Deposition system

Abstract

The utility model discloses a deposition system. The deposition system comprises a shell, a supporting base and a movable base. The supporting base is arranged in the shell and used for supporting a carrier. The movable seat is arranged on the shell, the movable seat and the supporting seat are oppositely arranged on the two sides of the shell, a carrier is placed between the movable seat and the supporting seat, the movable seat comprises a base installed on the shell and an abutting seat movably connected with the base, and the abutting seat is arranged in the shell. Wherein the abutting seat is used for selectively abutting against the carrier through movement so that the carrier can be closed through the movable seat and the supporting seat, one of the supporting seat and the movable seat is provided with an air inlet channel, and the other one of the supporting seat and the movable seat is provided with an air outlet channel; and the gas inlet channel and the gas outlet channel are used for introducing process gas into the carrier. In this way, the uniformity of film coating can be improved.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to a deposition system. Background Art

[0002] In the semiconductor field, film deposition, i.e., coating, can be performed on the surface of a substrate by vapor deposition or atomic layer deposition. In related technologies, coating equipment generally includes an outer cavity and an inner cavity. The outer cavity is used to accommodate components such as heaters, and the inner cavity is used to hold carriers and allow process gases to circulate. However, the flow direction of the process gas in the inner cavity is generally in the length direction of the equipment, and the process gas is diffused and circulated throughout the inner cavity. The concentration of the process gas will vary along the length of its flow direction. The concentration of the process gas decreases at the position where it passes later, and the coating thickness at this position is thinner, resulting in uneven coating. Utility Model Content

[0003] The embodiments of the present application provide a deposition system that can improve the uniformity of the coating.

[0004] An embodiment of the present application provides a deposition system. The deposition system includes a housing, a support seat, and a movable seat. The support seat is arranged in the housing, and the support seat is used to support a carrier. The movable seat is arranged in the housing, and the movable seat and the support seat are relatively arranged on both sides of the housing. The space between the movable seat and the support seat is used for placing the carrier. The movable seat includes a base installed on the housing and an abutment seat movably connected to the base, and the abutment seat is arranged in the housing. Among them, the abutment seat is used to abut with the carrier through movable selective contact to close the carrier through the movable seat and the support seat. One of the support seat and the movable seat is provided with an air inlet channel, and the other is provided with an air outlet channel; the air inlet channel and the air outlet channel are used to introduce process gas into the carrier.

[0005] Optionally, the base is arranged on the outer periphery of the shell, the abutment seat is connected to the base through a connecting piece passing through the shell, the abutment seat is provided with an air inlet channel, and the support seat is provided with an air outlet channel.

[0006] Optionally, a spray plate and a flow equalizer are sequentially provided on one side of the abutting seat close to the supporting seat, and a flow equalizer is also provided on one side of the supporting seat close to the abutting seat.

[0007] Optionally, the support seat, the abutting seat and the carrier are surrounded to form a process cavity, and the air inlet channel and the air outlet channel are respectively connected to the process cavity.

[0008] Optionally, the deposition system further includes a heating element, which is disposed on a peripheral side wall of the shell and surrounds the carrier.

[0009] Optionally, a heating element is provided between the abutting seat and the side wall of the shell, and the heating element is passed through the supporting seat.

[0010] Optionally, a plurality of movable seats are provided along the length direction of the housing.

[0011] Optionally, the plurality of movable seats are arranged in the length direction of the shell, the plurality of movable seats are arranged corresponding to one carrier, and the length direction of the carrier is consistent with the length direction of the shell.

[0012] Optionally, the plurality of movable seats are arranged in the length direction of the shell, the plurality of carriers are arranged on the support seat, and the plurality of movable seats and the plurality of carriers are respectively provided correspondingly.

[0013] Optionally, the deposition system further includes a gas cabinet and an exhaust device, the gas cabinet is connected to the air inlet channel, the exhaust device is connected to the air outlet pipe, and the exhaust device is also connected to the interior of the shell through a pipe parallel to the air inlet channel.

[0014] Optionally, the deposition system further includes a door body installed at one end of the shell, the door body is embedded with a heating element, and the door body also has a first channel connected to the interior of the shell; the other end of the shell opposite to the door body has a second channel connected to the interior of the shell.

