Composite device of electric melting opaque quartz glass plate

Abstract

The utility model relates to a compounding device, in particular to a compounding device of an electric melting opaque quartz glass plate. The composite device comprises a rack, a hearth is arranged on the rack, and a combustor is arranged on the side wall of the hearth; a supporting rotating shaft is installed on the rack through a lifting rotating mechanism, and a clamp is installed on the supporting rotating shaft through a rotating disc. The compounding device can be used for simultaneously compounding four surfaces of the electrically-fused opaque quartz glass plate, so that the production period is shortened, the production efficiency is improved, and the problems of low production efficiency and complicated working procedures caused by processing and impurity removal due to single-surface compounding are reduced; the position of the electric melting opaque quartz glass can be adjusted by adjusting the position of the turntable, so that local or overall compounding can be carried out; due to one-time composite forming in the composite process, impurity attachment in multiple composite processes can be reduced, the performance requirement for the high-quality and high-purity composite electric smelting opaque quartz glass coating for semiconductors is met, and impurity pollution is reduced. The problem that an existing compounding mode is low in production efficiency is solved.

Description

Technical Field

[0001] The utility model relates to a composite device, in particular to a composite device for an electrofused opaque quartz glass plate. Background Art

[0002] Electrofused opaque quartz glass is an excellent quartz glass material with pores, having a low expansion coefficient, good high-temperature stability, and good chemical resistance to many processing media; in addition, its low spectral transmittance enables it to be used as a high-temperature heat insulation and thermal insulation material in wafer manufacturing.

[0003] In the existing methods for preparing composite quartz glass, more often, a quartz glass plate (substrate) processed to a specific size is placed at the bottom of a synthesis furnace or a plasma sintering furnace, and a layer of silicon dioxide is deposited on the surface of the substrate by using silicone or silicon dioxide powder through chemical vapor deposition (CVD) or indirect synthesis method (VAD); however, this solution can only deposit on one side at a time, and after deposition, the other side needs to be changed for deposition, resulting in low production efficiency; at the same time, impurities or crystallization often exist on the bottom surface (the back surface of the substrate deposition side), and the bottom surface needs to be machined before deposition to remove impurities and crystallization, further affecting the processing progress. Therefore, it is necessary to design a composite device for electrofused opaque quartz glass plates to solve the above problems. Summary of the Invention

[0004] The purpose of the utility model is to provide a composite device for electrofused opaque quartz glass plates that can effectively improve production efficiency during the composite process of quartz glass plates in view of the deficiencies of the prior art.

[0005] The technical solution of the utility model is as follows:

[0006] A composite device for electrofused opaque quartz glass plates, which is composed of a frame, a furnace chamber, a burner, a lifting and rotating mechanism, a support rotating shaft, and a fixture, is characterized in that: a furnace chamber is arranged on the frame, and a burner is arranged on the side wall of the furnace chamber; a lifting and rotating mechanism is arranged on the frame, a support rotating shaft is arranged on the lifting and rotating mechanism, the top end of the support rotating shaft extends into the furnace chamber, a turntable is arranged at the end of the support rotating shaft extending into the furnace chamber, and a fixture capable of vertically clamping and fixing the substrate is arranged on the turntable.

[0007] The number of the burners is one or more; when the number of burners is more than one, the burners are arranged in a staggered manner.

[0008] The furnace chamber is wrapped with a heat insulation layer, an air extraction port is arranged at the bottom of the furnace chamber, and a reserved hole is arranged at the top of the furnace chamber.

[0009] The lifting and rotating mechanism described above is composed of a lifting carriage and a rotating motor. A rotating motor is arranged on the lifting carriage, and the lifting carriage is slidably connected to the machine frame through a slide rail; the lifting carriage is connected to a support rotating shaft through a bearing, and a synchronous pulley is arranged at the bottom end of the support rotating shaft. The synchronous pulley is connected to the rotating motor through a synchronous belt.

[0010] The beneficial effects of the present utility model are as follows:

[0011] The composite device for the electrofused opaque quartz glass plate can simultaneously perform composite operations on four sides of the electrofused opaque quartz glass plate (front, back, and two side surfaces), reducing the production cycle, improving production efficiency, and reducing the problems of low production efficiency and complex processes caused by processing and removing impurities in single-sided composite; by adjusting the position of the turntable, the position of the electrofused opaque quartz glass can be adjusted, and local or overall composite can be performed; since the composite is formed in one step during the composite process, the attachment of impurities during multiple composite processes can be reduced, meeting the performance requirements for high-quality and high-purity composite electrofused opaque quartz glass coatings for semiconductors, and reducing impurity contamination. It solves the problem of low production efficiency in the existing composite method. Description of the Drawings

[0012] Figure 1 It is a structural schematic diagram of the present utility model.

