Server cleaning device
Through the joint work of spraying, ultrasonic waves and drying gas of the server cleaning device, the problem of server cleaning difficulties is solved, and efficient and low-cost cleaning effect is achieved.
Patent Information
- Application Number
- CN202521491455.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-16
- Publication Date
- 2025-08-22
- Estimated Expiration
- 2035-07-16
AI Technical Summary
The existing server cleaning technology has problems such as difficulty in cleaning, complex processes, long downtime and difficulty in cleaning complex structures.
It provides a server cleaning device, including containers, liquid tank components, spray parts, drying components and ultrasonic generators. By spraying cleaning liquid, ultrasonic loosening and drying gas work together to achieve efficient cleaning without dismantling the server.
Simplifies server cleaning process, improves pollutant removal rate, reduces downtime, extends server life, and reduces energy consumption and maintenance costs.
Smart Images

Figure CN223250062U_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of server cleaning, and in particular to a server cleaning device. Background Art
[0002] Currently, servers are mostly cooled by immersion liquid cooling. However, long-term server operation and the liquid cooling process can lead to contaminant deposition and other issues. The main sources of server contaminants include: metal debris (such as copper foil wear on printed circuit boards and solder joint loss), coolant oxidation and decomposition products (fluorinated liquids generate corrosive substances such as hydrofluoric acid at high temperatures), and microbial growth (mineral oil environments are prone to the growth of oleophilic bacteria, forming biofilms). These contaminants can lead to reduced cooling performance, the risk of electrical failure, and shortened equipment lifespans.
[0003] Existing server maintenance methods include disassembly, cleaning, and reinstallation processes, which have significant drawbacks such as complex processes and long downtimes, affecting the continuous operation of data centers. Manual cleaning is difficult to cover the complex internal structures of the server (such as the gaps between heat sink fins and chip pins), resulting in incomplete cleaning.
[0004] In summary, the existing related technologies still have the problem of difficulty in cleaning servers. Utility Model Content
[0005] The present application provides a server cleaning device to at least solve the problem of difficulty in server cleaning in the related art.
[0006] The present application provides a server cleaning device, comprising: a container member, the container member having a receiving cavity for receiving a server; a liquid tank assembly, the liquid tank assembly providing cleaning liquid for the container member, the liquid tank assembly comprising a cleaning liquid tank, a liquid tank level detection member, a pH detection member, a turbidity detection member and a conductivity detection member, the cleaning liquid tank being used to receive cleaning liquid, the cleaning liquid tank being connected to the container member through a first pipe; the liquid tank level detection member being arranged in the cleaning liquid tank, the liquid tank level detection member being used to detect the liquid level in the cleaning liquid tank; the pH detection member, the turbidity detection member and the conductivity detection member being all arranged in the cleaning liquid tank The pH detection component is used to detect the pH of the cleaning liquid, the turbidity detection component is used to detect the turbidity of the cleaning liquid, and the conductivity detection component is used to detect the conductivity of the cleaning liquid; the spray component is arranged in the container component and is located at the outlet end of the first pipe. The cleaning liquid is sprayed into the accommodating cavity through the spray component; the drying component is connected to the container component through the second pipe. The drying component provides drying gas for the container component, and the drying gas is used to dry the server; the ultrasonic generator is connected to the container component and provides ultrasonic waves for the accommodating cavity. The liquid tank level detection component is electrically connected to the ultrasonic generator.
[0007] Furthermore, at least a portion of the spraying member is movably arranged relative to the container member, and the spraying member has a spraying channel. When the spraying member moves, the angle of the spraying channel can be adjusted.
[0008] Furthermore, the server cleaning device also includes a circulation pipe, both ends of which are connected to the container and the liquid tank assembly respectively, and the cleaning liquid in the container flows back to the liquid tank assembly through the circulation pipe.
[0009] Furthermore, the server cleaning device also includes: a circulation pump, which is arranged on the circulation pipe and provides driving force for the cleaning liquid; and / or a filter and a filter detection element, the filter is arranged on the circulation pipe, the filter filters the cleaning liquid, the filter detection element is connected to the circulation pipe through the detection pipe, and the filter detection element is arranged in parallel with the filter, the two ends of the detection pipe are respectively located at the two ends of the filter, and the filter detection element is used to detect the state changes at both ends of the filter.
[0010] Furthermore, the server cleaning device also includes: a container liquid level detection component and a circulation valve. The container liquid level detection component is arranged in the container component, and the container liquid level detection component is used to detect the liquid level of the cleaning liquid in the container component; the circulation valve is arranged on the circulation pipeline and controls the opening and closing of the circulation pipeline. The container liquid level detection component is electrically connected to the circulation valve.
[0011] Furthermore, the server cleaning device also includes a temperature and humidity detection component, which is arranged in the container component and is used to detect the temperature and humidity in the container component.
[0012] Furthermore, the server cleaning device also includes: a first flow detection component, a first valve, a first pressure detection component and a first pump body. The first flow detection component is arranged in the first pipeline, and the first flow detection component is used to detect the flow of the cleaning fluid; the first valve is arranged in the first pipeline and controls the opening and closing of the first pipeline, and the first flow detection component is electrically connected to the first valve; the first pressure detection component is arranged in the first pipeline, and the first pressure detection component is used to detect the pressure of the first pipeline; the first pump body is arranged in the first pipeline and provides driving force for the cleaning fluid, and the first pressure detection component is electrically connected to the first pump body.
