Novel photomask storage rack

Abstract

The novel photomask storage rack comprises a supporting table plate, first supporting columns are integrally formed at the four corners of the top of the supporting table plate, and second supporting columns are fixed to the four corners, close to the middle, of the supporting table plate; each first supporting column is provided with a first supporting step and a second supporting step. A third supporting step and a fourth supporting step are arranged on each second supporting column; according to the photomask storage rack, the multiple supporting steps are arranged on the first supporting column and the second supporting column correspondingly, so that the photomasks of different sizes can be placed on the photomask storage rack in a stacked mode, the photomask storage rack can adapt to the photomasks of multiple sizes, in this way, the storage space and the turnover space are saved, transportation is facilitated, more photomasks can be placed on one storage rack, and the storage rack is convenient to use. Meanwhile, by means of the mode, the purchasing or manufacturing cost of the storage rack by an enterprise can be effectively reduced, and development of the enterprise is facilitated.

Description

Technical Field

[0001] The utility model relates to the technical field of storage racks, in particular to a novel photomask storage rack. Background Technique

[0002] In the manufacturing process of touch screens and displays, photomasks are required for exposing patterns on motherboards. One photomask is needed for each process, and the sizes of photomasks for different-sized production lines are different.

[0003] When the photomasks are not in use, they are involved in storage and subsequent transportation. When storing the photomasks, due to the different sizes of the photomasks, it is necessary to match them with suitable storage devices. This will require a relatively large number of storage devices, which will increase the cost of purchasing or manufacturing the storage devices on the one hand, and on the other hand, it will require a relatively large number of locations for storage, occupying storage space and turnover space. And when the number of storage devices increases, the transportation cost will also increase accordingly, which is not conducive to the healthy production and development of enterprises. Content of the Utility Model

[0004] The utility model aims to provide a technical solution to solve the above problems in order to overcome the above deficiencies.

[0005] To achieve the above purpose, the utility model provides the following technical solution: A novel photomask storage rack includes a support table board. At the four corners of the top of the support table board, support columns I are integrally formed. At the four corners of the support table board near the middle, support columns II are fixed; on each support column I, a support step I and a support step II are provided; on each support column II, a support step III and a support step IV are provided.

[0006] As a further solution of the utility model: The support step I is provided at a position near the top of the support column I, the support step II is provided at a position near the middle of the support column I, the heights of the four support steps I are the same, and the heights of the four support steps II are the same.

[0007] As a further solution of the utility model: The opening directions of the four support steps I all face the center position of the support table board, and the four support steps I correspond to each other. The opening directions of the four support steps II all face the center position of the support table board, and the four support steps II correspond to each other.

[0008] As a further solution of the utility model: The support step III is provided at a position near the top of the support column II, the support step IV is provided at a position near the middle of the support column II, the heights of the four support steps III are the same, and the heights of the four support steps IV are the same.

[0009] As a further solution of the present utility model: the opening directions of the four support steps three all face the central position of the support base plate, and the four support steps three correspond to each other; the opening directions of the four support steps four all face the central position of the support base plate, and the four support steps four correspond to each other.

[0010] As a further solution of the present utility model: the four support columns one form a rectangular support structure, and the four support columns two also form a rectangular support structure.

[0011] As a further solution of the present utility model: the height of the support column two is lower than the height of the support column one, and the length and width of the support column two are the same as the length and width of the support column one.

[0012] As a further solution of the present utility model: the inner angles of the support step one, support step two, support step three and support step four are all designed as right-angle structures.

[0013] As a further solution of the present utility model: the tops of the four support columns one and the four support columns two are all designed as rounded structures.

[0014] As a further solution of the present utility model: a layer of anti-slip bottom pad is also fixed to the bottom of the support base plate. Card slots are opened at the four corners of the anti-slip bottom pad, and the shape and size of the card slots are adapted to the shape and size of the top end of the support column one.

[0015] Compared with the prior art, the beneficial effects of the present utility model are as follows:

[0016] In this application, through the designed structures such as the support base plate, support column one and support column two, and by respectively arranging a plurality of support steps on the support column one and support column two, the photomask storage rack can place photomasks of different sizes in a stacked form, can handle photomasks of more sizes. This method saves storage space and turnover space, is conducive to transportation, one storage rack can place more photomasks, and can also ensure the stability after placement. At the same time, this method can also effectively reduce the procurement or manufacturing cost of the storage rack for the enterprise, which is beneficial to the development of the enterprise. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is the three-dimensional structure schematic diagram of the whole of the present utility model;

[0018] Figure 2 is the side view structure schematic diagram of the whole of the present utility model;

[0019] Figure 3 is the bottom view structure schematic diagram of the anti-slip bottom pad of the present utility model.

