Lamp box structure

Abstract

The utility model provides a lamp box structure which comprises a shell, a light source assembly, a light condensation structure, a first gas distribution part, a second gas distribution part and a heating table, and the light source assembly is fixed to the top of the shell; the condensation structure is located on a light path of light emitted by the light source assembly and connected with the shell. The first gas distribution part is located on a light path of light emitted by the light source assembly and is in sealed connection with the shell. The second gas distribution part is located on a light path of the light penetrating through the first gas distribution part and is in sealed connection with the shell; the heating table is located on the light path of the light penetrating through the second gas distribution part and is spaced from the condensation structure by a preset distance. According to the utility model, the light condensation structure is arranged above the first gas distribution part, so that the treatment effect of an ultraviolet light treatment process is improved, and meanwhile, the treatment degree of the ultraviolet light treatment process and the flatness of a film layer can be adjusted by adjusting the light condensation structure.

Description

Technical Field

[0001] The utility model belongs to the field of semiconductor integrated circuit manufacturing and relates to a light box structure. Background Art

[0002] In the field of chemical vapor deposition (CVD) in integrated circuit manufacturing, it is very important to use ultraviolet light to treat the deposited film layer based on the bond breaking reaction of the reactants under the ultraviolet light band. For example, the bond breaking of the pore former in the BDⅡ process (manufacturing process of Black Diamond II nanoporous low dielectric constant film), the Si-H bond breaking in SiN in the CESL (contact etch barrier layer strain layer) process, and the curing of the film layer in FCVD (flow chemical vapor deposition) all require the use of ultraviolet light for bond breaking. The core component of the ultraviolet light treatment in the deposition chamber is the ultraviolet lamp box, and its optical path structure is as follows: Figure 1 As shown, it includes a housing 01, a light source 02, a quartz window 03, an upper gas shower head 04, a lower gas shower head 05, a heating platform 06, and a wafer 061. However, after being processed by a UV lamp box with this optical path, the film thickness is relatively thick, the density and flatness of the film are also poor, the quality of the processed film is relatively poor, and the degree of processing of the deposited film is difficult to control.

[0003] Therefore, there is an urgent need to find a light box structure that can control the degree of ultraviolet light treatment of the deposited film layer and improve the quality of the film layer. Utility Model Content

[0004] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a light box structure for solving the problems in the prior art that the film quality after ultraviolet light treatment of the ultraviolet light box is poor and the degree of ultraviolet light treatment is difficult to control.

[0005] To achieve the above-mentioned and other related purposes, the present invention provides a light box structure, comprising:

[0006] case;

[0007] A light source assembly is fixed to the top of the housing;

[0008] A light-collecting structure, located on the optical path of the light emitted by the light source assembly and connected to the housing;

[0009] a first gas distribution portion, located on the optical path of the light focused by the light focusing structure and sealedly connected to the housing;

[0010] a second gas distribution portion, located on an optical path of light passing through the first gas distribution portion and sealedly connected to the housing;

[0011] The heating platform is located on the optical path of the light passing through the second gas distribution portion and is spaced apart from the light focusing structure by a preset distance.

[0012] Optionally, the light-focusing structure is fixedly connected to the housing.

[0013] Optionally, the light-focusing structure is sealed to the housing.

[0014] Optionally, a light-transmitting window fixed on the shell and spaced a preset distance from the light-concentrating structure is provided below the light-concentrating structure, the light-transmitting window is sealed to the shell, and the light-transmitting window is located above the first gas distribution portion.

[0015] Optionally, the light-focusing structure and the housing are sealed and movably connected.

[0016] Optionally, the moving distance of the light-focusing structure ranges from 0.1 cm to 8 cm.

[0017] Optionally, the light-concentrating structure is movably connected to the shell, and a light-transmitting window fixed on the shell and spaced a preset distance from the light-concentrating structure is provided below the light-concentrating structure, and the light-transmitting window is sealed to the shell.

[0018] Optionally, the focusing structure includes one of a convex lens and an optical assembly.

