Etching cavity

Abstract

The etching cavity comprises a cavity bottom plate, a feeding and discharging table, an etching pool and a cleaning pool are sequentially arranged on the upper side of the cavity bottom plate, an outer cavity cover is arranged on the upper portion of the cavity bottom plate in a covering mode, a hydraulic cylinder is arranged in the outer cavity cover through a lead screw and a transverse sliding block, and a positioning clamping plate is arranged at the lower end of the hydraulic cylinder through a double-end air cylinder. Due to the fact that the hydraulic cylinder is arranged at the top in the outer cavity cover through the lead screw, the transverse sliding block and the bearing seat, and the positioning clamping plates are arranged at the lower end of the hydraulic cylinder through the double-end air cylinder, the double-end air cylinder drives the two positioning clamping plates to move and adjust so as to clamp and fix products placed on the feeding and discharging table. According to the utility model, the product is placed in the etching pool and the cleaning pool, the product is lifted and adjusted through the hydraulic cylinder, the product is driven by the lead screw to transversely move and is sequentially placed in the etching pool and the cleaning pool to be etched and cleaned, the etched product is dried through the drying mechanism after cleaning, the etching efficiency is relatively high, and the use functionality is relatively strong.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor etching, in particular to an etching cavity. Background Art

[0002] Semiconductors refer to materials with electrical conductivity between conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communications systems, photovoltaic power generation, lighting, and high-power power conversion. Diodes, for example, are devices made from semiconductors. In the semiconductor device manufacturing process, etching processes are widely used to form different patterns on wafers.

[0003] Prior art application number 201820936600.2 discloses a semiconductor etching apparatus comprising a reaction chamber, wherein a wafer support is disposed within the reaction chamber. The wafer support is used to support a wafer for etching the wafer using plasma. The reaction chamber further comprises an inner liner disposed around the sidewalls of the reaction chamber. The inner liner is formed by a plurality of sheet-like components arranged along the sidewalls. The plurality of sheet-like components are arranged so as to at least partially overlap with each other, thereby preventing the sidewalls of the reaction chamber from being exposed relative to the wafer. The semiconductor etching apparatus provided by the present invention is provided with sheet-like components arranged along the sidewalls and at least partially overlapping to form an inner liner, thereby preventing plasma from directly contacting the sidewalls of the reaction chamber and achieving comprehensive protection of the sidewalls of the reaction chamber. When the turbo pump is operating, a spiral airflow is generated through the inner liner, exerting a strong suction force on the polymer, facilitating cleaning of the reaction chamber and improving the cleanliness of the reaction chamber. However, the etching efficiency is low and the functionality is poor. Utility Model Content

[0004] The purpose of the utility model is to provide an etching chamber to solve the problems of low etching efficiency and poor functionality in the prior art.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: an etching chamber, comprising a chamber bottom plate, wherein the upper side of the chamber bottom plate is provided with a loading and unloading platform, an etching pool and a cleaning pool in sequence, the upper cover of the chamber bottom plate is provided with an outer chamber cover, a transverse slider is provided on the top of the outer chamber cover through a screw, a hydraulic cylinder is provided on the lower side of the transverse slider through a bearing seat and a bearing for rotation, a positioning clamp is provided at the lower end of the hydraulic cylinder through a double-headed cylinder, and a drying mechanism is also provided on the inner wall of the outer chamber cover on the upper side of the cleaning pool.

[0006] Furthermore, a material inlet and outlet and a control box are provided on one side of the outer cavity cover, and a chamber door is provided inside the material inlet and outlet.

[0007] Furthermore, an electric motor is connected between the hydraulic cylinder and the transverse slider via a gear set, and the electric motor is fixedly arranged at the lower part of the transverse slider.

[0008] Furthermore, a flushing pipe is provided at the upper part of the cleaning pool, a plurality of flushing nozzles are provided inside the flushing pipe, and a drain port and a valve are provided on one side of the bottom of the etching pool and the cleaning pool.

[0009] Furthermore, the flushing pipe is an annular pipe, and one end of the flushing pipe is connected to a water inlet pipe and a water pump.

