Chip manufacturing etching equipment

Abstract

The utility model relates to the technical field of chip manufacturing, and discloses chip manufacturing etching equipment, which comprises an etching processing plate, the front surface of the etching processing plate is fixedly connected with a first drawing rod, and the top end of the etching processing plate is welded with a product limiting frame; and the rear end of the etching processing plate is fixedly connected with a first fixing rod. According to the utility model, the first fixing rod and the second fixing rod in the etching processing plate are matched with the first anti-deviation wheel and the second anti-deviation wheel; when a product to be etched is placed in the etching processing plate and the product limiting frame, the first anti-deviation wheel and the second anti-deviation wheel rotate on the surfaces of the first fixing rod and the second fixing rod; the etching processing plate can be prevented from deviating on the conveying device, the etching effect of etching equipment on products placed in the etching processing plate and the product limiting frame is not influenced, and the processing efficiency of the equipment on the products is not influenced.

Description

Technical Field

[0001] The utility model relates to the technical field of chip manufacturing, in particular to a chip manufacturing etching device. Background Art

[0002] Etching machines can be divided into two categories: chemical etching machines and electrolytic etching machines. In chemical etching, chemical solutions are used to achieve the purpose of etching through chemical reactions. A chemical etching machine is a technology that removes materials through chemical reactions or physical impacts.

[0003] An etching device for semiconductor chip manufacturing with the publication number CN 210516678 U includes a support mechanism, a transportation mechanism, a printing mechanism, a gas supply mechanism, and a reaction mechanism; the transportation mechanism is connected to the support mechanism and is used to drive the circuit board to be etched to move along a preset trajectory; the printing mechanism, the gas supply mechanism, and the reaction mechanism are arranged in sequence, and all three are located above the transportation mechanism. The output end of the gas supply mechanism is connected to the input end of the reaction mechanism. When the circuit board moves below the reaction mechanism, the gas supply mechanism provides high-pressure gas to the reaction mechanism, and the reaction mechanism blows air to the circuit board. As a further improvement of the utility model, the support mechanism includes a base, a first support seat, a second support seat, and a third support seat, which are arranged on the base in sequence. As a further improvement of the utility model, the printing mechanism includes a lifting cylinder, a lifting seat, a printing template, an electric slider, an ink cartridge, and a roller brush. Cleaning the circuit board with high-pressure gas avoids over-etching of the reaction solution and improves the yield.

[0004] For the etching device for semiconductor chip manufacturing, cleaning the circuit board with high-pressure gas avoids over-etching of the reaction solution and improves the yield. However, when the whole device is etching and processing products, it is not convenient to protect the products to be etched and processed from running off track on the transmission device, which affects the processing efficiency of the device when etching products. Summary of the Utility Model

[0005] To solve the above technical problems, the utility model provides a chip manufacturing etching device.

[0006] The utility model is realized by the following technical solutions: A chip manufacturing etching device includes an etching processing plate. A first pull rod is fixedly connected to the front surface of the etching processing plate, and a product limiting frame is welded to the top end of the etching processing plate.

[0007] A first fixing rod is fixedly connected to the rear end of the etching processing plate. A first anti-deviation wheel is rotatably connected to the surface of the first fixing rod. A second fixing rod is fixedly connected to the inside of the etching processing plate. A second anti-deviation wheel is rotatably connected to the surface of the second fixing rod. A rotating groove is formed in the inside of the etching processing plate. A rotating rod is threadedly connected to the inside of the rotating groove. A rotating ring is welded to the top end of the rotating rod. A limiting plate is fixedly connected to the bottom end of the rotating rod. A limiting ring is fixedly connected to the bottom end of the etching processing plate. A spring is welded to the inside of the limiting ring.

[0008] Through the above technical solution, the number of springs is set to two, and the stretching and contracting of the springs can be used to jack up the etching processing plate from the conveying device.

