Device for testing scratch resistance of sapphire wafer

Abstract

The utility model relates to the technical field of sapphire wafer scratch resistance testing, in particular to a device for sapphire wafer scratch resistance testing. The device for testing the scratch resistance of the sapphire wafer comprises a base, a supporting plate, a guide rail, a connecting block, a pull rod, a measuring rod, a measuring assembly and a balancing weight. The supporting plate is fixed on the base; the guide rail is fixed on the supporting plate; the connecting block is slidably arranged on the guide rail; the pull rod is fixedly connected to one side of the connecting block; the measuring rod penetrates through the connecting block and is not fixedly connected with the connecting block; the measuring assembly is in threaded connection with the measuring rod; and the balancing weight is sleeved on the measuring rod. The measuring rod is sleeved with one or more balancing weights, the pull rod is moved to drive the connecting block, the measuring rod and the measuring assembly to move, the scratch resistance of the sapphire wafer can be effectively measured, and the test is not limited by the shape of the sapphire wafer. In addition, the device is simple in structure, convenient to operate, low in testing cost, convenient to move and not limited by use sites.

Description

Technical Field

[0001] The present disclosure relates to the technical field of scratch resistance testing of sapphire wafers, and particularly to a device for scratch resistance testing of sapphire wafers. Background Art

[0002] As a high-end crystal material, sapphire is mostly used as window wafers in consumer electronic products, such as: smartwatch lenses, heart rate wafers, and covers of smartphones. To ensure good visual effects, these window wafers have high requirements for scratch and wear resistance. Therefore, sapphire wafers usually need to be subjected to scratch resistance testing after processing. However, at present, the structure of the scratch resistance testing device for sapphire wafers is complex, the manufacturing cost is high, and it is inconvenient to move. Summary of the Invention

[0003] In order to solve the above technical problems or at least partially solve the above technical problems, the present disclosure provides a device for scratch resistance testing of sapphire wafers, which has a simple structure, low processing cost, and can be moved freely.

[0004] To achieve the above object, the present utility model, a fixture for grinding the concave platform surface of a sapphire wafer, includes: a base; a support plate, the support plate is fixed on the base; a guide rail, the guide rail is fixed on the support plate; a connecting block, the connecting block is slidably arranged on the guide rail; a pull rod, the pull rod is fixedly connected to one side of the connecting block; the pull rod penetrates through the support plate; a measuring rod, the measuring rod penetrates through the connecting block, and the measuring rod is not fixedly connected to the connecting block; a measuring assembly, the measuring assembly includes a probe; the measuring assembly is threadedly connected to the measuring rod; a counterweight block, the counterweight block is sleeved on the measuring rod.

[0005] Optionally, there are two support plates, which are respectively fixed on both sides of the base; there are two guide rails, which are respectively fixed on the support plates.

[0006] Optionally, it further includes a first fixing plate, a first fixing screw, a second fixing plate, and a second fixing screw. The first fixing screw fixedly connects the first fixing plate to the connecting block; the pull rod is fixedly connected to the second fixing plate, and the second fixing screw fixedly connects the second fixing plate and the pull rod to one side of the connecting block.

[0007] Optionally, the measuring rod is a variable cross-section cylinder, and the measuring rod includes a counterweight placement table, a baffle, and a spring; the counterweight block is sleeved on the measuring rod through the counterweight placement table; the measuring rod penetrates through the first fixing plate and the connecting block; the baffle restricts the measuring rod to move only within the height range of the connecting block.

[0008] Optionally, the measuring assembly further includes a rotating member, a mounting hole, and a three-jaw chuck; the three-jaw chuck clamps the probe.

[0009] Optionally, a scale is provided on the top surface of the base.

[0010] Optionally, a scale is provided on the upper surface of the guide rail, and the scale on the guide rail corresponds to the scale on the scale.

[0011] Optionally, a limiting member is further included. The limiting member includes a limiting collar and a limiting screw. The limiting collar is sleeved on the guide rail, and the limiting screw fixes the position of the limiting collar on the guide rail.

[0012] The technical solution provided by the present disclosure has the following advantages compared with the prior art:

[0013] The present disclosure provides a device for testing the scratch resistance of sapphire wafers. By sleeving counterweights of different weights on the measuring rod and moving the pull rod to drive the connecting block, the measuring rod and the measuring assembly to move, the scratch resistance of the sapphire wafer can be effectively measured, and it is not limited by the shape of the sapphire wafer. In addition, the device for testing the scratch resistance of sapphire wafers provided by the present disclosure has a simple structure, convenient operation, low test cost, and is convenient to move, and is not limited by the use site. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The accompanying drawings herein are incorporated into the specification and form a part of the specification, showing embodiments consistent with the present disclosure, and are used together with the specification to explain the principles of the present disclosure.