[0015] The beneficial effects of the present application are as follows: by providing a support seat, the carrier can be supported; by providing a movable seat, the abutment seat can be retracted by the movement of the abutment seat. In this case, the carrier can be placed into the shell, or the carrier in the shell can be taken out. By providing a movable seat, the abutment seat can also be moved to abut against the carrier, thereby closing the carrier. In this case, the support seat, the abutment seat and the side walls of the carrier itself can form a closed process space for process gas to pass through. An air inlet channel and an air outlet channel are also provided in the support seat and the movable seat, so that the process gas can be directly introduced into the carrier through the support seat and the movable seat without being diffused in the entire shell. In this way, the process gas can be introduced into the carrier in a concentrated manner, reducing the difference in process gas concentration, which is beneficial to improving the uniformity of the coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a structural schematic diagram of a deposition device in the related art;

[0017] Figure 2 is a schematic cross-sectional view of the deposition system of the present application along the length direction;

[0018] Figure 3 is a schematic cross-sectional view of the deposition system of the present application along the width direction;

[0019] Figure 4 yes Figure 3 The diagram shows the structure of the abutment seat of the deposition system abutting against the carrier.

[0020] Reference numerals:

[0021] Deposition system, 1; housing, 11; support seat, 12; gas outlet channel, 121; movable seat, 13; base, 131; abutment seat, 132; gas inlet channel, 1321; spray plate, 14; flow plate, 15; heating element, 16; gas cabinet, 17; exhaust device, 18; door, 19;

[0022] Vehicle, 20. DETAILED DESCRIPTION

[0023] The following will be combined with the drawings in the embodiments of this application to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the embodiments described are only part of the embodiments of this application, not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of this application.

[0024] Combine Figure 1 The deposition equipment usually has inner and outer multi-layer pipes, and a heat-conducting space is formed between the outer pipe B and the inner pipe A, also known as the outer cavity, which can be used to install a heating device, a preheating device or a cooling device, etc. The inner cavity formed by the inner pipe A is used to accommodate the carrier C, and the process gas can pass through the inner pipe A from beginning to end along the axial direction of the inner pipe A, that is, the length direction of the equipment, so that the process gas can be filled in the carrier C, and the coating is achieved when the process temperature or other process conditions are met. In the related art, in order to increase production capacity and reduce costs, multiple stations are usually formed in the axial direction of the inner pipe A, that is, in the length direction of the equipment, and multiple carriers are arranged, and the process gas flows through each station in the length direction. In this case, the concentration of the process gas at different stations will gradually decrease in the direction of gas flow, resulting in uneven coating. For example, in the case of an atomic layer deposition equipment with 8 stations, the film thickness unevenness between the first and second stations is 1-2%, and the film thickness unevenness between the first and eighth stations can reach 7-8%. The uniformity of the coating is expressed as a percentage of film thickness nonuniformity. The calculation formula is: Film thickness nonuniformity = (maximum film thickness - minimum film thickness) / (maximum film thickness + minimum film thickness) * 100%. Alternatively, film thickness nonuniformity = (maximum film thickness - minimum film thickness) / (average film thickness * 2) * 100%. The larger the percentage, the more nonuniform the surface film thickness.

[0025] In order to improve the above technical problems, the present application may provide the following embodiments.

[0026] Combine Figures 2 to 4, an embodiment of the present application provides a deposition system 1. The deposition system 1 includes a shell 11, a support seat 12 and a movable seat 13. The shell 11 can provide mechanical support for the various components of the deposition system 1 and protect the various components. The support seat 12 is arranged in the shell 11, and the support seat 12 is used to support the carrier 20. The movable seat 13 is arranged in the shell 11, and the movable seat 13 and the support seat 12 are relatively arranged on both sides of the shell 11. Optionally, the shell 11 is arranged in a cylindrical shape. The cross-section of the shell 11 can be square or circular, which is not specifically limited here.

[0027] In some embodiments, the spacing direction between the movable seat 13 and the support seat 12 is perpendicular to the axial direction of the shell 11 (i.e., the length direction of the device). In some embodiments, the shell 11 is provided with an opening at one or both ends in the axial direction, so as to provide for the taking and placement of the carrier 20 and the entry and extraction of gas. The movable seat 13 and the support seat 12 are spaced apart in the direction of gravity. The support seat 12 can be provided in the lower part of the shell 11 in the direction of gravity, and the movable seat 13 can be provided in the upper part of the shell 11 in the direction of gravity. The carrier 20 can be placed between the movable seat 13 and the support seat 12.

