Movable planar magnetic field adjusting device and magnetron sputtering coating equipment

Abstract

The utility model discloses a movable plane magnetic field adjusting device and magnetron sputtering coating equipment, and relates to the technical field of magnetron sputtering coating, the movable plane magnetic field adjusting device comprises a magnetic steel seat, an inner ring magnet and an outer ring magnet, the inner ring magnet and the outer ring magnet are arranged on the magnetic steel seat, the two sides of the inner ring magnet along the length direction are respectively provided with a row of magnetic conduction components, and the magnetic conduction components are arranged on the magnetic steel seat. The magnetic conductive assembly is located between the inner ring magnet and the outer ring magnet, a magnetic conductive table fixed to the magnetic conductive assembly is arranged on the side, away from the inner ring magnet, of the magnetic conductive assembly, a kidney-shaped hole is formed in a bottom plate of the magnetic conductive table, and a bolt mounting hole is formed in the position, corresponding to the kidney-shaped hole, of the magnetic steel base. The magnetic conductive table and the magnetic steel base are fixedly connected through bolts penetrating through the kidney-shaped holes and the bolt installation holes, the position of the magnetic conductive table is adjusted in the direction of the kidney-shaped holes, and then the position of the magnetic conductive assembly in the plane magnetic field is adjusted. The device is simple in structure, convenient to adjust and capable of effectively adjusting the distribution uniformity of a magnetic field, so that the magnetron sputtering coating quality is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of magnetron sputtering coating, and particularly relates to a movable planar magnetic field adjusting device and a magnetron sputtering coating equipment. Background Art

[0002] Magnetron sputtering coating technology is an important thin film preparation technology, which is widely used in fields such as optics, electronics, and energy. During the magnetron sputtering coating process, the magnetic field between the target and the sputtering source has an important influence on the movement and distribution of sputtering particles. In order to achieve precise control of the magnetic field, it is necessary to adjust the intensity and distribution of the magnetic field. However, in existing magnetron sputtering coating equipment, the structure of the magnetic field adjusting device is complex and difficult to adjust, which affects the coating quality and efficiency of the magnetron sputtering coating equipment. Summary of the Utility Model

[0003] The purpose of the utility model is to provide a movable planar magnetic field adjusting device with a simple structure and convenient adjustment, which can effectively adjust the uniformity of the planar cathode magnetic field distribution; at the same time, a magnetron sputtering coating equipment is provided to facilitate the adjustment of the magnetic field intensity, thereby ensuring the magnetron sputtering coating quality.

[0004] To achieve the above purpose, the technical solution adopted by the utility model is: a movable planar magnetic field adjusting device, which includes a magnet steel seat, an inner ring magnet and an outer ring magnet installed on the magnet steel seat. The outer ring magnet is located outside the inner ring magnet. A row of magnetic conduction components is arranged on each side of the inner ring magnet along the length direction, and the magnetic conduction components are located between the inner ring magnet and the outer ring magnet. A magnetic conduction platform fixed to the magnetic conduction components is arranged on the side of the magnetic conduction components away from the inner ring magnet. A waist-shaped hole is opened on the bottom plate of the magnetic conduction platform, and bolt installation holes corresponding to the waist-shaped holes are arranged on the magnet steel seat. The magnetic conduction platform and the magnet steel seat are fixedly connected by bolts passing through the waist-shaped holes and the bolt installation holes. The position of the magnetic conduction platform is adjusted along the direction of the waist-shaped hole, and then the position of the magnetic conduction components in the planar magnetic field is adjusted.

[0005] In one of the embodiments, the magnetic conduction components include a plurality of long strip-shaped magnetic conduction blocks connected in sequence, and each magnetic conduction block is provided with the magnetic conduction platform on the side away from the inner ring magnet.

[0006] Further, two magnetic conduction platforms are correspondingly arranged for each magnetic conduction block, and the two magnetic conduction platforms are installed at intervals on one side of the magnetic conduction block.