[0019] Optionally, the focusing structure is a convex lens, the distance between the focusing structure and the heating platform is less than one focal length of the focusing structure, and the size of the maximum light spot focused by the focusing structure on the heating platform is not less than the size of the wafer to be processed.

[0020] Optionally, the light-concentrating structure can withstand a temperature of not less than 450°C.

[0021] As described above, the light box structure of the present invention, by providing a focusing structure between the light source assembly and the first gas distribution section, converges the optical path of the ultraviolet light emitted by the light source assembly and forms a light spot of a preset size on the heating table. This reduces ultraviolet light loss, improves the distribution of light, and enhances the density and flatness of the treated film layer, thereby enhancing the ultraviolet light treatment effect and improving the quality of the treated film layer. In addition, by adjusting the focusing structure or the distance between the focusing structure and the heating table, the size of the light spot on the heating table can be adjusted to control the distribution of ultraviolet light, thereby achieving control over the degree of ultraviolet light treatment of the deposited film layer and the flatness after treatment, thus having high industrial application value. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 Shown is a diagram of the UV light box structure.

[0023] Figures 2 to 7 Several structural schematic diagrams of the light box structure of the present invention are respectively shown.

[0024] Explanation of Figure Numbers

[0025] 01 Housing

[0026] 02 Light Source

[0027] 03 Quartz Window

[0028] 04 Upper gas distribution head

[0029] 05 Lower gas distribution head

[0030] 06 Heating table

[0031] 061 Wafer

[0032] 1 Housing

[0033] 2 Light source components

[0034] 3 Focusing structure

[0035] 31 Convex lens

[0036] 32 Optical components

[0037] 4. First gas distribution unit

[0038] 5 Second gas distribution unit

[0039] 6 Heating table

[0040] 7 wafers

[0041] 8 light-transmitting windows DETAILED DESCRIPTION

[0042] The following describes the embodiments of the present invention through specific examples. Those skilled in the art will readily understand the other advantages and benefits of the present invention from the disclosure herein. The present invention may also be implemented or applied through various other specific embodiments, and the details in this specification may be modified or altered based on different perspectives and applications without departing from the spirit of the present invention.

[0043] See also Figures 2 to 7 It should be noted that the illustrations provided in this embodiment are merely schematic illustrations of the basic concept of the present invention. Therefore, the illustrations only show components relevant to the present invention and are not drawn according to the number, shape, and size of components in actual implementation. In actual implementation, the type, quantity, and proportion of each component may be arbitrarily changed, and the component layout may also be more complex.

[0044] This embodiment provides a light box structure, such as Figures 2 to 7 The figures show several structural schematic diagrams of the light box structure, including a shell 1, a light source assembly 2, a focusing structure 3, a first gas distribution part 4, a second gas distribution part 5 and a heating platform 6, wherein the light source assembly 2 is fixed to the top of the shell 1; the focusing structure 3 is located on the optical path of the light emitted by the light source assembly 2 and is connected to the shell 1; the first gas distribution part 4 is located on the optical path of the light emitted by the light source assembly 2 and is sealed with the shell 1; the second gas distribution part 5 is located on the optical path of the light passing through the first gas distribution part 4 and is sealed with the shell 1; the heating platform 6 is located on the optical path of the light passing through the second gas distribution part 5 and is spaced a preset distance from the focusing structure 3.

[0045] Specifically, the housing 1 is usually used as a support body for components that need to be supported in a light box. The material, size and shape of the housing 1 can be selected according to actual conditions.

[0046] Specifically, the light source assembly 2 is used to generate light directed toward the heating stage 6 . For example, the ultraviolet light generated by the light source assembly 2 can be used in a BDII process, an FCVD process, or a CESL process.

[0047] It should be noted that the ultraviolet light emitted from the light source component 2 generally propagates in the direction toward the heating table 6, and it is usually a relatively complex component that generates ultraviolet light. Its specific internal structure will not be described here; the size of the light source component 2 and the wavelength of the light generated can be selected according to actual conditions and are not restricted here.

[0048] As an example, the light-focusing structure 3 includes a convex lens, an optical assembly, or other suitable light-focusing structures or devices.

