External liquid removal device for silicon tetrachloride vaporizer

Abstract

The utility model provides a liquid removing device externally arranged on a silicon tetrachloride vaporizer, and aims to solve the technical problem that liquid is contained in a medium after silicon tetrachloride is vaporized in the prior art. The liquid removal device comprises: a tank body having an inlet, an outlet and an inspection port; the defoaming net is arranged in the middle of the tank body and located between the inlet and the outlet, and the interior of the tank body is divided into two spaces by the defoaming net; the blind plate covers the inspection opening; wherein the inlet is located at the bottom of the tank body, and the outlet is located above the inlet. The inlet of the tank body is connected with the outlet of the vaporizer, a medium obtained after vaporization of silicon tetrachloride needs to penetrate through the defoaming net, and liquid carried in the medium can be separated through the defoaming net. Besides, the inlet of the tank body is arranged at the bottom of the tank body, so that the separated liquid can fall into the vaporizer again under the influence of gravity for vaporization. According to the technical scheme, the influence on the production quality of polycrystalline silicon in the reduction furnace can be avoided, and the production energy consumption of the polycrystalline silicon is reduced.

Description

Technical Field

[0001] The utility model relates to a vapor-liquid separation device, specifically to a liquid removal device with an external silicon tetrachloride vaporizer. Background Art

[0002] In the production process of polysilicon, one of its by-products is silicon tetrachloride. Since the generated silicon tetrachloride carries silicon atoms, the output of polysilicon will decrease. In addition, silicon tetrachloride is difficult to handle and will pollute the environment. Therefore, a process for treating silicon tetrachloride will be designed during the production process.

[0003] Currently, the relatively conventional treatment method is to convert silicon tetrachloride into trichlorosilane through hydrogenation, and then make the trichlorosilane re-enter the reduction furnace, where it is reduced to polysilicon by hydrogen in the reduction furnace to achieve closed-loop cyclic production. Generally speaking, in order to improve the reaction efficiency of silicon tetrachloride hydrogenation, it is necessary to vaporize silicon tetrachloride.

[0004] Silicon tetrachloride usually adopts a mixed vaporization method, that is, hydrogen and silicon tetrachloride are fed into the vaporizer at a fixed flow rate. The vaporization temperature of silicon tetrachloride is reduced by hydrogen bubbling. At the same time, a steam tube bundle is introduced into the vaporizer to provide heat for the vaporization of silicon tetrachloride.

[0005] However, the medium after the vaporization of silicon tetrachloride is likely to carry liquid. This liquid enters the reduction furnace along with the medium, which will affect the quality of polysilicon products and increase the production energy consumption of polysilicon. Summary of the Utility Model

[0006] Aiming at the technical problem that the medium after the vaporization of silicon tetrachloride in the prior art carries liquid, the utility model provides a liquid removal device with an external silicon tetrachloride vaporizer, which has the advantage of being able to separate the liquid in the medium after the vaporization of silicon tetrachloride.

[0007] The technical solution of the utility model is as follows:

[0008] A liquid removal device with an external silicon tetrachloride vaporizer, comprising:

[0009] A tank body, having an inlet, an outlet and an inspection port;

[0010] A demisting net, arranged in the middle of the tank body, located between the inlet and the outlet, and dividing the inner part of the tank body into two spaces;

[0011] A blind plate, covering the inspection port;

[0012] Wherein, the inlet is located at the bottom of the tank body, and the outlet is located above the inlet.

[0013] Optionally, the blind plate is detachably arranged on the inspection port.

[0014] Optionally, the opening size of the inspection port is equal to the cross-sectional size of the tank body.

[0015] Optionally, the outlet is located on the side of the tank body.

[0016] Optionally, flange plates are provided on both the inlet and the outlet.

[0017] Optionally, a head is provided at the bottom of the tank body, and the inlet is provided on the head.

[0018] Optionally, the blind plate is rotatably arranged on the inspection port, and a sealing gasket is provided between the blind plate and the inspection port.

[0019] Optionally, a raised support part is provided inside the tank body, the demisting net is arranged in a mounting part, and the mounting part is placed on the support part.

[0020] Optionally, the mounting part is an annular columnar structure, and the top of the mounting part has a hook.

[0021] Optionally, a pressure ring is movably arranged inside the tank body, and the pressure ring is placed on the top of the mounting part.

