Cleaning device and cleaning system

By introducing a combination of distillation filter assembly and storage parts into the cleaning device, the problem of incomplete filtration of impurities in traditional cleaning devices is solved, and high-purity spraying of cleaning liquid is achieved, improving the cleaning effect and the performance and quality of the workpiece.

CN223083407UActive Publication Date: 2025-07-11DONG GUAN GAO WEI GUANG XUE DIAN ZI YOU XIAN GONG SI
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Patent Information

Application Number
CN202422171573.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-09-04
Publication Date
2025-07-11
Estimated Expiration
2034-09-04

AI Technical Summary

Technical Problem

Traditional cleaning devices cannot effectively filter impurities in the cleaning liquid, resulting in poor cleaning effect and affecting the performance and quality of the workpiece to be cleaned.

Method used

The cleaning liquid is distilled and filtered by using a distillation filter assembly, and then removed impurities are passed into the storage part to improve the purity of the cleaning liquid and spray it through the nozzle to ensure the purity and effect of the cleaning liquid.

Benefits of technology

It improves the purity and cleaning effect of the cleaning liquid, reduces the risk of secondary contamination of the workpiece to be cleaned, and improves the cleaning effect and the overall performance and quality of the workpiece.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to a cleaning device and a cleaning system, and the cleaning device comprises a cleaning liquid storage part which is used for storing cleaning liquid; the distillation filtering assembly is communicated with the outflow end of the cleaning liquid storage part and is used for filtering impurities in the cleaning liquid; the first storage piece is communicated with the outflow end of the distillation filtering assembly; and the nozzle communicates with the outflow end of the first storage piece, and the nozzle is located above the workpiece to be cleaned. According to the technical scheme, the technical problem that a traditional cleaning device is poor in cleaning effect is effectively solved.
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Description

Technical Field

[0001] This application relates to the technical field of cleaning equipment, and particularly to a cleaning device and a cleaning system. Background Art

[0002] In the packaging process of a camera module, it is necessary to clean the camera module that has completed chip flip-chip welding and encapsulation with glue, so as to remove foreign matters such as dust and oil stains on the camera module, thereby improving the pixel and packaging reliability of the camera, and improving the packaging yield and quality.

[0003] In the related art, generally, a cleaning liquid is added to the main tank, and then filtered through a filter element communicated with the liquid outlet end of the main tank, and finally sprayed out from a spray head to realize the cleaning of the workpiece to be cleaned. However, the filter element cannot ensure that all impurities in the cleaning liquid are completely filtered out, which will result in poor cleaning effect of the workpiece to be cleaned and cannot meet the production requirements. Summary of the Utility Model

[0004] This application provides a cleaning device and a cleaning system to solve the technical problem of poor cleaning effect of traditional cleaning devices.

[0005] To this end, in a first aspect, an embodiment of this application provides a cleaning device, which includes: a cleaning liquid storage member for storing a cleaning liquid; a distillation and filtration assembly communicated with the outflow end of the cleaning liquid storage member for filtering impurities in the cleaning liquid; a first storage member communicated with the outflow end of the distillation and filtration assembly; and a nozzle communicated with the outflow end of the first storage member, and the nozzle is located above the workpiece to be cleaned.

[0006] In a possible implementation manner, the distillation and filtration assembly includes a distillation member, a connecting elbow and a condensation member that are sequentially communicated. The connecting elbow and the condensation member are both located above the distillation member. The inflow end of the distillation member is communicated with the outflow end of the cleaning liquid storage member, and the outflow end of the condensation member is communicated with the inflow end of the first storage member.

[0007] In a possible implementation manner, the operating temperature of the distillation member is 40°C to 60°C; and / or,

[0008] The operating temperature of the condensation member is -12°C to -8°C.

[0009] In a possible implementation manner, the distillation and filtration assembly further includes a second storage member. The inflow end of the second storage member is communicated with the outflow end of the condensation member, and the outflow end of the second storage member is communicated with the inflow end of the first storage member.