[0010] Furthermore, the drying mechanism includes a hot air pipe, one end of the hot air pipe is provided with a blower and an electric heating wire, and one side of the hot air pipe is provided with multiple blowing ports.

[0011] Furthermore, the positioning clamp is a rectangular clamp, and an anti-slip protrusion is provided on the inner side of the positioning clamp.

[0012] Compared with the prior art, the beneficial effects of the present invention are:

[0013] 1. In the present invention, a hydraulic cylinder is provided at the top of the outer cavity cover through a lead screw, a transverse slider and a bearing seat, and a positioning clamp is provided at the lower end of the hydraulic cylinder through a double-headed cylinder, so that the two positioning clamps are driven to move and adjust by the double-headed cylinder, which is used to clamp and fix the products placed on the loading and unloading table, and then the product is raised and lowered by the hydraulic cylinder, and the product is driven to move laterally by the lead screw, and is placed in the etching tank and the cleaning tank in turn for etching and cleaning. After cleaning, the etched product is dried by the drying mechanism, so the etching efficiency is high and the functionality is strong.

[0014] 2. In the present invention, one end of the hydraulic cylinder is rotatably arranged on the lower side of the transverse slider through a bearing seat and a bearing. An electric motor is connected between the hydraulic cylinder and the transverse slider through a gear set, and the motor is fixedly arranged at the lower part of the transverse slider, so that the hydraulic cylinder is driven by the motor and the gear set to rotate horizontally, thereby being able to perform horizontal rotation adjustment on the product, which is beneficial to improving the efficiency of product etching, cleaning and drying. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings:

[0016] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0017] Figure 2 This is the main view of the internal structure of the cavity of the present utility model;

[0018] Figure 3 This is a top view of the cleaning pool structure of the present utility model.

[0019] In the figure: 1. Chamber bottom plate; 2. Loading and unloading table; 3. Etching pool; 4. Lead screw; 5. Cleaning pool; 6. Horizontal slide; 7. Bearing seat; 8. Hydraulic cylinder; 9. Double-head cylinder; 10. Positioning clamp; 11. Motor; 12. Gear set; 13. Hot air pipe; 14. Blower; 15. Heating wire; 16. Air outlet; 17. Water inlet pipe; 18. Water pump; 19. Drain port; 20. Flushing pipe; 21. Flushing nozzle; 22. Outer cavity cover; 23. Chamber door; 24. Control box. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0021] See also Figure 1 , Figure 2 , Figure 3 The upper part of the cavity bottom plate 1 is provided with an outer cavity cover 22, and a transverse slider 6 is provided on the top of the outer cavity cover 22 through a screw 4. A hydraulic cylinder 8 is provided on the lower side of the transverse slider 6. The lower end of the hydraulic cylinder 8 is provided with a positioning splint 10 through a double-headed cylinder 9. The positioning splint 10 is a rectangular splint, and the inner side of the positioning splint 10 is provided with an anti-slip protrusion. The double-headed cylinder 9 drives the two positioning splints 10 to move and adjust, which is used to clamp and fix the product placed on the loading and unloading table 2. The clamping and fixing has high stability, and loading and unloading are convenient and fast. The product is lifted and lowered by the hydraulic cylinder 8, and the product is driven to move laterally by the screw 4, and is placed in the etching pool 3 and the cleaning pool 5 for etching and cleaning treatment in turn. The etching efficiency is high and the functionality is strong.

[0022] like Figure 2 As shown, in order to dry the products after etching and cleaning, a drying mechanism is also provided on the inner wall of the outer cavity cover 22 on the upper side of the cleaning pool 5. The drying mechanism includes a hot air pipe 13, one end of the hot air pipe 13 is provided with a blower 14 and an electric heating wire 15, and one side of the hot air pipe 13 is provided with multiple blowing ports 16, which can dry the products after etching and cleaning, and the drying uniformity is strong, thereby improving the functionality of the equipment.

