High-precision CVD reactor with multiple protection functions
By setting up heating parts and cooling water circulation systems in the CVD reactor, the temperature is highly controllable, and the gas flow is accurately controlled through the integrated buffer chamber, multiple gas branch pipelines and flow control valves, which solves the shortcomings in temperature uniformity, gas control and safety of traditional CVD reactors, and achieves an efficient, safe and convenient reaction process.
Patent Information
- Application Number
- CN202422078904.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-26
- Publication Date
- 2025-06-24
- Estimated Expiration
- 2034-08-26
AI Technical Summary
Traditional CVD reactors have shortcomings in gas flow control, temperature uniformity, pressure stability, etc., which affects the quality and consistency of the deposited materials and lacks an effective safety protection system.
A high-precision CVD reactor with multiple protection functions was designed. By setting a heating element and a cooling water circulation system between the tank and the inner liner, the temperature was highly controlled; the buffer chamber, multiple gas branch pipelines and flow control valves were integrated into the control component to achieve accurate gas control; and the automatic pressure relief valve and sensing system were used to ensure the safety and controllability of the reactor.
It achieves a high degree of controllability of the reaction ambient temperature, ensuring temperature uniformity and stability during the reaction process; by precisely controlling the gas flow, the reaction efficiency and product quality are improved; at the same time, the safety of equipment operation and convenience of operation are ensured.
Smart Images
Figure CN223016971U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of chemical reaction control, and particularly relates to a high-precision CVD reactor with multiple protection functions. Background Technique
[0002] CVD is a material deposition technology widely used in the fields of semiconductors, optoelectronics, new material preparation, etc. It introduces gaseous precursors containing the components of the required deposited material into a high-temperature environment, and chemical reactions occur on the surface of the substrate to form solid thin films or coatings.
[0003] Traditional CVD reactors have deficiencies in aspects such as gas flow control, temperature uniformity, and pressure stability, which directly affect the quality and consistency of the deposited material; in order to obtain high-quality deposited materials, parameters such as temperature, pressure, and gas flow need to be precisely controlled; in order to ensure the safety of operators and the long-term stable operation of the equipment, an effective safety protection system needs to be established; by integrating advanced sensing technologies and intelligent control systems, the automation level of the entire process is improved.
[0004] Based on the above background, the utility model aims to solve the problems existing in the existing CVD reactors and provide a CVD reactor design scheme with a more reasonable structure, simpler operation, and higher safety. Content of the Utility Model
[0005] To achieve the above object, the utility model is realized through the following technical solutions:
[0006] The utility model provides a high-precision CVD reactor with multiple protection functions, which includes a reaction tank and a control component adaptively installed with the reaction tank. The reaction tank includes a tank body, a support fixed to the lower part of the peripheral side of the tank body, a tank cover hermetically connected to the end of the tank body, an inner tank arranged inside the tank body, and a gas pipeline passing through the inner tank and the tank body; the control component includes a buffer chamber connected to the gas pipeline, a multi-way gas branch pipeline connected to the buffer chamber, a flow control valve correspondingly connected to the gas branch pipeline, a heating element arranged in the gap between the tank body and the inner tank, a pressure relief pipe arranged in the middle of the tank cover, and an automatic pressure relief valve adaptively installed with the pressure relief pipe.
[0007] The utility model is further arranged such that a control panel is arranged on the side of the support, and the control panel is connected to a sensing system, and the sensing system includes a temperature sensor, a pressure sensor, and a gas concentration sensor arranged inside the inner tank.
[0008] The utility model is further arranged such that a temperature control chamber is formed by the interval between the inner tank and the tank body, and cooling water is circulated and infused in the temperature control chamber through a water pipe, and a water valve is adaptively installed on the water pipe.
[0009] The utility model is further configured such that the control circuit of the heating element and the automatic pressure relief valve is connected to the control panel, and the heating element and the cooling water form a water bath heating system.
[0010] The utility model is further configured such that the control panel is interconnected with the management end for data interaction, and an alarm is provided at the bottom of the control panel.
[0011] The utility model is further configured such that the heating element has an annular heating structure, and the heating elements are evenly distributed at equal intervals in the temperature control chamber.
[0012] The utility model has the following beneficial effects:
[0013] 1. By arranging a heating element and a cooling water circulation system between the tank body and the inner tank, the utility model realizes high controllability of the reaction environment temperature, ensures temperature uniformity and stability during the reaction process. The cooling water circulation system realizes effective temperature regulation, and at the same time, the flow rate and direction of the cooling water are controlled by a water valve to ensure the stable operation of the temperature control system.