[0010] In a possible implementation manner, the condensation member includes a condensation tank and a condensation pipe. The inflow end of the condensation tank is communicated with the outflow end of the distillation member, the outflow end of the condensation tank is communicated with the inflow end of the first storage member, and the condensation pipe is wound around the outer wall of the condensation tank and communicated with a cold source.

[0011] In a possible implementation, a first filter element is further included, and the first filter element is disposed between the cleaning liquid storage element and the distillation and filtration assembly.

[0012] In a possible implementation, a second filter element is further included, and the second filter element is disposed between the first storage element and the nozzle.

[0013] In a possible implementation, a third storage element and a separation element are further included. The inflow end of the third storage element is communicated with the confluence tank below the nozzle, the outflow end of the third storage element is communicated with the inflow end of the distillation and filtration assembly, and the inflow end of the separation element is communicated with the top of the third storage element for collecting the gaseous substances in the third storage element.

[0014] In a second aspect, the present application further provides a cleaning system, including a box body, a conveying element, and the cleaning device as described above. The conveying element is disposed below the box body and is used for conveying the workpiece to be cleaned. The nozzle of the cleaning device is disposed in the box body and is located below the conveying element.

[0015] In a possible implementation, the box body includes a buffer part, a cleaning part, and a drying part arranged in sequence. The conveying element sequentially passes through the buffer part, the cleaning part, and the drying part, and the nozzle is disposed at the bottom of the cleaning part.

[0016] According to the cleaning device and the cleaning system provided by the embodiments of the present application, the cleaning device includes: a cleaning liquid storage element for storing the cleaning liquid; a distillation and filtration assembly communicated with the outflow end of the cleaning liquid storage element for filtering impurities in the cleaning liquid; a first storage element communicated with the outflow end of the distillation and filtration assembly; and a nozzle communicated with the outflow end of the first storage element, and the nozzle is located above the workpiece to be cleaned. Compared with the traditional cleaning device that directly adds the cleaning liquid into the main tank, in the present application, the cleaning liquid is first introduced into the distillation and filtration assembly for distillation and filtration to remove impurities in the cleaning liquid and improve the purity of the cleaning liquid; then the cleaning liquid after impurity removal is introduced into the first storage element to supply liquid to the nozzle, which improves the purity of the cleaning liquid sprayed at the nozzle and improves the cleaning effect of the workpiece to be cleaned. Description of the Drawings

[0017] The accompanying drawings here are incorporated into the specification and form a part of this specification, showing embodiments consistent with the present application, and are used together with the specification to explain the principles of the present application. To more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the accompanying drawings required for use in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings. One or more embodiments are exemplarily illustrated by the pictures in the corresponding accompanying drawings. These exemplary illustrations do not constitute limitations on the embodiments. Elements with the same reference numerals in the drawings are represented as similar elements, unless otherwise stated, the drawings in the figures do not constitute a scale limitation.

[0018] Figure 1 It is a schematic structural diagram of the cleaning system provided by the embodiment of the present application.

[0019] Explanation of reference numerals in the drawings:

[0020] 100, cleaning liquid storage member;

[0021] 200, distillation and filtration assembly; 210, distillation member; 220, connecting elbow; 230, condensation member; 231, condensation tank; 232, condensation pipeline; 240, second storage member;

[0022] 300, first storage member; 400, nozzle; 500, first filter member; 600, second filter member;

[0023] 700, third storage member; 800, separation member;

[0024] 10, box body; 11, buffer part; 12, cleaning part; 13, drying part; 20, conveying member. Detailed implementation manners

[0025] To make the objectives, technical solutions, and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of the present application.

[0026] The following disclosure provides many different embodiments or examples for implementing different structures of the present application. To simplify the disclosure of the present application, the components and settings of specific examples are described below. Of course, they are only examples and are not intended to limit the present application. In addition, the present application may repeat reference numerals and / or letters in different examples. This repetition is for the purpose of simplification and clarity and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the present application provides examples of various specific processes and materials, but those of ordinary skill in the art can recognize the applicability of other processes and / or the use of other materials.

