Liquid phase epitaxial wafer taking shovel

Abstract

The utility model provides a liquid phase epitaxy wafer taking shovel, and relates to the technical field of semiconductor material preparation. The liquid phase extension slice taking shovel comprises a bearing shovel and a transparent shovel, the bearing shovel comprises a bearing shovel handle and a bearing shovel support, the transparent shovel comprises a transparent shovel handle and a transparent shovel support, the two opposite sides of the bearing shovel support are each provided with a baffle, and the two opposite sides of the transparent shovel support are rotationally connected to the two baffles respectively; the liquid-phase epitaxial wafer taking shovel has a preparation process and an observation process in sequence, an epitaxial wafer is placed on a transparent shovel support in the preparation process, the back face of the epitaxial wafer is attached to the transparent shovel support, a transparent shovel handle moves towards a bearing shovel handle in the observation process, and the end, away from the transparent shovel handle, of the transparent shovel support tilts up; an observation space is formed between the transparent shovel support and the bearing shovel support, so that a user can observe whether mother liquor remains on the back of the epitaxial wafer through the transparent shovel support. On the basis, when whether mother liquor remains on the back face of the epitaxial wafer is observed, the risk that the epitaxial wafer is scratched and falls off can be reduced.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor material preparation, and in particular to a liquid phase epitaxial wafer shovel. Background Art

[0002] Liquid phase epitaxy (LPE) is a method in which a solid phase is precipitated from a solution and deposited onto a substrate to form an epitaxial layer (i.e., a thin single-crystal layer). It is primarily used in the manufacture of transistors, integrated circuits, photodetectors, and light-emitting diodes. While there are many LPE methods, such as tilted, vertical, and slide-boat, vertical LPE has become the most widely used in recent years.

[0003] In related technologies, vertical liquid phase epitaxy usually uses a HgCdTe mother liquor to grow a HgCdTe thin layer on a substrate. The HgCdTe mother liquor is placed in a graphite crucible, and the substrate is fixed on a quartz fixture. A graphite pull rod is used to extend the quartz fixture and the substrate on it into the graphite crucible, and the substrate is immersed in the HgCdTe mother liquor. At the same time, appropriate temperature and pressure are maintained. After a period of time, the growth of the HgCdTe thin layer on the substrate can be completed, and finally an epitaxial wafer (i.e., a substrate with a HgCdTe thin layer grown on it) is obtained. However, during the growth of the HgCdTe thin layer, there is continuous friction between the substrate and the quartz fixture, causing the HgCdTe mother liquor to easily penetrate into the gap between the two and remain on the back side of the substrate (i.e., the side where the HgCdTe thin layer has not grown). Therefore, after the growth of the HgCdTe thin layer is completed, it is necessary to use tweezers to clamp the epitaxial wafer in order to observe whether there is any HgCdTe mother liquor residue on the back side of the epitaxial wafer. During this process, the epitaxial wafer is not only easily scratched by the tweezers, but also easily falls from the tweezers, causing the epitaxial wafer to be broken. Utility Model Content

[0004] The present application provides a liquid phase epitaxial wafer shovel, which aims to solve the problem in the related art that the epitaxial wafer is easily scratched by tweezers and falls from the tweezers when observing whether there is mother liquid residue on the back of the epitaxial wafer.

[0005] In order to solve the above-mentioned disadvantages existing in the related technology, the present application provides a liquid phase epitaxial wafer shovel, which includes a carrying shovel and a transparent shovel. The carrying shovel includes a carrying shovel handle and a carrying shovel support extending obliquely from one end of the carrying shovel handle. The transparent shovel includes a transparent shovel handle and a transparent shovel support extending obliquely from one end of the transparent shovel handle. A baffle is respectively provided on the opposite sides of the carrying shovel support. The length direction of the baffle is consistent with the extension direction of the carrying shovel support. The opposite sides of the transparent shovel support are respectively rotatably connected to the two baffles. The position on the baffle that is rotatably connected to the transparent shovel support is close to the carrying shovel handle, and the position on the transparent shovel support that is rotatably connected to the baffle is close to the transparent shovel handle. The working process of the liquid phase epitaxial wafer shovel includes a preparation process and an observation process performed in sequence. Among them, the carrying shovel tray is used to fit with the transparent shovel tray during the preparation process; the transparent shovel tray is used to carry the epitaxial wafer to be observed during the preparation process and the observation process, and the back side of the epitaxial wafer where the epitaxial layer has not grown fits with the transparent shovel tray; the transparent shovel handle is used to move toward the carrying shovel handle under the action of external force during the observation process, so as to lift the end of the transparent shovel tray away from the transparent shovel handle, so that an observation space is formed between the transparent shovel tray and the carrying shovel tray; the observation space is used for the user to observe through the transparent shovel tray whether there is mother liquor residue on the back side of the epitaxial wafer.

