Integrated wafer frame automatic cleaning machine

Abstract

The utility model discloses an integrated wafer frame automatic cleaning machine which comprises a machine frame, a controller, a cleaning frame assembly, a cleaning tank assembly and a feeding and discharging assembly, the machine frame is vertically arranged on the ground, and a working cavity is formed in the surface of the middle end of the machine frame; the cleaning frame assembly is arranged on the inner side wall of the working cavity; the feeding and discharging assembly and the cleaning tank assembly are arranged on the inner bottom wall and the inner top wall of the working cavity correspondingly. The controller is arranged on the surface of the upper end of the rack and connected with the cleaning frame assembly, the cleaning tank assembly and the feeding and discharging assembly through an efficient control bus, and accurate instruction transmission and comprehensive monitoring of the equipment running state are achieved. Therefore, compared with a traditional cleaning pool and groove type design, the occupied area is greatly reduced, flexible deployment on a production line is more convenient, accurate management of use and timely replacement of the cleaning liquid is achieved through the controller, the stability and consistency of the cleaning process are guaranteed, the cleaning quality of products is remarkably improved, and the using effect is good.

Description

Technical Field

[0001] The utility model relates to the technical field of cleaning devices, in particular to an integrated automatic wafer frame cleaning machine. Background Technique

[0002] In the semiconductor manufacturing industry, the cleaning of wafer frames is a key link to ensure product quality and performance.

[0003] Traditionally, the cleaning process of wafer frames mainly relies on the cooperation of manual operations and auxiliary equipment. In this process, wafer frames are usually lifted by large mechanical equipment such as cranes and sent into the cleaning pool for cleaning operations.

[0004] However, there are problems with this cleaning method. Firstly, the traditional cleaning pool design often occupies a large area, which not only increases the space requirements of the production workshop but also limits the flexibility and scalability of the production line. Secondly, due to the large volume of the cleaning pool, the replacement frequency of the cleaning liquid is not frequent. After long-term use, impurities and pollutants in the cleaning liquid gradually accumulate, resulting in a decrease in the cleaning effect and thus affecting the cleanliness of the wafer frame. Content of the Utility Model

[0005] The utility model aims to solve at least one of the technical problems in the related technologies to a certain extent.

[0006] For this reason, the purpose of the utility model is to propose an integrated automatic wafer frame cleaning machine. Compared with the traditional cleaning pool, the tank design significantly reduces the floor area and is more convenient for flexible deployment on the production line. Among them, the use and timely replacement of the cleaning liquid are precisely managed through the controller, ensuring the stability and consistency of the cleaning process, and thus significantly improving the cleaning quality of the product with good use effect.

[0007] To achieve the above object, the utility model proposes an integrated automatic wafer frame cleaning machine, including a frame, a controller, a cleaning rack assembly, a cleaning tank assembly, and a loading and unloading assembly. Among them, the frame is vertically arranged on the ground, and a working cavity is opened on the middle-end surface of the frame; the cleaning rack assembly is arranged on the inner side wall of the working cavity; the loading and unloading assembly and the cleaning tank assembly are respectively arranged on the inner bottom wall and the inner top wall of the working cavity; the controller is arranged on the upper-end surface of the frame, and the controller uses a standardized power plug to seamlessly connect to an external power supply. The controller is respectively connected to the cleaning rack assembly, the cleaning tank assembly, and the loading and unloading assembly through an efficient control bus to achieve precise instruction transmission and comprehensive monitoring of the equipment operation status.

[0008] In addition, an integrated automatic wafer frame cleaning machine proposed according to the above application may also have the following additional technical features:

[0009] Specifically, the cleaning rack assembly includes a lifting slide base, a cleaning frame, an electric push rod, a screw rod lifting mechanism, and a dual-axis motor. Among them, the lifting slide base is symmetrically and vertically slidably connected to the inner wall of the working chamber, the cleaning frame is horizontally slidably connected to the outer surface of the lifting slide base, the electric push rod is fixedly connected to the outer surface of the lifting slide base and is fixedly connected to one end of the cleaning frame, the screw rod lifting mechanism is symmetrically fixedly connected to the inner wall of the machine frame and corresponds to the position of the lifting slide base, one end of the lifting slide base penetrates into the interior of the machine frame and is connected to the screw rod lifting mechanism, the dual-axis motor is fixedly connected to the inner wall of the machine frame and is located between the two screw rod lifting mechanisms, both ends of the dual-axis motor are respectively connected to the two screw rod lifting mechanisms, and the controller is respectively connected to the electric push rod and the dual-axis motor through a high-efficiency control bus to achieve precise command transmission and comprehensive monitoring of the equipment operation status; the screw rod lifting mechanism includes a fixed frame, a threaded screw rod, a first bevel gear, and a second bevel gear. Among them, the fixed frame is fixedly connected to the inner wall of the machine frame and corresponds to the position of the lifting slide base, the threaded screw rod is rotatably connected to the inner wall of the fixed frame, one end of the lifting slide base penetrates into the interior of the fixed frame and is threadedly connected to the outer surface of the threaded screw rod, the first bevel gear is fixedly connected to the top of the threaded screw rod, the second bevel gear is rotatably connected to the inner wall of the fixed frame and meshes with the first bevel gear, and the output end of the dual-axis motor is fixedly connected to one end of the central axis of the first bevel gear through a coupling; the cleaning tank assembly includes a cleaning tank body, a liquid level sensor, a concentration sensor, an ultrasonic generator, a water injection assembly, a cleaning liquid injection assembly, and a waste liquid discharge assembly. Among them, the cleaning tank body is symmetrically fixedly connected to the inner bottom wall of the working chamber and corresponds to the position of the cleaning frame, the liquid level sensor, the concentration sensor, and the ultrasonic generator are respectively fixedly connected to the inner wall of the cleaning tank body, the water injection assembly, the cleaning liquid injection assembly, and the waste liquid discharge assembly are sequentially arranged on the inner wall of the machine frame from top to bottom along the Z-axis direction, one end of the water injection assembly and one end of the cleaning liquid injection assembly are respectively communicated with the upper end of the inner cavity of the cleaning tank body, and one end of the waste liquid discharge assembly is communicated with the bottom of the inner cavity of the cleaning tank body. The controller is respectively connected to the liquid level sensor, the concentration sensor, the ultrasonic generator, the water injection assembly, the cleaning liquid injection assembly, and the waste liquid discharge assembly through a high-efficiency control bus to achieve precise command transmission and comprehensive monitoring of the equipment operation status;The water injection assembly has the same structure as the cleaning liquid injection assembly. The water injection assembly includes two groups of main liquid inlet pipes, liquid inlet solenoid valves, flow detectors, two groups of liquid distribution end seats, and a liquid storage tank. Among them, the two groups of liquid distribution end seats, the two groups of main liquid inlet pipes, and the liquid storage tank are respectively arranged on the inner wall of the frame. The liquid inlet solenoid valves and the flow detectors are respectively fixedly connected to the two groups of main liquid inlet pipes. The output ends of the two groups of main liquid inlet pipes are respectively connected to the input ends of the two groups of liquid distribution end seats. The input ends of the two groups of main liquid inlet pipes are respectively connected to the output end of the liquid storage tank. The output ends of the two groups of liquid distribution end seats are respectively communicated with the upper ends of the inner cavities of the two cleaning tanks; The waste liquid discharge assembly includes two groups of main liquid discharge pipes, liquid discharge solenoid valves, and a waste liquid storage tank. Among them, the two groups of main liquid discharge pipes and the waste liquid storage tank are respectively arranged on the inner wall of the frame. The input ends of the two groups of main liquid discharge pipes are respectively communicated with the bottoms of the inner cavities of the two cleaning tanks. The output ends of the two groups of main liquid discharge pipes are respectively communicated with the inside of the waste liquid storage tank. The liquid discharge solenoid valves are respectively fixedly connected to the two groups of main liquid discharge pipes; The controller is respectively connected to the liquid inlet solenoid valve, the flow detector, and the liquid discharge solenoid valve through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status; The loading and unloading assembly includes a mounting frame, a screw rod translation mechanism, a horizontal sliding seat, an electric telescopic rod, a negative pressure suction seat, a blanking conveying mechanism, and a feeding conveying mechanism. Among them, the mounting frame is fixedly connected to the top wall of the working chamber. The screw rod translation mechanism is arranged inside the mounting frame. The horizontal sliding seat is horizontally slidably connected to the bottom of the mounting frame. One end of the horizontal sliding seat penetrates into the inside of the mounting frame and is connected to the screw rod translation mechanism. The electric telescopic rod is fixedly connected to the bottom of the horizontal sliding seat. The negative pressure suction seat is slidably connected to the bottom of the horizontal sliding seat and is fixedly connected to the output end of the electric telescopic rod. The negative pressure suction seat is internally provided with a micro vacuum pump. The blanking conveying mechanism and the feeding conveying mechanism are respectively arranged on the ground and are located outside the frame. The conveying speeds of the blanking conveying mechanism and the feeding conveying mechanism are the same. The controller is respectively connected to the screw rod translation mechanism, the electric telescopic rod, the micro vacuum pump built in the negative pressure suction seat, the blanking conveying mechanism, and the feeding conveying mechanism through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.;