[0013] Furthermore, the server cleaning device also includes: a second pressure detection component, a second valve and a second flow detection component. The second pressure detection component is arranged in the second pipeline, and the second pressure detection component is used to detect the pressure of the second pipeline; the second valve is arranged in the second pipeline and controls the opening and closing of the second pipeline, and the second pressure detection component is electrically connected to the second valve; the second flow detection component is arranged in the second pipeline, and the second flow detection component is used to detect the purge flow rate of the dry gas.
[0014] Furthermore, the liquid tank assembly also includes: a drainage pipe and a drainage pump. The drainage pipe is connected to the cleaning liquid tank and is used to discharge waste liquid in the cleaning liquid tank. The drainage pump is arranged on the drainage pipe and provides driving force for the cleaning liquid.
[0015] Furthermore, the server cleaning device also includes a circulation pipeline, the two ends of the circulation pipeline are respectively connected to the container part and the liquid tank assembly, the cleaning liquid in the container part flows back to the liquid tank assembly via the circulation pipeline, and a circulation valve is provided on the circulation pipeline, and the circulation valve controls the opening and closing of the circulation pipeline; a first valve and a first pump body are provided on the first pipeline, and a second valve is provided on the second pipeline; the server cleaning device also includes a detection component, the detection component includes a container liquid level detection component, a first flow detection component, a first pressure detection component, a second pressure detection component, and a second flow detection component, the container liquid level detection component is provided in the container part, and the container liquid level detection component is used To detect the liquid level of the cleaning liquid in the container, the first flow detection component is arranged in the first pipeline, the first flow detection component is used to detect the flow of the cleaning liquid, the first flow detection component is electrically connected to the first valve, the first pressure detection component is arranged in the first pipeline, the first pressure detection component is used to detect the pressure of the first pipeline, the first pressure detection component is electrically connected to the first pump body, the second pressure detection component is arranged in the second pipeline, the second pressure detection component is used to detect the pressure of the second pipeline, the second pressure detection component is electrically connected to the second valve, the second flow detection component is arranged in the second pipeline, and the second flow detection component is used to detect the purge flow rate of the dry gas.
[0016] By placing the entire server in a receiving chamber and injecting the cleaning fluid in the liquid tank assembly into the receiving chamber through a first pipe, the entire server in the receiving chamber can be cleaned. There is no need to disassemble the server for cleaning and reinstall it, simplifying the server cleaning process, reducing the difficulty of cleaning the server, achieving efficient cleaning of the server, reducing server downtime, and ensuring that the data center can operate continuously. The cleaning fluid can be sprayed onto the server through a spray element. The spray element can spray out a mist, columnar, or other cleaning fluid with a certain pressure, which can flush out contaminants on the server that are difficult to clean and contaminants in the complex structure of the server that are difficult to clean, thereby improving the removal rate of contaminants on the server. An ultrasonic generator connected to the container element can provide ultrasonic waves to the receiving chamber. The ultrasonic waves can loosen contaminants on the server, making it easier for the cleaning fluid to be cleaned. The ultrasonic generator can cooperate with the spray element. The ultrasonic waves loosen contaminants on the server, making the loosened contaminants more easily washed away by the cleaning fluid sprayed by the spray element. The combination of the two can improve cleaning efficiency and flush out contaminants that are difficult to clean on the server, thereby achieving efficient cleaning of the server. A second pipe supplies dry gas to the container, drying the cleaned servers. This prevents oxidation and corrosion from occurring after contact with the cleaning fluid, extending the server's service life. This embodiment utilizes a spray element, ultrasonic generator, and drying assembly to collaboratively clean and dry servers. This allows for efficient and reliable server cleaning, shortening cleaning and drying times and reducing energy consumption, meeting the data center's requirements for high reliability and low maintenance costs while also improving the removal rate of contaminants from the servers. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] In order to more clearly illustrate the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.
[0018] Figure 1 A schematic structural diagram of a server cleaning device provided in an embodiment of the present application.
[0019] The above drawings include the following reference numerals:
[0020] 10. Container component; 11. Container liquid level detection component; 12. Temperature and humidity detection component; 13. Ultrasonic generator; 20. Liquid tank assembly; 21. Cleaning liquid tank; 22. Liquid tank liquid level detection component; 23. pH detection component; 24. Turbidity detection component; 25. Conductivity detection component; 26. Drain pipe; 27. Drain pump; 30. Spray component; 40. Drying component; 50. Circulation pipe; 51. Circulation pump; 52. Filter; 53. Filter detection component; 54. Circulation valve; 60. First pipe; 61. First flow detection component; 62. First valve; 63. First pressure detection component; 64. First pump body; 70. Second pipe; 71. Second pressure detection component; 72. Second valve; 73. Second flow detection component. DETAILED DESCRIPTION
[0021] The following will be combined with the accompanying drawings in the embodiments of this application to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the embodiments described are only part of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.