[0014] 2. By integrating a buffer bin, multi-way gas branch pipes and flow control valves in the control assembly, the utility model realizes precise control and stable supply of multiple reaction gases, improves the reaction efficiency and product quality. An automatic pressure relief valve is provided on the tank cover to realize effective monitoring and safe release of the pressure in the tank body, ensuring the safety of equipment operation; a control panel is provided and connected to the sensing system to realize real-time monitoring and remote control of the internal state of the reactor, improving the operation convenience and controllability of the reaction process.
[0015] Of course, it is not necessary for any product implementing the utility model to achieve all the above-mentioned advantages simultaneously. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings required for describing the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present utility model, and those of ordinary skill in the art can also obtain other drawings based on these drawings without creative efforts.
[0017] Figure 1 It is a schematic view of one side of the overall structure of the present utility model.
[0018] Figure 2 It is a schematic view of the other side of the overall structure of the present utility model.
[0019] Figure 3 It is a schematic view of the position of the inner tank and the heating element in the present utility model.
[0020] In the accompanying drawings, the list of components represented by each reference numeral is as follows:
[0021] 1. Reaction tank; 11. Tank body; 12. Support; 13. Tank cover; 14. Inner tank; 15. Gas pipeline; 16. Water pipe; 17. Water valve; 2. Control assembly; 21. Buffer bin; 22. Gas branch pipeline; 23. Flow control valve; 24. Heating element; 25. Pressure relief pipe; 26. Automatic pressure relief valve; 27. Control panel; 28. Alarm. Detailed implementation manners
[0022] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0023] Embodiment
[0024] Please refer to Figures 1-3 , the present invention is a high-precision CVD reactor with multiple protection functions, including a reaction tank 1 and a control assembly 2 adaptively installed with the reaction tank 1. The reaction tank 1 includes a tank body 11, a support 12 fixed to the lower part of the periphery of the tank body 11, a tank cover 13 sealingly connected to the end of the tank body 11, an inner tank 14 arranged inside the tank body 11, and a gas pipeline 15 passing through the inner tank 14 and the tank body 11; the control assembly 2 includes a buffer bin 21 connected to the gas pipeline 15, a multi-way gas branch pipeline 22 connected to the buffer bin 21, a flow control valve 23 correspondingly connected to the gas branch pipeline 22, a heating element 24 arranged in the gap between the tank body 11 and the inner tank 14, a pressure relief pipe 25 arranged in the middle of the tank cover 13, and an automatic pressure relief valve 26 adaptively installed with the pressure relief pipe 25;
[0025] In the reaction tank 1, the tank body 11 is the main container of the reactor, made of high-temperature resistant materials, capable of withstanding high pressure and high temperature conditions. The support 12 is used to support the tank body 11 and ensure its stable placement. The tank cover 13 is tightly connected to the tank body 11 through a sealing structure (such as an O-ring) to prevent leakage. The inner tank 14 is located inside the tank body 11, directly contacting the reaction gas, made of corrosion-resistant materials, capable of withstanding the high temperature and chemical substances generated during the reaction. The gas pipeline 15 is responsible for introducing the reaction gas from an external source into the inner tank 14;
[0026] In the control component 2, the buffer bin 21 stabilizes the gas flow rate and pressure entering the reaction tank 1, reduces fluctuations, and improves the stability of the reaction process. The multi-channel gas branch pipes 22 inject different gases into the buffer bin 21 as required. Each gas branch pipe 22 is connected to a flow control valve 23 for precisely adjusting the flow rate of each gas. The heating element 24 is located in the space between the tank body 11 and the inner tank 14 and adopts an electric heating method. It is evenly distributed to ensure the uniformity of the temperature field. The automatic pressure relief valve 26 is connected to the pressure relief pipe 25 and will automatically open when the pressure in the tank body 11 reaches the set threshold, releasing the excess pressure through the pressure relief pipe 25 and connecting to a dedicated safety system.
