Bearing mechanism and wafer detection bearing jig

Abstract

The utility model discloses a bearing mechanism and a wafer detection bearing jig, the bearing mechanism comprises a horizontally arranged support beam and a mounting seat used for being connected with a turntable, one end of the support beam is fixed with the mounting seat, and the upper surface of the support beam is flush with or higher than the upper surface of the mounting seat; a bearing block is arranged on the upper surface of the other end of the supporting beam, the bearing block is horizontally arranged, a bearing piece is arranged on the upper surface of the outer end of the bearing block, the bearing piece is a rubber ring, and the bearing piece is obliquely arranged with the inner bottom and the outer high. The wafer detection bearing jig comprises a rotating disc and a plurality of the bearing mechanisms arranged on the rotating disc, all the bearing mechanisms are evenly distributed along the circumference of the rotating disc, and each bearing mechanism extends out of the rotating disc in the radial direction of the rotating disc and is used for bearing wafers. According to the utility model, the edge of the wafer cannot be damaged, and the wafer detection efficiency can be improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of semiconductor detection, relates to wafer detection, and particularly relates to a carrying mechanism and a wafer detection carrying jig. Background Art

[0002] A silicon wafer, also known as a silicon wafer slice, is an important material for manufacturing integrated circuits. By means of photolithography, ion implantation, etc. on the silicon wafer, integrated circuits and various semiconductor devices can be made. A silicon wafer is a sheet-shaped object made of silicon, and its diameters are in specifications such as 6 inches, 8 inches, 12 inches, 18 inches, etc. Semiconductor silicon wafers are the most widely used and important semiconductor basic materials globally. They are the basic substrate materials for manufacturing chips and the only semiconductor materials that penetrate all the front-end processes of chips. Currently, in the global semiconductor market, more than 90% of chips and sensors are manufactured based on silicon materials, and it accounts for the largest proportion among wafer manufacturing materials.

[0003] During the production process of a wafer, it is necessary to perform an appearance inspection on its outer edge to ensure the quality of the wafer. In the prior art, a rotating mechanism is usually used to carry and drive the wafer to rotate to ensure that the detection device effectively inspects the entire outer edge of the wafer. The rotating mechanism includes a turntable and a carrying jig arranged on the turntable. The carrying jig is used to carry and clamp the wafer. Chinese Patent CN105470192A discloses a wafer clamping mechanism, which includes: a turntable; a plurality of claws, the plurality of claws including at least one movable claw, the movable claw being movably arranged on the turntable, and the claws being used to clamp the wafer on the turntable; an elastic clamping force assembly, the elastic clamping force assembly being arranged to provide an elastic clamping force for the movable claw to clamp the wafer. By setting the elastic clamping force assembly, the clamping force for the movable claw to clamp the wafer can be provided, and the clamping force of the movable claw clamping the wafer is relatively large, which can prevent the self-rotation of the wafer and can effectively protect the wafer. However, clamping the wafer will cause damage to the wafer edge, and during the detection process, it is necessary to change hands so that the clamping part is exposed for inspection of the clamping part. At the same time, when the clamping mechanism needs to accommodate a large-size wafer, a turntable with a larger outer diameter needs to be replaced, and the disassembly and assembly of the turntable are very inconvenient, affecting the wafer detection efficiency. Summary of the Invention

[0004] Aiming at the above deficiencies existing in the prior art, the purpose of the utility model is to provide a carrying mechanism and a wafer detection carrying jig, which will not cause damage to the wafer edge and are also conducive to improving the wafer detection efficiency.

[0005] The technical solution of the utility model is realized as follows:

[0006] A carrying mechanism includes a horizontally arranged support beam and a mounting seat for connecting with a turntable. One end of the support beam is fixed to the mounting seat, and the upper surface of the support beam is flush with or higher than the upper surface of the mounting seat. A carrying block is provided on the upper surface of the other end of the support beam. The carrying block is horizontally arranged, and a carrying member is provided on the upper surface of the outer end of the carrying block. The carrying member is a rubber ring, and the inner bottom of the carrying member is inclined with the outer side higher.

[0007] Further, an inclined sink with the inner bottom lower and the outer side higher is provided on the upper surface of the outer end of the carrying block. The inclination angle of the sink corresponds to the inclination angle of the carrying member. The carrying member is arranged on the sink, and at the same time, the upper part of the carrying member protrudes a certain height above the carrying block.