[0022] It should be noted that the terms "center," "longitudinal," "transverse," "length," "width," "thickness," "upper," "lower," "front," "back," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like, indicating positions or relationships, are based on the positions or relationships shown in the accompanying drawings and are intended solely for ease of description and simplification of the present application. They are not intended to indicate or imply that the devices or components referred to must have, be constructed, or operate in a specific orientation, and therefore should not be construed as limiting the present application. The terms "mounted," "connected," and "connected" should be interpreted broadly, and may include, for example, fixed, removable, or integral connections; mechanical or electrical connections; direct or indirect connections through an intermediary; and internal communication between two components. The terms "parallel," "perpendicular," and "equal" encompass the described conditions and conditions similar to the described conditions, provided that the range of the similar conditions is within an acceptable range of deviation, as determined by a person of ordinary skill in the art taking into account the measurement in question and the errors associated with the measurement of the particular quantity (i.e., the limitations of the measurement system). For example, "parallel" includes both absolute parallelism and approximate parallelism, where the acceptable deviation range for approximate parallelism may be, for example, within 5°; "perpendicular" includes both absolute perpendicularity and approximate perpendicularity, where the acceptable deviation range for approximate perpendicularity may also be, for example, within 5°. "Equal" includes both absolute equality and approximate equality, where the acceptable deviation range for approximate equality may be, for example, that the difference between the two is less than or equal to 5% of either. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.
[0023] In order to enable those skilled in the art to better understand the present application, the present application is further described in detail below with reference to the accompanying drawings and specific implementation methods.
[0024] In order to solve the problem of difficulty in server cleaning in the related art, the present application provides a server cleaning device.
[0025] like Figure 1A server cleaning device shown includes a container part 10, a liquid tank assembly 20, a spray part 30, a drying assembly 40 and an ultrasonic generator 13. The container part 10 has a accommodating cavity for accommodating the server; the liquid tank assembly 20 is connected to the container part 10 through a first pipe 60, and the liquid tank assembly 20 provides cleaning liquid to the container part 10; the spray part 30 is arranged in the container part 10 and is located at the outlet end of the first pipe 60, and the cleaning liquid is sprayed into the accommodating cavity through the spray part 30; the drying assembly 40 is connected to the container part 10 through a second pipe 70, and the drying assembly 40 provides drying gas to the container part 10, and the drying gas is used to dry the server; the ultrasonic generator 13 is connected to the container part 10 and provides ultrasonic waves to the accommodating cavity.
[0026] In this embodiment, the entire server is placed in the accommodating chamber and the cleaning liquid in the liquid tank assembly 20 is injected into the accommodating chamber through the first pipe 60. The entire server in the accommodating chamber can be cleaned without disassembling the server for cleaning and reinstalling. This simplifies the server cleaning process, reduces the difficulty of cleaning the server, achieves efficient cleaning of the server, reduces server downtime, and ensures that the data center can operate continuously. The cleaning liquid can be sprayed on the server through the spray part 30 to clean the server. The spray part 30 can spray out a mist, columnar or other cleaning liquid with a certain pressure, which can flush out pollutants that are difficult to clean on the cleaning server and pollutants that are difficult to clean in the complex structure of the server, thereby improving the removal rate of pollutants on the server. The ultrasonic generator 13 connected to the container part 10 can provide ultrasonic waves for the accommodating chamber. The ultrasonic waves can loosen the pollutants on the server, making the pollutants on the server easier to be cleaned by the cleaning liquid. The ultrasonic generator 13 can cooperate with the spray part 30. The ultrasonic wave loosens the contaminants on the server, and the loosened contaminants are more easily washed away by the cleaning liquid sprayed by the spray part 30. The cooperation of the two can improve the cleaning efficiency and flush away the contaminants on the server that are difficult to clean, so as to achieve efficient cleaning of the server. Dry gas is provided to the container part 10 through the second pipe 70, so that the cleaned server can be dried to avoid problems such as oxidation and corrosion of the server after contact with the cleaning liquid, thereby extending the service life of the server. In this embodiment, the spray part 30, the ultrasonic generator 13, and the drying component 40 cooperate to clean and dry the server, which can clean the server efficiently and reliably, shorten the cleaning and drying time of the server and reduce energy consumption, meet the high reliability and low maintenance cost requirements of the data center, and at the same time improve the removal rate of contaminants on the server.
[0027] This embodiment is described by taking the application of the server cleaning device to an immersion liquid cooling server as an example. Of course, it can also be applied to other types of servers as needed.
[0028] The drying component 40 of this embodiment can be a double-layer stainless steel gas storage tank with a volume of 200L and a pressure resistance of 1.5MPa. The drying gas can be nitrogen, which can be used to dry the cleaned server and prevent the server from oxidation.
[0029] This embodiment includes multiple ultrasonic generators arranged in a honeycomb array at the bottom of the container 10. This allows for direct cleaning of servers within the container, eliminating the need to remove the servers for separate cleaning. The ultrasonic generator 13 can be an ultrasonic vibrator with a power of 50-200W, providing low-frequency ultrasonic waves of 15-20kHz to the container. The low-frequency ultrasonic waves can loosen contaminants on the servers and prevent high-frequency ultrasonic waves from damaging sensitive components such as capacitors and inductors. Alternatively, only one ultrasonic generator may be provided.