[0006] In some implementation schemes, a receiving groove is provided on the carrying shovel support, and the shape and size of the receiving groove are adapted to the transparent shovel support. Two baffles are located on opposite sides of the receiving groove. The receiving groove is used to accommodate the transparent shovel support during the preparation process, and the lower surface of the transparent shovel support is in contact with the bottom wall of the receiving groove, and the upper surface is flush with the notch of the receiving groove.

[0007] In some implementations, an end of the carrying shovel support away from the carrying shovel handle is formed with an inclined structure extending downward from the notch of the accommodating groove. The carrying shovel support is also used to shovel the epitaxial wafer onto the transparent shovel support through the inclined structure under the action of external force during the preparation process.

[0008] In some implementations, the liquid phase epitaxy wafer scoop further includes a stopper rod, with opposing ends of the stopper rod disposed on two baffles near the ends of the scoop handle, configured to abut against the epitaxial wafer during observation. In one or more implementations, a gap is provided between the stopper rod and the transparent scoop holder, configured to accommodate the edge of the epitaxial wafer during observation. In one or more implementations, a groove is provided on the stopper rod extending along the axis of the stopper rod, configured to accommodate the edge of the epitaxial wafer during observation.

[0009] In some implementations, the LPE wafer scoop further includes a buffer bar, which is positioned on the carrying scoop handle near the carrying scoop support and extends along the width of the carrying scoop handle. Specifically, the buffer bar is configured to abut against and be compressed by the transparent scoop handle as the transparent scoop handle moves toward the carrying scoop handle during observation.

[0010] In some implementations, the LPE wafer scoop further includes a plurality of buffer blocks, each of which is disposed on the carrying scoop handle near the carrying scoop support and spaced apart along the width of the carrying scoop handle. Specifically, the buffer blocks are configured to abut against and be compressed by the transparent scoop handle as the transparent scoop handle moves toward the carrying scoop handle during observation.

[0011] In some implementations, the liquid phase epitaxial wafer shovel further includes two hinges, and the transparent shovel support is rotatably connected to the two baffles through the two hinges.

[0012] In some implementation schemes, the liquid phase epitaxial wafer shovel also includes a rotating shaft, and the opposite ends of the rotating shaft are respectively arranged on the ends of the two baffles near the supporting shovel handle. A through hole is opened on one side of the transparent shovel support and extends to the other opposite side. The transparent shovel support is mounted on the rotating shaft through the through hole, and the transparent shovel support rotates in coordination with the rotating shaft.

[0013] The liquid phase epitaxial wafer shovel provided in the present application includes a carrying shovel and a transparent shovel. The carrying shovel includes a carrying shovel handle and a carrying shovel support extending obliquely from one end of the carrying shovel handle. The transparent shovel includes a transparent shovel handle and a transparent shovel support extending obliquely from one end of the transparent shovel handle. A baffle is respectively provided on the opposite sides of the carrying shovel support. The length direction of the baffle is consistent with the extension direction of the carrying shovel support. The opposite sides of the transparent shovel support are respectively rotatably connected to the two baffles. The position on the baffle that is rotatably connected to the transparent shovel support is close to the carrying shovel handle, and the position on the transparent shovel support that is rotatably connected to the baffle is close to the transparent shovel handle. In actual applications, the working process of the liquid phase epitaxial wafer shovel is divided into a preparation process and an observation process which are carried out in sequence: in the preparation process, a carrying shovel tray is used to carry the transparent shovel tray, and the carrying shovel tray is fit together with the transparent shovel tray, and then the epitaxial wafer can be clamped with tweezers and placed on the transparent shovel tray (that is, the transparent shovel tray is used to carry the epitaxial wafer), and the back side of the epitaxial wafer where the epitaxial layer has not grown is fit together with the transparent shovel tray; in the observation process, the user can press the transparent shovel handle to move it toward the carrying shovel handle, and at the same time, the end of the transparent shovel tray away from the transparent shovel handle will tilt up and separate from the carrying shovel tray, so that an observation space will be formed between the transparent shovel tray and the carrying shovel tray, and the user can observe whether there is mother liquid residue on the back side of the epitaxial wafer through the observation space and through the transparent shovel tray. It is understandable that when observing whether there is mother liquor residue on the back of the epitaxial wafer, the traditional solution requires the use of tweezers to clamp the epitaxial wafer until the observation is completed, while the present application only requires the use of tweezers to place the epitaxial wafer on a transparent shovel during the preparation process, and during the subsequent observation process, the epitaxial wafer is always supported by the transparent shovel, and no tweezers are required. Compared with the traditional solution, this greatly reduces the time it takes to clamp the epitaxial wafer with tweezers, which not only reduces the risk of the epitaxial wafer being scratched by the tweezers, but also reduces the risk of the epitaxial wafer falling from the tweezers and breaking. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] In order to more clearly illustrate the relevant technologies or the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for the description of the relevant technologies or the embodiments of the present application. Obviously, the drawings described below are only some embodiments of the present application, not all embodiments. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0015] Figure 1 A schematic diagram of the structure of a liquid phase epitaxial wafer shovel during the preparation process provided in an embodiment of the present application;