[0010] Specifically, the cleaning rack assembly further includes two groups of electric pressing plate assemblies, which are respectively arranged on the surfaces of the two cleaning frames and are arranged in a staggered manner. The electric pressing plate assembly includes a first fixed seat, a second fixed seat, a pressing plate frame, an elastic key shaft, a fixed key shaft, a first rotating key cylinder, a second rotating key cylinder and a driving motor. Among them, the first fixed seat and the second fixed seat are respectively fixedly connected to the surface of the cleaning frame and are corresponding in position. The pressing plate frame is arranged between the first fixed seat and the second fixed seat. An elastic key shaft and a first rotating key cylinder are respectively arranged at positions corresponding to the surface of the first fixed seat on one end surface of the pressing plate frame. One end of the elastic key shaft is located inside the first rotating key cylinder and is slidably connected to the inner wall of the first rotating key cylinder. A fixed key shaft and a second rotating key cylinder are respectively arranged at positions corresponding to the surface of the second fixed seat on the other end surface of the pressing plate frame. One end of the fixed key shaft is located inside the second rotating key cylinder and is slidably connected to the inner wall of the second rotating key cylinder. The driving motor is fixedly connected to the inner wall of the second fixed seat, and the output end of the driving motor is fixedly connected to one end surface of the second rotating key cylinder. The controller is connected to the driving motor through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0011] Specifically, the cleaning rack assembly further includes a differential, which is fixedly connected to the inner wall of the frame and is located between the double-shaft motor and one of the screw rod lifting mechanisms. The output end of the double-shaft motor is connected to one of the screw rod lifting mechanisms through the differential.

[0012] Specifically, the cleaning rack assembly further includes two infrared rangefinders, which are used to respectively detect the placement states of the frame body and the cover plate in the wafer frame. The two infrared rangefinders are respectively fixedly connected to the top wall of the working chamber and face the cleaning frame. The controller is connected to the two infrared rangefinders through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0013] Specifically, the waste liquid discharge assembly further includes a quick drainage mechanism, which includes a conical drainage base and a negative pressure pump. Among them, the conical drainage base is fixedly connected to the bottom of the cleaning tank body and is communicated with the inside of the cleaning tank body. The negative pressure pump is fixedly connected to the inner wall of the frame. The input end of the negative pressure pump is connected to the output end of the conical drainage base, and the output end of the negative pressure pump is connected to the input end of the main liquid discharge pipeline. The controller is connected to the negative pressure pump through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0014] Specifically, the loading and conveying mechanism further includes a wafer frame detection mechanism, which includes a vertical frame, a first ultrasonic sensor, and a second ultrasonic sensor. Among them, the vertical frame is fixedly connected to the top of the loading and conveying mechanism and corresponds to the position of the working chamber. The first ultrasonic sensor and the second ultrasonic sensor are respectively fixedly connected to the surface of the vertical frame and are arranged up and down along the Z-axis direction. The height of the first ultrasonic sensor is adapted to the height of the frame body in the wafer frame, and the height of the second ultrasonic sensor is adapted to the height of the cover plate in the wafer frame. The controller is connected to the first ultrasonic sensor and the second ultrasonic sensor respectively through an efficient control bus to achieve accurate instruction transmission and comprehensive monitoring of the equipment operation status.

[0015] Additional aspects and advantages of the present invention will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present invention.

[0016] Compared with the prior art, the present invention has the following beneficial effects:

[0017] 1. The structure of the present invention is reasonable. The present invention is provided with a frame, a working chamber, and a cleaning tank body. Compared with the traditional cleaning pool, the tank design significantly reduces the floor area and is more convenient for flexible deployment on the production line, with good use effects.

[0018] 2. The present invention is provided with a controller, a water injection component, a cleaning liquid injection component, and a waste liquid discharge component. The use and timely replacement of the cleaning mixture are precisely managed through the controller, ensuring the stability and consistency of the cleaning process, thereby significantly improving the cleaning quality of the product, achieving an efficient and high-quality cleaning effect, and meeting the high standards of cleanliness and efficiency required by modern production.

[0019] 3. The present invention is provided with a cleaning rack component. The cleaning rack component can not only drive the wafer frame into the cleaning tank body for cleaning operations, but also drive the wafer frame to move up, down, left, and right in the cleaning tank body at a set speed and set number of times. Compared with the fixed position of the crane lifting, moving its position can further improve the cleaning quality of the wafer frame.

[0020] 4. The present invention is provided with an electric pressing plate component, which can fix the wafer frame on the cleaning rack component, effectively improving the stability and safety of the wafer frame during the cleaning process, with good use effects.

