded in the magnet assembly 4, and the magnet assembly 4 can generate a magnetic field to suppress the electrons generated by the beam in the beam cup 2.

[0064] Specifically, when the energies of the ions in the beam are all small, the probability of secondary electron emission when the beam bombards the side wall of the collection sump after entering the collection sump is small, and its influence on the measurement result is small, and it is not necessary to suppress the electrons in the beam cup 2. In the ion implantation process, a large amount of secondary electron emission will be triggered when the beam bombards the collection sump, so it is necessary to suppress the electrons to ensure the accuracy of the measurement result.

[0065] By providing the magnet assembly 4 and embedding the beam cup 2 in the magnet assembly 4, the magnet assembly 4 can generate a magnetic field, and the magnetic field can suppress the occurrence of secondary electron emission, thereby effectively improving the accuracy of the measurement result. Moreover, by embedding the beam cup 2 in the magnet assembly 4, an overlapping layout is formed between the beam cup 2 and the magnet assembly 4, which can not only improve the effect of the magnetic field, but also reduce the space occupation, thereby reducing the sizes of the measurement housing 1 and the beam cup 2, which is beneficial to reducing the overall manufacturing cost while ensuring the suppression of secondary electron emission.

[0066] Optionally, the magnet assembly 4 includes a mounting shell 41 and a magnetic block 42. The mounting shell 41 has a mounting groove therein, and the beam cup 2 is embedded in the mounting groove; the magnetic block 42 is fixedly arranged in the mounting groove for generating a magnetic field.

[0067] Specifically, the cross-section of the mounting shell 41 can be U-shaped, and a mounting groove is formed inside it. The beam cup 2 is installed in the mounting groove. The width of the beam cup 2 is smaller than the width of the mounting groove to form a space for mounting the magnetic block 42 between the side wall of the mounting groove and the outer side wall of the beam cup 2. The length of the beam cup 2 is smaller than the depth of the mounting groove so that the beam cup 2 will be completely embedded in the mounting groove. The magnetic block 42 can be made of a permanent magnetic material, such as a permanent magnetic alloy, a permanent ferrite, a rare earth permanent magnetic material, or a composite permanent magnetic material. In this embodiment, the magnetic block 42 is made of an iron-chromium-cobalt-based alloy. Mounting blocks 43 can be provided at both the upper and lower ends of the magnetic block 42. The side surface of the mounting block 43 is detachably connected to the side wall of the mounting groove, and the two mounting blocks 43 respectively abut against the upper and lower end surfaces of the magnetic block 42, thereby fixing the magnetic block 42 in the mounting groove.

[0068] Through the arrangement of the mounting shell 41 and the magnetic block 42, the beam cup 2 can be embedded in the mounting groove, and the magnetic block 42 is located on the side of the beam cup 2. The magnetic field generated by the magnetic block 42 can act on the beam in the collection sink, thereby effectively suppressing the occurrence of secondary electron emission.

[0069] Optionally, the magnet assembly 4 further includes a protective shell 44. The protective shell 44 is arranged between the magnetic block 42 and the beam cup 2.

[0070] Specifically, a protective shell 44 is arranged on the outer side of the beam cup 2. The protective shell 44 is in a plate-like structure and can be adapted to the outer shape of the beam cup 2. By arranging the protective shell 44, the magnetic block 42 can be separated from the beam cup 2, thereby reducing the possibility of the beam directly bombarding the surface of the magnetic block 42, and further reducing the possibility of the magnetic block 42 continuously heating up.

[0071] Optionally, magnetic blocks 42 are arranged on both opposite sides of the beam cup 2.

[0072] Specifically, magnetic blocks 42 are arranged on both opposite side surfaces of the beam cup 2, and each side of the magnetic block 42 can be multiple. The range of the length and width of each magnetic block 42 is between 10 mm and 30 mm. The multiple magnetic blocks 42 are horizontally arranged along the magnetic pole direction. The number of magnetic blocks 42 on one side is less than 100 to ensure that the remanence of the magnetic blocks 42 on one side is between 1000 Gauss and 10000 Gauss. The specific number of the magnetic blocks 42 can be designed according to actual operation requirements.

[0073] By arranging magnetic blocks 42 on both sides of the beam cup 2 and horizontally arranging a plurality of magnetic blocks 42 along the magnetic pole direction, a horizontal magnetic field that completely covers the beam cup 2 can be formed by the plurality of magnetic blocks 42, thereby effectively suppressing the occurrence of secondary electron emission.

[0074] Optionally, the beam measurement device further includes a gasket 5. The gasket 5 is made of a heat-insulating and insulating material and is arranged between the magnet assembly 4 and the measurement shell 1.

[0075] Specifically, a gasket 5 is arranged on the top wall of the fixing block 13 at the bottom of the measurement shell 1, and its material can be PA46 (Polyamide 46), PPA (Polyphthalamide), PPS (Polyphenylenesulfide), PEEK (Polyetheretherketone), PEK (Polyetherketone), etc. The gasket 5 can not only isolate the magnet assembly 4 from the measurement shell 1, thereby avoiding current transmission to the measurement shell 1, but also has the effect of heat insulation, reducing the heat transfer efficiency to the measurement shell 1.

[0076] Optionally, a yoke plate 6 is provided on the inner side of the measurement shell 1 in a ring shape.

