Composite uniform flow structure for diffusion furnace

Abstract

The utility model relates to the technical field of photovoltaic cell production, in particular to a composite flow uniformizing structure for a diffusion furnace, which comprises a furnace body positioning part, an embedded part and a filling part, a through groove is arranged at the central position of the furnace body positioning part, and the embedded part is arranged in the through groove. The embedded part is arranged at the position of the penetrating groove, the filling part is arranged in the embedded part, and a plurality of through holes are formed in the embedded part; according to the utility model, the quartz balls are filled in the embedded part, so that the problem of non-uniform diffusion of silicon wafers in the furnace tube is solved, the problem of low efficiency after processing of battery pieces is further avoided, and the defective rate of the battery pieces is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic cell production, and more specifically, to a composite flow equalizing structure for a diffusion furnace. Background Art

[0002] Currently, in the photovoltaic industry, in order to increase the hourly output of a single machine, the wafer insertion method of the original high-temperature diffusion, boron diffusion, and oxidation furnaces has been changed from vertical to horizontal, and the number of wafers placed in a single tube has increased from 1200 to 2400; however, in the actual production process, the sheet resistance fluctuation of the wafers on the quartz boats at both the head and the tail is relatively large, especially the sheet resistance uniformity within the sheet, which will affect the diffusion uniformity of the wafers in the overall furnace tube, and ultimately lead to a decrease in the electrical efficiency of the solar cells.

[0003] Therefore, it is necessary to provide a composite flow equalizing structure for a diffusion furnace. Summary of the Utility Model

[0004] The utility model provides a composite flow equalizing structure for a diffusion furnace to solve the above technical problems.

[0005] To achieve the above object, an embodiment of the utility model provides a composite flow equalizing structure for a diffusion furnace, including: a furnace body positioning part, an embedded part, and a filling part. A through groove is opened at the central position of the furnace body positioning part, the embedded part is arranged at the position of the through groove, the filling part is arranged inside the embedded part, and a plurality of through holes are opened on the embedded part.

[0006] Further, the furnace body positioning part includes a first area and a second area, and the through groove is opened on the second area.

[0007] Further, a plurality of pressure relief holes are opened on the first area.

[0008] Further, the inside of the embedded part is an air flow dispersion cavity, and the air flow dispersion cavity communicates the two sides of the embedded part through the through holes.

[0009] Further, the filling part is arranged inside the air flow dispersion cavity.

[0010] Further, the aperture of each through hole is different.

[0011] Further, the filling part includes a plurality of spheres, and two adjacent spheres are tangent to each other.

[0012] Further, the radius of the sphere is smaller than the radius of the through hole.

[0013] Further, the sphere is a high-temperature resistant sphere.

[0014] Further, the sphere includes a quartz sphere.

[0015] Compared with the prior art, the beneficial effects of the present utility model are as follows: By filling quartz balls in the embedded part, the problem of uneven diffusion of silicon wafers in the furnace tube is solved, thereby avoiding the problem of low efficiency after the processing of battery wafers and reducing the yield of defective battery wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The present utility model will be further described below in conjunction with the drawings and embodiments.

[0017] Figure 1 is the front view of a composite flow equalizing structure for a diffusion furnace of the present utility model;

[0018] Figure 2 is the three-dimensional view of the optimal embodiment of a composite flow equalizing structure for a diffusion furnace of the present utility model;

[0019] Figure 3 is the side sectional view of a composite flow equalizing structure for a diffusion furnace of the present utility model;

[0020] Figure 4 is the structural schematic diagram of the optimal embodiment of the sphere of the present utility model.

[0021] Among them, 100, furnace body positioning part; 101, first area; 102, second area; 103, pressure relief hole; 200, embedded part; 201, air flow dispersion cavity; 202, through hole; 300, filling part. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0022] The present utility model will now be further described in detail in conjunction with the drawings. These drawings are all simplified schematic diagrams, only illustrating the basic structure of the present utility model in a schematic manner, so they only show the components related to the present utility model.