[0008] Further, a convex block protrudes downward from the lower surface of the inner end of the carrying block towards the lower part of the carrying block. A groove corresponding to the convex block is provided on the support beam. The convex block of the carrying block is embedded in the groove of the support beam. At the same time, a plurality of first threaded holes are provided on the lower surface of the carrying block, and second threaded holes penetrating the upper and lower surfaces of the support beam are provided on the support beam. The first threaded holes and the second threaded holes are arranged in one-to-one correspondence. A first bolt passes through the second threaded hole from bottom to top and inserts into the first threaded hole, thereby realizing the connection between the carrying block and the support beam.

[0009] Further, the carrying member is detachably arranged on the carrying block. A third threaded hole corresponding to the central hole of the carrying member is provided on the carrying block. A second bolt passes through the central hole of the carrying member from top to bottom and inserts into the third threaded hole. The size of the upper end of the second bolt is smaller than that of the carrying member, thereby pressing and fixing the carrying member on the carrying block.

[0010] Further, the inclination angle of the carrying member is 7 - 9°.

[0011] Further, a lifting adjustment member is provided between the mounting seat and the support beam. The lifting adjustment member is fixed on the mounting seat, and the support beam is arranged on the lifting adjustment member in a liftable manner, facilitating the adjustment of the height of the support beam by adjusting the lifting adjustment member to lift the support beam.

[0012] Further, the mounting seat includes a horizontally arranged cross plate and a vertically arranged vertical plate. The vertical plate is arranged on one side edge of the cross plate and above the cross plate, thus forming an L-shaped structure. A plurality of mounting holes are provided on the cross plate for connecting with the turntable, and a plurality of connection holes are provided on the vertical plate for connecting with the lifting adjustment member.

[0013] Further, there are two rubber rings, and the two rubber rings are arranged overlapping each other up and down.

[0014] A wafer detection carrying fixture includes a turntable and a plurality of the above-mentioned carrying mechanisms arranged on the turntable. All the carrying mechanisms are evenly distributed along the circumference of the turntable, and each carrying mechanism extends radially to the outside of the turntable for carrying wafers.

[0015] Compared with the prior art, the utility model has the following beneficial effects:

[0016] 1. The utility model uses a rubber ring as a bearing member, which is inclinedly arranged on the bearing block. During use, the wafer is directly placed on the rubber rings of all bearing mechanisms on the turntable, and the lower surface of the wafer contacts the rubber ring, so as to fix the wafer by using the friction force of the rubber ring on the wafer, making the wafer have good stability during rotation. There is no need to set up clamping members to clamp the wafer, thus effectively avoiding damage to the edge of the wafer while realizing wafer fixation. At the same time, during the wafer detection process, the entire peripheral edge of the wafer can be detected without changing hands, effectively improving the wafer detection efficiency.

[0017] 2. The bearing mechanism of the utility model has good universality and can be used to bear wafers of different specifications and sizes. When wafers of different specifications and sizes need to be detected, there is no need to replace the turntable or adjust the bearing mechanism, thereby further improving the wafer detection efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 - Structural schematic diagram of the bearing mechanism of the utility model.

[0019] Figure 2 - Front view of the bearing mechanism of the utility model.

[0020] Figure 3 - Structural schematic diagram of the bearing fixture of the utility model.

[0021] Wherein: 100 - bearing mechanism; 101 - mounting base; 102 - lifting adjustment member; 103 - support beam; 104 - bearing block; 105 - bearing member; 200 - turntable. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0022] The following further describes the utility model in detail with reference to the drawings and specific embodiments.

[0023] See Figure 1 、 Figure 2 and Figure 3 A bearing mechanism 100 includes a horizontally arranged support beam 103 and a mounting base 101 for connecting with a turntable 200. One end of the support beam 103 is fixed to the mounting base 101, and the upper surface of the support beam 103 is flush with or higher than the upper surface of the mounting base 101. The upper surface of the other end of the support beam 103 is provided with a bearing block 104, the bearing block 104 is horizontally arranged, and the upper surface of the outer end of the bearing block 104 is provided with a bearing member 105. The bearing member 105 is a rubber ring, and the inner bottom of the bearing member 105 is inclined with the outer side being higher.

