Double-source co-evaporation evaporator convenient for accurate monitoring

Abstract

According to the double-source co-evaporation evaporator convenient to accurately monitor, the crystal oscillator probe is arranged to monitor the thickness of an independent film material and the thickness of an alloy material respectively, and the sleeve is arranged outside the crystal oscillator probe to block the film material of adjacent holes, so that the monitoring accuracy of the independent film material is improved; and the magnetic field interference among different acupoints is reduced by arranging the magnetic isolation device, and the coating precision is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of vacuum evaporation coating machines, and more specifically, to a dual-source co-evaporation coating machine that is convenient for accurate monitoring. Background Art

[0002] Vacuum evaporation coating: Briefly called evaporation coating, it refers to a process method in which, under vacuum conditions, a coating material (or film material) is evaporated by a certain heating evaporation method and vaporized, and the particles fly to the surface of the substrate and condense into a film. Evaporation coating is a gas-phase deposition technology that has been used earlier and has a wide range of applications. It has the advantages of simple film-forming method, high purity and density of the film, and unique film structure and performance.

[0003] In the processing technology of vacuum evaporation coating, under vacuum conditions, a crucible is used to vaporize the coating material. The crucible includes: an evaporation chamber, an evaporation source arranged in the evaporation chamber. The evaporation source is heated to cause the evaporation material in the evaporation chamber to vaporize through heating. It has a scattering angle and evaporates upward in the shape of a cone. One evaporation material has a fixed scattering angle. There is a coating pot above the crucible for carrying the workpiece to be coated, and the workpiece to be coated is fixed on the coating pot. Therefore, the evaporation material molecules are deposited on the workpiece to be coated to form a coating. During the coating process, the evaporation material is placed in the crucible. The electron beam emitted by the electron gun is deflected by the deflection coil, so that the electron beam bombards in the crucible, causing the evaporation material to melt and evaporate.

[0004] Currently, vacuum evaporation coating machines usually use crystal oscillator components to monitor the film thickness during coating. When the vacuum evaporation coating machine is working, the crystal oscillator component can calculate the film thickness of the product to be coated according to the thickness of the film on the crystal oscillator plate, so as to accurately control the coating.

[0005] The invention patent with the publication number CN118291924A discloses a monitoring device and its monitoring method for realizing the monitoring of the composition of evaporation film materials based on multi-point crystal control. The deposition rate and the ratio of each component during the coating process of the composite film material are monitored in real time through a crystal oscillator probe and a computer control module. However, no probe is set to detect the composite film material, and only the film material molecules are blocked by a baffle plate arranged above the crystal oscillator probe. Since the film material molecules are dispersed from bottom to top, the effect of blocking the film material molecules at other positions is not good, and the electron beam emitted by the electron gun causes magnetic field interference between different positions, affecting the evaporation coating effect.

[0006] In view of this, the utility model provides a dual-source co-evaporation coating machine that is convenient for accurate monitoring, which can simultaneously evaporate and separately monitor the film thicknesses of the evaporation materials and alloy materials in two crucibles, so that the film material molecules are deposited in an interlaced manner with each other when evaporating the alloy material, without evaporating layer by layer, improving the efficiency, and reducing the magnetic field interference between different positions. Utility Model Content

[0007] In view of this, in order to solve the above problems, the present utility model proposes a dual-source co-evaporation evaporation coating machine that is convenient for accurate monitoring. By setting crystal oscillator probes to respectively monitor the thickness of individual film materials and the film material of alloy materials, and by arranging sleeves outside the crystal oscillator probes to block the film materials at adjacent acupuncture points, the accuracy of individual film material monitoring is improved. By setting a magnetic isolation device, the magnetic field interference between different acupuncture points is reduced, and the coating accuracy is improved.