[0009] As a further improvement of the above solution, the rotating rings are symmetrically distributed with the etching processing plate as the center, the rotating rods are symmetrically distributed with the etching processing plate as the center, and the limiting plates are symmetrically distributed with the etching processing plate as the center.

[0010] As a further improvement of the above solution, the limiting rings are symmetrically distributed with the etching processing plate as the center, the springs are symmetrically distributed with the etching processing plate as the center, and a limiting plate is provided at the bottom end of the etching processing plate.

[0011] Through the above technical solution, the number of limiting plates is set to two, which can limit the springs.

[0012] As a further improvement of the above solution, a spring is welded to the bottom end of the etching processing plate. A first anti-deviation wheel is provided at the left end of the etching processing plate. A second anti-deviation wheel is provided at the right end of the etching processing plate.

[0013] As a further improvement of the above solution, a second pull rod is provided at the rear end of the product limiting frame. A first pull rod is provided on the front surface of the product limiting frame.

[0014] As a further improvement of the above solution, a first fixing rod is provided at the left end of the product limiting frame. A first anti-deviation wheel is provided at the left end of the product limiting frame.

[0015] Through the above technical solution, the number of anti-deviation wheels is set to several.

[0016] As a further improvement of the above solution, a second fixing rod is provided at the right end of the product limiting frame. A second anti-deviation wheel is provided at the right end of the product limiting frame.

[0017] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0018] The utility model avoids the etching processing plate running off on the conveying device by arranging the first fixing rod and the second fixing rod inside the etching processing plate and matching with the first anti-deviation wheel and the second anti-deviation wheel. When the product to be etched is placed inside the etching processing plate and the product limiting frame, when the first anti-deviation wheel and the second anti-deviation wheel rotate on the surfaces of the first fixing rod and the second fixing rod, it can prevent the etching processing plate from running off on the conveying device, affecting the etching effect of the etching equipment on the product placed inside the etching processing plate and the product limiting frame, and affecting the processing efficiency of the equipment on the product.

[0019] The utility model enables the staff to conveniently pull out the product after etching inside the etching processing plate and the product limiting frame by arranging the first pull rod on the front surface of the etching processing plate and the second pull rod at the rear end. When the staff needs to take out the etching processing plate from the conveying device, rotate the rotating ring to drive the rotating rod to rotate inside the rotating groove, so that the limiting plate at the bottom end of the rotating rod rotates from the bottom end of the spring to the opened groove, and the expansion and contraction of the spring jacks up the etching processing plate from the conveying device, facilitating the staff to conveniently take the etching processing plate. Description of the Drawings

[0020] Figure 1 Schematic diagram of the overall structure of the utility model;

[0021] Figure 2 Schematic diagram of the anatomical structure of the utility model;

[0022] Figure 3 Schematic diagram of the disassembly structure of the limiting plate of the utility model;

[0023] Figure 4 Schematic diagram of the bottom view structure of the utility model;

[0024] Figure 5 Schematic diagram of the right view structure of the utility model.

[0025] Main Symbol Description:

[0026] 1. Etching processing plate; 2. First pull rod; 3. Product limiting frame; 4. Second pull rod; 5. First fixing rod; 6. First anti-deviation wheel; 7. Second fixing rod; 8. Second anti-deviation wheel; 9. Rotating ring; 10. Rotating rod; 11. Limiting plate; 12. Rotating groove; 13. Limiting ring; 14. Spring. Detailed Embodiment

[0027] Next, in combination with the drawings and specific embodiments, the utility model will be further described. It should be noted that on the premise of no conflict, the following described embodiments or technical features can be arbitrarily combined with each other to form new embodiments.