[0027] For ease of description, spatially relative terms may be used in the text to describe the relative positional relationship or movement of one element or feature shown in the figure with respect to another element or feature. These relative relationship terms such as "inside", "outside", "inner side", "outer side", "below", "beneath", "above", "over", "front", "rear", etc. This spatially relative relationship term is intended to include different orientations of the device in use or operation other than the orientation depicted in the figure. For example, if the device in the figure undergoes a position flip or attitude change or motion state change, then these directional indications will change accordingly. For example, an element described as "below other elements or features" or "beneath other elements or features" will then be oriented as "above other elements or features" or "over other elements or features". Therefore, the exemplary term "below" can include both the upper and lower orientations. The device may be oriented otherwise (rotated 90 degrees or in other directions) and the spatially relative descriptors used in the text are interpreted accordingly.

[0028] Traditional cleaning devices directly add the cleaning liquid into the main tank, then filter it through a filter element, and finally spray it onto the workpiece to be cleaned through a nozzle to achieve the cleaning of the workpiece to be cleaned. Since some impurities such as iron filings and dust are mixed in the cleaning liquid, simple filtration by the filter element cannot completely remove the impurities in the cleaning liquid, which will bring a risk of secondary pollution to the workpiece to be cleaned and affect the performance and quality of the workpiece to be cleaned. Based on this, the present application provides a new type of cleaning device, which first passes the cleaning liquid into the distillation filtration assembly 200 for distillation and purification to remove the impurities in the cleaning liquid, then passes the impurity-removed cleaning liquid into the first storage member 300 for caching, and sprays it onto the workpiece to be cleaned through the nozzle 400. The purity of the cleaning liquid sprayed from the nozzle 400 is high, which can effectively avoid the secondary pollution of the workpiece to be cleaned and improve the cleaning effect of the workpiece to be cleaned.

[0029] See Figure 1, embodiments of the present application provide a cleaning device, which includes: a cleaning liquid storage member 100 for storing cleaning liquid; a distillation and filtration assembly 200 connected to the outflow end of the cleaning liquid storage member 100 for filtering impurities in the cleaning liquid; a first storage member 300 connected to the outflow end of the distillation and filtration assembly 200; and a nozzle 400 connected to the outflow end of the first storage member 300, and the nozzle 400 is located above the workpiece to be cleaned.

[0030] Compared with the traditional cleaning device that directly adds the cleaning liquid into the main tank, in the present application, the cleaning liquid is first passed through the distillation and filtration assembly 200 for distillation and filtration to remove impurities in the cleaning liquid and improve the purity of the cleaning liquid; then the cleaned cleaning liquid is passed into the first storage member 300 to supply liquid to the nozzle 400, which improves the purity of the cleaning liquid sprayed at the nozzle 400 and the cleaning effect of the workpiece to be cleaned.

[0031] Specifically, the cleaning device is configured to include at least a combined component of a cleaning liquid storage member 100, a distillation and filtration assembly 200, a first storage member 300, and a nozzle 400. The cleaning liquid storage member 100 can be a storage tank, and the stored cleaning liquid can be a diluted isopropyl alcohol solution for cleaning impurities such as oil stains, dust, and iron filings on the workpiece to be cleaned, improving the overall performance and quality of the workpiece to be cleaned. According to the principle that different substances have different boiling points, the distillation and filtration assembly 200 can distill the cleaning liquid from impurities such as oil stains, iron filings, or dust, and obtain purified cleaning liquid after cooling, thereby reducing pollution on the cleaning liquid side. The first storage member 300 can be a storage tank or a storage box / tank, etc., which can be used to cache a certain volume of cleaning liquid to ensure sufficient supply of cleaning liquid in the liquid circuit. The nozzle 400 is provided with a plurality of liquid outlet holes, which can realize liquid spraying in multiple directions, thereby ensuring thorough cleaning of the workpiece to be cleaned and improving the cleanliness of the workpiece to be cleaned; for example, the nozzle 400 can be set to be multiple, and multiple nozzles 400 can be arranged at intervals along the conveying direction of the conveyor belt for conveying the workpiece to be cleaned vertically. In this way, the workpiece to be cleaned passing under the nozzle 400 can receive cleaning by the cleaning liquid sprayed from multiple nozzles 400 at different angles at the same time, which is beneficial to improving the cleaning effect. The cleaning device provided in this example has a simple structure and is convenient for processing; moreover, the purity of the cleaning liquid sprayed at the nozzle 400 is high, and the cleaning effect on the workpiece to be cleaned is good.

