Photovoltaic cell silicon wafer drying equipment

Through the turntable and eccentric telescopic rod gear system driven by the servo motor, the silicon wafer is flipped to achieve uniform drying on both sides, solving the problem that existing equipment can only dry on one side, and improving drying efficiency and uniformity.

CN223295199UActive Publication Date: 2025-09-02ZHENJIANG XINYUAN MICROTECH TECHNOLOGY CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202422563633.5
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-10-23
Publication Date
2025-09-02
Estimated Expiration
2034-10-23

AI Technical Summary

Technical Problem

Existing photovoltaic cell silicon wafer drying equipment can only effectively dry one side of the silicon wafer, but the other side cannot be fully contacted, resulting in uneven drying and affecting subsequent processing processes.

Method used

A photovoltaic cell silicon wafer drying equipment is designed to drive the eccentric telescopic rod and gear system through a servo motor to flip the silicon wafer, ensuring that both sides can be in full contact with the hot air drying parts, and the flip rate is adjusted by adjusting the components to meet different production needs.

Benefits of technology

The silicon wafer is uniformly dried on both sides, improving the drying effect and avoiding subsequent processing problems caused by uneven drying.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN223295199U_ABST
    Figure CN223295199U_ABST
Patent Text Reader

Abstract

The utility model discloses photovoltaic cell silicon wafer drying equipment, which relates to the technical field of photovoltaic cell silicon wafer production equipment, and comprises a mounting rack, a first conveying belt and a second conveying belt which are arranged on the mounting rack, and a driving turntable rotationally connected to one side of the mounting rack, one side of the mounting rack is connected with a servo motor for driving the driving turntable to rotate; the driving telescopic rod is rotationally arranged on the driving rotary disc, and when the driving rotary disc rotates, the driving telescopic rod continuously performs eccentric movement; according to the utility model, the silicon wafer is clamped by the clamping piece, and then the driving gear and the driven rack are driven by the driving turntable to be continuously meshed, so that the clamping piece is driven to continuously turn over, both sides of the silicon wafer can be in full contact with the hot air drying piece, and the drying effect is further improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaic cell silicon wafer production equipment, in particular to photovoltaic cell silicon wafer drying equipment. Background Art

[0002] During the production and cleaning of silicon wafers, a certain amount of moisture will remain on the surface of the wafer. If not dried, this moisture will affect subsequent processing steps, such as causing uneven coating and affecting the quality of electrode printing. Drying can effectively remove moisture from the silicon wafer surface, providing a dry silicon wafer surface for subsequent processing.

[0003] An existing Chinese patent (publication number: CN221113213U) discloses a solar cell silicon wafer drying device, which relates to the field of screen printing technology in the production of photovoltaic cells. The device comprises a frame, a chain mesh conveyor belt and an oven arranged on the frame, wherein the oven is located above the chain mesh conveyor belt; the device also comprises: a lifting drive unit and a sliding fitting unit arranged between the two sides of the oven and the top surface of the frame; the lifting drive unit is capable of driving the oven to move up and down; the sliding fitting unit is located inside the lifting drive unit; a lifting elastic body is provided inside the sliding fitting unit, and the lifting elastic body is substantially equal to the gravity of the oven. The solar cell silicon wafer drying device provided by the utility model not only relies on the support of the lifting drive unit for the lifting and lowering control of the oven, but also provides a lifting elastic body inside the sliding fitting unit. The elastic support of the lifting elastic body is used to relieve the driving support of the lifting drive unit, so that the lifting drive unit will not be under the pressure of gravity for a long time, and can be used more stably and for a long time.

[0004] During the drying process, the above-mentioned equipment uses a conveyor belt to carry silicon wafers, and a liftable oven is set on the conveyor belt. Then, when the silicon wafer moves to the bottom of the oven, the oven descends to seal and dry the silicon wafer. Although it can also perform drying operations, during the drying process, only one side of the silicon wafer can be dried, and the other side cannot fully contact with the drying equipment.