[0013] In the figure: 1. Machine frame, 2. Furnace chamber, 3. Burner, 4. Support rotating shaft, 5. Fixture, 6. Turntable, 7. Thermal insulation layer, 8. Air extraction port, 9. Reserved hole, 10. Lifting carriage, 11. Rotating motor, 12. Synchronous pulley, 13. Substrate of the quartz glass plate. Specific Embodiments

[0014] The composite device for the fused opaque quartz glass plate is composed of a frame 1, a furnace chamber 2, a burner 3, a lifting and rotating mechanism, a support rotating shaft 4 and a fixture 5. The frame 1 is provided with the furnace chamber 2 to form a closed environment through the furnace chamber 2, thereby facilitating temperature rise and saving energy. A burner 3 is arranged on the side wall of the furnace chamber 2 to burn fuel through the burner 3, so as to raise the temperature inside the furnace chamber 2; at the same time, the high temperature generated by the combustion of the burner 3 liquefies or vaporizes the material, and then the material is compounded on the quartz glass plate to form a fused opaque quartz glass plate. The frame 1 is provided with a lifting and rotating mechanism, and the support rotating shaft 4 is arranged on the lifting and rotating mechanism. The top end of the support rotating shaft 4 extends into the furnace chamber 2, and a turntable 6 is arranged at the end of the support rotating shaft 4 extending into the furnace chamber 2. A fixture 5 capable of vertically clamping and fixing the base material is arranged on the turntable 6. The function of the lifting and rotating mechanism is to drive the support rotating shaft 4 to rotate and lift through the lifting and rotating mechanism, and then drive the turntable 6 to rotate and lift during the rotation and lifting of the support rotating shaft 4, so as to drive the quartz glass plate fixed on the turntable 6 through the fixture 5 to rotate and lift during the rotation and lifting of the turntable 6. Through rotation, the vaporized or liquefied material is evenly attached to the surface of the base material, and then evenly compounded to ensure the performance of the formed fused opaque quartz glass plate; through lifting, the position of the quartz glass plate is adjusted, and then the relative position between the quartz glass plate and the burner is adjusted, so as to adjust the up and down position of the compounding of the quartz glass plate and perform partial or overall compounding.

[0015] The number of burners 3 is one or more; when the number of burners 3 is multiple (two or more), the burners 3 are arranged in a staggered manner. Simultaneous compounding by multiple burners 3 can greatly improve the temperature rise and compounding efficiency, so as to produce quickly and improve production efficiency. The purpose of arranging the burners 3 in a staggered manner is to avoid the air flow impact generated by the burners 3, reduce the turbulent flow, and then ensure uniform compounding.

[0016] The furnace chamber 2 is wrapped with a heat insulation layer 7 to insulate heat through the heat insulation layer 7. On the one hand, it avoids scalding, and on the other hand, it avoids heat dissipation, thereby saving energy. An air extraction port 8 is arranged at the bottom of the furnace chamber 2 to discharge the waste gas and waste generated by combustion through the air extraction port 8, and reduce the impurities in the furnace chamber. A reserved hole 9 is arranged at the top of the furnace chamber 2 to install a sensor through the reserved hole 9, so as to monitor data such as the temperature and gas flow in the furnace chamber 2 to ensure production; or use the reserved hole 9 as an observation hole to observe the internal situation of the furnace chamber 2.

[0017] The lifting and rotating mechanism consists of a lifting carriage 10 and a rotating motor 11. The rotating motor 11 is arranged on the lifting carriage 10. The lifting carriage 10 is slidably connected to the machine frame 1 through a slide rail; the lifting carriage 10 is connected to the support rotating shaft 4 through a bearing. A synchronous pulley 12 is arranged at the bottom end of the support rotating shaft 4, and the synchronous pulley 12 is connected to the rotating motor 11 through a synchronous belt. The lifting carriage 10 is driven to lift by a pneumatic cylinder, a hydraulic cylinder, an electric cylinder or a lead screw pair. When the lifting carriage 10 lifts, it drives the support rotating shaft 4 to lift. The function of the rotating motor 11 is to drive the synchronous pulley 12 to rotate through the synchronous belt during the rotation of the rotating motor 11, and then drive the support rotating shaft 4 to rotate.

[0018] When the composite device for the fused opaque quartz glass plate prepares the composite fused opaque quartz glass, the quartz glass plate is fixed on the fixture 5 on the turntable 6, and the quartz glass plate is rotated for multi-faceted composite. Specifically:

[0019] Prepare the fused quartz glass substrate

[0020] Add quartz sand with a particle size of 20 - 100 μm D 50 (with an average particle size of 50 μm) to deionized water to prepare a slurry with a solid content of 70% - 90%. After homogenizing and defoaming the slurry, pour it into a mold for molding. After molding, dry it by gradient heating to obtain a blank. The heating gradient is 40, 50, 60, 70, 80, 90, 100, 110 °C. After drying, sinter the blank at a high temperature of 1300 - 1450 °C; the sintered sample is machined and cut into a quartz glass plate of 300 * 300 * (6 - 20) mm. The fused opaque quartz glass used can include any shape, such as square, circular, rod-shaped, and any variety, such as fused black quartz glass, low-hydroxyl quartz glass, and homogeneous quartz glass.