[0016] Figure 2 A side view of a liquid phase epitaxial wafer removal shovel during preparation provided in an embodiment of the present application;

[0017] Figure 3 A schematic diagram of the structure of a liquid phase epitaxial wafer shovel during observation provided in an embodiment of the present application;

[0018] Figure 4 A side view of the liquid phase epitaxial wafer shovel provided in an embodiment of the present application during the observation process.

[0019] The symbols in the above drawings represent:

[0020] 100-load-bearing shovel, 200-transparent shovel, 300-limiting rod, 400-buffer bar, 500-hinge, 110-load-bearing shovel handle, 120-load-bearing shovel support, 130-baffle, 140-inclined structure, 121-accommodation groove, 210-transparent shovel handle, 220-transparent shovel support. DETAILED DESCRIPTION

[0021] In the related art, when growing a thin HgCdTe layer on a substrate, the substrate and the quartz fixture are constantly rubbing against each other, causing the HgCdTe mother liquor to easily penetrate into the gap between the two and remain on the back side of the substrate (i.e., the side where the HgCdTe thin layer is not grown). Therefore, after the HgCdTe thin layer is grown, it is necessary to use tweezers to pick up the epitaxial wafer (i.e., the substrate on which the HgCdTe thin layer is grown) and inspect the back side of the epitaxial wafer for any residual HgCdTe mother liquor. During this process, the epitaxial wafer is not only easily scratched by the tweezers, but also easily falls from the tweezers, causing the epitaxial wafer to break. In view of this, the present application proposes a liquid phase epitaxial wafer removal shovel in the following embodiments to address the above-mentioned drawbacks in the related art.

[0022] In order to make the purpose, technical solutions and advantages of the present application more obvious and easy to understand, the present application will be clearly and completely described below in conjunction with the embodiments of the present application and the corresponding drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements with the same or similar functions. It should be understood that the embodiments of the present application described below are only used to explain the present application and are not used to limit the present application, that is, based on the various embodiments of the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application. In addition, the technical features involved in the various embodiments of the present application described below can be combined with each other as long as they do not conflict with each other.

[0023] See also Figure 1 、 Figure 2 、 Figure 3 and Figure 4 , Figure 1 This is a schematic diagram of the structure of the liquid phase epitaxy shovel during the preparation process. Figure 2 This is a side view of the liquid phase epitaxy shovel during preparation. Figure 3 This is a schematic diagram of the structure of the liquid phase epitaxy shovel during the observation process. Figure 4 This is a side view of a liquid phase epitaxy wafer scoop during observation. This embodiment provides a liquid phase epitaxy wafer scoop, comprising a carrier scoop 100 and a transparent scoop 200. The carrier scoop 100 comprises a carrier scoop handle 110 and a carrier scoop support 120 extending obliquely from one end of the carrier scoop handle 110. The transparent scoop 200 comprises a transparent scoop handle 210 and a transparent scoop support 220 extending obliquely from one end of the transparent scoop handle 210. The transparent scoop 200 is disposed on the carrier scoop 100, with the transparent scoop handle 210 corresponding to the carrier scoop handle 110 and the transparent scoop support 220 corresponding to the carrier scoop support 120.

[0024] Specifically, a baffle 130 is provided on each of the two opposite sides of the load-bearing shovel support 120. The length directions of the two baffles 130 are consistent with the extension direction of the load-bearing shovel support 120. The two opposite sides of the transparent shovel support 220 are rotatably connected to the two baffles 130. The position on the baffle 130 where the transparent shovel support 220 is rotatably connected is close to the load-bearing shovel handle 110, and the position on the transparent shovel support 220 where the baffle 130 is rotatably connected is close to the transparent shovel handle 210. Preferably, the position on the baffle 130 where the transparent shovel support 220 is rotatably connected is at the end of the baffle 130 close to the load-bearing shovel handle 110, and the position on the transparent shovel support 220 where the baffle 130 is rotatably connected is at the position where the transparent shovel support 220 and the transparent shovel handle 210 meet.

