Mask plate movement mechanism and exposure machine equipment

Abstract

The utility model provides a mask plate movement mechanism and exposure machine equipment, and relates to the technical field of photoetching machines. Wherein the mask plate movement mechanism comprises a mask plate bracket for bearing and mounting a mask plate, a back plate and a base, and the mask plate bracket is arranged on the back plate in a sliding manner along the vertical direction; the back plate is arranged on the base, and the base is used for being connected with an exposure machine alignment platform; the device further comprises an abutting assembly and a pressing assembly, and the abutting assembly is used for applying downward force to the mask plate support so that the mask plate can be tightly pressed to a to-be-machined product. And the pressing assembly is used for fully laminating the mask plate and a product to be processed. Therefore, the mask and the product can be processed in different counterpoint combination modes. The exposure machine has the effect of enlarging the application range of the exposure machine equipment.

Description

Technical Field

[0001] The utility model relates to the technical field of photolithography machines, and in particular to a mask movement mechanism and exposure machine equipment. Background Art

[0002] Photolithography is a crucial process in semiconductor manufacturing. It involves sequentially transferring chip patterns from a series of mask plates to the corresponding layers of a silicon wafer through exposure. It is a core step in large-scale integrated circuit manufacturing. During the exposure process, the mask plate and the product must be kept in a stable state before the exposure process can proceed. In existing exposure machines, the product to be exposed and the exposure machine typically experience three states: the product to be exposed and the mask plate are relatively parallel with a gap; the mask plate is in contact with the product; and the mask plate and product are fully bonded.

[0003] The inventors' research has revealed that current exposure machines typically determine the desired processing method based on the product's operating environment, material, and processing precision requirements, using one of the three aforementioned methods to design the alignment and connection between the mask and the product. This results in current exposure machines being limited to exposing the product using only specific alignment methods, limiting their applicability. Utility Model Content

[0004] The purpose of the utility model is to provide a mask plate movement mechanism and exposure machine equipment, which can increase the application range of the exposure machine equipment.

[0005] The embodiment of the present utility model is achieved as follows:

[0006] In a first aspect, the present invention provides a mask movement mechanism, comprising:

[0007] A mask plate support, the mask plate support is used to carry and install the mask plate;

[0008] A back plate, the back plate is vertically arranged, and the mask plate bracket is slidably arranged on the back plate along the vertical direction;

[0009] A base, on which the back plate is disposed, and the base is used to connect to the alignment platform of the exposure machine;

[0010] an abutment assembly, the abutment assembly being disposed on the back plate and connected to the mask support, the abutment assembly being used to apply a downward force to the mask support to press the mask onto the product to be processed;

[0011] A pressing assembly is provided on the mask plate support and is used to fully fit the mask plate to the product to be processed.

[0012] In an optional embodiment, a guide rail is provided on the back plate in a vertical direction, a guide rail slider adapted to the guide rail is provided on the mask plate bracket, and the mask plate bracket is slidably arranged on the back plate through the guide rail slider.

[0013] In an optional embodiment, the interference component includes a spring, and the spring is connected to the mask plate support and the back plate at the same time, and the spring makes the mask plate support always have a tendency to move downward.

[0014] In an optional embodiment, the interference assembly includes a cylinder, a cylinder body of the cylinder is connected to the back plate, and a piston rod of the cylinder extends vertically upward and is connected to the mask plate bracket.

[0015] In an optional embodiment, the pressing assembly includes a seal and an exhaust device, the seal is arranged below the mask plate bracket, and the seal is arranged around the outside of the mask plate. When the seal is attached to the product carrier, the exhaust device is used to vacuum the gap between the mask plate and the product to be processed.

[0016] In an optional embodiment, the sealing member includes a sealing ring, which is arranged around the lower surface of the mask template bracket. A cavity for filling and exhausting air is opened in the sealing ring, and a sealing strip is provided at the bottom of the sealing ring. When the cavity is exhausted, the sealing ring contracts and drives the sealing strip to sink into the sealing ring.