[0049] Specifically, the focusing structure 3 is used to focus the light generated by the light source assembly 2 and form a light spot of a preset size on the heating platform 6 .

[0050] As an example, the focusing structure 3 is a convex lens 31 , the distance between the focusing structure 3 and the heating platform 6 is less than one focal length of the focusing structure 3 , and the size of the maximum light spot focused by the focusing structure 3 on the heating platform 6 is not less than the size of the wafer 7 to be processed.

[0051] It should be noted that the relationship between the curvature radius of the lens, the thickness of the lens and the focal length of the lens is usually Wherein, f is the focal length of the lens, n is the refractive index of the lens material, R1 is the curvature radius of one side of the lens, R2 is the curvature radius of the other side of the lens, and d is the thickness of the lens. When the focusing structure 3 is a convex lens 31, the relationship between the focal length of the convex lens 31, the diameter of the convex lens 31, the diameter of the light spot on the heating stage 6, and the distance from the convex lens 31 to the heating stage 6 is: (D is the diameter of the convex lens 31, f is the focal length of the convex lens 31, s is the distance from the convex lens 31 to the heating platform 6, and h is the diameter of the light spot on the heating platform 6). The curvature of the convex lens 31 can then be determined based on the distance between the focusing structure 3 and the heating platform 6 and the size of the wafer 7 to be processed.

[0052] Specifically, when the focusing structure 3 is a convex lens 31 , the distance between the convex lens 31 and the heating stage 6 is within one focal length of the convex lens 31 , so as to minimize the light loss received by the wafer 7 on the heating stage 6 .

[0053] Specifically, when the focusing structure 3 is a convex lens 31, the maximum size of the light spot gathered by the convex lens 31 on the heating platform 6 is made larger than the size of the wafer 7 to be processed, so as to ensure that each area of ​​the wafer 7 to be processed can be irradiated by the ultraviolet light generated by the light source assembly 2, thereby facilitating the control of the processing effect of the wafer 7.

[0054] As an example, the light-concentrating structure 3 is fixedly connected to the housing 1, that is, the light-concentrating structure 3 is fixed on the housing 1, such as Figure 2 and Figure 3 shown.

[0055] Specifically, by fixing the focusing structure 3 on the housing 1, the divergent light path of the light source assembly 2 toward the heating platform 6 is converged, thereby reducing light loss, improving light utilization, and improving the ultraviolet light processing effect.

[0056] As an example, the light-concentrating structure 3 is sealed to the housing 1, that is, the light-concentrating structure 3 is fixed and forms a cavity with the first gas distribution part 4 and the housing 1 between the light-concentrating structure 3 and the first gas distribution part 4, and the gas in the cavity can only flow downward from the gas spray port in the first gas distribution part 4. The specific structure is as follows Figure 2 shown.

[0057] Specifically, by sealing and fixing the light-concentrating structure 3 and the housing 1 , it is possible to prevent the gas distributed by the first gas distribution portion 4 from escaping from the contact point between the light-concentrating structure 3 and the housing 1 .

[0058] As an example, a light-transmitting window 8 is provided below the light-concentrating structure 3 and is fixed to the housing 1 and spaced a preset distance from the light-concentrating structure 3. The light-transmitting window 8 is sealed to the housing 1 and is located above the first gas distribution portion 4. The specific structure is as follows: Figure 3 shown.

[0059] Specifically, a light-transmitting window 8 is provided below the light-focusing structure 3, and the light-transmitting window 8 is located above the first gas distribution part 4 and is sealed with the shell 1. Then, the light-transmitting window 8, the first gas distribution part 4 and the shell 1 between the first gas distribution part 4 and the light-transmitting window 8 form a cavity, and the gas in the cavity can only flow downward from the gas spray port in the first gas distribution part 4. There is no need to require a sealed connection between the light-focusing structure 3 and the shell 1. The light-focusing structure 3 only needs to be fixed to the shell 1, thereby reducing the difficulty of assembling the light-focusing structure 3 and the shell 1.