[0008] A dual-source co-evaporation evaporation coating machine that is convenient for accurate monitoring, including a vacuum chamber 1 for providing a vacuum environment. A coating pot 2 is provided at the top of the vacuum chamber 1, and a coating substrate 22 is provided on the coating pot 2. A first crucible 3 and a second crucible 4 are provided at the bottom of the vacuum chamber 1. Evaporation sources are provided at the bottoms of the first crucible 3 and the second crucible 4, and the evaporation sources are used to sublimate the evaporation materials in the crucibles from solid state to gaseous state. Different film materials are respectively placed in the first crucible 3 and the second crucible 4. It is characterized in that: a monitoring device 5 is provided in the vacuum chamber 1. The monitoring device 5 includes a first crystal oscillator probe 51, a second crystal oscillator probe 53, and a total crystal oscillator probe 55. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are arranged on the side wall of the vacuum chamber 1 or on the upper part close to the coating pot 2. A first sleeve 52 is provided outside the first crystal oscillator probe 51, and the open end of the first sleeve 52 is inclined towards the first crucible 3. The first crystal oscillator probe 51 is used to monitor the film thickness of the film evaporated from the first crucible 3. A second sleeve 54 is provided outside the second crystal oscillator probe 53, and the open end of the second sleeve 54 is inclined towards the second crucible 4. The second crystal oscillator probe 53 is used to monitor the film thickness of the film evaporated from the second crucible 4. By setting the first sleeve 52 and the second sleeve 54, the first crystal oscillator probe 51 and the second crystal oscillator probe 53 only detect the film materials evaporated from the corresponding crucibles and block the film material molecules at other acupuncture points. Even if a small amount of film materials from other acupuncture points enter the sleeves, they can be deposited on the inner walls of the sleeves, improving the detection accuracy of individual film material molecules. The film materials in the coating pot 2 are evaporated by the evaporation sources and adhered to the monitoring device 5. The monitoring device 5 obtains the film thickness and deposition rate through the change of the crystal oscillation frequency, so as to timely adjust the evaporation rate to make the deposition rate reach the target value.

[0009] Further, the total crystal oscillator probe 55 is arranged at the center of the top of the coating pot 2 and is used to detect the film thickness of the evaporated alloy material.

[0010] Further, when the space of the vacuum chamber 1 is large, the evaporation path of the crucible from the evaporation pot 2 is long, and the first crystal oscillator probe 51 and the second crystal oscillator probe 53 are arranged on the side wall of the vacuum chamber 1 near the evaporation pot 2; when the space of the vacuum chamber 1 is small, the evaporation path of the crucible from the evaporation pot 2 is short, and the first crystal oscillator probe 51 and the second crystal oscillator probe 53 are arranged on the top of the vacuum chamber 1 near the evaporation pot 2, so that the different film material thicknesses monitored by the first crystal oscillator probe 51 and the second crystal oscillator probe 53 are close to the film material thickness of the alloy material monitored by the total crystal oscillator probe 55, reducing errors.

[0011] Further, the inclination angles of the first sleeve 52 and the second sleeve 54 are 0 to 50°.

[0012] Further, the sleeve lengths of the first sleeve 52 and the second sleeve 54 are 100 to 200 mm.

[0013] Further, a magnetic shielding device 6 is provided outside the first crucible 3 and the second crucible 4. The magnetic shielding device 6 includes a plurality of magnetic shielding plates vertically arranged around the first crucible 3 and the second crucible 4. The magnetic shielding plates are magnetic and are used to isolate the magnetic field interference of adjacent acupuncture points.

[0014] Further, there is a spacing between the first crucible 3 and the second crucible 4, and the first crucible 3 and the second crucible 4 are arranged on the horizontal center line at the bottom of the vacuum chamber 1.

[0015] Further, a baffle 7 is provided above the crucible. The baffle 7 is connected to a rotating mechanism 77 provided on one side. When starting evaporation, the preheating temperature in the chamber is not enough, and the baffle 7 is used to block the film material molecules. When the temperature reaches the required value, the baffle 7 is moved away by the rotating mechanism 77 for evaporation. When evaporation ends, there is still residual temperature in the chamber, and the baffle 7 is moved by the rotating mechanism 77 to cover above the crucible to prevent the film material molecules from continuing to evaporate.

[0016] Further, a correction device 8 is provided on one side near the evaporation pot 2 above the crucible. Both sides of the correction device 8 are connected to the top of the vacuum chamber 1. The correction device 8 includes at least two correction pieces 88. The correction pieces 88 are in the shape of blades that are large in the middle and small on both sides, and are used to block the overly dense film material molecules in the middle to make the film coating uniform.

[0017] Further, a plurality of coating substrates 22 are arranged around the evaporation pot 2 as the center to improve the evaporation coating efficiency.