[0028] The movable seat 13 includes a base 131 mounted on the housing 11 and an abutment seat 132 movably connected to the base 131. The abutment seat 132 is disposed within the housing 11. The abutment seat 132 is configured to selectively abut against the carrier 20 through movement, thereby enclosing the carrier 20 through the movable seat 13 and the support seat 12. Specifically, in some embodiments, the support seat 12, the abutment seat 132, and the carrier 20 enclose a process chamber, and the air inlet channel 1321 and the air outlet channel 121 are respectively connected to the process chamber.

[0029] Combine Figure 4 After the carrier 20 is placed on the support base 12, the abutment seat 132 can be rotated or moved to abut against the carrier 20, covering the top of the carrier 20, while the support base 12 can seal the bottom of the carrier 20. Combined with the side walls of the carrier 20 itself, the internal space of the carrier 20 can be sealed. Through the carrier 20 itself, the support base 12 and the abutment seat 132, a process cavity can be naturally enclosed inside the carrier 20. When the carrier 20 needs to be removed, the abutment seat 132 can be moved away from the carrier 20, and the carrier 20 can be removed from the support base 12.

[0030] Furthermore, one of the support base 12 and the movable base 13 is provided with an air inlet channel 1321, and the other is provided with an air outlet channel 121; the air inlet channel 1321 and the air outlet channel 121 are used to introduce process gas into the carrier 20. The support base 12 and the movable base 13 can separate the interior of the carrier 20 from the interior of the housing 11. At the same time, the air inlet and air outlet provided on the support base 12 and the movable base 13 respectively allow the process gas to be directly introduced into the carrier 20, reducing the concentration loss of the process gas during the conduction process.

[0031] Furthermore, in the deposition system 1 of the present application, a plurality of carriers 20 can be arranged on the support seat 12 to form a plurality of workstations, but the arrangement direction of the plurality of carriers 20 is along the length direction of the housing 11. Among them, a carrier 20 can also include a plurality of carrier boats, that is, a carrier 20 provided as an integral part can have a plurality of workstations. The carrier boats can be stacked in two or more layers in the height direction to form a plurality of workstations in the height direction, but due to the air intake method of the embodiment of the present application, the stacking in the height direction should not be too high, for example, the number of stacked layers in the height direction is less than three layers. The carrier boats can be arranged in a plurality in the length direction to form a plurality of workstations, and due to the air intake method of the embodiment of the present application, the number of arranged carrier boats in the length direction has little effect on the coating unevenness. Optionally, the carrier 20 can also be stacked in two or three layers in the height direction. The carrier 20 can also be arranged in a plurality in the length direction.

[0032] The spacing between the support base 12 and the movable base 13 is perpendicular to the arrangement of the carriers 20. This arrangement allows process gas to be introduced into the carriers 20 via the support base 12 and the movable base 13, so the distance along which the gas flows is no longer related to the number of carriers 20 arranged. The process gas flow path is maintained at a substantially uniform distance at the height of the carriers 20. This reduces the impact of the number of carriers 20 on the concentration of the process gas, thereby improving the uniformity of the coating.

[0033] In some embodiments, the base 131 is arranged on the outer periphery of the shell 11, and the abutment seat 132 is connected to the base 131 by a connecting piece passing through the shell 11. The abutment seat 132 is provided with an air inlet channel 1321, and the support seat 12 is provided with an air outlet channel 121. The base 131 can be provided with a driving device such as a motor or a cylinder. The base 131 can control the movement of the abutment seat 132 through the connecting piece, so that the abutment seat 132 can abut with or leave the carrier 20. Specifically, in some embodiments, an elastic piece is further provided on the connecting piece between the abutment seat 132 and the base 131, and the base 131 controls the movement of the abutment seat 132. Under the action of the elastic piece, the abutment seat 132 is in close contact with the carrier 20.

[0034] Since the outlet channel 121 is used to extract the gas, when its position and number are determined, factors such as whether the component with the outlet channel 121 is integrated or split have little effect on the concentration of the process gas. However, the inlet channel 1321 involves the diffusion of the process gas, and the distances between different channels and the gas source are different, so the inlet channel 1321 has a greater impact on the concentration of the process gas. Based on the above reasons, it is more appropriate to use the support seat 12 that is set in the shell 11 and does not need to be movable or frequently disassembled, and can be stably placed in the shell 11 as the outlet channel 121. It is more appropriate to use the movable seat 13 that needs to be movable, is not too long, and can be easily split or improved in other structures as the inlet channel 1321.