[0007] Further, the length direction of the waist-shaped hole is perpendicular to the length direction of the magnetic conduction block.

[0008] In one of the embodiments, a water blocking platform is fixed on one side of the bottom plate of the magnetic conduction platform where the waist-shaped hole is located.

[0009] In one of the embodiments, the inner ring magnet includes edge magnets that are parallel to each other and semi-circular magnets connected to both ends of the edge magnets, and the magnetic conduction component is arranged parallel to the edge magnets.

[0010] Further, the magnetic conduction table has a U-shaped structure, and the magnetic conduction block is installed on one vertical plate of the magnetic conduction table.

[0011] Further, there is a certain gap between the bottom of the magnetic conduction block and the upper surface of the magnetic steel seat.

[0012] This application also provides a magnetron sputtering coating device, including the movable planar magnetic field adjusting device described in any one of the above.

[0013] The beneficial effects of the present utility model are as follows:

[0014] (1) By controlling the movement of the magnetic conduction block, the intensity and distribution of the magnetic field can be adjusted in real time, making the deposition of sputtering particles on the target surface more uniform and improving the coating quality of the magnetron sputtering coating device.

[0015] (2) Since the structure of the movable planar magnetic field adjusting device is simple and the adjustment is convenient, the coating efficiency of the magnetron sputtering coating device can be effectively improved.

[0016] (3) The planar magnetic field adjusting device is applicable to various magnetron sputtering coating devices, has a wide application field and good market prospects. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a schematic structural diagram of Embodiment 1 of this application;

[0018] Figure 2 is Figure 1 a partial structural schematic diagram of;

[0019] Figure 3 is Figure 1 a top view of a partial structure of;

[0020] Figure 4 is a schematic diagram of the overall structure of the planar cathode cover plate of the magnetron sputtering coating device in Embodiment 2 of this application.

[0021] Markings in the figure:

[0022] 100. Movable planar magnetic field adjusting device, 101. Magnetic steel seat, 102. Inner ring magnet, 1021. Edge magnet, 1022. Semi-circular magnet, 103. Outer ring magnet, 104. Magnetic conduction component, 1041. Magnetic conduction block, 105. Magnetic conduction table, 1051. Bottom plate, 1052. Waist-shaped hole, 1053. Water retaining table, 1054. Vertical plate;

[0023] 200. Planar cathode cover plate, 201. Target. Detailed implementation manners

[0024] The following further describes the present utility model in detail with reference to the accompanying drawings and specific embodiments.

[0025] The structures, ratios, sizes, etc. shown in the drawings of this specification are only used to cooperate with the content disclosed in the specification for those familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present utility model. Therefore, they do not have technical essence. Any modification of the structure, change of the proportional relationship or adjustment of the size, without affecting the effects that the present utility model can produce and the purposes that can be achieved, should still fall within the scope covered by the technical content disclosed in the present utility model.

[0026] At the same time, it should be noted that unless otherwise stated, the meaning of "a plurality of" is two or more; the orientation or positional relationship indicated by terms such as "upper", "lower", "left", "right", "front end", "rear end", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present utility model and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation to the present utility model. The change or adjustment of its relative relationship, without substantial change in the technical content, should also be regarded as the scope in which the present utility model can be implemented.

[0027] Embodiment 1

[0028] As Figures 1 to 3 shown, this embodiment provides a movable planar magnetic field adjusting device, which includes a magnet seat 101, an inner ring magnet 102 and an outer ring magnet 103 installed on the magnet seat 101. The outer ring magnet 103 is located outside the inner ring magnet 102. The inner ring magnet 102 includes side magnets 1021 that are parallel to each other and semi-circular magnets 1022 connected to both ends of the side magnets 1021. After the two side magnets 1021 and the two semi-circular magnets 1022 are connected, a ring structure is formed.