[0021] 5. The utility model is provided with a differential mechanism. The differential mechanism precisely regulates the transmission ratio of the dual-axis motor to ensure that the two cleaning frames can independently descend at relatively appropriate moving speeds and accurately locate at different depths in the cleaning tank body. This design not only improves the adaptability of the equipment to the frame and cover plate, but also significantly enhances the flexibility and effect of the cleaning operation, realizing an efficient and precise cleaning process;

[0022] 6. The utility model is provided with two groups of infrared rangefinders, which are used to detect the placement states of the frame and the cover plate in the wafer frame respectively. When the infrared rangefinder detects the frame, it can control the water injection component and the cleaning liquid injection component to operate, and first inject liquid into the left cleaning tank body. When the infrared rangefinder detects the cover plate, it can control the water injection component and the cleaning liquid injection component to operate, and then inject liquid into the right cleaning tank body. Since the internal space of the right cleaning tank body is smaller than that of the left cleaning tank body, injecting liquid into the left cleaning tank body first can effectively shorten the liquid injection time, improve the liquid injection efficiency, and has a good use effect;

[0023] 7. The utility model is provided with a rapid drainage mechanism. The rapid drainage mechanism utilizes gravity acceleration and negative pressure suction technologies to quickly drain the cleaning mixture in the cleaning tank body after cleaning, reducing the drainage time and improving the cleaning efficiency;

[0024] 8. The utility model is provided with a loading and unloading component, which can automatically and accurately place the frame and the cover plate of the wafer frame on the two cleaning frames respectively, realizing the full-automatic loading and unloading process of the wafer frame. This design not only greatly improves the working efficiency, effectively replaces the traditional manual operation mode, but also significantly reduces the complexity and error rate of manual operation, ensuring the smoothness and accuracy of the production process, thus achieving a more excellent use effect;

[0025] 9. The utility model is provided with a wafer frame detection mechanism. The heights of the first ultrasonic sensor and the second ultrasonic sensor in the wafer frame detection mechanism respectively correspond to the height of the frame and the height of the cover plate in the wafer frame, so as to detect the sequence of the frame and the cover plate. Through the mutual cooperation of the first ultrasonic sensor and the second ultrasonic sensor, it can also be used to detect whether there is a material at the current loading position, so as to judge the loading situation, and has a good use effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The above-mentioned and / or additional aspects and advantages of the utility model will become obvious and easy to understand from the following description of the embodiments in conjunction with the drawings, where:

[0027] Figure 1 is a schematic structural diagram of an integrated automatic wafer frame cleaning machine of the utility model;

[0028] Figure 2 Schematic diagram of the cleaning rack assembly structure in an integrated wafer frame automatic cleaning machine of the present utility model;

[0029] Figure 3 Schematic diagram of the electric pressing plate assembly structure in an integrated wafer frame automatic cleaning machine of the present utility model;

[0030] Figure 4 Schematic diagram of the screw rod lifting mechanism structure in an integrated wafer frame automatic cleaning machine of the present utility model;

[0031] Figure 5 Schematic diagram of the cleaning tank assembly structure in an integrated wafer frame automatic cleaning machine of the present utility model;

[0032] Figure 6 Schematic diagram of the loading and unloading assembly structure in an integrated wafer frame automatic cleaning machine of the present utility model;

[0033] Figure 7 Schematic diagram of the wafer frame detection mechanism structure in an integrated wafer frame automatic cleaning machine of the present utility model.

[0034] As shown in the figure:

[0035] 1. Frame; 2. Controller; 3. Cleaning rack assembly; 4. Cleaning tank assembly; 5. Loading and unloading assembly; 10. Infrared rangefinder; 11. Working chamber;

[0036] 31. Lifting slide seat; 32. Cleaning frame; 34. Electric push rod; 35. Screw rod lifting mechanism; 36. Biaxial motor;

[0037] 351. Fixed frame; 352. Threaded screw rod; 353. First bevel gear; 354. Second bevel gear;

[0038] 41. Cleaning tank body; 42. Liquid level sensor; 43. Concentration sensor; 44. Ultrasonic generator; 45. Water injection assembly; 46. Cleaning liquid injection assembly; 47. Waste liquid discharge assembly;

[0039] 451. Main liquid inlet pipeline; 452. Liquid inlet solenoid valve; 453. Flow detector; 454. Liquid distribution end seat; 455. Liquid storage tank;

[0040] 471. Main liquid discharge pipeline; 472. Liquid discharge solenoid valve; 473. Waste liquid storage tank;

[0041] 51. Mounting frame; 52. Screw rod translation mechanism; 53. Horizontal slide seat; 54. Electric telescopic rod; 55. Negative pressure suction seat; 56. Unloading conveying mechanism; 57. Loading conveying mechanism;

[0042] 33. Electric pressure plate assembly; 331. First fixed seat; 332. Second fixed seat; 333. Pressure plate frame; 334. Elastic key shaft; 335. Fixed key shaft; 336. First rotating key cylinder; 337. Second rotating key cylinder; 338. Driving motor;

[0043] 37. Differential;

[0044] 48. Quick drainage mechanism; 481. Conical drainage base; 482. Negative pressure pump;

[0045] 100. Wafer frame detection mechanism; 101. Upright frame; 102. First ultrasonic sensor; 103. Second ultrasonic sensor. Detailed implementation manners

[0046] The embodiments of the present utility model will be described in detail below. The examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions from beginning to end. The embodiments described below with reference to the drawings are exemplary and are intended to explain the present utility model, and should not be construed as a limitation to the present utility model. On the contrary, the embodiments of the present utility model include all changes, modifications and equivalents falling within the spirit and scope of the appended claims.

[0047] An integrated wafer frame automatic cleaning machine according to an embodiment of the present utility model will be described below with reference to the drawings.

[0048] As Figures 1 - 7 shown, an integrated wafer frame automatic cleaning machine according to an embodiment of the present utility model includes a frame 1, a controller 2, a cleaning frame assembly 3, a cleaning tank assembly 4 and a loading and unloading assembly 5. Among them, the frame 1 is vertically arranged on the ground, and a working cavity 11 is opened on the middle end surface of the frame 1; the cleaning frame assembly 3 is arranged on the inner side wall of the working cavity 11; the loading and unloading assembly 5 and the cleaning tank assembly 4 are respectively arranged on the inner bottom wall and the inner top wall of the working cavity 11; the controller 2 is arranged on the upper end surface of the frame 1, and the controller 2 is seamlessly connected to an external power supply by a standardized power plug. The controller 2 is respectively connected to the cleaning frame assembly 3, the cleaning tank assembly 4 and the loading and unloading assembly 5 through an efficient control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0049] It should be noted that the wafer frame is composed of a frame body and a cover plate.

[0050] It should also be noted that the controller 2 is a prior art, so it will not be described in detail here.

[0051] Specifically, during use, the loading and unloading component 5 operates according to instructions and places the wafer frame to be cleaned on the cleaning rack component 3. Then, the water injection component 45 and the cleaning liquid injection component 46 operate according to instructions and inject a set amount of water and cleaning liquid into the cleaning tank body 41 respectively. During this process, the ultrasonic generator 44 operates according to instructions and emits ultrasonic waves to improve the mixing efficiency of water and cleaning liquid. The liquid level sensor 42 operates according to instructions and real-time detects the liquid level situation inside the cleaning tank body 41. The concentration sensor 43 operates according to instructions and real-time detects the concentration of the cleaning mixture to judge the mixing effect of water and cleaning liquid. When all the water and cleaning liquid are injected, and the concentration sensor 43 detects that the cleaning mixture is in the optimal use state, the cleaning rack component 3 operates according to instructions and drives the wafer frame into the cleaning tank body 41 for ultrasonic cleaning, and drives the wafer frame to move up, down, left and right at a set speed and set number of times, and drives the wafer frame out of the cleaning tank body 41 after cleaning. After the cleaning rack component 3 drives the wafer frame out of the cleaning tank body 41 according to instructions, the loading and unloading component 5 operates according to instructions and removes the cleaned wafer frame from the cleaning rack component 3. Then, the rapid drainage mechanism 48 and the waste liquid discharge component 47 operate according to instructions and quickly discharge the cleaning mixture inside the cleaning tank body 41. When the liquid level sensor 42 detects that all the cleaning mixture inside the cleaning tank body 41 has been discharged, the loading and unloading component 5 operates according to instructions and places the next group of wafer frames to be cleaned on the cleaning rack component 3, and so on until all the wafer frames to be cleaned are cleaned up.