[0060] It should be noted that, usually, the heating platform 6 can move up and down in the direction of the light directed toward the heating platform 6. When the focusing structure 3 is fixed on the shell 1 and is a convex lens 31, while ensuring that the distance between the focusing structure 3 and the heating platform 6 is within 1 times the focal length of the focusing structure 3, by adjusting the distance between the heating platform 6 and the focusing structure 3, the size of the light spot on the heating platform 6 can be adjusted to suit the corresponding wafer 7 size. At the same time, the distribution of ultraviolet light can be adjusted to improve the film processing effect on the surface of the wafer 7.

[0061] As an example, the light-focusing structure 3 and the housing 1 are sealed and movably connected.

[0062] Specifically, since the focusing structure 3 and the shell 1 are sealed and movably connected, a cavity is formed between the focusing structure 3, the first gas distribution part 4 and the shell 1, and the gas in the cavity can only flow downward from the gas spray port in the first gas distribution part 4.

[0063] Specifically, the focusing structure 3 moves up and down in the direction in which the light is directed toward the heating platform 6. When the focusing structure 3 is a convex lens 31, the size of the upper light spot focused by the focusing structure 3 on the heating platform 6 can be adjusted by moving the focusing structure 3 up and down, and the minimum size of the light spot focused by the focusing structure 3 on the heating platform 6 is smaller than the size of the wafer 7 located on the heating platform 6, and the maximum size is larger than the size of the wafer 7 located on the heating platform 6. The specific structure is as follows: Figure 4 shown.

[0064] Specifically, when the focusing structure 3 is a convex lens 31, the distance between the focusing structure 3 and the heating platform 6 needs to be less than 1 times the focal length of the lens, so that the size of the light spot focused by the focusing structure 3 on the heating platform 6 decreases as the distance between the focusing structure 3 and the heating platform 6 increases.

[0065] Specifically, when the focusing structure 3 is a convex lens 31 , the size of the light spot on the heating platform 6 can be controlled in a wider range by coordinating the movement between the focusing structure 3 and the heating platform 6 .

[0066] It should be noted that the manner of achieving sealing and movable connection between the focusing structure 3 and the housing 1 is related to the internal structure of the light box and the sealing process, and is not limited here.

[0067] As an example, the distance that the focusing structure 3 moves ranges from 0.1 cm to 8 cm. For example, it can be 0.1 cm, 0.5 cm, 1 cm, 3 cm, 5 cm, 7 cm, or 8 cm. The movement here refers to the movement in the direction from the focusing structure 3 to the heating platform 6.

[0068] Specifically, when the focusing structure 3 is a convex lens 31, since the distance between the focusing structure 3 and the heating platform 6 needs to be within 1 times the focal length of the focusing structure 3, by limiting the moving range of the focusing structure 3 to the range of 0.1 cm to 8 cm, the size of the light spot focused by the focusing structure 3 on the heating platform 6 can be regulated while minimizing the impact of the introduction of the focusing structure 3 on the size of the light box structure.

[0069] Specifically, when the focusing structure 3 is an optical assembly 32, it can be a combination of a concave lens and a convex lens. Usually, the optical assembly 32 is usually a complex optical system. It can adjust the ultraviolet light irradiation range by adjusting its own height and the height of the heating platform 6, so that the spot size irradiated on the heating platform 6 can be adjusted according to actual needs. It can also adjust the spot size irradiated on the heating platform 6 according to actual needs by moving its components. The distance between it and the heating platform 6 and the range of movement do not need to be limited by curvature, the adjustable range is larger, and the light loss can be minimized by regulation. The specific structure is as follows Figure 6 shown.

[0070] It should be noted that, if the space in the light box or the size of the light box allows, the moving distance of the focusing structure 3 may also be other appropriate values.

[0071] As an example, the light-concentrating structure 3 is movably connected to the housing 1. A light-transmitting window 8 is fixed to the housing 1 and spaced a preset distance from the light-concentrating structure 3 below the light-concentrating structure 3. The light-transmitting window 8 is sealed to the housing 1. The specific structure is as follows: Figure 5 and Figure 7 shown.

