Cleaning tank
By setting a liftable baffle on the side wall of the cleaning tank and driving it with a lever, the risk of cross contamination and chip transfer caused by liquid splashing is solved, and the cleaning effect is improved and chemical defects are reduced.
Patent Information
- Application Number
- CN202422523357.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-18
- Publication Date
- 2025-09-05
- Estimated Expiration
- 2034-10-18
AI Technical Summary
During the chip cleaning process, the chemical liquid in the cleaning tank is easily splashed into the adjacent overflow tank, resulting in an increased possibility of cross-contamination and chemical defects. The existing T-shaped baffle is prone to contamination and collision risks during the chip transfer process, and the water flow in the overflow tank cannot be replaced in time.
Liftable baffles are set on the opposite side walls of the cleaning tank. The interactive movement of the baffles is achieved by lever driving to prevent the splashing of the liquid medicine. The height of the baffles can be lowered when the wafer is transferred to facilitate the transfer of the wafer.
Effectively prevents chemical liquid from splashing into adjacent overflow tanks, reduces the risk of fragmentation and cross contamination during wafer transfer, and avoids the occurrence of chemical defects.
Smart Images
Figure CN223300549U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor materials, and more particularly to a cleaning tank. Background Art
[0002] During the cleaning process of the 8-inch cleaning table, since the cleaning tank is closely adjacent to the overflow tank, a large amount of liquid can easily splash into the overflow tank next door during the Etch process after adding the liquid, causing pollution to the deionized water in the overflow tank. At the same time, the splashed liquid will pollute the overflow tank and the surface of the cleaning table, increasing the possibility of chemical defects and thus increasing the frequency of rework.
[0003] To address the above problems, a T-shaped baffle is currently installed between the cleaning tank and the overflow tank to block the splashing of the chemical solution. The T-shaped baffle is placed on the cleaning table to block the cross contamination caused by the splashing of the chemical solution. Since the T-shaped baffle needs to be placed on the table during use, the wafer will be blocked by the baffle during the transfer from the cleaning tank to the overflow tank after etch. The baffle needs to be moved before the wafer is transferred. Since the T-shaped baffle will contact the chemical solution during this process, the table will be contaminated by the chemical solution during the movement. When the baffle cannot be moved in time, there is a risk of bumping into the wafer. At the same time, the water flow in the overflow tank at this stage cannot replace the contaminated water in the overflow tank with new water in time, which will increase the possibility of chemical defects on the wafer surface.
[0004] Therefore, how to provide a cleaning tank that can prevent the chemical solution from splashing into the adjacent overflow tank and affecting the chip cleaning effect during the chip cleaning process is a problem that technical personnel in this field urgently need to solve. Utility Model Content
[0005] In view of this, the present invention provides a cleaning tank, which aims to solve one of the problems in the above-mentioned background technology, and prevent the liquid in the cleaning tank from splashing into the overflow tank adjacent to the cleaning tank when the 8-inch wafer is etched, thereby affecting the cleaning effect of the wafer.
[0006] In order to achieve the above purpose, the utility model adopts the following technical solutions:
[0007] The utility model provides a cleaning tank, comprising:
[0008] A cleaning tank body, wherein two opposite side walls of the cleaning tank body are respectively provided with slots;
[0009] Two baffles are provided, and the two baffles are respectively arranged in two slots for lifting and lowering, and a friction pair is formed between the baffles and the slots. Two limit rods arranged toward the direction of the cleaning tank body are connected to both ends of each baffle near its bottom edge, and the two limit rods are spaced apart in the height direction;
[0010] There are two levers, each of which is disposed at the two ends of the cleaning tank body where the slot is not disposed, the middle portion of the lever being hinged to the middle portion of the cleaning tank body, and the two ends of the lever extending between the two spaced-apart limit rods;
[0011] Among them, when the lever is in a horizontal state, the two baffles partially extend beyond the upper edge of the cleaning tank body to form a barrier to the cleaning tank body, thereby preventing the liquid in the cleaning tank body from splashing into the overflow tank adjacent to the cleaning tank body; when it is necessary to transfer the wafers in the cleaning tank body to the overflow tank adjacent to it, the baffle on the side of the cleaning tank body corresponding to the wafer to be transferred is pressed down to reduce the height of the baffle extending out of the cleaning tank body, thereby facilitating the transfer of the wafers in the cleaning tank body to the adjacent overflow tank.
[0012] According to the cleaning tank provided by the present invention, the lever is arranged inside the cleaning tank body, the cleaning tank body is provided with a vertically arranged strip groove on the inner side wall of the slot, and the limiting rod extends into the interior of the cleaning tank body from the strip groove.
[0013] According to the cleaning tank provided by the present invention, the lever is arranged on the outside of the cleaning tank body, the two ends of the slot are open, the two ends of the baffle extend out of the two ends of the cleaning tank body respectively, and the limit rod is connected to the part of the baffle extending out of the end of the cleaning tank body.