[0052] In an embodiment of the present invention, as Figures 1 - 6As shown in the figure, the cleaning rack assembly 3 includes a lifting slide base 31, a cleaning frame 32, an electric push rod 34, a screw rod lifting mechanism 35 and a double-shaft motor 36. Among them, the lifting slide base 31 is symmetrically and vertically slidably connected to the inner wall of the working chamber 11, the cleaning frame 32 is horizontally slidably connected to the outer surface of the lifting slide base 31, the electric push rod 34 is fixedly connected to the outer surface of the lifting slide base 31 and fixedly connected to one end of the cleaning frame 32. The screw rod lifting mechanism 35 is symmetrically and fixedly connected to the inner wall of the machine frame 1 and corresponds to the position of the lifting slide base 31. One end of the lifting slide base 31 penetrates into the interior of the machine frame 1 and is connected to the screw rod lifting mechanism 35. The double-shaft motor 36 is fixedly connected to the inner wall of the machine frame 1 and is located between the two screw rod lifting mechanisms 35. Both ends of the double-shaft motor 36 are respectively connected to the two screw rod lifting mechanisms 35. The controller 2 is respectively connected to the electric push rod 34 and the double-shaft motor 36 through a high-efficiency control bus to achieve precise command transmission and comprehensive monitoring of the equipment operation status. The screw rod lifting mechanism 35 includes a fixed frame 351, a threaded screw rod 352, a first bevel gear 353 and a second bevel gear 354. Among them, the fixed frame 351 is fixedly connected to the inner wall of the machine frame 1 and corresponds to the position of the lifting slide base 31. The threaded screw rod 352 is rotatably connected to the inner wall of the fixed frame 351. One end of the lifting slide base 31 penetrates into the interior of the fixed frame 351 and is threadedly connected to the outer surface of the threaded screw rod 352. The first bevel gear 353 is fixedly connected to the top of the threaded screw rod 352. The second bevel gear 354 is rotatably connected to the inner wall of the fixed frame 351 and meshes with the first bevel gear 353. The output end of the double-shaft motor 36 is fixedly connected to one end of the central axis of the first bevel gear 353 through a coupling. The cleaning tank assembly 4 includes a cleaning tank body 41, a liquid level sensor 42, a concentration sensor 43, an ultrasonic generator 44, a water injection assembly 45, a cleaning liquid injection assembly 46 and a waste liquid discharge assembly 47. Among them, the cleaning tank body 41 is symmetrically and fixedly connected to the inner bottom wall of the working chamber 11 and corresponds to the position of the cleaning frame 32. The liquid level sensor 42, the concentration sensor 43 and the ultrasonic generator 44 are respectively fixedly connected to the inner wall of the cleaning tank body 41. The water injection assembly 45, the cleaning liquid injection assembly 46 and the waste liquid discharge assembly 47 are arranged on the inner wall of the machine frame 1 in sequence from top to bottom along the Z-axis direction. One end of the water injection assembly 45 and one end of the cleaning liquid injection assembly 46 are respectively communicated with the upper end of the inner cavity of the cleaning tank body 41. One end of the waste liquid discharge assembly 47 is communicated with the bottom of the inner cavity of the cleaning tank body 41. The controller 2 is respectively connected to the liquid level sensor 42, the concentration sensor 43, the ultrasonic generator 44, the water injection assembly 45, the cleaning liquid injection assembly 46 and the waste liquid discharge assembly 47 through a high-efficiency control bus to achieve precise command transmission and comprehensive monitoring of the equipment operation status;The water injection component 45 has the same structure as the cleaning liquid injection component 46. The water injection component 45 includes two groups of main liquid inlet pipes 451, liquid inlet solenoid valves 452, flow detectors 453, two groups of liquid distribution end seats 454, and a liquid storage tank 455. Among them, the two groups of liquid distribution end seats 454, the two groups of main liquid inlet pipes 451, and the liquid storage tank 455 are respectively arranged on the inner wall of the frame 1. The liquid inlet solenoid valves 452 and the flow detectors 453 are respectively fixedly connected to the two groups of main liquid inlet pipes 451. The output ends of the two groups of main liquid inlet pipes 451 are respectively connected to the input ends of the two groups of liquid distribution end seats 454. The input ends of the two groups of main liquid inlet pipes 451 are respectively connected to the output end of the liquid storage tank 455. The output ends of the two groups of liquid distribution end seats 454 are respectively communicated with the upper ends of the inner cavities of the two groups of cleaning tanks 41; The waste liquid discharge component 47 includes two groups of main liquid discharge pipes 471, liquid discharge solenoid valves 472, and a waste liquid storage tank 473. Among them, the two groups of main liquid discharge pipes 471 and the waste liquid storage tank 473 are respectively arranged on the inner wall of the frame 1. The input ends of the two groups of main liquid discharge pipes 471 are respectively communicated with the bottoms of the inner cavities of the two groups of cleaning tanks 41. The output ends of the two groups of main liquid discharge pipes 471 are respectively communicated with the inside of the waste liquid storage tank 473. The liquid discharge solenoid valves 472 are respectively fixedly connected to the two groups of main liquid discharge pipes 471; The controller 2 is respectively connected to the liquid inlet solenoid valve 452, the flow detector 453, and the liquid discharge solenoid valve 472 through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the operating state of the equipment; The loading and unloading component 5 includes a mounting frame 51, a lead screw translation mechanism 52, a horizontal sliding seat 53, an electric telescopic rod 54, a negative pressure suction seat 55, a blanking conveying mechanism 56, and a feeding conveying mechanism 57. Among them, the mounting frame 51 is fixedly connected to the inner top wall of the working chamber 11. The lead screw translation mechanism 52 is arranged inside the mounting frame 51. The horizontal sliding seat 53 is horizontally slidably connected to the bottom of the mounting frame 51. One end of the horizontal sliding seat 53 penetrates into the inside of the mounting frame 51 and is connected to the lead screw translation mechanism 52. The electric telescopic rod 54 is fixedly connected to the bottom of the horizontal sliding seat 53. The negative pressure suction seat 55 is slidably connected to the bottom of the horizontal sliding seat 53 and is fixedly connected to the output end of the electric telescopic rod 54. A micro vacuum pump is built in the negative pressure suction seat 55. The blanking conveying mechanism 56 and the feeding conveying mechanism 57 are respectively arranged on the ground and are located outside the frame 1. The conveying speeds of the blanking conveying mechanism 56 and the feeding conveying mechanism 57 are the same. The controller 2 is respectively connected to the lead screw translation mechanism 52, the electric telescopic rod 54, the micro vacuum pump built in the negative pressure suction seat 55, the blanking conveying mechanism 56, and the feeding conveying mechanism 57 through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the operating state of the equipment.;

[0053] It should be noted that the lead screw translation mechanism 52 described in this embodiment is equipped with a rotating motor by itself. The controller 2 is connected to the rotating motor through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the operating state of the equipment. A negative pressure groove is opened at the bottom of the negative pressure suction seat 55. In the initial state, the frame and the cover plate are evenly arranged on the feeding conveying mechanism 57.

