Constant-temperature quantitative feeding device for polishing solution

Abstract

The utility model discloses a constant-temperature quantitative feeding device for polishing liquid, which relates to the technical field of liquid delivery, and comprises a base, a heater, a constant-temperature barrel, a constant-temperature pump, a constant-temperature pump, a constant-temperature pump, a constant-temperature pump, a constant-temperature pump and a constant-temperature pump, the supply mechanism is located in the constant-temperature barrel and comprises a buffer tank, and the top surface of the buffer tank is fixedly communicated with a liquid outlet pipeline; and the control mechanism is used for controlling quantitative supply of the polishing solution and located below the buffer tank, the control mechanism comprises an electric telescopic rod fixedly connected with the constant-temperature barrel, a connecting rod is fixedly arranged at the output end of the electric telescopic rod, a piston is fixedly arranged at the end, away from the electric telescopic rod, of the connecting rod, and the piston is matched with the buffer tank. According to the constant-temperature quantitative supply device for the polishing solution, the constant-temperature polishing solution can be prepared conveniently, the constant-temperature polishing solution can be supplied quantitatively, use is convenient, and the working efficiency is high.

Description

Technical Field

[0001] The utility model relates to the technical field of liquid transportation, in particular to a polishing liquid constant-temperature quantitative supply device. Background Art

[0002] Polishing fluid is a chemical widely used in the field of surface processing. Its main function is to remove tiny bumps and flaws on the surface of the material to make the surface smooth and shiny.

[0003] Currently, when using polishing liquid for external surface treatment of materials, a constant temperature and quantitative polishing liquid needs to be provided according to the characteristics of the material. The existing method for preparing a constant temperature and quantitative polishing liquid is to manually use a measuring vessel to fill a certain amount of polishing liquid, then heat the polishing liquid and measure the temperature at the same time to make the polishing liquid reach the target temperature before putting it into use. This is time-consuming and labor-intensive, and has low work efficiency.

[0004] Therefore, in order to solve the above problems, the applicant needs to design a constant temperature and quantitative supply device for polishing liquid to solve the problems. Summary of the Invention

[0005] The purpose of the present invention is to provide a constant temperature and quantitative supply device for polishing liquid to solve the problems mentioned in the above background technology.

[0006] To achieve the above purpose, the present invention provides the following technical solution: a polishing liquid constant temperature quantitative supply device, comprising a base, and a constant temperature barrel is placed on the top surface of the base,

[0007] Also included: a heater fixedly connected to the constant temperature barrel, and the heater is located outside the constant temperature barrel, the bottom surface of the heater is fixedly connected to a support column, and the support column is fixedly connected to the base;

[0008] A supply mechanism located inside the constant temperature barrel, the supply mechanism comprising a buffer tank, a top surface of the buffer tank being fixedly connected to a liquid outlet pipe, and an end of the liquid outlet pipe remote from the buffer tank being fixedly connected to a device for using the polishing liquid;

[0009] A control mechanism for controlling the quantitative supply of polishing liquid, and the control mechanism is located below the cache tank. The control mechanism includes an electric telescopic rod fixedly connected to the constant temperature barrel, and a connecting rod is fixedly provided at the output end of the electric telescopic rod, and a piston is fixedly provided at one end of the connecting rod away from the electric telescopic rod, and the piston is adapted to the cache tank.

[0010] Furthermore, a liquid inlet is provided on the top surface of the cache tank, and a sealing cover is threadedly provided on the liquid inlet end of the liquid inlet.

[0011] Through the above structural design, the liquid inlet is convenient for filling the polishing liquid into the cache tank, and the sealing cover is convenient for preventing water from entering the cache tank when the cache tank is immersed in constant temperature water.

[0012] Furthermore, a movable cover is detachably mounted on the top surface of the thermostatic barrel, and a plurality of exhaust holes are provided on the top surface of the movable cover.

[0013] Through the above structural design, the movable cover can prevent debris from entering the constant temperature barrel, and the exhaust hole can balance the air pressure inside the constant temperature barrel and the outside air pressure.

[0014] Furthermore, one side of the thermostatic barrel is fixedly connected to a water pump through a flange, and the water inlet end of the water pump is fixedly connected to an external water source. A base is fixedly provided on the bottom surface of the water pump, and the base is fixedly connected to the base.

[0015] Through the above structural design, the water pump can easily absorb clean water from the outside into the constant temperature barrel, and can easily add clean water to the constant temperature barrel, thereby filling the evaporated clean water in the constant temperature barrel, so that the cache tank is always in a constant temperature state.

[0016] Furthermore, a column is detachably installed on the inner bottom surface of the constant temperature barrel, and a support plate for placing the cache tank is fixedly provided on the top surface of the column.

[0017] Through the above structural design, the buffer tank is easily supported by the columns and support plates, so that the buffer tank does not directly contact the inner wall of the constant temperature barrel, preventing the temperature of the polishing liquid in different parts of the buffer tank from being different.