[0072] Specifically, when a light-transmitting window 8 is provided under the focusing structure 3, when the focusing structure 3 and the shell 1 are movable, the light-transmitting window 8 and the shell 1 can be fixed and sealed, and then there is no need for a sealed connection between the focusing structure 3 and the shell 1, thereby reducing the difficulty of the connection process between the focusing structure 3 and the shell 1.

[0073] It should be noted that when a light-transmitting window 8 is provided below the light-concentrating structure 3, the light-transmitting window 8 needs to be made of a highly transparent material to reduce the loss of ultraviolet light passing through the light-transmitting window 8. At the same time, since the light-transmitting window 8 needs to work in a high-temperature environment, the light-transmitting window 8 also needs to have high-temperature resistance. Generally, the temperature resistance of the light-transmitting window 8 should not be lower than 450°C. A light-transmitting window 8 with other temperature resistances can also be selected according to actual process requirements. The material, size, shape and thickness of the light-transmitting window 8 can be selected according to actual process requirements and are not limited here. Preferably, the material of the light-transmitting window 8 is quartz with high light transmittance and a temperature resistance of not less than 450°C.

[0074] As an example, the light-concentrating structure 3 can withstand a temperature no lower than 450°C.

[0075] Specifically, since the focusing structure 3 usually needs to work in a relatively high temperature environment and it needs to have high light transmittance to prevent the loss of ultraviolet light, when the tolerance temperature of the focusing structure 3 is low, the light transmittance of the focusing structure 3 will be affected, thereby affecting the focusing effect of the focusing structure 3.

[0076] Specifically, the first gas distribution part 4 is provided with a plurality of first gas distribution holes distributed in an array. Under the premise of ensuring the uniformity of the gas distribution flowing downward from the first gas distribution part 4, the size and shape of the first gas distribution part 4 can be selected according to actual conditions; the arrangement, number, size and shape of the first gas distribution holes in the first gas distribution part 4 can be selected according to actual conditions.

[0077] Specifically, the second gas distribution part 5 is provided with a plurality of second gas distribution holes distributed in an array. Under the premise of ensuring the uniformity of the gas distribution flowing out of the second gas distribution part 5 to the heating table 6, the size and shape of the second gas distribution part 5 can be selected according to actual conditions; the arrangement, number, size and shape of the second gas distribution holes in the second gas distribution part 5 can be selected according to actual conditions.

[0078] It should be noted that the ultraviolet light emitted by the light source assembly 2 needs to pass through the first gas distribution part 4 and the second gas distribution part 5 to reach the heating platform 6, and the first gas distribution part 4 and the second gas distribution part 5 need to work in a high-temperature environment. They also need to have high transmittance and high-temperature resistance to reduce the loss of ultraviolet light emitted by the light source assembly 2, while ensuring the light transmittance of the first gas distribution part 4 and the second gas distribution part 5.

[0079] Specifically, while ensuring the UV treatment effect, the material of the first gas distribution section 4 can be selected based on actual conditions; the material of the second gas distribution section 5 can also be selected based on actual conditions. Preferably, the first gas distribution section 4 is made of highly permeable quartz, and the second gas distribution section 5 is also made of highly permeable quartz, and the first gas distribution section 4 and the second gas distribution section 5 are temperature-resistant to no less than 450°C.

[0080] Specifically, the light box structure is further provided with a first pipeline and a second pipeline. The first pipeline introduces gas into the cavity between the focusing structure 3 and the first gas distribution part 4, and the second pipeline introduces gas into the cavity formed by the first gas distribution part 4, the second gas distribution part 5 and the shell 1.

[0081] It should be noted that the specific components of the cavity between the focusing structure 3 and the first gas distribution part 4 are determined by its structure. For example, the focusing structure 3 is sealed to the shell 1, and no light-transmitting window 8 is set between the focusing structure 3 and the shell 1, and the cavity is composed of the focusing structure 3, the shell 1 and the first gas distribution part 4; a light-transmitting window 8 is set between the focusing structure 3 and the shell 1, and the light-transmitting window 8 is fixed and sealed to the shell 1, then the cavity is composed of the light-transmitting window 8, the shell 1 and the first gas distribution part 4.