[0054] It should also be noted that the electric push rod 34, the double-shaft motor 36, the liquid level sensor 42, the concentration sensor 43, the ultrasonic generator 44, the liquid inlet solenoid valve 452, the flow detector 453, the liquid discharge solenoid valve 472, the motors in the lead screw translation mechanism 52, the electric telescopic rod 54, the micro vacuum pump in the negative pressure suction seat 55, the blanking conveying mechanism 56, and the feeding conveying mechanism 57 described in this embodiment are all prior arts, so they will not be elaborated here.

[0055] It can be understood that in order to facilitate the timely replenishment of the cleaning liquid, a cleaning liquid automatic replenishment mechanism (not shown in the figure) is provided on the frame 1. The output end of the cleaning liquid automatic replenishment mechanism (not shown in the figure) is connected to the inside of the liquid storage tank 455 in the cleaning liquid injection assembly 46. To prevent the waste liquid storage tank 473 from being full, an automatic liquid discharge mechanism (not shown in the figure) is provided on the frame 1. The controller 2 is respectively connected to the cleaning liquid automatic replenishment mechanism (not shown in the figure) and the automatic liquid discharge mechanism (not shown in the figure) through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0056] Specifically, the structures and connection relationships of the cleaning rack assembly 3, the cleaning tank assembly 4, and the loading and unloading assembly 5 are further described. During use, the loading conveyor mechanism 57 operates according to instructions, transporting the cover plate and the frame body on it forward by one station as a whole. Then, the lead screw translation mechanism 52 operates according to instructions, driving the horizontal slide 53, the electric telescopic rod 54, and the negative pressure suction seat 55 to move to the position of the frame body. Then, the electric telescopic rod 54 operates according to instructions, driving the negative pressure suction seat 55 to descend until it contacts the top of the frame body. Then, the micro vacuum pump inside the negative pressure suction seat 55 operates according to instructions, extracting the air inside the negative pressure tank at the bottom of the negative pressure suction seat 55 to make it in a negative pressure state, thereby tightly adsorbing the top of the frame body. Then, the electric telescopic rod 54 operates according to instructions, driving the frame body to rise. Then, the lead screw translation mechanism 52 operates according to instructions, driving the horizontal slide 53, the electric telescopic rod 54, the negative pressure suction seat 55, and the frame body to move to the position of the left cleaning frame 32. Then, the electric telescopic rod 54 operates according to instructions, driving the frame body to descend until the frame body is placed on the left cleaning frame 32. Then, the micro vacuum pump stops operating according to instructions, separating the bottom of the negative pressure suction seat 55 from the top of the frame body. Then, the electric telescopic rod 54 operates according to instructions, driving the negative pressure suction seat 55 to reset. Then, the loading conveyor mechanism 57 operates according to instructions, transporting the cover plate and the frame body on it forward by one station as a whole again. Then, the lead screw translation mechanism 52 operates according to instructions, driving the horizontal slide 53, the electric telescopic rod 54, and the negative pressure suction seat 55 to move to the position of the cover plate. Then, the above operations are repeated to place the cover plate on the right cleaning frame 32. After the cover plate is placed, then the micro vacuum pump stops operating according to instructions, separating the bottom of the negative pressure suction seat 55 from the top of the cover plate. Then, the electric telescopic rod 54 operates according to instructions, driving the negative pressure suction seat 55 to reset. After the negative pressure suction seat 55 resets, then the inlet solenoid valve 452 and the flow detector 453 in the water injection component 45 and the cleaning liquid injection component 46 operate according to instructions. The inlet solenoid valve 452 opens to allow water and cleaning liquid to flow into the inside of the cleaning tank body 41 respectively. The flow detector 453 then monitors the flow rates of water and cleaning liquid in real time. When it is detected that the flow rates of water and cleaning liquid reach the set values, the inlet solenoid valve 452 stops operating according to instructions, thereby controlling the ratio of water and cleaning liquid entering the inside of the cleaning tank body 41. By injecting a set amount of water and cleaning liquid into the cleaning tank body 41 respectively, it ensures that the cleaning mixture is in the best state, guaranteeing the stability and consistency of the cleaning process, and thus significantly improving the cleaning quality of the product. During this process, the ultrasonic generator 44 operates according to instructions and emits ultrasonic waves to improve the mixing efficiency of water and cleaning liquid. The liquid level sensor 42 operates according to instructions, detecting the liquid level situation inside the cleaning tank body 41 in real time. The concentration sensor 43 operates according to instructions, detecting the concentration of the cleaning mixture in real time to judge the mixing effect of water and cleaning liquid. When all the water and cleaning liquid are injected, and the concentration sensor 43 detects that the cleaning mixture is in the best use state, the double-shaft motor 36 operates according to instructions,And synchronously drive the operation of two sets of screw rod lifting mechanisms 35. The operation of the screw rod lifting mechanisms 35 drives the lifting slide seat 31 to descend. The descent of the lifting slide seat 31 synchronously drives the cleaning frame 32 into the interior of the cleaning tank body 41. The entry of the cleaning frame 32 into the interior of the cleaning tank body 41 synchronously drives the frame body and the cover plate into the interior of the cleaning tank body 41 for ultrasonic cleaning operation. During the cleaning process, the dual-axis motor 36 is used in cooperation with the screw rod lifting mechanisms 35, and can drive the frame body and the cover plate to move up and down inside the cleaning tank body 41 at a set speed and for a set number of times. After the up and down movement is completed, the electric push rod 34 operates according to the instruction, and drives the frame body and the cover plate to move left and right inside the cleaning tank body 41 at a set speed and for a set number of times. After the left and right movement is completed, the dual-axis motor 36 is used in cooperation with the screw rod lifting mechanisms 35 to drive the cover plate and the frame body out of the exterior of the cleaning tank body 41. After the cover plate and the frame body are moved out of the exterior of the cleaning tank body 41, the blanking conveying mechanism 56 operates according to the instruction, and conveys the cover plate and the frame body on it backward by one station as a whole. Then the screw rod translation mechanism 52 operates according to the instruction, drives the horizontal slide seat 53, the electric telescopic rod 54 and the negative pressure suction seat 55 to move to the position of the frame body. Then the electric telescopic rod 54 operates according to the instruction, drives the negative pressure suction seat 55 to descend until it contacts the top of the frame body. Then the micro vacuum pump inside the negative pressure suction seat 55 operates according to the instruction, extracts the air inside the negative pressure tank at the bottom of the negative pressure suction seat 55, making it in a negative pressure state, so as to tightly adsorb the top of the frame body. Then the electric telescopic rod 54 operates according to the instruction, drives the frame body to rise. Then the screw rod translation mechanism 52 operates according to the instruction, drives the horizontal slide seat 53, the electric telescopic rod 54, the negative pressure suction seat 55 and the frame body to move to the position of the blanking conveying mechanism 56. Then the electric telescopic rod 54 operates according to the instruction, drives the frame body to descend until the frame body is placed on the blanking conveying mechanism 56. Then the electric telescopic rod 54 operates according to the instruction, drives the negative pressure suction seat 55 to reset. Then the blanking conveying mechanism 56 operates according to the instruction, conveys the cover plate and the frame body as a whole backward by one more station. Then the screw rod translation mechanism 52 operates according to the instruction, repeats the above operation, and places the cover plate on the blanking conveying mechanism 56. During this process, the drain solenoid valve 472 operates according to the instruction, so that the cleaning mixture inside the cleaning tank body 41 is discharged through the main drain pipe 471 into the waste liquid storage tank 473 for collection. When the liquid level sensor 42 detects that all the cleaning mixture inside the cleaning tank body 41 has been discharged, the feeding conveying mechanism 57 operates according to the instruction, conveys the cover plate and the frame body on it forward by one station as a whole. Then repeat the above operation until all the frame bodies and cover plates are cleaned.

