Wafer laser processing cavity convenient to clean

Abstract

The utility model relates to a wafer laser processing cavity convenient to clean, which comprises a cavity body and a cleaning pipeline, the cleaning pipeline is an annular pipe, and the cleaning pipeline is positioned on the inner wall of the cavity body; the cleaning pipeline is connected with the electromagnetic valve; and the cleaning pipeline is provided with a plurality of nozzles. The utility model has the advantages that the cleaning cost is low, the equipment maintenance frequency is reduced, the cleaning time is shortened, and the problem that the cavity is difficult to clean is effectively solved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor packaging, in particular to a wafer laser processing chamber which is easy to clean. Background Art

[0002] Before laser grooving the wafer, a layer of laser protection liquid needs to be applied. During the coating process, the coating work disk rotates at high speed, which will throw excess protection liquid onto the side walls of the cavity and flow out from the drain port at the bottom of the cavity along the inner wall. However, since the laser protection liquid is easy to crystallize and solidify, the inner wall of the cavity will be severely crystallized, blocking the drain port, which will cause abnormal operation of the cavity. Once there are too many crystals, it is difficult to remove them. Therefore, the existing wafer grooving cavity is difficult to clean and has high equipment maintenance costs. Utility Model Content

[0003] The utility model aims to provide a wafer laser processing chamber which is easy to clean and can solve the problem of abnormal crystallization of laser protection liquid in the coating chamber.

[0004] In order to achieve the above-mentioned utility model object, the utility model provides a wafer laser processing chamber that is easy to clean, including a chamber body and a cleaning pipeline, wherein the cleaning pipeline is an annular pipe, and the cleaning pipeline is located on the inner wall of the chamber body; the cleaning pipeline is connected to a solenoid valve;

[0005] The cleaning pipeline is provided with a plurality of nozzles;

[0006] It also includes a three-way joint, through which the cleaning pipeline is connected to a water inlet pipe;

[0007] It also includes a buckle, and the cleaning pipe is detachably fixed to the inner wall of the cavity through the buckle.

[0008] Preferably, the nozzle is a fan-shaped nozzle.

[0009] The utility model discloses a wafer laser processing chamber that is easy to clean. When the wafer coating is finished, the solenoid valve is opened, water enters the cleaning pipe, and a plurality of nozzles are aimed at the side wall of the chamber to spray water, flushing the laser protection liquid hanging on the wall and discharging it from the bottom of the chamber. The program can be preset to keep the solenoid valve open when the coating equipment is on standby, so as to achieve self-cleaning of the chamber.

[0010] Compared with the prior art, the wafer laser processing chamber of the utility model which is easy to clean has the following advantages:

[0011] The cleaning cost is low, which reduces the equipment maintenance frequency and cleaning time, and effectively solves the problem of difficult cavity cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1This is a schematic diagram of a wafer laser processing chamber structure that is easy to clean according to the utility model;

[0013] Figure 2 This is a schematic diagram of the cleaning pipeline structure;

[0014] Figure 3 Schematic diagram of the nozzle structure;

[0015] Figure 4 This is a schematic diagram of the cleaning pipeline connection. DETAILED DESCRIPTION

[0016] The specific implementation of the utility model is further described in detail below with reference to the accompanying drawings.

[0017] like Figure 1-2 As shown, a wafer laser processing chamber that is easy to clean of the utility model comprises a chamber body 1 and a cleaning pipe 2. The cleaning pipe 2 is an annular pipe, and the cleaning pipe 2 is located on the inner wall of the chamber body 1. The cleaning pipe 2 is connected to a solenoid valve 22.

[0018] The cleaning pipeline 2 is provided with a plurality of nozzles 3 .

[0019] The utility model provides a wafer laser processing chamber that is easy to clean. When wafer coating is finished, the solenoid valve 22 is opened, water enters the cleaning pipe 2, and a plurality of nozzles 3 spray water toward the side wall of the chamber 1 to flush the laser protection liquid hanging on the wall and discharge it from the bottom of the chamber 1. A program can be preset to keep the solenoid valve open when the coating equipment is on standby, so as to achieve self-cleaning of the chamber 1.

[0020] The utility model provides a wafer laser processing chamber that is easy to clean, and further includes a three-way joint 23, through which the cleaning pipe 2 is connected to the water inlet pipe 21. After the water inlet pipe 21 is filled with water by opening the solenoid valve 22, the water flow of the water inlet pipe 21 simultaneously enters the connection of the annular cleaning pipe 2 through the three-way joint 23, and the cleaning pipe 2 is filled with water in both directions at the same time, and the water inlet of the cleaning pipe 2 is faster.

[0021] The utility model is a wafer laser processing chamber that is easy to clean, and also includes a buckle 24, such as Figure 4 As shown, the cleaning pipe 2 is detachably fixed to the inner wall of the cavity 1 by a buckle 24, which is convenient for the disassembly and assembly of the cleaning pipe 2. The cleaning pipe 2 can be removed by the buckle 24, and each nozzle 3 can be regularly maintained and cleaned to prevent the protective liquid from splashing onto the nozzle 3, clogging the nozzle 3, and affecting the cleaning effect.

[0022] like Figure 4 As shown, the nozzle 3 can be a fan-shaped nozzle, which has a better spraying effect and only needs a small amount of water to clean the waste liquid residue on the surface of the cavity.

[0023] The preferred embodiments of the present utility model have been specifically described above. However, the present utility model is not limited to the described embodiments. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present utility model, and these equivalent modifications or substitutions are all included within the scope defined by the claims of this application.

Claims

1. A wafer laser processing chamber that is easy to clean, characterized in that: It includes a cavity and a cleaning pipe, wherein the cleaning pipe is an annular pipe and is located on the inner wall of the cavity; the cleaning pipe is connected to a solenoid valve; The cleaning pipeline is provided with a plurality of nozzles; It also includes a three-way joint, through which the cleaning pipeline is connected to a water inlet pipe; It also includes a buckle, and the cleaning pipe is detachably fixed to the inner wall of the cavity through the buckle.

2. A wafer laser processing chamber that is easy to clean as claimed in claim 1, characterized in that: The nozzle is a fan-shaped nozzle.

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