[0025] In actual applications, the working process of the liquid phase epitaxy wafer scoop includes a preparation process and an observation process performed in sequence. On this basis, the carrying scoop tray 120 is used to carry the transparent scoop tray 220 during the preparation process and to fit with the transparent scoop tray 220. The transparent scoop tray 220 is used to carry the epitaxial wafer to be observed during the preparation process and the observation process, and the back side of the epitaxial wafer (i.e., the side without epitaxial layer growth) fits with the transparent scoop tray 220. The transparent scoop handle 210 is used to move toward the carrying scoop handle 110 under the action of an external force during the observation process, so as to tilt the transparent scoop tray 220 away from one end of the transparent scoop handle 210, so that an observation space is formed between the transparent scoop tray 220 and the carrying scoop tray 120. The observation space is used for the user to observe whether there is mother liquid residue on the back side of the epitaxial wafer through the transparent scoop tray 220. In addition, it should be noted that the external force in this application comes from the user, that is, the force is applied by the user.

[0026] That is to say, during the preparation process, the carrying shovel tray 120 is used to carry the transparent shovel tray 220, and the carrying shovel tray 120 is made to fit together with the transparent shovel tray 220. Then, the epitaxial wafer can be clamped with tweezers and placed on the transparent shovel tray 220 (that is, the transparent shovel tray 220 is used to carry the epitaxial wafer), and the back side of the epitaxial wafer where the epitaxial layer has not grown is made to fit together with the transparent shovel tray 220. During the observation process, the user can press down the transparent shovel handle 210 to move it toward the carrying shovel handle 110. At the same time, the end of the transparent shovel tray 220 away from the transparent shovel handle 210 will tilt up and separate from the carrying shovel tray 120. In this way, an observation space will be formed between the transparent shovel tray 220 and the carrying shovel tray 120, and the user can observe whether there is mother liquid residue on the back side of the epitaxial wafer through the observation space and through the transparent shovel tray 220.

[0027] In this embodiment, the transparent shovel 200 is transparent and can be made of commonly used transparent materials in the art, such as polymethyl methacrylate (PMMA, also known as acrylic), polycarbonate (PC), and polystyrene (PS). The specific material can be selected based on actual needs and is not limited to this in this application. Furthermore, it should be noted that the shapes of the carrying shovel holder 120 and the transparent shovel holder 220 should be compatible with the epitaxial wafer. Since the most common shape of epitaxial wafers in the art is rectangular, the carrying shovel holder 120 and the transparent shovel holder 220 are preferably rectangular with chamfered edges. However, those skilled in the art will appreciate that the shapes of the carrying shovel holder 120 and the transparent shovel holder 220 are not limited to rectangles and can also be other shapes, such as circular, elliptical, triangular, trapezoidal, and other polygonal shapes. The specific material can be selected based on actual needs and is not limited to this in this application. It should also be noted that the edges of the carrying shovel handle 110 are chamfered. The length can be designed based on actual needs and is not limited to this in this application, but is preferably 6 to 10 cm for ease of handling.

[0028] From the above, it can be found that when observing whether there is mother liquor residue on the back of the epitaxial wafer, the traditional solution requires the use of tweezers to clamp the epitaxial wafer until the observation is completed, while the present embodiment only requires the use of tweezers to place the epitaxial wafer on the transparent shovel support 220 during the preparation process, and in the subsequent observation process, the epitaxial wafer is always supported by the transparent shovel support 220, and no tweezers are required. Compared with the traditional solution, this greatly reduces the time it takes to clamp the epitaxial wafer with the tweezers, which not only reduces the risk of the epitaxial wafer being scratched by the tweezers, but also reduces the risk of the epitaxial wafer falling from the tweezers and breaking.

[0029] In some embodiments, still refer to Figures 1 to 4 The carrying shovel holder 120 is provided with a receiving groove 121, the shape and size of which are adapted to the transparent shovel holder 220. Two baffles 130 are located on opposite sides of the receiving groove 121. The receiving groove 121 is used to receive the transparent shovel holder 220 during the preparation process. It is understandable that, because the shape and size of the receiving groove 121 are adapted to the transparent shovel holder 220, when the transparent shovel holder 220 is accommodated in the receiving groove 121, the lower surface of the transparent shovel holder 220 will be in contact with the bottom wall of the receiving groove 121, the upper surface of the transparent shovel holder 220 will be flush with the notch of the receiving groove 121, and the side surfaces of the transparent shovel holder 220 will be in contact with the side walls of the receiving groove 121.