[0082] Specifically, the gas introduced into the first pipeline is generally different from the gas introduced into the second pipeline. While ensuring the effect of the ultraviolet light process, the size, shape, material, quantity and gas flow of the first pipeline can be selected according to actual conditions; the size, shape, material, quantity and gas flow of the second pipeline can be selected according to actual conditions.

[0083] Specifically, by setting a focusing structure 3 in the light box, the light path of the divergent ultraviolet light emitted by the light source component 2 is aggregated and concentrated on the heating table 6 to form a light spot of a preset size, thereby reducing the loss of ultraviolet light. At the same time, by adjusting the focusing structure 3 or the distance between the focusing structure 3 and the heating table, the size of the light spot and the distribution of the ultraviolet light can be adjusted, and then the degree of ultraviolet light treatment of the corresponding deposited film layer and the morphology after treatment can be adjusted.

[0084] Specifically, by disposing the focusing structure 3 , the density and flatness of the treated film layer can be improved, the treatment effect of the ultraviolet light can be improved, and the quality of the film layer after the ultraviolet light treatment can be improved.

[0085] In summary, the light box structure of the present invention improves the light box structure and sets a focusing structure in the light box, so that the light path of the ultraviolet light emitted by the light source component is aggregated and focused on the heating table to form a light spot of a preset size, reducing the loss of ultraviolet light, improving the density and flatness of the treated film layer, improving the ultraviolet light treatment effect, and improving the quality of the treated film layer. By adjusting the focusing structure or the distance between the focusing structure and the heating table, the size of the light spot emitted to the heating table and the distribution of ultraviolet light can be controlled, and then the degree of ultraviolet light treatment of the corresponding deposited film layer and the morphological performance after treatment can be adjusted. Therefore, the present invention effectively overcomes the various shortcomings of the existing technology and has a high industrial utilization value.

[0086] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the present invention. Anyone skilled in the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by one of ordinary skill in the art without departing from the spirit and technical principles disclosed in the present invention are intended to be covered by the claims of the present invention.

Claims

1. A light box structure, characterized in that: include: case; A light source assembly is fixed to the top of the housing; A light-collecting structure, located on the optical path of the light emitted by the light source assembly and connected to the housing; a first gas distribution portion, located on the optical path of the light focused by the light focusing structure and sealedly connected to the housing; a second gas distribution portion, located on an optical path of light passing through the first gas distribution portion and sealedly connected to the housing; The heating platform is located on the optical path of the light passing through the second gas distribution portion and is spaced apart from the light focusing structure by a preset distance.

2. The light box structure according to claim 1, characterized in that: The light-concentrating structure is fixedly connected to the housing.

3. The light box structure according to claim 2, characterized in that: The light-concentrating structure is sealed to the housing.

4. The light box structure according to claim 2, characterized in that: A light-transmitting window is provided below the light-concentrating structure and is fixed on the shell and spaced a preset distance from the light-concentrating structure. The light-transmitting window is sealed to the shell and is located above the first gas distribution portion.

5. The light box structure according to claim 1, characterized in that: The light-collecting structure and the housing are sealed and movably connected.

6. The light box structure according to claim 5, characterized in that: The moving distance of the light-concentrating structure ranges from 0.1 cm to 8 cm.

7. The light box structure according to claim 1, characterized in that: The light-concentrating structure is movably connected to the shell. A light-transmitting window fixed on the shell and spaced a preset distance from the light-concentrating structure is provided below the light-concentrating structure. The light-transmitting window is sealed to the shell.

8. The light box structure according to claim 1, characterized in that: The light-focusing structure includes one of a convex lens and an optical assembly.

9. The light box structure according to claim 8, characterized in that: The focusing structure is a convex lens, the distance between the focusing structure and the heating platform is less than one focal length of the focusing structure, and the size of the maximum light spot focused by the focusing structure on the heating platform is not less than the size of the wafer to be processed.

10. The light box structure according to claim 1, characterized in that: The light-concentrating structure has a temperature tolerance of not less than 450°C.

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