[0014] According to the cleaning tank provided by the utility model, when one of the two baffles slides to the bottom of the slot, both ends of the lever are still located between the two limiting rods.
[0015] According to the cleaning tank provided by the present invention, the height of the baffle is greater than the height of the cleaning tank body.
[0016] Through the above technical solution, it can be known that compared with the prior art, the utility model discloses a cleaning tank, which is provided with slots respectively provided on the two opposite side walls of the cleaning tank body, and baffles that can be raised and lowered are inserted in the slots. The baffles on both sides are driven by levers to realize the interactive movement of the two baffles, that is, the left rises and the right falls, or the right rises and the left falls. When the lever is in a horizontal state, the two baffles partially extend beyond the upper edge of the cleaning tank body to form a barrier to the cleaning tank body, preventing the liquid medicine in the cleaning tank body from splashing into the overflow tank adjacent to the cleaning tank body; when the chip in the cleaning tank body needs to be transferred to the overflow tank adjacent to it, the baffle on the corresponding side of the cleaning tank body where the chip needs to be transferred is pressed down to reduce the height of the baffle extending out of the cleaning tank body, so as to facilitate the transfer of the chip in the cleaning tank body to the adjacent overflow tank; the utility model can reduce the risk of fragmentation in the chip transfer process by setting the liftable baffle, and at the same time avoid rework of chemical defects caused by cross contamination of liquid medicine spraying. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are merely embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without paying any creative work.
[0018] Figure 1 A schematic diagram of the structure of the cleaning tank provided by the utility model;
[0019] Figure 2 This is a schematic structural diagram of the use state of the baffle plate of the cleaning tank provided by the utility model to prevent the splashing of liquid medicine;
[0020] Figure 3 The utility model provides Figure 2 Main view of the middle cleaning tank;
[0021] Figure 4 This is a schematic structural diagram of the use state of the baffle of the cleaning tank provided by the utility model during wafer transfer;
[0022] Figure 5 The utility model provides Figure 4 Front view of the middle cleaning tank.
[0023] In the figure: 1 is the cleaning tank body; 2 is the baffle; 3 is the lever; 4 is the overflow tank; 5 is the slot; 6 is the limit rod. DETAILED DESCRIPTION
[0024] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.
[0025] Example 1
[0026] See also Figure 1-5 The embodiment of the utility model discloses a cleaning tank, including: a cleaning tank body 1, a baffle 2 and a lever 3.
[0027] The cleaning tank body 1 is preferably a box body with a rectangular structure. The shape of the cleaning tank body 1 can also be specifically set according to needs, as long as there is a box body with straight-edge structures on opposite sides. During the cleaning process of 8-inch wafers, since the cleaning tank body 1 is closely adjacent to the overflow tank 4, when the 8-inch wafer is etched in the cleaning tank body 1, a chemical liquid needs to be placed in the cleaning tank body 1. Therefore, during the wafer cleaning process, a large amount of chemical liquid is easily splashed into the overflow tank 4 next door, affecting the cleaning effect of the wafer in the overflow tank 4.
[0028] In the cleaning tank provided by the present invention, two opposite side walls of the cleaning tank body 1 are respectively provided with slots 5 .
[0029] There are two baffles 2, and the two baffles 2 are respectively arranged in two slots 5 for lifting. There is a friction pair between the baffle 2 and the slot 5. Two ends of each baffle 2 are connected near its bottom edge with two limit rods 6 arranged toward the direction of the cleaning tank body 1, and the two limit rods 6 are arranged at intervals in the height direction; the two baffles 2 have the same shape and size, and the friction pair between the baffle 2 and the slot 5 can be ensured by the cooperation of the two, specifically by the friction between the slot 5 and the baffle 2. As long as the friction between the baffle 2 and the slot 5 is greater than the gravity of the baffle 2, the lifting and lowering of the baffle 2 in the slot 5 can be achieved by applying an external force; in other embodiments, a rubber pad or sponge pad for increasing the friction can also be provided on the inner wall of the slot 5 or the inner wall of the open end of the slot 5 to ensure that the friction between the baffle 2 and the slot 5 is greater than the weight of the baffle 2.
[0030] There are two levers 3, which are respectively arranged at the two ends of the cleaning tank body 1 where no slots 5 are provided. The middle part of the lever 3 is hinged to the middle part of the two ends of the cleaning tank body 1 where no slots 5 are provided, and the two ends of the lever 3 are respectively extended between the two limit rods 6 set at intervals; through the setting of the lever 3, when the height of the baffle 2 inserted into the slot 5 is adjusted by external force, the two baffles 2 can realize interactive movement, thereby realizing the adjustment of the height of the baffles 2 on both sides of the cleaning tank body 1 as needed.
