Micro-nano bubble cleaning water tank

Abstract

The utility model relates to a micro-nano bubble cleaning water tank which is provided with an outer tank body, an inner tank body is arranged in the outer tank body, an overflow pipeline is arranged at the bottom of an inner cavity of the inner tank body, the overflow pipeline is connected with a water inlet pipeline, a water inlet end of the water inlet pipeline is connected with a pure water pipe for introducing pure water, and a water pump and a gas-liquid mixing pump are sequentially arranged on the water inlet pipeline. The gas-liquid mixing pump is connected with a nitrogen pipe for introducing nitrogen; an overflow hole is formed in the overflow pipeline; a flow uniformizing plate is installed in the inner tank body above the overflow pipeline, flow uniformizing holes distributed in a matrix mode are formed in the flow uniformizing plate, and a flower basket support for containing silicon wafers is arranged on the flow uniformizing plate. Nitrogen is added through the gas-liquid mixing pump on the pipeline through which pure water enters the cleaning tank body to form functional water containing micro-nano bubbles, and the functional water is fully distributed in the whole inner tank body through the overflow pipeline, so that functional water cleaning is performed on a silicon wafer, the cleaning effect is effectively improved, and fragments are prevented from being generated in the cleaning process.

Description

Technical Field

[0001] The utility model relates to the technical field of solar cells, in particular to a micro-nano bubble cleaning water tank for wafer cleaning. Background Technique

[0002] In the conventional crystalline silicon solar cell process, the wet process is an indispensable part. In the wet process of the mainstream TOPcon cells on the market now, there are three processes in total: texturing, alkaline polishing, and RCA, and the tank machine is the main equipment model among them.

[0003] The tank machine will add various chemicals into the process tank according to different process requirements. However, due to the property conflict between various process tank bodies, water tanks are mostly set as buffers between each process tank. Moreover, finally, in order to avoid chemical residues, the wafers generally need to be cleaned through two water tanks and then dried.

[0004] There are mainly two existing ways to increase the cleaning ability of the water tank. One is to supplement pure water into the continuous water tank and overflow it, resulting in a large amount of wasted water resources; the other is to mix nitrogen into the water tank during the wafer cleaning process for bubbling. However, the cleaning ability of nitrogen bubbling is limited. When encountering difficult-to-clean organic matter attachment, there are still excessive residues on the wafers after passing through the water tank. In addition, if the nitrogen flow rate is too small, the bubbling is uneven and the cleaning energy decreases, and if it is too large, it is easy to cause fragmentation, and it is difficult to control the nitrogen flow rate. Content of the Utility Model

[0005] The technical problem to be solved by the utility model is: in order to overcome the deficiencies in the prior art, the utility model provides a micro-nano bubble cleaning water tank that can effectively reduce the residues of organic matter and metal ions in the wet process of wafers and further improve the efficiency of solar cells.

[0006] The technical solution adopted by the utility model to solve its technical problems is: a micro-nano bubble cleaning water tank, which has an outer tank body, and an inner tank body is arranged inside the outer tank body. An overflow pipe is arranged at the bottom of the inner cavity of the inner tank body. The overflow pipe is connected to a water inlet pipe through a pipeline. The water inlet end of the water inlet pipe is connected to a pure water pipe for introducing pure water. A water pump and a gas-liquid mixing pump are arranged in sequence on the water inlet pipe. The gas-liquid mixing pump is connected to a nitrogen pipe for introducing nitrogen. An overflow hole is opened on the overflow pipe; a flow equalizing plate is installed in the inner tank body above the overflow pipe. The flow equalizing plate is provided with evenly distributed flow equalizing holes in a matrix. The flower basket bracket for placing wafers is arranged on the flow equalizing plate.

[0007] Furthermore, an overflow cavity is formed between the inner wall of the outer tank body and the outer wall of the inner tank body, and the height of the inner tank body is lower than that of the outer tank body.