[0005] To this end, we designed a photovoltaic cell silicon wafer drying equipment to solve the above problems. Utility Model Content

[0006] The purpose of the present invention is to provide a photovoltaic cell silicon wafer drying device to solve the problems raised in the above background technology.

[0007] In order to solve the above technical problems, the utility model provides a photovoltaic cell silicon wafer drying device, comprising a mounting frame and a first conveyor belt and a second conveyor belt arranged on the mounting frame, including:

[0008] A driving turntable is rotatably connected to one side of the mounting frame, and a servo motor for driving the driving turntable to rotate is connected to one side of the mounting frame;

[0009] The driving telescopic rod is rotatably arranged on the driving turntable. When the driving turntable rotates, the driving telescopic rod continuously moves eccentrically.

[0010] A driving gear is rotatably connected to the other end of the driving telescopic rod, and a clamping member for clamping the silicon wafer is connected to the other side of the driving gear;

[0011] The driven rack is connected to one side of the mounting frame. When the driving gear moves away from the driving turntable to a certain position, it meshes with the driven rack to drive the clamping part to flip.

[0012] Furthermore, it also includes a regulating component for regulating the flipping rate, including,

[0013] A fixed frame connected to the driving turntable;

[0014] The slider is slidably arranged in the fixed frame and can slide along the length direction of the fixed frame to move away from or close to the center of the driving turntable;

[0015] A first limiting bolt is threadedly connected to the slider to limit the position of the slider, and a plurality of limiting screw holes adapted to the first limiting bolt are opened in the fixing frame;

[0016] The second limit screw is threadedly connected to the driving telescopic rod and is used to control the length of the driving telescopic rod.

[0017] Furthermore, the clamping member includes an electric telescopic rod connected to one side of the driving gear, and the telescopic end of the electric telescopic rod is connected to a pneumatic clamping claw.

[0018] Furthermore, a first synchronous wheel is coaxially provided on one side of the driving turntable, a second synchronous wheel is connected to the driving shaft of the servo motor, and a synchronous belt is connected between the first synchronous wheel and the second synchronous wheel.

[0019] Furthermore, the mounting rack is connected to a mounting frame, and a plurality of hot air drying components are connected in a linear array at equal intervals along the length direction in the mounting frame.

[0020] Furthermore, opposite sides of the pneumatic clamping jaws are connected to buffer pads, and anti-slip particles are integrally formed on the buffer pads.

[0021] Furthermore, a turning area is formed between the second conveyor belt and the first conveyor belt for turning over silicon wafers.

[0022] Furthermore, a slide groove for sliding the electric telescopic rod is provided on the mounting frame, and the slide groove is waist-shaped.

[0023] Compared with the prior art, the beneficial effects of the present invention are:

[0024] 1. The silicon wafer is clamped by the clamping parts, and then the driving turntable is used to drive the active gear and the driven rack to continuously engage, thereby driving the clamping parts to continuously flip, so that both sides of the silicon wafer can fully contact with the hot air drying parts, further improving the drying effect.

[0025] 2. Adjusting the slider position changes the eccentricity of the drive telescopic rod, thereby adjusting the gripper's flipping rate to suit varying production needs. As the slider moves closer to or further away from the center of the drive turntable, the flipping speed is controlled. The first stop bolt secures the slider position to ensure stability after adjustment. This setting allows for easy adjustment of the flipping rate based on the conveyor rate, effectively adapting to various production situations. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 This is a schematic diagram of the overall structure of the exterior of the utility model;

[0027] Figure 2 It is a first side view of the interior of the utility model;

[0028] Figure 3 is a second side view of the interior of the utility model;

[0029] Figure 4 is a third side view of the interior of the utility model;

[0030] Figure 5 For this utility model Figure 2 A magnified view of the structure at point A;

[0031] Figure 6 For this utility model Figure 4 A magnified view of the structure at point B.

