Chemical polishing tank for inner wall plate treatment

Abstract

The utility model discloses a chemical polishing tank for processing an inner wall plate, which relates to the technical field of chemical polishing tanks, and comprises a chemical polishing tank, one side of the chemical polishing tank is provided with a storage tank for storing processed materials, an axial slide rail for axial movement of a vertical slide rail is arranged above the chemical polishing tank, and a vertical slide rail is arranged above the axial slide rail. The inner wall of the axial sliding rail is in sliding connection with a vertical sliding rail allowing the fixing support to vertically move, the bottom end of the vertical sliding rail is connected with the fixing support allowing materials to be loaded, and the transmission mechanism is arranged on the fixing support and used for limiting the materials. The transmission mechanism is arranged, after the vertical sliding rail is used for taking out the fixed support containing materials from the chemical polishing pool, the axial sliding rail is used for moving the materials to the position above the containing groove and making contact with the side wall of the containing groove, the rotating plate is made to rotate, the materials automatically fall on the containing groove, and the purpose of automatic discharging is achieved; and the working efficiency is further improved.

Description

Technical Field

[0001] The utility model relates to the technical field of chemical polishing tanks, in particular to a chemical polishing tank for inner wall plate treatment. Background Art

[0002] Chemical polishing is a method that relies on the chemical etching effect of chemical reagents to selectively dissolve the uneven areas on the surface of the sample to eliminate grinding marks and achieve etching and leveling. The chemical polishing equipment is simple, can process thin tubes, parts with deep holes and complex shapes, and has high production efficiency. Chemical polishing can be used as a pretreatment process for electroplating or can be directly used after polishing with necessary protective measures.

[0003] In the prior art, when treating the inner wall plate of an aluminum alloy plate, a chemical polishing tank is generally used. The aluminum alloy plate is placed in a polishing tank containing additives such as sulfuric acid. Since the chemical reagent will adhere to the outer wall of the aluminum alloy plate during the chemical reagent polishing process, it is inconvenient for manual removal of the aluminum alloy plate, and a mechanical device is required for unloading operations. In order to further improve the unloading efficiency, reduce the operation of the driving unit, and further reduce costs, the utility model provides a chemical polishing tank for inner wall plate treatment. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a chemical polishing tank for inner wall plate treatment to solve the problems raised in the above background art.

[0005] To achieve the above purpose, the utility model provides the following technical solution: A chemical polishing tank for inner wall plate treatment, including a chemical polishing tank, a storage tank for receiving the processed materials is arranged on one side of the chemical polishing tank, an axial slide rail for the vertical slide rail to move axially is arranged above the chemical polishing tank, a vertical slide rail for the fixed bracket to move vertically is slidably connected to the inner wall of the axial slide rail, the bottom end of the vertical slide rail is connected to a fixed bracket for loading materials, and a transmission mechanism arranged on the fixed bracket, the transmission mechanism is used to limit the materials;

[0006] The transmission mechanism includes a transmission unit and a reset unit;

[0007] The transmission unit is used to limit the materials loaded inside the fixed bracket;

[0008] The reset unit is used to always provide an elastic thrust in one direction for the transmission unit.

[0009] As a further scheme of the utility model: The transmission unit includes a positioning plate, a rotating plate, a gear, and a rack;

[0010] The positioning plate is fixed inside the fixed bracket, and the positioning plate is used to support the materials;

[0011] The rotating plate is rotatably connected to the outer wall of one side of the positioning plate, and the rotating plate is used to limit the movement of the material;

[0012] The gear is fixed at one end of the rotating plate and located inside the fixed bracket, and the gear is used to drive the rotating plate to rotate synchronously;

[0013] The rack is axially slidably installed inside the fixed bracket and meshes with the outer wall of the gear, and the rack is used to push the gear to rotate.

[0014] As a further solution of the present invention: The reset unit includes a positioning block, a positioning rod, and a spring;

[0015] The positioning block is fixed at the top of the rack, and the positioning block drives the rack to move synchronously;

[0016] The positioning rod is fixed on the inner wall of the fixed bracket and penetrates through the positioning block, and the positioning rod is used to guide the movement of the positioning block;

[0017] The two ends of the spring are respectively clamped on the outer wall of the positioning block and the inner wall of the fixed bracket, and the spring is used to provide an elastic thrust in one direction for the positioning block.

[0018] As a further solution of the present invention: The number of the positioning plates, rotating plates, and gears is set to be multiple, and the multiple positioning plates, rotating plates, and gears are evenly distributed inside the fixed bracket.

[0019] As a further solution of the present invention: A chute for the axial movement of the rack is formed in the inner cavity of the fixed bracket, and one end of the rack extends to the outside of the fixed bracket.

[0020] As a further solution of the present invention: The outer wall of the positioning rod is integrally in a "T" - shaped structure, the outer wall of the positioning rod matches the inner wall of the positioning block, and a hole groove for the rack to enter and exit is formed at the end of the fixed bracket.