[0030] like Figure 1 As shown, in this embodiment, there are multiple spray members 30, and spray members 30 are provided on both opposite sides of the inner wall of the container member 10. There are multiple complex structures inside the server, such as gaps between heat sink fins and chip pins. Multiple spray members 30 can simultaneously flush and clean different parts of the server and / or different complex structures, thereby improving the cleaning efficiency of the server. At least a portion of the spray member 30 is movable relative to the container member 10. The spray member 30 has a spray channel. When the spray member 30 is movable, the angle of the spray channel can be adjusted. The angles of the multiple spray members 30 can be adjusted according to the cleaning requirements of different parts of the server and the different installation positions of the complex structures, so that the spray member 30 can better clean the contaminants on the server. Even if the server is not disassembled, it can be well cleaned, improving the cleaning efficiency of the server and ensuring a high removal rate of contaminants on the server.
[0031] The spraying member 30 of this embodiment may be a nozzle, which adopts a 3D printed (additive manufacturing technology) titanium alloy structure. The aperture can be adjusted within 0.2-0.5 mm. A servo motor is provided on the nozzle, and the spray angle can be dynamically deflected by 30°-60° through the servo motor, thereby improving the flexibility of flushing and cleaning the server.
[0032] like Figure 1 As shown, the server cleaning device of this embodiment also includes a circulation pipe 50, and the two ends of the circulation pipe 50 are respectively connected to the container part 10 and the liquid tank assembly 20. The cleaning liquid in the container part 10 flows back to the liquid tank assembly 20 via the circulation pipe 50; after the cleaning liquid injected into the accommodating cavity by the liquid tank assembly 20 cleans the server, it can flow back to the liquid tank assembly 20 due to its own gravity or factors such as the pump body, and then be re-injected into the accommodating cavity by the liquid tank assembly 20 to clean the server, thereby realizing the recycling of the cleaning liquid and achieving energy-saving and environmental protection effects.
[0033] like Figure 1 As shown, the server cleaning device of this embodiment also includes: a circulation pump 51, a filter 52 and a filter detection element 53. The circulation pump 51 can be a variable frequency pump with an adjustable power of 0-5kW to achieve precise control of the flow rate of 5-15L / min. The circulation pump 51 is arranged on the circulation pipe 50 and provides a driving force for the cleaning liquid. The circulation pump 51 can drive the used cleaning liquid to flow back into the liquid tank assembly 20 to achieve the recycling of the cleaning liquid; the filter 52 can be a filter element with a 50μm stainless steel filter mesh. The filter 52 is arranged on the circulation pipe 50. When the cleaning liquid flows in the circulation pipe 50, the filter 52 on the circulation pipe 50 can filter the cleaning liquid. The filter 52 can filter impurities in the used cleaning liquid, and the used cleaning liquid can flow back. To the liquid tank assembly 20, and then re-injected into the receiving cavity by the liquid tank assembly 20, and used again to clean the server; the filter detection element 53 can be a pressure differential sensor with a range accuracy of 0-1kPa / ±0.1%FS. The filter detection element 53 is connected to the circulation pipe 50 through a detection pipe, and the filter detection element 53 is set in parallel with the filter 52. The two ends of the detection pipe are respectively located at the two ends of the filter 52. The filter detection element 53 is used to detect the state change at both ends of the filter 52, and the pressure difference at both ends of the filter 52 is used to determine whether the filter 52 is blocked. When the pressure difference is ≥0.1MPa, the filter 52 is considered to be blocked. At this time, an alarm can be triggered to avoid problems such as the rupture of the circulation pipe 50 and the excessive level of the cleaning liquid in the receiving cavity connected to the circulation pipe 50. Of course, it is also possible to set only the circulation pump 51 to drive the used cleaning liquid backflow, and only set the filter 52 to filter the used cleaning liquid, or set both the circulation pump 51 and the filter 52 to drive the used cleaning liquid backflow and filter the used cleaning liquid.
[0034] like Figure 1 As shown, the server cleaning device of this embodiment also includes: a container liquid level detection component 11 and a circulation valve 54. The container liquid level detection component 11 can be a liquid level sensor. The container liquid level detection component 11 is arranged in the container component 10. The container liquid level detection component 11 is used to detect the liquid level of the cleaning liquid in the container component 10. When there is an error between the liquid level and the predetermined liquid level, the error can be ±1 cm of the predetermined liquid level. The container liquid level detection component 11 can send an electrical signal to the circulation valve 54 to control the opening and closing of the circulation valve 54 to adjust the liquid level of the cleaning liquid in the container component 10; the circulation valve 54 is arranged on the circulation pipe 50 and controls the opening and closing of the circulation pipe 50. The container liquid level detection component 11 is electrically connected to the circulation valve 54. The circulation valve 54 can receive the electrical signal of the container liquid level detection component 11 to control the opening and closing of the circulation pipe 50.
[0035] like Figure 1As shown, the server cleaning device of this embodiment also includes a temperature and humidity detection component 12, which can be a temperature and humidity sensor. The temperature and humidity detection component 12 is arranged in the container component 10. The temperature and humidity detection component 12 is used to detect the temperature and humidity in the container component 10. When drying the server, when the temperature and humidity sensor detects that the humidity in the container component 10 is greater than 5% RH, the temperature and humidity sensor can send an alarm electrical signal.