[0032] In the figure: 1. Mounting frame; 2. First conveyor belt; 3. Second conveyor belt; 401. Driving turntable; 402. Servo motor; 403. Driving telescopic rod; 404. Driving gear; 405. Driven rack; 500. Adjustment assembly; 501. Fixing frame; 502. Slider; 503. First limiting bolt; 504. Second limiting screw; 6. First synchronous wheel; 7. Second synchronous wheel; 8. Synchronous belt; 9. Mounting frame; 10. Hot air drying component; 11. Pneumatic clamp; 12. Electric telescopic rod. DETAILED DESCRIPTION

[0033] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0034] See also Figure 1-6 The utility model provides a technical solution: a photovoltaic cell silicon wafer drying device, comprising a mounting frame 1 and a first conveyor belt 2 and a second conveyor belt 3 arranged on the mounting frame 1, including:

[0035] A driving turntable 401 is rotatably connected to one side of the mounting frame 1 , and a servo motor 402 is connected to one side of the mounting frame 1 for driving the driving turntable 401 to rotate;

[0036] The driving telescopic rod 403 is rotatably mounted on the driving turntable 401. When the driving turntable 401 rotates, the driving telescopic rod 403 continuously moves eccentrically.

[0037] A driving gear 404 is rotatably connected to the other end of the driving telescopic rod 403. The other side of the driving gear 404 is connected to a clamping member for clamping the silicon wafer;

[0038] The driven rack 405 is connected to one side of the mounting frame 1 . When the driving gear 404 moves away from the driving turntable 401 to a certain position, it meshes with the driven rack 405 to drive the clamping member to flip.

[0039] Preferably, a sensor can be installed on the mounting rack 1, and when the silicon wafer is moved to a certain position, the clamping member can directly clamp and fix the silicon wafer.

[0040] In a specific implementation, a silicon wafer is placed on the first conveyor belt 2 and the second conveyor belt 3 on the mounting frame 1 for transport. When the silicon wafer reaches the clamping position, the clamping member clamps and secures the silicon wafer, and the servo motor 402 is activated, which drives the drive disc 401 to rotate. Because the drive telescopic rod 403 is rotatably mounted on the drive disc 401, as the drive disc 401 rotates, the drive telescopic rod 403 continuously moves eccentrically, and the driving gear 404 connected to the other end of the drive telescopic rod 403 also moves accordingly. When the driving gear 404 moves away from the drive disc 401 to a certain position, it meshes with the driven rack 405 on one side of the mounting frame 1. At this time, the driving gear 404 begins to rotate under the meshing action of the driven rack 405, which in turn drives the clamping member connected to the other side of the driving gear 404 to flip, exposing both sides of the silicon wafer to the drying environment, thereby fully drying the silicon wafer.

[0041] refer to Figure 1 、 Figure 2 and Figure 6 , further comprising an adjusting component 500 for adjusting the flipping rate, comprising,

[0042] The fixed frame 501 is connected to the driving turntable 401;

[0043] The slider 502 is slidably disposed within the fixed frame 501 and can slide along the length of the fixed frame 501 to move away from or toward the center of the driving turntable 401;

[0044] The first limiting bolt 503 is threadedly connected to the slider 502 to limit the position of the slider 502. The fixing frame 501 is provided with a plurality of limiting screw holes adapted to the first limiting bolt 503.

[0045] The second limiting screw 504 is threadedly connected to the driving telescopic rod 403 and is used to control the length of the driving telescopic rod 403 .