[0032] It should be noted that the workpiece to be cleaned can be a camera module or other electronic products that have been sealed with glue. The main component of the cleaning liquid can be isopropyl alcohol.

[0033] In a possible implementation, the distillation and filtration assembly 200 includes a distillation component 210, a connecting elbow 220, and a condensation component 230 that are connected in sequence. The connecting elbow 220 and the condensation component 230 are both located above the distillation component 210. The inflow end of the distillation component 210 is connected to the outflow end of the cleaning liquid storage component 100, and the outflow end of the condensation component 230 is connected to the inflow end of the first storage component 300.

[0034] In this embodiment, the specific configuration of the distillation assembly is optimized. Specifically, the distillation and filtration assembly 200 is configured as a combined component at least including the distillation component 210, the connecting elbow 220, and the condensation component 230. The distillation component 210 can be a distillation tank, the condensation component 230 can be a condensation circuit, and the connecting elbow 220 can be in the shape of an inverted and bent goblet. Since the gas phase of distillation rises upwards, the connecting elbow 220 and the condensation component 230 need to be arranged above the distillation component 210 to facilitate the collection of the gas-phase cleaning liquid. The size of the connecting elbow 220 on the connection side with the distillation component 210 is larger, which is beneficial to collecting the gas-phase cleaning liquid evaporated from the distillation component 210; the size of the connecting elbow 220 on the connection side with the condensation component 230 is smaller, which can effectively reduce the waste of the cold source while realizing the condensation of the gas-phase cleaning liquid; the condensation component 230 is arranged to slope downwards, which is convenient for collecting the condensed liquid-phase cleaning liquid. The structure of the distillation and filtration assembly 200 provided in this example is simple and convenient for processing; moreover, it is beneficial to collect and condense the gas-phase cleaning liquid and reduce the loss of the cleaning liquid.

[0035] In one example, the distillation component 210 can be placed in a constant temperature water bath to achieve the constant temperature heating of the distillation component 210, so that the distillation component 210 is maintained within the optimal working temperature range for cleaning liquid distillation, ensuring that the gas-phase substance distilled is the cleaning liquid and improving the purity of the cleaning liquid. Of course, in other embodiments, the distillation component 210 can also be maintained at a certain temperature through a heating device. The heating method of the cleaning liquid is not limited here, as long as the distillation component 210 can be maintained within the specified working temperature range.

[0036] In a possible implementation, the working temperature of the distillation component 210 is 40°C to 60°C. Such a setting can prevent other impurities such as oil stains from being evaporated into the gas phase and carried away due to too high a distillation temperature, which affects the purification concentration of the cleaning liquid, or prevent the cleaning liquid from not being evaporated into the gas phase due to too low a distillation temperature, which affects the supply of the cleaning liquid in the liquid circuit. In this example, the working temperature of the distillation component 210 is designed within a suitable range to only evaporate the liquid-phase cleaning liquid entering the distillation component 210 into the gas phase, while keeping other impurities in their original phases, realizing the separation and purification of the cleaning liquid and improving the concentration of the cleaning liquid.

[0037] In one example, the working temperature of the distillation component 210 can be 45°C to 55°C. For example but not limited to, the distillation component 210 maintains a constant temperature operation at 50°C.

[0038] In a possible implementation, the operating temperature of the condenser 230 is -12°C to -8°C. With this setting, it is possible to avoid the liquid-phase cleaning liquid from freezing and blocking the condenser 230 due to too high a condensation temperature, resulting in the malfunction / damage of the distillation and filtration assembly 200, or to avoid some gas-phase cleaning liquid from not being condensed into the liquid phase due to too low a condensation temperature, resulting in waste of the cleaning liquid. In this example, the operating temperature of the condenser 230 is designed within a suitable range so that the gas-phase cleaning liquid entering the condenser 230 can be condensed into the liquid phase at a suitable temperature, improving the collection of the liquid-phase cleaning liquid and reducing waste. For example but not limited to, the operating temperature of the condenser 230 can be -10°C.