[0021] Preheating: Turn on the hydrogen-oxygen gas, control the gas flow rate at 200 - 600 L / min, and ignite (the heating method is hydrogen-oxygen flame combustion heating or electric heating. Taking hydrogen-oxygen flame heating as an example. The heating environment is an atmospheric environment, a vacuum environment (under the condition of electric heating), or an inert gas environment.); control the heating temperature at 1700 °C - 2200 °C, and preheat the furnace chamber 2. During the preheating process, reduce the risk of dust falling on the inner wall of the furnace chamber and the uniformity of synthesis lamination through the flowing gas. When the temperature of the furnace chamber 2 reaches 300 - 500 °C, that is, after the furnace chamber 2 is preheated, place the processed and formed fused quartz glass on the turntable, and clamp the quartz glass with the fixture 5; transfer the quartz glass into the furnace chamber 2, turn on the rotating motor 11, and the rotating motor 11 drives the fused quartz glass to rotate through the synchronous belt, synchronous pulley 13, support rotating shaft 4, turntable 6, and fixture 5 in sequence, and preheat the fused quartz glass for 30 min - 240 min.

[0022] Composite: After preheating the fused silica glass, continue to heat up the furnace chamber. After the furnace chamber temperature reaches 600°C - 800°C, feed the materials (the composite layer used for preparing the fused opaque composite silica glass by chemical vapor deposition method or indirect synthesis method; the raw materials for the chemical vapor deposition method include silicon tetrachloride (SiCl4) and octamethylcyclotetrasiloxane (D4); the indirect synthesis method is to melt and composite synthetic quartz sand or sinter a loose body prepared from silica glass powder into a composite layer. Here, the chemical vapor deposition method is taken as an example). The feeding speed is 200 - 1000 g / h. After the materials are vaporized, they are deposited on the surface of the fused silica glass for composite. Start the composite from the bottom of the fused silica glass and move the turntable 4 from top to bottom at a speed of 1 - 20 mm / min. According to requirements, adjust the position of the fused opaque silica glass by lifting to achieve partial or overall composite. After feeding for 1 - 5 h (determine the feeding time according to the actual thickness of the composite coating; the thicker the composite layer, the longer the feeding time, and the thinner the composite layer, the shorter the feeding time), reduce the flow rate of the oxy-hydrogen flame and control the flow rate of the oxy-hydrogen flame at 50 - 100 L / min. Keep warm for 1 - 6 h and perform annealing to prevent the fused silica glass from cracking under the action of thermal stress. After keeping warm, turn off the flame and cool. After the temperature of the fused silica glass drops below 500°C, take out the finished product to obtain the fused opaque silica glass.

[0023] The composite device of the fused opaque silica glass plate can composite the four sides of the fused opaque silica glass plate simultaneously, reducing the production cycle, improving the production efficiency, and reducing the problems of low production efficiency and complex processes caused by processing and removing impurities in single-sided composite; by adjusting the position of the turntable, the position of the fused opaque silica glass can be adjusted, and partial or overall composite can be carried out; since it is formed by one-time composite during the composite process, the attachment of impurities in multiple composite processes can be reduced, meeting the performance requirements of high-quality and high-purity composite fused opaque silica glass coatings for semiconductors, and reducing impurity pollution. It solves the problem of low production efficiency of the existing composite method.

Claims

1. A composite device for an electrofused opaque quartz glass plate, which is composed of a frame (1), a furnace chamber (2), a burner (3), a lifting and rotating mechanism, a support rotating shaft (4) and a fixture (5), and is characterized in that: A furnace chamber (2) is provided on a frame (1), and a burner (3) is provided on the side wall of the furnace chamber (2); a lifting and rotating mechanism is provided on the frame (1), a support rotating shaft (4) is provided on the lifting and rotating mechanism, the top end of the support rotating shaft (4) extends into the furnace chamber (2), a turntable (6) is provided at the end of the support rotating shaft (4) extending into the furnace chamber (2), and a fixture (5) capable of vertically clamping and fixing a substrate is provided on the turntable (6).

2. The composite device of an electrofused opaque quartz glass plate according to claim 1, characterized in that: The number of the burners (3) is one or more; when the number of the burners (3) is more than one, the burners (3) are arranged in a staggered manner.

3. The composite device of an electro-fused opaque quartz glass plate according to claim 1, characterized in that: A heat-insulating layer (7) is wrapped on the furnace chamber (2), an air extraction port (8) is provided at the bottom of the furnace chamber (2), and a reserved hole (9) is provided at the top of the furnace chamber (2).

4. The composite device of an electrofused opaque quartz glass plate according to claim 1, wherein: The lifting and rotating mechanism is composed of a lifting carriage (10) and a rotating motor (11). The rotating motor (11) is provided on the lifting carriage (10). The lifting carriage (10) is slidably connected to the frame (1) through a slide rail; the lifting carriage (10) is connected to the support rotating shaft (4) through a bearing. A synchronous pulley (12) is provided at the bottom end of the support rotating shaft (4), and the synchronous pulley (12) is connected to the rotating motor (11) through a synchronous belt.

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