[0023] Embodiment 1

[0024] Please refer to Figures 1 to 3 , Figure 1 is the front view of a composite flow equalizing structure for a diffusion furnace of the present utility model; Figure 2 is the three-dimensional view of the optimal embodiment of a composite flow equalizing structure for a diffusion furnace of the present utility model; Figure 3 is the side sectional view of a composite flow equalizing structure for a diffusion furnace of the present utility model. As Figures 1 to 3As shown, at least one embodiment provides a composite flow - equalizing structure for a diffusion furnace, including: a furnace body positioning part 100, an embedded part 200, and a filling part 300. The furnace body positioning part 100 is used to be installed on the inner wall of the furnace body. Thus, the inner contour of the furnace body coincides with the furnace body positioning part 100, including a circle and a polygon. A through - slot is opened at the central position of the furnace body positioning part 100. The embedded part 200 is arranged at the position of the through - slot, and the filling part 300 is arranged inside the embedded part 200. The flow - equalizing structure divides the furnace body into two large parts. An air inlet pipe is arranged on one side of the flow - equalizing structure, and an air outlet pipe is arranged on the other side. The inlet of the air outlet pipe is communicated with the battery - chip processing cavity. The gas needs to pass through the flow - equalizing structure to reach the battery - chip processing cavity. In this way, the gas can be evenly dispersed before acting on the battery chip, solving the problem of uneven diffusion of silicon wafers in the furnace tube, and further avoiding the problem of low efficiency after battery - chip processing and reducing the production rate of defective battery chips.

[0025] I. Furnace body positioning part 100

[0026] The furnace body positioning part 100 includes a first region 101 and a second region 102. The second region 102 is arranged at the central position of the furnace body positioning part 100. The regular and symmetric shape of the second region 102 includes a circle and a polygon. The region between the edge of the furnace body positioning part 100 and the edge of the second region 102 is the first region 101. The through - slot is opened on the second region 102. A plurality of pressure - relief holes 103 are opened on the first region 101, mainly to ensure that there is no interference between the outlet of the air outlet pipe and the flow - equalizing structure.

[0027] II. Embedded part 200

[0028] The interior of the embedded part 200 is an air - flow dispersion cavity 201. The outer contour of the embedded part 200 is determined by the contour of the second region 102. Specifically, the embedded part 200 is hollow. Through - holes 202 of different sizes are arranged on the front and rear two side surfaces of the embedded part 200. That is, a plurality of through - holes 202 are opened on the embedded part 200. The air - flow dispersion cavity 201 makes the two sides of the embedded part 200 communicate through the through - holes 202. The aperture of each through - hole 202 is different.

[0029] Filling part 300

[0030] The filling part 300 is arranged in the air - flow dispersion cavity 201. The filling part 300 includes a plurality of spheres. Adjacent spheres are tangent to each other. The radius of the sphere is smaller than the radius of the through - hole 202. The sphere is a high - temperature - resistant sphere. The sphere includes a quartz sphere.

[0031] Embodiment two

[0032] The utility model provides a composite flow - equalizing structure for a diffusion furnace, which comprises a furnace body positioning part 100, an embedded part 200 and a filling part 300. The furnace body positioning part 100 is used to be installed on the inner wall of the furnace body, so the inner contour of the furnace body coincides with the furnace body positioning part 100, including a circle and a polygon. A through - groove is opened at the central position of the furnace body positioning part 100. The embedded part 200 is arranged at the position of the through - groove, and the filling part 300 is arranged inside the embedded part 200. The flow - equalizing structure divides the furnace body into two large parts. An air inlet pipe is arranged on one side of the flow - equalizing structure, and an air outlet pipe is arranged on the other side. The inlet of the air outlet pipe is communicated with the battery - chip processing cavity. The gas needs to pass through the flow - equalizing structure to reach the battery - chip processing cavity. In this way, the gas can be evenly dispersed before acting on the battery chip, solving the problem of uneven diffusion of silicon wafers in the furnace tube, and further avoiding the problem of low efficiency after battery - chip processing, and reducing the output of defective battery chips.