[0030] It can be seen from this that when the receiving groove 121 is not provided on the carrying shovel tray 120, after the epitaxial wafer is placed on the transparent shovel tray 220 during the preparation process, the height of the epitaxial wafer in the liquid phase epitaxial wafer shovel is equal to the sum of the thicknesses of the carrying shovel tray 120 and the transparent shovel tray 220; when the receiving groove 121 is provided on the carrying shovel tray 120, after the epitaxial wafer is placed on the transparent shovel tray 220 during the preparation process, the height of the epitaxial wafer in the liquid phase epitaxial wafer shovel is only the thickness of the carrying shovel tray 120; that is, providing the receiving groove 121 for accommodating the transparent shovel tray 220 on the carrying shovel tray 120 can reduce the height of the epitaxial wafer in the liquid phase epitaxial wafer shovel, thereby reducing the risk of the epitaxial wafer falling from the transparent shovel tray 220.

[0031] In some embodiments, still refer to Figures 1 to 4 A slope structure 140 is formed at the end of the carrying shovel support 120 away from the carrying shovel handle 110, which extends downward from the notch of the accommodating groove 121 (or a position relatively close to the notch of the accommodating groove 121); on this basis, the carrying shovel support 120 is also used to shovel the epitaxial wafer onto the transparent shovel support 220 through the slope structure 140 under the action of external force during the preparation process.

[0032] That is, during the preparation process, tweezers can be used to press against one side of the epitaxial wafer, and the inclined surface structure 140 on the carrying scoop holder 120 can be placed against the other side of the epitaxial wafer. The user can then push the carrying scoop holder 120 toward the epitaxial wafer. During the movement of the carrying scoop holder 120, the inclined surface structure 140 on the carrying scoop holder 120 can guide the epitaxial wafer onto the transparent scoop holder 220, that is, the epitaxial wafer will slide along the inclined surface structure 140 onto the transparent scoop holder 220. It can be understood that by providing the inclined surface structure 140 at the end of the carrying scoop holder 120 away from the carrying scoop handle 110, the epitaxial wafer can be scooped onto the transparent scoop holder 220 during the preparation process without having to use tweezers to grasp the epitaxial wafer and transfer it to the transparent scoop holder 220. In this case, tweezers are not required to grasp the epitaxial wafer during both the preparation process and the observation process, thus completely avoiding the disadvantages of the epitaxial wafer being scratched by the tweezers or falling from the tweezers and breaking in traditional solutions.

[0033] In some embodiments, still refer to Figures 1 to 4 In addition to the structure given above, the liquid phase epitaxial wafer shovel also includes a limiting structure (not shown in the figure). The opposite ends of the limiting structure are respectively arranged on the ends of the two baffles 130 close to the supporting shovel handle 110. The limiting structure is used to abut against the epitaxial wafer on the transparent shovel support 220 during the observation process to prevent the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210. It is understandable that during the observation process, the user will press the transparent shovel handle 210 downward to move it toward the carrying shovel handle 110. At the same time, the end of the transparent shovel support 220 away from the transparent shovel handle 210 will tilt up and separate from the carrying shovel support 120. In this case, the epitaxial wafer on the transparent shovel support 220 will be covered with a tendency to slide and / or flip toward the transparent shovel handle 210. Under this tendency, the epitaxial wafer on the transparent shovel support 220 will abut against the limiting structure, that is, the limiting structure will prevent the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210. In this way, the smooth progress of the observation process can be ensured, and the epitaxial wafer can be prevented from being contaminated when sliding and / or flipping toward the transparent shovel handle 210.

[0034] In one or more embodiments, the limiting structure includes a limiting rod 300, the opposite ends of which are respectively disposed at the ends of the two baffles 130 near the carrying shovel handle 110. The limiting rod 300 is used to abut against the epitaxial wafer during the observation process to prevent the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210. In other words, during the observation process, when the end of the transparent shovel support 220 away from the transparent shovel handle 210 is tilted and separated from the carrying shovel support 120, the epitaxial wafer on the transparent shovel support 220 has a tendency to slide and / or flip toward the transparent shovel handle 210. Under this tendency, the epitaxial wafer on the transparent shovel support 220 will abut against the limiting rod 300, thereby preventing the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210, thereby ensuring smooth observation.

