Rotary supporting assembly and extension equipment

Abstract

The utility model provides a rotary support assembly, which comprises a quartz support assembly and a quartz rotary support piece, the quartz support assembly is used for supporting a pin when the pin descends, and the quartz support assembly comprises a shaft and a first support arm; wherein each first supporting arm comprises a first arm part and a platform part, the first supporting arms are evenly distributed in the circumferential direction of the shaft, one end of each first arm part is connected with the shaft, and the other end of each first arm part is connected with the platform part; the platform part comprises a first convex block and a second convex block, the first convex block is arranged on the upper surface of the platform part, and the second convex block is transversely arranged on the outer side surface of the platform part. According to the utility model, the first bump and the second bump are arranged, so that the problem that the rotating shaft of the quartz rotating supporting piece possibly collides with the shaft of the quartz supporting assembly in the rotating process can be solved.

Description

Technical Field

[0001] The utility model relates to the technical field of epitaxial equipment of semiconductor equipment, and particularly relates to a rotary support assembly and an epitaxial equipment with the rotary support assembly. Background Art

[0002] In the current structure of epitaxial equipment, it includes a rotary support assembly, and the rotary support assembly can be used to support and rotate a base, and includes a quartz support assembly and a quartz rotary support.

[0003] However, since the existing rotary support assembly is made of quartz, there will be certain processing errors during the welding process of quartz. On the one hand, it may cause the center of gravity of the quartz support assembly and the quartz rotary support not to be in the middle of the vertical axis, resulting in the center of gravity shifting and collision between the two. On the other hand, it may cause the upper surfaces of the support arms of the quartz support assembly not to be on the same horizontal plane. In this case, the levelness of the upper surface of the base is insufficient, and uneven films will be deposited on the wafer surface when the base rotates. Summary of the Utility Model

[0004] The purpose of the utility model is to provide a rotary support assembly and an epitaxial equipment with the rotary support assembly, including a quartz support assembly and a quartz rotary support, to solve the problem that the rotation axis of the quartz rotary support may deviate from the axis center of gravity of the quartz support assembly during rotation.

[0005] In order to achieve the above purpose, the utility model is realized through the following technical solutions:

[0006] A rotary support assembly for an epitaxial equipment, the epitaxial equipment includes a cavity, a base and a pin, the base is horizontally arranged in the cavity, the pin is movably arranged on the base, and the rotary support assembly is used to support and rotate the base, and includes:

[0007] A quartz support assembly for supporting the pin when the pin descends, and it includes: a shaft, at least one first support arm;

[0008] Wherein, the first support arm includes a first arm part and a platform part, the first support arms are evenly distributed along the circumference of the shaft, one end of the first arm part is connected to the shaft, and the other end of the first arm part is connected to the platform part; the platform part includes: a first convex block arranged on the upper surface of the platform part; a second convex block horizontally arranged on the outer side surface of the platform part.

[0009] Optionally, the rotary support assembly further includes:

[0010] A quartz rotating support member, which is coaxially arranged with the quartz support assembly and is used for rotating and supporting the base. It includes a rotating shaft and a second support arm, and the second support arm is connected to the rotating shaft. The first end of the second support arm is connected to the rotating shaft, and a support rod is arranged on the upper surface of the second end of the second support arm, and the support rod is also connected to the lower surface of the base.

[0011] Optionally, a third bump is further arranged at the second end of the second support arm, and the third bump is horizontally arranged on the outer surface of the second end.

[0012] Optionally, the number of the first support arms and the second support arms is not less than 3.

[0013] Optionally, the cross-sectional area of the first bump is smaller than the cross-sectional area of the upper surface of the platform part.

[0014] Optionally, the cross-sectional area of the second bump is smaller than the cross-sectional area of the outer surface of the platform part.

[0015] Optionally, the cross-sectional area of the first bump is larger than the cross-sectional area of the second bump.

[0016] Optionally, the cross-sectional area of the third bump is smaller than the cross-sectional area of the outer surface of the second end of the second support arm.

[0017] Optionally, the first bump, the second bump, the first support arm and the shaft are integrally arranged.

[0018] Optionally, the third bump, the second support arm and the rotating shaft are integrally arranged.

[0019] Optionally, the cross-sectional shapes of the first bump, the second bump and the third bump are any one of polygon and circle.

[0020] The present invention also provides an epitaxial device, which is characterized by including:

[0021] A cavity;

[0022] A base, which is horizontally arranged in the cavity;

[0023] A pin, which is movably arranged on the base;

[0024] A rotating support assembly, which is used for supporting and rotating the base.