[0033] The following specifically describes the specific component structures of the furnace body positioning part 100, the embedded part 200 and the filling part 300. The furnace body positioning part 100 includes a first region 101 and a second region 102. The second region 102 is arranged at the central position of the furnace body positioning part 100. The regular and symmetric shape of the second region 102 includes a circle and a polygon. The first region 101 is between the edge of the furnace body positioning part 100 and the edge of the second region 102. The through - groove is opened on the second region 102. A plurality of pressure - relief holes 103 are opened on the first region 101, mainly to ensure that there is no interference between the outlet of the air outlet pipe and the flow - equalizing structure. The inside of the embedded part 200 is an air - flow dispersion cavity 201. The outer contour of the embedded part 200 is determined by the contour of the second region 102. Specifically, the embedded part 200 is hollow, and through - holes 202 of different sizes are arranged on the front and rear side surfaces of the embedded part 200, that is, a plurality of through - holes 202 are opened on the embedded part 200. The air - flow dispersion cavity 201 makes the two sides of the embedded part 200 communicate through the through - holes 202. The aperture of each through - hole 202 is different. The filling part 300 is arranged in the air - flow dispersion cavity 201. The filling part 300 includes a plurality of spheres, and two adjacent spheres are tangent to each other. The radius of the sphere is smaller than the radius of the through - hole 202. The sphere is a high - temperature - resistant sphere. The sphere includes a quartz sphere. Please refer to Figure 4 , Figure 4 is a schematic structural diagram of the optimal embodiment of the sphere of the present utility model. As Figure 4 shown, in order to further improve the effect of dispersing the air flow, dispersion holes are opened on the quartz sphere. The contour of the dispersion hole is strip - shaped or serrated, and the extending direction of the dispersion hole is parallel to the gas flow direction.

[0034] In summary, by filling the embedded part 200 with quartz balls, the problem of uneven diffusion of silicon wafers in the furnace tube is solved, thereby avoiding the problem of low efficiency after the processing of battery chips and reducing the output of defective battery chips; by providing dispersion holes on the spheres, the air flow dispersion effect is further improved.

[0035] Inspired by the above ideal embodiments of the present invention, through the above description, relevant staff can completely make various changes and modifications without departing from the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A composite uniform flow structure for a diffusion furnace, characterized in that: include: A furnace body positioning portion (100), an embedded portion (200) and a filling portion (300), wherein a through groove is provided at the center of the furnace body positioning portion (100), the embedded portion (200) is arranged at the position of the through groove, the filling portion (300) is arranged in the embedded portion (200), and a plurality of through holes (202) are provided on the embedded portion (200).

2. The composite uniform flow structure for a diffusion furnace according to claim 1, characterized in that: The furnace body positioning portion (100) comprises a first area (101) and a second area (102), and the through groove is opened in the second area (102).

3. The composite uniform flow structure for a diffusion furnace according to claim 2, characterized in that: A plurality of pressure relief holes (103) are provided in the first area (101).

4. The composite uniform flow structure for a diffusion furnace according to claim 1, characterized in that: The interior of the embedded part (200) is an airflow dispersion chamber (201), and the airflow dispersion chamber (201) enables two sides of the embedded part (200) to communicate with each other through the through hole (202).

5. The composite uniform flow structure for a diffusion furnace according to claim 4, characterized in that: The filling portion (300) is arranged in the airflow dispersion chamber (201).

6. The composite uniform flow structure for a diffusion furnace according to claim 1, characterized in that: The diameter of each through hole (202) is different.

7. A composite uniform flow structure for a diffusion furnace as claimed in claim 6, characterized in that: The filling portion (300) comprises a plurality of spheres, and two adjacent spheres are tangent to each other.

8. The composite uniform flow structure for a diffusion furnace according to claim 7, characterized in that: The radius of the sphere is smaller than the radius of the through hole (202).

9. A composite uniform flow structure for a diffusion furnace as claimed in claim 8, characterized in that: The sphere is a high temperature resistant sphere.

10. The composite uniform flow structure for a diffusion furnace according to claim 8, characterized in that: The sphere includes a quartz sphere.

Images