[0023] like Figure 2As shown, in order to perform horizontal rotation adjustment on the product, a hydraulic cylinder 8 is also rotatably arranged at one end of the hydraulic cylinder 8 through a bearing seat 7 and a bearing at the lower part of the transverse slider 6. An electric motor 11 is connected between the hydraulic cylinder 8 and the transverse slider 6 through a gear set 12, and the motor 11 is fixedly arranged at the lower part of the transverse slider 6, so that the hydraulic cylinder 8 is driven to perform horizontal rotation adjustment by the motor 11 and the gear set 12, thereby enabling the product to be horizontally rotationally adjusted, which is beneficial to improving the efficiency of product etching, cleaning and drying.

[0024] like Figure 3 As shown, in order to perform multi-angle flushing on the outside of the etched product, a flushing pipe 20 is provided on the upper part of the cleaning tank 5, and a plurality of flushing nozzles 21 are provided on the inside of the flushing pipe 20. A drain port 19 and a valve are provided on one side of the bottom of the etching tank 3 and the cleaning tank 5. The flushing pipe 20 is an annular pipe, and one end of the flushing pipe 20 is connected to the water inlet pipe 17 and the water pump 18, so that the outside of the etched product can be flushed at multiple angles, and the cleaning efficiency is high.

[0025] The working principle and usage process of the utility model: When in use, since a hydraulic cylinder 8 is provided at the top of the outer cavity cover 22 through a lead screw 4, a transverse slider 6 and a bearing seat 7, and a positioning splint 10 is provided at the lower end of the hydraulic cylinder 8 through a double-headed cylinder 9, the two positioning splints 10 are driven by the double-headed cylinder 9 to move and adjust, which is used to clamp and fix the products placed on the loading and unloading platform 2, and then the hydraulic cylinder 8 is used to adjust the product lifting and lowering, and the lead screw 4 is used to drive the product to move laterally, and the product is placed in the etching tank 3 and the cleaning tank 5 in turn for etching and cleaning. After cleaning, the etched product is dried by the drying mechanism, and the etching efficiency is high and the functionality is strong.

[0026] Finally, it should be noted that the above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art will be able to modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein with equivalents. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. An etching chamber, comprising a chamber bottom plate (1), characterized in that: The upper side of the cavity bottom plate (1) is provided with a loading and unloading platform (2), an etching pool (3) and a cleaning pool (5) in sequence. The upper cover of the cavity bottom plate (1) is provided with an outer cavity cover (22). The top of the outer cavity cover (22) is provided with a transverse slider (6) through a screw (4). The lower side of the transverse slider (6) is provided with a hydraulic cylinder (8) for rotation through a bearing seat (7) and a bearing. The lower end of the hydraulic cylinder (8) is provided with a positioning clamping plate (10) through a double-headed cylinder (9). The inner wall of the outer cavity cover (22) on the upper side of the cleaning pool (5) is also provided with a drying mechanism.

2. The etching chamber according to claim 1, characterized in that: One side of the outer cavity cover (22) is provided with an inlet and outlet, and a chamber door (23) is provided inside the inlet and outlet.

3. The etching chamber according to claim 1, characterized in that: An electric motor (11) is connected between the hydraulic cylinder (8) and the transverse slider (6) via a gear set (12), and the electric motor (11) is fixedly arranged at the lower part of the transverse slider (6).

4. The etching chamber according to claim 1, characterized in that: A flushing pipe (20) is provided in the upper portion of the cleaning pool (5), and a plurality of flushing nozzles (21) are provided inside the flushing pipe (20).

5. The etching chamber according to claim 4, characterized in that: The flushing pipe (20) is an annular pipe, and one end of the flushing pipe (20) is connected to a water inlet pipe (17) and a water pump (18).

6. The etching chamber according to claim 1, characterized in that: The drying mechanism comprises a hot air pipe (13), one end of which is provided with a blower (14) and an electric heating wire (15), and one side of which is provided with a plurality of blowing ports (16).

7. The etching chamber according to claim 1, characterized in that: The positioning clamping plate (10) is a rectangular clamping plate, and an anti-slip protrusion is provided on the inner side of the positioning clamping plate (10).

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