[0024] When using this carrier mechanism, multiple carrier mechanisms 100 are arranged on the turntable 200. All the carrier mechanisms 100 are evenly distributed along the circumference of the turntable 200 and each carrier mechanism 100 extends radially outward from the turntable 200 for carrying wafers. Figure 3 Six carrier mechanisms are provided on the turntable. In specific applications, it can be set according to needs.

[0025] In this way, the wafer can be directly placed on the carriers of all the carrier mechanisms. The lower surface of the wafer contacts the rubber ring. Since the rotation speed of the turntable is relatively slow during the wafer detection process, the friction force of the rubber ring on the wafer can be utilized to fix the wafer, so that the wafer has good stability during rotation. Furthermore, while fixing the wafer, damage to the wafer edge can be effectively avoided. At the same time, during the wafer detection process, the entire circumferential edge of the wafer can be detected without changing hands, effectively improving the wafer detection efficiency. At the same time, this carrier mechanism has good universality and can be used to carry wafers of different specifications and sizes. When wafers of different specifications and sizes need to be detected, there is no need to replace the turntable or adjust the carrier mechanism, thus further improving the wafer detection efficiency.

[0026] During specific implementation, an inclined sunk platform with an inner bottom and an outer height is provided on the upper surface of the outer end of the carrier block 104. The inclination angle of the sunk platform corresponds to the inclination angle of the carrier 105. The carrier 105 is arranged on the sunk platform. At the same time, the upper part of the carrier 105 protrudes from the carrier block 104 by a certain height. The inclination angle a of the carrier 105 and the sunk platform is 7 to 9°.

[0027] It is found through practice that when the inclination angle of the carrier is 7 to 9°, the contact area between the wafer and the carrier after the wafer is placed on the carrier is small, which can effectively reduce the contamination of the wafer and can effectively fix the wafer at the same time.

[0028] During specific implementation, a convex block protrudes downward from the lower surface of the inner end of the carrier block 104. A groove corresponding to the convex block is provided on the support beam 103. The convex block of the carrier block 104 is embedded in the groove of the support beam 103. At the same time, a plurality of first threaded holes are provided on the lower surface of the carrier block 104, and second threaded holes penetrating the upper and lower surfaces of the support beam 104 are provided on the support beam 103. The first threaded holes and the second threaded holes are arranged in one-to-one correspondence. The first bolts pass through the second threaded holes from bottom to top and are inserted into the first threaded holes, thereby realizing the connection between the carrier block 104 and the support beam 103.

[0029] In this embodiment, two first threaded holes and two second threaded holes are respectively provided, and they are respectively arranged along the length directions of the carrier block and the support beam.

[0030] In specific implementation, the carrier 105 is detachably arranged on the carrier block 104. The carrier block 104 is provided with a third threaded hole corresponding to the central hole of the carrier 105. The second bolt passes through the central hole of the carrier 105 from top to bottom and is inserted into the third threaded hole. The size of the upper end of the second bolt is smaller than that of the carrier 105, so as to press and fix the carrier 105 on the carrier block 104.

[0031] In this way, after the second bolt presses the carrier (rubber ring) on the carrier block, the inner ring of the rubber ring is sunken and the outer ring protrudes from the second bolt for carrying the wafer. A rubber ring with a high hardness can be selected for the rubber ring, which is beneficial to reducing the contact area between the wafer and the rubber ring.

[0032] In specific implementation, a lifting and adjusting member 102 is arranged between the mounting seat 101 and the support beam 103. The lifting and adjusting member 102 is fixed on the mounting seat 101. The support beam 103 is arranged on the lifting and adjusting member 103 in a liftable manner, facilitating the adjustment of the height of the support beam 103 by adjusting the lifting and adjusting member 103, so as to adjust the height of the support beam 103.

[0033] Here, the lifting and adjusting member is used to lift the support beam to finely adjust the height of the carrier of the loading mechanism, so that the heights of all carriers on the turntable are the same. During the specific adjustment process, a camera and a laser can be assisted to improve the adjustment accuracy. In this embodiment, one end of the support beam close to the mounting seat is folded downward to form a connecting portion, and the connecting portion is connected to the lifting and adjusting member.