[0039] In a possible implementation, the distillation and filtration assembly 200 further includes a second storage member 240. The inflow end of the second storage member 240 is communicated with the outflow end of the condenser 230, and the outflow end of the second storage member 240 is communicated with the inflow end of the first storage member 300.

[0040] In this embodiment, the specific configuration of the distillation assembly is further optimized. Specifically, the distillation and filtration assembly 200 is configured as a combined component at least including a distillation member 210, a condenser 230 and a second storage member 240. The second storage member 240 can be a storage tank or a storage box / tank, etc., which can be used to cache a certain volume of cleaning liquid to realize the collection and storage of the liquid-phase cleaning liquid flowing out of the condenser 230. At the same time, the cleaning liquid at a lower temperature can be warmed up to room temperature in the second storage member 240 and then transported to the nozzle 400 for spraying and cleaning, ensuring the cleaning activity of the cleaning liquid and improving the cleaning effect on the workpiece to be cleaned. The cleaning liquid collected by the distillation and filtration assembly 200 provided in this example has high cleaning activity and good cleaning effect.

[0041] In a possible implementation, the condenser 230 includes a condensation tank 231 and a condensation pipe 232. The inflow end of the condensation tank 231 is communicated with the outflow end of the distillation member 210, the outflow end of the condensation tank 231 is communicated with the inflow end of the first storage member 300, and the condensation pipe 232 is wound around the outer wall of the condensation tank 231 and communicated with a cold source.

[0042] In this embodiment, the specific configuration of the condensing member 230 is optimized. Specifically, the condensing member 230 is configured as a combined component including at least a condensing tank 231 and a condensing pipe 232. The condensing pipe 232 can be spirally wound around the outer wall of the condensing tank 231. The cold source provided in this example can be a refrigerant or cooling water. The inflow end of the condensing pipe 232 is connected to the cold source tank, and the outflow end of the condensing pipe 232 can be connected to the cold source recovery tank. The cold source flowing out of the cold source tank exchanges heat with the high-temperature gaseous cleaning liquid flowing through the condensing tank 231 at the outer wall of the condensing tank 231, so that the high-temperature gaseous cleaning liquid is cooled and condensed into a liquid phase and flows out from the outflow end of the condensing tank 231, thereby realizing the collection of the purified cleaning liquid. The structure of the condensing member 230 provided in this example is simple and convenient for processing.

[0043] In a possible implementation manner, a first filter member 500 is further included. The first filter member 500 is disposed between the cleaning liquid storage member 100 and the distillation and filtration assembly 200.

[0044] In this embodiment, the specific configuration of the cleaning device is further optimized. Specifically, the cleaning device is configured as a combined component including at least a cleaning liquid storage member 100, a distillation and filtration assembly 200, a first storage member 300, a nozzle 400, and a first filter member 500. The first filter member 500 can be an activated carbon filtration device or a filter cotton device, and is used for filtering solid impurities such as iron filings and dust particles in the cleaning liquid. A plurality of first filter members 500 can be provided, and the plurality of first filter members 500 are arranged at intervals along the flow direction of the cleaning liquid to improve the filtering effect on the solid impurities in the cleaning liquid and improve the purity of the cleaning liquid. The cleaning device provided in this example pre-filters some impurities in the cleaning liquid, which is beneficial to reducing the separation and purification burden of the distillation and filtration assembly 200, reducing the waste of heat energy at the distillation and filtration assembly 200, and improving the purity of the cleaning liquid.

[0045] In a possible implementation manner, a second filter member 600 is further included. The second filter member 600 is disposed between the first storage member 300 and the nozzle 400.