[0035] In some embodiments, a spray plate 14 and a flow equalizer plate are sequentially provided on the side of the abutment seat 132 close to the support seat 12 (the flow equalizer plate of the abutment seat 132 is not shown), and a flow equalizer plate 15 is also provided on the side of the support seat 12 close to the abutment seat 132. The provision of the spray plate 14 and the flow equalizer plate 15 can optimize the uniformity of gas flow, allowing the process gas to flow more evenly through the interior of the carrier 20.

[0036] In some embodiments, the deposition system 1 further includes a heater 16 disposed on a peripheral sidewall of the housing 11 and surrounding the carrier 20. The heater 16 can heat the carrier 20 to a predetermined process temperature, thereby satisfying corresponding process conditions.

[0037] In some embodiments, a heating element 16 is provided between the abutment seat 132 and the side wall of the outer shell 11, and a heating element 16 is provided inside the support seat 12. In other words, the heating element 16 is not provided between the carrier 20 and the abutment seat 132, nor is it provided between the carrier 20 and the support seat 12. The heating element 16 can be provided around the carrier 20, the support seat 12 and the abutment seat 132 to heat the carrier 20. Different from the solutions in the related art, the heating element 16 in the present application can be directly provided in the outer shell 11 to directly heat the carrier 20. Compared with the related art, the method of heating outside the inner tube reduces the obstruction of the inner tube and reduces heat loss.

[0038] In some embodiments, multiple movable seats 13 are provided along the length of the housing 11. Multiple movable seats 13 can correspond to one or more carriers 20. If only one movable seat 13 is provided, and multiple carriers 20 are connected in series along the length, a single movable seat 13 that is too long can complicate manufacturing and easily bend and deform, resulting in poor sealing.

[0039] On the other hand, by setting up multiple movable seats 13, the air intake of the carrier 20 can be independently realized through multiple movable seats 13, so that the distance between different parts of the carrier 20 and the gas source is more uniform, reducing the concentration unevenness problem caused by the long diffusion path of the process gas in one movable seat 13.

[0040] In some embodiments, multiple movable seats 13 are arranged along the length of the housing 11, with each movable seat 13 corresponding to a carrier 20. The length of the carrier 20 coincides with the length of the housing 11, and multiple substrate-carrying positions are provided within the carrier 20 along the length, forming multiple workstations. By arranging multiple movable seats 13 corresponding to one or more stacked carriers 20, the intake air of the carrier 20 can be evenly distributed along the length, further reducing the problem of uneven concentration of process gases caused by an excessively long diffusion path.

[0041] In some embodiments, multiple movable seats 13 are arranged in the longitudinal direction of the housing 11, and multiple carriers 20 are arranged on the support base 12. The multiple movable seats 13 are respectively provided corresponding to the multiple carriers 20. For example, three movable seats 13 can be provided corresponding to four carriers 20, or four movable seats 13 can be provided corresponding to three carriers 20.

[0042] Furthermore, in some embodiments, multiple movable seats 13 are arranged along the length of the housing 11, and multiple carriers 20 are arranged on the support base 12, with the multiple movable seats 13 corresponding one-to-one with the multiple carriers 20. This one-to-one correspondence between the movable seats 13 and the carriers 20 can further isolate the processes between different carriers 20, allowing each carrier 20 to receive process gas independently through its corresponding movable seat 13. This one-to-one correspondence between the movable seats 13 and the carriers 20 can also ensure a tight seal after the abutment seat 132 abuts the carrier 20.

[0043] In some embodiments, combined Figure 2 The deposition system 1 further includes a gas cabinet 17 and a gas extraction device 18. The gas cabinet 17 is connected to the gas inlet channel 1321, and the gas extraction device 18 is connected to the gas outlet pipe. The gas extraction device 18 is also connected to the interior of the housing 11 through a pipe connected in parallel with the gas inlet channel 1321. The gas cabinet 17 can sufficiently pass the process gas into the carrier 20 through the gas inlet pipe (gas inlet channel 1321). On the one hand, the gas extraction device 18 provides negative pressure so that the process gas can circulate sufficiently in the carrier 20. On the other hand, the gas extraction device 18 can also evacuate the internal space of the housing 11 at the beginning of the process stage, so that the vacuum degree in the housing 11 meets the process requirements.