[0025] Compared with the prior art, the present invention has the following advantages:

[0026] 1. A first bump is provided on the upper surface of the platform portion of the quartz support assembly. By polishing the first bump, the planes where the respective first bumps are located are made to lie on the same horizontal plane, thereby ensuring that the pins can simultaneously land on the upper surfaces of the first bumps.

[0027] 2. A second bump is provided on the outer surface of the platform portion of the quartz support assembly. By polishing the second bump, the center of gravity of the quartz support assembly can be adjusted, ensuring that the center of gravity is located at the center of the axis and preventing the rotation axis of the quartz rotating support from colliding with the axis of the quartz support assembly during rotation.

[0028] 3. A third bump is provided on the outer surface of the quartz rotating support. By polishing the third bump, the center of gravity of the quartz rotating support can be adjusted, ensuring that the center of gravity is located at the center of the rotation axis and preventing the rotation axis of the quartz rotating support from colliding with the axis of the quartz support assembly during rotation. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions of the present utility model, the drawings required for description will be briefly introduced below. Obviously, the drawings in the following description are an embodiment of the present utility model. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts:

[0030] Figure 1 It is a schematic structural diagram of the epitaxial device of the present utility model;

[0031] Figure 2 It is a three-dimensional structure diagram of the quartz support assembly of the present utility model;

[0032] Figure 3 It is a plan view of the quartz support assembly of the present utility model;

[0033] Figure 4 It is a plan view of the quartz rotating support of the present utility model. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0034] The following further describes in detail the solution proposed by the present utility model in conjunction with the accompanying drawings and specific embodiments. According to the following description, the advantages and features of the present utility model will be clearer. It should be noted that the accompanying drawings are in a very simplified form and all use non-precise scales, only for the purpose of facilitating and clearly assisting in explaining the embodiments of the present utility model. In order to make the purpose, features, and advantages of the present utility model more obvious and understandable, please refer to the accompanying drawings. It should be noted that the structures, scales, sizes, etc. shown in the drawings of this specification are only used to cooperate with the content disclosed in the specification for those familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the present utility model. Therefore, they do not have technical substance. Any modification of the structure, change in the proportional relationship, or adjustment of the size, without affecting the efficacy that the present utility model can produce and the purpose that can be achieved, should still fall within the scope covered by the technical content disclosed by the present utility model.

[0035] Figure 1 The structural schematic diagram of the epitaxial device of the present utility model is shown; as Figure 1As shown, the epitaxial device 100 includes a cavity, a base 122, pins 128, an inlet gas pipeline 102, a gas injection plug 110, a heating assembly 106, a thermometer 108, a rotary support assembly, an outlet plug 134, and an exhaust gas pipeline 103. The cavity includes a wall portion 112, an upper lining 114, a lower lining 116, an upper dome 118, a lower dome 120, an upper flange 122, and a lower flange 124. The upper lining 114 and the lower lining 116 are both annular bodies formed of transparent quartz and are disposed inside the annular wall portion 112. The upper dome 118 and the lower dome 120 are substantially circular formed of quartz. The upper lining 114 is disposed above the lower lining 116, and a gas inlet and a gas outlet opposite thereto are provided on the side of the lining for the entry and discharge of process gas. The upper dome 118 is disposed above the upper lining 114, and the upper dome 118 is fixed above the wall portion 112 through the upper flange 122. The lower dome 120 is disposed below the lower lining 116, and the lower dome 120 is fixed below the wall portion 112 through the lower flange 124. The heating assembly 106 is disposed above and below the cavity, and the emitted infrared light can penetrate the upper dome 118 and the lower dome 120 to enter the upper and lower parts of the reaction cavity, providing heating energy for the inside of the cavity. The base 122 is horizontally disposed inside the cavity for carrying a substrate 130 (or wafer) to be processed. The pins 128 are movably disposed on the base 122. The rotary support assembly is used to support and rotate the base 122 and includes a quartz support assembly 126 and a quartz rotary support member 125. The quartz rotary support member 125 is coaxially disposed with the quartz support assembly 126. The thermometer 108 is disposed above and below the cavity for monitoring the temperature near the substrate 130. The epitaxial device further includes a preheating ring 132 disposed around the base 122 for preheating the process gas entering the cavity. The inlet gas pipeline 102 is connected to the gas inlet through the gas injection plug 110 for introducing the process gas into the cavity. The gas injection plug 110 is inserted into the gap of the wall portion 112 in the intake direction. The heating assembly 106 heats and decomposes the process gas, which is deposited on the surface of the substrate 130, thereby forming an epitaxial layer on the substrate 130. The outlet plug 134 is inserted into the gap of the wall portion 112 in the exhaust gas direction. The outlet plug 134 is connected to the exhaust gas pipeline 103 to discharge the process exhaust gas from the cavity.