[0077] Specifically, fixing grooves are opened on the inner sides of the plurality of graphite plates constituting the measurement shell 1, and a yoke plate 6 is arranged in each fixing groove, and the plurality of yoke plates 6 are connected to each other to form a complete surrounding structure. The yoke plate 6 can be processed from carbon steel, and the thickness can be between 1.5 mm and 10 mm.

[0078] By arranging the yoke plate 6 in a ring shape, the magnetic field inside the measurement shell 1 can be effectively constrained to reduce the influence of the magnetic field inside the measurement shell 1 on the external beam.

[0079] Optionally, the beam measurement device further includes a base 7. One side of the base 7 is fixedly connected to the measurement shell 1, and a coil housing 8 is fixedly connected to the other side of the base 7. The base 7 has a cooling channel for the coolant to flow through.

[0080] Specifically, the top wall of the base 7 is fixedly connected to the measurement shell 1, and the coil housing 8 is arranged on the bottom wall of the base 7. A cooling channel is arranged inside the base 7, and the cooling channel can be bent and extended to increase the length of the cooling channel and extend the residence time of the coolant inside the base 7.

[0081] By arranging the base 7, the coil housing 8 is separated from the test shell, and through the flow of the coolant in the cooling channel, the heat is timely taken away from the base 7, thereby reducing the possibility of heat transfer to the coil housing 8, and further reducing the possibility of damage to the electrical cable caused by temperature rise.

[0082] The beam measurement device includes a sensor and a beam measurement device as in the above embodiments. The sensor is connected to the beam cup 2 of the beam measurement device.

[0083] During use, the beam measurement device can effectively exclude low-energy ions and electrons in the beam, and the measurement data is fed back to the remote control system in real time through the sensor, so that the operator can obtain the corresponding data in a timely manner.

[0084] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, rather than limiting the implementation manners of the present invention. For those of ordinary skill in the art, various obvious changes, re-adjustments and substitutions can be made without departing from the protection scope of the present invention. It is not necessary and impossible to enumerate all the implementation manners here. Any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention shall be included in the protection scope of the claims of the present invention.

Claims

1. A beam current measuring device, characterized in that: include: A measuring shell (1), wherein a closed installation cavity is provided in the measuring shell (1), and a conducting slit (11) is provided on a side surface of the measuring shell (1); A beam cup (2) is arranged in the installation cavity, and a side surface of the beam cup (2) is provided with a collecting trough for beam injection; as well as An electrode assembly (3) is provided with a screening slit, one side of the screening slit is connected to the conducting slit (11), and the other side is connected to the collecting trough, and an electric field with different potentials is formed in the screening slit to exclude low-energy ions and electrons in the beam.

2. The beam current measuring device according to claim 1, characterized in that: The electrode assembly (3) comprises: A first electrode plate (31) connected to the positive electrode of a power source, wherein the first electrode plate (31) is provided with a first slit; a second electrode plate, electrically connected to the first electrode plate (31) and the negative electrode of the power source so that the electrode assembly (3) as a whole forms a positive electrode (32) and a negative electrode (33), the second electrode plate being provided with a second slit; the first slit, the second slit and the gap between the first electrode plate (31) and the second electrode plate forming the screening slit; Wherein, the voltage difference between the positive electrode (32) and the negative electrode (33) is greater than or equal to 25V.

3. The beam current measuring device according to claim 2, characterized in that: The electrode assembly (3) is in the shape of an elongated strip, with one side along the length direction of the electrode assembly (3) being the positive electrode (32) and the other side being the negative electrode (33).

4. The beam current measuring device according to claim 1, characterized in that: The beam current measuring device also includes: A magnet assembly (4), wherein the beam cup (2) is embedded in the magnet assembly (4), and the magnet assembly (4) can generate a magnetic field to suppress electrons generated by the beam in the beam cup (2).

5. The beam current measuring device according to claim 4, characterized in that: The magnet assembly (4) comprises: A mounting shell (41), wherein the mounting shell (41) has a mounting groove, and the beam cup (2) is embedded in the mounting groove; and A magnetic block (42) is fixedly disposed in the mounting groove to generate a magnetic field.

6. The beam current measuring device according to claim 5, characterized in that: The magnet assembly (4) further comprises: A protective shell (44) is arranged between the magnetic block (42) and the beam cup (2).

7. The beam current measuring device according to claim 5, characterized in that: The magnetic blocks (42) are arranged on opposite sides of the beam cup (2).

8. The beam current measuring device according to claim 4, characterized in that: The electrode assembly (3) is detachably connected to the beam cup (2).

9. The beam current measuring device according to any one of claims 4 to 8, characterized in that: The beam current measuring device also includes: a gasket (5) made of a heat-insulating material and arranged between the magnet assembly (4) and the measuring housing (1); and / or a yoke plate (6) arranged in a ring on the inner side of the measuring housing (1); and / or A base (7), one side of the base (7) is fixedly connected to the measuring shell (1), the other side of the base (7) is fixedly connected to a coil shell (8), and the base (7) has a cooling channel for a coolant flow channel.

10. Beam current measurement equipment, characterized in that include: The beam current measuring device according to any one of claims 1 to 9; as well as The sensor is connected to the beam cup (2) of the beam measuring device.