[0008] Furthermore, the bottom of the overflow cavity is connected to a pneumatic control valve through a pipeline to control the discharge of the cleaning solution from the water tank body.

[0009] Specifically, the overflow pipe includes a first overflow pipe, a second overflow pipe, and a third overflow pipe that are spaced apart and arranged in parallel. The second overflow pipe is connected to the water inlet pipe, and shunt pipes are respectively connected between the second overflow pipe and the first overflow pipe, and between the second overflow pipe and the third overflow pipe.

[0010] The beneficial effects of the present utility model are as follows: The present utility model forms functional water containing micro-nano bubbles by adding nitrogen through a gas-liquid mixing pump on the pipeline where pure water enters the cleaning tank body. The functional water fills the entire inner tank body through the overflow pipe, thereby performing functional water cleaning on the silicon wafer, effectively improving the cleaning effect, and also preventing the generation of fragments during the cleaning process. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] The present utility model will be further described below in conjunction with the drawings and embodiments.

[0012] Figure 1 is a schematic structural diagram of the present utility model.

[0013] Figure 2 is a schematic structural diagram of the flow equalizing plate of the present utility model.

[0014] Figure 3 is a schematic structural diagram of the overflow pipe of the present utility model.

[0015] In the figure: 1. Outer tank body, 2. Inner tank body, 3. Overflow pipe, 3-1. First overflow pipe, 3-2. Second overflow pipe, 3-3. Third overflow pipe, 3-4. Shunt pipe, 4. Water inlet pipe, 5. Pure water pipe, 6. Water pump, 7. Gas-liquid mixing pump, 8. Nitrogen pipe, 9. Overflow hole, 10. Flow equalizing plate, 11. Flow equalizing hole, 12. Flower basket bracket, 13. Overflow cavity, 14. Pneumatic control valve. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0016] The present utility model will now be further described in detail in conjunction with the drawings. These drawings are all simplified schematic diagrams, only illustrating the basic structure of the present utility model in a schematic manner, so they only show the components related to the present utility model.

[0017] As Figures 1 to 3 shown, a micro-nano bubble cleaning water tank, the tank body of the water tank is composed of an outer tank body 1 and an inner tank body 2 provided inside the outer tank body 1. The height of the inner tank body 2 is lower than the height of the outer tank body 1. An overflow cavity 13 is formed between the inner wall of the outer tank body 1 and the outer wall of the inner tank body 2. The pipeline at the bottom of the overflow cavity 12 is connected to a pneumatic control valve 14.

[0018] At the bottom of the inner cavity of the inner tank body 2, there is an overflow pipeline 3. The overflow pipeline 3 includes a first overflow pipe 3-1, a second overflow pipe 3-2, and a third overflow pipe 3-3 that are spaced apart and arranged in parallel. A shunt pipe 3-4 is respectively connected between the second overflow pipe 3-2 and the first overflow pipe 3-1, and between the second overflow pipe 3-2 and the third overflow pipe 3-3.

[0019] Among them, the second overflow pipe 3-2 is connected to a water inlet pipeline 4. At the water inlet end of the water inlet pipeline 4, there is a pure water pipe 5 for introducing pure water. On the connecting pipeline between the pure water pipe 5 and the water inlet pipeline 4, a water pump 6 and a gas-liquid mixing pump 7 are successively arranged. The gas-liquid mixing pump 7 is connected to a nitrogen gas pipe 8 for introducing nitrogen gas.

[0020] Overflow holes 9 are spacedly arranged on the first overflow pipe 3-1, the second overflow pipe 3-2, and the third overflow pipe 3-3. An even-flow plate 10 is installed in the inner tank body 2 above the overflow pipeline 3. The even-flow plate 10 is provided with evenly distributed even-flow holes 11 in a matrix. A wafer basket support 12 for placing wafers is arranged on the even-flow plate 10.