[0044] In some embodiments, deposition system 1 further includes a door 19 mounted at one end of housing 11, with heater 16 embedded therein. Door 19 further defines a first passage (not shown) communicating with the interior of housing 11; a second passage (not shown) communicating with the interior of housing 11 is defined at the other end of housing 11, opposite door 19. The provision of the first and second passages allows for the introduction of an inert process gas, such as nitrogen or argon, into housing 11, thereby purging the interior of housing 11 during the process or breaking the vacuum after the process is complete.

[0045] In summary, the support seat 12 can support the carrier 20. The movable seat 13 allows the abutment seat 132 to be retracted by moving the abutment seat 132. In this case, the carrier 20 can be placed into the housing 11, or the carrier 20 in the housing 11 can be removed. The movable seat 13 also allows the abutment seat 132 to abut against the carrier 20 by moving the abutment seat 132, thereby sealing the carrier 20. In this case, the support seat 12, the abutment seat 132, and the sidewalls of the carrier 20 itself can form a sealed process chamber for process gas to pass through. The support seat 12 and the movable seat 13 are also provided with an inlet channel 1321 and an outlet channel 121, allowing process gas to pass directly through the support seat 12 and the movable seat 13 into the carrier 20 without having to be dispersed throughout the housing 11. In this way, the process gas can be introduced into the carrier 20 in a concentrated manner, reducing differences in process gas concentration and facilitating improved coating uniformity.

[0046] The above are merely embodiments of the present application and are not intended to limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A deposition system, characterized in that: include: shell; A support base is provided in the housing and is used to support the carrier; a movable seat, disposed on the housing, wherein the movable seat and the support seat are disposed on opposite sides of the housing, and the carrier is placed between the movable seat and the support seat. The movable seat includes a base mounted on the housing and an abutment seat movably connected to the base, and the abutment seat is disposed within the housing; Among them, the abutment seat is used to abut with the carrier through movable selectiveness to selectively close the carrier through the movable seat and the support seat, one of the support seat and the movable seat is provided with an air inlet channel, and the other is provided with an air outlet channel; the air inlet channel and the air outlet channel are used to introduce process gas into the carrier.

2. The deposition system according to claim 1, wherein: The base is arranged on the outer periphery of the shell, the abutting seat is connected to the base by a connecting piece passing through the shell in the shell, the abutting seat is provided with the air inlet channel, and the supporting seat is provided with the air outlet channel.

3. The deposition system according to claim 1, wherein: A spray plate and a flow equalizer are sequentially provided on one side of the abutting seat close to the supporting seat, and a flow equalizer is further provided on one side of the supporting seat close to the abutting seat.

4. The deposition system according to claim 1, wherein: The supporting seat, the abutting seat and the carrier are surrounded to form a process cavity, and the air inlet channel and the air outlet channel are respectively communicated with the process cavity.

5. The deposition system according to claim 1, wherein: The deposition system further includes a heating element, which is disposed on a peripheral side wall of the housing and surrounds the carrier.

6. The deposition system according to claim 5, wherein: The heating element is arranged between the abutting seat and the side wall of the shell, and the heating element is passed through the supporting seat.

7. The deposition system according to any one of claims 1 to 6, characterized in that: A plurality of movable seats are provided along the length direction of the shell.

8. The deposition system according to claim 7, wherein: The plurality of movable seats are arranged in the length direction of the shell, and the plurality of movable seats are provided corresponding to one carrier, and the length direction of the carrier is consistent with the length direction of the shell.

9. The deposition system according to claim 7, wherein: The plurality of movable seats are arranged in the longitudinal direction of the shell, the plurality of carriers are arranged on the support seat, and the plurality of movable seats and the plurality of carriers are respectively arranged correspondingly.

10. The deposition system according to claim 1, wherein: The deposition system further includes a gas cabinet and an exhaust device, wherein the gas cabinet is connected to the air inlet channel, the exhaust device is connected to the air outlet channel, and the exhaust device is further connected to the interior of the shell through a pipeline connected in parallel with the air inlet channel.

11. The deposition system according to claim 1, wherein: The deposition system also includes a door body installed at one end of the shell, the door body is embedded with a heating element, and the door body also has a first channel connected to the interior of the shell; the other end of the shell opposite to the door body has a second channel connected to the interior of the shell.

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