[0021] As a further solution of the present invention: The outer wall of the positioning plate is inclined on the side close to the rotating plate, and the unrotated rotating plate is in an overall vertical state.

[0022] Compared with the prior art, the beneficial effect of the present invention is:

[0023] By setting the transmission mechanism, after the fixed bracket with the material is taken out of the chemical polishing pool using the vertical slide rail, the axial slide rail can be used to move the material above the storage tank, contact the side wall of the storage tank, make the rotating plate rotate, and make the material automatically fall on the storage tank, achieving the purpose of automatic unloading and further improving the work efficiency. Description of the Drawings

[0024] Figure 1 is a schematic structural view of the present utility model;

[0025] Figure 2 is a schematic structural view of the transmission mechanism of the present utility model;

[0026] Figure 3 is a partially enlarged view at position A of the present utility model.

[0027] In the figure: 1, chemical polishing tank; 2, storage tank; 3, axial slide rail; 4, vertical slide rail; 5, fixed bracket; 6, transmission mechanism; 601, positioning plate; 602, rotating plate; 603, gear; 604, rack; 605, positioning block; 606, positioning rod; 607, spring. Specific embodiments

[0028] Next, the technical solutions in the embodiments of the present utility model will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present utility model.

[0029] Please refer to Figures 1 - 3 , in the embodiment of the present utility model, a chemical polishing tank for inner wall plate treatment includes a chemical polishing tank 1. A storage tank 2 for storing the processed materials is arranged on one side of the chemical polishing tank 1. An axial slide rail 3 for the axial movement of the vertical slide rail 4 is arranged above the chemical polishing tank 1. The inner wall of the axial slide rail 3 is slidably connected with a vertical slide rail 4 for the vertical movement of the fixed bracket 5. The bottom end of the vertical slide rail 4 is connected with a fixed bracket 5 for loading materials. A transmission mechanism 6 is arranged on the fixed bracket 5, and the transmission mechanism 6 is used to limit the materials;

[0030] The transmission mechanism 6 includes a transmission unit and a reset unit;

[0031] The transmission unit is used to limit the materials loaded inside the fixed bracket 5;

[0032] The reset unit is used to always provide an elastic thrust in one direction for the transmission unit;

[0033] The transmission unit includes a positioning plate 601, a rotating plate 602, a gear 603, and a rack 604;

[0034] The positioning plate 601 is fixed inside the fixed bracket 5, and the positioning plate 601 is used to provide support for the materials;

[0035] The rotating plate 602 is rotatably connected to the outer wall of the positioning plate 601, and the rotating plate 602 is used to limit the movement of the material;

[0036] The gear 603 is fixed to one end of the rotating plate 602 and is located inside the fixed bracket 5. The gear 603 is used to drive the rotating plate 602 to rotate synchronously;

[0037] The rack 604 is axially slidably installed inside the fixed bracket 5 and meshes with the outer wall of the gear 603. The rack 604 is used to push the gear 603 to rotate;

[0038] The reset unit includes a positioning block 605, a positioning rod 606, and a spring 607;

[0039] The positioning block 605 is fixed to the top of the rack 604, and the positioning block 605 drives the rack 604 to move synchronously;

[0040] The positioning rod 606 is fixed to the inner wall of the fixed bracket 5 and penetrates through the positioning block 605. The positioning rod 606 is used to guide the movement of the positioning block 605;

[0041] The two ends of the spring 607 are respectively clamped to the outer wall of the positioning block 605 and the inner wall of the fixed bracket 5. The spring 607 is used to provide an elastic thrust in one direction for the positioning block 605.

[0042] In this embodiment: When using this device, the fixed bracket 5 is taken out from the inner cavity of the chemical polishing tank 1 by using the vertical slide rail 4. The taken-out fixed bracket 5 will drive the vertical slide rail 4 and the fixed bracket 5 to move synchronously to the upper part of the storage tank 2 under the action of the axial slide rail 3. The end of the rack 604 protruding from the outer wall of the fixed bracket 5 will contact the side wall of the storage tank 2, giving an impact force to the rack 604. The impacted rack 604 will drive the positioning block 605 to move along the outer wall of the positioning rod 606 and give an extrusion force to the spring 607. The moving rack 604 will synchronously give a thrust to the gear 603, causing the gear 603 to rotate. The rotating gear 603 will synchronously drive the rotating plate 602 to rotate, making the outer wall of the rotating plate 602 flush with the inclined state of the positioning plate 601 from the vertical state. At this time, the materials on the inclined end face of the positioning plate 601 will also move along the outer surfaces of the positioning plate 601 and the rotating plate 602. Multiple materials will all fall from between the respective positioning plates 601 to the upper part of the storage tank 2, completing the automatic unloading operation of the materials, reducing the driving unit, lowering the cost, and further improving the working efficiency.