[0057] In an embodiment of the present utility model, as Figure 3As shown in the figure, the cleaning rack assembly 3 further includes two sets of electric pressing plate assemblies 33. The two sets of electric pressing plate assemblies 33 are respectively arranged on the surfaces of the two sets of cleaning frames 32 and are arranged in a staggered manner. The electric pressing plate assembly 33 includes a first fixed seat 331, a second fixed seat 332, a pressing plate frame 333, an elastic key shaft 334, a fixed key shaft 335, a first rotating key cylinder 336, a second rotating key cylinder 337 and a driving motor 338. Among them, the first fixed seat 331 and the second fixed seat 332 are respectively fixedly connected to the surface of the cleaning frame 32 and are corresponding in position. The pressing plate frame 333 is arranged between the first fixed seat 331 and the second fixed seat 332. An elastic key shaft 334 and a first rotating key cylinder 336 are respectively arranged at the positions corresponding to the surface of the first fixed seat 331 on one end surface of the pressing plate frame 333. One end of the elastic key shaft 334 is located inside the first rotating key cylinder 336 and is slidably connected to the inner wall of the first rotating key cylinder 336. A fixed key shaft 335 and a second rotating key cylinder 337 are respectively arranged at the positions corresponding to the surface of the second fixed seat 332 on the other end surface of the pressing plate frame 333. One end of the fixed key shaft 335 is located inside the second rotating key cylinder 337 and is slidably connected to the inner wall of the second rotating key cylinder 337. The driving motor 338 is fixedly connected to the inner wall of the second fixed seat 332, and the output end of the driving motor 338 is fixedly connected to one end surface of the second rotating key cylinder 337. The controller 2 is connected to the driving motor 338 through a high-efficiency control bus to achieve accurate instruction transmission and comprehensive monitoring of the equipment operation status.

[0058] It should be noted that the driving motor 338 described in this embodiment is a stepping motor. The stepping motor is a prior art, so it will not be elaborated here.

[0059] Specifically, further illustrate the structure and connection relationship of the electric pressing plate assembly 33. The electric pressing plate assembly 33 is set to fix the cover plate and the frame body, effectively improving the stability and safety of the cover plate and the frame body during the cleaning process, and having a good use effect. When in use, the driving motor 338 operates according to the instruction and drives the second rotating key cylinder 337 to rotate to a set angle. The rotation of the second rotating key cylinder 337 synchronously drives the fixed key shaft 335, the pressing plate frame 333, the elastic key shaft 334 and the first rotating key cylinder 336 to rotate. When the pressing plate frame 333 contacts and compresses the top of the cover plate and the frame body, the driving motor 338 stops operating according to the instruction.

[0060] In an embodiment of the present utility model, as Figure 2 shown, the cleaning rack assembly 3 further includes a differential 37. The differential 37 is fixedly connected to the inner wall of the frame 1 and is located between the dual-axis motor 36 and one of the screw rod lifting mechanisms 35. The output end of the dual-axis motor 36 is connected to one of the screw rod lifting mechanisms 35 through the differential 37.

[0061] It should be noted that in order to reduce resource consumption, the depth of the cleaning tank body 41 of the cleaning cover plate is less than the depth of the cleaning tank body 41 of the cleaning frame body.

[0062] Specifically, in order to adjust the descending speed of the cover plate and the frame body, a differential 37 is specially provided. The differential 37 ensures that the two groups of cleaning frames 32 can independently descend at a relatively adaptable moving speed through precisely regulating the transmission ratio of the double-shaft motor 36, and accurately locate at different depth positions in the cleaning tank body 41. This design not only improves the adaptability of the equipment to the frame body and the cover plate, but also significantly enhances the flexibility and effect of the cleaning operation, realizing an efficient and delicate cleaning process.

[0063] In an embodiment of the present utility model, as Figure 2 shown, the cleaning rack assembly 3 further includes two groups of infrared rangefinders 10. The two groups of infrared rangefinders 10 are used to respectively detect the placement states of the frame body and the cover plate in the wafer frame. The two groups of infrared rangefinders 10 are respectively fixedly connected to the inner top wall of the working chamber 11 and face the cleaning frame 32. The controller 2 is connected to the two groups of infrared rangefinders 10 through an efficient control bus respectively, realizing precise command transmission and comprehensive monitoring of the equipment operation state.

[0064] It should be noted that the infrared rangefinder 10 is a prior art, so it will not be elaborated here.

[0065] Specifically, the two groups of infrared rangefinders 10 are used to respectively detect the placement states of the frame body and the cover plate in the wafer frame. When the infrared rangefinder 10 detects the frame body, it can control the operation of the water injection assembly 45 and the cleaning liquid injection assembly 46, and first inject liquid into the left cleaning tank body 41. When the infrared rangefinder 10 detects the cover plate, it can control the operation of the water injection assembly 45 and the cleaning liquid injection assembly 46, and then inject liquid into the right cleaning tank body 41. Since the internal space of the right cleaning tank body 41 is smaller than that of the left cleaning tank body 41, injecting liquid into the left cleaning tank body 41 first can effectively shorten the overall liquid injection time, improve the liquid injection efficiency, and has a good use effect.

[0066] In an embodiment of the present utility model, as Figure 5 shown, the waste liquid discharge assembly 47 further includes a quick drainage mechanism 48. The quick drainage mechanism 48 includes a conical drainage base 481 and a negative pressure pump 482. Among them, the conical drainage base 481 is fixedly connected to the bottom of the cleaning tank body 41 and is communicated with the inside of the cleaning tank body 41. The negative pressure pump 482 is fixedly connected to the inner wall of the frame 1. The input end of the negative pressure pump 482 is connected to the output end of the conical drainage base 481. The output end of the negative pressure pump 482 is connected to the input end of the main drainage pipe 471. The controller 2 is connected to the negative pressure pump 482 through an efficient control bus, realizing precise command transmission and comprehensive monitoring of the equipment operation state.

[0067] It should be noted that the negative pressure pump 482 described in this embodiment is a prior art, so it will not be elaborated here.

[0068] Specifically, the rapid drainage mechanism 48 utilizes gravity acceleration and negative pressure suction technologies to quickly drain the cleaning mixture in the cleaning tank body 41 after cleaning is completed, reducing the drainage time and improving the cleaning efficiency.