[0046] In specific implementation, the eccentricity of the drive telescopic rod 403 can be changed by adjusting the position of the slider 502 within the fixed frame 501. When the slider 502 is close to the center of the drive turntable 401, the eccentricity of the drive telescopic rod 403 decreases, and the flipping rate of the clamping member will correspondingly slow down; when the slider 502 is away from the center of the drive turntable 401, the eccentricity of the drive telescopic rod 403 increases, and the flipping rate of the clamping member will become faster. After adjusting the position of the slider 502, the first limiting bolt 503 is threadedly connected to the slider 502 and matched with the corresponding limiting screw hole in the fixed frame 501 to limit and fix the position of the slider 502. This setting facilitates the adjustment of the flipping rate according to the conveying rate of the first conveyor belt 2 and the second conveyor belt 3, thereby effectively adapting to various situations.

[0047] See Figure 3 The clamping member includes an electric telescopic rod 12 connected to one side of the driving gear 404, and the telescopic end of the electric telescopic rod 12 is connected to the pneumatic clamping claw 11.

[0048] In specific implementation, the designed electric telescopic rod 12 is convenient for adjusting the clamping position of the pneumatic clamp 11 to adapt to different types of silicon wafers, while the designed pneumatic clamp 11 is convenient for clamping and positioning the silicon wafer.

[0049] See Figure 1-5 A first synchronous wheel 6 is coaxially arranged on one side of the driving turntable 401, a driving shaft of the servo motor 402 is connected to a second synchronous wheel 7, and a synchronous belt 8 is connected between the first synchronous wheel 6 and the second synchronous wheel 7.

[0050] During specific implementation, the designed second synchronous wheel 7 transmits the power of the servo motor 402 to the driving turntable 401 through the first synchronous wheel 6, thereby driving the driving turntable 401 to rotate.

[0051] See Figure 1 The mounting frame 9 is connected to the mounting frame 1, and a plurality of hot air drying components 10 are connected in a linear array at equal intervals along the length direction in the mounting frame 9.

[0052] In specific implementation, the hot air drying member 10 is designed to facilitate drying of water on the surface of the silicon wafer.

[0053] refer to Figure 3 The pneumatic clamping jaws 11 are connected to opposite sides of the clamping jaws with a buffer pad, and the buffer pad is integrally formed with anti-slip particles.

[0054] During specific implementation, the designed buffer pad avoids the situation where the silicon wafer is damaged due to excessive clamping force.

[0055] refer to Figure 1 and Figure 2 A turning area is formed between the second conveyor belt 3 and the first conveyor belt 2 for turning over the silicon wafers.

[0056] During specific implementation, the designed flipping area facilitates flipping of the silicon wafer, avoiding damage to the silicon wafer caused by contact with the second conveyor belt 3 and the first conveyor belt 2 during flipping.

[0057] refer to Figure 5 The mounting frame 1 is provided with a slide groove for the electric telescopic rod 12 to slide, and the slide groove is set in a waist shape.

[0058] In specific implementation, this design facilitates the sliding of the electric telescopic rod 12 .

[0059] Working principle: When in use, the silicon wafer is placed on the first conveyor belt 2 and the second conveyor belt 3 on the mounting frame 1 for transportation. When the silicon wafer reaches the clamping part position, the clamping part clamps and fixes the silicon wafer, and the servo motor 402 is started, and the servo motor 402 drives the driving turntable 401 to rotate. Since the driving telescopic rod 403 is rotatably set on the driving turntable 401, as the driving turntable 401 rotates, the driving telescopic rod 403 continuously moves eccentrically, and the driving gear 404 connected to the other end of the driving telescopic rod 403 also moves accordingly. When the driving gear 404 moves away from the driving turntable 401 to a certain position, it meshes with the driven rack 405 on one side of the mounting frame 1. At this time, the driving gear 404 starts to rotate under the meshing action with the driven rack 405, and then drives the clamping part connected to the other side of the driving gear 404 to flip over, so that both sides of the silicon wafer can be exposed to the drying environment, thereby fully drying the silicon wafer;