[0020] The reference numerals and names in the drawings are as follows:

[0021] 1. Support platen; 2. First support column; 201. First support step; 202. Second support step; 3. Second support column; 301. Third support step; 302. Fourth support step; 4. Anti-slip bottom pad; 5. Card slot. Detailed implementation manner

[0022] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0023] Please refer to Figures 1-3 , a novel photomask storage rack, including a support platen 1, first support columns 2 are integrally formed at the four corners of the top of the support platen 1, and second support columns 3 are fixed at the four corners near the middle of the support platen 1; a first support step 201 and a second support step 202 are provided on each first support column 2; a third support step 301 and a fourth support step 302 are provided on each second support column 3.

[0024] Please refer to Figures 1-2 , in this embodiment, the first support step 201 is provided at a position close to the top end of the first support column 2, the second support step 202 is provided at a position close to the middle of the first support column 2, the heights of the four first support steps 201 are the same, and the heights of the four second support steps 202 are the same.

[0025] Specifically, the four first support steps 201 are at the highest position, and the formed support area is the largest compared to the other three, that is, relatively large photomasks can be placed on the four first support steps 201, and the first support step 201 and the second support step 202 are far away from each other, which can facilitate separating the photomasks placed at the first support step 201 and the second support step 202 to avoid the problem of being difficult to remove later when they are attached together.

[0026] Please refer to Figures 1-2 , in this embodiment, the opening directions of the four first support steps 201 all face the center position of the support platen 1, and the four first support steps 201 correspond to each other. The opening directions of the four second support steps 202 all face the center position of the support platen 1, and the four second support steps 202 correspond to each other. The four first support columns 2 form a rectangular support structure.

[0027] Specifically, the above design can form two support areas on the four first support columns 2, on which two photomasks of different sizes can be placed, and ensure the flatness and stability of the photomasks after supporting.

[0028] Please refer to Figures 1-2 , in this embodiment, the third support step 301 is provided at a position close to the top of the second support column 3, and the fourth support step 302 is provided at a position close to the middle of the second support column 3. The heights of the four third support steps 301 are the same, and the heights of the four fourth support steps 302 are the same.

[0029] Specifically, the four third support steps 301 are at a high position on the second support column 3, and the formed support area is larger than the support area formed by the fourth support step 302. That is, a reticle smaller than that on the first support step 201 and the second support step 202 and larger than that on the fourth support step 302 can be placed on the four third support steps 301. The fourth support step 302 is far away from the third support step 301, which can facilitate separating the reticles placed on the fourth support step 302 and the third support step 301, and avoid the problem that they are stuck together and difficult to remove later.

[0030] Please refer to Figures 1-2 , in this embodiment, the opening directions of the four third support steps 301 all face the central position of the support platen 1, and the four third support steps 301 correspond to each other. The opening directions of the four fourth support steps 302 all face the central position of the support platen 1, and the four fourth support steps 302 correspond to each other. The four second support columns 3 form a rectangular support structure.

[0031] Specifically, the above design can also form two support areas on the four second support columns 3, on which two reticles of different sizes can be placed, and ensure the flatness and stability of the reticles after supporting.

[0032] Please refer to Figures 1-2 , in this embodiment, the height of the second support column 3 is shorter than that of the first support column 2, and the length and width of the second support column 3 are the same as those of the first support column 2.

[0033] Specifically, the height of the second support column 3 is only about half of the height of the first support column 2, which can avoid the mutual influence between the reticles placed on the first support column 2 and the second support column 3. That is, the reticles on the entire second support column 3 will be shorter than the reticles on the first support column 2. The length and width of the second support column 3 are the same as those of the first support column 2, which is convenient for the early production.

[0034] Please refer to Figure 1 , in this embodiment, the inner angles of the first support step 201, the second support step 202, the third support step 301 and the fourth support step 302 are all designed as right-angled structures.

[0035] Specifically, the multiple steps with right-angled structures can be adapted to the right-angled sides of the reticle, and ensure the stability of the reticle after placement.

[0036] Please refer to Figures 1-2, in this embodiment, the tops of the four first support columns 2 and the four second support columns 3 are both designed with a rounded structure.

[0037] Specifically, the design of the rounded structure can ensure that when placing the photomask, the tops of the first support column 2 and the second support column 3 will not scratch the photomask and other situations.