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present disclosure or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, for those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0016] Figure 1 is the front view of the device for testing the scratch resistance of sapphire wafers;

[0017] Figure 2 is the top view of the device for testing the scratch resistance of sapphire wafers;

[0018] Figure 3 is the structural schematic diagram of the measuring rod of the device for testing the scratch resistance of sapphire wafers;

[0019] Figure 4 is the structural schematic diagram of the measuring assembly of the device for testing the scratch resistance of sapphire wafers;

[0020] Wherein: 1. Base, 2. Support plate, 3. Guide rail, 4. Connecting block, 5. Pull rod, 6. Measuring rod, 61. Counterweight placement table, 62. Baffle, 63. Spring, 7. Measuring assembly, 71. Rotating part, 72. Mounting hole, 73. Three-jaw chuck, 74. Probe, 8. Counterweight, 9. Scale, 10. First fixing plate, 11. First fixing screw, 12. Second fixing plate, 13. Second fixing screw, 14. Limiting part, 141. Limiting collar, 142. Limiting screw. Detailed implementation manner

[0021] In order to more clearly understand the above-mentioned objects, features, and advantages of the present disclosure, the solutions of the present disclosure will be further described below. It should be noted that, without conflict, the embodiments of the present disclosure and the features in the embodiments may be combined with each other.

[0022] In the following description, many specific details are set forth in order to fully understand the present disclosure, but the present disclosure may also be implemented in other ways different from those described herein; obviously, the embodiments in the specification are only a part of the embodiments of the present disclosure, rather than all the embodiments.

[0023] As Figure 1 - Figure 2 shown, the present disclosure provides a device for anti-scratch testing of sapphire wafers, which includes: a base 1, a support plate 2, a guide rail 3, a connecting block 4, a pull rod 5, a measuring rod 6, a measuring assembly 7, and a counterweight 8. The support plate 2 is fixed on the base 1; the guide rail 3 is fixed on the support plate 2; the connecting block 4 is slidably arranged on the guide rail 3; the pull rod 5 is fixedly connected to one side of the connecting block 4; the pull rod 5 penetrates through the support plate 2; the measuring rod 6 penetrates through the connecting block 4, and the measuring rod 6 has no fixed connection with the connecting block 4; the measuring assembly 7 includes a probe 74; the measuring assembly 7 is threadedly connected to the measuring rod 6; the counterweight 8 is sleeved on the measuring rod 6.

[0024] Specifically, the base 1 is a cuboid, and its upper surface is a smooth plane. During testing, the sapphire wafer is fixed at a specific position on the upper surface of the base 1 according to the testing requirements. Among them, during measurement, the shape of the sapphire wafer is not restricted. The measuring rod 6 penetrates through the connecting block 4, and the fact that the measuring rod 6 is movably connected to the connecting block 4 means that the measuring rod 6 can move vertically inside the connecting block 4; in addition, the counterweight 8 can include multiple pieces, the mass of the counterweight 8 can be 50g, 100g, and one counterweight 8 or multiple counterweights 8 can be sleeved on the measuring rod 6.

[0025] In addition, the pull rod 5 is fixedly connected to one side of the connecting block 4. During testing, the connecting block 4, the measuring rod 6, and the measuring assembly 7 are driven to move by moving the pull rod 5. Among them, during testing, the pull rod 5 can be manually dragged to move, or a servo motor can be externally connected to the end of the pull rod 5 that is not connected to the connecting block 4, and the pull rod 5 is dragged to move by the motor.

[0026] By sleeving counterweight blocks 8 of different weights on the measuring rod 6, moving the pull rod 5 to drive the connecting block 4, the measuring rod 6 and the measuring assembly 7 to move can effectively measure the scratch resistance of the sapphire wafer, and it is not limited by the shape of the sapphire wafer.

[0027] During specific use, fix the sapphire wafer on the base 1, move the connecting block 4 above the sapphire wafer, make the probe 74 correspond to the specified position of the sapphire wafer, sleeve a counterweight block 8 of a specified weight on the measuring rod 6. After installing the counterweight block 8, the probe 74 contacts the sapphire wafer under the action of the counterweight block 8. Pull the pull rod 5 to drive the connecting block 4 and the probe 74 to slide a specified distance on the sapphire wafer. Remove the counterweight block 8, take out the sapphire wafer, and detect whether there are scratches on its surface.