[0018] Advantages of the present utility model: The present utility model provides a dual-source co-evaporation evaporation coating machine for facilitating precise monitoring, which includes a vacuum chamber 1 for providing a vacuum environment. A monitoring device 5 is arranged inside the vacuum chamber 1. The monitoring device 5 includes a first crystal oscillator probe 51, a second crystal oscillator probe 53, and a total crystal oscillator probe 55. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are arranged on the side wall of the vacuum chamber 1 or near the coating pot 2 at the upper part. A first sleeve 52 is arranged outside the first crystal oscillator probe 51, and the open end of the first sleeve 52 inclines towards the first crucible 3. The first crystal oscillator probe 51 is used to monitor the film thickness of the film evaporated by the first crucible 3. A second sleeve 54 is arranged outside the second crystal oscillator probe 53, and the open end of the second sleeve 54 inclines towards the second crucible 4. The second crystal oscillator probe 53 is used to monitor the film thickness of the film evaporated by the second crucible 4. The arrangement of the first sleeve 52 and the second sleeve 54 enables the first crystal oscillator probe 51 and the second crystal oscillator probe 53 to only detect the film materials evaporated by the corresponding crucibles, and block the film material molecules at other positions. Even if a small amount of film materials at other positions enter the sleeve, they can be deposited on the inner wall of the sleeve, improving the detection accuracy of individual film material molecules. The total crystal oscillator probe 55 is arranged at the center of the top of the coating pot 2 and is used to detect the film thickness of the evaporated alloy material. The film materials in the coating pot 2 are evaporated by the evaporation source and adhered to the monitoring device 5. The monitoring device 5 obtains the film thickness and deposition rate through the change of the crystal oscillation frequency, so as to timely adjust the evaporation rate to make the deposition rate reach the target value. By setting a magnetic isolation device, the magnetic field interference between different positions is reduced, and the coating accuracy is improved. Description of the Drawings

[0019] Figure 1 FIG. is a three-dimensional structure diagram of the dual-source co-evaporation evaporation coating machine for facilitating precise monitoring of the present utility model.

[0020] Figure 2 FIG. is an elevation view of the dual-source co-evaporation evaporation coating machine for facilitating precise monitoring of the present utility model.

[0021] Description of the Main Component Symbols

[0022] Vacuum chamber 1, coating pot 2, coating substrate 22, first crucible 3, second crucible 4, monitoring device 5, first crystal oscillator probe 51, first sleeve 52, second crystal oscillator probe 53, second sleeve 54, total crystal oscillator probe 55, magnetic isolation device 6, baffle 7, rotating mechanism 77, correction device 8, correction piece 88.

[0023] The following specific embodiments will further illustrate the present utility model in conjunction with the above drawings. Specific Embodiments

[0024] As Figure 1 shown, it is a three-dimensional structure diagram of the dual-source co-evaporation evaporation coating machine for facilitating precise monitoring of the present utility model; as Figure 2As shown in the figure, it is an elevation view of a dual-source co-evaporation evaporation coating machine for convenient and accurate monitoring of the present utility model. Embodiment 1:

[0025] A dual-source co-evaporation evaporation coating machine for convenient and accurate monitoring, comprising a vacuum chamber 1 for providing a vacuum environment. A coating pot 2 is provided at the top of the vacuum chamber 1, and a coating substrate 22 is provided on the coating pot 2. A first crucible 3 and a second crucible 4 are provided at the bottom of the vacuum chamber 1. Evaporation sources are provided at the bottoms of the first crucible 3 and the second crucible 4, and the evaporation sources are used to sublime the evaporation materials in the crucibles from solid state to gaseous state. Different film materials are placed in the first crucible 3 and the second crucible 4 respectively. It is characterized in that: a monitoring device 5 is provided in the vacuum chamber 1. The monitoring device 5 includes a first crystal oscillator probe 51, a second crystal oscillator probe 53 and a total crystal oscillator probe 55. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are provided on the side wall of the vacuum chamber 1 or on the upper part close to the coating pot 2. A first sleeve 52 is provided outside the first crystal oscillator probe 51, and the open end of the first sleeve 52 inclines towards the first crucible 3. The first crystal oscillator probe 51 is used to monitor the film thickness of the evaporation from the first crucible 3. A second sleeve 54 is provided outside the second crystal oscillator probe 53, and the open end of the second sleeve 54 inclines towards the second crucible 4. The second crystal oscillator probe 53 is used to monitor the film thickness of the evaporation from the second crucible 4. The first sleeve 52 and the second sleeve 54 are provided so that the first crystal oscillator probe 51 and the second crystal oscillator probe 53 only detect the film materials evaporated from the corresponding crucibles, and block the film materials of other positions. Even if a small amount of film materials of other positions enter the sleeves, they can be deposited on the inner walls of the sleeves, improving the detection accuracy of individual film materials. The film materials in the coating pot 2 are evaporated by the evaporation sources and adhered to the monitoring device 5. The monitoring device 5 obtains the film thickness and deposition rate through the change of the crystal oscillation frequency, so as to adjust the evaporation rate in time to make the deposition rate reach the target value.