[0046] In this embodiment, the specific configuration of the cleaning device is further optimized. Specifically, the cleaning device is configured as a combined component including at least a cleaning liquid storage member 100, a distillation and filtration assembly 200, a first storage member 300, a nozzle 400, and a second filter member 600. The second filter member 600 can be a microbial filter or a reverse osmosis filtration membrane, and is used for filtering bacteria and harmful organic substances in the cleaning liquid. A plurality of second filter members 600 can be provided, and the plurality of second filter members 600 are arranged at intervals along the flow direction of the cleaning liquid to improve the filtering effect on the toxic substances and bacteria in the cleaning liquid and improve the purity of the cleaning liquid. The cleaning device provided in this example filters out the toxic substances and bacteria in the cleaning liquid, which can improve the use safety of the cleaning liquid.

[0047] In a possible implementation, it further includes a third storage member 700 and a separation member 800. The inflow end of the third storage member 700 is communicated with the confluence trough below the nozzle 400, the outflow end of the third storage member 700 is communicated with the inflow end of the distillation and filtration assembly 200, and the inflow end of the separation member 800 is communicated with the top of the third storage member 700 for collecting the gaseous substances in the third storage member 700.

[0048] In this embodiment, the specific configuration of the cleaning device is further optimized. Specifically, the cleaning device is configured as a combined component at least including a cleaning liquid storage member 100, a distillation and filtration assembly 200, a first storage member 300, a nozzle 400, a third storage member 700 and a separation member 800. The third storage member 700 can be a storage trough or a storage box / tank, etc., which can be used to collect the waste liquid after cleaning the workpiece to be cleaned, realize the recycling of the cleaning liquid, and reduce waste. The separation member 800 can be a storage box or a storage tank, etc., and a condensed water circuit is arranged on its outer side for collecting the gaseous substances flowing in from the third storage member 700. The cleaning device provided in this example can realize the recycling of the cleaning liquid and improve the effective utilization rate of the cleaning liquid.

[0049] In addition, the present application also provides a cleaning system, including a box body 10, a conveying member 20 and the cleaning device as described above. The conveying member 20 is arranged below the box body 10 and is used for conveying the workpiece to be cleaned. The nozzle 400 of the cleaning device is arranged in the box body 10 and is located below the conveying member 20.

[0050] In this embodiment, the cleaning system is configured as a combined component at least including the box body 10, the conveying member 20 and the cleaning device. The box body 10 is hollow inside, and a window through which the conveying member 20 can pass is arranged on the side wall near the bottom; the conveying member 20 can be a conveying belt, and a working station for placing the workpiece to be cleaned is arranged thereon, and a fixing component for fixing the workpiece to be cleaned is arranged on the periphery of the working station. In this way, the workpiece to be cleaned can be fixed on the conveying member 20 for convenient conveying; the nozzle 400 of the cleaning device can be arranged at the bottom of the box body 10 to spray the cleaning liquid upward to clean the workpiece to be cleaned on the conveying member 20 above it. The cleaning system provided in this example can realize the continuous cleaning of multiple workpieces to be cleaned, improve the cleaning efficiency while ensuring the cleaning effect.

[0051] Moreover, the specific structure of the cleaning device refers to the above embodiment. Since this cleaning system adopts all the technical solutions of the above all embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, and will not be elaborated herein one by one.

[0052] In a possible implementation, the box body 10 includes a buffer part 11, a cleaning part 12, and a drying part 13 arranged in sequence. The conveyor 20 passes through the buffer part 11, the cleaning part 12, and the drying part 13 in sequence, and the nozzle 400 is arranged at the bottom of the cleaning part 12.

[0053] In this embodiment, the specific configuration of the conveyor 20 is optimized. Specifically, the box body 10 is configured as a combined component at least including the buffer part 11, the cleaning part 12, and the drying part 13. The buffer part 11 can be a small box body 10 with an independent chamber, and the front and rear sides thereof are correspondingly provided with first windows for the conveyor 20 to pass through. The buffer part 11 covers at least a part of the conveyor 20 through the first windows. The cleaning part 12 can be a small box body 10 with an independent chamber, and the front and rear sides thereof are correspondingly provided with second windows for the conveyor 20 to pass through. The second window on the front side is communicated with the first window on the rear side, and the cleaning part 12 covers another part of the conveyor 20 through the second windows; a nozzle 400 of the cleaning device is arranged at the bottom of the cleaning part 12, and the cleaning liquid can be sprayed upward through the nozzle 400 to clean the workpiece to be cleaned passing through the cleaning part 12. The drying part 13 can be a small box body 10 with an independent chamber, and the front and rear sides thereof are correspondingly provided with third windows for the conveyor 20 to pass through. The third window on the front side is communicated with the second window on the rear side, and the drying part 13 covers another part of the conveyor 20 through the third windows; drying gas is arranged in the drying part 13 for drying the cleaned workpiece, which is convenient for subsequent transfer and storage. The buffering, cleaning, and drying operations of the cleaning system provided in this example are independent of each other and will not interfere with each other.