[0028] In some embodiments, there are two support plates 2, which are respectively fixed on both sides of the base 1; there are two guide rails 3. Among them, the guide rail 3 can be a cylinder, and the two guide rails 3 are symmetrically fixed on the support plate 2.

[0029] Continue to refer to Figure 1 - Figure 2 , the device for testing the scratch resistance of the sapphire wafer further includes a first fixing plate 10, a first fixing screw 11, a second fixing plate 12, and a second fixing screw 13. The first fixing screw 11 fixedly connects the first fixing plate 10 to the connecting block 4; the pull rod 5 is fixedly connected to the second fixing plate 12, and the second fixing screw 13 fixedly connects the second fixing plate 12 and the pull rod 5 to one side of the connecting block 4.

[0030] As Figure 3 shown, the measuring rod 6 is a variable cross-section cylinder. The measuring rod 6 includes a counterweight placing table 61, a baffle 62, and a spring 63; the counterweight block 8 is sleeved on the measuring rod 6 through the counterweight placing table 61; the measuring rod 6 penetrates through the first fixing plate 10 and the connecting block 4; among them, the size of the baffle 62 is larger than the size of the through holes corresponding to the measuring rod 6 on the first fixing plate 10 and the connecting block 4, and the baffle 62 restricts the measuring rod 6 to move only within the height range of the connecting block 4.

[0031] Specifically, a spring 63 is provided. When the counterweight placing table 61 sleeves the counterweight block 8, the spring 63 is compressed to drive the measuring rod 6 to move downward. When the counterweight block 8 is removed, the spring 63 returns to its original state to drive the measuring rod 6 to move upward. Through this setting, it is convenient to install and disassemble the sapphire wafer.

[0032] As Figure 4 shown, the measuring assembly 7 further includes a rotating member 71, a mounting hole 72, and a three-jaw chuck 73; the three-jaw chuck 73 clamps the probe 74.

[0033] Specifically, there can be multiple probes 74, and the diameter of the probe 74 can be 1 mm, 2 mm, or 5 mm; the mounting hole 72 is used to assist in mounting the measuring component 7; the three-jaw chuck 73 clamps the probe 74, and the rotating member 71 controls the three-jaw chuck 73 to clamp and loosen. When in actual use, rotate the rotating member 71 to adjust the three-jaw chuck 73 to a relaxed state, place the probe 74 of a specified size into the three-jaw chuck 73, and then rotate the rotating member 71 to adjust the three-jaw chuck 73 to a clamped state, thereby clamping the probe 74.

[0034] In some embodiments, a scale 9 is provided on the top surface of the base 1.

[0035] Specifically, the scale 9 is pasted on the top surface of the base 1, and both ends of the scale 9 are in contact with the support plate 2.

[0036] When in actual use, when the sapphire wafer is pasted on the base, compare it with the scale 9 and align one end of the sapphire wafer with the scale on the scale 9. Through this setting, it is convenient to confirm the sliding distance of the probe 74 on the sapphire wafer during the test.

[0037] In some embodiments, a scale is provided on the upper surface of the guide rail 3, and the scale on the guide rail 3 corresponds to the scale on the scale 9.

[0038] Specifically, a scale is provided on the upper surface of the guide rail 3, and the scale on the guide rail 3 corresponds to the scale on the scale 9. Through this setting, the sliding distance of the probe 74 on the sapphire wafer during the test can be determined by the moving distance of the connecting block 4 on the guide rail 3, and the observation is more intuitive and accurate, minimizing the impact of visual errors on the test.

[0039] In some embodiments, the device for the anti-scratch test of the sapphire wafer further includes a limiting member 14, and the limiting member 14 includes a limiting collar 141 and a limiting screw 142. The limiting collar 141 is sleeved on the guide rail 3, and the limiting screw 142 fixes the position of the limiting collar 141 on the guide rail 3.

[0040] Specifically, the limiting screw 142 fixes the position of the limiting collar 141 on the guide rail 3. Through this setting, the limiting member 14 can limit the movement of the connecting block 4 on the guide rail 3, making the control of the moving distance of the connecting block 4 on the guide rail 3 more accurate and avoiding excessive or insufficient sliding distance.

[0041] When in actual use, according to the test requirements, after selecting the test distance, move the limiting collar 141 to a specific distance behind the connecting block 4 according to the scale on the guide rail 3, and then use the limiting screw 142 to fix the limiting collar 141.