[0043] Please refer specifically to Figures 1 - 3, the number of the positioning plates 601, the rotating plates 602 and the gears 603 is set to be multiple, and the multiple positioning plates 601, rotating plates 602 and gears 603 are evenly distributed inside the fixed bracket 5. A chute for the axial movement of the rack 604 is formed in the inner cavity of the fixed bracket 5. One end of the rack 604 extends to the outside of the fixed bracket 5. The outer wall of the positioning rod 606 is integrally in a "T" - shaped structure, and the outer wall of the positioning rod 606 matches the inner wall of the positioning block 605. A hole groove for the rack 604 to enter and exit is formed at the end of the fixed bracket 5. The outer wall of the positioning plate 601 is inclined on the side close to the rotating plate 602, and the non - rotated rotating plate 602 is in an overall vertical state.

[0044] In this embodiment: through this structure, when the rotating plate 602 is not rotated, the vertically - arranged rotating plate 602 cooperates with the positioning plate 601, so that the bottom end of the material is on the inclined surface of the positioning plate 601, and the material is limited by the vertical rotating plate 602. It should be noted that a docking groove for limiting the movement of the material is also opened at the top end of the fixed bracket 5.

[0045] The above - mentioned is only the preferred specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present invention, according to the technical solution and the inventive concept of the present invention, makes equivalent substitutions or changes, and all should be covered within the protection scope of the present invention.

Claims

1. A chemical polishing tank for inner wall plate processing, comprising a chemical polishing tank (1), a storage tank (2) for storing processed materials is arranged on one side of the chemical polishing tank (1), an axial slide rail (3) for axial movement of a vertical slide rail (4) is arranged above the chemical polishing tank (1), the inner wall of the axial slide rail (3) is slidably connected to a vertical slide rail (4) for vertical movement of a fixed bracket (5), and the bottom end of the vertical slide rail (4) is connected to a fixed bracket (5) for material loading, characterized in that: A transmission mechanism (6) disposed on the fixed support (5), wherein the transmission mechanism (6) is used to limit the position of the material; The transmission mechanism (6) comprises a transmission unit and a reset unit; The transmission unit is used to limit the position of the material loaded inside the fixed bracket (5); The reset unit is used to provide a directional elastic thrust for the transmission unit at all times.

2. A chemical polishing trough for inner wall plate treatment according to claim 1, characterized in that: The transmission unit comprises a positioning plate (601), a rotating plate (602), a gear (603), and a rack (604); The positioning plate (601) is fixed on the inner side of the fixed bracket (5), and the positioning plate (601) is used to provide support for the material; The rotating plate (602) is rotatably connected to an outer wall of one side of the positioning plate (601), and the rotating plate (602) is used to limit the movement of the material; The gear (603) is fixed to one end of the rotating plate (602) and is located inside the fixed bracket (5), and the gear (603) is used to drive the rotating plate (602) to rotate synchronously; The rack (604) is axially slidably mounted inside the fixed bracket (5) and meshes with the outer wall of the gear (603). The rack (604) is used to drive the gear (603) to rotate.

3. A chemical polishing trough for inner wall plate treatment according to claim 1, characterized in that: The reset unit comprises a positioning block (605), a positioning rod (606), and a spring (607); The positioning block (605) is fixed on the top of the rack (604), and the positioning block (605) drives the rack (604) to move synchronously; The positioning rod (606) is fixed to the inner wall of the fixed bracket (5) and passes through the positioning block (605), and the positioning rod (606) is used to provide guidance for the movement of the positioning block (605); The two ends of the spring (607) are respectively clamped on the outer wall of the positioning block (605) and the inner wall of the fixing bracket (5), and the spring (607) is used to provide a directional elastic thrust for the positioning block (605).

4. A chemical polishing trough for inner wall plate treatment according to claim 2, characterized in that: The number of the positioning plates (601), the rotating plates (602), and the gears (603) is multiple, and the multiple positioning plates (601), the rotating plates (602), and the gears (603) are evenly distributed on the inner side of the fixed bracket (5).

5. The chemical polishing trough for inner wall plate treatment according to claim 2, characterized in that: The inner cavity of the fixed bracket (5) is formed with a sliding groove for the axial movement of the rack (604), and one end of the rack (604) extends to the outside of the fixed bracket (5).

6. A chemical polishing trough for inner wall plate treatment according to claim 3, characterized in that: The outer wall of the positioning rod (606) is in a T-shaped structure as a whole. The outer wall of the positioning rod (606) matches the inner wall of the positioning block (605). The end of the fixing bracket (5) is formed with a hole groove for the rack (604) to enter and exit.

7. The chemical polishing trough for inner wall plate treatment according to claim 2, characterized in that: The outer wall of the positioning plate (601) is in an inclined state at one side close to the rotating plate (602), and the rotating plate (602) that is not rotated is in a vertical state as a whole.

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