[0017] In an optional embodiment, a sealing convex pattern is provided at the bottom of the sealing strip.

[0018] In a second aspect, the present invention provides an exposure machine, comprising the mask movement mechanism according to any one of the aforementioned embodiments, further comprising:

[0019] An alignment platform is connected to the mask movement mechanism and is used to drive the base to move in space.

[0020] In an optional embodiment, the alignment platform includes a Z-axis platform and an XY-axis platform, the base is detachably arranged on the Z-axis platform, the Z-axis platform is used to drive the mask template movement mechanism to move in the vertical direction, and the Z-axis platform is arranged on the XY-axis platform, and the XY-axis platform is used to drive the Z-axis platform to move in the horizontal direction.

[0021] In an optional embodiment, the method further includes:

[0022] The product carrier is used to carry the product to be processed, and the product carrier is used to drive the product to be processed to move below the mask plate support.

[0023] The beneficial effects of the embodiments of the present utility model include:

[0024] The mask plate movement mechanism is used to drive the mask plate to move in the vertical direction, thereby adjusting the distance between the mask plate and the product, so as to facilitate the processing of the product through different alignment methods between the mask and the product, thereby increasing the applicability of the exposure machine equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following is a brief introduction to the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0026] Figure 1 A schematic structural diagram of an exposure machine provided in an embodiment of the present invention;

[0027] Figure 2 A schematic structural diagram of a mask movement mechanism provided by an embodiment of the present invention;

[0028] Figure 3 A bottom view of the mask movement mechanism provided by an embodiment of the present utility model;

[0029] Figure 4 A schematic cross-sectional view of the sealing ring inflated in the mask plate movement mechanism provided by an embodiment of the present utility model;

[0030] Figure 5 This is a cross-sectional schematic diagram of the sealing ring in the mask plate movement mechanism provided by an embodiment of the present utility model during air extraction.

[0031] Icons: 100 - mask plate movement mechanism; 110 - mask plate bracket; 120 - back plate; 121 - guide rail; 122 - guide rail slider; 130 - base; 140 - interference assembly; 150 - pressing assembly; 160 - seal; 161 - sealing ring; 162 - cavity; 163 - sealing strip; 164 - sealing ridge;

[0032] 200-Exposure machine equipment; 210-Positioning platform; 211-Z-axis platform; 212-XY-axis platform; 220-Product carrier. DETAILED DESCRIPTION

[0033] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings herein can be arranged and designed in various different configurations.

[0034] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but rather merely represents selected embodiments of the present invention. All other embodiments derived by persons of ordinary skill in the art based on the embodiments of the present invention without creative effort are also within the scope of protection of the present invention.

[0035] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings.

[0036] In the description of this utility model, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer" and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, or are the orientations or positional relationships in which the utility model product is typically placed when in use. These terms are intended solely to facilitate the description of this utility model and to simplify the description, and are not intended to indicate or imply that the device or component referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this utility model. Furthermore, the terms "first," "second," and "third," etc., are used solely to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0037] In addition, the terms "horizontal" and "vertical" do not mean that the components must be absolutely horizontal or overhanging, but can be slightly tilted. For example, "horizontal" only means that its direction is more horizontal than "vertical", not that the structure must be completely horizontal, but can be slightly tilted.

[0038] It should also be noted that, in the description of this utility model, unless otherwise expressly specified or limited, the terms "disposed," "installed," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections, electrical connections; direct connections, indirect connections through an intermediate medium, and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.

[0039] In an exposure machine, the relative position of the mask and the product must be maintained in a stable state before exposure processing can be performed. In current exposure machines, the mask and product generally have three states: 1. The product and mask remain relatively parallel, but a preset gap is left between the product and the mask according to design requirements; 2. The mask is in contact with the product, that is, the lower surface of the mask contacts the upper surface of the product. When the mask and product contact, an external force is generally applied in the normal direction of the contact surface to make the mask and product fit more tightly; 3. The mask and product are fully in contact. Since the contact surface between the mask and the product is not absolutely flat, a uniform force is applied to the contact surface between the mask and the product to ensure a tight fit between the mask and the product.