[0042] Such as Figure 1 - Figure 4The device for the scratch resistance test of the sapphire wafer shown is specifically used as follows. During actual use, first refer to the scale on the scale ruler 9, fix the sapphire wafer at the designated position on the base 1, adjust the rotating part 71, control the three-jaw chuck 73 to clamp the probe 74, move the fixed block 4, corresponding to the scale on the slide rail 3, move the fixed block 4 to the designated position, according to the test requirements, move the limit collar 141 to the designated position on the guide rail 3, tighten the limit screw 142 to fix the position of the limit collar 141, sleeve a counterweight block 8 with a designated weight on the counterweight block placement table 61. Under the action of the counterweight block 8, the spring 63 is compressed, driving the probe 74 to move downward and contact the upper surface of the sapphire wafer. Pull the pull rod 5 at a uniform speed to drive the fixed block 4 to move a designated distance, remove the counterweight block 8, take out the sapphire wafer, and judge whether there are scratches on its surface.

[0043] It should be noted that in this text, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "including a..." does not exclude the existence of additional identical elements in the process, method, article or device including the element.

[0044] The above are only specific implementation manners of the present disclosure, enabling those skilled in the art to understand or implement the present disclosure. Various modifications to these embodiments will be obvious to those skilled in the art. The general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present disclosure. Therefore, the present disclosure will not be limited to these embodiments herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An apparatus for anti-scratch testing of sapphire wafers, characterized in that, Comprising: Base (1); Support plate (2), the support plate (2) is fixed on the base (1); Guide rail (3), the guide rail (3) is fixed on the support plate (2); Connecting block (4), the connecting block (4) is slidably arranged on the guide rail (3); Pull rod (5), the pull rod (5) is fixedly connected to one side of the connecting block (4); the pull rod (5) penetrates through the support plate (2); Measuring rod (6), the measuring rod (6) penetrates through the connecting block (4), and the measuring rod (6) has no fixed connection with the connecting block (4); Measuring assembly (7), the measuring assembly (7) includes a probe (74); the measuring assembly (7) is threadedly connected to the measuring rod (6); Counterweight block (8), the counterweight block (8) is sleeved on the measuring rod (6).

2. The device for the anti-scratch test of the sapphire wafer according to claim 1, characterized in that, There are two support plates (2), which are respectively fixed on both sides of the base (1); there are two guide rails (3), which are respectively fixed on the support plates (2).

3. The device for anti-scratch testing of sapphire wafers according to claim 1, characterized in that, It further includes a first fixing plate (10), a first fixing screw (11), a second fixing plate (12), and a second fixing screw (13). The first fixing screw (11) fixedly connects the first fixing plate (10) to the connecting block (4); the pull rod (5) is fixedly connected to the second fixing plate (12), and the second fixing screw (13) fixedly connects the second fixing plate (12) and the pull rod (5) to one side of the connecting block (4).

4. The device for scratch resistance testing of sapphire wafers according to claim 3, characterized in that, The measuring rod (6) is a variable cross-section cylinder, and the measuring rod (6) includes a counterweight placement table (61), a baffle (62), and a spring (63); the counterweight block (8) is sleeved on the measuring rod (6) through the counterweight placement table (61); the measuring rod (6) penetrates through the first fixing plate (10) and the connecting block (4); the baffle (62) restricts the measuring rod (6) to move only within the height range of the connecting block (4).

5. The device for scratch resistance test of sapphire wafers according to claim 1, characterized in that, The measuring assembly (7) further includes a rotating part (71), a mounting hole (72), and a three-jaw chuck (73); the three-jaw chuck (73) clamps the probe (74).

6. The device for scratch resistance testing of sapphire wafers according to claim 1, wherein, A scale (9) is provided on the top surface of the base (1).

7. The device for scratch resistance testing of sapphire wafers according to claim 6, characterized in that, A scale is provided on the upper surface of the guide rail (3), and the scale on the guide rail (3) corresponds to the scale on the scale (9).

8. The device for anti-scratch testing of sapphire wafers according to claim 1, characterized in that, It further includes a limiting member (14), the limiting member (14) includes a limiting collar (141) and a limiting screw (142), the limiting collar (141) is sleeved on the guide rail (3), and the limiting screw (142) fixes the position of the limiting collar (141) on the guide rail (3).

9. The device for anti-scratch testing of sapphire wafers according to claim 1, wherein, The base (1), the support plate (2), the guide rail (3), the connecting block (4), the pull rod (5), the measuring rod (6), and the counterweight block (8) are all made of stainless steel.

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