Electrode cleaning device for polycrystalline silicon reduction furnace

Abstract

The utility model relates to the technical field of polycrystalline silicon, in particular to an electrode cleaning device for a polycrystalline silicon reduction furnace. The device comprises a cleaning block (1), a transmission shaft (3), a shell (5) and a base (6), the transmission shaft (3) is arranged at the circle center of the disc-shaped base (6); a plurality of arc-shaped shells (5) are arranged on the edge of the base (6) on the opposite side of the transmission shaft (3); and a cleaning block (1) is detachably arranged on the inner side of the shell (5). The cleaning device has the advantages of being simple in structure, convenient to operate, safe, effective, high in efficiency and good in cleaning effect.

Description

Technical Field

[0001] The utility model relates to the technical field of polysilicon, in particular to a polysilicon reduction furnace electrode cleaning device. Background Art

[0002] The electrodes in a polysilicon reduction furnace are crucial components of the modified Siemens process and are a crucial component of the electrically self-heating thin silicon cores. During the production cycle, as the thin silicon cores are deposited into silicon rods, a portion of the electrode is constantly in contact with the furnace's gas phase, inevitably depositing a layer of silicon powder on the surface. To ensure proper heating performance, the electrode tips must be cleaned after each silicon rod exits the furnace.

[0003] The electrode tips of polysilicon reduction furnaces have a certain degree of taper. Due to the lack of specialized tools, manual cleaning is currently required. This process can easily damage the electrode tips or cause incomplete cleaning due to improper cleaning force. Furthermore, manual cleaning is inefficient. Damaged or incompletely cleaned electrode tips can easily lead to discharge during production, resulting in production anomalies. Utility Model Content

[0004] The purpose of the utility model is to overcome the defects of the above-mentioned prior art and provide a polysilicon reduction furnace electrode cleaning device with simple structure, high efficiency, good cleaning effect, no damage to the electrode and easy operation.

[0005] In order to achieve the above purpose, the technical solution adopted by the utility model is:

[0006] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a housing 5 and a base 6;

[0007] The transmission shaft 3 is set at the center of the disc-shaped base 6;

[0008] Several arc-shaped shells 5 are provided on the edge of the base 6 on the opposite side of the transmission shaft 3;

[0009] A cleaning block 1 is detachably provided on the inner side of the shell 5 .

[0010] Furthermore, the housing 5 is composed of at least two pieces;

[0011] The shell 5 is axially symmetrically distributed on the base 6 .

[0012] Furthermore, the angle between the shell 5 and the base 6 is ≥90°.

[0013] Furthermore, an elastic member 2 is provided between the shell 5 and the cleaning block 1 .

[0014] Furthermore, a taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0015] Furthermore, an adjusting bolt 4 - 1 is provided on the outer side of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0016] Furthermore, the taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0017] Furthermore, the taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0018] Furthermore, the elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0019] Furthermore, the parallel spring group with support surface comprises a plurality of springs 7 and a support surface 8;

[0020] A plurality of springs 7 are fixedly arranged in parallel between two supporting surfaces 8;

[0021] The adjusting bolt 4 - 1 is fixedly arranged on the outer arc surface of the supporting surface 8 .

[0022] The utility model provides a polysilicon reduction furnace electrode cleaning device, comprising a housing, a base, a cleaning block, and a drive shaft. The drive shaft is positioned at the center of the disc-shaped base; a plurality of arc-shaped housings are positioned on the edges of the base opposite the drive shaft; and a removable cleaning block is positioned within the housing. The drive shaft is connected to a drive device (such as an electric or pneumatic hand drill), the cleaning block is attached to the electrode head, and the drive device is activated to rapidly clean the electrode.

[0023] In order to improve the cleaning efficiency and effect, the longitudinal section of the shell is set to be arc-shaped, and the flexible cleaning block can be detachably connected to the inner side of the shell. The surface of the cleaning block can also form an arc that matches the outer side of the electrode. When the base rotates, it drives the cleaning block on the inside of the shell to rotate, thereby achieving efficient cleaning.

[0024] This utility model provides an electrode cleaning device for a polysilicon reduction furnace. The housing forms an outer bell mouth, allowing for easy attachment to the electrode tip during use while also aligning with the tip's taper. To further enhance compatibility with the electrode and its taper, an elastic member is provided between the housing and the cleaning block. The cleaning block is detachably connected to the inside of the elastic member, providing a buffer between the cleaning block and the electrode, thereby minimizing damage to the electrode.

[0025] The utility model provides an electrode cleaning device for a polysilicon reduction furnace. A taper adjustment plate is disposed between an elastic member and a housing. An adjustment bolt is disposed on the outside of the taper adjustment plate, extending through the housing and secured with a matching nut. The elastic member is detachably connected to the inside of the taper adjustment plate. Adjusting the adjustment bolt adjusts the angle between the taper adjustment plate and the housing, thereby adjusting the fit between the cleaning block and the electrode, as well as the electrode taper.