[0035] In one or more embodiments, the limiting structure includes a limiting rod 300, with opposing ends of the limiting rod 300 disposed at the ends of the two baffles 130 near the carrying shovel handle 110. A gap (not shown) is defined between the limiting rod 300 and the transparent shovel support 220. The gap is used to accommodate the edge of the epitaxial wafer during observation. Specifically, during observation, when the end of the transparent shovel support 220, which is away from the transparent shovel handle 210, rises and separates from the carrying shovel support 120, the epitaxial wafer on the transparent shovel support 220 has a tendency to slide and / or flip toward the transparent shovel handle 210. Under this tendency, the edge of the epitaxial wafer near the limiting rod 300 is inserted into the gap between the limiting rod 300 and the transparent shovel support 220, thereby preventing the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210.

[0036] In one or more embodiments, the limiting structure includes a limiting rod 300, with opposing ends of the limiting rod 300 disposed at the ends of the two baffles 130 near the carrying shovel handle 110. The limiting rod 300 is provided with a groove (not shown) extending along its axis. The groove is used to accommodate the edge of the epitaxial wafer during observation. In other words, during observation, when the transparent shovel holder 220 is tilted away from the transparent shovel handle 210 and separated from the carrying shovel holder 120, the epitaxial wafer on the transparent shovel holder 220 has a tendency to slide and / or flip toward the transparent shovel handle 210. Under this tendency, the edge of the epitaxial wafer near the limiting rod 300 will be inserted into the groove of the limiting rod 300, thereby preventing the epitaxial wafer from sliding and / or flipping toward the transparent shovel handle 210.

[0037] In some embodiments, still refer to Figures 1 to 4In addition to the structure described above, the liquid phase epitaxy wafer scoop also includes a buffer structure (not shown). The buffer structure is provided on the carrying scoop handle 110 near the carrying scoop support 120 and extends along the width direction of the carrying scoop handle 110. The buffer structure is used to support and cushion the transparent scoop handle 210 when the transparent scoop handle 210 moves toward the carrying scoop handle 110 during observation. In other words, during observation, the user presses the transparent scoop handle 210 downward to move it toward the carrying scoop handle 110. During the movement of the transparent scoop handle 210 toward the carrying scoop handle 110, the buffer structure abuts against the transparent scoop handle 210 and is squeezed by the transparent scoop handle 210. In this way, the transparent scoop handle 210 is supported by the abutment between the two and cushioned by the squeezing between the two.

[0038] In one or more embodiments, the buffer structure includes a buffer strip 400. The buffer strip 400 is disposed on the load-bearing shovel handle 110 near the load-bearing shovel support 120 and extends along the width of the load-bearing shovel handle 110. Specifically, the buffer strip 400 is configured to abut against and be compressed by the transparent shovel handle 210 when the transparent shovel handle 210 moves toward the load-bearing shovel handle 110 during observation. In other words, during observation, when the transparent shovel handle 210 moves toward the load-bearing shovel handle 110, the transparent shovel handle 210 abuts against the buffer strip 400 and is compressed by the transparent shovel handle 210, thereby providing support and cushioning for the transparent shovel handle 210. It should be noted that the buffer strip 400 can be made of commonly used materials with good elastic properties in the art, such as natural rubber, synthetic rubber, silicone rubber, polyurethane foam, thermoplastic polyurethane (TPU), etc. The specific material can be selected based on actual needs and is not limited in this application.

[0039] As one or more embodiments, the buffer strip 400 described above can be divided into multiple buffer blocks (not shown). Specifically, the buffer structure includes multiple buffer blocks, each of which is disposed on the load-bearing shovel handle 110 near the load-bearing shovel support 120 and spaced apart along the width of the load-bearing shovel handle 110. Specifically, each buffer block is configured to abut against and be compressed by the transparent shovel handle 210 when the transparent shovel handle 210 moves toward the load-bearing shovel handle 110 during observation. In other words, during observation, when the transparent shovel handle 210 moves toward the load-bearing shovel handle 110, the transparent shovel handle 210 abuts against the multiple buffer blocks, and each of the multiple buffer blocks is compressed by the transparent shovel handle 210, thereby providing support and cushioning for the transparent shovel handle 210. In addition, it should be noted that the buffer block can be made of materials with good elastic properties commonly used in this field, such as natural rubber, synthetic rubber, silicone rubber, polyurethane foam, thermoplastic polyurethane (TPU), etc. The specific selection can be based on actual needs, and this application does not make the sole limitation to this.