[0036] Figure 2 Fig. shows a three-dimensional structural view of the quartz support assembly 126 of the present invention. Figure 3 Fig. shows a schematic plan view of the quartz support assembly 126 of the present invention; as Figure 2-3As shown, the quartz support assembly 126 includes a shaft 136 and a first support arm. The first support arm includes a first arm portion 138 and a platform portion 140. The first support arms are evenly distributed along the axial direction of the shaft 136. One end of the first arm portion 138 is connected to the shaft 136, and the other end of the first arm portion 138 is connected to the platform portion 140.

[0037] The platform portion 140 includes a first bump 142 and a second bump 144. The first bump 142 is disposed on the upper surface of the platform portion 140, and the second bump 144 is horizontally disposed on the outer side surface of the platform portion 140. The platform portion 140 includes an upper surface, a lower surface, an inner side surface, and an outer side surface. The outer side surface refers to the surface of the platform portion 140 away from the outer side of the first arm portion 138. When the upper surfaces of the respective first support arms are not in the same horizontal plane, by grinding the first bump 142, the planes where the respective first bumps 142 are located are made to be in the same horizontal plane, so that when the three pins fall, they are on the same horizontal plane. When the center of gravity of the quartz support assembly 126 is offset, by grinding the second bump 144, the center of gravity of the quartz support assembly can be adjusted so that it is located at the center of the shaft 136, preventing the quartz rotary support 125 from colliding with the quartz support assembly 126 during rotation.

[0038] Optionally, the number of the first support arms, the first bump 142, and the second bump 144 is not less than 3, preferably 3.

[0039] Optionally, the cross-sectional area of the first bump 142 is smaller than the cross-sectional area of the upper surface of the platform portion 140.

[0040] Optionally, the cross-sectional area of the second bump 144 is smaller than the cross-sectional area of the outer side surface of the platform portion 140.

[0041] Optionally, the cross-sectional area of the first bump 142 is larger than the cross-sectional area of the second bump 144.

[0042] Optionally, the first support arm extends obliquely upward at a fixed angle.

[0043] Optionally, the first bump 142, the second bump 144, the first support arm, and the shaft 136 are integrally provided.

[0044] Optionally, the cross-sectional shape of the first bump 142 and the second bump 144 is any one of a polygon and a circle.

[0045] Optionally, the upper surfaces of the first bump 142 and the second bump 144 are on the same horizontal plane.

[0046] Figure 4 shows a plan view of the quartz rotating support member 125 of the present utility model; as Figure 4 shown, the quartz rotating support member 125 includes a rotating shaft 127 and a second support arm 129, and the second support arm 129 is connected to the rotating shaft 127.

[0047] Optionally, a first end portion of the second support arm 129 is connected to the rotating shaft 127, and a support rod 146 is disposed on an upper surface of a second end portion of the second support arm 129, and the support rod 146 is also connected to the base 122 ( Figure 1 shown).

[0048] Optionally, a third bump 148 is further disposed at the second end portion of the second support arm 129, and the third bump 148 is horizontally disposed on an outer surface of the second end portion. Wherein, the second end portion of the second support arm 129 includes an upper surface, a lower surface and an outer surface, and the outer surface refers to a surface on the outer side of the second end portion of the second support arm 129 away from the rotating shaft; when the center of gravity of the quartz rotating support member 125 is offset, by grinding the third bump 148, the center of gravity of the quartz rotating support member 125 can be adjusted to be located at the center of the rotating shaft 127, preventing the rotating shaft 127 of the quartz rotating support member 125 from colliding with the shaft 136 of the quartz support assembly 126 during rotation.

[0049] Optionally, the number of the second support arms 129 and the third bumps 148 is not less than 3, and preferably 3.

[0050] Optionally, the cross-sectional area of the third bump 148 is smaller than the cross-sectional area of the outer surface of the second end portion of the second support arm 129.

[0051] Optionally, the second support arm 129 extends obliquely upward at a fixed angle.

[0052] Optionally, the third bump 148, the second support arm 129 and the rotating shaft 127 are integrally provided.

[0053] Optionally, the cross-sectional shape of the third bump 148 is any one of a square, a trapezoid and a circle.

