Device for enhancing microwave plasma
By introducing electromagnetic enhancement components into the microwave coaxial device, an induction magnetic field is generated, the problem of low plasma concentration is solved, high-density plasma excitation and precise control are achieved in a low vacuum environment, and the long-term reliability of the device is ensured.
Patent Information
- Application Number
- CN202422005745.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-19
- Publication Date
- 2025-06-13
- Estimated Expiration
- 2034-08-19
AI Technical Summary
The plasma concentrations excitated by existing microwave coaxial devices are low, which limits its application scenarios.
A device for enhancing microwave plasma is designed to generate an induced magnetic field to enhance plasma density by providing an electromagnetic reinforcement assembly behind the conductors in the device, including a magnet and a spiral wound electromagnetic coil.
A microwave plasma that operates normally in a vacuum environment below 1 pa is realized, which can accurately control the plasma area and ensure long-term reliability through the design of the hollow structure.
Smart Images

Figure CN222981722U_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of microwave plasma, and specifically relates to a device for enhancing microwave plasma. Background Art
[0002] Microwave coaxial devices can be used in fields such as microwave plasma. This structure generally includes coaxial inner and outer conductors and an insulating medium that isolates the inner and outer conductors (such as CN201680064747, CN201680064995). Through coaxial feeding, microwaves propagate in the coaxial structure, and a high electromagnetic field is generated at the end of the coaxial structure, thereby exciting plasma. However, the plasma concentration excited by the general coaxial structure is relatively low, which limits its application scenarios and urgently needs improvement and optimization. Utility Model Content
[0003] The purpose of this application is to provide a device for enhancing microwave plasma, which solves the problem of low plasma concentration in microwave coaxial devices.
[0004] The purpose of this application is achieved through the following technical solutions:
[0005] A device for enhancing microwave plasma includes an outer conductor of the device. An inner conductor of the device and an electromagnetic enhancement component are arranged inside the outer conductor of the device. The inner conductor of the device is located behind the electromagnetic enhancement component. A device cavity is formed between the outer conductor of the device and the inner conductor of the device. An insulating medium is arranged between the outer conductor of the device and the electromagnetic enhancement component. The inner conductor of the coaxial feeder is connected to the inner conductor of the device.
[0006] Further, the inner conductor of the device is a hollow structure, and a rear opening and a side opening are provided at the rear of the inner conductor of the device.
[0007] Further, the rear opening of the device of the outer conductor of the device is connected to a rear cover. The inner conductor of the device passes through the rear cover. The front opening of the outer conductor of the device is connected to a front cover. The insulating medium passes through the front cover. The electromagnetic enhancement component passes through the insulating medium.
[0008] Further, a coaxial feed port is provided on the rear cover, and the inner conductor of the coaxial feeder extending into the device cavity is connected to the inner conductor of the device.
[0009] Further, the insulating medium is clamped between the outer conductor of the device and the front cover, and the electromagnetic enhancement component is clamped between the insulating medium and the inner conductor of the device.
[0010] Further, the front end of the inner conductor of the device is opposite to the rear end of the electromagnetic enhancement component.
[0011] Further, the electromagnetic enhancement component includes a magnet and a coil, and the coil is located outside the magnet.
[0012] Further, the electromagnetic enhancement component further includes a component housing, and both the magnet and the coil are located inside the component housing, and the component housing faces the inner conductor of the device.
[0013] Further, the coil is spirally wound around the magnet.
[0014] Further, a hollow cooling channel is provided inside the coil.
[0015] Advantages of the present application:
[0016] 1. By adding an inductance coil, an induced magnetic field is generated, enabling the microwave plasma to operate normally in a vacuum environment below 1 Pa.
[0017] 2. By adjusting the magnitude of the current, the intensity of the induced magnetic field is precisely controlled, thereby controlling the region of the plasma.
[0018] 3. It is convenient to arrange in a small size. The inside of the induction coil can be made hollow to facilitate water flow and ventilation cooling, ensuring long-term reliability.
[0019] The foregoing main solution of the present application and its various further alternative solutions can be freely combined to form multiple solutions, all of which are solutions that can be adopted and claimed in the present application; and in the present application, (each non-conflicting alternative) can be freely combined between alternatives and with other alternatives. Those skilled in the art can understand that there are various combinations according to the prior art and common general knowledge after understanding this solution, all of which are technical solutions to be protected in the present application, and will not be enumerated here. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 is a schematic structural diagram of the present application.