[0018] Furthermore, reinforcement plates are detachably installed on both sides of the column, and the reinforcement plates are fixedly connected to the inner bottom surface of the thermostatic barrel by screws.

[0019] Through the above structural design, the reinforcement plate is used to firmly connect the column and the constant temperature barrel, thereby improving the stability of the column.

[0020] Compared with the prior art, the beneficial effects of the present invention are: the polishing liquid constant temperature quantitative supply device is convenient for preparing constant temperature polishing liquid, and can quantitatively supply constant temperature polishing liquid, is easy to use, and has high work efficiency. The specific contents are as follows:

[0021] 1. A supply mechanism is provided. When in use, the buffer tank is filled with polishing liquid through the liquid inlet, and then the water pump is used to input clean water from the outside into the constant temperature barrel, and the clean water is allowed to overflow the buffer tank. When the clean water is input, the heater is started to make the polishing liquid in the buffer tank reach the target temperature, thereby preparing constant temperature polishing liquid. When the constant temperature polishing liquid is prepared, the control mechanism pushes the polishing liquid into the liquid outlet pipe, thereby facilitating the provision of constant temperature polishing liquid to the device that needs to use the polishing liquid. It is convenient to use and has high work efficiency.

[0022] 2. A control mechanism is provided. When in use, after the constant temperature polishing liquid is prepared, the electric telescopic rod is started, and the extension length of the electric telescopic rod is controlled according to the demand for polishing liquid. The movement of the electric telescopic rod facilitates the movement of the connecting rod, and the movement of the connecting rod facilitates the movement of the piston. The piston pushes a certain amount of polishing liquid through the liquid outlet pipe into the device that needs to use the polishing liquid. It is easy to use and has high work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic diagram of the overall three-dimensional structure of the utility model;

[0024] Figure 2 This is a schematic diagram of the overall three-dimensional cross-sectional structure of the utility model;

[0025] Figure 3 This is a schematic diagram of the three-dimensional structure of the supply mechanism of the utility model;

[0026] Figure 4 For this utility model Figure 3 A schematic diagram of the structure enlarged in the middle;

[0027] Figure 5 It is a schematic diagram of the three-dimensional structure of the control mechanism of the utility model.

[0028] In the figure: 1. base; 2. supply mechanism; 3. control mechanism; 10. constant temperature barrel; 11. movable cover; 12. exhaust hole; 13. heater; 14. support column; 15. water pump; 16. base; 20. buffer tank; 21. liquid outlet pipe; 22. liquid inlet; 23. support plate; 24. column; 25. reinforcement plate; 30. electric telescopic rod; 31. connecting rod; 32. piston. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0030] like Figure 1-Figure 5As shown, the constant temperature and quantitative supply device of the polishing liquid of the present invention includes a base 1, and a constant temperature barrel 10 is placed on the top surface of the base 1, and also includes a heater 13 fixedly connected to the constant temperature barrel 10, and the heater 13 is located outside the constant temperature barrel 10, and the bottom surface of the heater 13 is fixedly connected to a support column 14, and the support column 14 is fixedly connected to the base 1, and the top surface of the constant temperature barrel 10 is detachably installed with a movable cover 11, and the top surface of the movable cover 11 is provided with a plurality of exhaust holes 12; the supply mechanism 2 is located inside the constant temperature barrel 10, and the supply mechanism 2 includes a buffer tank 20, and the top surface of the buffer tank 20 is fixedly connected to a liquid outlet pipe 21, and the liquid outlet pipe 21 is away from one side of the buffer tank 20. The end is fixedly connected with the device for using polishing liquid, the top surface of the cache tank 20 is provided with a liquid inlet 22, and the liquid inlet end of the liquid inlet 22 is threadedly provided with a sealing cover, one side of the constant temperature barrel 10 is fixedly connected with a water pump 15 through a flange, and the water inlet end of the water pump 15 is fixedly connected to the external water source, the bottom surface of the water pump 15 is fixedly provided with a base 16, and the base 16 is fixedly connected to the base 1, the inner bottom surface of the constant temperature barrel 10 is disassembled and installed with a column 24, and the top surface of the column 24 is fixedly provided with a support plate 23 for placing the cache tank 20, and reinforcement plates 25 are disassembled and installed on both sides of the column 24, and the reinforcement plate 25 is fixedly connected to the inner bottom surface of the constant temperature barrel 10 by screws.

[0031] Through the above-mentioned structural design, when in use, the polishing liquid is filled into the buffer tank 20 through the liquid inlet 22, and then the water pump 15 is used to input clean water from the outside into the constant temperature barrel 10, and the clean water is allowed to overflow the buffer tank 20. When the clean water is input, the heater 13 is started to make the polishing liquid in the buffer tank 20 reach the target temperature, thereby preparing a constant temperature polishing liquid. When the constant temperature polishing liquid is prepared, the control mechanism 3 pushes the polishing liquid into the liquid outlet pipe 21, so as to facilitate the provision of constant temperature polishing liquid to the device that needs to use the polishing liquid, and it is convenient to use and has high work efficiency.