[0034] In specific implementation, the mounting seat 101 includes a horizontally arranged cross plate and a vertically arranged vertical plate. The vertical plate is arranged on one side edge of the cross plate and above the cross plate, thus forming an L-shaped structure. The cross plate is provided with a plurality of mounting holes for connecting with the turntable 200, and the vertical plate is provided with a plurality of connecting holes for connecting with the lifting and adjusting member 103.

[0035] In this embodiment, the vertical plate and the cross plate are integrally formed.

[0036] In specific implementation, there are two rubber rings, and the two rubber rings are arranged overlapping up and down, which can effectively increase the buffering effect.

[0037] Finally, it should be noted that the above embodiments of the present invention are only examples for explaining the present invention, rather than limitations on the implementation manners of the present invention. For those of ordinary skill in the art, other different forms of changes and modifications can be made on the basis of the above description. It is impossible to list all the implementation manners here. Any obvious changes or modifications derived from the technical solutions of the present invention still fall within the protection scope of the present invention.

Claims

1. A carrying mechanism, characterized in that, It includes a horizontally arranged support beam and a mounting seat for connecting with a turntable. One end of the support beam is fixed to the mounting seat, and the upper surface of the support beam is flush with or higher than the upper surface of the mounting seat. A bearing block is provided on the upper surface of the other end of the support beam. The bearing block is horizontally arranged, and a bearing member is provided on the upper surface of the outer end of the bearing block. The bearing member is a rubber ring, and the inner bottom of the bearing member is inclined with the outer end being higher.

2. The load-bearing mechanism according to claim 1, characterized in that, An inclined sink with an inner bottom lower and outer end higher is provided on the upper surface of the outer end of the bearing block. The inclination angle of the sink corresponds to the inclination angle of the bearing member. The bearing member is arranged on the sink, and at the same time, the upper part of the bearing member protrudes a certain height from the bearing block.

3. The load-bearing mechanism according to claim 2, characterized in that, A convex block protrudes downward from the lower surface of the inner end of the bearing block towards the lower part of the bearing block. A groove corresponding to the convex block is provided on the support beam. The convex block of the bearing block is embedded in the groove of the support beam. At the same time, a number of first threaded holes are provided on the lower surface of the bearing block, and second threaded holes penetrating the upper and lower surfaces of the support beam are provided on the support beam. The first threaded holes and the second threaded holes are arranged in one-to-one correspondence. A first bolt passes through the second threaded hole from bottom to top and inserts into the first threaded hole, thereby realizing the connection between the bearing block and the support beam.

4. A carrying mechanism according to claim 2, characterized in that, The bearing member is detachably arranged on the bearing block. Third threaded holes corresponding to the central holes of the bearing member are provided on the bearing block. A second bolt passes through the central hole of the bearing member from top to bottom and inserts into the third threaded hole. The size of the upper end of the second bolt is smaller than that of the bearing member, thereby pressing and fixing the bearing member on the bearing block.

5. A bearing mechanism according to claim 1, 2 or 3, characterized in that The inclination angle of the bearing member is 7 - 9°.

6. The load-bearing mechanism according to claim 1, wherein, A lifting adjustment member is provided between the mounting seat and the support beam. The lifting adjustment member is fixed on the mounting seat, and the support beam is arranged on the lifting adjustment member in a liftable manner, facilitating the adjustment of the height of the support beam by adjusting the lifting adjustment member to lift the support beam.

7. The carrier mechanism according to claim 6, wherein, The mounting seat includes a horizontally arranged cross plate and a vertically arranged vertical plate. The vertical plate is arranged on one side edge of the cross plate and above the cross plate, thus forming an L-shaped structure. A number of mounting holes are provided on the cross plate for connecting with the turntable, and a number of connection holes are provided on the vertical plate for connecting with the lifting adjustment member.

8. A carrying mechanism according to claim 1, characterized in that, There are two rubber rings, and the two rubber rings are arranged overlappingly up and down.

9. A wafer detection carrier fixture includes a turntable and a number of carrier mechanisms as described in any one of claims 1 - 8 arranged on the turntable. All carrier mechanisms are evenly distributed along the circumference of the turntable, and each carrier mechanism extends radially to the outside of the turntable along the radial direction of the turntable for carrying wafers.

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