[0027] Specifically, a control panel 27 is provided on the side of the support 12. The control panel 27 is connected to a sensing system. The sensing system includes a temperature sensor, a pressure sensor, and a gas concentration sensor arranged inside the inner tank 14. The control circuits of the heating element 24 and the automatic pressure relief valve 26 are connected to the control panel 27. The heating element 24 and the cooling water form a water bath heating system. The heating element 24 is in a ring-shaped heating structure and is evenly distributed at equal intervals in the temperature control chamber. The control panel 27 is interconnected with the management end for data interaction, and an alarm 28 is provided at the bottom of the control panel 27.
[0028] The sensing system is used to continuously monitor the state inside the inner tank 14. The data of the temperature sensor, the pressure sensor, and the gas concentration sensor are transmitted to the control panel 27 for processing. The control panel 27 integrates the readings of all sensors and the control system, enabling the operator to monitor and control the reaction process in real time and communicate with other management systems through the network. The heating element 24 is combined with the circulating cooling water to form a closed-loop temperature control system. The cooling water circulates through the water pipe 16 to keep the temperature around the inner tank 14 stable. When an abnormal situation is detected (such as too high temperature or abnormal pressure), the alarm 28 will be immediately activated to remind the operator to take measures.
[0029] Furthermore, a temperature control chamber is formed by spacing the inner tank 14 from the tank body 11. Cooling water is circulated and infused in the temperature control chamber through the water pipe 16. The water pipe 16 is adaptively installed with a water valve 17. The water pipe 16 is part of the cooling water circulation system and is used to send cooling water into and out of the temperature control chamber. The water valve 17 is used to control the flow rate and direction of the cooling water to ensure the normal operation of the cooling water circulation system.
[0030] In summary, this technical solution provides a CVD reactor with reasonable structure, simple operation, and high safety, which is suitable for various application scenarios that require precise control of reaction conditions.
[0031] In the description of this specification, the descriptions referring to terms such as "one embodiment", "example", "specific example", etc. mean that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present utility model. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.
[0032] The preferred embodiments of the present utility model disclosed above are only used to help illustrate the present utility model. The preferred embodiments do not describe all the details in detail, nor do they limit the present utility model to the specific embodiments described. Obviously, many modifications and variations can be made according to the content of this specification. These embodiments are selected and specifically described in this specification in order to better explain the principle and practical application of the present utility model, so that those skilled in the relevant art can well understand and utilize the present utility model. The present utility model is only limited by the claims and their full scope and equivalents.
Claims
1. A high-precision CVD reactor with multiple protection functions, comprising a reaction tank (1), and a control component (2) adapted to be installed with the reaction tank (1), characterized in that: The reaction tank (1) comprises a tank body (11), a support (12) fixed to the lower part of the circumference of the tank body (11), a tank cover (13) sealed to the end of the tank body (11), an inner liner (14) arranged inside the tank body (11), and a gas pipeline (15) passing through the inner liner (14) and the tank body (11); The control assembly (2) comprises a buffer bin (21) connected to a gas pipeline (15), a multi-channel gas branch pipeline (22) connected to the buffer bin (21), a flow control valve (23) correspondingly connected to the gas branch pipeline (22), a heating element (24) arranged in a gap between the tank body (11) and the inner tank (14), a pressure relief pipe (25) arranged in the middle of the tank cover (13), and an automatic pressure relief valve (26) adapted to be mounted on the pressure relief pipe (25).
2. A high-precision CVD reactor with multiple protection functions according to claim 1, characterized in that: A control panel (27) is arranged on the side of the support (12), and the control panel (27) is connected to a sensor system, wherein the sensor system comprises a temperature sensor, a pressure sensor and a gas concentration sensor arranged inside the inner container (14).
3. The high-precision CVD reactor with multiple protection functions according to claim 1, characterized in that: The inner liner (14) and the tank body (11) are spaced apart to form a temperature-controlled chamber, wherein cooling water is circulated and infused into the temperature-controlled chamber via a water pipe (16), and a water valve (17) is installed on the water pipe (16).
4. The high-precision CVD reactor with multiple protection functions according to claim 1, characterized in that: The control circuit of the heating element (24) and the automatic pressure relief valve (26) is connected to a control panel (27), and the heating element (24) and cooling water form a water bath heating system.
5. The high-precision CVD reactor with multiple protection functions according to claim 2, characterized in that: The control panel (27) is connected to the management end for data exchange, and an alarm (28) is provided at the bottom of the control panel (27).
6. The high-precision CVD reactor with multiple protection functions according to claim 1, characterized in that: The heating element (24) is a ring-shaped heating structure, and the heating element (24) is evenly distributed at equal distances in the temperature control chamber.