[0032] A control mechanism 3 for controlling the quantitative supply of the polishing liquid is provided, and the control mechanism 3 is located below the buffer tank 20. The control mechanism 3 includes an electric telescopic rod 30 fixedly connected to the constant temperature barrel 10, and a connecting rod 31 is fixedly provided at the output end of the electric telescopic rod 30, and a piston 32 is fixedly provided at one end of the connecting rod 31 away from the electric telescopic rod 30, and the piston 32 is adapted to the buffer tank 20.

[0033] With the above structural design, during use, after the polishing liquid at a constant temperature is prepared, the electric telescopic rod 30 is started, and the extension length of the electric telescopic rod 30 is controlled according to the demand for polishing liquid. The movement of the electric telescopic rod 30 facilitates the movement of the connecting rod 31, and the movement of the connecting rod 31 facilitates the movement of the piston 32. The piston 32 pushes a certain amount of polishing liquid through the liquid outlet pipe 21 into the device that needs to use the polishing liquid, which is convenient to use and has high work efficiency.

[0034] Working principle: When using the constant temperature and quantitative supply device for polishing liquid, the buffer tank 20 is filled with polishing liquid through the liquid inlet 22, and then the water pump 15 is used to input clean water from the outside into the constant temperature barrel 10, and the clean water is allowed to overflow the buffer tank 20. When the clean water is input, the heater 13 is started to make the polishing liquid in the buffer tank 20 reach the target temperature, thereby preparing a constant temperature polishing liquid. When the constant temperature polishing liquid is prepared, the electric telescopic rod 30 is started, and the extension length of the electric telescopic rod 30 is controlled according to the demand for polishing liquid. The movement of the electric telescopic rod 30 is convenient for driving the connecting rod 31 to move, and the movement of the connecting rod 31 is convenient for driving the piston 32 to move. The piston 32 will push a certain amount of constant temperature polishing liquid through the liquid outlet pipe 21 into the device that needs to use the polishing liquid. It is easy to use and has high work efficiency.

[0035] Based on the above-mentioned ideal embodiment of the present invention, and in accordance with the above description, relevant personnel can make various changes and modifications without departing from the technical scope of the present invention. The technical scope of the present invention is not limited to the content of the specification, but must be determined according to the scope of the claims.

Claims

1. A polishing liquid constant temperature quantitative supply device, comprising a base (1), and a constant temperature barrel (10) is placed on the top surface of the base (1). It is characterized in that Also includes: A heater (13) fixedly connected to the thermostatic barrel (10), the heater (13) being located outside the thermostatic barrel (10), the bottom surface of the heater (13) being fixedly connected to a support column (14), and the support column (14) being fixedly connected to the base (1); A supply mechanism (2) is located inside the constant temperature barrel (10), the supply mechanism (2) includes a buffer tank (20), a top surface of the buffer tank (20) is fixedly connected to a liquid outlet pipe (21), and an end of the liquid outlet pipe (21) away from the buffer tank (20) is fixedly connected to a device for using polishing liquid; A control mechanism (3) for controlling the quantitative supply of the polishing liquid, wherein the control mechanism (3) is located below the buffer tank (20), wherein the control mechanism (3) comprises an electric telescopic rod (30) fixedly connected to the constant temperature barrel (10), and a connecting rod (31) is fixedly provided at the output end of the electric telescopic rod (30), and a piston (32) is fixedly provided at one end of the connecting rod (31) away from the electric telescopic rod (30), and the piston (32) is adapted to the buffer tank (20).

2. The polishing liquid constant temperature quantitative supply device according to claim 1, characterized in that: The top surface of the buffer tank (20) is provided with a liquid inlet (22), and a sealing cover is threadedly provided at the liquid inlet end of the liquid inlet (22).

3. The polishing liquid constant temperature quantitative supply device according to claim 1, characterized in that: A movable cover (11) is detachably mounted on the top surface of the thermostatic barrel (10), and a plurality of exhaust holes (12) are provided on the top surface of the movable cover (11).

4. The polishing liquid constant temperature quantitative supply device according to claim 1, characterized in that: One side of the thermostatic barrel (10) is fixedly connected to a water pump (15) via a flange, and the water inlet end of the water pump (15) is fixedly connected to an external water source. A base (16) is fixedly provided on the bottom surface of the water pump (15), and the base (16) is fixedly connected to the base (1).

5. The polishing liquid constant temperature quantitative supply device according to claim 1, characterized in that: The inner bottom surface of the thermostatic barrel (10) is detachably mounted with a column (24), and the top surface of the column (24) is fixedly provided with a support plate (23) for placing the cache tank (20).

6. The polishing liquid constant temperature quantitative supply device according to claim 5, characterized in that: Reinforcement plates (25) are detachably mounted on both sides of the upright column (24), and the reinforcement plates (25) are fixedly connected to the inner bottom surface of the thermostatic barrel (10) via screws.

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