[0040] In some embodiments, still refer to Figures 1 to 4 In addition to the structure given above, the liquid phase epitaxial wafer shovel also includes a rotating structure (not shown). The transparent shovel support 220 can realize the rotational connection between itself and the two baffles 130 through the rotating structure.

[0041] In one or more embodiments, the rotation structure includes two hinges 500, and the transparent shovel holder 220 is rotatably connected to the two baffles 130 via the two hinges 500. In one or more embodiments, the rotation structure includes a rotation shaft (not shown), with opposite ends of the rotation shaft disposed at the ends of the two baffles 130 near the shovel handle 110. A through hole (not shown) is defined on one side of the transparent shovel holder 220, extending through to the other opposite side. The transparent shovel holder 220 is sleeved on the rotation shaft through the through hole and rotatably engages with the rotation shaft. In one or more embodiments, the rotation structure includes two rotation posts (not shown), with one end of each rotation post disposed at the ends of the two baffles 130 near the shovel handle 110. A countersunk hole (not shown) is defined on opposite sides of the transparent shovel holder 220. The two rotation posts are inserted into the two countersunk holes of the transparent shovel holder 220, and the two rotation posts rotatably engage with the two countersunk holes.

[0042] The above embodiments are merely preferred implementations of the present application and are not intended to be the sole limitations on the liquid phase epitaxy wafer scoop. Persons skilled in the art may flexibly adjust the configuration based on the above embodiments and actual application scenarios. It is understood that, through the implementation of the above embodiments of the present application, a liquid phase epitaxy wafer scoop is formed by a carrying scoop 100 and a transparent scoop 200. The carrying scoop 100 includes a carrying scoop handle 110 and a carrying scoop support 120 extending obliquely from one end of the carrying scoop handle 110. The transparent scoop 200 includes a transparent scoop handle 210 and a transparent scoop support 220 extending obliquely from one end of the transparent scoop handle 210. A baffle 130 is provided on opposite sides of the carrying scoop support 120. The length of the baffle 130 coincides with the extension direction of the carrying scoop support 120. Opposite sides of the transparent scoop support 220 are rotatably connected to the two baffles 130. The position of the baffle 130 rotatably connected to the transparent scoop support 220 is adjacent to the carrying scoop handle 110, and the position of the transparent scoop support 220 rotatably connected to the baffle 130 is adjacent to the transparent scoop handle 210. In actual application, the working process of the liquid phase epitaxial wafer scoop can be divided into a preparation process and an observation process which are carried out in sequence: in the preparation process, the carrying scoop tray 120 is used to carry the transparent scoop tray 220, and the carrying scoop tray 120 is made to fit together with the transparent scoop tray 220, and then the epitaxial wafer can be clamped with tweezers and placed on the transparent scoop tray 220 (that is, the transparent scoop tray 220 is used to carry the epitaxial wafer), and the back side of the epitaxial wafer where the epitaxial layer has not grown is made to fit together with the transparent scoop tray 220; in the observation process, the user can press the transparent scoop handle 210 to move it toward the carrying scoop handle 110, and at the same time, the end of the transparent scoop tray 220 away from the transparent scoop handle 210 will be tilted up and separated from the carrying scoop tray 120, so that an observation space will be formed between the transparent scoop tray 220 and the carrying scoop tray 120, and the user can observe whether there is mother liquid residue on the back side of the epitaxial wafer through the observation space and through the transparent scoop tray 220. It can be found that when observing whether there is mother liquor residue on the back of the epitaxial wafer, the traditional solution requires the use of tweezers to clamp the epitaxial wafer until the observation is completed, while the present application only requires the use of tweezers to place the epitaxial wafer on the transparent shovel support 220 during the preparation process, and in the subsequent observation process, the epitaxial wafer is always supported by the transparent shovel support 220, and no tweezers are required. Compared with the traditional solution, this greatly reduces the time it takes to clamp the epitaxial wafer with tweezers, which not only reduces the risk of the epitaxial wafer being scratched by the tweezers, but also reduces the risk of the epitaxial wafer falling from the tweezers and breaking.

[0043] It should be noted that the present application is described in a progressive manner in the several embodiments shown above, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other. It should also be noted that in the text description of the present application, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is such an actual relationship or order between these entities or operations. Further, the terms "include", "comprise" or any other corresponding variants are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only these elements, but also other elements not explicitly listed, or elements inherent to such a process, method, article or device; and, in the absence of further restrictions, the elements defined by the sentence "including one..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0044] Furthermore, by implementing the several embodiments described above, those skilled in the art can implement or use the present application. Various modifications to the several embodiments described above will be readily apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments not shown without departing from the spirit or scope of the present application. Therefore, the present application is not limited to the several embodiments described above, but rather is intended to conform to the broadest scope consistent with the principles and novel features disclosed herein.