[0069] In an embodiment of the present invention, as Figures 6 - 7 shown, the loading and conveying mechanism 57 further includes a wafer cassette detection mechanism 100. The wafer cassette detection mechanism 100 includes a vertical frame 101, a first ultrasonic sensor 102, and a second ultrasonic sensor 103. Among them, the vertical frame 101 is fixedly connected to the top of the loading and conveying mechanism 57 and corresponds to the position of the working chamber 11. The first ultrasonic sensor 102 and the second ultrasonic sensor 103 are respectively fixedly connected to the surface of the vertical frame 101 and are arranged up and down along the Z-axis direction. The height of the first ultrasonic sensor 102 is adapted to the height of the frame body in the wafer cassette, and the height of the second ultrasonic sensor 103 is adapted to the height of the cover plate in the wafer cassette. The controller 2 is respectively connected to the first ultrasonic sensor 102 and the second ultrasonic sensor 103 through a high-efficiency control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

[0070] It should be noted that the first ultrasonic sensor 102 and the second ultrasonic sensor 103 described in this embodiment are both prior arts, so they will not be elaborated here.

[0071] Specifically, the height of the first ultrasonic sensor 102 and the height of the second ultrasonic sensor 103 in the wafer cassette detection mechanism 100 respectively correspond to the height of the frame body and the cover plate in the wafer cassette, so as to detect the sequence of the frame body and the cover plate. Through the cooperation of the first ultrasonic sensor 102 and the second ultrasonic sensor 103, it can also be used to detect whether there is a material at the current loading position, so as to judge the loading situation, and the use effect is good.

[0072] In summary, an integrated wafer cassette automatic cleaning machine according to an embodiment of the present invention has a significantly reduced floor area in the tank design compared with a traditional cleaning tank and is more convenient for flexible deployment on a production line. Among them, the use and timely replacement of the cleaning liquid are precisely managed through the controller 2, ensuring the stability and consistency of the cleaning process, and thus significantly improving the cleaning quality of the product, and the use effect is good.

[0073] In the description of this specification, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present utility model, "a plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

[0074] In the description of this specification, the description with reference to terms such as "one embodiment", "some embodiments", "examples", "specific examples", or "some examples", etc. means that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples described in this specification and the features of different embodiments or examples.

[0075] Although the embodiments of the present utility model have been shown and described above, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present utility model. Those of ordinary skill in the art can make changes, modifications, substitutions, and variations to the above embodiments within the scope of the present utility model.

Claims

1. An integrated wafer frame automatic cleaning machine, characterized in that: It comprises a frame (1), a controller (2), a cleaning frame assembly (3), a cleaning tank assembly (4) and a loading and unloading assembly (5), wherein: The frame (1) is vertically arranged on the ground, and a working cavity (11) is provided on the middle surface of the frame (1); The cleaning rack assembly (3) is arranged on the inner wall of the working chamber (11); The loading and unloading assembly (5) and the cleaning tank assembly (4) are respectively arranged on the inner bottom wall of the working chamber (11) and the inner top wall of the working chamber (11); The controller (2) is arranged on the upper surface of the frame (1). The controller (2) uses a standardized power plug to seamlessly connect to an external power supply. The controller (2) is connected to the cleaning rack assembly (3), the cleaning tank assembly (4) and the loading and unloading assembly (5) respectively through an efficient control bus, thereby achieving accurate command transmission and comprehensive monitoring of the equipment operation status.

2. The integrated wafer frame automatic cleaning machine according to claim 1, characterized in that: The cleaning rack assembly (3) comprises a lifting slide (31), a cleaning frame (32), an electric push rod (34), a screw lifting mechanism (35) and a dual-axis motor (36), wherein the lifting slide (31) is symmetrically and vertically slidably connected to the inner wall of the working chamber (11), the cleaning frame (32) is horizontally and slidably connected to the outer surface of the lifting slide (31), the electric push rod (34) is fixedly connected to the outer surface of the lifting slide (31) and is fixedly connected to one end of the cleaning frame (32), and the screw lifting mechanism (35) is symmetrically and fixedly connected to the inner wall of the frame (1). The lifting slide (31) is located in correspondence with the position of the lifting slide (31), one end of the lifting slide (31) penetrates into the interior of the frame (1) and is connected to the screw lifting mechanism (35), the dual-axis motor (36) is fixedly connected to the inner wall of the frame (1) and is located between the two sets of the screw lifting mechanisms (35), the two ends of the dual-axis motor (36) are respectively connected to the two sets of the screw lifting mechanisms (35), and the controller (2) is respectively connected to the electric push rod (34) and the dual-axis motor (36) through an efficient control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment operation status; The screw lifting mechanism (35) comprises a fixed frame (351), a threaded screw (352), a first bevel gear (353) and a second bevel gear (354), wherein the fixed frame (351) is fixedly connected to the inner wall of the frame (1) and corresponds to the position of the lifting slide (31); the threaded screw (352) is rotatably connected to the inner wall of the fixed frame (351); one end of the lifting slide (31) penetrates into the interior of the fixed frame (351) and is threadedly connected to the outer surface of the threaded screw (352); the first bevel gear (353) is fixedly connected to the top of the threaded screw (352); the second bevel gear (354) is rotatably connected to the inner wall of the fixed frame (351) and meshes with the first bevel gear (353); and the output end of the dual-axis motor (36) is fixedly connected to one end of the central axis of the first bevel gear (353) via a coupling; The cleaning tank assembly (4) comprises a cleaning tank body (41), a liquid level sensor (42), a concentration sensor (43), an ultrasonic generator (44), a water injection assembly (45), a cleaning liquid injection assembly (46) and a waste liquid discharge assembly (47), wherein the cleaning tank body (41) is symmetrically fixedly connected to the inner bottom wall of the working chamber (11) and corresponds to the position of the cleaning frame (32); the liquid level sensor (42), the concentration sensor (43) and the ultrasonic generator (44) are respectively fixedly connected to the inner wall of the cleaning tank body (41); the water injection assembly (45), the cleaning liquid injection assembly (46) and the waste liquid discharge assembly (47) are respectively fixedly connected to the inner wall of the cleaning tank body (41); 47) are sequentially arranged on the inner wall of the frame (1) from top to bottom along the Z-axis direction, one end of the water injection assembly (45) and one end of the cleaning liquid injection assembly (46) are respectively connected to the upper end of the inner cavity of the cleaning tank body (41), one end of the waste liquid discharge assembly (47) is connected to the bottom of the inner cavity of the cleaning tank body (41), and the controller (2) is respectively connected to the liquid level sensor (42), the concentration sensor (43), the ultrasonic generator (44), the water injection assembly (45), the cleaning liquid injection assembly (46) and the waste liquid discharge assembly (47) through an efficient control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status; The water injection assembly (45) has the same structure as the cleaning liquid injection assembly (46), and comprises two groups of liquid inlet main pipes (451), a liquid inlet solenoid valve (452), a flow detector (453), two groups of liquid separation end seats (454) and a liquid storage tank (455), wherein the two groups of the liquid separation end seats (454), the two groups of the liquid inlet main pipes (451) and the liquid storage tank (455) are respectively arranged on the inner wall of the frame (1), and the liquid inlet solenoid valve (452) is arranged on the inner wall of the frame (1). The valve (452) and the flow detector (453) are respectively fixedly connected to the two groups of the liquid inlet main pipes (451); the output ends of the two groups of the liquid inlet main pipes (451) are respectively connected to the input ends of the two groups of the liquid separation end seats (454); the input ends of the two groups of the liquid inlet main pipes (451) are respectively connected to the output ends of the liquid storage tank (455); and the output ends of the two groups of the liquid separation end seats (454) are respectively connected to the upper ends of the inner cavities of the two groups of the cleaning tank bodies (41); The waste liquid discharge assembly (47) comprises two groups of liquid discharge main pipes (471), a liquid discharge solenoid valve (472) and a waste liquid storage tank (473), wherein the two groups of liquid discharge main pipes (471) and the waste liquid storage tank (473) are respectively arranged on the inner wall of the frame (1), the input ends of the two groups of liquid discharge main pipes (471) are respectively connected to the bottom of the inner cavity of the two groups of cleaning tank bodies (41), the output ends of the two groups of liquid discharge main pipes (471) are respectively connected to the inside of the waste liquid storage tank (473), and the liquid discharge solenoid valve (472) is respectively fixedly connected to the two groups of liquid discharge main pipes (471); The controller (2) is connected to the liquid inlet solenoid valve (452), the flow detector (453) and the liquid discharge solenoid valve (472) respectively through an efficient control bus, so as to achieve accurate command transmission and comprehensive monitoring of the equipment operation status; The loading and unloading assembly (5) comprises a mounting frame (51), a screw translation mechanism (52), a horizontal slide (53), an electric telescopic rod (54), a negative pressure suction seat (55), a loading and unloading conveying mechanism (56) and a loading and unloading conveying mechanism (57), wherein the mounting frame (51) is fixedly connected to the top wall of the working chamber (11), the screw translation mechanism (52) is arranged inside the mounting frame (51), the horizontal slide (53) is horizontally slidably connected to the bottom of the mounting frame (51), one end of the horizontal slide (53) passes through the inside of the mounting frame (51) and is connected to the screw translation mechanism (52), the electric telescopic rod (54) is fixedly connected to the bottom of the horizontal slide (53), and the negative pressure suction seat (55) is fixedly connected to the bottom of the horizontal slide (53). 5) is slidably connected to the bottom of the horizontal slide (53) and fixedly connected to the output end of the electric telescopic rod (54); the negative pressure suction seat (55) is equipped with a micro vacuum pump; the unloading conveying mechanism (56) and the loading conveying mechanism (57) are respectively arranged on the ground and located outside the frame (1); the unloading conveying mechanism (56) and the loading conveying mechanism (57) have the same conveying rate; the controller (2) is respectively connected to the screw translation mechanism (52), the electric telescopic rod (54), the micro vacuum pump built into the negative pressure suction seat (55), the unloading conveying mechanism (56) and the loading conveying mechanism (57) through an efficient control bus, so as to realize accurate command transmission and comprehensive monitoring of the equipment operation status.