[0026] The total crystal oscillator probe 55 is provided at the center of the top of the coating pot 2 and is used to detect the film thickness of the evaporated alloy material.

[0027] When the space of the vacuum chamber 1 is large, the evaporation path of the crucible from the coating pot 2 is long. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are provided on the side wall of the vacuum chamber 1 close to the coating pot 2. When the space of the vacuum chamber 1 is small, the evaporation path of the crucible from the coating pot 2 is short. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are provided on the top of the vacuum chamber 1 close to the coating pot 2, so that the film thicknesses of different film materials monitored by the first crystal oscillator probe 51 and the second crystal oscillator probe 53 are close to the film thickness of the alloy material monitored by the total crystal oscillator probe 55, reducing the error.

[0028] The inclination angles of the first sleeve 52 and the second sleeve 54 are 0 to 50°.

[0029] The sleeve lengths of the first sleeve 52 and the second sleeve 54 are 100 to 200 mm.

[0030] A magnetic shielding device 6 is provided outside the first crucible 3 and the second crucible 4. The magnetic shielding device 6 includes a plurality of magnetic shielding plates vertically arranged around the first crucible 3 and the second crucible 4. The magnetic shielding plates are magnetic and are used to isolate the magnetic field interference between adjacent acupuncture points.

[0031] There is a spacing between the first crucible 3 and the second crucible 4. The first crucible 3 and the second crucible 4 are arranged on the horizontal center line at the bottom of the vacuum chamber 1.

[0032] A baffle 7 is provided above the crucible. The baffle 7 is connected to a rotating mechanism 77 provided on one side. When starting evaporation, if the preheating temperature in the chamber is not enough, the baffle 7 is used to block the film material molecules. When the temperature reaches the required value, the baffle 7 is moved away by the rotating mechanism 77 for evaporation coating. When evaporation ends, there is still residual temperature in the chamber, and the baffle 7 is moved by the rotating mechanism 77 to cover above the crucible to prevent the film material molecules from continuing to evaporate.

[0033] A correction device 8 is provided above the crucible and near the coating pot 2. Both sides of the correction device 8 are connected to the top of the vacuum chamber 1. The correction device 8 includes at least two correction pieces 88. The correction pieces 88 are in the shape of blades that are larger in the middle and smaller on both sides, and are used to block the film material molecules that are too dense in the middle, so as to make the coating uniform.

[0034] A plurality of coating substrates 22 are arranged around the coating pot 2 as the center, which is used to improve the evaporation coating efficiency.

[0035] Advantages of the present utility model: The present utility model provides a dual-source co-evaporation evaporation coating machine convenient for accurate monitoring, including a vacuum chamber 1 for providing a vacuum environment. A monitoring device 5 is arranged in the vacuum chamber 1. The monitoring device 5 includes a first crystal oscillator probe 51, a second crystal oscillator probe 53, and a total crystal oscillator probe 55. The first crystal oscillator probe 51 and the second crystal oscillator probe 53 are arranged on the side wall of the vacuum chamber 1 or near the coating pot 2 at the upper part. A first sleeve 52 is arranged outside the first crystal oscillator probe 51. The open end of the first sleeve 52 inclines towards the first crucible 3. The first crystal oscillator probe 51 is used to monitor the film thickness of the film evaporated by the first crucible 3. A second sleeve 54 is arranged outside the second crystal oscillator probe 53. The open end of the second sleeve 54 inclines towards the second crucible 4. The second crystal oscillator probe 53 is used to monitor the film thickness of the film evaporated by the second crucible 4. The arrangement of the first sleeve 52 and the second sleeve 54 enables the first crystal oscillator probe 51 and the second crystal oscillator probe 53 to only detect the film materials evaporated by the corresponding crucibles, and block the film material molecules at other positions. Even if a small amount of film materials at other positions enter the sleeve, they can be deposited on the inner wall of the sleeve, improving the detection accuracy of individual film material molecules. The total crystal oscillator probe 55 is arranged at the center of the top of the coating pot 2 and is used to detect the film thickness of the alloy material evaporated. The film materials in the coating pot 2 are evaporated by the evaporation source and adhered to the monitoring device 5. The monitoring device 5 obtains the film thickness and deposition rate through the change of the crystal oscillation frequency, and then timely adjusts the evaporation rate to make the deposition rate reach the target value. By setting a magnetic isolation device, the magnetic field interference between different positions is reduced, improving the coating accuracy.