[0029] A row of magnetic conduction components 104 are arranged on both sides of the inner ring magnet 102 along the length direction, which play the role of a magnetic yoke, and the magnetic conduction components 104 are located between the inner ring magnet 102 and the outer ring magnet 103. The magnetic conduction components 104 are arranged parallel to the side magnets 1021 of the inner ring magnet 102. Specifically, the magnetic conduction components 104 include a plurality of long strip-shaped magnetic conduction blocks 1041 connected in sequence.

[0030] A magnetic conduction table 105 fixed to the magnetic conduction components 104 is arranged on the side of the magnetic conduction components 104 away from the inner ring magnet 102. In specific implementation, a magnetic conduction table 105 is installed on each magnetic conduction block 1041, and the magnetic conduction table 105 is located on the side away from the inner ring magnet 102.

[0031] In this embodiment, the magnetic guiding table 105 has a U-shaped structure, and the magnetic guiding block 1041 is installed on a vertical plate 1054 of the magnetic guiding table 105. A waist-shaped hole 1052 is formed in the bottom plate 1051 of the magnetic guiding table 105. Bolt mounting holes are provided on the magnetic steel seat 101 at positions corresponding to the waist-shaped hole 1052. The magnetic guiding table 105 and the magnetic steel seat 101 are fixedly connected by bolts passing through the waist-shaped hole 1052 and the bolt mounting holes. The length direction of the waist-shaped hole 1052 is perpendicular to the length direction of the magnetic guiding block 1041. After loosening the bolts, adjust the position of the magnetic guiding table 105 along the direction of the waist-shaped hole 1052, and then adjust the position of the magnetic guiding component 104 in the plane magnetic field. After adjustment, tighten the bolts.

[0032] In a specific setting, there is a certain gap between the bottom of the magnetic guiding block 1041 and the upper surface of the magnetic steel seat 101, which is convenient for the magnetic steel seat 101 to move along with the magnetic guiding table 105.

[0033] Preferably, two magnetic guiding tables 105 are correspondingly arranged for each magnetic guiding block 1041. The two magnetic guiding tables 105 are installed at intervals on one side of the magnetic guiding block 1041. In this embodiment, the two magnetic guiding tables 105 are fixed at both ends of the magnetic guiding block.

[0034] A water retaining table 1053 is fixed on one side of the waist-shaped hole 1052 on the bottom plate 1051 of the magnetic guiding table 105. The water retaining table 1053 is a rectangular parallelepiped convex platform that is higher than the bottom plate 1051. Since the magnetic steel is cooled by water, the water retaining table 1053 can increase the tortuous path of the water flow and enhance the cooling effect.

[0035] The magnetic guiding block 1041 has a high magnetic permeability and can be magnetized more easily and maintain the magnetic state. When the magnetic guiding block 1041 is placed in a magnetic field, it can absorb more magnetic field lines, thereby reducing the interference of the magnetic field on the surrounding environment. During use, the movable plane magnetic field adjusting device is installed in the magnetron sputtering coating equipment. In cooperation with the magnetic field detection device, if a higher magnetic field is detected at a certain place, move the position of the corresponding magnetic guiding block 1041 to weaken the magnetic field intensity of this part, so as to achieve the purpose of adjusting the magnetic field uniformity.

[0036] Embodiment 2

[0037] This embodiment provides a magnetron sputtering coating equipment, including a sputtering chamber and a planar cathode cover plate 200 buckled on the sputtering chamber. After the planar cathode cover plate 200 is pressed against the sputtering chamber, a sealing effect is achieved. The planar cathode cover plate 200 is as Figure 4 shown. Other parts of the magnetron sputtering coating equipment adopt the prior art and are not shown in the figure.

[0038] The movable plane magnetic field adjusting device 100 and the target 201 are installed on the planar cathode cover plate 200. The specific installation method is not the innovation point of this application and adopts the prior art, so it will not be elaborated here.