[0054] To further elaborate on the beneficial effects of the cleaning device and the cleaning system provided by the present disclosure, the following will be elaborated in combination with specific example groups. It should be understood that the specific example groups are a further detailed description of the present disclosure and do not limit the protection scope of the present disclosure. At the same time, the raw materials and equipment used in the example groups can be obtained by purchasing in the market.

[0055] Example Group 1 Detection of the purity of the cleaning liquid provided by different cleaning devices

[0056] 1. Experimental operation:

[0057] 1) Select the device: Select a traditional cleaning device and the cleaning device provided by the present application for the experiment. The difference between the two is that the traditional cleaning device directly adds the cleaning liquid to the first storage part 300 and then supplies it to the nozzle through the filter element.

[0058] 2) Specific operation: Take 10 ml of the control group sample from the nozzle of the traditional cleaning device, and detect the number of particles of 0.5 μm dust and 1 μm dust in the control group sample; at the same time, take 10 ml of the experimental group sample from the nozzle 400 of the cleaning device provided by the present application, detect the number of particles of 0.5 μm dust and 1 μm dust in the experimental group sample, and obtain the data shown in Table 1 below.

[0059] Table 1 Purity data of the cleaning liquid obtained by different cleaning devices

[0060]

[0061] 2. Result analysis:

[0062] Referring to Table 1, the average number of 0.5 μm dust particles in the cleaning liquid filtered and sprayed by the traditional cleaning device is 7.3, and the average number of 0.1 μm dust particles is 3.8; while the average number of 0.5 μm dust particles in the cleaning liquid filtered and sprayed by the cleaning device provided by the present application is 7.0, and the average number of 0.1 μm dust particles is 3.6. It can be seen that the purity of the cleaning liquid provided by the cleaning device of the present application is higher than that of the cleaning liquid provided by the traditional cleaning device. Among them, the overall reduction of 0.5 μm dust particles is 4.2%, and the overall reduction of 0.1 μm dust particles is 5.2%.

[0063] Cleaning effect of different cleaning devices in Example Group 2

[0064] 1. Experimental operation:

[0065] First, select 20 jigs, and 15 workpieces to be cleaned are placed on each jig; among them, 10 jigs are cleaned with the traditional cleaning device, and the remaining 10 jigs are cleaned with the cleaning device of the present application. Detect the cleaning effect of each workpiece to be cleaned on each jig, and obtain the cleaning rate shown in Table 2.

[0066] Table 2 Cleaning efficiency of different cleaning devices

[0067] Parallel embodiment Cleaning rate of traditional cleaning device / % Cleaning rate of the cleaning device of the present application / % 1 80 80 2 66.7 80 3 80 73.3 4 66.7 73.3 5 66.7 66.7 6 73.3 73.3 7 73.3 80 8 66.7 73.3 9 86.7 80 10 66.7 73.3 Average value 72.7 75.3

[0068] 2. Result analysis:

[0069] Referring to Table 2, the average cleaning rate of the workpieces to be processed cleaned by the traditional cleaning device is 72.7, while the average cleaning rate of the workpieces to be processed cleaned by the cleaning device provided by the present application is 75.3, with an overall increase of 2.6%. It can be seen that the cleaning effect of the cleaning device provided by the present application is better.