[0038] Please refer to Figures 1-3 , in this embodiment, a layer of anti-slip bottom pad 4 is also fixed to the bottom of the support plate 1. Card slots 5 are provided at the four corners of the anti-slip bottom pad 4. The shape and size of the card slots 5 are adapted to the shape and size of the top of the first support column 2.

[0039] Specifically, the anti-slip bottom pad 4 can be made of silica gel or rubber. The anti-slip bottom pad 4 can ensure that when the entire support plate 1 is placed on the ground or the tabletop, there will be no sliding or unstable situation. And the card slots 5 are provided on the anti-slip bottom pad 4, which is convenient for when two support plates 1 are stacked, the top of the first support column 2 on one support plate 1 can be inserted into the card slot 5 at the bottom of the other support plate 1, facilitating stacking positioning and improving stability.

[0040] During use, the four first support steps 201, the four second support steps 202, the four third support steps 301, and the four fourth support steps 302 respectively form a placement area for a photomask, that is, there are four photomask placement areas on the support plate 1, and the four photomask placement areas are of different sizes and can place photomasks of different sizes. When placing, only need to place the four corners of the photomask into the corresponding support steps respectively.

[0041] It should be noted that the longitudinal depth and the vertical depth of the settings of the first support step 201, the second support step 202, the third support step 301, and the fourth support step 302 can be designed according to the actual size of the photomask, and it is not limited that only two support steps are provided on each first support column 2 and each second support column 3, and more support steps can be provided according to the actual situation.

[0042] For those skilled in the art, it is obvious that the present invention is not limited to the details of the above exemplary embodiments, and without departing from the spirit or basic characteristics of the present invention, the present invention can be implemented in other specific forms. Therefore, in any regard, the embodiments should be regarded as exemplary and non-limiting. The scope of the present invention is defined by the appended claims rather than the above description. Therefore, it is intended to embrace all changes falling within the meaning and scope of the equivalent elements of the claims in the present invention. Any reference signs in the claims should not be regarded as limiting the claimed rights.

Claims

1. A novel photomask storage rack, characterized in that, It includes a support platen (1), and support columns one (2) are integrally formed at the four corners of the top of the support platen (1), and support columns two (3) are fixed at the four corners near the middle of the support platen (1); Each of the support columns one (2) is provided with a support step one (201) and a support step two (202); Each of the support columns two (3) is provided with a support step three (301) and a support step four (302).

2. The novel photomask storage rack according to claim 1, characterized in that, The support step one (201) is provided at a position close to the top end of the support column one (2), and the support step two (202) is provided at a position close to the middle of the support column one (2). The heights of the four support steps one (201) are the same, and the heights of the four support steps two (202) are the same.

3. A novel photomask storage rack according to claim 1, characterized in that, The opening directions of the four support steps one (201) all face the central position of the support platen (1), and the four support steps one (201) correspond to each other. The opening directions of the four support steps two (202) all face the central position of the support platen (1), and the four support steps two (202) correspond to each other.

4. A novel photomask storage rack according to claim 1, characterized in that, The support step three (301) is provided at a position close to the top end of the support column two (3), and the support step four (302) is provided at a position close to the middle of the support column two (3). The heights of the four support steps three (301) are the same, and the heights of the four support steps four (302) are the same.

5. A novel photomask storage rack according to claim 1, characterized in that, The opening directions of the four support steps three (301) all face the central position of the support platen (1), and the four support steps three (301) correspond to each other. The opening directions of the four support steps four (302) all face the central position of the support platen (1), and the four support steps four (302) correspond to each other.

6. The novel photomask storage rack according to claim 1, characterized in that, The four support columns one (2) form a rectangular support structure, and the four support columns two (3) also form a rectangular support structure.

7. A novel photomask storage rack according to claim 1, characterized in that, The height of the support column two (3) is lower than the height of the support column one (2), and the length and width of the support column two (3) are the same as the length and width of the support column one (2).

8. The novel photomask storage rack according to claim 1, wherein, The inner angles of the support step one (201), the support step two (202), the support step three (301) and the support step four (302) are all designed with right-angle structures.

9. A novel photomask storage rack according to claim 1, wherein, The tops of the four support columns one (2) and the four support columns two (3) are all designed with rounded structures.

10. A novel photomask storage rack according to claim 1, characterized in that, A layer of anti-slip bottom pad (4) is further fixed at the bottom of the support platen (1), and card slots (5) are opened at the four corners of the anti-slip bottom pad (4). The shape and size of the card slots (5) are adapted to the shape and size of the top end of the support column one (2).

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