[0036] like Figure 1 As shown, the drying component 40 of this embodiment also includes a drying gas injection system and a heating plate. The drying gas injection system is connected to the second pipe 70 and is used to purge drying gas to the server in the accommodating chamber to dry the server. The drying gas injection system adopts a swirl acceleration design, and the drying gas airflow velocity can be 25m / s. The heating plate can be a semiconductor ceramic material ceramic heater with an adjustable power of 500-2000W. There can be multiple heating plates. The heating plates are located in the drying gas injection system and / or the second pipe 70 and / or the inner wall of the container 10 to heat the drying gas so that the drying gas can better dry the server. When the temperature and humidity detection component 12 detects that the temperature inside the container 10 exceeds 60°C, it triggers the heating plate on the side wall to cut off the power to prevent the temperature inside the container 10 from being too high and damaging the server components. The drying component 40 can achieve gradient heating in combination with the temperature feedback from the temperature and humidity detection component 12.
[0037] The server cleaning device of this embodiment also includes a detection component, which is used to perform real-time detection of the status of various parts of the server cleaning device, and can control the actions of various components based on the detection results, thereby achieving coordination and cooperation, ensuring the reliability of operation, and avoiding accidents. In addition to the aforementioned container liquid level detection component 11, filter detection component 53, and temperature and humidity detection component 12, the detection component of this embodiment also includes a first flow detection component 61, a first pressure detection component 63, a second pressure detection component 71, a second flow detection component 73, a liquid tank liquid level detection component 22, a pH detection component 23, a turbidity detection component 24, and a conductivity detection component 25. The specific setting method and function of each of the above-mentioned detection components will be further explained later. Of course, the detection components specifically included in the detection component can also be adjusted as needed and are not limited to the several detection components listed in this embodiment. The coordinated cooperation of various detection components can realize the detection and dynamic optimization of cleaning liquid parameters, the detection and dynamic optimization of parameters in the container part 10, the detection and dynamic optimization of relevant parameters of the drying component 40, and the detection and dynamic optimization of the dryness of the server. It does not only rely on manual experience. The detection component can realize closed-loop control, accurately adjust the server cleaning parameters, and has multiple anti-damage mechanisms such as pressure protection to avoid damage to server components.
[0038] like Figure 1As shown, the server cleaning device of this embodiment also includes: a first flow detection component 61, a first valve 62, a first pressure detection component 63 and a first pump body 64. The first flow detection component 61 can be a flow sensor. The first flow detection component 61 is arranged in the first pipe 60. The first flow detection component 61 is used to detect the flow of the cleaning liquid. When the flow deviates from the predetermined flow value, the first flow detection component 61 can send a flow abnormality electrical signal; the first valve 62 can be a solenoid valve. The first valve 62 is arranged in the first pipe 60 and controls the opening and closing of the first pipe 60. The first flow detection component 61 is electrically connected to the first valve 62. When the first flow detection component 61 detects that the flow of the first pipe 60 deviates from the predetermined flow value, the first flow detection component 61 can send a flow abnormality electrical signal to the first valve 62 to control the opening and closing of the first valve 62 to adjust the flow of the cleaning liquid. The first pressure detecting component 63 can be a pressure sensor. The first pressure detecting component 63 is arranged in the first pipe 60. The first pressure detecting component 63 is used to detect the pressure of the cleaning fluid in the first pipe 60. When the pressure exceeds the predetermined pressure value, the first pressure detecting component 63 can send a pressure abnormality electrical signal; the first pump body 64 can be a variable frequency pump with an adjustable power of 0-5kW to achieve precise control of the flow rate of 5-15L / min. The first pump body 64 is arranged in the first pipe 60 and provides driving force for the cleaning fluid. The first pressure detecting component 63 is electrically connected to the first pump body 64. When the first pressure detecting component 63 detects that the pressure of the cleaning fluid in the first pipe 60 exceeds the predetermined pressure value, it can send a pressure abnormality electrical signal to the first pump body 64 to reduce the power of the first pump body 64 to reduce the cleaning fluid pressure or close the first pump body 64 to cut off the flow of the cleaning fluid, so as to prevent the high pressure of the cleaning fluid from impacting the server and damaging the surface mount components of the server.
[0039] like Figure 1As shown, the server cleaning device of this embodiment also includes: a second pressure detecting element 71, a second valve 72, and a second flow detecting element 73. The second pressure detecting element 71 can be a pressure sensor, which is arranged in the second pipe 70. The second pressure detecting element 71 is used to detect the pressure of the second pipe 70. The second pressure detecting element 71 is used to detect the pressure of the dry gas in the second pipe 70. When the pressure exceeds a predetermined pressure value, the second pressure detecting element 71 can send a pressure abnormality electrical signal. The predetermined pressure value can be 0.1-0.5 MPa. A pressure lower than 0.1 MPa or higher than 0.5 MPa is considered to be a pressure abnormality. A pressure lower than 0.1 MPa indicates insufficient dry gas supply, and a pressure higher than 0.5 MPa indicates that the second pipe 70 is blocked. The second valve 72 can be a solenoid valve or a safety pressure relief valve. The second valve 72 is arranged in the second pipe 70 and controls the opening and closing of the second pipe 70. The second pressure detecting element 71 is electrically connected to the second valve 72. The second pressure detecting element 71 can control the opening and closing of the second valve 72 through the pressure abnormality electrical signal to adjust the pressure of the dry gas in the second pipe 70. The second flow sensor 73 can be a flow sensor disposed in the second conduit 70 and configured to detect the purge flow rate of the drying gas. When the second flow sensor 73 detects that the flow rate in the second conduit 70 deviates from a predetermined flow rate, the second flow sensor 73 can send a signal to the second valve 72 to control the opening and closing of the second valve 72 and thereby adjust the flow rate of the drying gas. The predetermined flow rate can be 5-15 L / min. In this embodiment, the second valve 72 can be electrically connected to the temperature and humidity sensor 12. When the temperature and humidity sensor 12 detects that the humidity within the container 10 is greater than 5% RH, the temperature and humidity sensor 12 can generate an alarm signal to control the opening and closing of the second valve 72, thereby increasing the flow rate of the drying gas or extending the injection time of the drying gas.