[0021] During the process, pure water is pumped from the water inlet pipeline 4 by the water pump 6. Nitrogen gas is introduced into the gas-liquid mixing pump 7 through the nitrogen gas pipe 8 and mixed with the pure water to form functional water with nitrogen micro-nano bubbles. The functional water enters from the second overflow pipe 3-2 and respectively enters the second overflow pipe 3-2 and the third overflow pipe 3-3 through the shunt pipe 3-4, and then flows into the inner tank body 2 through the overflow holes 9. Finally, it is evenly distributed in the inner tank body 2 through the even-flow holes 11 on the even-flow plate 10 to clean the wafers on the wafer basket support 12.

[0022] As the functional water continuously flows in and gradually fills the inner cavity of the inner tank body 2, the functional water flows into the overflow cavity 13 from the upper edge surface of the inner tank body 2 and is discharged out of the tank body through the control of the pneumatic control valve 14.

[0023] The utility model adopts adding nitrogen gas through the gas-liquid mixing pump 7 to form micro-nano bubbles on the pipeline where pure water enters the cleaning tank body, and the micro-nano bubbles cover the entire inner tank body 2 through the overflow pipeline 3, so as to clean the wafers with functional water.

[0024] The micro-nano bubbles have a large specific surface area and a slow rising speed, and can be well distributed in every corner of the inner tank body 2 during the overflow process. The functional water filled with micro-nano bubbles in the water will present a milky white color; the micro-nano bubbles have a slow rising speed and are not easy to disorder the position of the wafers in the tank and cause fragmentation; the surface of the micro-nano bubbles will carry negative charges, which is more conducive to adsorbing dirt and metal ions. At the same time, at the moment when the micro-nano bubbles burst, a large number of hydroxyl free radicals will be generated, which has a super high redox effect, so the cleaning effect on the wafers can be greatly improved.

[0025] Based on the above-mentioned ideal embodiments of the present utility model as an inspiration, through the above description, relevant staff can completely make various changes and modifications without departing from the technical idea of this utility model. The technical scope of this utility model is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A micro-nano bubble cleaning water tank, comprising an outer tank body (1), wherein an inner tank body (2) is arranged inside the outer tank body (1), wherein: An overflow pipe (3) is provided at the bottom of the inner cavity of the inner tank body (2), the overflow pipe (3) is connected to a water inlet pipe (4), the water inlet end of the water inlet pipe (4) is connected to a pure water pipe (5) for introducing pure water, a water pump (6) and a gas-liquid mixing pump (7) are provided on the water inlet pipe (4) in sequence, the gas-liquid mixing pump (7) is connected to a nitrogen pipe (8) for introducing nitrogen, and an overflow hole (9) is provided on the overflow pipe (3); a flow equalizer plate (10) is installed in the inner tank body (2) above the overflow pipe (3), the flow equalizer plate (10) is provided with flow equalizer holes (11) distributed in a matrix, and a basket support (12) for placing silicon wafers is provided on the flow equalizer plate (10).

2. The micro-nano bubble cleaning water tank as claimed in claim 1, characterized in that: An overflow cavity (13) is formed between the inner wall of the outer tank body (1) and the outer wall of the inner tank body (2), and the height of the inner tank body (2) is lower than that of the outer tank body (1).

3. The micro-nano bubble cleaning water tank as claimed in claim 2, characterized in that: The bottom pipeline of the overflow chamber (13) is connected to a pneumatic control valve (14).

4. The micro-nano bubble cleaning water tank as claimed in claim 1, characterized in that: The overflow pipe (3) comprises a first overflow pipe (3-1), a second overflow pipe (3-2) and a third overflow pipe (3-3) which are arranged in parallel and at a distance from each other; the second overflow pipe (3-2) is connected to the water inlet pipe (4); and a shunt pipe (3-4) is connected between the second overflow pipe (3-2) and the first overflow pipe (3-1) and between the second overflow pipe (3-2) and the third overflow pipe (3-3).

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