[0054] Since the material of the rotating support assembly is quartz, quartz processing is usually done manually, and there will be certain processing errors. During epitaxial deposition, the rotating shaft 127 of the quartz rotating support 125 drives the second support arm 129 to rotate, and the second support arm 129 drives the base 122 to rotate through the support rod 146 at its second end. At this time, the quartz support assembly 126 rotates with the rotation of the rotating shaft 127. Due to the existence of processing errors, during the rotation process, the center of gravity of the quartz rotating support 125 and the quartz support assembly 126 may be offset, and then the rotating shaft 127 and the shaft 135 may collide. Then, by grinding the third protrusion 148 and the second protrusion 144, it is convenient to The center of gravity positions of the quartz rotating support 125 and the quartz support assembly 126 are adjusted to solve the collision problem; when the deposition is completed, the substrate needs to be transferred. At this time, the quartz rotating support 125 descends. When it descends to a certain position, the pin 128 abuts against the first support arm 138 of the quartz support assembly 126, and then the pin 128 lifts the substrate 130 to the surface away from the base 122. Due to processing errors, the upper surfaces of the platform portions 140 of each first support arm 138 may not be on the same horizontal plane. By arranging a first bump 142 on each platform portion 140 and polishing the first bump 142, the planes where the first bumps 142 are located are on the same horizontal plane.

[0055] It should be noted that, in this document, relational terms such as first and second are used solely to distinguish one entity or operation from another, and do not necessarily require or imply any actual relationship or order between these entities or operations. Furthermore, the terms "comprise," "include," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or device comprising a series of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. Without further limitation, an element defined by the phrase "comprising a..." does not preclude the presence of other identical elements in the process, method, article, or device comprising the element. Furthermore, the term "connected" herein refers to a direct connection between A and B, or an indirect connection between A and B, such as through C, or even through more components such as C and D. The connection between A and B can be integral or separate, removable, or fixed. The term "optional" herein refers to a technical feature that can be combined or not combined with any other feature herein.

[0056] Although the content of the present utility model has been described in detail through the above preferred embodiments, it should be recognized that the above description should not be considered as a limitation of the present utility model. After those skilled in the art have read the above content, various modifications and alternatives to the present utility model will be obvious. Therefore, the protection scope of the present utility model should be defined by the appended claims.

Claims

1. A rotary support assembly for an epitaxial device, the epitaxial device including a cavity, a base, and a pin, the base being horizontally disposed in the cavity, the pin being movably disposed on the base, the rotary support assembly being used for supporting and rotating the base, characterized in that, Comprising: A quartz support assembly for supporting the pin when the pin descends, which includes: a shaft, and at least one first support arm; Wherein, the first support arm includes a first arm portion and a platform portion, the first support arms are evenly distributed along the circumferential direction of the shaft, one end of the first arm portion is connected to the shaft, and the other end of the first arm portion is connected to the platform portion; The platform portion includes: A first bump, which is arranged on the upper surface of the platform portion; A second bump, which is horizontally arranged on the outer side surface of the platform portion.

2. The rotary support assembly according to claim 1, characterized in that, The rotary support assembly further includes: A quartz rotary support member, which is coaxially arranged with the quartz support assembly and is used for rotating and supporting the base, and includes: a rotary shaft and at least one second support arm, and the second support arm is connected to the rotary shaft; The first end of the second support arm is connected to the rotary shaft, and a support rod is arranged on the upper surface of the second end of the second support arm, and the support rod is also connected to the lower surface of the base.

3. The rotating support assembly according to claim 2, characterized in that, A third bump is further arranged at the second end of the second support arm, and the third bump is horizontally arranged on the outer side surface of the second end.

4. The rotary support assembly according to any one of claims 2 or 3, characterized in that The number of the first support arms and the second support arms is not less than 3.

5. The rotary support assembly according to any one of claims 1-3, characterized in that, The cross-sectional area of the first bump is smaller than the cross-sectional area of the upper surface of the platform portion.

6. The rotary support assembly according to any one of claims 1-3, characterized in that, The cross-sectional area of the second bump is smaller than the cross-sectional area of the outer side surface of the platform portion.

7. The rotary support assembly according to any one of claims 1-3, characterized in that The cross-sectional area of the first bump is larger than the cross-sectional area of the second bump.

8. The rotating support assembly according to claim 3, wherein, The cross-sectional area of the third bump is smaller than the cross-sectional area of the outer side surface of the second end of the second support arm.

9. The rotary support assembly according to any one of claims 1-3, characterized in that, The first bump, the second bump, the first support arm and the shaft are integrally arranged.

10. The rotary support assembly according to claim 3, characterized in that, The third bump, the second support arm and the rotary shaft are integrally arranged.

11. The rotary support assembly according to claim 3, wherein, The cross-sectional shapes of the first bump, the second bump and the third bump are any one of polygon and circle.

12. An epitaxial device, characterized in that, Comprising: A cavity; A base, which is horizontally arranged in the cavity; A pin, which is movably arranged on the base; The rotary support assembly according to any one of claims 1-11, and the rotary support assembly is used for supporting and rotating the base.

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