[0040] like Figure 1 As shown, the liquid tank assembly 20 of this embodiment includes: a cleaning liquid tank 21, a liquid tank heating element, a liquid tank level detection element 22, a pH detection element 23, a turbidity detection element 24, a conductivity detection element 25, a drainage pipe 26 and a drainage pump 27. The cleaning liquid tank 21 is used to contain cleaning liquid. The cleaning liquid tank 21 is connected to the first pipe 60. The cleaning liquid can be sprayed into the container part 10 through the first pipe 60 for flushing and cleaning the server. The liquid tank heating element can heat the cleaning liquid to 40-50°C to activate the activity of the cleaning liquid, so that the server can be better cleaned.
[0041] like Figure 1As shown, the liquid tank level detection component 22 of this embodiment can be a liquid level sensor. The liquid tank level detection component 22 is arranged in the cleaning liquid tank 21. The liquid tank level detection component 22 is used to detect the liquid level in the cleaning liquid tank 21. The liquid tank level detection component 22 is electrically connected to the ultrasonic generator 13. When the liquid tank level detection component 22 detects that the liquid level is too low, it will send an electrical signal to control the ultrasonic generator 13 to suspend work, so as to avoid the cleaning liquid tank 21 being unable to inject cleaning liquid into the container part 10 and causing no-load operation to damage the ultrasonic generator 13. When the liquid tank level detection component 22 detects that the liquid level is too high, the liquid tank level detection component 22 can send a signal to activate the drainage pump 27 for emergency drainage, so as to avoid the server being corroded due to being soaked in the cleaning liquid, thereby avoiding damage to the server.
[0042] like Figure 1 As shown, the pH detection element 23 of this embodiment can be a pH sensor, the turbidity detection element 24 can be a turbidity sensor, a laser turbidimeter, etc., and the conductivity detection element 25 can be a conductivity sensor; the pH detection element 23, the turbidity detection element 24 and the conductivity detection element 25 are all arranged in the cleaning liquid tank 21, and the pH detection element 23 is used to detect the pH of the cleaning liquid, so that the pH of the cleaning liquid is maintained at a predetermined pH value, which can be 6-8. When the pH deviates from 6-8, the pH detection element 23 can send an electrical signal to prompt Neutralizers are injected promptly to prevent strong acids and alkalis from corroding the server's metal contacts. Turbidity detector 24 has a range accuracy of 0-1000 NTU / ±2%. It is used to detect the turbidity of the cleaning fluid, assess the filtration efficiency of the used cleaning fluid, ensure good cleaning performance, and prevent impurities in the filtered fluid from damaging the server during flushing. If turbidity continues to rise, filter 52 is deemed to have failed and an alarm is activated, prompting prompt replacement or repair of filter 52. Conductivity detector 25 detects the conductivity of the cleaning fluid and its ion concentration. When the ion concentration exceeds a predetermined value, an alarm is activated, prompting prompt dilution of the cleaning fluid. The predetermined concentration can be 100 μS / cm, preventing residual ions from causing server short circuits. The drainage pipe 26 is connected to the cleaning liquid tank 21. The drainage pipe 26 is used to discharge the waste liquid in the cleaning liquid tank 21 to ensure that the cleaning liquid in the cleaning liquid tank 21 has good cleaning ability and can better clean the server; the drainage pump 27 can be a variable frequency pump with an adjustable power of 0-5kW to achieve precise control of the flow rate of 5-15L / min. The drainage pump 27 is set on the drainage pipe 26 and provides driving force for the cleaning liquid, which can speed up the discharge of waste liquid in the cleaning liquid tank 21. When receiving the signal from the liquid tank liquid level detection component 22, the drainage pump 27 can realize emergency drainage.
[0043] The server cleaning device of this embodiment is divided into three stages when cleaning the server:
[0044] 1. Main cleaning phase: A cleaning solution with a pH of 6-8 is proportionally injected into the cleaning solution tank 21. The conductivity detection element 25 detects the ion concentration and dynamically adjusts it. The cleaning solution is heated to 40-50°C to activate the cleaning solution. The spray element 30 and the ultrasonic generator are then activated. The two work together to clean the server. The used cleaning solution is filtered and returned to the cleaning solution tank 21, allowing the cleaning solution to be recycled.
[0045] 2. Rinsing stage: The recycled cleaning liquid is extracted by the drainage pump 27 and fresh cooled cleaning liquid is circulated and injected 3-5 times for rinsing the server;
[0046] 3. Drying stage: Drying gas heated to 50-60°C is blown through the drying assembly 40, and the humidity in the tank is detected and controlled to be ≤5%RH by the temperature and humidity detection component 12.