3. The integrated wafer frame automatic cleaning machine according to claim 2, characterized in that: The cleaning frame assembly (3) further comprises two groups of electric pressure plate assemblies (33), the two groups of electric pressure plate assemblies (33) are respectively arranged on the surfaces of the two groups of cleaning frames (32) and are arranged in a staggered manner, the electric pressure plate assembly (33) comprises a first fixed seat (331), a second fixed seat (332), a pressure plate frame (333), an elastic key shaft (334), a fixed key shaft (335), a first rotating key cylinder (336), a second rotating key cylinder (337) and a driving motor (338), wherein the first fixed seat (331) and the second fixed seat (332) are respectively fixedly connected to the surface of the cleaning frame (32) and are positioned correspondingly, the pressure plate frame (333) is arranged between the first fixed seat (331) and the second fixed seat (332), and the elastic key shaft (33) is respectively arranged at a position corresponding to the surface position of the first fixed seat (331) on one end surface of the pressure plate frame (333). 4) and the first rotating key cylinder (336), one end of the elastic key shaft (334) is located inside the first rotating key cylinder (336) and is slidably connected to the inner wall of the first rotating key cylinder (336), the fixed key shaft (335) and the second rotating key cylinder (337) are respectively arranged at the positions corresponding to the surface positions of the second fixed seat (332) on the other end surface of the pressure plate frame (333), one end of the fixed key shaft (335) is located inside the second rotating key cylinder (337) and is slidably connected to the inner wall of the second rotating key cylinder (337), the driving motor (338) is fixedly connected to the inner wall of the second fixed seat (332), the output end of the driving motor (338) is fixedly connected to the surface of one end of the second rotating key cylinder (337), and the controller (2) is connected to the driving motor (338) through an efficient control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

4. The integrated wafer frame automatic cleaning machine according to claim 2, characterized in that: The cleaning rack assembly (3) further comprises a differential (37), wherein the differential (37) is fixedly connected to the inner wall of the rack (1) and is located between the dual-axis motor (36) and one set of the screw lifting mechanisms (35); the output end of the dual-axis motor (36) is connected to one set of the screw lifting mechanisms (35) via the differential (37).

5. The integrated wafer frame automatic cleaning machine according to claim 2, characterized in that: The cleaning rack assembly (3) further comprises two groups of infrared rangefinders (10), the two groups of infrared rangefinders (10) being used to respectively detect the placement status of the frame body and the cover plate in the wafer frame, the two groups of infrared rangefinders (10) being respectively fixedly connected to the top wall of the working chamber (11) and facing the cleaning frame (32), and the controller (2) being respectively connected to the two groups of infrared rangefinders (10) via an efficient control bus, thereby achieving accurate command transmission and comprehensive monitoring of the equipment operation status.

6. The integrated wafer frame automatic cleaning machine according to claim 2, characterized in that: The waste liquid discharge assembly (47) further comprises a rapid drainage mechanism (48), wherein the rapid drainage mechanism (48) comprises a conical drainage base (481) and a negative pressure pump (482), wherein the conical drainage base (481) is fixedly connected to the bottom of the cleaning tank body (41) and communicates with the interior of the cleaning tank body (41), the negative pressure pump (482) is fixedly connected to the inner wall of the frame (1), the input end of the negative pressure pump (482) is connected to the output end of the conical drainage base (481), and the output end of the negative pressure pump (482) is connected to the input end of the drainage main pipeline (471), and the controller (2) is connected to the negative pressure pump (482) via an efficient control bus, thereby realizing accurate command transmission and comprehensive monitoring of the equipment operation status.

7. The integrated wafer frame automatic cleaning machine according to claim 2, characterized in that: The loading and conveying mechanism (57) further comprises a wafer frame detection mechanism (100), wherein the wafer frame detection mechanism (100) comprises a stand (101), a first ultrasonic sensor (102) and a second ultrasonic sensor (103), wherein the stand (101) is fixedly connected to the top of the loading and conveying mechanism (57) and corresponds to the position of the working chamber (11); the first ultrasonic sensor (102) and the second ultrasonic sensor (103) are respectively fixedly connected to the surface of the stand (101) and are arranged up and down along the Z-axis direction; the height of the first ultrasonic sensor (102) matches the height of the frame in the wafer frame; the height of the second ultrasonic sensor (103) matches the height of the cover plate in the wafer frame; the controller (2) is respectively connected to the first ultrasonic sensor (102) and the second ultrasonic sensor (103) through an efficient control bus to achieve accurate command transmission and comprehensive monitoring of the equipment operation status.

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