[0036] The above embodiments only represent several implementation manners of the present utility model, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the patent of the present utility model. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present utility model, several deformations and improvements can still be made, and these all belong to the protection scope of the present utility model. Therefore, the protection scope of the patent of the present utility model should be subject to the appended claims.

Claims

1. A dual-source co-evaporation evaporation machine that is convenient for accurate monitoring, comprising a vacuum chamber (1) for providing a vacuum environment, a coating pot (2) is provided on the top of the vacuum chamber (1), a coating substrate (22) is provided on the coating pot (2), a first crucible (3) and a second crucible (4) are provided at the bottom of the vacuum chamber (1), a evaporation source is provided at the bottom of the first crucible (3) and the second crucible (4), and different film materials are placed in the first crucible (3) and the second crucible (4), respectively, and characterized in that: A monitoring device (5) is provided in the vacuum chamber (1), and the monitoring device (5) comprises a first crystal oscillator probe (51), a second crystal oscillator probe (53) and a total crystal oscillator probe (55). The first crystal oscillator probe (51) and the second crystal oscillator probe (53) are arranged on a side wall or an upper part of the vacuum chamber (1) close to the plating pot (2). A first sleeve (52) is provided outside the first crystal oscillator probe (51), and an opening end of the first sleeve (52) is inclined toward the first crucible (3). The first crystal oscillator probe (51) is used to monitor the thickness of the film evaporated from the first crucible (3); the second crystal oscillator probe (53) is provided with a second sleeve (54) outside the second crystal oscillator probe (53); the opening end of the second sleeve (54) is inclined toward the second crucible (4); the second crystal oscillator probe (53) is used to monitor the thickness of the film evaporated from the second crucible (4); the first sleeve (52) and the second sleeve (54) are arranged so that the first crystal oscillator probe (51) and the second crystal oscillator probe (53) only detect the film material evaporated from the corresponding crucible.

2. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: The total crystal oscillator probe (55) is arranged at the top center of the plating pot (2).

3. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: When the space of the vacuum chamber (1) is large, the crucible is far from the evaporation path of the coating pot (2), and the first crystal oscillator probe (51) and the second crystal oscillator probe (53) are arranged on the side wall of the vacuum chamber (1) close to the coating pot (2); when the space of the vacuum chamber (1) is small, the crucible is close to the evaporation path of the coating pot (2), and the first crystal oscillator probe (51) and the second crystal oscillator probe (53) are arranged on the top of the vacuum chamber (1) close to the coating pot (2), so that the different film material thicknesses monitored by the first crystal oscillator probe (51) and the second crystal oscillator probe (53) are close to the film material thickness of the alloy material monitored by the total crystal oscillator probe (55).

4. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: The inclination angles of the first sleeve (52) and the second sleeve (54) are 0 to 50 degrees.

5. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: The sleeve lengths of the first sleeve (52) and the second sleeve (54) are 100 to 200 mm.

6. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: A magnetic isolation device (6) is provided outside the first crucible (3) and the second crucible (4), and the magnetic isolation device (6) comprises a plurality of magnetic isolation plates vertically arranged around the first crucible (3) and the second crucible (4), and the magnetic isolation plates are magnetic.

7. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: There is a distance between the first crucible (3) and the second crucible (4), and the first crucible (3) and the second crucible (4) are arranged on the horizontal center line of the bottom of the vacuum chamber (1).

8. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: A baffle (7) is provided above the first crucible (3) and the second crucible (4), and the baffle (7) is connected to a rotating mechanism (77) provided on one side.

9. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: A correction device (8) is provided above the first crucible (3) and the second crucible (4) on one side close to the plating pot (2), and both sides of the correction device (8) are connected to the top of the vacuum chamber (1). The correction device (8) includes at least two correction plates (88), and the correction plates (88) are in the shape of blades with a large middle portion and small sides.

10. The dual-source co-evaporation deposition machine for easy and precise monitoring according to claim 1, characterized in that: The coating substrates (22) are arranged in plurality around the coating pot (2).

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