[0028] Embodiment:

[0029] Please combine with Figures 1-5 , an etching device for chip manufacturing in this embodiment, includes an etching processing plate 1. A first pulling rod 2 is fixedly connected to the front surface of the etching processing plate 1, and a product limiting frame 3 is welded to the top end of the etching processing plate 1;

[0030] A first fixing rod 5 is fixedly connected to the rear end of the etching processing plate 1. A first anti-deviation wheel 6 is rotatably connected to the surface of the first fixing rod 5. A second fixing rod 7 is fixedly connected to the inside of the etching processing plate 1. A second anti-deviation wheel 8 is rotatably connected to the surface of the second fixing rod 7. A rotating groove 12 is formed inside the etching processing plate 1. A rotating rod 10 is threadedly connected to the inside of the rotating groove 12. A rotating ring 9 is welded to the top end of the rotating rod 10. A limiting plate 11 is fixedly connected to the bottom end of the rotating rod 10. A limiting ring 13 is fixedly connected to the bottom end of the etching processing plate 1. A spring 14 is welded to the inside of the limiting ring 13. By setting the first fixing rod 5 and the second fixing rod 7 inside the etching processing plate 1 in cooperation with the first anti-deviation wheel 6 and the second anti-deviation wheel 8, when products to be etched are placed inside the etching processing plate 1 and the product limiting frame 3, when the first anti-deviation wheel 6 and the second anti-deviation wheel 8 rotate on the surfaces of the first fixing rod 5 and the second fixing rod 7, it can prevent the etching processing plate 1 from running off track on the conveying device, affecting the etching effect of the products placed inside the etching processing plate 1 and the product limiting frame 3, and affecting the processing efficiency of the device for the products.

[0031] The number of the springs 14 is set to two, and the telescoping of the springs 14 can jack up the etching processing plate 1 from the conveying device.

[0032] The rotating rings 9 are symmetrically distributed with the etching processing plate 1 as the center. The rotating rods 10 are symmetrically distributed with the etching processing plate 1 as the center. The limiting plates 11 are symmetrically distributed with the etching processing plate 1 as the center.

[0033] The limiting rings 13 are symmetrically distributed with the etching processing plate 1 as the center. The springs 14 are symmetrically distributed with the etching processing plate 1 as the center. A limiting plate 11 is provided at the bottom end of the etching processing plate 1.

[0034] The number of the limiting plates 11 is set to two, which can limit the springs 14.

[0035] A spring 14 is welded to the bottom end of the etching processing plate 1. A first anti-deviation wheel 6 is provided at the left end of the etching processing plate 1. A second anti-deviation wheel 8 is provided at the right end of the etching processing plate 1.

[0036] A second pulling rod 4 is provided at the rear end of the product limiting frame 3. A first pulling rod 2 is provided on the front surface of the product limiting frame 3.

[0037] The left end of the product limiting frame 3 is provided with a first fixing rod 5, and the left end of the product limiting frame 3 is provided with a first anti-deviation wheel 6. By setting the first pulling rod 2 on the front surface of the etching processing plate 1 and the second pulling rod 4 at the rear end, it enables the staff to cooperate with the conveying equipment to conveniently pull out the product after etching inside the etching processing plate 1 and the product limiting frame 3. When the staff needs to take out the etching processing plate 1 from the conveying equipment, rotate the rotating ring 9 to drive the rotating rod 10 to rotate inside the rotating groove 12, so that the limiting plate 11 at the bottom end of the rotating rod 10 rotates from the bottom end of the spring 14 to the opened groove, and the expansion and contraction of the spring 14 jacks up the etching processing plate 1 from the conveying equipment, facilitating the staff to conveniently take the etching processing plate 1.

[0038] The number of anti-deviation wheels is set to several.

[0039] The right end of the product limiting frame 3 is provided with a second fixing rod 7, and the right end of the product limiting frame 3 is provided with a second anti-deviation wheel 8.