[0047] Low-frequency ultrasound loosens the pollutants in the server, the spray part 30 flushes and removes the pollutants in the server, and the dry gas purges and dries the server. The three-stage timing is precisely controlled to improve the cleaning efficiency of the server, so that the pollutant removal rate is ≥98%, the single cleaning time is ≤25 minutes, and the drying time is ≤10 minutes; under the detection and regulation of pressure, temperature, temperature and humidity, pH, etc. by the detection component, the server component damage rate is <0.005%, ensuring the safety and reliability of the server cleaning process; the detection component can send signals to control each variable frequency pump to realize the intelligent start and stop of each variable frequency pump, reducing energy consumption by 30%, and the ultrasonic generator also controls energy consumption, and makes the biodegradation rate of the cleaning liquid ≥90%, achieving energy saving and environmental protection; and the server cleaning device of this embodiment has strong compatibility and supports cleaning of various immersion liquid types such as mineral oil and fluorinated liquid.
[0048] The server cleaning device of this embodiment can also be used in the field of precision electronic manufacturing for online cleaning before chip packaging, replacing traditional gas phase cleaning; in the field of medical equipment maintenance, it is suitable for sterilization and cleaning of precision instruments such as endoscopes and surgical robots; in the field of new energy vehicles, it is used for removing pollutants from the immersion cooling system of battery modules, etc.
[0049] The server cleaning device of this embodiment can adopt a modular design: the drying component 40 and the ultrasonic generator 13 are split into independent units to support on-demand combination; the heating plate and the liquid tank heating element can use waste heat recovery or solar power to achieve green energy integration.
[0050] It should be noted that, in the above embodiments, a plurality refers to at least two.
[0051] From the above description, it can be seen that the above embodiments of the present invention achieve the following technical effects:
[0052] Placing the entire server in the accommodating chamber and injecting the cleaning liquid in the liquid tank assembly 20 into the accommodating chamber through the first pipe 60 can clean the entire server in the accommodating chamber. There is no need to disassemble the server for cleaning and reinstall it, which simplifies the server cleaning process, reduces the difficulty of cleaning the server, achieves efficient cleaning of the server, reduces server downtime, and ensures that the data center can operate continuously. The cleaning liquid can be sprayed on the server through the spray part 30 to clean the server. The spray part 30 can spray out a mist, columnar or other cleaning liquid with a certain pressure, which can flush out pollutants that are difficult to clean on the cleaning server and pollutants that are difficult to clean in the complex structure of the server, thereby improving the removal rate of pollutants on the server. The ultrasonic generator 13 connected to the container part 10 can provide ultrasonic waves for the accommodating chamber. The ultrasonic waves can loosen the pollutants on the server, making the pollutants on the server easier to be cleaned by the cleaning liquid. The ultrasonic generator 13 can cooperate with the spray part 30. The ultrasonic wave loosens the contaminants on the server, and the loosened contaminants are more easily washed away by the cleaning liquid sprayed by the spray part 30. The cooperation of the two can improve the cleaning efficiency and flush away the contaminants on the server that are difficult to clean, so as to achieve efficient cleaning of the server. Dry gas is provided to the container part 10 through the second pipe 70, so that the cleaned server can be dried to avoid problems such as oxidation and corrosion of the server after contact with the cleaning liquid, thereby extending the service life of the server. In this embodiment, the spray part 30, the ultrasonic generator 13, and the drying component 40 cooperate to clean and dry the server, which can clean the server efficiently and reliably, shorten the cleaning and drying time of the server and reduce energy consumption, meet the high reliability and low maintenance cost requirements of the data center, and at the same time improve the removal rate of contaminants on the server.
[0053] The above is a detailed introduction to the server cleaning device provided by this application. This article uses specific examples to illustrate the principles and implementation methods of this application. The description of the above examples is only intended to help understand the method and core concept of this application. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of this application, several improvements and modifications can be made to this application, and these improvements and modifications also fall within the scope of protection of the claims of this application.
Claims
1. A server cleaning device, characterized in that: include: A container (10), wherein the container (10) has a receiving cavity for receiving a server; A liquid tank assembly (20) is provided for providing cleaning liquid to the container (10). The liquid tank assembly (20) comprises a cleaning liquid tank (21), a liquid tank level detection element (22), a pH detection element (23), a turbidity detection element (24) and a conductivity detection element (25). The cleaning liquid tank (21) is used to contain the cleaning liquid. The cleaning liquid tank (21) is connected to the container (10) via a first pipe (60). The liquid tank level detection element (22) is arranged at the container (10). The cleaning liquid tank (21), the liquid tank level detection element (22) is used to detect the liquid level in the cleaning liquid tank (21); the pH detection element (23), the turbidity detection element (24) and the conductivity detection element (25) are all arranged in the cleaning liquid tank (21), the pH detection element (23) is used to detect the pH of the cleaning liquid, the turbidity detection element (24) is used to detect the turbidity of the cleaning liquid, and the conductivity detection element (25) is used to detect the conductivity of the cleaning liquid; a spraying member (30), the spraying member (30) being arranged in the container member (10) and located at the outlet end of the first pipe (60), the cleaning liquid being sprayed into the accommodating cavity via the spraying member (30); A drying component (40), the drying component (40) being in communication with the container (10) via a second pipe (70), the drying component (40) providing drying gas to the container (10), the drying gas being used to dry the server; An ultrasonic generator (13) is connected to the container component (10) and provides ultrasonic waves to the accommodating cavity. The liquid tank level detection component (22) is electrically connected to the ultrasonic generator (13).