[0031] Among them, when the lever 3 is in a horizontal state, the two baffles 2 partially extend beyond the upper edge of the cleaning tank body 1 to form a barrier to the cleaning tank body 1, preventing the liquid in the cleaning tank body 1 from splashing into the overflow tank 4 adjacent to the cleaning tank body 1; when it is necessary to transfer the wafer in the cleaning tank body 1 to the overflow tank 4 adjacent to it, the baffle 2 on the corresponding side of the cleaning tank body 1 where the wafer needs to be transferred is pressed down to lower the height of the baffle 2 extending out of the cleaning tank body 1, so as to facilitate the transfer of the wafer in the cleaning tank body 1 to the adjacent overflow tank 4.
[0032] In the above embodiment, preferably, the lever 3 is disposed inside the washing tank body 1, and a vertical strip groove (not shown) is provided on the inner side wall of the washing tank body 1 where the slot 5 is provided, and the limiting rod 6 extends from the strip groove into the interior of the washing tank body 1. Specifically, the strip groove connects the slot 5 with the interior of the washing tank body 1. When the lever 3 is in a horizontal state, the two ends of the lever 3 extend from the strip groove to between the two limiting rods 6 in the slot 5. The provision of the strip groove provides clearance space during the rotation of the lever 3.
[0033] Preferably, when one of the two baffles 2 slides to the bottom of the slot 5, the two ends of the lever 3 are still between the two limit rods 6. This arrangement can prevent the two ends of the lever 3 from being between the two limit rods 6 when the baffle 2 is in the highest state and the lowest state extended from the slot 5, thereby preventing the two ends of the lever 3 from slipping out from between the two limit rods 6.
[0034] In a further embodiment, the height of the baffle 2 is greater than the height of the cleaning tank body 1. This arrangement prevents the baffle 2 from completely descending into the slot 5 when it descends to the lowest position in the slot 5. After fully descending into the slot 5, when the upper edge of the slot 5 is provided with a rubber pad or sponge pad for increasing friction, the baffle 2 is likely to interfere with the upper edge of the slot 5 when it rises again, thereby affecting the normal rise of the baffle 2.
[0035] Example 2
[0036] The difference between Example 2 and Example 1 is that the lever 3 is disposed outside the tank body 1, the ends of the slot 5 are open, the ends of the baffle 2 extend out of the tank body 1, and the limit rod 6 is connected to the portion of the baffle 2 extending out of the tank body 1. In other words, the lever 3 and the limit rod 6, which control the raising and lowering of the baffle 2, are both disposed outside the tank body 1.
[0037] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. Reference can be made to the common and similar parts between the various embodiments. For the devices disclosed in the embodiments, since they correspond to the methods disclosed in the embodiments, the description is relatively simple, and the relevant parts can be referred to the method description.
[0038] The above description of the disclosed embodiments will enable one skilled in the art to implement or use the present invention. Various modifications to these embodiments will be readily apparent to one skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention is not limited to the embodiments shown herein but is intended to conform to the widest scope consistent with the principles and novel features disclosed herein.
Claims
1. A cleaning tank, characterized in that: include: A cleaning tank body, wherein two opposite side walls of the cleaning tank body are respectively provided with slots; Two baffles are provided, and the two baffles are respectively arranged in two slots for lifting and lowering, and a friction pair is formed between the baffles and the slots. Two limit rods arranged toward the direction of the cleaning tank body are connected to both ends of each baffle near its bottom edge, and the two limit rods are spaced apart in the height direction; There are two levers, each of which is disposed at the two ends of the cleaning tank body where the slot is not disposed, the middle portion of the lever being hinged to the middle portion of the cleaning tank body, and the two ends of the lever extending between the two spaced-apart limit rods; Among them, when the lever is in a horizontal state, the two baffles partially extend beyond the upper edge of the cleaning tank body to form a barrier to the cleaning tank body, thereby preventing the liquid in the cleaning tank body from splashing into the overflow tank adjacent to the cleaning tank body; when it is necessary to transfer the wafers in the cleaning tank body to the overflow tank adjacent to it, the baffle on the side of the cleaning tank body corresponding to the wafer to be transferred is pressed down to reduce the height of the baffle extending out of the cleaning tank body, thereby facilitating the transfer of the wafers in the cleaning tank body to the adjacent overflow tank.
2. The cleaning tank according to claim 1, wherein The lever is arranged inside the cleaning tank body. The inner side wall of the cleaning tank body provided with the slot is provided with a vertical strip groove. The limiting rod extends into the interior of the cleaning tank body through the strip groove.
3. The cleaning tank according to claim 1, wherein The lever is arranged outside the cleaning tank body, the two ends of the slot are open, the two ends of the baffle extend out of the two ends of the cleaning tank body respectively, and the limiting rod is connected to the part of the baffle extending out of the end of the cleaning tank body.
4. The cleaning tank according to claim 2 or 3, characterized in that When one of the two baffles slides to the bottom of the slot, both ends of the lever are still located between the two limiting rods.
5. The cleaning tank according to claim 1, wherein The height of the baffle is greater than the height of the cleaning tank body.