[0026] Compared with the prior art, the advantages of the polysilicon reduction furnace electrode cleaning device provided by the present invention are:

[0027] (1)Simple structure.

[0028] (2) Easy to operate.

[0029] (3) Safe and effective.

[0030] (4) High efficiency and good cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 The utility model is a front view structural schematic diagram of a polysilicon reduction furnace electrode cleaning device.

[0032] Figure 2 The utility model is a schematic diagram of the left side structure of a polysilicon reduction furnace electrode cleaning device.

[0033] Figure 3 The utility model is a right side structural schematic diagram of a polysilicon reduction furnace electrode cleaning device provided by the present invention.

[0034] Figure 4 The utility model provides a schematic structural diagram of a parallel spring group with a supporting surface for a polysilicon reduction furnace electrode cleaning device.

[0035] Figure 5 The utility model is a schematic diagram of the cross-sectional structure of a parallel spring group with a supporting surface of an electrode cleaning device for a polysilicon reduction furnace provided by the utility model.

[0036] In the figure: 1 is a cleaning block, 2 is an elastic member, 3 is a transmission shaft, 4 is a taper adjustment plate, 4-1 is an adjusting bolt, 5 is a housing, 6 is a base, 7 is a spring, and 8 is a support surface. DETAILED DESCRIPTION

[0037] In order to enable those skilled in the art to better understand the technical solution of the present invention, the following examples further describe the present invention in detail. The following examples are only used to illustrate the present invention but are not used to limit the scope of the present invention.

[0038] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a housing 5 and a base 6;

[0039] The transmission shaft 3 is set at the center of the disc-shaped base 6;

[0040] Several arc-shaped shells 5 are provided on the edge of the base 6 on the opposite side of the transmission shaft 3;

[0041] A cleaning block 1 is detachably provided on the inner side of the shell 5 .

[0042] Furthermore, the housing 5 is composed of at least two pieces;

[0043] The shell 5 is axially symmetrically distributed on the base 6 .

[0044] Furthermore, the angle between the shell 5 and the base 6 is ≥90°.

[0045] Furthermore, an elastic member 2 is provided between the shell 5 and the cleaning block 1 .

[0046] Furthermore, a taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0047] Furthermore, an adjusting bolt 4 - 1 is provided on the outer side of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0048] Furthermore, the taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0049] Furthermore, the taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0050] Furthermore, the elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0051] Furthermore, the parallel spring group with support surface comprises a plurality of springs 7 and a support surface 8;

[0052] A plurality of springs 7 are fixedly arranged in parallel between two supporting surfaces 8;

[0053] The adjusting bolt 4 - 1 is fixedly arranged on the outer arc surface of the supporting surface 8 .

[0054] Example 1

[0055] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a shell 5 and a base 6; the transmission shaft 3 is arranged at the center of the disc-shaped base 6; a plurality of arc-shaped shells 5 are arranged on the edge of the base 6 on the opposite side of the transmission shaft 3; and the cleaning block 1 is detachably arranged on the inner side of the shell 5.

[0056] The shells 5 are at least two in number; the shells 5 are axially symmetrically distributed on the base 6 .

[0057] The angle between the housing 5 and the base 6 is ≥90°.

[0058] An elastic member 2 is provided between the housing 5 and the cleaning block 1 .

[0059] A taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0060] An adjusting bolt 4 - 1 is provided on the outside of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0061] The taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0062] The taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0063] The elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0064] The parallel spring group with support surfaces comprises a plurality of springs 7 and support surfaces 8; the plurality of springs 7 are fixedly arranged in parallel between two support surfaces 8; and the adjusting bolt 4-1 is fixedly arranged on the outer arc surface of the support surface 8.

[0065] Example 2

[0066] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a shell 5 and a base 6; the transmission shaft 3 is arranged at the center of the disc-shaped base 6; a plurality of arc-shaped shells 5 are arranged on the edge of the base 6 on the opposite side of the transmission shaft 3; and the cleaning block 1 is detachably arranged on the inner side of the shell 5.

[0067] The shells 5 are at least two in number; the shells 5 are axially symmetrically distributed on the base 6 .

[0068] The angle between the housing 5 and the base 6 is ≥90°.

[0069] An elastic member 2 is provided between the housing 5 and the cleaning block 1 .

[0070] A taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0071] An adjusting bolt 4 - 1 is provided on the outside of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0072] The taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0073] The taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0074] The elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0075] The parallel spring group with support surfaces includes a plurality of springs 7 and support surfaces 8; the plurality of springs 7 are fixedly arranged in parallel between two support surfaces 8; and the adjusting bolt 4 - 1 is fixedly arranged on the outer arc surface of the support surface 8.

[0076] Example 3

[0077] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a shell 5 and a base 6; the transmission shaft 3 is arranged at the center of the disc-shaped base 6; a plurality of arc-shaped shells 5 are arranged on the edge of the base 6 on the opposite side of the transmission shaft 3; and the cleaning block 1 is detachably arranged on the inner side of the shell 5.