[0040] Existing exposure machines typically determine the required processing method based on the actual product's usage environment, product material, and processing accuracy. The alignment of the mask and the product is designed using one of the three methods described above. Consequently, existing exposure machines typically only achieve mask-to-product alignment using a single method, allowing them to expose products with the same design requirements. This limits the machine's applicability and makes it unable to process products with diverse design requirements.

[0041] In view of the above situation, the present application provides a mask plate movement mechanism 100 and an exposure machine device 200, which are used to improve the application range of the exposure machine device 200. Figure 1-Figure 5 , a detailed introduction is given to the basic structure, working principle and technical effects achieved by a mask plate movement mechanism 100 and an exposure machine equipment 200 provided in this application.

[0042] Please refer to Figure 1 This embodiment provides an exposure machine 200, which includes a mask movement mechanism 100, an alignment platform 210, and a product carrier 220. The product carrier 220 is used to carry the product to be processed and move the product to face the mask on the mask movement mechanism 100. The mask movement mechanism 100 is used to drive the mask to move in a vertical direction, thereby adjusting the distance between the mask and the product, so that the product can be processed through different alignment methods between the mask and the product.

[0043] For further information, please refer to Figure 2To increase the range of reticle movement and broaden its applicability during the exposure process, the alignment platform 210 includes a Z-axis platform 211 and an XY-axis platform 212. The reticle motion mechanism 100 is mounted on the Z-axis platform 211, which drives the reticle motion mechanism 100 in vertical movement. The Z-axis platform 211 is mounted on the XY-axis platform 212, which drives the Z-axis platform 211 in horizontal movement. This allows for precise adjustment of the reticle's position, increases the reticle's range of movement, and thus expands its applicability.

[0044] For further information, please refer to Figure 2 This embodiment provides a mask movement mechanism 100 for driving the mask in vertical motion. This allows the mask to be moved to maintain a certain gap with the product during the exposure process, or to be moved to contact and press against the product. Furthermore, the mechanism applies uniform pressure to the mask and product during contact, ensuring a tight fit. This allows the exposure machine 200 to process a variety of products using different mask-to-product alignment methods.

[0045] Please refer to Figure 2 The mask movement mechanism 100 includes a mask support 110, a back plate 120, and a base 130. The base 130 is a rectangular plate with multiple through-holes for bolts. The base 130 can be removably mounted on the alignment platform 210 of the exposure machine 200. The back plate 120 is also a rectangular plate and is vertically fixed to one side of the base 130. To enhance the connection stability between the base 130 and the back plate 120, a reinforcement ear plate is provided between the back plate 120 and the base 130. The mask support 110 is vertically slidably mounted on the back plate 120. The mask support 110 is used to secure the mask. During exposure processing, the product carrier 220 drives the processed product to move below the mask support 110. Depending on the actual processing requirements and to adapt to different processing scenarios, the mask can be mounted to the mask support 110 through mechanical clamping, magnetic clamping, slot connection, vacuum suction, and other methods. In this embodiment, the mask is detachably mounted on the mask support 110 by mechanical clamping.

[0046] Please refer to Figure 2Furthermore, in order to facilitate the movement of the mask template support 110 in the vertical direction on the back plate 120, a guide rail 121 is provided on the side surface of the back plate 120 facing the mask template support 110, and the guide rail 121 is provided in the vertical direction. A guide rail slider 122 is provided on the side of the mask template support 110 facing the back plate 120, and the guide rail slider 122 is adapted to the guide rail 121, so that the mask template support 110 is slid along the vertical direction on the back plate 120 through the guide rail slider 122.

[0047] When the exposure machine 200 operates in a mode where a gap is maintained between the mask and the product, the mask and mask holder 110, due to gravity, remain stationary at the lowest end of the guide rail 121. The Z-axis platform 211 then drives the mask motion mechanism 100 to its highest position. The product carrier 220, carrying the product, moves to a designated position below the mask. The XY platform then drives the Z-axis platform 211 in a plane, aligning the mask and the product being processed. Finally, the Z-axis platform 211 descends, moving the mask to a designated distance from the product, allowing exposure processing to proceed.