Claims

1. A liquid phase epitaxy wafer shovel, characterized in that: The device comprises a carrying shovel and a transparent shovel, wherein the carrying shovel comprises a carrying shovel handle and a carrying shovel support extending obliquely from one end of the carrying shovel handle, and the transparent shovel comprises a transparent shovel handle and a transparent shovel support extending obliquely from one end of the transparent shovel handle, and a baffle is respectively provided on opposite sides of the carrying shovel support, the length direction of the baffle is consistent with the extension direction of the carrying shovel support, and opposite sides of the transparent shovel support are respectively rotatably connected to the two baffles, the position on the baffle that is rotatably connected to the transparent shovel support is close to the carrying shovel handle, and the position on the transparent shovel support that is rotatably connected to the baffle is close to the transparent shovel handle. The working process of the liquid phase epitaxial wafer shovel comprises a preparation process and an observation process performed in sequence, wherein: The carrying shovel support is used to fit with the transparent shovel support during the preparation process; The transparent shovel holder is used to carry the epitaxial wafer to be observed during the preparation process and the observation process, and the back surface of the epitaxial wafer where the epitaxial layer is not grown is in contact with the transparent shovel holder; The transparent shovel handle is used to move toward the carrying shovel handle under the action of external force during the observation process, so as to tilt the transparent shovel support away from one end of the transparent shovel handle, so that an observation space is formed between the transparent shovel support and the carrying shovel support. The observation space is used for the user to observe through the transparent shovel support whether there is mother liquid residue on the back of the epitaxial wafer.

2. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: A receiving groove is provided on the carrying shovel support, and the shape and size of the receiving groove are adapted to the transparent shovel support. The two baffles are respectively located on opposite sides of the receiving groove. The receiving groove is used to receive the transparent shovel support during the preparation process, and the lower surface of the transparent shovel support is in contact with the bottom wall of the receiving groove, and the upper surface is flush with the notch of the receiving groove.

3. The liquid phase epitaxy wafer shovel according to claim 2, characterized in that: An inclined surface structure extending downward from the notch of the accommodating groove is formed at one end of the carrying shovel support away from the carrying shovel handle. The carrying shovel support is also used to shovel the epitaxial wafer onto the transparent shovel support through the inclined surface structure under the action of external force during the preparation process.

4. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: The liquid phase epitaxial wafer shovel further includes a limiting rod, the opposite ends of which are respectively arranged at the ends of the two baffles close to the carrying shovel handle, for contacting the epitaxial wafer during the observation process.

5. The liquid phase epitaxy wafer shovel according to claim 4, characterized in that: A gap is formed between the limiting rod and the transparent shovel support, and the gap is used to accommodate the edge portion of the epitaxial wafer during the observation process.

6. The liquid phase epitaxy wafer shovel according to claim 4, characterized in that: The limiting rod is provided with a groove extending along the axis direction of the limiting rod, and the groove is used to accommodate the edge portion of the epitaxial wafer during the observation process.

7. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: The liquid phase epitaxy wafer scoop further includes a buffer bar, which is arranged on the carrying scoop handle near the carrying scoop support and extends along the width direction of the carrying scoop handle; The buffer bar is used to abut against the transparent shovel handle and be squeezed by the transparent shovel handle when the transparent shovel handle moves toward the load-bearing shovel handle during the observation process.

8. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: The liquid phase epitaxy wafer scoop further includes a plurality of buffer blocks, which are all arranged on the carrying scoop handle near the carrying scoop support and spaced apart along the width direction of the carrying scoop handle; The buffer block is used to abut against the transparent shovel handle and be squeezed by the transparent shovel handle when the transparent shovel handle moves toward the load-bearing shovel handle during the observation process.

9. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: It also includes two hinges, and the transparent shovel support is rotatably connected to the two baffles through the two hinges respectively.

10. The liquid phase epitaxy wafer shovel according to claim 1, characterized in that: It also includes a rotating shaft, the opposite ends of which are respectively arranged on the ends of the two baffles close to the carrying shovel handle, and a through hole is opened on one side of the transparent shovel support that penetrates to the other opposite side. The transparent shovel support is sleeved on the rotating shaft through the through hole and rotates with the rotating shaft.

Images