Gas spray header suitable for PECVD

Abstract

The utility model relates to the technical field of gas spraying equipment, in particular to a gas spraying head suitable for PECVD (Plasma Enhanced Chemical Vapor Deposition), and aims to solve the problems of non-uniform gas flow velocity and low preparation efficiency in the prior art. The gas spray header comprises a bustle pipe and a tubular structure, the gas spraying plate is arranged at the lower end of the bustle pipe, a plurality of gas outlet holes are formed in the gas spraying plate, and the longitudinal section of each gas outlet hole is in a waist drum shape with the thin middle and the two thick ends; the end, away from the gas spraying plate, of the bustle pipe is connected with a ventilation pipe, and a gas containing cavity is formed by the space between the upper end and the lower end in the bustle pipe. The breather pipe inputs needed gas into the gas containing cavity, and the gas is evenly diffused outwards through the gas outlet holes.

Description

Technical Field

[0001] The utility model relates to the technical field of wireless information collection equipment, in particular to a gas shower head suitable for PECVD. Background Art

[0002] PECVD plays an important role in the manufacture of ultra-large-scale integrated circuits (ULSI), and is used to deposit key material layers such as polysilicon films, tungsten films, aluminum films, metal silicides, silicon oxide films, and silicon nitride films. In addition, in the manufacture of optoelectronic devices such as LEDs and solar cells, PECVD technology is used to deposit anti-reflection films, passivation films, etc., to improve the photoelectric conversion efficiency and performance stability of the devices. The preparation of key film layers in these different fields is done by injecting process gases into the chamber using a gas shower head, which is a key component of the equipment. There are many types and specifications of gas shower heads, and the air hole design of the shower head determines the uniformity of thin film preparation. At present, there are still many problems such as uneven gas flow rate and low preparation efficiency. Summary of the Invention

[0003] In view of this, the purpose of the present invention is to provide a gas shower head suitable for PECVD to solve the problems of uneven gas flow rate and low preparation efficiency in the prior art.

[0004] Based on the above-mentioned purpose, the utility model provides a gas shower head suitable for PECVD, including a surrounding tube, a tubular structure; a gas shower plate, arranged at the lower end of the surrounding tube, with a plurality of air outlet holes provided thereon, the longitudinal section of the air outlet holes being in the shape of a waist drum with a thin middle and thick ends; the end of the surrounding tube away from the gas shower plate is connected to the ventilation pipe, and the space between the upper and lower ends of the interior of the surrounding tube constitutes a gas containing chamber; the ventilation pipe inputs the required gas into the gas containing chamber, and the gas diffuses evenly outward through the air outlet holes.

[0005] A fixed edge is further provided on the outer edge of one end of the surrounding tube away from the gas shower plate, a reinforcing edge is provided on the outer edge of the fixed edge, and a slot is provided at the lower part of the fixed edge. The longitudinal section of the slot is a right-angled trapezoid, with the right angle facing the center of the gas shower plate. The slot is supported by bolts, so that the gas shower head as a whole is centered.

[0006] The axis of the air hole is perpendicular to the gas shower plate.

[0007] The plurality of air holes are evenly arranged on the gas shower plate in a concentric circle manner.

[0008] The wall thickness of the surrounding tube is 3.1 mm, and the internal vertical length, i.e., the height of the gas containing chamber wall, is 16.4 mm.

[0009] The diameters of the two ends of the air outlet are equal, and the ratio of the diameter of the air outlet at the thinnest part of the waist is 2:1.

[0010] The beneficial effects of the present invention are as follows: through the evenly distributed waist-drum-shaped air outlet holes, the gas in the gas containing chamber is evenly discharged outward, and the air flow passes through the narrow waist with a smaller diameter. Under the action of the narrow tube effect, the air flow is accelerated at the lower trumpet mouth and diffused in a conical range, so that the dispersion range of the air flow is larger, and the air holes are evenly distributed regularly, so that the processing gas can be evenly distributed in the space in the chamber and deposited on the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only for the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0012] Figure 1 This is a schematic structural diagram of a gas shower head suitable for PECVD according to an embodiment of the present invention;

[0013] Figure 2 This is a longitudinal cross-sectional structural diagram of a gas shower head suitable for PECVD according to an embodiment of the present invention;

[0014] Figure 3 This is a diagram of the connection structure between a gas shower head and a vent pipe suitable for PECVD according to an embodiment of the present invention.

[0015] Among them, 11, gas spray plate; 111, gas outlet; 12, gas containing cavity; 13, fixed edge; 131, slot; 132: reinforcement edge; 14, surrounding pipe. DETAILED DESCRIPTION

[0016] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments.

[0017] It should be noted that, unless otherwise defined, the technical or scientific terms used in this utility model should have the usual meanings understood by people with ordinary skills in the field to which this utility model belongs. The "first", "second" and similar words used in this utility model do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative position relationships. When the absolute position of the object being described changes, the relative position relationship may also change accordingly.