[0022] Compared with the prior art, the beneficial effects of the present utility model are:

[0023] The entire tank body is installed on the outlet of the vaporizer, and the inlet of the tank body is connected to the outlet of the vaporizer. Then, the medium after the vaporization of silicon tetrachloride enters the tank body and moves towards the outlet on the tank body. During this process, the medium after the vaporization of silicon tetrachloride needs to pass through the demisting net, and the liquid carried in the medium can be separated through the demisting net.

[0024] In addition, since the inlet of the tank body is arranged at its bottom, after the liquid is separated, it will fall back into the vaporizer under the influence of gravity for vaporization.

[0025] With this technical solution, the liquid in the medium after the vaporization of silicon tetrachloride can be separated, which can avoid affecting the quality of polysilicon production in the reduction furnace and reduce the production energy consumption of polysilicon. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0027] Figure 1 It is a schematic structural diagram of the present utility model. Detailed implementation mode

[0028] In the following text, only some exemplary embodiments are simply described. As those skilled in the art can recognize, the described embodiments can be modified in various different ways without departing from the spirit or scope of the present invention. Therefore, the drawings and the description are considered to be exemplary in nature rather than restrictive.

[0029] The following disclosure provides many different embodiments or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, the components and settings of specific examples are described below. Of course, they are only examples and are not intended to limit the present invention. In addition, the present invention may repeat reference numerals and / or reference letters in different examples. This repetition is for the purpose of simplification and clarity and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the present invention provides examples of various specific processes and materials, but those of ordinary skill in the art can be aware of the application of other processes and / or the use of other materials.

[0030] The embodiments of the present invention will be described in detail below with reference to the drawings.

[0031] Embodiment:

[0032] See Figure 1 , in this embodiment, a liquid removal device with an external silicon tetrachloride vaporizer is disclosed, including a tank body 10, a demisting screen 21 and a blind plate 30. Among them, a inspection port 11 is arranged at the top of the tank body 10, an outlet 12 is arranged at the side of the tank body 10, and an inlet 13 is arranged at the bottom of the tank body 10.

[0033] The demisting screen 21 is arranged inside the tank body 10 and is located between the inlet 13 and the outlet 12 of the tank body 10. At the same time, the demisting screen 21 divides the interior of the tank body 10 into upper and lower two spaces.

[0034] The demisting screen 21 includes a gas-liquid filter screen, which is usually composed of metal wires. The demisting screen 21 can not only filter out larger liquid droplets suspended in the air flow, but also filter out smaller and micro liquid droplets. In addition, the demisting screen 21 meets the current standard: HG / T21618-1998.

[0035] The blind plate 30 is arranged on the inspection port 11 at the top of the tank body 10 and completely covers the inspection port 11. By arranging the blind plate 30 and the inspection port 11, the working state of the demisting screen 21 inside the tank body 10, as well as the degree of wear and tear, etc. can be regularly inspected.

[0036] The working mode of this implementation is as follows: The entire tank body 10 is installed on the outlet 12 of the vaporizer, and the inlet 13 of the tank body 10 is connected to the outlet of the vaporizer. Then, the medium after the vaporization of silicon tetrachloride enters the tank body 10 and moves towards the outlet 12 on the tank body 10. During this process, the medium after the vaporization of silicon tetrachloride needs to pass through the demisting mesh 21, and the liquid carried in the medium can be separated through the demisting mesh 21.

[0037] In addition, since the inlet 13 of the tank body 10 is arranged at its bottom, after the liquid is separated, it will fall back into the vaporizer under the influence of gravity for vaporization.

[0038] Through this technical solution, the liquid in the medium after the vaporization of silicon chloride can be separated, which can avoid affecting the quality of polysilicon production in the reduction furnace and reduce the production energy consumption of polysilicon.

[0039] Preferably, a flange 14 is respectively arranged on the inlet 13 and the outlet 12, and the flange 14 is used to connect with the outlet 12 of the vaporizer.

[0040] In one specific embodiment:

[0041] The above-mentioned blind plate 30 is arranged on the inspection port 11 in a detachable manner, so as to facilitate opening the blind plate 30 and inspecting the internal situation of the tank body 10 from the inspection port 11.

[0042] Among them, the blind plate 30 can be connected to the inspection port 11 in a rotatable connection manner, or can be connected to the inspection port 11 through a plurality of bolts.

[0043] In another specific embodiment:

[0044] The whole tank body 10 is a hollow cylindrical structure, the inspection port 11 is located at the top of the tank body 10, and the size of the inspection port 11 is equal to the size of the cross-section of the tank body 10. In addition, the size of the blind plate 30 is larger than the size of the inspection port 11, so that the blind plate 30 can completely cover the inspection port 11.