[0078] The shells 5 are at least two in number; the shells 5 are axially symmetrically distributed on the base 6 .

[0079] The angle between the housing 5 and the base 6 is ≥90°.

[0080] An elastic member 2 is provided between the housing 5 and the cleaning block 1 .

[0081] A taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0082] An adjusting bolt 4 - 1 is provided on the outside of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0083] The taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0084] The taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0085] The elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0086] The parallel spring group with support surfaces includes a plurality of springs 7 and support surfaces 8; the plurality of springs 7 are fixedly arranged in parallel between two support surfaces 8; and the adjusting bolt 4 - 1 is fixedly arranged on the outer arc surface of the support surface 8.

[0087] Example 4

[0088] A polysilicon reduction furnace electrode cleaning device, the device comprising: a cleaning block 1, a transmission shaft 3, a shell 5 and a base 6; the transmission shaft 3 is arranged at the center of the disc-shaped base 6; a plurality of arc-shaped shells 5 are arranged on the edge of the base 6 on the opposite side of the transmission shaft 3; and the cleaning block 1 is detachably arranged on the inner side of the shell 5.

[0089] The shells 5 are at least two in number; the shells 5 are axially symmetrically distributed on the base 6 .

[0090] The angle between the housing 5 and the base 6 is ≥90°.

[0091] An elastic member 2 is provided between the housing 5 and the cleaning block 1 .

[0092] A taper adjustment plate 4 is provided between the elastic member 2 and the housing 5 .

[0093] An adjusting bolt 4 - 1 is provided on the outside of the taper adjusting plate 4 , and the adjusting bolt 4 - 1 passes through the housing 5 and is fixed by a matching nut.

[0094] The taper adjustment plate 4 is detachably connected to the elastic member 2 .

[0095] The taper adjustment plate 4 is connected to the elastic member 2 via Velcro.

[0096] The elastic member 2 is a spring sheet or a parallel spring group with a supporting surface.

[0097] The parallel spring group with support surfaces includes a plurality of springs 7 and support surfaces 8; the plurality of springs 7 are fixedly arranged in parallel between two support surfaces 8; and the adjusting bolt 4 - 1 is fixedly arranged on the outer arc surface of the support surface 8.

[0098] The preferred embodiments of the present invention are described in detail above. However, the present invention is not limited to the specific details of the above embodiments. Within the technical concept of the present invention, various changes can be made to the technical solution of the present invention. These simple variations all fall within the scope of protection of the present invention.

[0099] It should also be noted that the various specific technical features and steps described in the above specific embodiments can be combined in any appropriate manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further describe various possible combinations.

[0100] In addition, the various embodiments of the present invention may be arbitrarily combined, and as long as they do not violate the concept of the present invention, they should also be regarded as the contents disclosed by the present invention.

Claims

1. A polysilicon reduction furnace electrode cleaning device, characterized in that: The device comprises: a cleaning block (1), a transmission shaft (3), a housing (5) and a base (6); A transmission shaft (3) is provided at the center of the disc-shaped base (6); A plurality of arc-shaped housings (5) are provided on the edge of the base (6) on the opposite side of the transmission shaft (3); A cleaning block (1) is detachably arranged on the inner side of the shell (5).

2. The polysilicon reduction furnace electrode cleaning device according to claim 1, characterized in that: The housing (5) is composed of at least two pieces; The shells (5) are axially symmetrically distributed on the base (6).

3. The polysilicon reduction furnace electrode cleaning device according to claim 1, characterized in that: The angle between the shell (5) and the base (6) is ≥90°.

4. The polysilicon reduction furnace electrode cleaning device according to claim 1, characterized in that: An elastic member (2) is provided between the housing (5) and the cleaning block (1).

5. The polysilicon reduction furnace electrode cleaning device according to claim 4, characterized in that: A taper adjustment plate (4) is provided between the elastic member (2) and the housing (5).

6. The polysilicon reduction furnace electrode cleaning device according to claim 5, characterized in that: An adjusting bolt (4-1) is arranged on the outside of the taper adjusting plate (4), and the adjusting bolt (4-1) passes through the housing (5) and is fixed by a matching nut.

7. A polysilicon reduction furnace electrode cleaning device according to claim 5 or 6, characterized in that: The taper adjustment plate (4) is detachably connected to the elastic member (2).

8. The polysilicon reduction furnace electrode cleaning device according to claim 7, characterized in that: The taper adjustment plate (4) is connected to the elastic member (2) via Velcro.

9. The polysilicon reduction furnace electrode cleaning device according to claim 4, characterized in that: The elastic member (2) is a spring sheet or a parallel spring group with a supporting surface.

10. The polysilicon reduction furnace electrode cleaning device according to claim 9, characterized in that: The parallel spring group with a support surface comprises a plurality of springs (7) and a support surface (8); A plurality of springs (7) are fixedly arranged in parallel between two supporting surfaces (8); The adjusting bolt (4-1) is fixedly arranged on the outer arc surface of the supporting surface (8).

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