[0070] It should be understood that the terms used herein are for the purpose of describing particular example embodiments only and are not intended to be limiting. Unless the context clearly dictates otherwise, the singular forms "a", "an" and "the" as used herein may also include the plural. The terms "comprising", "including", "containing" and "having" are inclusive and thus specify the presence of the stated features, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, steps, operations, elements, components, and / or combinations thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring their performance in the particular order described or illustrated, unless the order of performance is expressly stated. It should also be understood that additional or alternative steps may be used.

[0071] Although the terms first, second, third, etc. may be used herein to describe multiple elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms may be used only to distinguish one element, component, region, layer or section from another. Unless the context clearly indicates otherwise, terms such as "first", "second" and other numerical terms used herein do not imply an order or sequence. Thus, the first element, component, region, layer or section discussed below may be referred to as the second element, component, region, layer or section without departing from the teachings of the example embodiments.

[0072] The above are only specific embodiments of the present application, enabling those skilled in the art to understand or implement the present application. Various modifications to these embodiments will be obvious to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to these embodiments shown herein, but rather will be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. A cleaning device, characterized in that, Comprising: A cleaning liquid storage member (100) for storing cleaning liquid; A distillation and filtration assembly (200) communicated with the outflow end of the cleaning liquid storage member (100) for filtering impurities in the cleaning liquid; A first storage member (300) communicated with the outflow end of the distillation and filtration assembly (200); and A nozzle (400) communicated with the outflow end of the first storage member (300), and the nozzle (400) is located above the workpiece to be cleaned.

2. The cleaning device according to claim 1, wherein The distillation and filtration assembly (200) includes a distillation member (210), a connecting elbow (220) and a condensation member (230) that are sequentially communicated. The connecting elbow (220) and the condensation member (230) are both located above the distillation member (210). The inflow end of the distillation member (210) is communicated with the outflow end of the cleaning liquid storage member (100), and the outflow end of the condensation member (230) is communicated with the inflow end of the first storage member (300).

3. The cleaning device according to claim 2, characterized in that, The operating temperature of the distillation member (210) is 40°C to 60°C; and / or, The operating temperature of the condensation member (230) is -12°C to -8°C.

4. The cleaning device according to claim 2, wherein The distillation and filtration assembly (200) further includes a second storage member (240). The inflow end of the second storage member (240) is communicated with the outflow end of the condensation member (230), and the outflow end of the second storage member (240) is communicated with the inflow end of the first storage member (300).

5. The cleaning device according to claim 2, wherein The condensation member (230) includes a condensation tank (231) and a condensation pipeline (232). The inflow end of the condensation tank (231) is communicated with the outflow end of the distillation member (210), and the outflow end of the condensation tank (231) is communicated with the inflow end of the first storage member (300). The condensation pipeline (232) is wound around the outer wall of the condensation tank (231) and is communicated with a cold source.

6. The cleaning device according to claim 1, characterized in that, It further includes a first filter member (500) disposed between the cleaning liquid storage member (100) and the distillation and filtration assembly (200).

7. The cleaning device according to claim 1, characterized in that, It further includes a second filter member (600) disposed between the first storage member (300) and the nozzle (400).

8. The cleaning device according to claim 1, characterized in that, It further includes a third storage member (700) and a separation member (800). The inflow end of the third storage member (700) is communicated with a confluence trough below the nozzle (400). The outflow end of the third storage member (700) is communicated with the inflow end of the distillation and filtration assembly (200). The inflow end of the separation member (800) is communicated with the top of the third storage member (700) for collecting gaseous substances in the third storage member (700).

9. A cleaning system, characterized in that, Comprising a box body (10), a conveying member (20) and the cleaning device according to any one of claims 1 to 8. The conveying member (20) is disposed below the box body (10) for conveying the workpiece to be cleaned. The nozzle (400) of the cleaning device is disposed in the box body (10) and is located below the conveying member (20).

10. The cleaning system according to claim 9, wherein, The box body (10) includes a buffer part (11), a cleaning part (12), and a drying part (13) arranged in sequence. The conveying member (20) passes through the buffer part (11), the cleaning part (12), and the drying part (13) in sequence. The nozzle (400) is arranged at the bottom of the cleaning part (12).