[0048] For further information, please refer to Figure 1 The mask plate movement mechanism 100 further includes a resistance component 140. The resistance component 140 is disposed on the back plate 120 and connected to the mask plate support 110. The resistance component 140 is used to apply a downward force to the mask plate support 110, thereby pressing the mask plate onto the product to be processed.

[0049] In order to facilitate applying a downward force to the mask support 110, please refer to Figure 1 In some optional embodiments, the interference assembly 140 includes a spring, the upper end of which is connected to the mask support 110 and the lower end of which is connected to the back plate 120. The spring is always in a stretched state, thereby constantly tending to drive the mask support 110 to move vertically downward. In other optional embodiments, the interference assembly 140 includes a cylinder, the cylinder body of which is detachably connected to the back plate 120 via bolts, and the cylinder piston rod of which extends vertically upward and is connected to the mask support 110.

[0050] When the exposure machine 200 adopts the working mode of maintaining contact between the mask and the product for exposure processing, the Z-axis platform 211 and the mask movement mechanism 100 move to the highest position, the product carrier 220 drives the product to the designated position below the mask, and the XY platform drives the Z-axis platform 211 to move within the plane to align the mask with the processed product. Finally, the Z-axis platform 211 descends. During the descent, the mask will contact the product. After contact, the Z-axis platform 211 continues to move downward. Since the back plate 120 and the mask support 110 are connected by the guide rail 121, the mask support 110 no longer moves with the base 130 after contacting the product. The Z-axis platform 211 stops after moving to the designated position. At this time, the mask is in contact with the product, and the mask is pressed against the product by a spring or cylinder, and then the product is exposed.

[0051] Please refer to Figure 3-Figure 5 Furthermore, in some optional embodiments, the mask plate movement mechanism 100 also includes a pressing assembly 150, which is disposed on the mask plate support 110. The pressing assembly 150 is used to apply uniform pressure on the mask plate and the product, thereby completely fitting the mask plate to the product to be processed. The pressing assembly 150 includes a sealing member and an exhaust device. The sealing member is disposed below the mask plate support 110 and surrounds the mask plate. When the mask plate support 110 moves until the sealing member fits with the product carrier 220, the sealing member forms a sealed space between the mask plate and the product, and the exhaust device performs a vacuum process on the sealed space formed by the sealing member.

[0052] Because the contact surface between the mask and the product is not perfectly flat, when a normal force is applied to the contact surface of the mask or product, the force is not applied evenly across the contact surface, resulting in a loose fit between the mask and the product. In this case, by creating a vacuum between the mask and the product, atmospheric pressure is evenly applied to the mask surface, ensuring a more even fit between the two.

[0053] Please refer to Figure 3-Figure 5Furthermore, to facilitate sealing between the mask and the product, in some optional embodiments, the seal includes a sealing ring 161, which is disposed around the lower surface of the mask support 110. The cross-section of the sealing ring 161 is pentagonal, with one side of the sealing ring 161 connected to the mask support 110 and one corner of the sealing ring 161 extending vertically downward. A cavity 162 for filling and exhausting air is defined within the sealing ring 161, and the cross-section of the cavity 162 is also pentagonal. A sealing strip 163 is also disposed at the bottom of the sealing ring 161, causing the bottom of the sealing ring 161 to bulge downward, facilitating contact between the sealing ring 161 and the product carrier 220. When the gas in the cavity 162 is exhausted, the lower end of the sealing ring 161 contracts upward, driving the sealing strip 163 inwardly into the sealing ring 161. At the same time, in order to improve the airtightness of the sealing ring 161, a sealing convex pattern 164 is provided at the bottom of the sealing strip 163 to increase the contact area with the product carrier and improve the airtightness.

[0054] In some other optional embodiments, the sealing member may also be a sealing gasket, which can be ejected or retracted from the mask plate support 110 by means of hydraulic pressure or pneumatic pressure, thereby achieving sealing between the mask plate and the product.