[0021] In the figure: 1 - rear conductor port, 2 - side conductor port, 3 - coaxial feed port, 4 - inner conductor of coaxial feeder, 5 - outer conductor of device, 6 - first pole of coil, 7 - second pole of coil, 8 - device cavity, 9 - inner conductor of device, 10 - insulating medium, 11 - component housing, 12 - magnet, 13 - rear cover, 14 - front cover, 15 - electromagnetic coil. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0022] The present application will be further described below in conjunction with specific embodiments and the drawings.
[0023] Referring to Figure 1 as shown, a device for enhancing microwave plasma includes a rear conductor port 1, a side conductor port 2, a coaxial feed port 3, an inner conductor 4 of a coaxial feeder, an outer conductor 5 of the device, a rear device port, a front device port, a device cavity 8, an inner conductor 9 of the device, an insulating medium 10, a rear cover 13, a front cover 14, and an electromagnetic enhancement component. The electromagnetic enhancement component includes a component housing 11, a magnet 12, an electromagnetic coil 15, a first pole 6 of the coil, and a second pole 7 of the coil.
[0024] The outer conductor 5 of the device is a multi-segment cylindrical structure with a diameter, specifically including a front large-diameter section, a middle and small-diameter section, and a rear large-diameter section, and its interior is a hollow structure. The front large-diameter section has a front opening of the device. The front opening of the outer conductor 5 of the device is connected to the front cover 14, and the specific connection method is screw, thread, or interference fit. The middle and small-diameter section forms a stepped inclined plane for fixing the device. Cooperating with the snap-fastening component, the whole device can be fixed on the cavity wall to realize the application and placement of the device. The rear large-diameter section has a rear opening of the device. The rear opening of the outer conductor 5 of the device is connected to the rear cover 13, and the preferred connection method is screw connection, and it can also be in the form of thread or interference fit.
[0025] Inside the outer conductor 5 of the device, there are an inner conductor 9 of the device and an electromagnetic enhancement component. The inner conductor 9 of the device is located behind the electromagnetic enhancement component. A device cavity 8 is formed between the outer conductor 5 of the device and the inner conductor 9 of the device, and an insulating medium 10 is provided between the outer conductor 5 of the device and the electromagnetic enhancement component.
[0026] The inner conductor 9 of the device passes through and is fixed on the rear cover 13, the insulating medium 10 passes through the front cover 14, the insulating medium 10 is clamped and fixed between the outer conductor 5 of the device and the front cover 14, the electromagnetic enhancement component passes through the insulating medium 10, and the electromagnetic enhancement component is clamped and fixed between the insulating medium 10 and the inner conductor 9 of the device.
[0027] A coaxial feed port 3 is fixedly provided on the rear cover 13, and the inner conductor 4 of the coaxial feeder of the coaxial feed port 3 extends into the device cavity 8 and is connected to the inner conductor 9 of the device.
[0028] The inner conductor 9 of the device is a cylindrical hollow structure. The hollow structure provides an internal channel for power supply or cooling of the electromagnetic enhancement component. A conductor rear opening 1 and a conductor side opening 2 are provided at the rear of the inner conductor 9 of the device. The two openings can enable a cable or a cooling pipeline to enter the conductor, and then supply it forward to the electromagnetic enhancement component.
[0029] The inner conductor 9 of the device is located at the center of the outer conductor 5 of the device. The front end of the outer conductor 5 is opposite to the rear end of the electromagnetic enhancement component, ensuring that the electromagnetic enhancement component is also located at the center of the outer conductor 5 of the device. A magnetic field is generated through the electromagnetic enhancement component to enhance the microwave plasma.
[0030] The electromagnetic enhancement component includes a component housing 11, a magnet 12, an electromagnetic coil 15, a coil first pole 6, and a coil second pole 7. The magnet 12 is a cylindrical structure and is located at the central position. The coil 15 is located outside the magnet 12 and is spirally wound around the magnet 12. By energizing the coil first pole 6 and the coil second pole 7 at the top of the coil 15, the generation of the magnetic field is realized, and by adjusting the magnitude of the current, the adjustment of the magnitude of the magnetic field is realized.
[0031] The component housing is a cylindrical structure with an upper opening and a hollow interior. The magnet 12 and the coil 15 are both located inside the component housing 11, and the housing is used to protect the coil and the magnet. The component housing 11 faces the inner conductor 9 of the device, and the component housing 11 is clamped and fixed between the insulating medium 10 and the inner conductor 9 of the device to achieve the fixed placement of the electromagnetic enhancement component. The coil 15 is provided with a hollow cooling channel inside to allow the passage of cold water or cold air to cool the coil.