[0039] The usage method is as follows: First, install the movable planar magnetic field adjusting device 100 on the planar cathode cover plate 200; second, loosen the bolts and move the position of the magnetic conduction table 105, and then adjust the position of the magnetic conduction block to adjust the uniformity of the magnetic field distribution, and tighten the bolts; then, perform magnetron sputtering coating. During the magnetron sputtering coating process, make the deposition of the sputtering particles on the surface of the target 202 more uniform; finally, complete the magnetron sputtering coating process to obtain a high-quality coating effect.

[0040] The utility model changes the uniformity of the overall magnetic field by adjusting the position of the magnetic conduction block, has a simple structure, is convenient to adjust, has a high coating quality, and can effectively solve the problem of uneven magnetic field intensity of the planar cathode.

[0041] Finally, it should be noted that the above are only the preferred embodiments of the present utility model and are not used to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements on some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the inspiration of the idea of the present utility model shall be included within the scope of the protection of the rights of the present utility model.

Claims

1. A movable planar magnetic field regulating device, comprising a magnetic steel seat (101) and an inner ring magnet (102) and an outer ring magnet (103) mounted on the magnetic steel seat (101), wherein the outer ring magnet (103) is located outside the inner ring magnet (102), and characterized in that: A row of magnetic conductive components (104) is provided on both sides of the inner ring magnet (102) along the length direction, and the magnetic conductive components (104) are located between the inner ring magnet (102) and the outer ring magnet (103); A magnetic conductive platform (105) fixed to the magnetic conductive component (104) is provided on one side of the magnetic conductive component (104) away from the inner ring magnet (102); a waist-shaped hole (1052) is provided on the bottom plate (1051) of the magnetic conductive platform (105); a bolt mounting hole is provided on the magnetic steel seat (101) at a position corresponding to the waist-shaped hole (1052); the magnetic conductive platform (105) and the magnetic steel seat (101) are fixedly connected by bolts passing through the waist-shaped hole (1052) and the bolt mounting hole; the position of the magnetic conductive platform (105) is adjusted along the direction of the waist-shaped hole (1052), thereby adjusting the position of the magnetic conductive component (104) in the plane magnetic field.

2. The movable planar magnetic field regulating device according to claim 1, characterized in that: The magnetic conductive component (104) comprises a plurality of long magnetic conductive blocks (1041) connected in sequence, and the magnetic conductive platform (105) is installed on a side of each magnetic conductive block (1041) away from the inner ring magnet (102).

3. The movable planar magnetic field regulating device according to claim 2, characterized in that: Two magnetic conductive platforms (105) are correspondingly arranged for each magnetic conductive block (1041), and the two magnetic conductive platforms (105) are installed at intervals on one side of the magnetic conductive block (1041).

4. The movable planar magnetic field regulating device according to claim 3, characterized in that: The length direction of the waist-shaped hole (1052) is perpendicular to the length direction of the magnetic conductive block (1041).

5. The movable planar magnetic field regulating device according to claim 1, characterized in that: A water retaining platform (1053) is fixed on the bottom plate (1051) of the magnetic conductive platform (105) at one side of the waist-shaped hole (1052).

6. The movable planar magnetic field regulating device according to claim 2, characterized in that: The inner ring magnet (102) comprises mutually parallel side magnets (1021) and semicircular magnets (1022) connected to both ends of the side magnets (1021); the magnetic conductive component (104) is arranged in parallel with the side magnets (1021).

7. The movable planar magnetic field regulating device according to claim 6, characterized in that: The magnetic conductive platform (105) is in a U-shaped structure, and the magnetic conductive block (1041) is installed on a vertical plate (1054) of the magnetic conductive platform (105).

8. The movable planar magnetic field adjustment device according to claim 7, characterized in that: There is a certain gap between the bottom of the magnetic conductive block (1041) and the upper surface of the magnetic steel seat (101).

9. A magnetron sputtering coating device, characterized in that: The movable planar magnetic field regulating device comprises the movable planar magnetic field regulating device as described in any one of claims 1 to 8.

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