[0060] By adjusting the position of the slider 502 within the fixed frame 501, the degree of eccentricity of the drive telescopic rod 403 can be changed. When the slider 502 is close to the center of the drive turntable 401, the degree of eccentricity of the drive telescopic rod 403 decreases, and the flipping rate of the clamping member will correspondingly slow down; when the slider 502 is away from the center of the drive turntable 401, the degree of eccentricity of the drive telescopic rod 403 increases, and the flipping rate of the clamping member will become faster. After adjusting the position of the slider 502, use the first limiting bolt 503 to thread onto the slider 502 and make it cooperate with the corresponding limiting screw hole in the fixed frame 501 to limit and fix the position of the slider 502. This setting facilitates the adjustment of the flipping rate according to the conveying rate of the first conveyor belt 2 and the second conveyor belt 3, thereby effectively adapting to various production situations.

Claims

1. A photovoltaic cell silicon wafer drying device, comprising a mounting frame (1) and a first conveyor belt (2) and a second conveyor belt (3) arranged on the mounting frame (1), characterized in that: include, A driving turntable (401) is rotatably connected to one side of the mounting frame (1), and a servo motor (402) for driving the driving turntable (401) to rotate is connected to one side of the mounting frame (1); A driving telescopic rod (403) is rotatably arranged on a driving turntable (401), and when the driving turntable (401) rotates, the driving telescopic rod (403) continuously moves eccentrically; A driving gear (404) is rotatably connected to the other end of the driving telescopic rod (403), and a clamping member for clamping the silicon wafer is connected to the other side of the driving gear (404); The driven rack (405) is connected to one side of the mounting frame (1). When the driving gear (404) moves away from the driving turntable (401) to a certain position, it meshes with the driven rack (405) to drive the clamping member to flip.

2. The photovoltaic cell silicon wafer drying equipment according to claim 1, characterized in that: Also included is an adjustment component (500) for adjusting the flipping rate, comprising, A fixed frame (501) is connected to the driving turntable (401); The slider (502) is slidably disposed in the fixed frame (501) and can slide along the length direction of the fixed frame (501) to move away from or toward the center of the driving turntable (401); A first limiting bolt (503) is threadedly connected to the slider (502) to limit the position of the slider (502); a plurality of limiting screw holes adapted to the first limiting bolt (503) are provided in the fixing frame (501); The second limiting screw (504) is threadedly connected to the driving telescopic rod (403) and is used to control the length of the driving telescopic rod (403).

3. The photovoltaic cell silicon wafer drying equipment according to claim 1, characterized in that: The clamping member comprises an electric telescopic rod (12) connected to one side of the driving gear (404), and the telescopic end of the electric telescopic rod (12) is connected to a pneumatic clamping claw (11).

4. The photovoltaic cell silicon wafer drying equipment according to claim 1, characterized in that: A first synchronous wheel (6) is coaxially arranged on one side of the driving turntable (401), a second synchronous wheel (7) is connected to the driving shaft of the servo motor (402), and a synchronous belt (8) is connected between the first synchronous wheel (6) and the second synchronous wheel (7).

5. The photovoltaic cell silicon wafer drying equipment according to claim 1, characterized in that: The mounting frame (1) is connected to a mounting frame (9), and a plurality of hot air drying components (10) are connected in a linear array at equal intervals along the length direction within the mounting frame (9).

6. The photovoltaic cell silicon wafer drying equipment according to claim 3, characterized in that: The pneumatic clamping jaws (11) are connected to buffer pads on opposite sides of the clamping jaws, and the buffer pads are integrally formed with anti-skid particles.

7. The photovoltaic cell silicon wafer drying equipment according to claim 1, characterized in that: A turning area is formed between the second conveyor belt (3) and the first conveyor belt (2) for turning over silicon wafers.

8. The photovoltaic cell silicon wafer drying equipment according to claim 3, characterized in that: The mounting frame (1) is provided with a slide groove for the electric telescopic rod (12) to slide, and the slide groove is waist-shaped.

Citation Information

Patent Citations

  • Solar cell silicon wafer drying equipment

    CN221113213U