[0040] The implementation principle of a chip manufacturing etching equipment in the embodiment of the present application is as follows: Place the equipment in a suitable position. By setting the first fixing rod 5 and the second fixing rod 7 inside the etching processing plate 1 and cooperating with the first anti-deviation wheel 6 and the second anti-deviation wheel 8, when the product to be etched is placed inside the etching processing plate 1 and the product limiting frame 3, when the first anti-deviation wheel 6 and the second anti-deviation wheel 8 rotate on the surfaces of the first fixing rod 5 and the second fixing rod 7, it can prevent the etching processing plate 1 from running off track on the conveying device, affecting the etching effect of the product placed inside the etching processing plate 1 and the product limiting frame 3 and the processing efficiency of the equipment for the product. By setting the first pulling rod 2 on the front surface of the etching processing plate 1 and the second pulling rod 4 at the rear end, it enables the staff to cooperate with the conveying equipment to conveniently pull out the product after etching inside the etching processing plate 1 and the product limiting frame 3. When the staff needs to take out the etching processing plate 1 from the conveying equipment, rotate the rotating ring 9 to drive the rotating rod 10 to rotate inside the rotating groove 12, so that the limiting plate 11 at the bottom end of the rotating rod 10 rotates from the bottom end of the spring 14 to the opened groove, and the expansion and contraction of the spring 14 jacks up the etching processing plate 1 from the conveying equipment, facilitating the staff to conveniently take the etching processing plate 1.

[0041] The above implementation manners are only the preferred implementation manners of the present utility model, and cannot be used to limit the scope of protection of the present utility model. Any non-substantial changes and substitutions made by those skilled in the art on the basis of the present utility model belong to the scope of protection required by the present utility model.

Claims

1. A chip manufacturing etching device, including an etching processing plate (1), a first pull rod (2) is fixedly connected to the front surface of the etching processing plate (1), and a product limiting frame (3) is welded to the top end of the etching processing plate (1); It is characterized in that A first fixing rod (5) is fixedly connected to the rear end of the etching processing plate (1), a first anti-deviation wheel (6) is rotatably connected to the surface of the first fixing rod (5), a second fixing rod (7) is fixedly connected to the inside of the etching processing plate (1), a second anti-deviation wheel (8) is rotatably connected to the surface of the second fixing rod (7), a rotating groove (12) is formed in the inside of the etching processing plate (1), a rotating rod (10) is threadedly connected to the inside of the rotating groove (12), a rotating ring (9) is welded to the top end of the rotating rod (10), a limiting plate (11) is fixedly connected to the bottom end of the rotating rod (10), a limiting ring (13) is fixedly connected to the bottom end of the etching processing plate (1), and a spring (14) is welded to the inside of the limiting ring (13).

2. The chip manufacturing etching equipment according to claim 1, characterized in that: The rotating rings (9) are symmetrically distributed with the etching processing plate (1) as the center, the rotating rods (10) are symmetrically distributed with the etching processing plate (1) as the center, and the limiting plates (11) are symmetrically distributed with the etching processing plate (1) as the center.

3. A chip manufacturing etching device as claimed in claim 1, wherein: The limiting rings (13) are symmetrically distributed with the etching processing plate (1) as the center, the springs (14) are symmetrically distributed with the etching processing plate (1) as the center, and a limiting plate (11) is provided at the bottom end of the etching processing plate (1).

4. A chip manufacturing etching device as claimed in claim 3, wherein: A spring (14) is welded to the bottom end of the etching processing plate (1), a first anti-deviation wheel (6) is provided at the left end of the etching processing plate (1), and a second anti-deviation wheel (8) is provided at the right end of the etching processing plate (1).

5. The chip manufacturing etching equipment according to claim 1, characterized in that: A second pull rod (4) is provided at the rear end of the product limiting frame (3), and a first pull rod (2) is provided at the front surface of the product limiting frame (3).

6. The chip manufacturing etching equipment according to claim 5, wherein: A first fixing rod (5) is provided at the left end of the product limiting frame (3), and a first anti-deviation wheel (6) is provided at the left end of the product limiting frame (3).

7. The chip manufacturing etching equipment according to claim 6, wherein: A second fixing rod (7) is provided at the right end of the product limiting frame (3), and a second anti-deviation wheel (8) is provided at the right end of the product limiting frame (3).

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