2. The server cleaning device according to claim 1, characterized in that: At least a portion of the spraying member (30) is movably arranged relative to the container member (10), and the spraying member (30) has a spraying channel. When the spraying member (30) is movable, the angle of the spraying channel can be adjusted.
3. The server cleaning device according to claim 1, characterized in that: The server cleaning device further comprises a circulation pipe (50), the two ends of which are respectively in communication with the container (10) and the liquid tank assembly (20), and the cleaning liquid in the container (10) flows back into the liquid tank assembly (20) via the circulation pipe (50).
4. The server cleaning device according to claim 3, characterized in that: The server cleaning device also includes: a circulation pump (51), the circulation pump (51) being arranged on the circulation pipe (50) and providing driving force for the cleaning liquid; and / or A filter (52) and a filter detection member (53), wherein the filter (52) is arranged on the circulation pipe (50), the filter (52) filters the cleaning liquid, the filter detection member (53) is connected to the circulation pipe (50) through the detection pipe, and the filter detection member (53) and the filter (52) are arranged in parallel, the two ends of the detection pipe are respectively located at the two ends of the filter (52), and the filter detection member (53) is used to detect the state change of the two ends of the filter (52).
5. The server cleaning device according to claim 3, characterized in that: The server cleaning device also includes: a container liquid level detection member (11), the container liquid level detection member (11) being arranged in the container member (10), and the container liquid level detection member (11) being used to detect the liquid level of the cleaning liquid in the container member (10); A circulation valve (54) is provided on the circulation pipe (50) and controls the opening and closing of the circulation pipe (50); the container liquid level detection element (11) is electrically connected to the circulation valve (54).
6. The server cleaning device according to claim 1, characterized in that: The server cleaning device further comprises a temperature and humidity detection component (12), which is arranged in the container component (10) and is used to detect the temperature and humidity in the container component (10).
7. The server cleaning device according to claim 1, characterized in that: The server cleaning device also includes: a first flow detection element (61), the first flow detection element (61) being arranged in the first pipe (60), and the first flow detection element (61) being used to detect the flow of the cleaning liquid; a first valve (62), the first valve (62) being arranged in the first pipe (60) and controlling the opening and closing of the first pipe (60), the first flow detection element (61) being electrically connected to the first valve (62); a first pressure detection member (63), the first pressure detection member (63) being arranged in the first pipeline (60), and the first pressure detection member (63) being used to detect the pressure of the first pipeline (60); A first pump body (64) is provided in the first pipeline (60) and provides driving force for the cleaning liquid. The first pressure detection component (63) is electrically connected to the first pump body (64).
8. The server cleaning device according to claim 1, characterized in that: The server cleaning device also includes: a second pressure detection member (71), the second pressure detection member (71) being arranged in the second pipeline (70), and the second pressure detection member (71) being used to detect the pressure of the second pipeline (70); a second valve (72), the second valve (72) being arranged in the second pipe (70) and controlling the opening and closing of the second pipe (70), the second pressure detecting element (71) being electrically connected to the second valve (72); A second flow detection element (73) is provided in the second pipeline (70), and the second flow detection element (73) is used to detect the purge flow rate of the drying gas.
9. The server cleaning device according to claim 1, characterized in that: The liquid tank assembly (20) further includes: a liquid discharge pipe (26), the liquid discharge pipe (26) being connected to the cleaning liquid tank (21), and the liquid discharge pipe (26) being used to discharge waste liquid in the cleaning liquid tank (21); A drainage pump (27), wherein the drainage pump (27) is arranged on the drainage pipe (26) and provides driving force for the cleaning liquid.
10. The server cleaning device according to claim 1, characterized in that: The server cleaning device further comprises a circulation pipe (50), the two ends of which are respectively in communication with the container (10) and the liquid tank assembly (20), and the cleaning liquid in the container (10) flows back into the liquid tank assembly (20) via the circulation pipe (50). The circulation pipe (50) is provided with a circulation valve (54), and the circulation valve (54) controls the opening and closing of the circulation pipe (50); the first pipe (60) is provided with a first valve (62) and a first pump body (64), and the second pipe (70) is provided with a second valve (72); The server cleaning device further includes a detection component, which includes a container liquid level detection component (11), a first flow detection component (61), a first pressure detection component (63), a second pressure detection component (71), and a second flow detection component (73). The container liquid level detection component (11) is arranged on the container component (10), and the container liquid level detection component (11) is used to detect the liquid level of the cleaning liquid in the container component (10). The first flow detection component (61) is arranged on the first pipe (60), and the first flow detection component (61) is used to detect the flow of the cleaning liquid. The first flow detection component (61) is electrically connected to the first valve (62). The first pressure detecting element (63) is provided in the first pipeline (60), and the first pressure detecting element (63) is used to detect the pressure of the first pipeline (60). The first pressure detecting element (63) is electrically connected to the first pump body (64). The second pressure detecting element (71) is provided in the second pipeline (70), and the second pressure detecting element (71) is used to detect the pressure of the second pipeline (70). The second pressure detecting element (71) is electrically connected to the second valve (72). The second flow detecting element (73) is provided in the second pipeline (70), and the second flow detecting element (73) is used to detect the purge flow rate of the dry gas.