[0032] In order to increase the plasma density after excitation, this device uses a wound metal coil magnet column as the excitation device for the terminal plasma of the coaxial-like structure. By energizing the metal coil, an induced magnetic field can be formed, and the magnetic induction intensity can be adjusted by changing the magnitude of the current value, which helps to enhance the microwave plasma density in a high-vacuum environment (0.001 - 1 Pa). At the same time, the coil can be designed as a hollow structure, and passing water / ventilating air through the structure can play the role of generating a strong magnetic field and cooling in a narrow space.
[0033] The working process of this application:
[0034] The entire coaxial-like device includes an inner conductor and an outer conductor of the device. A magnet is inserted into the inner conductor of the device, and at the same time, a metal coil is wound around the magnet, and the coil is energized through the first pole and the second pole. At the same time, a conductor rear opening is made at the upper part of the inner conductor of the device and a conductor side opening is made at the side, which can be used for feeding power to the first pole and the second pole of the coil and for passing cold for heat dissipation. The coaxial feed port is installed on the metal rear cover, and the inner conductor of its coaxial feeder is connected to the inner conductor of the device. Through the coaxial feed port for feeding power, electromagnetic waves can be generated in the device cavity and transmitted to the lower end of the entire device through the insulating medium. When a cavity with a vacuum environment lower than 1 Pa is connected to the lower end, plasma can be generated. By energizing the first pole and the second pole of the coil, an induced magnetic field can be generated, enabling the microwave plasma to operate normally in a vacuum environment lower than 1 Pa. At the same time, by adjusting the magnitude of the current, the intensity of the induced magnetic field can be precisely controlled, thereby controlling the region of the plasma. In order to ensure long-term operation, the induction coil can be made into a hollow structure and ventilated or passed with water.
[0035] The foregoing basic example of this application and its various further alternative examples can be freely combined to form multiple embodiments, all of which are embodiments that can be adopted and claimed in this application. In the solution of this application, each alternative example can be arbitrarily combined with any basic example and alternative example.
[0036] The above are only the preferred embodiments of this application and are not intended to limit this application. Any modifications, equivalent replacements, and improvements made within the spirit and principle of this application shall be included within the protection scope of this application.
Claims
1. A device for enhancing microwave plasma, comprising an outer conductor (5) of the device, characterized in that: The device outer conductor (5) is provided with a device inner conductor (9) and an electromagnetic enhancement component. The device inner conductor (9) is located behind the electromagnetic enhancement component. A device cavity (8) is formed between the device outer conductor (5) and the device inner conductor (9). An insulating medium (10) is provided between the device outer conductor (5) and the electromagnetic enhancement component. The coaxial feed line inner conductor (4) is connected to the device inner conductor (9).
2. The device for enhancing microwave plasma according to claim 1, characterized in that: The conductor (9) inside the device is a hollow structure, and a conductor rear opening (1) and a conductor side opening (2) are provided at the rear of the conductor (9) inside the device.
3. The device for enhancing microwave plasma according to claim 1, characterized in that: The device rear port of the device outer conductor (5) is connected to the rear cover (13), the device inner conductor (9) is passed through the rear cover (13), the device front port of the device outer conductor (5) is connected to the front cover (14), the insulating medium (10) is passed through the front cover (14), and the electromagnetic enhancement component is passed through the insulating medium (10).
4. The device for enhancing microwave plasma according to claim 3, characterized in that: The rear cover (13) is provided with a coaxial feed port (3), and the coaxial feed line inner conductor (4) of the coaxial feed port (3) extends into the device cavity (8) and is connected to the device inner conductor (9).
5. The device for enhancing microwave plasma according to claim 3, characterized in that: The insulating medium (10) is sandwiched between the outer conductor (5) of the device and the front cover (14), and the electromagnetic enhancement component is sandwiched between the insulating medium (10) and the inner conductor (9) of the device.
6. The device for enhancing microwave plasma according to claim 1, characterized in that: The front end of the conductor (9) in the device is opposite to the rear end of the electromagnetic enhancement component.
7. The device for enhancing microwave plasma according to claim 1, characterized in that: The electromagnetic enhancement component comprises a magnet (12) and a coil (15), wherein the coil (15) is located outside the magnet (12).
8. The device for enhancing microwave plasma according to claim 7, characterized in that: The electromagnetic increasing component also includes a component housing (11), the magnet (12) and the coil (15) are both located in the component housing (11), and the component housing (11) is opposite to the conductor (9) in the device.
9. The device for enhancing microwave plasma according to claim 7, characterized in that: The coil (15) is spirally wound around the magnet (12).
10. The device for enhancing microwave plasma according to claim 7 or 9, characterized in that: A hollow cooling channel is provided inside the coil (15).