[0045] The size of the inspection port 11 is designed to the maximum state to facilitate the maintenance of the parts in the tank body 10 through the inspection port 11.

[0046] In another specific embodiment:

[0047] A head 15 is provided at the bottom of the tank body 10. The whole head 15 is generally a hemispherical structure. The inlet 13 is arranged on the head 15 and is located at the lowest point of the head 15.

[0048] By providing the head 15, on the one hand, it is convenient to provide the inlet 13. On the other hand, when the liquid separated by the demisting mesh 21 drips onto the bottom of the tank body 10, the inner wall of the spherical head 15 can cause the liquid to converge into the inlet 13 and flow back into the vaporizer from the inlet 13.

[0049] In another specific embodiment:

[0050] A sealing gasket 31 is provided between the blind plate 30 and the inspection port 11. The sealing gasket 31 is of an annular structure and is made of rubber, giving it a certain elasticity.

[0051] After the blind plate 30 is installed on the inspection port 11, the sealing gasket 31 is compressed, so that the blind plate 30 and the inspection port 11 are in a sealed connection state, thereby preventing the medium after the vaporization of silicon tetrachloride from escaping from the inspection port 11.

[0052] In another specific embodiment:

[0053] A ring-shaped support portion 22 is provided on the inner wall of the tank body 10. The support portion 22 protrudes on the inner wall of the tank body 10. The demisting mesh 21 is provided in a mounting member 23. The mounting member 23 is also of an annular structure. When the demisting mesh 21 and the mounting member 23 are placed in the tank body 10, the mounting member 23 can be placed on the support portion 22, and the demisting mesh 21 completely divides the interior of the tank body 10 into upper and lower spaces.

[0054] By simply placing the demisting mesh 21 on the support portion 22, the demisting mesh 21 can be conveniently removed from the tank body 10 when the demisting mesh 21 needs to be replaced or repaired.

[0055] Preferably, a hook is provided at the top of the mounting member 23. Through this hook, the entire mounting member 23 and the demisting mesh 21 can be conveniently pulled out of the tank body 10.

[0056] In addition, a pressure ring 24 is movably provided in the tank body 10. The pressure ring 24 is placed on the top of the mounting member 23. The pressure ring 24 is made of metal, and the weight of the pressure ring 24 is greater than or equal to the weight of the demisting mesh 21. Through this pressure ring 24, the demisting mesh 21 and the mounting member 23 can be pressed on the support portion 22, preventing the demisting mesh 21 and the mounting member 23 from jumping under the impact of the medium after the vaporization of silicon tetrachloride.

[0057] The above-described embodiments only represent the specific embodiments of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the patent of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several deformations and improvements can be made, and these all belong to the protection scope of the present invention.

Claims

1. A liquid removal device with an external silicon tetrachloride vaporizer, characterized in that, Comprising: A tank body, having an inlet, an outlet and an inspection port; A demisting mesh, provided in the middle of the tank body, located between the inlet and the outlet, and dividing the interior of the tank body into two spaces; A blind plate, covering the inspection port; Wherein, the inlet is located at the bottom of the tank body, and the outlet is located above the inlet.

2. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 1, characterized in that The blind plate is detachably provided on the inspection port.

3. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 1, characterized in that The opening size of the inspection port is equal to the cross-sectional size of the tank body.

4. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 1, characterized in that The outlet is located on the side of the tank body.

5. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 1, characterized in that Flange plates are provided on both the inlet and the outlet.

6. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 1, characterized in that A head is provided at the bottom of the tank body, and the inlet is provided on the head.

7. The liquid removal device external to the silicon tetrachloride vaporizer according to any one of claims 1-6, characterized in that The blind plate is rotatably provided on the inspection port, and a sealing gasket is provided between the blind plate and the inspection port.

8. The liquid removal device external to the silicon tetrachloride vaporizer according to any one of claims 1-6, characterized in that A raised support part is provided inside the tank body, the demisting mesh is provided in a mounting member, and the mounting member is placed on the support part.

9. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 8, characterized in that The mounting member is an annular columnar structure, and the top of the mounting member has a hook.

10. The liquid removal device external to the silicon tetrachloride vaporizer according to claim 8, characterized in that A pressing ring is movably provided inside the tank body, and the pressing ring is placed on the top of the mounting member.

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