[0018] like Figure 1 and Figure 2 As shown, a gas shower head suitable for PECVD includes a surrounding tube 14 with a tubular structure; a gas shower plate 11, which is arranged at the lower end of the surrounding tube 14 and is provided with a plurality of gas outlet holes 111, and the longitudinal section of the gas outlet holes 111 is a waist drum shape with a thin middle and thick ends; the end of the surrounding tube 14 away from the gas shower plate 11 is connected to the vent pipe, and the space between the upper and lower ends of the surrounding tube 14 constitutes a gas containing chamber 12; the vent pipe inputs the required gas into the gas containing chamber 12, and the gas diffuses outward evenly through the gas outlet holes 111.

[0019] When the PECVD equipment starts working, the gas enters the gas containing chamber 12 of the gas shower head, and then enters from the outward-expanded rough-mouthed end of the upper end of several regularly distributed outlet holes 111. The airflow passes through the narrow waist with a smaller diameter. Under the action of the narrow tube effect, the airflow is accelerated at the lower trumpet mouth and diffused in a conical range, making the airflow dispersion range larger. Combined with the regular and uniform distribution of the air holes 111, the processing gas can be evenly distributed in the space in the chamber and deposited on the substrate.

[0020] like Figure 2 and Figure 3 To facilitate connection with the vent pipe and enhance the structural strength of the upper end of the surrounding tube 14, a fixed edge 13 is provided on the outer edge of the end of the surrounding tube 14 away from the gas shower plate 11. A reinforcing edge 132 is provided on the outer edge of the fixed edge 13, and a retaining groove 131 is provided at the lower portion of the fixed edge 13. The longitudinal cross-section of the retaining groove 131 is a right-angled trapezoid, with the right angle facing the center of the gas shower plate 11. Bolts support the interior of the retaining groove 131, and the side walls of the bolts contact the right-angled sides of the right-angled trapezoid, ensuring that the gas shower head is centered as a whole.

[0021] In order to reduce the resistance of gas outlet, the axis of the gas hole 111 is perpendicular to the gas shower plate 11. In order to distribute evenly, a plurality of the gas holes 111 are evenly arranged on the gas shower plate 11 in a concentric circle manner.

[0022] The wall thickness of the surrounding tube 14 is 3.1 mm, and the internal vertical length, that is, the height of the gas containing chamber wall, is 16.4 mm.

[0023] Specifically, the diameters of the two ends of the vent hole 111 are equal, and the ratio of the diameter of the thinnest part of the waist is 2:1. Under this structure, the thickness of the deposited film is The uniformity of the deposited film thickness is 1.1%, which greatly improves the film uniformity and accelerates the air flow speed, effectively improving the deposition efficiency.

[0024] If the ratio of the diameters of the two ends of the vent 111 to the diameter of the thinnest part of the waist is changed to 1:1, that is, the vent 111 is a straight cylinder, the thickness of the deposited film is The thickness uniformity of the deposited film is 2.5%. Compared with the design of the present invention, there are certain disadvantages in terms of film deposition uniformity and deposition efficiency.

[0025] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present invention (including the claims) is limited to these examples. Within the scope of the present invention, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity.

[0026] The present invention is intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention shall be included in the scope of protection of the present invention.

Claims

1. A gas shower head suitable for PECVD, characterized in that: include Peritubular tube (14), tubular structure; A gas shower plate (11) is provided at the lower end of the surrounding tube (14) and is provided with a plurality of gas outlet holes (111). The longitudinal section of the gas outlet holes (111) is in the shape of a waist drum with a narrow middle and thick ends. One end of the surrounding pipe (14) away from the gas shower plate (11) is connected to the ventilation pipe, and the space between the upper and lower ends of the surrounding pipe (14) forms a gas accommodating chamber (12); The vent pipe inputs required gas into the gas containing chamber (12), and the gas is uniformly diffused outward through the gas outlet hole (111).

2. The gas shower head suitable for PECVD according to claim 1, characterized in that: A fixed edge (13) is further provided on the outer edge of one end of the surrounding tube (14) away from the gas shower plate (11), a reinforcement edge (132) is provided on the outer edge of the fixed edge (13), and a clamping groove (131) is provided at the lower portion of the fixed edge (13); The longitudinal section of the clamping groove (131) is a right-angled trapezoid, with the right angle facing the center of the gas shower plate (11). The clamping groove (131) is supported by bolts, and the gas shower head as a whole is centered.

3. The gas shower head suitable for PECVD according to claim 1, characterized in that: The axis of the air hole (111) is perpendicular to the gas shower plate (11).

4. The gas shower head suitable for PECVD according to claim 1, characterized in that: The plurality of air holes (111) are evenly arranged on the gas shower plate (11) in a concentric circle manner.

5. The gas shower head suitable for PECVD according to claim 1, characterized in that: The wall thickness of the surrounding tube (14) is 3.1 mm, and the internal vertical length, i.e., the wall height of the gas containing chamber, is 16.4 mm.

6. The gas shower head suitable for PECVD according to claim 1, characterized in that: The diameters of the two ends of the air outlet (111) are equal, and the ratio of the diameter of the air outlet (111) to the diameter of the thinnest part of the waist is 2:1.

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