[0055] When the exposure machine 200 adopts a working mode in which the mask plate and the product are completely fitted together for exposure processing, on the basis of the working mode in which the mask plate and the product maintain contact, the sealing ring 161 is inflated to seal the space between the mask plate bracket 110 and the product carrier, and a vacuum is drawn between the mask plate and the product. At this time, the atmospheric pressure is strongly pressed on the mask plate, and the pressure generated is evenly distributed on the plane of the mask plate, thereby pressing the mask plate on the product, and the pressure on the contact surface is relatively uniform.

[0056] The working principle of the mask plate movement mechanism 100 in this embodiment is: the mask plate is driven to move in the vertical direction through the resistance component 140, thereby adjusting the distance between the mask plate and the product to be processed, so that the exposure machine equipment 200 can adopt three alignment combination methods: maintaining a gap between the mask plate and the product, maintaining contact between the mask plate and the product, and complete fit between the mask plate and the product to process the product, thereby improving the scope of application of the exposure machine equipment 200.

[0057] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Those skilled in the art will readily appreciate that the present invention is susceptible to various modifications and variations. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. A mask motion mechanism, characterized in that: include: A mask plate support, the mask plate support is used to carry and install the mask plate; A back plate, the back plate is vertically arranged, and the mask plate bracket is slidably arranged on the back plate along the vertical direction; A base, on which the back plate is disposed, and the base is used to connect to the alignment platform of the exposure machine; an abutment assembly, the abutment assembly being disposed on the back plate and connected to the mask support, the abutment assembly being used to apply a downward force to the mask support so that the mask contacts the product to be processed; A pressing assembly is provided on the mask plate support, and is used to fully fit the mask plate to the product to be processed.

2. The mask movement mechanism according to claim 1, wherein: A guide rail is provided on the back plate in a vertical direction, a guide rail slider adapted to the guide rail is provided on the mask plate bracket, and the mask plate bracket is slidably arranged on the back plate through the guide rail slider.

3. The mask movement mechanism according to claim 2, characterized in that: The resistance component includes a spring, and the spring is connected to the mask support and the back plate at the same time. The spring enables the mask support to always have a tendency to move downward.

4. The mask movement mechanism according to claim 2, wherein: The interference assembly includes a cylinder, a cylinder body of the cylinder is connected to the back plate, and a piston rod of the cylinder extends vertically upward and is connected to the mask plate bracket.

5. The mask movement mechanism according to claim 1, wherein: The pressing assembly includes a seal and an exhaust device. The seal is arranged below the mask plate bracket and is arranged around the outside of the mask plate. When the seal is attached to the product carrier, the exhaust device is used to vacuum the gap between the mask plate and the product to be processed.

6. The mask movement mechanism according to claim 5, characterized in that: The sealing member includes a sealing ring, which is arranged around the lower surface of the mask template bracket. A cavity for filling and exhausting air is opened in the sealing ring. A sealing strip is provided at the bottom of the sealing ring. When the cavity is exhausted, the sealing ring contracts and drives the sealing strip to sink into the sealing ring.

7. The mask movement mechanism according to claim 6, characterized in that: The bottom of the sealing strip is provided with sealing convex patterns.

8. An exposure machine, characterized in that: The mask movement mechanism according to any one of claims 1 to 7 further comprises: An alignment platform is connected to the mask movement mechanism and is used to drive the base to move in space.

9. The exposure machine according to claim 8, characterized in that: The alignment platform includes a Z-axis platform and an XY-axis platform. The base is detachably arranged on the Z-axis platform. The Z-axis platform is used to drive the mask template movement mechanism to move in the vertical direction. The Z-axis platform is arranged on the XY-axis platform. The XY-axis platform is used to drive the Z-axis platform to move in the horizontal direction.

10. The exposure machine according to claim 8, characterized in that: Also includes: The product carrier is used to carry the product to be processed, and the product carrier is used to drive the product to be processed to move below the mask plate support.

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